CN108579449A - A kind of method of the high silicon SSZ-13 molecular screen membranes of Fast back-projection algorithm - Google Patents

A kind of method of the high silicon SSZ-13 molecular screen membranes of Fast back-projection algorithm Download PDF

Info

Publication number
CN108579449A
CN108579449A CN201810455775.6A CN201810455775A CN108579449A CN 108579449 A CN108579449 A CN 108579449A CN 201810455775 A CN201810455775 A CN 201810455775A CN 108579449 A CN108579449 A CN 108579449A
Authority
CN
China
Prior art keywords
ssz
colloidal sol
molecular screen
screen membranes
sol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201810455775.6A
Other languages
Chinese (zh)
Other versions
CN108579449B (en
Inventor
周荣飞
宋世超
高峰
李新平
王斌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nanjing Tech University
Original Assignee
Nanjing Tech University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanjing Tech University filed Critical Nanjing Tech University
Priority to CN201810455775.6A priority Critical patent/CN108579449B/en
Publication of CN108579449A publication Critical patent/CN108579449A/en
Application granted granted Critical
Publication of CN108579449B publication Critical patent/CN108579449B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D71/00Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02Inorganic material
    • B01D71/028Molecular sieves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D53/228Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D67/00Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039Inorganic membrane manufacture
    • B01D67/0044Inorganic membrane manufacture by chemical reaction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D69/00Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
    • B01D69/10Supported membranes; Membrane supports
    • B01D69/105Support pretreatment
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10LFUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G, C10K; LIQUEFIED PETROLEUM GAS; ADDING MATERIALS TO FUELS OR FIRES TO REDUCE SMOKE OR UNDESIRABLE DEPOSITS OR TO FACILITATE SOOT REMOVAL; FIRELIGHTERS
    • C10L3/00Gaseous fuels; Natural gas; Synthetic natural gas obtained by processes not covered by subclass C10G, C10K; Liquefied petroleum gas
    • C10L3/06Natural gas; Synthetic natural gas obtained by processes not covered by C10G, C10K3/02 or C10K3/04
    • C10L3/10Working-up natural gas or synthetic natural gas
    • C10L3/101Removal of contaminants
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10LFUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G, C10K; LIQUEFIED PETROLEUM GAS; ADDING MATERIALS TO FUELS OR FIRES TO REDUCE SMOKE OR UNDESIRABLE DEPOSITS OR TO FACILITATE SOOT REMOVAL; FIRELIGHTERS
    • C10L3/00Gaseous fuels; Natural gas; Synthetic natural gas obtained by processes not covered by subclass C10G, C10K; Liquefied petroleum gas
    • C10L3/06Natural gas; Synthetic natural gas obtained by processes not covered by C10G, C10K3/02 or C10K3/04
    • C10L3/10Working-up natural gas or synthetic natural gas
    • C10L3/101Removal of contaminants
    • C10L3/102Removal of contaminants of acid contaminants
    • C10L3/104Carbon dioxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2256/00Main component in the product gas stream after treatment
    • B01D2256/24Hydrocarbons
    • B01D2256/245Methane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/10Single element gases other than halogens
    • B01D2257/102Nitrogen
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2257/00Components to be removed
    • B01D2257/50Carbon oxides
    • B01D2257/504Carbon dioxide
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/20Capture or disposal of greenhouse gases of methane
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/40Capture or disposal of greenhouse gases of CO2

Abstract

The present invention relates to a kind of preparation methods of high 13 molecular screen membranes of silicon SSZ.Molecular screen membrane includes the crystalline film and supporter for having Selective Separation, and crystalline film is overlying on supporting body surface;The crystalline film of Selective Separation is made of 13 molecular sieves of SSZ;The supporter is Al2O3, mullite or stainless steel.13 molecular screen membranes of SSZ are quickly prepared by way of adding nucleus and oil bath heating.Film layer prepared by the method is fine and close, and more traditional mode of heating is compared, and film generated time is greatly shortened while ensureing the separating property of film.Structure directing agent is removed in ozone atmosphere simultaneously, effectively prevents the generation of crystal defect in knockout course.13 molecular screen membranes of SSZ prepared by the method are to CO2/CH4And N2/CH4Mixed gas has good separating property, can be used for purification of natural gas.

