CN108828887A - Projector and depth camera - Google Patents
Projector and depth camera Download PDFInfo
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- CN108828887A CN108828887A CN201810569869.6A CN201810569869A CN108828887A CN 108828887 A CN108828887 A CN 108828887A CN 201810569869 A CN201810569869 A CN 201810569869A CN 108828887 A CN108828887 A CN 108828887A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2033—LED or laser light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2006—Lamp housings characterised by the light source
- G03B21/2013—Plural light sources
Abstract
The present invention provides a kind of projector and depth camera, projector include:VCSEL array light source, including:Semiconductor substrate;Multiple VCSEL sub-light sources are arranged in the form of two-dimensional pattern at least one key light source region and at least one secondary light source region on the semiconductor substrate;The arrangement of VCSEL sub-light source and at least partly VCSEL sub-light source arrangement in the key light source region are mutually complementary in the secondary light source region;Controller shines for controlling VCSEL sub-light source in the key light source region, and/or, it shines for controlling the VCSEL sub-light source in the secondary light source region;Pattern maker for receiving the light beam of the VCSEL array light source transmitting, and launches outward out structured light patterns light beam.The projector and depth camera can also realize other distinctive functions in addition to the function of having traditional structured light projection, and not influence the quality of structured light patterns.
Description
Technical field
The present invention relates to optics and electronic technology field more particularly to a kind of projectors and depth camera.
Background technique
The 3D imaging technique that is especially applied in consumer field of 3D imaging will constantly impact even replace traditional 2D at
As technology, 3D imaging technique can also obtain the depth of target object other than possessing and carrying out 2D imaging capability to target object
Information can further realize the functions such as 3D scanning, scene modeling, gesture interaction according to depth information.Depth camera is especially
Structure light depth camera or TOF (time flight) depth camera are the hardware devices for being generally used to 3D imaging at present.
Core component in depth camera is laser projection mould group, according to the difference of depth camera institute projection pattern type,
The structure of laser projection mould group is also had any different with function, for example the projective module group disclosed in patent CN201610977172A is used
In projecting speckle patterns into space to realize structure light depth measurement, this spot structure light depth camera is also at present more
Scheme mature and being widely used.With the continuous extension of depth camera application field, optical projection mould group will be to smaller and smaller
Volume and higher and higher performance on constantly evolve.
Using VCSEL (vertical cavity surface emitting laser) array light source depth camera because have small in size, power it is big,
The characteristics of the advantages that light beam is concentrated will replace edge emitting laser emitter light source, VCSEL array light source is extremely small at one
Substrate on carry out laser projection by way of arrange multiple VCSEL light sources.For structure light depth camera, swash
The speckle patterns that light projective module group projects outward require high irrelevance, this requirement increases in VCSEL array
The design difficulty of light source arrangement.On the other hand optical element matched with VCSEL array light source, such as diffraction optical element,
Finally formed structured light patterns quality will be determined directly to the modulation function for the light beam that VCSEL array light source is launched.
Summary of the invention
To solve the above problems, the present invention proposes the projector and depth camera of a kind of multifunction.
The present invention provides a kind of projector, including:VCSEL array light source, including:Semiconductor substrate;Multiple VCSEL sub-lights
Source arranges at least one key light source region and at least one light on the semiconductor substrate in the form of two-dimensional pattern
In source region;The arrangement of VCSEL sub-light source and at least partly VCSEL sub-light in the key light source region in the secondary light source region
Source arrangement is mutually complementary;Controller shines for controlling VCSEL sub-light source in the key light source region, and/or, for controlling
VCSEL sub-light source in the secondary light source region shines;Pattern maker, for receiving the VCSEL array light source transmitting
Light beam, and launch outward out structured light patterns light beam.
In some embodiments, the quantity of VCSEL sub-light source is greater than in the secondary light source region in the key light source region
The quantity of VCSEL sub-light source.Preferably, in the key light source region in the quantity of VCSEL sub-light source and the secondary light source region
The quantity of VCSEL sub-light source is located on the different orders of magnitude.
