CN108732234A - Plasma producing apparatus - Google Patents
Plasma producing apparatus Download PDFInfo
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- CN108732234A CN108732234A CN201710272198.2A CN201710272198A CN108732234A CN 108732234 A CN108732234 A CN 108732234A CN 201710272198 A CN201710272198 A CN 201710272198A CN 108732234 A CN108732234 A CN 108732234A
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- tube body
- producing apparatus
- plasma producing
- sample
- pores
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
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Abstract
The present invention provides a kind of plasma producing apparatus, the plasma producing apparatus includes ontology, the first tube body, the second tube body and third tube body, wherein：The ontology is separately connected the top of first tube body, second tube body and the third tube body；First tube body is located in second tube body, and second tube body is located in the third tube body；The length of first tube body is less than second tube body, and the length of second tube body is less than the third tube body；Second tube body includes first end, and the first end is close to the end of second tube body；There are second tube body one or more first pores, first pores to be located on the side wall of the first end.
Description
Technical field
The present invention relates to element analysis technology field, more particularly to a kind of plasma producing apparatus.
Background technology
Inductivity coupled plasma mass spectrometry technology (ICP-MS) is the most powerful element analysis technology, is especially detected micro-
Amount and trace element.Icp ms device mainly by：Sampling system, interface and ion lens, quality analysis
The compositions such as device, detector, quarter bend and ionization generating means.
As shown in Fig. 1~2, in quarter bend and ionization generating means 1, radio-frequency coil 11 generates electromagnetic field, is filled by high frequency
The argon gas ionization for making to export in auxiliary flue 13 is set, argon ion and electronics are collided with other ar atmos under electromagnetic field effect and produced
Raw more argon ions and electronics, powerful electric current generate high temperature, and argon gas is made to form the plasma torch that temperature reaches 10000K
12, sample is brought plasma torch 12 by carrier gas argon gas and is evaporated, and decomposes, excitation and ionization.Existing torch pipe and ionization
The solution residual that sample or argon gas are had in generating means 1, can make the extinguishing of plasma torch 12 that test be caused to stop, or basic
Flame square can not be lighted.Further include atomising device 14 and drain pipe 18 in quarter bend and ionization generating means 1, sample is atomized
And discharge sample is atomized incompletely formed solution.
Therefore, it is necessary to design a kind of plasma producing apparatus for preventing flame square from extinguishing.
Invention content
The purpose of the present invention is to provide a kind of plasma producing apparatus, are filled with solving existing torch pipe and ionization
Set the problem of flame square extinguishes.
In order to solve the above technical problems, the present invention provides a kind of plasma producing apparatus, the plasma fills
It sets including ontology, the first tube body, the second tube body and third tube body, wherein：
The ontology is separately connected the top of first tube body, second tube body and the third tube body；Described
One tube body is located in second tube body, and second tube body is located in the third tube body；
The length of first tube body is less than second tube body, and the length of second tube body is less than the third pipe
Body；
Second tube body includes first end, and the first end is close to the end of second tube body；Described second
There are tube body one or more first pores, first pores to be located on the side wall of the first end.
Optionally, in the plasma producing apparatus, the third tube body includes madial wall and lateral wall,
In：
The madial wall is located in the lateral wall, and the madial wall and the lateral wall form hollow structure；
The madial wall includes the second end, and the second end is close to the end of the third tube body, the madial wall
With one or more second pores, second pores is located on the second end；
The lateral wall has one or more third pores.
Optionally, in the plasma producing apparatus, the second end is received to the inside of the third tube body
Contracting.
Optionally, in the plasma producing apparatus, first tube body sprays mixed gas, the gaseous mixture
Body includes carrying gas and sample.
Optionally, in the plasma producing apparatus, the carrying gas be helium, neon, argon gas, Krypton or
Xenon.
Optionally, in the plasma producing apparatus, the second tube body injection auxiliary gas.
Optionally, in the plasma producing apparatus, the auxiliary gas be helium, neon, argon gas, Krypton or
Xenon.
Optionally, in the plasma producing apparatus, the third tube body spray cooling gas.
Optionally, in the plasma producing apparatus, the cooling gas be helium, neon, argon gas, Krypton or
Xenon.
Optionally, in the plasma producing apparatus, the plasma producing apparatus further includes atomising device,
The atomising device is transported to after being atomized the sample in first tube body.