Description

A kind of method of the high silicon SSZ-13 molecular screen membranes of Fast back-projection algorithm
Technical field
The present invention provides a kind of preparation method of high silicon SSZ-13 molecular screen membranes, belong to zeolite membrane material preparation and Detach application field.
Background technology
As current petroleum resources are increasingly deficient, natural gas is as one of world today's energy mainstay, and people are to it Development and utilization also more and more paid attention to.In explored natural gas, in addition to main component methane gas, it includes Major impurity gas also has carbon dioxide and nitrogen, they can reduce the combustion heat value of combustion gas, it is therefore desirable to preceding by it utilizing Separation.Currently used separation method includes mainly solvent absorption, UF membrane, pressure-variable adsorption, cryogenic rectification etc..Wherein UF membrane Technology since low energy consumption, the advantages such as easy to operate and it is of increasing concern.
In recent years, the application of molecular screen membrane in this respect is gradually paid attention to, because it has higher chemical stability And thermal stability, even if in some complicated working environments, molecular screen membrane can still keep preferable separating property.It is so far Only, the Large pore molecular sieve membrane that a batch can be used for gas separation, such as FAU, MFI etc. have been prepared.But due to these molecular screen membranes Crystal pore size itself is too big, therefore micro-molecular gas system difficult to realize(Such as N2/CH4And CO2/CH4)Efficiently separate.
Compared to these Large pore molecular sieve membranes, microporous molecular sieve membrane has prodigious advantage in this respect, because it has Smaller pore passage structure, therefore can be used for detaching some small gas molecules.Wherein SSZ-13 is a kind of molecule for CHA structure Sieve, its effective pore size is the nm of 0.38 nm × 0.38, between carbon dioxide(0.33 nm), nitrogen(0.372 nm)With Methane(0.38 nm)Kinetic diameter between, along with SSZ-13 molecular sieves itself to carbon dioxide have Preferential adsorption, So that SSZ-13 molecular sieves are to CO2/CH4Separation when be better than other Large pore molecular sieve membranes.
In the preparation method of existing SSZ-13 molecular screen membranes, what is mainly used is all conventional hydrothermal synthesis.Halil Kalipcilar etc. (Chem .Mater., 14 (2012), 3458-3464) SSZ- that hydrothermal synthesis 5d is prepared at 433K 13 molecular screen membranes(Si/Al=20)To CO2/CH4, H2/CH4Separation factor be respectively 12 and 8.2.2014, Nikolay Kosinov etc.(J. Mater. Chem. A, 2(2014), 13083-13092)With Al2O3Doughnut is carrier, in 433K Lower hydrothermal synthesis 144h prepares SSZ-13 molecular screen membranes(Si/Al=100), to CO at 0.6 MPa2/CH4Separation factor reach To 42.Zheng Yihong etc.(Journal of Membrane Science 475(2015), 303–310)With TMAdaOH and TEAOH For mixed structure directed agents high performance SSZ-13 molecular screen membranes are prepared in mullite carrier outer surface(Si/Al=20), the conjunction Film forming is not only to CO2/CH4Separation selectivity reach 300, and to C2H4/C2H6Also there is a preferable separating property, but film Infiltration rate is relatively low, such as CO2Infiltration rate is 2.0 × 10-7 mol/(m2 s Pa)。
Within past several years, researchers achieved in terms of the synthesis of SSZ-13 molecular screen membranes it is certain into Exhibition, but it is generally long to the generated time of SSZ-13 molecular screen membranes at present(≥4d), this make the film layer synthesized partially thick and Thickness low LCL is uniform, more seriously, and a large amount of crystal are also grown inside supporter, seriously affect the infiltration rate of film.It carries High film layer crystallization velocity can effectively reduce crystal in supporter growth inside so that surface growth obtains apparent competitive advantage, obtains Obtain the SSZ-13 molecular screen membranes of high-throughput and high uniform surface growth.The preparation of SSZ-13 molecular screen membranes is all made of common baking at present Case heats, and the efficiency of air as a heat transfer medium is low, if excessive shortening crystallization time, and film layer can be caused not fine and close enough, Influence its separating property.
Invention content
The purpose of the invention is to improve the preparation method of existing high silicon SSZ-13, especially by addition effective nucleation And the method for combining oil bath heating, so that generated time is greatly shortened, reduces the consumption of the building-up process energy;And it uses at low temperature Ozone removes the structure directing agent in molecular sieve pore passage, effectively prevents the generation of defect in knockout course.It is prepared with the method SSZ-13 molecular screen membranes are to CO2/CH4And N2/CH4With excellent separating property.The present invention will be helpful to SSZ-13 molecular screen membranes Industrial amplification production.
