CN108745335B - Photoelectric functional material and preparation method thereof - Google Patents
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- 239000000463 material Substances 0.000 title claims abstract description 37
- 238000002360 preparation method Methods 0.000 title claims abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 64
- 229960000892 attapulgite Drugs 0.000 claims abstract description 53
- 229910052625 palygorskite Inorganic materials 0.000 claims abstract description 53
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 32
- 239000003054 catalyst Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 7
- 239000011259 mixed solution Substances 0.000 claims description 30
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- 239000008367 deionised water Substances 0.000 claims description 13
- 229910021641 deionized water Inorganic materials 0.000 claims description 13
- 238000003756 stirring Methods 0.000 claims description 13
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 9
- 238000001354 calcination Methods 0.000 claims description 9
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 7
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 5
- 238000001035 drying Methods 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 5
- 230000001376 precipitating effect Effects 0.000 claims description 5
- 238000009210 therapy by ultrasound Methods 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 4
- 229910002370 SrTiO3 Inorganic materials 0.000 claims description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 3
- 238000011068 loading method Methods 0.000 claims description 3
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 230000005693 optoelectronics Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 150000002484 inorganic compounds Chemical class 0.000 abstract 1
- 229910010272 inorganic material Inorganic materials 0.000 abstract 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 16
- 238000005406 washing Methods 0.000 description 6
- 235000019441 ethanol Nutrition 0.000 description 3
- 238000004108 freeze drying Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000001000 micrograph Methods 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 241001391944 Commicarpus scandens Species 0.000 description 2
- 229910002808 Si–O–Si Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000011941 photocatalyst Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- IWBJJCOKGLUQIZ-HQKKAZOISA-N hyperforin Chemical compound OC1=C(CC=C(C)C)C(=O)[C@@]2(CC=C(C)C)C[C@H](CC=C(C)C)[C@](CCC=C(C)C)(C)[C@]1(C(=O)C(C)C)C2=O IWBJJCOKGLUQIZ-HQKKAZOISA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000013335 mesoporous material Substances 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
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- 231100000331 toxic Toxicity 0.000 description 1
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- 229910052723 transition metal Inorganic materials 0.000 description 1
- 229910000314 transition metal oxide Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/74—Iron group metals
- B01J23/745—Iron
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/24—Nitrogen compounds
-
- B01J35/39—
Abstract
The invention relates to the technical field of preparation of inorganic compound semiconductor materials, and discloses a photoelectric functional material and a preparation method thereof, wherein the photoelectric functional material consists of an acidified nano attapulgite-mesoporous silica layer carrier and a catalyst, and the mass ratio of the acidified nano attapulgite to the mesoporous silica layer carrier to the catalyst is 1: 0.001 to 5. The photoelectric functional material prepared by the method has high light utilization rate, has large specific surface area and can provide more surface active sites; the diffusion distance of the charges is short, the charge transmission is facilitated, and the structural performance is stable.
Description
Technical Field
The invention relates to the field of photoelectric materials, in particular to a photoelectric functional material and a preparation method thereof.
Background
Main catalyst (Fe)2O3、C3N4、SrTiO3、TiO2Etc.) the utilization rate of light is an important factor influencing the photocatalytic hydrogen production efficiency. The utilization range of the host catalyst to light is expanded mainly by ion doping or dye sensitization. From another perspective, increasing the efficiency of solar light utilization can also be achieved by increasing the scattering of light inside the catalyst. The hollow porous structure can realize the scattering of light in the catalyst, thereby improving the utilization rate of the light.
At present, most methods for synthesizing hollow materials need to synthesize soft and hard templates in advance, the operation steps are complicated, and toxic organic solvents are generally used. Attapulgite is a natural one-dimensional aluminum-magnesium-rich silicate mineral, and is fibrous crystal with single crystal length of about 1-5 μm and diameter of about 20-70 nm. The large specific surface and adsorbability of attapulgite enable the attapulgite to be applied to the research of photocatalyst carriers. The hollow nano photocatalyst is constructed by taking the natural attapulgite as a template, so that the synthesis steps can be simplified, and the use of a large amount of organic solvents during template synthesis can be reduced. But the research of synthesizing the hollow porous main catalyst by taking the porous carbon nanotube as a template is rarely reported. This is because Si bonds on the surface of attapulgite hardly form strong bonds (Si-O-M) with transition metals; although the surface of the attapulgite has grooves, the size of the grooves is less than 1 nm, so that the semiconductor bulk catalyst (transition metal oxide, sulfide and the like) is difficult to form a tight coating on the surface of the attapulgite, and Si-O-M is easy to break, thereby influencing the catalytic effect.
