CN108796442A - Film plating process, metal shell and terminal device - Google Patents
Film plating process, metal shell and terminal device Download PDFInfo
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- CN108796442A CN108796442A CN201810622556.2A CN201810622556A CN108796442A CN 108796442 A CN108796442 A CN 108796442A CN 201810622556 A CN201810622556 A CN 201810622556A CN 108796442 A CN108796442 A CN 108796442A
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- metal shell
- default
- decoration coating
- substance
- shell surface
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
- C23C14/0611—Diamond
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
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- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Adornments (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The disclosure is directed to a kind of film plating process, metal shell and terminal devices.This method includes：Decoration coating is deposited in the metal shell surface of terminal device, the material of the decoration coating includes：Default target and/or object gas；During depositing the decoration coating, by the default electrodeposition substance in the metal shell surface, the transmitance of the default substance is more than or equal to default transmitance.The disclosure improves the transmitance of decoration coating.
Description
Technical field
This disclosure relates to a kind of metal working technical area more particularly to film plating process, metal shell and terminal device.
Background technology
With the raising of metalworking technology and the reduction of material cost, more and more terminals are using metal as shell
Material.
In the related technology, it usually needs decoration coating is deposited on metal shell.For example, physical vapour deposition (PVD) may be used
The decoration coating of (Physical Vapor Deposition, PVD) method deposited metal shell.Also, in order to solve decoration coating
Visually unintelligible, impermeable problem.In general, being obtained by the way of covering optical interference coating on decoration coating clear logical
Saturating decoration coating.
Invention content
To overcome the problems in correlation technique, a kind of film plating process of disclosure offer, metal shell and terminal device.
According to the first aspect of the embodiments of the present disclosure, a kind of film plating process is provided, including：
Decoration coating is deposited in the metal shell surface of terminal device；
Wherein, the material of the decoration coating includes：Default target and/or object gas；
During depositing the decoration coating, by default electrodeposition substance in the metal shell surface；
Wherein, the transmitance of the default substance is more than or equal to default transmitance.
Optionally, decoration coating should be deposited in the metal shell surface of terminal device, including：
Start the metal shell surface deposition decoration coating in terminal device at the first moment, terminates to deposit at the second moment
The decoration coating；
It is somebody's turn to do during depositing the decoration coating, by default electrodeposition substance in the metal shell surface, including：
Start default electrodeposition substance in the metal shell surface at first moment, it is pre- to terminate deposition at second moment
If substance；
Wherein, first moment is earlier than second moment.
Optionally, which is diamond-like DLC.
Optionally, when carbon atom forms covalent bond with other atoms in the DLC, hydridization type SP3Volume content be more than
Or it is equal to first threshold, and it is less than or equal to second threshold.
Optionally, which is 20%, which is 80%.
Optionally, should further include before the metal shell surface deposition decoration coating of terminal device：
Transition metal layer is deposited in the metal shell surface.
According to the second aspect of the embodiment of the present disclosure, a kind of metal shell is provided.
Wherein, metal shell surface deposition has decoration coating, and the material of the decoration coating includes：Default target and/or
Object gas；
Deposition has default substance in the decoration coating, and the transmitance of the default substance is more than or equal to default transmitance.
Optionally, which is evenly distributed in the decoration coating.
Optionally, which is diamond-like DLC.
Optionally, when carbon atom forms covalent bond with other atoms in the DLC, hydridization type SP3Volume content be more than
Or it is equal to first threshold, and it is less than or equal to second threshold.
Optionally, which is 20%, which is 80%.
Optionally, deposition has transition metal layer between the metal shell surface and the decoration coating.
According to the third aspect of the embodiment of the present disclosure, a kind of terminal device is provided, including：Metal shell.
Wherein, metal shell surface deposition has decoration coating, and the material of the decoration coating includes：Default target and/or
Object gas；
Deposition has default substance in the decoration coating, and the transmitance of the default substance is more than or equal to default transmitance.
Optionally, which is evenly distributed in the decoration coating.
Optionally, which is diamond-like DLC.
Optionally, when carbon atom forms covalent bond with other atoms in the DLC, hydridization type SP3Volume content be more than
Or it is equal to first threshold, and it is less than or equal to second threshold.