For achieving the above object, the present invention adopts the following technical scheme that:
A kind of method of the high silicon SSZ-13 molecular screen membranes of Fast back-projection algorithm, steps are as follows:
(1)The preparation of SSZ-13 molecular sieves:
It is prepared by SSZ-13 molecular sieve seeds:By alkali source, structure directing agent(SDA)It is mixed to form Sol A with silicon source, by silicon source and water It is mixed to form sol B, forming crystal seed after Sol A and B mixing prepares colloidal sol, and colloidal sol constitutive molar ratio is:SiO2/Al2O3=20~ 60、Na2O/SiO2=0.05~0.2、H2O/SiO2=30~60、SDA/SiO2=0.05 ~ 0.5, colloidal sol is in 65-120oAging 24- under C 72h forms nucleus colloidal sol M;The colloidal sol prepared again with identical proportioning and step is in 20-40o0.5-3h is stirred under C forms colloidal sol S, By nucleus colloidal sol M and colloidal sol S with mass ratio M:S=0.05 ~ 0.5 mixes;Above-mentioned colloidal sol is fitted into reaction kettle, 110 ~ 200oC reacts 5-24h, takes out, cooling, centrifuges, and washing obtains SSZ-13 molecular sieve seeds after dry;Molecular sieve after drying is brilliant Kind calcining, then after 5 ~ 15h of ball-milling treatment, it is spare.
(2)The pretreatment of porous supporting body:Weigh appropriate step 1)Molecular sieve seed is added in ethanol solution, through super Crystal seed is evenly dispersed in dispersed phase solution after sound and concussion processing, forms uniform suspension, suspension quality score For 0.01-2%;In a manner of vacuumizing by molecular sieve seed suspension on supporter, holding vacuum degree is 0.01- 0.08 MPa, suction time 5-90s, then at the uniform velocity proposes from suspension, after oven drying is handled, in supporting body surface Form continuous fine and close molecular sieve crystal layer.
(3)The preparation of SSZ-13 molecular screen membranes
The preparation of SSZ-13 molecular screen membranes:Alkali source, structure directing agent and silicon source are mixed to form Sol A, silicon source is mixed with water Sol B is formed, forming crystal seed after Sol A and B mixing prepares colloidal sol, and colloidal sol constitutive molar ratio is:SiO2/Al2O3=80~250、 Na2O/SiO2=0.05~0.5、H2O/SiO2=30~200、SDA/SiO2=0.05 ~ 0.5, colloidal sol is in 65-120oAging 24- under C 72h forms nucleus colloidal sol M;The colloidal sol that identical proportioning and step are prepared is in 20-40o0.5-3h is stirred under C forms colloidal sol S, it will be brilliant Core colloidal sol M and colloidal sol S are with mass ratio M:S=0.05-0.5 is mixed;Above-mentioned colloidal sol is fitted into reaction kettle, by step(2)It is coated with crystalline substance In the supporter merging colloidal sol of kind, 110 ~ 200oC reacts 6-36h and forms film layer;It is cleaned, it is dry, it is calcined under ozone atmosphere Obtain SSZ-13 molecular screen membranes.
Step of the present invention(2)In selected support body material be aluminium oxide, mullite, stainless steel;Support shape be Tubulose, sheet and doughnut.
Preferably, the present invention is in step(3)Middle mode of heating is oil bath.
Step of the present invention(2)The seed density that middle vacuum crystal method obtains is 0.5 ~ 2.5mg/cm2
The silicon source is aluminium hydroxide, sodium metaaluminate, the thin stone of aluminium, aluminium isopropoxide, Tributyl aluminate, aluminium foil, aluminium powder or oxygen Change aluminium.
The silicon source is Ludox, tetraethyl orthosilicate, positive quanmethyl silicate, sodium metasilicate, waterglass or silica flour.
The structure directing agent is N, N, N- front three adamantyls ammonium hydroxide, N, N, N- front three adamantyl bromines Change ammonium, N, N, N- front three adamantyls ammonium iodide, N, N, N- trimethyl benzyls ammonium hydroxide, N, N, N- trimethyl benzyl brominations One or more combinations of ammonium, N, N, N- trimethyl benzyls ammonium iodide or tetraethyl ammonium hydroxide.
It is carried out in the structure directing agent removing preferred ozone atmosphere of mode, ozone(Ozone/oxygen gas)It is excellent 1 ~ 50% is selected, calcination temperature preferably 150 ~ 300oC, calcination time preferably 5 ~ 48 h, heat up rate of temperature fall 0.5 ~ 10oC/min。
SSZ-13 molecular screen membranes prepared by aforesaid way are mainly used for gas separation, and concrete application system is CO2/CH4With N2/CH4
Beneficial effects of the present invention:
(1)By solution of the addition with effective nucleation in synthesizing colloidal sol in film, the method that oil bath heating is used in combination replaces the present invention Traditional mode of heating effectively shortens the generated time of high silicon SSZ-13 molecular screen membranes, has saved being prepared into for molecular screen membrane This, is conducive to industrial production.
