CN108693575A - Anti-reflection layer and preparation method thereof, display device - Google Patents
Anti-reflection layer and preparation method thereof, display device Download PDFInfo
- Publication number
- CN108693575A CN108693575A CN201810487273.1A CN201810487273A CN108693575A CN 108693575 A CN108693575 A CN 108693575A CN 201810487273 A CN201810487273 A CN 201810487273A CN 108693575 A CN108693575 A CN 108693575A
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- China
- Prior art keywords
- layer
- reflection
- material layer
- reflection material
- substrate
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
Abstract
The present invention provides a kind of production method of anti-reflection layer, including:Anti-reflection material layer is formed on substrate;Hydrophobic treatment is carried out away from the surface of the substrate to the anti-reflection material layer, to form multiple microprotrusions in pre-defined rule arrangement in the anti-reflection material layer, the anti-reflection material layer after hydrophobic treatment is the anti-reflection layer;Wherein, the microprotrusion is respectively less than 30nm along the size of any direction.Correspondingly, the present invention also provides a kind of anti-reflection layers and a kind of display device.The present invention can improve the hydrophobicity of anti-reflection layer surface, after forming other film layers on anti-reflection layer, obtain more hydrophobic surface topography, improve the resistance to abrasiveness for showing product.
Description
Technical field
The present invention relates to display technology fields, and in particular to a kind of anti-reflection layer and preparation method thereof, display device.
Background technology
With the progress of display technology, the requirement to showing the display effect of product is also more and more, such as reduces reflection, prevents
It dazzles and anti-fingerprint etc..Wherein, anti-reflection layer (anti-reflection, AR layers) and anti-fingerprint layer (anti-fingerprints,
AF layers) it is common functional film layer.In procedure for producing, need to showing that the wearability of product is detected, wherein water droplet angle
Test is one of main test method.In general, (e.g., being more than when the water droplet angle that anti-reflection layer surface is formed reaches a certain size
20 °) when, the wearability for being possible to the fingerprint proof membrane for making to be formed on anti-reflection layer meets specification requirement (e.g., using steel wool anti-
After the certain number of fingerprint film mantle friction, water droplet angle is more than 90 °).
But the hydrophobicity of the anti-reflection layer surface currently formed is poor, so as to cause anti-fingerprint layer is formed on anti-reflection layer
Afterwards, the hydrophobicity of anti-fingerprint layer is poor, and then the water droplet angle for causing anti-fingerprint layer to be formed after being rubbed is smaller, that is, wear-resisting
Property is poor.
Invention content
The present invention is directed at least solve one of the technical problems existing in the prior art, it is proposed that a kind of anti-reflection layer and its system
Make method, display device, to improve the hydrophobicity of anti-reflection layer surface, to improve the hydrophobicity of anti-fingerprint layer so that anti-fingerprint
Layer forms larger water droplet angle after being rubbed, that is, improves the wearability of anti-fingerprint layer.
One of in order to solve the above-mentioned technical problem, the present invention provides a kind of production method of anti-reflection layer, including:
Anti-reflection material layer is formed on substrate;
Hydrophobic treatment is carried out away from the surface of the substrate to the anti-reflection material layer, with the shape in the anti-reflection material layer
At the multiple microprotrusions arranged in pre-defined rule, the anti-reflection material layer after hydrophobic treatment is the anti-reflection layer;Wherein, institute
The size that microprotrusion is stated along any direction is respectively less than 30nm.
Preferably, described in the step of forming anti-reflection material layer on substrate, the thickness of the anti-reflection material layer is more than mesh
Mark thickness;
The hydrophobic treatment includes:
The anti-reflection material layer is ground, until the anti-reflection material layer reaches target thickness.
Preferably, the step of being ground to the anti-reflection material layer include:Along predetermined direction, using hardware cloth or polishing
Liquid is ground the anti-reflection material layer.
Preferably, it is described on substrate formed anti-reflection material layer the step of in, the thickness of the anti-reflection material layer with it is described
The difference of target thickness is between 10nm~100nm.
Preferably, the anti-reflection material layer includes the first film layer and the second film layer being alternately superimposed on, and the microprotrusion is formed
In first film layer;
First film layer is silicon oxide layer, and second film layer is silicon nitride layer or niobium pentaoxide layer.
Preferably, in the step of forming anti-reflection material layer on substrate, the anti-reflection material layer is formed using coating process.
Correspondingly, the present invention also provides a kind of anti-reflection layers, including the anti-reflection material layer being disposed on the substrate, the anti-reflection material
The bed of material is formed with the multiple microprotrusions arranged in pre-defined rule on the surface of the substrate, and the microprotrusion is along any direction
Size be respectively less than 30nm.