In some embodiments, the arranging density of VCSEL sub-light source is greater than the secondary light source area in the key light source region
The arranging density of VCSEL sub-light source in domain.
In some embodiments, the two-dimensional pattern includes multiple sub-patterns, and the sub-pattern includes in key light source region
Part VCSEL sub-light source and the secondary light source region in part VCSEL sub-light source, it is full between at least two sub-patterns
Sufficient transformation relation.Wherein, the transformation includes one of duplication, translation, rotation, scaling, mapping transformation mode or a variety of.
In some embodiments, the structured light patterns are adjoined each other by multiple minor structure light patterns and are formed;When only opening
VCSEL sub-light when VCSEL sub-light source in the key light source region, in the minor structure light pattern and the key light source region
Source arrangement corresponds to;When opening simultaneously the VCSEL sub-light source in the key light source region and the secondary light source region, the son
VCSEL sub-light source arrangement in structured light patterns and the key light source region and the VCSEL sub-light source in the secondary light source region
Superimposed arrangement is arranged to correspond to.
In some embodiments, the VCSEL sub-light source in the secondary light source region is independently controlled, in the projection
When instrument single projection, the part VCSEL sub-light source in the secondary light source region is opened at random.
It in some embodiments, further include lens, the lens are located at the VCSEL array light source and the pattern generation
Between device, the light beam launched for converging the VCSEL array light source.
The present invention also provides a kind of depth cameras, including:Projector as described above, for the emitting structural light into space
Pattern beam;Mould group is acquired, is radiated on target object for acquiring the structured light patterns light beam and is formed by structure light figure
Case;Processor, for receiving the structured light patterns and calculating the depth image of the target object.
Beneficial effects of the present invention:Multiple VCSEL sub-light sources are arranged on a semiconductor substrate in the form of two-dimensional pattern
In at least one key light source region and at least one secondary light source region, in secondary light source region VCSEL sub-light source arrangement with it is described
At least partly VCSEL sub-light source arrangement in key light source region is mutually complementary, by key light source region and secondary light source region
The control of VCSEL sub-light source packet, has projector outside the function of traditional structured light projection, can also realize that other are distinctive
Function, and the quality of structured light patterns is not influenced.
Detailed description of the invention
Fig. 1 is the depth camera side schematic view of one embodiment of the invention.
Fig. 2 is the projector schematic diagram of one embodiment of the invention.
Fig. 3 is the VCSEL array light source schematic diagram of one embodiment of the invention.
Fig. 4, which is that sub-light source is luminous in the only control key light source region of one embodiment of the invention, is formed by structured light patterns
Schematic diagram.
Fig. 5, which is that sub-light source is luminous in the synchronously control primary and secondary area source region of one embodiment of the invention, is formed by knot
Structure light pattern schematic diagram.
Fig. 6 is the VCSEL array light source schematic diagram of another embodiment of the present invention.
Fig. 7 is the VCSEL array light source schematic diagram of another embodiment of the invention.
Fig. 8 is the VCSEL array light source schematic diagram of further embodiment of the present invention.
Specific embodiment
With reference to embodiment and compares attached drawing invention is further described in detail, it should be emphasised that,
Following the description is only exemplary, the range and its application being not intended to be limiting of the invention.
The present invention proposes that a kind of VCSEL array light source and the projector based on the light source, projector can project outward
Optical design out, such as structure light speckle pattern, while corresponding 3D imaging device is proposed based on projector, 3D here at
As equipment is called depth camera, what the value in the image of object taken by depth camera in each pixel represented is in space
Depth value of the corresponding point between depth camera.It will be to VCSEL array light source, projector, depth in explanation below
It is illustrated for degree camera, but is not meant to that this VCSEL array light source is only capable of applying in projector or this throwing
Shadow instrument is only capable of applying in depth camera, and the technical solution in any other device in all direct or indirect utilization present invention is all
It should be comprised in protection scope of the present invention.
