CN108645801A - Collotype printing down radiation absorption computational methods - Google Patents
Collotype printing down radiation absorption computational methods Download PDFInfo
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- CN108645801A CN108645801A CN201810302238.8A CN201810302238A CN108645801A CN 108645801 A CN108645801 A CN 108645801A CN 201810302238 A CN201810302238 A CN 201810302238A CN 108645801 A CN108645801 A CN 108645801A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/3103—Atomic absorption analysis
Abstract
The invention belongs to technical field of semiconductor illumination, specially collotype printing down radiation absorption computational methods.The present invention passes through measurement daylight spectral power distributions and the spectral absorption curve of collotype printing down photoresists, calculate Net long wave radiation absorbed flux of the photoresists to daylight, then pass through the spectral power distribution of artificial light sources, it determines the radiant energy flux for reaching the artificial light sources needed for identical Net long wave radiation absorbed flux, the input power of corresponding artificial light sources is finally obtained according to its radiation efficiency.In the present invention artificial light sources be supplied to collotype printing down photoresists radiation absorption flux and daylight it is consistent; ensure the stability in printing down Light Curing; printing down effect is set not influenced by daylight illumination variation; standard printing down technique is formulated convenient for historical relic's protection worker; simplify operating procedure, the succession of power-assisted tradition collotype mask-making technology.
Description
Technical field
The invention belongs to technical field of semiconductor illumination, and in particular to collotype printing down radiation absorption computational methods.
Background technology
Collotype is the transliteration of word collotype, is earliest one of photolithographic methods, is passed in Qing Dynasty's last years of a dynasty or reign
Enter China.Its main feature is that lithographic printing, without site, therefore can verily reflect the prototype of printed image, effect is vivid
It is true to nature, the pen and ink romantic charm in painting and calligraphy pieces can be retained.Therefore collotype printing technology is applied in copy of ancient generation drawing, ink marks etc.
In terms of artistic work, irreplaceable artistic value is shown, becomes a kind of special skill for replicating the ancient Chinese art works
Art.
Painting and calligraphy pieces are one of most important components of Chinese traditional culture, thousands of years history civilization leave it is great such as
Huge and voluminous historical relic works.But since painting and calligraphy pieces are easy to make moist, damage by worms and chaos caused by war etc. historical reasons, can be saved in existing
The painting and calligraphy pieces in generation are fewer and fewer.The units such as Shanghai Museum of Art and History have special historical relic repair replication department, are printed using collotype
Brush art is repaired and is printed to ancient calligraphy and painting.But since traditional collotype printing technique relies primarily on day in printing down
Light carries out, and light exposure is controlled by the experience of operating personnel entirely, and exposure dose can not control strictly, and the time printed
There is certain demand to weather, sizable difficulty is all brought to entire printing work and printing quality in this way.Therefore it needs
The controllable collotype printing-down box of a exposure dose is designed, dependence of the printing work for weather environment factor is not only removed, and
And it can be accurately controlled the light exposure of printing process, the quality and efficiency of printing are greatly improved, this is for painting and calligraphy historical relic works
Reparation and protection have far-reaching significance.
The basic principle of collotype printing down is exactly that photosensitive solidification glue is coated on the surface of ground glass, and ingredient is certain
The photoresists and ammonium dichromate solution of concentration are mixed with lead nitrate solution；Light-sensitive surface is formed after drying, what light-sensitive surface was formed
Fold generates different sclerous reactions under light illumination after being contacted with egative film, ultimately forms printing plate.Its specific technological process is：According to
Phase-colour-separation drafting-plate-making-printing.Wherein printing down is the core process of collotype printing, and can the light exposure control of photosensitive liquid is
The key for the printing plate got well is the condition of collotype printing indispensability.The process of plate-making is that ground glass is cleaned up drying
Afterwards, it is dried in 60 DEG C or so of incubator after painting photosensitive liquid, the glued membrane that photosensitive liquid is formed will produce uniform fine corrugations.It will
The egative film fixed is placed on exposure in printing-down box together with being applied with the one side of glued membrane.Photoresists mainly absorb ultraviolet and short wavelength red
Light, photosensitive rear glued membrane can harden.The energy of photosensitive absorption is more, and fold will be deeper, and tone is darker, otherwise tone then becomes clear.
Material is thus formed the images with egative film reverted image.The drying after rinsing fixing of image glass version can be not only used for printing.
During making printing down, the image of different tones has strict requirements for light exposure.The density of egative film is got over
The high time for exposure is longer.In order to form the reverted image image of tone identical with egative film, it is necessary to the time of stringent control exposure and
Exposure dose could form the printing plate that tone is accurate, level is abundant.