(2)The method for the removing structure directing agent that the present invention is taken carries out in a certain concentration atmosphere in ozone, This method reduce the temperature of tradition removing structure directing agent, effectively prevent SSZ-13 molecular sieve crystals and supporter under high temperature The coefficient of expansion unmatched problem forms intergranular defect when avoiding de- structure directing agent, reduces the separating property of film.
Description of the drawings
Fig. 1 is XRD diagram before and after 1 SSZ-13 molecular sieve seed ball millings of embodiment.
Fig. 2 is SEM figures before and after 1 SSZ-13 molecular sieve seed ball millings of embodiment:Wherein(a)For SSZ-13 molecules before ball milling Crystal seed is sieved,(b)For SSZ-13 molecular sieve seeds after ball milling.
Fig. 3 is the SSZ-13 molecular screen membrane XRD diagram prepared by embodiment 1 ~ 4, wherein with * being supporter diffraction maximum.
Fig. 4 is the SSZ-13 molecular screen membranes SEM figures prepared by embodiment 1.
Fig. 5 is the SSZ-13 molecular sieve seed XRD diagram prepared by embodiment 13.
Specific implementation mode
In order to further describe the present invention, implementation specific embodiments of the present invention are given below, but the present invention is claimed Range be not limited to embodiment.
Embodiment 1
The mode that the present invention prepares SSZ-13 molecular sieves is specific as follows:
Step 1:It is prepared by SSZ-13 molecular sieve seeds.By sodium hydroxide, N, N, N- front three adamantyl ammonium hydroxide (TMAdaOH)Be added in deionized water with aluminium hydroxide, be stirred at room temperature 30 min, form Sol A, by Ludox and go from Sub- water is uniformly mixed, and 10 min of stirring form sol B.Sol A and sol B are mixing uniformly to form crystal seed and prepare colloidal sol.Most The molar ratio of colloidal sol is SiO afterwards2/Al2O3=20、Na2O/SiO2=0.05、H2O/SiO2=30、SDA/SiO2=0.05.By preparation Colloidal sol is 65o72 H-shaped of burin-in process is at crystal seed nucleus colloidal sol M under C;The colloidal sol that identical preparation process is prepared is 20oUnder C It stirs 3h and forms colloidal sol S.By nucleus colloidal sol M and colloidal sol S with mass ratio M:S=0.05 is mixed, and synthesis colloidal sol molar ratio is constant.It waits for After stirring evenly, above-mentioned colloidal sol is fitted into reaction kettle, 110oC reacts for 24 hours, takes out, cooling, centrifuges, washing, after dry Obtain SSZ-13 crystal seeds.By the molecular sieve seed 550 after dryingoStructure directing agent in C calcining removal molecular sieve pore passages, will It is spare after molecular sieve after calcining takes out 15 h of ball-milling treatment.The SSZ-13 molecular sieve seeds prepared with the method are denoted as S1.
Step 2:The pretreatment of porous supporting body.It weighs 1 crystal seed of suitable embodiment to be added in ethanol solution, through super Crystal is evenly dispersed in dispersed phase solution after sound and concussion processing and forms uniform molecular sieve suspension, suspension quality Score is 0.2%.0.08MPa vacuumizes 5s by molecular sieve crystal coated on aluminium oxide sheet supporter, is handled through oven drying Afterwards, the molecular sieve crystal layer of continuous densification is formed in supporting body surface, seed density is 1.5 mg/cm2
Step 3:It is prepared by SSZ-13 molecular screen membranes.By sodium hydroxide, structure directing agent TMAdaOH and aluminium hydroxide in room It is sufficiently stirred 30 min under temperature and forms Sol A, Ludox is added in deionized water, sol B is formed after stirring 20 min, it will be molten Glue A is added in sol B, and the colloidal sol molar ratio finally obtained is:SiO2/Al2O3=80、Na2O/SiO2=0.05、H2O/SiO2=30、 SDA/SiO2=0.05, colloidal sol is 65oAging 72h forms nucleus colloidal sol M under C;The colloidal sol that identical proportioning and step are prepared is 20oC Lower stirring 3h forms colloidal sol S, by nucleus colloidal sol M and colloidal sol S with mass ratio M:S=0.05 is mixed, and colloidal sol molar ratio is not after mixing Become;Above-mentioned colloidal sol is fitted into reaction kettle, will be coated in the supporter merging colloidal sol of crystal seed, in oil bath 180oC reactions 6h is formed Film layer;Cleaning, it is dry.
Step 4:The removing of structure directing agent.The removing of structure directing agent, ozone are carried out in ozone atmosphere (Ozone/oxygen gas)It is 50%, calcination temperature 200oC, calcination time are 2 d, and heat up rate of temperature fall preferably 0.5oC/min.It will SSZ-13 molecular screen membranes after calcining are denoted as M1.
