CN108817405B - W target repairing method - Google Patents
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- CN108817405B CN108817405B CN201810761747.7A CN201810761747A CN108817405B CN 108817405 B CN108817405 B CN 108817405B CN 201810761747 A CN201810761747 A CN 201810761747A CN 108817405 B CN108817405 B CN 108817405B
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000000843 powder Substances 0.000 claims abstract description 52
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 49
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 41
- 239000010439 graphite Substances 0.000 claims abstract description 41
- 239000013077 target material Substances 0.000 claims abstract description 35
- 238000005245 sintering Methods 0.000 claims abstract description 29
- 230000007547 defect Effects 0.000 claims abstract description 17
- 230000008569 process Effects 0.000 claims abstract description 10
- 230000008439 repair process Effects 0.000 claims abstract description 8
- 238000010438 heat treatment Methods 0.000 claims description 16
- 238000002490 spark plasma sintering Methods 0.000 claims description 11
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 7
- 239000012535 impurity Substances 0.000 claims description 7
- 238000005498 polishing Methods 0.000 claims description 7
- 238000004321 preservation Methods 0.000 claims description 7
- 238000005303 weighing Methods 0.000 claims description 7
- 238000003825 pressing Methods 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 239000002245 particle Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000013001 point bending Methods 0.000 description 6
- 230000009471 action Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004663 powder metallurgy Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000001208 nuclear magnetic resonance pulse sequence Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
- B22F7/062—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
- B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
- B22F2003/1051—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding by electric discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
- B22F7/062—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts
- B22F2007/068—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts repairing articles
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- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
Abstract
The invention discloses a W target repairing method, which comprises the steps of putting a W target to be repaired into a graphite die, adding W powder required for repairing, enabling the W powder to be located on the surface to be repaired of the W target, prepressing, putting into a discharge plasma sintering system for sintering connection, enabling the W powder to be filled in an uneven defect area of the surface to be repaired of the W target, and completing W target repairing. The method adopts SPS technology, can completely repair the defects on the surface of the W target material by selecting proper sintering parameters, has fine tissues and high density after repair, effectively solves the problem that the existing W target material cannot be repaired and reused after the defects are generated on the surface, has simple process, short period and high production efficiency, and can greatly reduce the use cost of the W target material.
Description
Technical Field
The invention belongs to the field of powder metallurgy, and particularly relates to a tungsten target repairing method.
Background
The W target is taken as a representative of refractory metal targets and is widely applied to the electronic and information industries, such as integrated circuits, information storage, liquid crystal display screens, laser memories, electronic control devices and the like; can also be applied to the field of glass coating; can also be applied to the industries of wear-resistant materials, high-temperature corrosion resistance, high-grade decorative products and the like. The working principle is that an orthogonal magnetic field and an electric field are added between a sputtered target pole (cathode) and an anode, required inert gas (usually Ar gas) is filled in a high vacuum chamber, the Ar gas is ionized into positive ions and electrons under the action of the electric field, certain negative high voltage is added on the target, the ionization probability of the electrons emitted from the target pole under the action of the magnetic field and the working gas is increased, high-density plasma is formed near the cathode, the Ar ions accelerate to fly to the target surface under the action of Lorentz force, the target surface is bombarded at high speed, and atoms sputtered from the target are separated from the target surface by high kinetic energy to fly to a substrate to deposit and form a film according to the momentum conversion principle. Under the long-time work consumption, the defect of unevenness is easy to appear on the surface of the target, and the performance of the W target and the service life of a product are influenced. Because the melting point of W is higher, the W target material on the market is generally prepared by a powder metallurgy method, but the reuse rate is lower, and an effective method for effectively repairing the damaged W target is not available at home and abroad, so that the damaged W target material cannot be repaired and reused after defects are generated on the surface of the W target material, serious resource waste is caused, and heavy metal pollution is easily caused.
Disclosure of Invention
Aiming at the defects in the prior art, the invention provides a W target repairing method, aiming at realizing W target repairing by a Spark Plasma Sintering (SPS) method.