Optionally, which is 20%, which is 80%.
Optionally, deposition has transition metal layer between the metal shell surface and the decoration coating.
Film plating process, metal shell and the terminal device that the disclosure provides, pass through the metal shell surface in terminal device
Decoration coating is deposited, and during depositing the decoration coating, the rate that will transmit through is more than or equal to the default of default transmitance
Electrodeposition substance improves the transmitance of decoration coating in the metal shell surface, so that decoration coating is clear, penetrating, together
When avoid and cover the mode of optical interference coating on decoration coating and obtain cambered surface caused by clear penetrating decoration coating and deposit
In the problem of rainbow line etc..
It should be understood that above general description and following detailed description is only exemplary and explanatory, not
The disclosure can be limited.
Description of the drawings
The drawings herein are incorporated into the specification and forms part of this specification, and shows the implementation for meeting the disclosure
Example, and together with specification for explaining the principles of this disclosure.
Fig. 1 is a kind of block diagram of film plating process shown according to an exemplary embodiment；
Fig. 2 is a kind of block diagram of metal shell shown according to an exemplary embodiment；
Fig. 3 is a kind of block diagram of the film plating process shown according to another exemplary embodiment；
Fig. 4 is a kind of block diagram of the metal shell shown according to another exemplary embodiment；
Fig. 5 is a kind of block diagram of the terminal device 800 shown according to a further exemplary embodiment.
Specific implementation mode
Example embodiments are described in detail here, and the example is illustrated in the accompanying drawings.Following description is related to
When attached drawing, unless otherwise indicated, the same numbers in different drawings indicate the same or similar elements.Following exemplary embodiment
Described in embodiment do not represent all implementations consistent with this disclosure.On the contrary, they be only with it is such as appended
The example of the consistent device and method of some aspects be described in detail in claims, the disclosure.
Fig. 1 is a kind of block diagram of film plating process shown according to an exemplary embodiment.Plated film side provided in this embodiment
The executive agent of method can be filming equipment.As shown in Figure 1, the method for the present embodiment may comprise steps of：
In a step 101, decoration coating, the material packet of the decoration coating are deposited in the metal shell surface of terminal device
It includes：Default target and/or object gas.
In this step, which for example can be Stainless Steel shell.Optionally, physical vapour deposition (PVD) may be used
(Physical Vapor Deposition, PVD) method, chemical vapor deposition (Chemical Vapor Deposition, CVD)
Method etc. deposits decoration coating in metal shell surface.
By based on PVD method metal shell surface deposition decoration coating for, can the difference based on surface color and
Different targets and/or gas is selected to manufacture decoration coating.For example, titanium target and CH can be used4、C2H2、O2、N2Deng acquisition eka-gold
Titanium compound (the TiO of color, black, grey, imitation copper etc.xCy、TiOxNy、TiNxDeng)；Alternatively, stainless steel target (SUS) can be used
And CH4、C2H2、O2、N2Deng the stainless steel compound (SUSO for obtaining black, green, blue, purple etc.xCy、SUSOxNy、SUSNx
Deng)；Alternatively, chromium target (Cr) and CH can be used4、C2H2、O2、N2Deng the chromium compound for obtaining black, green, blue, purple etc.
(CrOxCy、CrOxNy、CrNxDeng).
It should be noted that the concrete mode about deposition decoration coating, the disclosure are not restricted.
In a step 102, during depositing the decoration coating, by default electrodeposition substance in the metal shell surface.
In this step, which can be the substance of high transmittance, be specifically as follows transmitance and be more than or equal to
The substance of default transmitance.Specifically, whithin a period of time, the decoration coating and the default substance can be deposited simultaneously.It is optional
, the duration of this time is specifically as follows the total duration of deposition decoration coating, or might be less that the total duration.
Optionally, start and deposit decoration coating in metal shell surface and deposit the tool of default substance in metal shell surface
Body mode can be it is following in any one：Deposition decoration coating can be started simultaneously and deposition presets substance；Alternatively, also may be used
First to start deposition decoration coating, restarts deposition and preset substance；Alternatively, can also first start deposition presets substance, restart
Deposit decoration coating.