Optionally, in the plasma producing apparatus, the plasma producing apparatus further includes sampling device,
The sampling device includes specimen holder, sample feeding pipe and mechanical arm, wherein：
The specimen holder carries the sample, and the top of the sample feeding pipe connects the atomising device, the mechanical arm band
The dynamic sample feeding pipe movement is so that the end of the sample feeding pipe contacts the different zones of the specimen holder.
Optionally, in the plasma producing apparatus, the shape of the specimen holder is discoid, the specimen holder
Central area be equipped with a rinse bath, be distributed multiple openings on the specimen holder, a container, institute housed in each opening
It states and carries the sample in container.
Optionally, in the plasma producing apparatus, the mechanical arm drives the sample feeding pipe to be moved to first
Decline behind position, the end of the sample feeding pipe is immersed in some described container；
The mechanical arm drives the sample feeding pipe to rise, and declines after being moved to the second position, the end leaching of the sample feeding pipe
Enter into the rinse bath；
The specimen holder rotates by a certain angle.
In plasma producing apparatus provided by the invention, have on the side wall by the first end of the second tube body end
There are one or multiple first pores, so that the solution remained in the second tube body is quickly discharged, general remaining solution is to be atomized not
Complete sample, if liquefied sample carryover, in the second tube body, the plasma flame square in the second tube body can be affected,
Be difficult to light or ionization process in extinguish；The end of second tube body is far from the ontology；First pores is located at described
The end of second tube body makes the first pores be located at the outside of the first tube body outlet, the solution directly quilt that the first tube body can be made to spray
Discharge, will not flow backwards into the second tube body close to the inside of ontology, so that the internal temperature of the second tube body is reduced, influence plasma
The ionization of flame square.
Further, the present invention has madial wall and lateral wall by third tube body, and madial wall and lateral wall have respectively
There are the second pores and third pores, the solution remained in third tube body is made quickly to be discharged, the second pores is located at the third pipe
The end of body can be such that the solution that the second tube body flows out directly is discharged, and will not flow backwards into third tube body close to the inside of ontology,
So that the external temperature of the second tube body is reduced, influences the ionization of plasma flame square；Third pores be also possible to prevent solution flow backwards into
Enter third tube body close to the inside of ontology, pollutes.
Further, the end of the madial wall can reduce external environment and temperature to the internal contraction of the third tube body
The influence of the plasma flame square inside plasma generating means is spent, and prevents solution from being flowed out from the opening of third tube body,
It pollutes.
In addition, since the elemental analysis of sample is to be directed to trace element or trace element, the trace element in usual sample
It being easy to cause larger analytical error because of various pollutions, the present invention has rinse bath by the specimen holder of sampling device,
And it is rotatable, mechanical arm coordinates the rotation of specimen holder to carry out the absorption of sample and the cleaning of sample feeding pipe, reduces the friendship of sample
Fork pollution, and prevent pollution of the hand sample to sample.
Description of the drawings
Fig. 1~3 are existing torch pipe and ionization generating means schematic diagram；
Fig. 4 is plasma producing apparatus schematic diagram of the present invention；
Fig. 5~6 are the third pipe structure schematic diagrames of plasma producing apparatus of the present invention；
Fig. 7~9 are the sampling device structural schematic diagrams of plasma producing apparatus of the present invention；
As shown in the figure：1- quarter bends and ionization generating means；11- radio-frequency coils；12- plasma torches；13- assists gas
Pipe；14- atomising devices；15- sample feeding pipes；16- specimen holders；18- drain pipes；2- plasma producing apparatus；21- ontologies；22-
One tube body；The second tube bodies of 23-；The first pores of 231-；232- first ends；24- third tube bodies；241- madial walls；2411- second
End；242- lateral walls；The second pores of 243-；244- third pores；25- atomising devices；26- sampling devices；261- specimen holders；
2611- rinse baths；2612- is open；262- sample feeding pipes；The top of 2621- sample feeding pipes；The end of 2622- sample feeding pipes；263- machineries
Arm；264- containers.
Specific implementation mode
Plasma producing apparatus proposed by the present invention is made further specifically below in conjunction with the drawings and specific embodiments
It is bright.According to following explanation and claims, advantages and features of the invention will become apparent from.It should be noted that attached drawing is all made of
Very simplified form and non-accurate ratio is used, only to mesh that is convenient, lucidly aiding in illustrating the embodiment of the present invention
's.
Core of the invention thought is to provide a kind of plasma producing apparatus for preventing flame square from extinguishing.