Preferably, the anti-reflection material layer includes the first film layer and the second film layer being alternately superimposed on, and the microprotrusion is formed
In first film layer;
First film layer is silicon oxide layer, and second film layer is silicon nitride layer or niobium pentaoxide layer.
Correspondingly, the present invention also provides a kind of display devices, including display panel and setting are in the display panel light extraction
The anti-reflection layer of side, the anti-reflection layer are above-mentioned anti-reflection layer, and the anti-reflection material layer is located at the substrate and deviates from the display panel
Side.
Preferably, the anti-reflection layer is additionally provided with anti-fingerprint layer away from the side of the display panel.
Description of the drawings
Attached drawing is to be used to provide further understanding of the present invention, an and part for constitution instruction, with following tool
Body embodiment is used to explain the present invention together, but is not construed as limiting the invention.In the accompanying drawings:
Fig. 1 is the production method flow chart of anti-reflection layer provided by the invention;
Fig. 2 a to Fig. 2 b are the manufacturing process schematic diagrames of anti-reflection layer in the present invention;
Fig. 3 is the schematic diagram of display device provided by the invention.
Wherein, reference numeral is:
10, substrate;20, anti-reflection material layer;201, the first film layer;202, the second film layer;21, microprotrusion;30, display surface
Plate;40, anti-fingerprint layer.
Specific implementation mode
The specific implementation mode of the present invention is described in detail below in conjunction with attached drawing.It should be understood that this place is retouched
The specific implementation mode stated is merely to illustrate and explain the present invention, and is not intended to restrict the invention.
The present invention provides a kind of production method of anti-reflection layer, and the anti-reflection layer is used in display device, to reduce to the external world
The reflection of ambient light improves display effect.Fig. 1 is the production method flow chart that the present invention provides anti-reflection layer, and Fig. 2 a to Fig. 2 b are
Structural schematic diagram of present invention during making anti-reflection layer.As shown in Fig. 1 to Fig. 2 b, the production method packet of the anti-reflection layer
It includes:
S1, anti-reflection material layer 20 is formed on the substrate 10, as shown in Figure 2 a.
S2, hydrophobic treatment is carried out away from the surface of the substrate to anti-reflection material layer 20, with the shape in anti-reflection material layer 20
At the multiple microprotrusions 21 arranged in pre-defined rule, as shown in Figure 2 b.Anti-reflection material layer 20 after hydrophobic treatment is institute
State anti-reflection layer;Wherein, microprotrusion 21 is respectively less than 30nm along the size of any direction.Wherein, the pre-defined rule can be:It is multiple
Microprotrusion 21 is uniformly distributed, and is both provided with multiple microprotrusions 21 in the region per square micron.
The prior art forms one layer of anti-reflection material layer, not to anti-reflection material when making anti-reflection layer directly on substrate
Layer carries out hydrophobic treatment, and during due to forming anti-reflection material layer on substrate, it can be influenced by impurity or process water
Flat limitation, therefore, it is very easy to which it is larger, in irregular shape and unevenly distributed to cause the surface of anti-reflection material layer to form size
Raised (as shown in Figure 2 a), the hydrophobicity so as to cause anti-reflection layer surface are poor;And subsequent anti-fingerprint layer is typically that solution is solid
Therefore the film layer formed after change when the hydrophobicity of anti-reflection layer surface is poor, can directly result in the anti-fingerprint layer hydrophobicity to be formed
Difference, and then anti-fingerprint layer is caused to cannot be satisfied the requirement of wearability test (that is, rubbing repeatedly in film surface using steel wool
Afterwards, water droplet angle is unsatisfactory for test request).
And the present invention can carry out the surface of anti-reflection material layer 20 hydrophobic treatment when making anti-reflection layer, in anti-reflection material
20 surface formation rule arrangement of the bed of material and small-sized microprotrusion 21, so as to improve the surface topography of anti-reflection layer, raising anti-reflection
The hydrophobicity of layer surface, and then after being subsequently formed anti-fingerprint layer or other film layers, the higher film layer table of hydrophobicity can be obtained
Face, to which when carrying out wearability test to anti-fingerprint layer, larger water droplet angle can be formed, that is, so that anti-reflection layer and anti-finger
The composite film that lamina is formed has preferable wear-resisting property.
The production method of the anti-reflection layer of the present invention is specifically introduced below.The production method includes:
S1, anti-reflection material layer 20 is formed on the substrate 10.