Optionally, the concrete mode for terminating to deposit the decoration coating and the default substance can be it is following in it is any one
Kind：It can specifically terminate to deposit decoration coating simultaneously and deposition presets substance；Alternatively, can also end first deposit decoration coating,
Terminate to deposit default substance again；Alternatively, can also end first deposition preset substance, then terminate deposit decoration coating.
It should be noted that above-mentioned startup deposits decoration coating in metal shell surface and is deposited in metal shell surface pre-
If the concrete mode of substance, the concrete mode of the decoration coating and the default substance is deposited with above-mentioned end, it can be with any combination.
For example, deposition decoration coating can be started simultaneously and deposition presets substance, after one section of duration, while terminate to deposit decoration coating and
Deposition presets substance.In another example deposition decoration coating and the default substance of deposition can be started simultaneously, and after one section of duration, end first
Decoration coating is deposited, then terminates to deposit default substance.In another example can first start deposition presets substance, restart deposition decoration
Film layer after one section of duration, while terminating to deposit decoration coating and deposition presets substance.It is right to be deposited in advance for example, first start
If substance, restart deposition decoration coating, after one section of duration, can be deposited with end first and preset substance, then terminate deposition decoration
Film layer.
In the present embodiment, during metal shell surface 20 deposits decoration coating 21, in the metal shell surface 20
After deposition presets substance 22, the deposition effect of metal shell surface 20 for example can be as shown in Figure 2.It should be noted that Fig. 2
Middle metal shell surface is plane, and the section of default substance is only for example for circle.
The film plating process of the present embodiment deposits decoration coating by the metal shell surface in terminal device, and is depositing
During the decoration coating, the rate that will transmit through is more than or equal to the default electrodeposition substance of default transmitance in the metal shell table
Face realizes the default object that deposition in the decoration coating of metal shell surface has transmitance to be more than or equal to default transmitance
Matter improves the transmitance of decoration coating, so that decoration coating is clear, penetrating, while avoiding in decoration coating overlying
The mode of lid optical interference coating obtains cambered surface caused by clear penetrating decoration coating and there is a problem of rainbow line etc..
Fig. 3 is a kind of block diagram of the film plating process shown according to another exemplary embodiment.Plated film provided in this embodiment
On the basis of method embodiment of the method shown in Fig. 1, a kind of concrete implementation mode is essentially described.As shown in figure 3, this implementation
The method of example may include steps of：
In step 301, transition metal layer is deposited in the metal shell surface of terminal device.
In this step, transition metal layer metal such as can be stainless steel (SUS) or chromium (Cr) or chromium titanium (CrTi)
Or alloy layer.Wherein, the thickness of the transition metal layer can be between 10nm-50nm.In this step, by metal shell
Surface deposits transition metal layer, can decoration coating preferably be adhered to.
In step 302, decoration coating is deposited in the transition metal layer surface, and in the process for depositing the decoration coating
In, by default electrodeposition substance in the metal transfer layer surface.
In this step, which can be the substance of high transmittance, be specifically as follows transmitance and be more than or equal to
The substance of default transmitance.The default substance is, for example, diamond-like (Physical Vapor Deposition, DLC), graphite
Alkene etc..When forming covalent bond due to carbon atom in the diamond-like and other atoms, hydridization type SP3Volume content it is bigger,
The transmitance of diamond-like is better, SP in the transmitance and diamond-like of decoration coating3Volume content it is closely bound up.Therefore,
In order to enable decoration coating can have better visual effect, it is further alternative, in the diamond-like carbon atom and other
When atom forms covalent bond, hydridization type SP3Volume content be more than or equal to first threshold, and less than or equal to the
Two threshold values.Optionally, which can be 20%, which is can be with 80%.
Optionally, step 302 is specifically as follows starts the decoration coating and deposition of deposited metal shell at the first moment
Default substance terminated to deposit the decoration coating and the default substance at the second moment.Here, by starting deposition decorating film simultaneously
The same of decoration coating and default substance may be implemented in layer and default substance, and terminate to deposit decoration coating and default substance simultaneously
When synchronize deposition, so as to as far as possible so that decoration coating in can uniformly be embedded in preset substance so that entire decorating film
The transmitance of layer is consistent.