To realize above-mentioned thought, the present invention provides a kind of plasma producing apparatus, the plasma producing apparatus
Including ontology, the first tube body, the second tube body and third tube body, wherein：The ontology is separately connected first tube body, described
The top of two tube bodies and the third tube body；First tube body is located in second tube body, and second tube body is located at institute
It states in third tube body；The length of first tube body is less than second tube body, and the length of second tube body is less than described the
Three tube bodies；Second tube body includes first end, and the first end is close to the end of second tube body；Second pipe
There are body one or more first pores, first pores to be located on the side wall of the first end.
As shown in Figures 4 and 5, specific implementation mode of the invention provides a kind of plasma producing apparatus 2, the plasma
Body generating means 2 includes ontology 21, the first tube body 22, the second tube body 23 and third tube body 24, wherein：The ontology 21 connects respectively
The top of first tube body 22, second tube body 23 and the third tube body 24 is connect, the ontology 21 is first pipe
Body 22, the second tube body 23 and third tube body 24 convey gas；First tube body 22 is located in second tube body 23, and described
Two tube bodies 23 are located in the third tube body 24；The length of first tube body 22 be less than second tube body 23, described second
The length of tube body 23 is less than the third tube body 24；Second tube body 23 includes first end 232, the first end 232
Close to the end of second tube body 23；Second tube body 23 has one or more first pores 231, first pores
231 are located on the side wall of the first end 232, far from the ontology 21.
In plasma producing apparatus 2 provided by the invention, by the side wall of first end 232 have there are one or it is more
A first pores 231 makes the solution remained in the second tube body 23 quickly be discharged, and general remaining solution is that atomization is incomplete
Sample, it is difficult if liquefied sample carryover, in the second tube body 23, the plasma flame square in the second tube body 23 can be affected
With light or ionization process in extinguish；First pores 231 is located at the end of second tube body 23, first pores
231, far from the ontology 21, make the first pores 231 be located at the outside of the first tube body 22 outlet, and the first tube body 22 can be made to spray
Solution is directly discharged, and will not flow backwards into the second tube body 23 close to the inside of ontology, the internal temperature of the second tube body 23 is made to drop
It is low, influence the ionization of plasma flame square.
As shown in Fig. 5~6, the third tube body 24 includes madial wall 241 and lateral wall 242, and the madial wall 241 is located at
In the lateral wall 242, the madial wall 241 and the lateral wall 242 form hollow structure, and the madial wall 241 includes the
Two ends 2411, for the second end 2411 close to the end of the third tube body 24, there are one the tools of the madial wall 241 or more
A second pores 243, second pores 243 are located on the second end 2411；The lateral wall 242 includes one or more
A third pores 244, for the second end 2411 far from the ontology 21, second pores 243 is described interior far from ontology 21
The end of side wall 241 can reduce external environment and temperature plasma fills to the internal contraction of the third tube body 24
The influence of the plasma flame square inside 2 is set, and prevents solution from being flowed out from the opening of third tube body 24, is polluted.
The present invention has madial wall 241 and lateral wall 242 by third tube body 24, and madial wall 241 and lateral wall 242 divide
Not Ju You the second pores 243 and third pores 244, so that the solution remained in third tube body 24 is quickly discharged, the second pores 243
Positioned at the end of the third tube body 24, the solution that the second tube body 23 flows out can be made directly to be discharged, will not be flow backwards into third
Tube body 24 makes the external temperature of the second tube body 23 reduce, influences the ionization of plasma flame square close to the inside of ontology 21；Third
Pores 244 is also possible to prevent solution and flows backwards into third tube body 24 close to the inside of ontology 21, pollutes.
Specifically, first tube body 22 sprays mixed gas, the mixed gas includes carrying gas and sample, described
Carrying gas is helium, neon, argon gas, Krypton or xenon, and second tube body 23 sprays auxiliary gas, and the auxiliary gas is
Helium, neon, argon gas, Krypton or xenon, 24 spray cooling gas of the third tube body, the cooling gas be helium, neon,
Argon gas, Krypton or xenon, it is preferred that carrying gas, auxiliary gas and cooling gas select same inert gas, in order to avoid cause
Pollution.The plasma producing apparatus 2 further includes atomising device 25, after the sample is atomized by the atomising device 25
It is transported in first tube body 22.