Traditional collotype printing down is carried out in the sunlight under the conditions of sunny.Since the intensity of daylight is uncontrollable, and locate
In variation, therefore all it is often the length that operator rule of thumb controls the time for exposure.Under Various Seasonal noon sun
Time for exposure differed at 10 seconds to five minutes.The solidification and printing plate back side whole face is dried in the shade, the light exposure needed then very little.Therefore exist
In the process for making printing plate, success rate is not high.And limited by condition, the time for making printing plate must be at the sunny noon
Afterwards.In addition photosensitive liquid also has temperature and humidity great requirement, also to allocate the dense of photosensitive liquid according to the variation in season
Degree.These are all to be badly in need of overcoming the problems, such as in collotype printing technique.
Radiation absorption computational methods when according to collotype printing down can make the collotype printing down system using artificial light source
System, it is ensured that the consistency of illumination condition during printing down facilitates historical relic's protection worker to formulate standard printing down technique, simplifies operation
Step, the succession of power-assisted tradition collotype mask-making technology.
Invention content
The object of the present invention is to provide a kind of collotype printing down radiation absorption computational methods.
The present invention is distributed by the spectral irradiance of measurement daylight and the spectral absorption curve of collotype printing down photoresists,
Net long wave radiation absorbed flux of the photoresists to daylight is calculated, then by the spectral power distribution of artificial light sources, determination reaches
The radiant energy flux of artificial light sources needed for identical Net long wave radiation absorbed flux obtains corresponding artificial light after finally considering radiation efficiency
The input power in source.Specifically include following steps：
(1) spectral absorptance of photoresists is calculated：Measure the logarithm absorptivity K of dry-film resista(λ) namely incident light
With the logarithm of emergent light ratio：
Wherein, Pi(λ) and Po(λ) is respectively the radiation flux of incident light and emergent light, it can thus be concluded that：
The radiation absorption flux P of photoresistsa(λ) is：
It is consequently possible to calculate going out spectral absorptance S (λ)：
(2) the Net long wave radiation absorbed flux F of photoresists under daylight is calculatedeff,s：The sunny afternoon daylight of survey calculation it is exhausted
E is distributed to spectral irradiances(λ).The effective irradiance that daylight is absorbed by photoresists is Eeff,s, unit Wm-2, that is, have：
Eeff,s=∫ S (λ) Es(λ)dλ； (5)
Then collotype sensitive glue absorbs the Net long wave radiation absorbed flux F of daylighteff,sFor：
Feff,s=Eeff,sA, (6)
Wherein, A is photoresists area, unit m2；
(3) proportionate relationship of the radiant energy flux and Net long wave radiation absorbed flux of artificial light sources is determined：Measure the phase of artificial light sources
E ' is distributed to spectral irradiancem(λ), then corresponding effective irradiance E ' under this conditioneff,mFor：
E′eff,m=∫ S (λ) E 'm(λ)dλ； (7)
Net long wave radiation absorbed flux is：
F′eff,m(λ)=E 'eff,mA； (8)
The corresponding irradiation level of the condition is：
E′m=∫ E 'm(λ)dλ； (9)
Radiant energy flux is：
F′m(λ)=E 'mA； (10)
Then the Net long wave radiation absorbed flux of artificial light source is with radiant energy flux ratio beta：
(4) radiant energy flux and input power of the artificial light sources needed for calculating：The Net long wave radiation of required artificial light source absorbs logical
Measure, i.e. F identical as daylighteff,m=Feff,s, then needed for artificial light sources radiant energy flux FmFor：
Fm=Feff,m/β； (12)
According to the radiation efficiency η of the artificial light sources, required input power P can be calculatedmFor：
Pm=Fm/η. (13)
The present invention further uses fiber spectrometer and spectral radiometer measures the absolute spectral irradiance distribution E of daylights
(λ)：Fiber spectrometer measures the relative spectral irradiation level E that wave-length coverage is 200~1050nmUVr(λ)；Spectral radiometer measures
Wave-length coverage is the absolute spectral irradiance E of 350~800nmVis(λ), unit Wm-2·nm-1；To obtain 300~800nm
The absolute spectrum of wave band defines the proportionality coefficient α at 350nm：
In this way, can be obtained the absolute spectral irradiance E of 300~350nm ultraviolet bandsUV(λ) is：
EUV(λ)=α EUVr(λ)； (15)
The spectrum of two wave bands is merged, can obtain daylight 300~800nm wave bands absolute spectral irradiance Es(λ)。
In the present invention, the photoresists used are certain density potassium bichromate and ammonium dichromate solution and lead nitrate solution
Mixed solution, reaction form plumbous chromate, and form light-sensitive surface after mixing drying with gelatin.