Disclosure of Invention
The purpose of the invention is as follows: aiming at the problems in the prior art, the invention provides a photoelectric functional material and a preparation method thereof, and the prepared photoelectric functional material has high light utilization rate, large specific surface area and capability of providing more surface active sites; the diffusion distance of the charges is short, the charge transmission is facilitated, and the structural performance is stable.
The technical scheme is as follows: the invention provides a photoelectric functional material, which consists of an acidified nano attapulgite-mesoporous silica layer carrier and a catalyst, wherein the mass ratio of the acidified nano attapulgite to the mesoporous silica layer carrier is 1: 0.001 to 5.
Preferably, the catalyst is Fe2O3,、C3N4、SrTiO3Or TiO2。
The invention also provides a preparation method of the photoelectric functional material, which comprises the following steps: s1: preparing acidified nano attapulgite; s2: dispersing the acidified nano attapulgite into a mixed solution M1 consisting of ammonia water, absolute ethyl alcohol and deionized water; s3: mixing TEOS and C18TMS is mixed to obtain mixed solution M2; s4: dropwise adding the mixed solution M2 into the mixed solution M1, stirring, performing ultrasonic treatment, precipitating, centrifuging, drying and calcining to obtain the acidified nano attapulgite-mesoporous silica layer carrier; s5: loading a catalyst into the acidified nano attapulgite-mesoporous silica layer carrier to obtain a photoelectric functional material; s6: and removing the acidified nano attapulgite-mesoporous silica layer carrier in the photoelectric functional material.
Further, in the S1, the acidified nano attapulgite is prepared by the steps of: s1-1: dispersing the attapulgite with impurities removed in hydrochloric acid with the molar concentration of 1M, stirring for 24h, centrifuging, and cleaning; s1-2: treating with HCl with the molar concentration of 3M for 24h at 60 ℃, centrifuging, and cleaning to obtain the acidified nano attapulgite.
Preferably, in the S2, the mass-to-volume ratio of the acidified nano attapulgite to the ammonia water, the absolute ethyl alcohol and the deionized water is 1g: 2-3.1 g: 75-100 mL: 10-20 mL.
Preferably, in the S3, the TEOS and C18The TMS volume ratio is 1-5: 0 to 3. By adjusting TEOS and C18The mass ratio of TMS can adjust the thickness of the mesoporous silica framework obtained on the surface of the acidified nano attapulgite, thereby realizing the adjustment of the thickness of the one-dimensional hollow porous main catalyst wall.
Preferably, in the S4, the dropping rate of the mixed solution M2 into the mixed solution M1 is 10-20 drops/min; the calcining temperature is 500-600 ℃, and the calcining time is 3-6 h.
Preferably, in S5, the mass ratio of the acidified nano-attapulgite-mesoporous silica layer carrier to the catalyst is 1: 0.01-1.
Preferably, in S6, the acidified nano-attapulgite-mesoporous silica layer support is removed using an alkaline solution or ammonium bifluoride, so as to obtain a hollow porous photoelectric functional material.
The principle and the beneficial effects are as follows: in the invention, mesoporous material TEOS and pore-forming agent C are adopted18Forming Si-O-Si bonds on the surface of the acidified nano attapulgite by the synergistic effect of TMS, finally forming a layer of mesoporous silica framework, then growing the main catalyst in the mesoporous silica framework, wherein the loading effect is good, and finally removing the attapulgite and the mesoporous silica framework to obtain the one-dimensional hollow porous main catalyst photoelectric functional material; the one-dimensional hollow porous main catalyst can improve the utilization rate of light through light scattering, and the catalyst has a large specific surface area and can provide more surface active sites; the diffusion distance of the charges is short, and the charge transmission is facilitated; in addition, compared with Si-O-M bonds, the Si-O-Si bonds are more stable and are not easy to break, and the hollow porous photoelectric structure is more favorable for formingAnd (3) a functional material.
Drawings
FIG. 1 is a scanning electron microscope photograph of acidified nano-attapulgite in embodiment 1;
fig. 2 is a scanning electron microscope image of the acidified nano-attapulgite-mesoporous silica layer support loaded with iron oxide according to embodiment 1.
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings.
Embodiment 1:
the embodiment provides an iron oxide photoelectric functional material and a preparation method thereof, wherein the iron oxide photoelectric functional material is prepared from an acidified nano-attapulgite-mesoporous silica layer carrier and Fe2O3The weight ratio of the two components is 1: 0.3.