Shown in FIG. 1 is depth camera side schematic view according to an embodiment of the invention.10 main groups of depth camera
There are projector 103, acquisition mould group 105, mainboard 102 and processor 101 at component, is further provided in some depth cameras
RGB camera 104 etc..It is flat that projector 103, acquisition mould group 105 and RGB camera 104 are generally mounted at the same depth camera
On face, and it is in same baseline, each mould group or camera correspond to a light portal 106.Generally, 101 quilt of processor
It is integrated on mainboard 102, and projector 103 is connect by interface with mainboard 102 with collection model 105, in one embodiment
The interface is FPC interface.Projector 103 is acquired for projecting encoded structured light patterns light beam into object space
After the acquisition of mould group 105 is radiated at and is formed by structured light patterns on target object, calculated by processor 101 according to trigonometry principle
The depth image of target object out.
Projector 103 includes mainly light source and optical element, and light source may include such as LED, laser light source, for sending out
Penetrate visible light and the black lights such as infrared, ultraviolet.Optical element such as lens, diffraction optical element, reflecting mirror etc., for light
The light beam that source issues is modulated, to be projected out structured light patterns light beam outward.What structured light patterns light beam mentioned here referred to
It is that the pattern beam projects and will form the pattern on space plane.Acquisition mould group 105 is often corresponded with projector 103,
On the other hand the visual field that the visual field of projector 103 generally requires the covering acquisition mould group 105 in measurement range acquires mould group 105
Corresponding with 103 beam emitted wavelength of the projector optical filter of setting is generally required, in order to allow more structured light patterns
The light of light beam, which passes through while reducing other wavelength light beams, passes through brought picture noise.
In one embodiment, structured light patterns are infrared speckle pattern (infrared speckle patterns), and pattern is with particle point
Cloth is relatively uniform but has very high local irrelevance, and local irrelevance here refers to that each sub-regions are all in pattern
Uniqueness with higher, acquiring mould group 105 at this time is corresponding infrared camera.Structured light patterns are also possible to striped, two dimension
The other forms such as pattern.
The chief component of depth camera based on time flight method principle (TOF) be also projector and acquisition mould group,
Its projector collects the light for emitting the light pulse clocked, acquisition mould group unlike the depth camera of structure light principle
It can be obtained by the flight time of light in space after pulse, processor recycled to calculate the distance of corresponding spatial point.
Fig. 2 is a kind of embodiment of projector 103 in Fig. 1.The projector 103 includes pedestal (such as including main pedestal
201, secondary pedestal 202 and circuit board 203), light source chip 204, microscope base 206, lens 207 and diffraction optical element (DOE)
208.The light beam that light source chip 204 issues is emitted from DOE208 into space after lens 207 are collimated or focused, generally, thoroughly
Mirror 207 between light source chip 204 and DOE208, the distance between lens 207 and light source chip 204 equal or approximate to etc.
In the focal length of lens 207, for converging the light beam of light source chip sending.Lens 207 and DOE208 can also in other embodiments
To be integrated into an optical element, for example it is formed on two surfaces of one piece of transparent substrates.It in some embodiments, can be with
Thermistor 205 is set to measure to the temperature around light source chip 204, any suitable thermistor can be applied
In mould group, such as NTC, PTC etc..Wherein it is also not necessary to such as some millimeters in some embodiments for lens 207
The short distance of magnitude distance projects, and directly can carry out diffraction modulation to the light beam that light source chip issues using DOE.
Light source chip 204 can be semiconductor LED, semiconductor laser etc., preferably use vertical cavity surface laser emitter
(VCSEL) array is as light source, since VCSEL possesses the features such as small in size, the light source angle of departure is small, stability is good, while can be with
Hundreds and thousands of a VCSEL sub-light sources, the VCSEL array light source thus constituted are arranged in the semiconductor substrate of area 1mmx1mm
Chip is not only small in size, low in energy consumption, while being more conducive to generating structure light speckle patterns light beam.