In the present invention, used artificial light source includes ultraviolet LED, monochromatic visible light LED, white light LEDs etc..
The present invention proposes collotype printing down radiation absorption computational methods, and printing plate can quantitatively be calculated in printing down process
In Net long wave radiation absorbed flux, reach identical printing down solidification effect thereby using artificial light source, and during ensuring printing down
Illumination consistency, convenient for historical relic's protection worker formulate standard printing down technique, simplify operating procedure, power-assisted tradition collotype system
The succession of version technique.
Description of the drawings
Fig. 1 is the spectral absorption curve of photoresists.
Fig. 2 is the relative spectral irradiation level curve for the daylight that fiber spectrometer measurement obtains.
Fig. 3 is the absolute light spectral irradiation curve for the daylight that spectral radiometer measurement obtains.
Fig. 4 is Net long wave radiation absorption curve of the photoresists to daylight.
Fig. 5 is the absolute light spectral irradiation curve of ultraviolet LED light source.
Fig. 6 is Net long wave radiation absorption curve of the photoresists to ultraviolet LED light source.
Fig. 7 is the relative spectral irradiation level curve of the white LED light source of colour temperature 6500K.
Fig. 8 is white LED light source Net long wave radiation absorption curve of the photoresists to colour temperature 6500K.
Specific implementation mode
Below in conjunction with drawings and examples, the present invention will be further described.Daylight described embodiment is only this hair
Bright section Example.Other all embodiments for not making creative achievement based on the embodiments of the present invention and, belong to
Protection scope of the present invention.
The spectrum logarithm absorptivity K of photoresists samplea(λ) uses the bis- light of TU-1900 of Beijing Pu Xi general instrument Corp.s
Beam measurement of ultraviolet-visible spectrophotometer, spectrum interval 1nm, measurement range are 300nm~800nm.Measuring environment chooses nothing
The sun deck blocked, data acquisition time choose fair weather 13:30 or so.Thus spectral absorptance S (λ) is calculated
Curve is as shown in Figure 1.
The day of 200~1050nm is measured using the HR4000CG-UV-NIR high resolution spectrometers of Ocean Optics
Light relative spectral irradiance distribution using the PLA-20 spectral radiometers of distant place company as shown in Fig. 2, obtained 350~800nm days
The absolute spectral irradiance distribution of light is as shown in Figure 3.Thus obtain daylight 300~800nm absolute spectral irradiance Es(λ),
Net long wave radiation absorption curve S (λ) E of photoresists to daylight can be calculateds(λ), as shown in Figure 4.Take wavelength interval be Δ λ=
When 1nm, daylight is converted by the effective irradiance calculation formula that photoresists absorb：
The effective irradiance that daylight is calculated according to Fig. 4 is 115.0W m-2.Photoresists area is 0.84m2, then daylight
Net long wave radiation absorbed flux be 96.6W.
Artificial light source uses 385nm ultraviolet LED light sources, spectral irradiance to be distributed E 'm(λ) is as shown in figure 5, then photoresists
To Net long wave radiation absorption curve S (λ) E ' of ultraviolet LED light sourcem(λ) is as shown in Figure 6.Due to the radiated wave of the ultraviolet LED light source
Long ranging from 350~450nm, absorptivity of photoresists is all 1 within the scope of this, is led to so the Net long wave radiation of the ultraviolet LED absorbs
Ratio beta=1.00 of amount and radiant energy flux.Therefore the radiant energy flux of the ultraviolet LED needed for is Net long wave radiation absorbed flux 96.6W.It presses
It is calculated according to radiation efficiency 40%, then the input power of required ultraviolet LED is 241.5W.
Artificial light source uses the white LED light source of colour temperature 6500K, and relative spectral irradiance distribution is as shown in fig. 7, then feel
Optical cement is as shown in Figure 8 to the Net long wave radiation absorption curve of the white LED light source.Effective spoke of the white LED light source is calculated
Ratio beta=0.43 of absorbed flux and radiant energy flux is penetrated, therefore to reach the white light LEDs spoke needed for printing down effect identical with daylight
Flux is 224.7W.It is 35% according to the radiation efficiency of the white LED light source is tested, then required electrical power is 641.9W.
The above result of calculation shows the 6500K color temperature white lights of 385nm ultraviolet LED light sources or 641.9W using 241.5W
LED can substitute daylight and carry out collotype printing down.Since artificial light source is stable light emitting source, unlike daylight has change at any time
Change, therefore illumination condition consistency is good, it may be determined that copying time is convenient for formulation standard printing down technique.