The preparation method of the photoelectric functional material comprises the following steps:
s1: preparing acidified nano attapulgite;
firstly, carrying out pretreatment on attapulgite to remove impurities, then dispersing the attapulgite in hydrochloric acid with the molar concentration of 1M, stirring for 24 hours, centrifuging, washing for three times by using deionized water, treating the attapulgite for 24 hours by using HCl with the molar concentration of 3M at 60 ℃, centrifuging, washing for three times by using deionized water to obtain acidified nano attapulgite, and freeze-drying the obtained sample; as shown in FIG. 1, which is a scanning electron microscope image of acidified nano attapulgite, it can be seen that the attapulgite has a fiber rod-like structure, a rod length of 0.2-2 μm, and a rod diameter of about 50-70 nm.
S2: dispersing 1g of the acidified nano-attapulgite in a mixed solution consisting of 3.10g of ammonia water, 100mL of ethanol and 20mL of deionized water, stirring for 1h, and then performing ultrasonic treatment for 1h to fully disperse the acidified nano-attapulgite in the mixed solution to obtain a mixed solution M1.
S3: 2.58g TEOS and 1g C18TMS is mixed to obtain a mixed solution M2.
S4: and (3) dropwise adding the mixed solution M2 into the mixed solution M1 at a dropping rate of 20 drops/min, stirring for 3 hours, precipitating, centrifuging, drying, and calcining for 6 hours at 550 ℃ by using a hyperforine furnace to obtain the acidified nano attapulgite-mesoporous silica layer carrier.
S5: 0.3g of Fe is washed by water and calcined2O3The iron oxide-loaded nano-attapulgite/mesoporous silica layer carrier is loaded into 1g of the acidified nano-attapulgite/mesoporous silica layer carrier, as shown in a scanning electron microscope image of a figure 2, it can be seen from the figure that the attapulgite is obviously thickened, a layer of iron oxide is loaded on the surface, the diameter of the rod reaches 100-150 nm, and the iron oxide is successfully loaded on the surface of the attapulgite.
S6: the acidified nano-attapulgite-mesoporous silicon dioxide layer carrier is melted by alkaline solution, and finally the one-dimensional hollow porous Fe is obtained2O3Photoelectric functional material.
Embodiment 2:
the embodiment provides an iron oxide photoelectric functional material and a preparation method thereof, wherein the iron oxide photoelectric functional material is prepared from an acidified nano-attapulgite-mesoporous silica layer carrier and TiO2The weight ratio of the two components is 1: 5.
The preparation method of the photoelectric functional material comprises the following steps:
s1: preparing acidified nano attapulgite;
firstly, carrying out pretreatment on attapulgite to remove impurities, then dispersing the attapulgite in hydrochloric acid with the molar concentration of 1M, stirring for 24 hours, centrifuging, washing for three times by using deionized water, treating the attapulgite for 24 hours by using HCl with the molar concentration of 3M at 60 ℃, centrifuging, washing for three times by using deionized water to obtain acidified nano attapulgite, and freeze-drying the obtained sample.
S2: dispersing 1g of the acidified nano-attapulgite into a mixed solution consisting of 3.10g of ammonia water, 74.12mL of ethanol and 10mL of deionized water, stirring for 1h, and then performing ultrasonic treatment for 1h to fully disperse the acidified nano-attapulgite in the mixed solution to obtain a mixed solution M1.
S3: 5g of TEOS and 3g of C18TMS were mixed to obtain a mixed solution M2.
S4: and (3) dropwise adding the mixed solution M2 into the mixed solution M1 at a dropwise adding rate of 15 drops/min, stirring for 3 hours, precipitating, centrifuging, drying, and calcining for 3 hours at 600 ℃ in a penetronite furnace to obtain the acidified nano attapulgite-mesoporous silica layer carrier.
S5: 5g of TiO is mixed by a sol-gel method2Loaded into 1g of acidified nano-attapulgite-mesoporous silica layer carrier.
S6: the acidified nano-attapulgite-mesoporous silicon dioxide layer carrier is melted by alkaline solution, and finally the one-dimensional hollow porous TiO is obtained2Photoelectric functional material.
Embodiment 3:
the present embodiment provides a3N4The photoelectric functional material is prepared with acidified nanometer attapulgite mesoporous silica layer as carrier and C3N4The weight ratio of the two components is 1: 0.25.
The preparation method of the photoelectric functional material comprises the following steps:
s1: preparing acidified nano attapulgite;
firstly, carrying out pretreatment on attapulgite to remove impurities, then dispersing the attapulgite in hydrochloric acid with the molar concentration of 1M, stirring for 24 hours, centrifuging, washing for three times by using deionized water, treating the attapulgite for 24 hours by using HCl with the molar concentration of 3M at 60 ℃, centrifuging, washing for three times by using deionized water to obtain acidified nano attapulgite, and freeze-drying the obtained sample.