In the present embodiment, transition metal layer 23 is deposited in metal shell surface 20, deposits and fills on 23 surface of transition metal layer
Film layer 21 is adornd, and during depositing decoration coating 21, after 23 surface of transition metal layer deposits and presets substance 22, gold
The deposition effect for belonging to case surface 20 for example can be as shown in Figure 4.It should be noted that metal shell surface is plane in Fig. 4,
The section of default substance is only for example for circle.
Optionally, can also include following step before step 301 in order to improve the roughness for reducing metal shell surface
Rapid 303.
Step 303, which is polished to half mirror or minute surface.
It is less than or equal to for example, no wax wet throwing method may be used, the surface of the phone housing is polished to roughness
0.4um。
Film plating process provided in this embodiment deposits transition metal layer by the metal shell surface in terminal device,
The transition metal layer surface deposits decoration coating, and during depositing the decoration coating, by default electrodeposition substance in the gold
Belong to transition layer surface so that decoration coating can preferably be attached to metal shell surface.
In addition, by and deposit the decoration coating during, the metal shell surface deposition transmitance be more than or
Person is equal to the diamond-like of default transmitance, realize deposition in the decoration coating of metal shell surface have transmitance be more than or
Equal to the diamond-like of default transmitance, the transmitance of decoration coating is improved.
In addition, when forming covalent bond by diamond-like carbon atom and other atoms, hydridization type SP3Volume content it is big
In or be equal to first threshold, and be less than or equal to second threshold so that decoration coating can have better vision effect
Fruit.
The embodiment of the present disclosure also provides a kind of block diagram of metal shell, which implements specifically by the above method
The metal shell that film plating process described in example obtains.As shown in Fig. 2, the metal shell surface 20 deposition has decoration coating 21, it should
The material of decoration coating includes：Default target and/or object gas；Deposition has default substance 22 in the decoration coating 21, this is pre-
If the transmitance of substance is more than or equal to default transmitance.
In conclusion metal shell provided in this embodiment, is deposited by metal shell surface by decoration coating, and should
Deposition has transmitance to be more than or equal to the default substance of default transmitance in decoration coating, improves the transmission of decoration coating
Rate, so that decoration coating is clear, penetrating, while the mode for avoiding the covering optical interference coating on decoration coating obtains clearly
Caused by clear penetrating decoration coating there is rainbow line etc. in cambered surface.
Optionally, which is evenly distributed in the decoration coating.
In conclusion being evenly distributed in decoration coating by default substance, it can make the transmission of entire decoration coating
Rate is consistent.
Optionally, which is diamond-like DLC.
In conclusion deposited by decoration coating by metal shell surface, and deposition has transmitance in the decoration coating
More than or equal to the diamond-like of default transmitance, the transmitance of decoration coating is improved.
Optionally, when carbon atom forms covalent bond with other atoms in the DLC, the volume content of hydridization type SP3 is more than
Or it is equal to first threshold, and it is less than or equal to second threshold.
In conclusion due to when carbon atom forms covalent bond with other atoms in the diamond-like, the body of hydridization type SP3
Product content is bigger, and the transmitance of diamond-like is better, the volume content breath breath of SP3 in the transmitance and diamond-like of decoration coating
Correlation, when forming covalent bond by diamond-like carbon atom and other atoms, hydridization type SP3Volume content be more than or wait
In first threshold, and it is less than or equal to second threshold so that decoration coating there can be better visual effect.
Optionally, which is 20%, which is 80%.
As shown in figure 4, on the basis of metal shell shown in Fig. 2, further, the metal shell surface 20 and the dress
Deposition has transition metal layer 23 between decorations film layer 21.
In conclusion metal shell provided in this embodiment, by sinking between the metal shell surface and the decoration coating
Product has transition metal layer so that decoration coating can preferably be attached to metal shell surface.
Fig. 5 is a kind of block diagram of the terminal device 800 shown according to a further exemplary embodiment.For example, terminal device 800
Can be mobile phone, computer, digital broadcast terminal equipment, messaging devices, game console, tablet device, medical treatment
Equipment, body-building equipment, personal digital assistant etc..