Lens 207 can also use microlens array (MLA) in one embodiment other than with single lens, micro-
Each lenticule unit is corresponding with each sub-light source in light source chip 204 in lens array, can also be with a lenticule list
It is first corresponding with multiple sub-light sources etc.;It can also realize that light beam is converged using lens group in another embodiment.
DOE208 is used to receive the light beam by lens 207 and launches outward out the structure light figure that can form structured light patterns
Case light beam, in one embodiment, such as when 202 quantity of light source be 100 when, i.e., be via the light beam on lens transmission to DOE
100, DOE can be expanded lens light beam with the multiplying power of a certain quantity (such as 200), and 20000 are finally emitted into space
A light beam, ideally it will be appreciated that there is 20000 spots (to have the situation of some spot overlappings in some cases, lead
Amount of speckle is caused to reduce).Other than DOE, other any optical elements that can form structure light image can also be used, than
Such as the combination of MLA, grating or a variety of optical elements.
Fig. 3 to Fig. 8 is the VCSEL array light source of embodiment according to the present invention and the schematic diagram of structured light patterns.Figure
Middle circle or stain indicate the position where light source, are not used to indicate the true form and size of light source, two-wire box generation
Table be substrate profile.For the ease of the elaboration to concept of the present invention, some dotted line earth's surfaces are also added in figure
Show separation or auxiliary line, these dotted lines are merely to illustrate, might not necessary being in VCSEL array.
Fig. 3 is VCSEL array light source schematic diagram according to an embodiment of the invention.VCSEL array light source includes partly leading
Body substrate 301, multiple VCSEL sub-light sources 302 and controller (not shown), multiple VCSEL sub-light sources 302 are with two-dimensional pattern shape
Formula is arranged on substrate 301, generally, is arranged in the form of irregular two-dimensional pattern.Controller is for controlling VCSEL sub-light
Source shines, for example controller is conductor electrode, for providing electric power to VCSEL sub-light source to drive its light emission.Each VCSEL
Sub-light source can configure independent controller, or multiple VCSEL sub-light sources configure a controller, so that multiple
VCSEL sub-light source energy synchronous light-emitting.In embodiment shown in Fig. 3, VCSEL sub-light source is divided into two groups, and dotted line is used in figure
It schematically separates and (can also intersect), the VCSEL sub-light source indicated with circle is formed in region 303, is indicated with stain
VCSEL sub-light source be formed in region 304, wherein region 303 be main source region, be made of more sub-light source, area
Domain 304 is secondary light source region, is made of less sub-light source.Sub-light source quantity in key light source region will be much higher than secondary light source
Sub-light source quantity in region, such as on the different orders of magnitude.In some embodiments, ratio of number is more than 10:1, than
300 sub-light sources are had more than as contained in key light source region, and the sub-light source quantity in secondary light source region is no more than 30.
In one embodiment, the arranging density of sub-light source is greater than the sub-light source in secondary light source region in key light source region
Arranging density.Such as in key light source region the arranging density of sub-light source be in secondary light source region 2 times of sub-light source arranging density or
Other multiples of person, so that being formed by the row in the density being arranged under the overlay and key light source region after two area arrangements are superimposed
Column similar density is overlapped the arranging density that will not change in key light source region substantially.
In some embodiments, key light source region is controlled from secondary light source region by two different controllers, can be independent
The sub-light source in key light source region or the sub-light source in secondary light source region are opened, can also synchronize to open in two regions and own
Sub-light source.