The invention solves the technical problem and adopts the following technical scheme:
the invention provides a W target repairing method, which is characterized by comprising the following steps: and putting the W target to be repaired into a graphite mold, adding W powder required for repairing to enable the W powder to be positioned on the surface to be repaired of the W target, prepressing, putting the W target into a discharge plasma sintering system for sintering connection, and filling the W powder in the uneven defect area of the surface to be repaired of the W target to finish the repairing of the W target. The method specifically comprises the following steps:
step 1, cleaning the surface to be repaired of the W target material to be repaired to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target material by using an Archimedes drainage method;
weighing W powder with the corresponding volume, the oxygen content of which is lower than 500ppm, the purity of which is 99.7 percent and the particle size of which is 2.8-3.2 mu m for later use;
step 2, selecting a graphite die with a corresponding size according to the size of the W target to be repaired, putting the cleaned W target into the graphite die, and then putting W powder into the graphite die, wherein the W powder is positioned on the surface to be repaired of the W target; pre-pressing the graphite die filled with the W target and the W powder by using a manual hydraulic press, wherein the pressure is 8-12 MPa;
step 3, wrapping a carbon felt with the thickness of 4-6 mm, the height of which is equal to that of the graphite mold, on the periphery of the graphite mold after pre-pressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: 10 to 40MPa of the total pressure of the slurry,
the heating rate is as follows: 10 to 60 ℃/min,
sintering temperature: 1800-2000 ℃,
and (3) heat preservation time: 5-10 min;
and (4) after furnace cooling, repairing the W target material to obtain the repaired W target material with high density and excellent mechanical property.
Furthermore, the diameter of the repaired W target is larger than 20mm, and the length-diameter ratio is 0.05-1.0.
Further, the temperature rise rate is 30-60 ℃/min between room temperature and 1300 ℃, and 10-30 ℃/min above 1300 ℃.
Further, the axial mechanical pressure adopts a gradient pressurization mode: when the temperature is less than 1500 ℃, the axial pressure is 10 MPa; when the temperature is more than or equal to 1500 ℃, the axial pressure is 30-40 MPa.
The invention has the beneficial effects that:
1. the method adopts SPS technology, can completely repair the defects on the surface of the W target by selecting proper sintering parameters, has fine tissues and high density after repair, is consistent with the original target, effectively solves the problem that the existing W target cannot be repaired and reused after the defects are generated on the surface, has simple process, short period and high production efficiency, and can greatly reduce the use cost of the W target.
2. According to the invention, the graphite die and the pressure head with proper sizes can be selected according to the size of the W target to be repaired, so that various W targets can be repaired.
3. The invention optimizes the repair process of the W target, adopts different process conditions for the W target cylindrical ingots with different diameters and length-diameter ratios, and can further improve the performance of the W target cylindrical ingots.
4. The W target material repaired by the method has good hardness, almost the same tensile strength and three-point bending property as the original target material, and wide application prospect.
Drawings
FIG. 1 is a schematic representation of an experimental operating simulation of the present invention;
FIG. 2 is a photograph of the microstructure of the W target joint after repair in example 1 of the present invention.
Detailed Description
The present invention will be described in detail with reference to the following examples, which are carried out on the premise of the technical solution of the present invention, and give detailed embodiments and specific procedures, but the scope of the present invention is not limited to the following examples.
In the following examples, metal W powder with oxygen content less than 500ppm, purity of 99.7% and particle size of 2.8-3.2 μm is selected.
The spark plasma sintering furnace used in the following examples was a LABOX-6020 series spark plasma sintering system manufactured by Sinter Land Inc., Japan, and the current type thereof was a DC pulse current having a pulse sequence of 40: 7.
Example 1
In this embodiment, a cylindrical ingot of W target with a diameter of 30mm × 30mm is repaired, which includes the following steps:
step 1, selecting a lathe to clean the surface to be repaired of the W target to be repaired so as to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target by using an Archimedes drainage method;
weighing W powder with corresponding volume for later use;
step 2, putting the cleaned W target material into a graphite die, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; prepressing the graphite die filled with the W target and the W powder by adopting a manual hydraulic press, wherein the pressure is-10 MPa;
step 3, wrapping a carbon felt with the same height as the graphite mold and the thickness of 5mm on the periphery of the graphite mold after prepressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: adopts a gradient pressurization mode (room temperature to 1500 ℃, pressure of 10MPa, 1500-1800 ℃, pressure of 40MPa)
The heating rate is as follows: the temperature is between room temperature and 1300 ℃, and the heating rate is 50 ℃/min; 1300-1800 ℃, and the heating rate is 30 ℃/min;
sintering temperature: at a temperature of 1800 c,
and (3) heat preservation time: 10 min;
after furnace cooling, rough machining is carried out to remove carbon paper on the surface of the sample, namely the repair of the W target is completed, and a high-density repaired W target cylindrical ingot with the diameter of phi 30mm multiplied by 30mm is obtained, the density is 93.67%, the tensile strength is 45.471MPa, and the three-point bending strength is 361.821 MPa.