With reference to Fig. 5, terminal device 800 may include following one or more components：Processing component 802, memory 804,
Electric power assembly 806, multimedia component 808, audio component 810, the interface 812 of input/output (I/O), sensor module 814,
And communication component 816.
The integrated operation of 802 usual control terminal equipment 800 of processing component, such as with display, call, data are logical
Letter, camera operation and record operate associated operation.Processing component 802 may include one or more processors 820 to hold
Row instruction, to perform all or part of the steps of the methods described above.In addition, processing component 802 may include one or more moulds
Block, convenient for the interaction between processing component 802 and other assemblies.For example, processing component 802 may include multi-media module, with
Facilitate the interaction between multimedia component 808 and processing component 802.
Memory 804 is configured as storing various types of data to support to set 800 operation in terminal.These data
Example includes the instruction for any application program or method that are operated on terminal device 800, contact data, telephone directory number
According to, message, picture, video etc..Memory 804 can by any kind of volatibility or non-volatile memory device or they
Combination realize, such as static RAM (SRAM), electrically erasable programmable read-only memory (EEPROM) is erasable
Programmable read only memory (EPROM), programmable read only memory (PROM), read-only memory (ROM), magnetic memory, quick flashing
Memory, disk or CD.
Electric power assembly 806 provides electric power for the various assemblies of terminal device 800.Electric power assembly 806 may include power supply pipe
Reason system, one or more power supplys and other generated with for terminal device 800, management and the associated component of distribution electric power.
Multimedia component 808 is included in the screen of one output interface of offer between the terminal device 800 and user.?
In some embodiments, screen may include liquid crystal display (LCD) and touch panel (TP).If screen includes touch panel,
Screen may be implemented as touch screen, to receive input signal from the user.Touch panel includes that one or more touch passes
Sensor is to sense the gesture on touch, slide, and touch panel.The touch sensor can not only sense touch or sliding action
Boundary, but also detect with the touch or the relevant duration and pressure of slide.In some embodiments, multimedia
Component 808 includes a front camera and/or rear camera.When terminal device 800 is in operation mode, such as screening-mode
Or when video mode, front camera and/or rear camera can receive external multi-medium data.Each front camera
With rear camera can be a fixed optical lens system or have focusing and optical zoom capabilities.
Audio component 810 is configured as output and/or input audio signal.For example, audio component 810 includes a Mike
Wind (MIC), when terminal device 800 is in operation mode, when such as call model, logging mode and speech recognition mode, microphone
It is configured as receiving external audio signal.The received audio signal can be further stored in memory 804 or via logical
Believe that component 816 is sent.In some embodiments, audio component 810 further includes a loud speaker, is used for exports audio signal.
I/O interfaces 812 provide interface between processing component 802 and peripheral interface module, and above-mentioned peripheral interface module can
To be keyboard, click wheel, button etc..These buttons may include but be not limited to：Home button, volume button, start button and lock
Determine button.
Sensor module 814 includes one or more sensors, the state for providing various aspects for terminal device 800
Assessment.For example, sensor module 814 can detect the state that opens/closes of terminal device 800, the relative positioning of component, example
Such as component is the display and keypad of terminal device 800, and sensor module 814 can be with detection terminal equipment 800 or end
The position change of 800 1 components of end equipment, the existence or non-existence that user contacts with terminal device 800,800 side of terminal device
The temperature change of position or acceleration/deceleration and terminal device 800.Sensor module 814 may include proximity sensor, be configured to use
To detect the presence of nearby objects without any physical contact.Sensor module 814 can also include optical sensor, such as
CMOS or ccd image sensor, for being used in imaging applications.In some embodiments, which can be with
Including acceleration transducer, gyro sensor, Magnetic Sensor, pressure sensor or temperature sensor.
Communication component 816 is configured to facilitate the communication of wired or wireless way between terminal device 800 and other equipment.