It is shown in Fig. 4 be only control key light source region in sub-light source shine be formed by structured light patterns schematic diagram;
Shown in fig. 5 is that the luminous structured light patterns that are formed by of sub-light source are illustrated in synchronously control primary and secondary area source region
Figure.In the embodiment shown in fig. 4, the light beam that DOE is issued array light source has carried out beam splitting, multiple by difference to copy
The minor structure light pattern 401 that diffraction order beams are formed, multiple minor structure light patterns adjoin each other to be combined into structured light patterns.Figure
It has been only shown schematically 2x3=6 times of duplication situation in 4, and has had ignored the pattern distortions as caused by lens etc., for example rest the head on
Shape distortion etc..402 shape of hot spot that each minor structure light pattern 401 is formed by light beam corresponding with the sub-light source in key light source region
At, the spread pattern of hot spot 402 with the arrangement of sub-light source is corresponding in key light source region in array of source, correspondence here can be
Identical to be also possible to central symmetry etc., this depends primarily on the construction of lens.The corresponding structured light patterns of Fig. 4 are by array of source
In be formed by when only opening the sub-light source in key light source region, therefore hot spot arrangement and key light source region in minor structure light pattern
Interior sub-light source, which arranges, to be corresponded to.
When the synchronous sub-light source opened in primary and secondary source region, the structured light patterns formed are schematically given by Fig. 5
Out.The light beam that sub-light source in secondary light source region issues forms spot pattern corresponding with its spread pattern after DOE is replicated, than
As being formed by spot pattern by hot spot 501 in Fig. 5.Since the area size of minor structure light pattern is corresponding with key light source region,
Therefore the corresponding light beam of sub-light source in secondary light source region, which is formed by hot spot, can drop into adjacent minor structure light pattern, and
With other hot spots therein are interlaced is superimposed.In one embodiment, in order to enable light inside when two kinds are arranged in superposition
It is not overlapped between spot, just needs to consider the arrangement of key light source region Yu secondary light source region inner light source in design, such as
In VCSEL light source array shown in Fig. 3, the sub-light source arrangement in secondary light source region should be with the sub-light in left side in key light source region
Source arrangement is complementary, and i.e. when the arrangement superposition in two regions, hot spot therein does not overlap the complementary meaning as far as possible, and
It is offset from each other.
Fig. 3~shown in fig. 5 is the signal of VCSEL array light source and the institute of projector according to some embodiments of the invention
The structured light patterns of transmitting are illustrated.The projector (such as Fig. 4 other than having the function of structured light projection identical with conventional projection
It is shown), it can also realize its distinctive function, by setting by the lesser secondary light source region of quantity, can then be selected in projection
Structured light patterns as shown in Figure 5 are projected out to selecting property, wherein being formed by speckle patterns extremely by sub-light source in secondary light source region
The function that following conventional projector cannot achieve may be implemented less:Since the sub-light source in secondary light source region is independent control,
Therefore the spot in these speckle patterns can carry out Direct Recognition and positioning, if only these spots and surrounding carry out depth gauge
Calculation, can with higher efficiency and resource consumption tentatively obtains the rough depth image of a width;Alternatively, can be by identifying this
Whether the relative position distribution of a little spots and its periphery spot, deform to structured light patterns and deflection calculate,
Here deformation refers to the collected structured light patterns of acquisition camera institute as caused by temperature or mechanical deformation etc. and presets
Structured light patterns between variation, it is this deformation will have a direct impact on depth image generation quality and precision;Or
In some embodiments, sub-light source is controlled by multiple controllers in secondary light source region, random to select when carrying out structured light projection
It takes one or several sub-light source therein to be projected, random, unique structure light image or structure light image can be formed
Sequence encrypts depth camera system by this structure light image generated at random, such as projector and processor core
The encryption etc. transmitted between piece, to improve the safety of system.
Fig. 6 is the schematic diagram of VCSEL array light source in accordance with another embodiment of the present invention.Compared with Fig. 3, contain two
A secondary light source region 601 and 602, the sub-light source in two secondary light source regions and key light source region 603 is by different controller controls
System.In one embodiment, in the projector comprising the VCSEL array light source, the function of DOE is similar with Fig. 4, i.e., only works as key light
In source region sub-light source open when, DOE replicates the light beam that key light source region neutron light source is issued, with formed it is multiple by
Minor structure light pattern corresponding with the neutron light source arrangement of key light source region, multiple minor structure light patterns adjoin each other to form structure
Light pattern;When opening simultaneously the sub-light source in one or two secondary light source region, being formed by speckle patterns be will be embedded in
In minor structure light pattern.It is understood that in some embodiments, secondary light source region can also have more, for example, 3 or
4;The position in secondary light source region can also be configured, for example the upper and lower, left and right of key light source region are arranged in, or setting
In the centre of key light source region.