Example 2
In this embodiment, a cylindrical ingot of W target with a diameter of 30mm × 30mm is repaired, which includes the following steps:
step 1, selecting a lathe to clean the surface to be repaired of the W target to be repaired so as to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target by using an Archimedes drainage method;
weighing W powder with corresponding volume for later use;
step 2, putting the cleaned W target material into a graphite die, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; prepressing the graphite die filled with the W target and the W powder by adopting a manual hydraulic press, wherein the pressure is-10 MPa;
step 3, wrapping a carbon felt with the same height as the graphite mold and the thickness of 5mm on the periphery of the graphite mold after prepressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: adopts a gradient pressurization mode (room temperature to 1500 ℃, pressure of 10MPa, 1500-;
the heating rate is as follows: the temperature is between room temperature and 1300 ℃, and the heating rate is 50 ℃/min; 1300-1900 ℃, and the heating rate is 30 ℃/min;
sintering temperature: 1900 deg.C;
and (3) heat preservation time: 5 min;
and (3) after furnace cooling, repairing the W target to obtain a high-density repaired W target cylindrical ingot with the density of 94.70%, the tensile strength of 85.331MPa and the three-point bending strength of 332.130MPa, wherein the repaired W target is phi 30mm multiplied by 30 mm.
Example 3
In this embodiment, a cylindrical ingot of W target with a diameter of 30mm × 30mm is repaired, which includes the following steps:
step 1, selecting a lathe to clean the surface to be repaired of the W target to be repaired so as to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target by using an Archimedes drainage method;
weighing W powder with corresponding volume for later use;
step 2, putting the cleaned W target material into a graphite die, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; prepressing the graphite die filled with the W target and the W powder by adopting a manual hydraulic press, wherein the pressure is-10 MPa;
step 3, wrapping a carbon felt with the same height as the graphite mold and the thickness of 5mm on the periphery of the graphite mold after prepressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: adopts a gradient pressurization mode (room temperature to 1500 ℃, pressure of 10MPa, 1500-;
the heating rate is as follows: the temperature is between room temperature and 1300 ℃, and the heating rate is 50 ℃/min; 1300-2000 ℃, and the heating rate is 30 ℃/min;
sintering temperature: 2000 deg.C;
and (3) heat preservation time: 5 min;
and (3) after furnace cooling, repairing the W target to obtain a high-density repaired W target cylindrical ingot with the density of 95.06% and the tensile strength of 100.11MPa, wherein the diameter of phi 30mm is multiplied by 30 mm. The three-point bending strength is 384.505 MPa.
Example 4
In this embodiment, a cylindrical ingot of a W target with a diameter of 55mm × 20mm is repaired, which includes the following steps:
step 1, selecting a lathe to clean the surface to be repaired of the W target to be repaired so as to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target by using an Archimedes drainage method;
weighing W powder with corresponding volume for later use;
step 2, putting the cleaned W target material into a graphite die, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; prepressing the graphite die filled with the W target and the W powder by adopting a manual hydraulic press, wherein the pressure is-10 MPa;
step 3, wrapping a carbon felt with the same height as the graphite mold and the thickness of 5mm on the periphery of the graphite mold after prepressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: adopts a gradient pressurization mode (room temperature to 1500 ℃, pressure of 10MPa, 1500-;
the heating rate is as follows: the temperature is between room temperature and 1300 ℃, and the heating rate is 40 ℃/min; the temperature rise rate is 25 ℃/min at 1300-1800 ℃;
sintering temperature: 1800 ℃;
and (3) heat preservation time: 10 min;
and (3) after furnace cooling, repairing the W target to obtain a high-density repaired W target cylindrical ingot with the density of 92.70%, the tensile strength of 50.63MPa and the three-point bending strength of 354.391MPa, wherein the repaired W target is phi 55mm multiplied by 20 mm.