Terminal device 800 can access the wireless network based on communication standard, such as WiFi, 2G or 3G or combination thereof.Show at one
In example property embodiment, communication component 816 receives broadcast singal or broadcast from external broadcasting management system via broadcast channel
Relevant information.In one exemplary embodiment, which further includes near-field communication (NFC) module, to promote short distance
Communication.For example, radio frequency identification (RFID) technology, Infrared Data Association (IrDA) technology, ultra wide band can be based in NFC module
(UWB) technology, bluetooth (BT) technology and other technologies are realized.
In the exemplary embodiment, terminal device 800 can be by one or more application application-specific integrated circuit (ASIC), number
Word signal processor (DSP), digital signal processing appts (DSPD), programmable logic device (PLD), field programmable gate array
(FPGA), controller, microcontroller, microprocessor or other electronic components are realized.
In the exemplary embodiment, it includes the non-transitorycomputer readable storage medium instructed, example to additionally provide a kind of
Such as include the memory 804 of instruction, above-metioned instruction can be executed by the processor 820 of terminal device 800.For example, the non-transitory
Computer readable storage medium can be ROM, random access memory (RAM), CD-ROM, tape, floppy disk and optical data storage
Equipment etc..
Wherein, terminal device may include metal shell.
Metal shell surface deposition has decoration coating, and the material of the decoration coating includes：Default target and/or target
Gas；
Deposition has default substance in the decoration coating, and the transmitance of the default substance is more than or equal to default transmitance.
In conclusion in the decoration coating for passing through the metal shell surface of terminal device deposition have transmitance be more than or
Equal to the default substance of default transmitance, the transmitance of the decoration coating of terminal device metal shell is improved, so that dress
Decorations film layer is clear, penetrating, while the mode for avoiding the covering optical interference coating on decoration coating obtains clear penetrating decoration
There is rainbow line etc. in cambered surface caused by film layer.
Optionally, which is evenly distributed in the decoration coating.
In conclusion being evenly distributed in decoration coating by default substance, it can make the transmission of entire decoration coating
Rate is consistent.
Optionally, which is diamond-like DLC.
In conclusion deposited by decoration coating by metal shell surface, and deposition has transmitance in the decoration coating
More than or equal to the diamond-like of default transmitance, the transmitance of decoration coating is improved.
Optionally, when carbon atom forms covalent bond with other atoms in the DLC, hydridization type SP3Volume content be more than
Or it is equal to first threshold, and it is less than or equal to second threshold.
In conclusion due to when carbon atom forms covalent bond with other atoms in the diamond-like, the body of hydridization type SP3
Product content is bigger, and the transmitance of diamond-like is better, the volume content breath breath of SP3 in the transmitance and diamond-like of decoration coating
Correlation, when forming covalent bond by diamond-like carbon atom and other atoms, hydridization type SP3Volume content be more than or wait
In first threshold, and it is less than or equal to second threshold so that decoration coating there can be better visual effect.
Optionally, which is 20%, which is 80%.
Optionally, deposition has transition metal layer between the metal shell surface and the decoration coating.
In conclusion having transition metal layer by being deposited between the metal shell surface and the decoration coating so that decoration
Film layer can preferably be attached to metal shell surface.
Those skilled in the art after considering the specification and implementing the invention disclosed here, will readily occur to its of the disclosure
Its embodiment.This application is intended to cover any variations, uses, or adaptations of the disclosure, these modifications, purposes or
Person's adaptive change follows the general principles of this disclosure and includes the undocumented common knowledge in the art of the disclosure
Or conventional techniques.The description and examples are only to be considered as illustrative, and the true scope and spirit of the disclosure are wanted by right
Book is asked to point out.
It should be understood that the present disclosure is not limited to the precise structures that have been described above and shown in the drawings, and
And various modifications and changes may be made without departing from the scope thereof.The scope of the present disclosure is only limited by appended claims
System.
Claims (13)
1. a kind of film plating process, which is characterized in that including：
Decoration coating is deposited in the metal shell surface of terminal device, the material of the decoration coating includes：Default target and/or
Object gas；
It is described default by the default electrodeposition substance in the metal shell surface during depositing the decoration coating
The transmitance of substance is more than or equal to default transmitance.