As shown in figs. 7-9, the plasma producing apparatus 2 further includes sampling device 26, and the sampling device 26 includes
Specimen holder 261, sample feeding pipe 262 and mechanical arm 263, wherein：The specimen holder 261 carries the sample, the top of the sample feeding pipe
The 2621 connection atomising device 25 of end, the sample introduction tube body connect the mechanical arm 263, and the mechanical arm 263 drives institute
The movement of sample feeding pipe 262 is stated so that the end 2622 of the sample feeding pipe contacts the different zones of the specimen holder 261.The sample
The shape of frame 261 is discoid, and the central area of the specimen holder 261 is equipped with a rinse bath 2611, divides on the specimen holder 261
The multiple openings 2612 of cloth each house a container 264 in the opening 2612, the sample are carried in the container 264.
The mechanical arm 263 declines after driving the sample feeding pipe 262 to be moved to first position, certain is immersed in the end 2622 of the sample feeding pipe
In a container 264；The mechanical arm 263 drives the sample feeding pipe 262 to rise, and declines after being moved to the second position, described
The end 2622 of sample feeding pipe is immersed in the rinse bath 2611；The specimen holder 261 rotates by a certain angle, and makes another container
It is moved to first position, then mechanical arm repeats the above process, and sample is obtained from another container.
The shape of existing sampling device in comparison diagram 3, the specimen holder 16 in Fig. 3 is rectangle, has been placed above multiple
Container 17, as shown in Fig. 2, existing specimen holder mainly by sample feeding pipe 15 of taking manually, is placed into the container 17 that will be sampled
In, it is input in atomising device 14, since the elemental analysis of sample is to be directed to trace element or trace element, in usual sample
Trace element is easy to cause larger analytical error because of various pollutions, the specimen holder that the present invention passes through sampling device 26
261 have rinse bath 2611, and rotatable, and mechanical arm 263 coordinates the absorption of the rotation progress sample of specimen holder 261, Yi Jijin
The cleaning of sample pipe 262, reduces the cross contamination of sample, and prevents pollution of the hand sample to sample.
To sum up, the various configuration of above-described embodiment plasma generating means is described in detail, certainly, the present invention
Cited configuration in including but not limited to above-mentioned implementation, it is any to be converted on the basis of the configuration of above-described embodiment offer
Content, belong to the range protected of the present invention.It is anti-that those skilled in the art can lift one according to the content of above-described embodiment
Three.
Each embodiment is described by the way of progressive in this specification, the highlights of each of the examples are with other
The difference of embodiment, just to refer each other for identical similar portion between each embodiment.Foregoing description is only to the present invention
The description of preferred embodiment, not to any restriction of the scope of the invention, the those of ordinary skill in field of the present invention is according to above-mentioned
Any change, the modification that disclosure is done, belong to the protection domain of claims.
Claims (13)
1. a kind of plasma producing apparatus, which is characterized in that the plasma producing apparatus include ontology, the first tube body,
Second tube body and third tube body, wherein：
The ontology is separately connected the top of first tube body, second tube body and the third tube body；First pipe
Body is located in second tube body, and second tube body is located in the third tube body；
The length of first tube body is less than second tube body, and the length of second tube body is less than the third tube body；
Second tube body includes first end, and the first end is close to the end of second tube body；Second tube body
With one or more first pores, first pores is located on the side wall of the first end.
2. plasma producing apparatus as described in claim 1, which is characterized in that the third tube body includes madial wall and outer
Side wall, wherein：
The madial wall is located in the lateral wall, and the madial wall and the lateral wall form hollow structure；
The madial wall includes the second end, and the second end has close to the end of the third tube body, the madial wall
One or more second pores, second pores are located on the second end；
The lateral wall has one or more third pores.
3. plasma producing apparatus as described in claim 1, which is characterized in that the second end is to the third tube body
Internal contraction.
4. plasma producing apparatus as claimed in claim 2, which is characterized in that first tube body sprays mixed gas,
The mixed gas includes carrying gas and sample.
5. plasma producing apparatus as claimed in claim 4, which is characterized in that the carrying gas is helium, neon, argon
Gas, Krypton or xenon.
6. plasma producing apparatus as claimed in claim 4, which is characterized in that the second tube body injection auxiliary gas.
7. plasma producing apparatus as claimed in claim 6, which is characterized in that the auxiliary gas is helium, neon, argon
Gas, Krypton or xenon.
8. plasma producing apparatus as claimed in claim 6, which is characterized in that the third tube body spray cooling gas.
9. plasma producing apparatus as claimed in claim 8, which is characterized in that the cooling gas is helium, neon, argon
Gas, Krypton or xenon.
10. plasma producing apparatus as claimed in claim 4, which is characterized in that the plasma producing apparatus also wraps
Atomising device is included, the atomising device is transported to after being atomized the sample in first tube body.