Example 5
In this embodiment, a cylindrical ingot of W target with a diameter of phi 40mm × 20mm is repaired, which includes the following steps:
step 1, selecting a lathe to clean the surface to be repaired of the W target to be repaired so as to remove impurities and an oxide layer, polishing the surface to be repaired with 1500-mesh abrasive paper, and calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target by using an Archimedes drainage method;
weighing W powder with corresponding volume for later use;
step 2, putting the cleaned W target material into a graphite die, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; prepressing the graphite die filled with the W target and the W powder by adopting a manual hydraulic press, wherein the pressure is-10 MPa;
step 3, wrapping a carbon felt with the same height as the graphite mold and the thickness of 5mm on the periphery of the graphite mold after prepressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
axial mechanical pressure: adopts a gradient pressurization mode (room temperature to 1500 ℃, pressure of 10MPa, 1500-;
the heating rate is as follows: the temperature is between room temperature and 1300 ℃, and the heating rate is 40 ℃/min; 1300-1850 ℃, the heating rate is 30 ℃/min;
sintering temperature: 1850 deg.C;
and (3) heat preservation time: 10 min;
and (3) after furnace cooling, repairing the W target to obtain a high-density repaired W target cylindrical ingot with the density of 93.10%, the tensile strength of 60.75MPa and the three-point bending strength of 362.408MPa, wherein the repaired W target is phi 40mm multiplied by 20 mm.
The present invention is not limited to the above exemplary embodiments, and any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (1)
1. A method for repairing a W target is characterized by comprising the following steps: putting the W target to be repaired into a graphite mold, adding W powder required for repairing to enable the W powder to be positioned on the surface to be repaired of the W target, prepressing, putting the W target into a discharge plasma sintering system for sintering connection, and enabling the W powder to be filled in the uneven defect area of the surface to be repaired of the W target, namely completing the repairing of the W target; the diameter of the repaired W target is more than 20mm, and the length-diameter ratio is 0.05-1.0;
the method specifically comprises the following steps:
step 1, cleaning the surface to be repaired of the W target material to be repaired to remove impurities and an oxidation layer, and then calculating the volume of W powder required for filling the uneven defect area of the surface to be repaired of the W target material by using an Archimedes drainage method;
weighing W powder with the corresponding volume, the oxygen content of which is lower than 500ppm, the purity of which is 99.7 percent and the particle size of which is 2.8-3.2 mu m for later use;
step 2, putting the cleaned W target material into a graphite mould with a corresponding size, adding W powder, and enabling the W powder to be located on the surface to be repaired of the W target material; pre-pressing the graphite die filled with the W target and the W powder by using a manual hydraulic press, wherein the pressure is 8-12 MPa;
step 3, wrapping a carbon felt with the thickness of 4-6 mm, the height of which is equal to that of the graphite mold, on the periphery of the graphite mold after pre-pressing, placing the graphite mold in a furnace chamber of a spark plasma sintering system, vacuumizing to below 5Pa, and sintering and connecting the W powder and the W target material, wherein the sintering process comprises the following steps:
the axial mechanical pressure adopts a gradient pressurization mode: when the temperature is less than 1500 ℃, the axial pressure is 10 MPa; when the temperature is more than or equal to 1500 ℃, the axial pressure is 30-40 MPa;
the heating rate is as follows: the temperature is 30-60 ℃/min between room temperature and 1300 ℃, and the temperature is 10-30 ℃/min above 1300 ℃;
sintering temperature: 1800-2000 ℃,
and (3) heat preservation time: 5-10 min;
and (5) cooling along with the furnace, and polishing smoothly to finish the repair of the W target material to obtain the repaired W target material.
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| CN201810761747.7A CN108817405B (en) | 2018-07-12 | 2018-07-12 | W target repairing method |
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| CN112958772A (en) * | 2021-02-02 | 2021-06-15 | 合肥工业大学 | Method for repairing waste WRe/TZM composite rotary anode target disc |
| CN113953516B (en) * | 2021-09-15 | 2023-04-18 | 北京科技大学 | Powder filling sintering repair method for surface defects of titanium or titanium alloy parts |
| CN114214587B (en) * | 2021-12-16 | 2024-02-06 | 国铭铸管股份有限公司 | Method for reducing surface defects of spheroidal graphite cast tube |
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