XRD diagram and SEM figures are as depicted in figs. 1 and 2 before and after SSZ-13 molecular sieve seed ball millings.XRD diagram is shown before and after ball milling Diffraction maximum and standard card on peak type fit like a glove, crystallinity is higher, crystal be pure phase CHA structure.From electron microscope(Figure 2)In as can be seen that crystal after ball milling by apparent broken, be conducive to coat crystal seed combined on supporter it is more firm Gu.Crystal grain average grain diameter is 200nm before ball milling, and average grain diameter is 80nm after ball milling.
The XRD diagram of film M1(Such as Fig. 3)Show that synthesizing film has complete CHA structure.Fig. 4 is the SEM figures of M1, it can be seen that is closed Film formation surface is continuously fine and close.Film M1 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.It is testing Condition be 0.2 MPa, 25oWhen C, film M1 is to CO2/CH4Separation selectivity be 95.6, to N2/CH4Separation selectivity be 8.0, corresponding CO2Infiltration rate is 6.6 × 10-7 mol/(m2S Pa), N2Infiltration rate be 5.2 × 10-8 mol/(m2 s Pa)。
Embodiment 2
The operating procedure of use such as embodiment 1, except that the structure directing agent in step 3 used in film synthesis is N, N, N- front three adamantyl ammonium bromide, used silicon source are sodium metaaluminate.The SSZ-13 molecular screen membranes prepared with the method It is denoted as M2.
The XRD diagram of film M2(Such as Fig. 3)Show that synthesizing film has complete CHA structure.Film M2 is in CO2/CH4And N2/CH4System Separating property difference it is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 3
The operating procedure of use such as embodiment 1, except that the aging temperature of nucleus colloidal sol M is 120 in step 3 oC, aging Time is that for 24 hours, the silicon source used in film synthesis is aluminium oxide, and silicon source is positive quanmethyl silicate.The SSZ-13 molecules of preparation Sieve membrane is denoted as M3.
The XRD diagram of film M3(Such as Fig. 3)Show that synthesizing film has complete CHA structure.Film M3 is in CO2/CH4And N2/CH4System Separating property difference it is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 4
The operating procedure of use such as embodiment 1, except that the silicon source in step 3 used in film synthesis is aluminium foil, institute The structure directing agent used is N, N, N- front three adamantyl ammonium iodides.The SSZ-13 molecular screen membranes prepared with the method are denoted as M4。
The XRD diagram of film M4(Such as Fig. 3)Show that synthesizing film has complete CHA structure.Film M4 is in CO2/CH4And N2/CH4System Separating property difference it is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 5
The operating procedure of use such as embodiment 1, except that the silicon source used in step 3 is aluminium powder, used structure Directed agents are N, and N, N- trimethyl benzyl ammonium iodides, silicon source used is tetraethyl orthosilicate.And point used in step 2 The mass fraction of son sieve suspension is 2%, and molecular sieve seed is coated on stainless steel supporter equally in a manner of vacuumizing, After oven drying is handled, the molecular sieve crystal layer of continuous densification, seed density 2.5mg/cm are formed in supporting body surface2。 The SSZ-13 molecular screen membranes prepared with the method are denoted as M5.
Film M5 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa With 25oC。
Embodiment 6
The operating procedure of use such as embodiment 1, except that the quality point of the molecular sieve suspension used in step 2 Number is 0.01%, and molecular sieve seed is coated on supporter equally in a manner of vacuumizing, after oven drying is handled, is being propped up Support body surface forms the molecular sieve crystal layer of continuous densification, seed density 0.5mg/cm2.Step 3 is preparing SSZ-13 molecules When sieve membrane synthesizes colloidal sol, silicon source is aluminium isopropoxide, and silicon source is waterglass, and the molar ratio of each component is in the Synthesis liquid: SiO2/Al2O3=250、Na2O/SiO2=0.1、H2O/SiO2=50、SDA/SiO2=0.3.The SSZ-13 molecular screen membranes prepared with the method It is denoted as M6.
Film M6 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa With 25oC。
Embodiment 7
The operating procedure of use such as embodiment 1, except that using vacuum pumping method in hollow fiber oxygen in step 2 Change aluminium support body surface and coat crystal seed, the time of 0.01MPa suctions is 90 s, is then at the uniform velocity proposed from suspension, through baking oven After drying process, the molecular sieve crystal layer of continuous densification is formed in supporting body surface.The SSZ-13 molecular screen membranes prepared with the method It is denoted as M7.
Film M7 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa With 25oC。
Embodiment 8