As shown in Figure 2 a, anti-reflection material layer 20 may include multiple film layers.Specifically, anti-reflection material layer 20 includes alternately folded
The first film layer 201 and the second film layer 202 set, the first film layer 201 are silicon oxide layer (SiO2), the second film layer 202 is silicon nitride
Layer (SiN) or niobium pentaoxide layer (Nb2O5).Since the wearability of silica is preferable, it will be farthest away from the film layer of substrate 10
It is set as silicon oxide layer, that is, the first film layer 201.It should be noted that the quantity of the first film layer 201 and the second film layer 202 is not made
It limits, as shown in Figure 2 a, anti-reflection material layer 20 may include two layers of first film layers 201 and the second film layer 202;It is of course also possible to
Including one layer of first film layer 201 and one layer of second film layer 202.
Each first film layer 201 and each second film layer 202 may be used coating process and formed, with improve film layer homogeneity and
Production efficiency.It is of course also possible to use other techniques such as coating (coating) are formed.
In addition, the thickness of the anti-reflection material layer 20 formed in step S1 is more than target thickness, in order to subsequently through physics
Mode carries out hydrophobic treatment.The thickness and target thickness difference of the anti-reflection material layer 20 of formation can be between 10~100nm.Its
In, it can will be made farthest away from the thickness of the first film layer 201 of substrate 10 larger, and remaining each film layer is according to required thickness
It is configured.
S2, hydrophobic treatment is carried out away from the surface of substrate 10 to anti-reflection material layer 20, to be formed in anti-reflection material layer 20
In multiple microprotrusions 21 that pre-defined rule is arranged, the anti-reflection material layer 20 after hydrophobic treatment is the anti-reflection layer;Wherein,
Microprotrusion 21 is respectively less than 30nm along the size of any direction.More specifically, the height of microprotrusion 21 is less than21 edge of microprotrusion
It is less than 30nm with the size of any direction of substrate-parallel.
Specifically, the hydrophobic treatment in step S2 includes:Anti-reflection material layer 20 is ground, until anti-reflection material layer 20
Reach target thickness.Further, the step of being ground to anti-reflection material layer 20 include:Along predetermined direction, use is higher
The hardware cloth or polishing fluid of hardness are ground the first film layer 201 farthest away from substrate 10, to be formed in the first film layer 201
It is above-mentioned along the evenly arranged multiple microprotrusions of pre-defined rule 21.Wherein, be ground using the first film layer of polishing fluid pair 201 that is,
The first film layer of non-dust cloth pair 201 for being soaked with polishing fluid is ground, alternatively, spraying polishing fluid in the first film layer 201, and is adopted
It is ground with the first film layer of non-dust cloth pair 201.The friction particles that grain size is less than 20nm are distributed in polishing fluid, so as to incite somebody to action
The surface of first film layer 201 is formed uniformly multiple microprotrusions.
Correspondingly, as shown in Figure 2 b, described the present invention also provides a kind of anti-reflection layer using made by above-mentioned production method
Anti-reflection layer includes the anti-reflection material layer 20 of setting on the substrate 10, and anti-reflection material layer 20 is formed on the surface of substrate 10 is in
Multiple microprotrusions 21 of pre-defined rule arrangement, microprotrusion 21 are respectively less than 30nm along the size of any direction.Specifically, microprotrusion 21
Height be less thanThe diameter of microprotrusion 21 is less than 30nm.
Wherein, anti-reflection material layer 20 includes the first film layer 201 and the second film layer 202 being alternately superimposed on, the formation of microprotrusion 21
In the first film layer 201.First film layer 201 is silicon oxide layer, and the second film layer 202 is silicon nitride layer or niobium pentaoxide layer.
Correspondingly, the present invention also provides a kind of display device, Fig. 3 is the schematic diagram of display device provided by the invention, such as
Shown in Fig. 3, the display device includes display panel 30 and the above-mentioned anti-reflection layer that is arranged on display panel 30, and anti-reflection layer is located at
The light emission side of display panel 30, anti-reflection material layer 20 are located at the side that substrate 10 deviates from display panel 30, wherein substrate 10 can be with
As the cover board being arranged in 30 light emission side of display panel.
Further, anti-reflection layer is additionally provided with anti-fingerprint layer 40 away from the side of display panel 30, for reducing greasy dirt, water
Vapour adheres on the display apparatus.Anti-fingerprint layer 40 is made up of solwution method.
There is small size and equally distributed microstructure appearance since the surface of the anti-reflection layer of the invention made is formed, improve
Therefore the hydrophobicity of anti-reflection layer after forming anti-fingerprint layer, can obtain more hydrophobic surface topography, to resistance in progress
When the test of mill property, larger water droplet angle can be formed, that is, improve the wear-resisting property of display screen.In the present invention, to anti-
When finger print layer carries out wearability test, after film surface friction repeatedly, the water droplet angle of formation is basically unchanged, and is remained above
110°。
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, however the present invention is not limited thereto.For those skilled in the art, in the essence for not departing from the present invention
In the case of refreshing and essence, various changes and modifications can be made therein, these variations and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a kind of production method of anti-reflection layer, which is characterized in that including:
Anti-reflection material layer is formed on substrate;
Hydrophobic treatment is carried out away from the surface of the substrate to the anti-reflection material layer, is in be formed in the anti-reflection material layer
Multiple microprotrusions of pre-defined rule arrangement, the anti-reflection material layer after hydrophobic treatment is the anti-reflection layer;Wherein, described micro-
Protrusion is respectively less than 30nm along the size of any direction.