S2: dispersing 1g of the acidified nano-attapulgite in a mixed solution consisting of 2g of ammonia water, 100mL of ethanol and 20mL of deionized water, stirring for 1h, and then performing ultrasonic treatment for 1h to fully disperse the acidified nano-attapulgite in the mixed solution to obtain a mixed solution M1.
S3: 4.645g TEOS and 2.649g C18TMS are mixed to obtain a mixed solution M2.
S4: and (3) dropwise adding the mixed solution M2 into the mixed solution M1 at a dropwise adding rate of 10 drops/min, stirring for 3 hours, precipitating, centrifuging, drying, and calcining for 6 hours at 500 ℃ in a penetronite furnace to obtain the acidified nano attapulgite-mesoporous silica layer carrier.
S5: 0.25g C is calcined3N4Loaded to 1g of acidified nano-grade concave-convexThe clavulanate-mesoporous silicon dioxide layer carrier.
S6: and (3) melting the acidified nano attapulgite-mesoporous silica layer carrier by using an alkaline solution to finally obtain the one-dimensional hollow porous C3N4 photoelectric functional material.
The above embodiments are merely illustrative of the technical concepts and features of the present invention, and the purpose of the embodiments is to enable those skilled in the art to understand the contents of the present invention and implement the present invention, and not to limit the protection scope of the present invention. All equivalent changes and modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.
Claims (7)
1. The preparation method of the photoelectric functional material is characterized by comprising the following steps of:
s1: preparing acidified nano attapulgite;
s2: dispersing the acidified nano attapulgite into a mixed solution M1 consisting of ammonia water, absolute ethyl alcohol and deionized water;
s3: mixing TEOS and C18TMS is mixed to obtain mixed solution M2;
s4: dropwise adding the mixed solution M2 into the mixed solution M1, stirring, performing ultrasonic treatment, precipitating, centrifuging, drying and calcining to obtain the acidified nano attapulgite-mesoporous silica layer carrier;
s5: loading a catalyst on the acidified nano attapulgite-mesoporous silica layer carrier;
the catalyst is Fe2O3,、C3N4、SrTiO3Or TiO2；
S6: and removing the acidified nano attapulgite-mesoporous silica layer carrier to obtain the hollow porous photoelectric functional material.
2. The method for preparing an opto-electronic functional material according to claim 1, wherein in the S1, the acidified nano attapulgite is prepared by:
s1-1: dispersing the attapulgite with impurities removed in hydrochloric acid with the molar concentration of 1M, stirring for 24h, centrifuging, and cleaning;
s1-2: treating with HCl with the molar concentration of 3M for 24h at 60 ℃, centrifuging, and cleaning to obtain the acidified nano attapulgite.
3. The method for preparing a photovoltaic functional material according to claim 1, wherein in the step S2, the mass-to-volume ratio of the acidified nano attapulgite to the ammonia water, the absolute ethyl alcohol and the deionized water is 1g: 2-3.1 g: 75-100 mL: 10-20 mL.
4. The method for preparing an electro-optical functional material according to claim 1, wherein in the S3, the TEOS and C18The mass ratio of TMS is 1-5: 0 to 3, and C18The mass of TMS is not zero.
5. The method for producing an optoelectronic functional material according to claim 1, wherein in the step S4, the dropping rate of the mixed solution M2 into the mixed solution M1 is 10 to 20 drops/min; the calcining temperature is 500-600 ℃, and the calcining time is 3-6 h.
6. The method for preparing an opto-electrical functional material according to claim 1, wherein in the step S5, a mass ratio of the acidified nano-attapulgite-mesoporous silica layer carrier to the catalyst is 1:0.01 to 1.
7. The method for preparing a photovoltaic functional material according to any one of claims 1 to 6, wherein in the S6, the acidified nano-attapulgite-mesoporous silica layer support is removed using an alkaline solution or ammonium bifluoride, so as to obtain a hollow porous photovoltaic functional material.
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| CN105396550A (en) * | 2015-12-27 | 2016-03-16 | 常州亚环环保科技有限公司 | Preparation method of gasoline discoloring agent namely nano SiO2 loaded attapulgite |
| CN106221434A (en) * | 2016-07-29 | 2016-12-14 | 蒋文兰 | Her green mixed-layer clay photocatalytic spray liquid can be cleaned |
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