The operating procedure of use such as embodiment 1, except that structure directing agent is tetraethyl ammonium hydroxide, silicon in step 3 Source is sodium metasilicate, by nucleus colloidal sol M and colloidal sol S with mass ratio M:S=0.5 is mixed.Colloidal sol is synthesized preparing SSZ-13 molecular screen membranes When, the molar ratio of each component is in the Synthesis liquid:SiO2/Al2O3=100、Na2O/SiO2=0.5、H2O/SiO2=200、 SDA/SiO2=0.5.The SSZ-13 molecular screen membranes prepared with the method are denoted as M8.
Film M8 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa With 25oC。
Embodiment 9
The operating procedure of use such as embodiment 1, except that the temperature that will be calcined when removing structure directing agent in step 4 Become 300oC, time are 15 h.The SSZ-13 molecular screen membranes prepared with the method are denoted as M9.
Film M9 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa With 25oC。
Embodiment 10
The operating procedure of use such as embodiment 1, except that when removing structure directing agent in step 4, ozone (Ozone/oxygen gas)It is 1%, temperature 150oC, time 48h, heating and rate of temperature fall are 10oC/min.It is prepared with the method SSZ-13 molecular screen membranes be denoted as M10.
Film M10 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 11
The operating procedure of use such as embodiment 1, except that synthesis temperature is 110 in step 3oC, generated time 36 h.The SSZ-13 molecular screen membranes prepared with the method are denoted as M11.
Film M11 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 12
The operating procedure of use such as embodiment 1, except that synthesis temperature is 200 in step 3oC, generated time 6 H, the supporter used is porous mullite pipe.The SSZ-13 molecular screen membranes prepared with the method are denoted as M12.
Film M12 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Embodiment 13
The operating procedure of use such as embodiment 1, except that the constitutive molar ratio of colloidal sol is SiO in step 12/Al2O3= 60、Na2O/SiO2=0.2、H2O/SiO2=60、SDA/SiO2=0.5;Nucleus colloidal sol M treatment conditions are 120oBurin-in process 24 under C h;The colloidal sol that identical preparation process is prepared is 40o0.5h is stirred under C forms colloidal sol S.The matter of the nucleus colloidal sol M and colloidal sol S of addition Amount compares M:S=0.5, it is to be mixed uniformly after, above-mentioned colloidal sol is fitted into reaction kettle, 200 oCReact 5h.It takes out, cooling, centrifugation is washed It washs, SSZ-13 crystal seeds is obtained after dry.By the molecular sieve seed 550 after dryingoStructure in C calcining removal molecular sieve pore passages Molecular sieve seed after calcining is taken out 5 h of ball-milling treatment by directed agents.The SSZ-13 molecular sieve seeds prepared with the method are denoted as S2.Crystal grain average grain diameter is 400 nm before ball milling, and average grain diameter is 200 nm after ball milling.
Fig. 5 shows equally there is CHA structure with molecular sieve prepared by the method.
Comparative example 1
The operating procedure of use such as embodiment 1, except that film is not added during synthesis with crystalline substance in step 3 Core solution M.And the brilliant clock of supporting body surface is coated in step 1 without ball-milling treatment.Film synthesizes in an oven, synthesis temperature Degree is 180oC, generated time 4d.The removing of the molecular screen membrane structure directing agent synthesized in step 4 carries out in air, forges It is 450 DEG C to burn temperature, and heating and rate of temperature fall are 1oC/min..The SSZ-13 molecular screen membranes prepared with the method are denoted as M13.
Film M13 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Comparative example 2
The operating procedure of use such as embodiment 1, except that film is not added during synthesis with crystalline substance in step 3 Core solution M, generated time 2d.The SSZ-13 molecular screen membranes prepared with the method are denoted as M14.
Film M14 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
Comparative example 3
The operating procedure of use such as embodiment 1, except that film is not added during synthesis with crystalline substance in step 3 Core solution M.And step 1 is coated in the crystal seed of supporting body surface without ball-milling treatment.Film synthesizes in an oven, synthesis temperature It is 180oC, generated time 2d.The removing of the molecular screen membrane structure directing agent synthesized in step 4 carries out in oxygen atmosphere, Calcination temperature is 400oC, heating and rate of temperature fall are 1oC/min.The SSZ-13 molecular screen membranes prepared with the method are denoted as M15.
Film M15 is in CO2/CH4And N2/CH4The separating property difference of system is as shown in Table 1 and Table 2.Test condition:0.2 MPa and 25oC。
1 SSZ-13 molecular screen membranes of table are to CO2/CH4Mixed gas separating property
2 SSZ-13 molecular screen membranes of table are to N2/CH4Mixed gas separating property