2. manufacturing method according to claim 1, which is characterized in that described the step of forming anti-reflection material layer on substrate
In, the thickness of the anti-reflection material layer is more than target thickness;
The hydrophobic treatment includes:
The anti-reflection material layer is ground, until the anti-reflection material layer reaches target thickness.
3. production method according to claim 2, which is characterized in that the step of being ground to the anti-reflection material layer is wrapped
It includes:Along predetermined direction, the anti-reflection material layer is ground using hardware cloth or polishing fluid.
4. production method according to claim 2, which is characterized in that described the step of forming anti-reflection material layer on substrate
In, the thickness of the anti-reflection material layer and the difference of the target thickness are between 10nm~100nm.
5. production method as claimed in any of claims 1 to 4, which is characterized in that the anti-reflection material layer includes
The first film layer and the second film layer being alternately superimposed on, the microprotrusion are formed in first film layer;
First film layer is silicon oxide layer, and second film layer is silicon nitride layer or niobium pentaoxide layer.
6. production method as claimed in any of claims 1 to 4, which is characterized in that form anti-reflection material on substrate
In the step of bed of material, the anti-reflection material layer is formed using coating process.
7. a kind of anti-reflection layer, including the anti-reflection material layer that is disposed on the substrate, which is characterized in that the anti-reflection material layer deviates from institute
The multiple microprotrusions for being formed on the surface of substrate and arranging in pre-defined rule are stated, the microprotrusion is small along the size of any direction
In 30nm.
8. anti-reflection layer according to claim 7, which is characterized in that the anti-reflection material layer includes the first film being alternately superimposed on
Layer and the second film layer, the microprotrusion are formed in first film layer;
First film layer is silicon oxide layer, and second film layer is silicon nitride layer or niobium pentaoxide layer.
9. a kind of display device, including display panel and the anti-reflection layer in the display panel light emission side is set, which is characterized in that
The anti-reflection layer is the anti-reflection layer described in claim 7 or 8, and the anti-reflection material layer is located at the substrate and deviates from the display surface
The side of plate.
10. display device according to claim 9, which is characterized in that the anti-reflection layer deviates from the one of the display panel
Side is additionally provided with anti-fingerprint layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810487273.1A CN108693575A (en) | 2018-05-21 | 2018-05-21 | Anti-reflection layer and preparation method thereof, display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810487273.1A CN108693575A (en) | 2018-05-21 | 2018-05-21 | Anti-reflection layer and preparation method thereof, display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108693575A true CN108693575A (en) | 2018-10-23 |
Family
ID=63846598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810487273.1A Pending CN108693575A (en) | 2018-05-21 | 2018-05-21 | Anti-reflection layer and preparation method thereof, display device |
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| Country | Link |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102565890A (en) * | 2010-10-01 | 2012-07-11 | 卡尔蔡司视觉有限责任公司 | Optical lens with anti-scratch, anti-reflective layer |
| CN102859047A (en) * | 2010-04-22 | 2013-01-02 | 三菱丽阳株式会社 | Mold, method for producing same, article having micro-relief structure on surface, and method for producing same |
| CN102998723A (en) * | 2012-11-29 | 2013-03-27 | 法国圣戈班玻璃公司 | Antireflection optical assembly and manufacturing method thereof |
| CN105451967A (en) * | 2013-08-14 | 2016-03-30 | 三菱丽阳株式会社 | Method for producing mold for nanoimprinting and anti-reflective article |
-
2018
- 2018-05-21 CN CN201810487273.1A patent/CN108693575A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102859047A (en) * | 2010-04-22 | 2013-01-02 | 三菱丽阳株式会社 | Mold, method for producing same, article having micro-relief structure on surface, and method for producing same |
| CN102565890A (en) * | 2010-10-01 | 2012-07-11 | 卡尔蔡司视觉有限责任公司 | Optical lens with anti-scratch, anti-reflective layer |
| CN102998723A (en) * | 2012-11-29 | 2013-03-27 | 法国圣戈班玻璃公司 | Antireflection optical assembly and manufacturing method thereof |
| CN105451967A (en) * | 2013-08-14 | 2016-03-30 | 三菱丽阳株式会社 | Method for producing mold for nanoimprinting and anti-reflective article |
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| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181023 |
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| RJ01 | Rejection of invention patent application after publication |