In some embodiments, key light source region can also have multiple, than as shown in Fig. 7 according to the present invention another
The VCSEL array light source schematic diagram of embodiment.It includes two secondary light source regions 701 and 702 and two key light source regions
703 and 704, each region is controlled by independent controller and shines.It is understood that only with two key light source regions in Fig. 7
Domain is to make to illustrate, in fact, it also may include more than two key light source regions.What the projector being made from it was launched
In structured light patterns, minor structure light pattern can be one of key light source region neutron light source and be formed by, and be also possible to more
Sub-light source in a key light source region (not all key light source region) is formed by, and multiple minor structure light patterns adjoin each other with shape
At structured light patterns.In one embodiment, corresponding with the region more when the sub-light source in key light source region 703 is opened
A sub- structured light patterns collectively constitute sparsity structure light pattern;When key light source region 703 and 704 opens simultaneously, will be formed close
Collect structured light patterns, each minor structure light pattern in the close packed structure light pattern is by key light source region 703 and key light source region
What the sub-light source in domain 704 was collectively formed, therefore, in general, the sub-light source in key light source region 703 and key light source region 704 is arranged
Column are mutually complementary, and when different main light source region areas is roughly the same, sub-light source arrangement therein should complete mutual complementation, when
When the area difference of key light source region, sub-light source arrangement therein should be at least partly mutually complementary.It is understood that secondary light source
Sub-light source arrangement also should be mutually complementary at least partly arrangement in key light source region in region.
When the quantity of key light source region or secondary light source region increases or sub-light source quantity therein increases, conjunction is designed
The VCSEL array light source arrangement pattern of reason will be more and more difficult.The arrangement pattern of VCSEL array light source will directly determine most
The pattern of whole structured light patterns, generally, it is desirable that structured light patterns even density as far as possible and the higher randomness of guarantee, so that
It obtains the matching primitives based on the structured light patterns and has higher stability and precision.Therefore in design VCSEL array light source row
When column pattern, need to consider many factors such as quantity of light source, distribution, energy-flux density.
Fig. 8 is the VCSEL array light source schematic diagram of further embodiment according to the present invention.It is similar with embodiment illustrated in fig. 6,
It (is not separated with dotted line in Fig. 6 comprising the key light source region being made of circle and the secondary light source region being made of stain
Signal).When the arrangement of VCSEL array light source is designed in the present embodiment, i.e., the two-dimensional pattern of arrangement is designed
When, part light source is designed first and arranges corresponding sub-pattern, such as 4 regions being separated out in figure with dotted line, is designed first
Secondly sub-light source distribution sub-pattern in the region is carried out mirror image to be formed by the sub-light source distribution sub-pattern in 801 regions out
Sub-light source distribution in 802 regions, then by 801 regions and son of the 802 region mirror images to be formed in 804 regions and 803 regions
Distribution of light sources, i.e., the sub-light source distribution in entire VCSEL array light source is by the sub-light source distribution (subgraph in a sub-regions
Case) sub-light source distribution that multiple subregions are generated by way of mirror image, ultimately form whole VCSEL array distribution of light sources
(whole two-dimensional pattern).It is understood that in some embodiments, it is also possible to passing through duplication, translation, rotation, scaling, mapping
Etc. mapping modes formed VCSEL array distribution of light sources.In some embodiments, it is also possible to by the transformation to multiple subregions come
Form final VCSEL array light source.
As can be seen from Figure 8, the sub-light source in the subregion of design phase and a non-formation key light source region or secondary
Source region, i.e. sub-light source in the subregion of design phase are not necessarily controlled by single controller.In Fig. 8, four sub-districts
Circle in domain collectively constitutes the sub-light source in key light source region, controls it by a controller and shines;Subregion 801 and 804
A secondary light source region can be formed, it is controlled by a controller and is shone;Subregion 802 and subregion 803 can form one
A secondary light source region controls it by a controller and shines.