Claims (9)

1.SSZ-13 the preparation method of molecular screen membrane, which is characterized in that include the following steps:
(1)It is prepared by SSZ-13 molecular sieve seeds:Alkali source, structure directing agent and silicon source are mixed to form Sol A, silicon source and water are mixed Conjunction forms sol B, and forming crystal seed after Sol A and B mixing prepares colloidal sol, and colloidal sol constitutive molar ratio is:SiO2/Al2O3=20~60、 Na2O/SiO2=0.05~0.2、H2O/SiO2=30~60、SDA/SiO2=0.05 ~ 0.5, colloidal sol is in 65-120oAging 24-72h under C Form nucleus colloidal sol M;The colloidal sol prepared again with identical proportioning and step is in 20-40o0.5-3h is stirred under C forms colloidal sol S, it will Nucleus colloidal sol M and colloidal sol S are with mass ratio M:S=0.05 ~ 0.5 mixes;Above-mentioned colloidal sol is fitted into reaction kettle, 110 ~ 200oC 5-24h is reacted, is taken out, it is cooling, it centrifuges, washing obtains SSZ-13 molecular sieve seeds after dry;By the molecular sieve seed after drying Calcining, then after 5 ~ 15h of ball-milling treatment, it is spare;
(2)The pretreatment of porous supporting body:Weigh appropriate step 1)Molecular sieve seed is added in ethanol solution, through ultrasound and Crystal seed is evenly dispersed in dispersed phase solution after concussion processing, forms uniform suspension, suspension quality score is 0.01-2%;In a manner of vacuumizing by molecular sieve seed suspension on supporter, holding vacuum degree is 0.01-0.08 MPa, suction time 5-90s, then at the uniform velocity proposes from suspension, after oven drying is handled, is formed in supporting body surface Continuous fine and close molecular sieve crystal layer;
(3)The preparation of SSZ-13 molecular screen membranes:Alkali source, structure directing agent and silicon source are mixed to form Sol A, silicon source and water are mixed Conjunction forms sol B, and forming crystal seed after Sol A and B mixing prepares colloidal sol, and colloidal sol constitutive molar ratio is:SiO2/Al2O3=80~250、 Na2O/SiO2=0.05~0.5、H2O/SiO2=30~200、SDA/SiO2=0.05 ~ 0.5, colloidal sol is in 65-120oAging 24- under C 72h forms nucleus colloidal sol M;The colloidal sol that identical proportioning and step are prepared is in 20-40o0.5-3h is stirred under C forms colloidal sol S, it will be brilliant Core colloidal sol M and colloidal sol S are with mass ratio M:S=0.05-0.5 is mixed;Above-mentioned colloidal sol is fitted into reaction kettle, by step(2)It is coated with crystalline substance In the supporter merging colloidal sol of kind, 110 ~ 200oC reacts 6-36h and forms film layer;It is cleaned, it is dry, it is calcined under ozone atmosphere Obtain SSZ-13 molecular screen membranes.
2. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that used in step 1 or 3 Oil bath heating.
3. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that the crystal seed of step 1 is Nanoscale, crystal seed prepared by step 1 are 400-600nm, and the crystal seed grain size obtained after ball milling is 80-200 nm.
4. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that vacuum crystal method obtains Seed density be 0.5 ~ 2.5mg/cm2
5. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that synthesized in step 3 The removing of the structure directing agent SDA of SSZ-13 molecular screen membranes is carried out in ozone atmosphere, and be passed through ozone accounts for the volume of oxygen Score is 1% ~ 50%, and calcination temperature is 150 ~ 300oC, 5 ~ 48 h of calcination time, heating and rate of temperature fall are 0.5-10oC/ min。
6. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that adopted in step 1 or 3 Silicon source is aluminium hydroxide, sodium metaaluminate, the thin stone of aluminium, aluminium isopropoxide, Tributyl aluminate, aluminium foil, aluminium powder or aluminium oxide.
7. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that adopted in step 1 or 3 Structure directing agent SDA is N, N, N- front three adamantyls ammonium hydroxide, N, N, N- front three adamantyls ammonium bromide, N, N, N- front three adamantyl ammonium iodide, N, N, N- trimethyl benzyls ammonium hydroxide, N, N, N- tri-methyl benzyl ammonium bromides, N, N, One or more combinations of N- trimethyl benzyls ammonium iodide or tetraethyl ammonium hydroxide.
8. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that step 13 is used Silicon source be Ludox, tetraethyl orthosilicate, positive quanmethyl silicate, sodium metasilicate, waterglass or silica flour.
9. the preparation method of SSZ-13 molecular screen membranes according to claim 1, which is characterized in that step 2 or 3 support Body material is aluminium oxide, mullite or stainless steel, and the supporter effective aperture is 0.05 ~ 3 μm, the support bodily form Shape is tubulose, sheet or hollow fiber.
CN201810455775.6A 2018-05-14 2018-05-14 Method for rapidly synthesizing high-silicon SSZ-13 molecular sieve membrane Active CN108579449B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201810455775.6A CN108579449B (en) 2018-05-14 2018-05-14 Method for rapidly synthesizing high-silicon SSZ-13 molecular sieve membrane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201810455775.6A CN108579449B (en) 2018-05-14 2018-05-14 Method for rapidly synthesizing high-silicon SSZ-13 molecular sieve membrane