11. plasma producing apparatus as claimed in claim 10, which is characterized in that the plasma producing apparatus also wraps
Including sampling device, the sampling device includes specimen holder, sample feeding pipe and mechanical arm, wherein：
The specimen holder carries the sample, and the top of the sample feeding pipe connects the atomising device, and the mechanical arm drives institute
Sample feeding pipe movement is stated so that the end of the sample feeding pipe contacts the different zones of the specimen holder.
12. plasma producing apparatus as claimed in claim 11, which is characterized in that the shape of the specimen holder is disk
The central area of shape, the specimen holder is equipped with a rinse bath, is distributed multiple openings on the specimen holder, holds in each opening
A container is set, the sample is carried in the container.
13. plasma producing apparatus as claimed in claim 12, which is characterized in that the mechanical arm drives the sample feeding pipe
Decline after being moved to first position, the end of the sample feeding pipe is immersed in some described container；
The mechanical arm drives the sample feeding pipe to rise, and declines after being moved to the second position, the end of the sample feeding pipe is immersed in
In the rinse bath；
The specimen holder rotates by a certain angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710272198.2A CN108732234B (en) | 2017-04-24 | 2017-04-24 | Plasma generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710272198.2A CN108732234B (en) | 2017-04-24 | 2017-04-24 | Plasma generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108732234A true CN108732234A (en) | 2018-11-02 |
| CN108732234B CN108732234B (en) | 2020-09-29 |
Family
ID=63934400
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710272198.2A Active CN108732234B (en) | 2017-04-24 | 2017-04-24 | Plasma generator |
Country Status (1)
| Country | Link |
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| CN (1) | CN108732234B (en) |
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| CN1174991A (en) * | 1997-07-08 | 1998-03-04 | 吉林大学 | Microwave plasma torch atomic emission spectrometer |
| JP2002039944A (en) * | 2000-07-25 | 2002-02-06 | Shimadzu Corp | Icp light source apparatus |
| CN1669368A (en) * | 2002-05-21 | 2005-09-14 | 美国瓦里安澳大利亚有限公司 | Plasma torch for microwave induced plasmas |
| US20080035844A1 (en) * | 2006-08-11 | 2008-02-14 | Kenichi Sakata | Inductively coupled plasma mass spectrometer |
| CN103515184A (en) * | 2012-06-27 | 2014-01-15 | 日本株式会社日立高新技术科学 | ICP apparatus, spectrometer and mass spectrometer |
| CN104661758A (en) * | 2012-10-11 | 2015-05-27 | 塞莫费雪科学（不来梅）有限公司 | Apparatus and method for improving throughput in spectrometry |
| JP2016061574A (en) * | 2014-09-16 | 2016-04-25 | 株式会社島津製作所 | ICP analyzer |
| CN106507573A (en) * | 2016-12-08 | 2017-03-15 | 广东省测试分析研究所（中国广州分析测试中心） | A kind of dismountable microwave induced plasma torch pipe |
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2017
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Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4125754A (en) * | 1976-01-15 | 1978-11-14 | Rene Wasserman | Installation for surfacing using plasma-arc welding |
| JPH01158334A (en) * | 1987-12-16 | 1989-06-21 | Shimadzu Corp | Icp light emission analyzer |
| CN1174991A (en) * | 1997-07-08 | 1998-03-04 | 吉林大学 | Microwave plasma torch atomic emission spectrometer |
| JP2002039944A (en) * | 2000-07-25 | 2002-02-06 | Shimadzu Corp | Icp light source apparatus |
| CN1669368A (en) * | 2002-05-21 | 2005-09-14 | 美国瓦里安澳大利亚有限公司 | Plasma torch for microwave induced plasmas |
| US20080035844A1 (en) * | 2006-08-11 | 2008-02-14 | Kenichi Sakata | Inductively coupled plasma mass spectrometer |
| CN103515184A (en) * | 2012-06-27 | 2014-01-15 | 日本株式会社日立高新技术科学 | ICP apparatus, spectrometer and mass spectrometer |
| CN104661758A (en) * | 2012-10-11 | 2015-05-27 | 塞莫费雪科学（不来梅）有限公司 | Apparatus and method for improving throughput in spectrometry |
| JP2016061574A (en) * | 2014-09-16 | 2016-04-25 | 株式会社島津製作所 | ICP analyzer |
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| CN108732234B (en) | 2020-09-29 |
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