2. according to the method described in claim 1, it is characterized in that, the metal shell surface in terminal device deposits decoration
Film layer, including：Start the metal shell surface deposition decoration coating in terminal device at the first moment, terminates to sink at the second moment
The product decoration coating；
It is described during depositing the decoration coating, by the default electrodeposition substance in the metal shell surface, including：
Start the default electrodeposition substance in the metal shell surface at first moment, terminates to deposit at second moment
Default substance；
Wherein, first moment is earlier than second moment.
3. method according to claim 1 or 2, which is characterized in that the default substance is diamond-like DLC.
4. according to the method described in claim 3, it is characterized in that, carbon atom forms covalent bond with other atoms in the DLC
When, hydridization type SP3Volume content be more than or equal to first threshold, and be less than or equal to second threshold.
5. according to the method described in claim 4, it is characterized in that, the first threshold is 20%, the second threshold is
80%.
6. method according to claim 1 or 2, which is characterized in that the metal shell surface in terminal device deposits
Before decoration coating, further include：
Transition metal layer is deposited in the metal shell surface.
7. a kind of metal shell, which is characterized in that
Metal shell surface deposition has the decoration coating, the material of the decoration coating to include：Default target and/or target gas
Body；
Deposition has default substance, the transmitance of the default substance to be more than or equal to default transmitance in the decoration coating.
8. metal shell according to claim 7, which is characterized in that the default substance is evenly distributed on the decorating film
In layer.
9. metal shell according to claim 7 or 8, which is characterized in that the default substance is diamond-like DLC.
10. metal shell according to claim 9, which is characterized in that carbon atom is formed altogether with other atoms in the DLC
When valence link, hydridization type SP3Volume content be more than or equal to first threshold, and be less than or equal to second threshold.
11. metal shell according to claim 10, which is characterized in that the first threshold is 20%, second threshold
Value is 80%.
12. metal shell according to claim 7 or 8, which is characterized in that the metal shell surface and the decorating film
Deposition has transition metal layer between layer.
13. a kind of terminal device, which is characterized in that including：Claim 7-12 any one of them metal shells.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810622556.2A CN108796442B (en) | 2018-06-15 | 2018-06-15 | Film coating method, metal shell and terminal equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810622556.2A CN108796442B (en) | 2018-06-15 | 2018-06-15 | Film coating method, metal shell and terminal equipment |
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| CN101066844A (en) * | 2007-05-24 | 2007-11-07 | 北京有色金属研究总院 | Antireflective protecting DLC/BP film for infrared optical window and its prepn |
| CN101823353A (en) * | 2010-04-30 | 2010-09-08 | 广州有色金属研究院 | Metal-diamond-like carbon (Me-DLC) nano composite membrane and preparation method thereof |
| CN102021513A (en) * | 2010-12-02 | 2011-04-20 | 中国科学院宁波材料技术与工程研究所 | High-tenacity oxidation-resistant anti-friction coating on substrate surface and preparation method thereof |
| CN103072334A (en) * | 2013-01-18 | 2013-05-01 | 肇庆市双石金属实业有限公司 | Binary-iodide-doped thermochromic decorative layer |
| CN105417964A (en) * | 2015-11-02 | 2016-03-23 | 浙江星星科技股份有限公司 | Cover plate with high wear resistance and high light transmittance |
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| CN101066844A (en) * | 2007-05-24 | 2007-11-07 | 北京有色金属研究总院 | Antireflective protecting DLC/BP film for infrared optical window and its prepn |
| CN101823353A (en) * | 2010-04-30 | 2010-09-08 | 广州有色金属研究院 | Metal-diamond-like carbon (Me-DLC) nano composite membrane and preparation method thereof |
| CN102021513A (en) * | 2010-12-02 | 2011-04-20 | 中国科学院宁波材料技术与工程研究所 | High-tenacity oxidation-resistant anti-friction coating on substrate surface and preparation method thereof |
| CN103072334A (en) * | 2013-01-18 | 2013-05-01 | 肇庆市双石金属实业有限公司 | Binary-iodide-doped thermochromic decorative layer |
| CN105417964A (en) * | 2015-11-02 | 2016-03-23 | 浙江星星科技股份有限公司 | Cover plate with high wear resistance and high light transmittance |
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