Claims (5)
1. collotype printing down radiation absorption computational methods, which is characterized in that by measure daylight spectral irradiance distribution and
The spectral absorption curve of collotype printing down photoresists calculates Net long wave radiation absorbed flux of the photoresists to daylight, then passes through
The spectral power distribution of artificial light sources determines the radiant energy flux for reaching the artificial light sources needed for identical Net long wave radiation absorbed flux, with
And the input power of corresponding artificial light sources is obtained after radiation efficiency.
2. collotype printing down radiation absorption computational methods according to claim 1, which is characterized in that the specific steps are：
(1) the spectral absorptance S (λ) of photoresists is calculated：
Measure the logarithm absorptivity K of dry-film resistaThe logarithm of (λ) namely incident light and emergent light ratio：
Wherein, Pi(λ) and Po(λ) is respectively the radiation flux of incident light and emergent light, thus：
The radiation absorption flux P of photoresistsa(λ) is：
Calculating spectral absorptance S (λ) as a result, is：
(2) the Net long wave radiation absorbed flux F of photoresists under daylight is calculatedeff,s：
The absolute spectral irradiance of the sunny afternoon daylight of survey calculation is distributed Es(λ)；The effective irradiation that daylight is absorbed by photoresists
Degree is Eeff,s, unit Wm-2, that is, have：
Eeff,s=∫ S (λ) Es(λ)dλ； (5)
Then collotype sensitive glue absorbs the Net long wave radiation absorbed flux F of daylighteff,sFor：
Feff,s=Eeff,sA, (6)
Wherein, A is photoresists area, unit m2；
(3) ratio beta of the radiant energy flux and Net long wave radiation absorbed flux of artificial light sources is determined：
Measure the relative spectral irradiance distribution E ' of artificial light sourcesm(λ), then corresponding effective irradiance E ' under this conditioneff,mFor：
E′eff,m=∫ S (λ) E 'm(λ)dλ； (7)
Net long wave radiation absorbed flux F 'eff,m(λ) is：
F′eff,m(λ)=E 'eff,mA； (8)
The corresponding irradiation level E ' of the conditionmFor：
E′m=∫ E 'm(λ)dλ； (9)
Radiant energy flux F 'm(λ) is：
F′m(λ)=E 'mA； (10)
Then the Net long wave radiation absorbed flux of artificial light source is with radiant energy flux ratio beta：
(4) the radiant energy flux F of the artificial light sources needed for calculatingmWith input power Pm：
The Net long wave radiation absorbed flux of required artificial light source is identical as daylight, i.e. Feff,m=Feff,s, then needed for artificial light sources
Radiant energy flux FmFor：
Fm=Feff,m/β； (12)
According to the radiation efficiency η of the artificial light sources, required input power P is calculatedmFor：
Pm=Fm/η. (13)。
3. collotype printing down radiation absorption computational methods according to claim 2, which is characterized in that use fiber spectrometer
The absolute spectral irradiance that daylight is measured with spectral radiometer is distributed Es(λ)：
The relative spectral irradiation level E that wave-length coverage is 200~1050nm is measured with fiber spectrometerUVr(λ)；
The absolute spectral irradiance E that wave-length coverage is 350~800nm is measured with spectral radiometerVis(λ), unit Wm-2·
nm-1；To obtain the absolute spectrum of 300~800nm wave bands, the proportionality coefficient α at 350nm is defined：
In this way, obtaining the absolute spectral irradiance E of 300~350nm ultraviolet bandsUV(λ) is：
EUV(λ)=α EUVr(λ)； (15)
The spectrum of two wave bands is merged, obtain daylight 300~800nm wave bands absolute spectral irradiance Es(λ)。
4. collotype printing down radiation absorption computational methods according to claim 2, which is characterized in that the photoresists used are
Certain density potassium bichromate and ammonium dichromate solution and lead nitrate solution mixed solution, reaction form plumbous chromate, and and gelatin
Light-sensitive surface is formed after mixing drying.
5. collotype printing down radiation absorption computational methods according to claim 2, which is characterized in that used artificial light
Source is ultraviolet LED, monochromatic visible light LED or white light LEDs.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108628111A (en) * | 2018-05-15 | 2018-10-09 | 复旦大学 | Edition system is shone using the collotype of ultraviolet LED light source |
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- 2018-04-04 CN CN201810302238.8A patent/CN108645801A/en active Pending
Non-Patent Citations (1)
| Title |
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| 李明昊等: "LED光谱对珂罗版感光胶固化效果的影响研究", 《光源与照明》 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108628111A (en) * | 2018-05-15 | 2018-10-09 | 复旦大学 | Edition system is shone using the collotype of ultraviolet LED light source |
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