It is understood that technical effect caused by above-described design method, however not excluded that there is other design methods
Come achieve the effect that with convert using subregion it is same, that is, generate with transformation have same characteristic features pattern, it is possible to understand that
, other any design methods, which reach, also belongs to protection model of the invention with the VCSEL array light source of transformation equivalent effect
In enclosing.The feature or effect of pattern mentioned here refer to the arrangement two-dimensional pattern packet of finally formed VCSEL array light source
Contain multiple sub-patterns, meets at least one of above-described transformation relation between at least two sub-patterns.
The above content is combine it is specific/further detailed description of the invention for preferred embodiment, cannot recognize
Fixed specific implementation of the invention is only limited to these instructions.For those of ordinary skill in the art to which the present invention belongs,
Without departing from the inventive concept of the premise, some replacements or modifications can also be made to the embodiment that these have been described,
And these substitutions or variant all shall be regarded as belonging to protection scope of the present invention.
Claims (10)
1. a kind of projector, which is characterized in that including:
VCSEL array light source, including:
Semiconductor substrate;
Multiple VCSEL sub-light sources arrange at least one key light source region on the semiconductor substrate in the form of two-dimensional pattern
And at least one secondary light source region;
The arrangement of VCSEL sub-light source is arranged at least partly VCSEL sub-light source in the key light source region in the secondary light source region
Column are mutually complementary;
Controller shines for controlling VCSEL sub-light source in the key light source region, and/or, for controlling the secondary light source area
VCSEL sub-light source in domain shines;
Pattern maker for receiving the light beam of the VCSEL array light source transmitting, and launches outward out structured light patterns light
Beam.
2. projector as described in claim 1, which is characterized in that the quantity of VCSEL sub-light source is big in the key light source region
In the quantity of VCSEL sub-light source in the secondary light source region.
3. projector as claimed in claim 2, which is characterized in that in the key light source region quantity of VCSEL sub-light source with
The quantity of VCSEL sub-light source is located on the different orders of magnitude in the secondary light source region.
4. projector as described in claim 1, which is characterized in that the arrangement of VCSEL sub-light source is close in the key light source region
Degree is greater than the arranging density of VCSEL sub-light source in the secondary light source region.
5. projector as described in claim 1, which is characterized in that the two-dimensional pattern includes multiple sub-patterns, the subgraph
Case includes the part VCSEL sub-light source in part VCSEL sub-light source and the secondary light source region in key light source region, and at least two
Meet transformation relation between a sub-pattern.
6. projector as claimed in claim 5, which is characterized in that the transformation includes duplication, translation, rotation, scaling, mapping
One of mapping mode is a variety of.
7. projector as claimed in claim 6, which is characterized in that the structured light patterns are mutual by multiple minor structure light patterns
It abuts to form;
When only opening the VCSEL sub-light source in the key light source region, the minor structure light pattern and the key light source region
Interior VCSEL sub-light source, which arranges, to be corresponded to;
When opening simultaneously the VCSEL sub-light source in the key light source region and the secondary light source region, the minor structure light
VCSEL sub-light source arrangement in pattern and the key light source region and the VCSEL sub-light source arrangement in the secondary light source region are folded
Arrangement after adding is corresponding.
8. projector as claimed in claim 7, which is characterized in that the VCSEL sub-light source in the secondary light source region is distinguished
Independent control opens the part VCSEL sub-light in the secondary light source region in the projector single projection at random
Source.
9. projector as described in claim 1, which is characterized in that further include lens, the lens are located at the VCSEL array
Between light source and the pattern maker, the light beam launched for converging the VCSEL array light source.
10. a kind of depth camera, which is characterized in that including:
Such as the described in any item projectors of claim 1-9, it to be used for the emitting structural light pattern light beam into space;
Mould group is acquired, is radiated on target object for acquiring the structured light patterns light beam and is formed by structured light patterns;
Processor, for receiving the structured light patterns and calculating the depth image of the target object.
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109471323A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | Projection arrangement and its light source and equipment |
CN109471322A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | Projection arrangement and its light source and equipment |
CN109471321A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | A kind of light-source structure, optical projection mould group, sensing device and equipment |
CN109541875A (en) * | 2018-11-24 | 2019-03-29 | 深圳阜时科技有限公司 | A kind of light-source structure, optical projection mould group, sensing device and equipment |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106568396A (en) * | 2016-10-26 | 2017-04-19 | 深圳奥比中光科技有限公司 | Laser projector and depth camera thereof |
CN107026392A (en) * | 2017-05-15 | 2017-08-08 | 深圳奥比中光科技有限公司 | Vcsel array light source |
CN107589623A (en) * | 2017-09-19 | 2018-01-16 | 深圳奥比中光科技有限公司 | Highdensity structured light projection instrument |
CN207133564U (en) * | 2017-07-12 | 2018-03-23 | 深圳奥比中光科技有限公司 | Multi-density pattern projector |
CN208239783U (en) * | 2018-06-05 | 2018-12-14 | 深圳奥比中光科技有限公司 | VCSEL array light source and its projector, depth camera |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1503275A3 (en) * | 2003-07-30 | 2006-08-09 | Agilent Technologies Inc | Method and device for optical navigation |
TWI624957B (en) * | 2015-08-19 | 2018-05-21 | 乾坤科技股份有限公司 | Optoelectronic module and method for producing same |
CN106468809B (en) * | 2015-08-19 | 2020-01-03 | 乾坤科技股份有限公司 | Optoelectronic module and method for manufacturing the same |
-
2018
- 2018-06-05 CN CN201810569869.6A patent/CN108828887B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106568396A (en) * | 2016-10-26 | 2017-04-19 | 深圳奥比中光科技有限公司 | Laser projector and depth camera thereof |
CN107026392A (en) * | 2017-05-15 | 2017-08-08 | 深圳奥比中光科技有限公司 | Vcsel array light source |
CN207133564U (en) * | 2017-07-12 | 2018-03-23 | 深圳奥比中光科技有限公司 | Multi-density pattern projector |
CN107589623A (en) * | 2017-09-19 | 2018-01-16 | 深圳奥比中光科技有限公司 | Highdensity structured light projection instrument |
CN208239783U (en) * | 2018-06-05 | 2018-12-14 | 深圳奥比中光科技有限公司 | VCSEL array light source and its projector, depth camera |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109471323A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | Projection arrangement and its light source and equipment |
CN109471322A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | Projection arrangement and its light source and equipment |
CN109471321A (en) * | 2018-11-24 | 2019-03-15 | 深圳阜时科技有限公司 | A kind of light-source structure, optical projection mould group, sensing device and equipment |
CN109541875A (en) * | 2018-11-24 | 2019-03-29 | 深圳阜时科技有限公司 | A kind of light-source structure, optical projection mould group, sensing device and equipment |
CN109541875B (en) * | 2018-11-24 | 2024-02-13 | 深圳阜时科技有限公司 | Light source structure, optical projection module, sensing device and equipment |
CN109597211A (en) * | 2018-12-25 | 2019-04-09 | 深圳奥比中光科技有限公司 | A kind of projective module group, depth camera and depth image acquisition method |
CN111290667A (en) * | 2020-01-21 | 2020-06-16 | 维沃移动通信有限公司 | Electronic device, control method thereof, and computer-readable storage medium |
CN111290667B (en) * | 2020-01-21 | 2024-04-26 | 维沃移动通信有限公司 | Electronic device, control method thereof, and computer-readable storage medium |
CN112822468A (en) * | 2020-12-31 | 2021-05-18 | 成都极米科技股份有限公司 | Projection control method and device, projection equipment and laser controller |
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