Publications (2)

Publication Number Publication Date
CN108579449A true CN108579449A (en) 2018-09-28
CN108579449B CN108579449B (en) 2019-12-17

Family

ID=63637102

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201810455775.6A Active CN108579449B (en) 2018-05-14 2018-05-14 Method for rapidly synthesizing high-silicon SSZ-13 molecular sieve membrane

Country Status (1)

Country Link
CN (1) CN108579449B (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109569320A (en) * 2018-12-26 2019-04-05 韩小学 A method of mixing crystal seed method prepares pure phase SSZ-13 molecular screen membrane
CN110182826A (en) * 2019-05-17 2019-08-30 大连理工大学 A method of synthesizing hollow SSZ-13 molecular sieve
CN111547735A (en) * 2020-04-30 2020-08-18 上海工程技术大学 Controllable synthesis method of pure silicon and high-silicon CHA molecular sieve
CN112499642A (en) * 2020-12-02 2021-03-16 南京工业大学 Preparation method of multichannel SSZ-13 molecular sieve membrane
KR20210092070A (en) * 2020-01-15 2021-07-23 고려대학교 산학협력단 Method of Controlling Structure of Defects in Chabazite Zeolite Membranes Through Low Temperature Heat Treatment
CN114437844A (en) * 2020-11-03 2022-05-06 中国石油化工股份有限公司 Automatic optimization method for parameters of selective denitrification process of natural gas by computer
CN114560475A (en) * 2022-03-09 2022-05-31 南京工业大学 Preparation method of metal modified M-SSZ-13 molecular sieve membrane
CN114634162A (en) * 2020-12-15 2022-06-17 南京工业大学 Hydrogen purification process adopting CHA type molecular sieve membrane
CN114669201A (en) * 2022-03-09 2022-06-28 南京工业大学 Preparation method of composite SSZ-13/MFI molecular sieve membrane
US20220203307A1 (en) * 2019-04-09 2022-06-30 Georgia Tech Research Corporation Zeolite membranes, molecular separation methods, and manufacturing processes for zeolite membranes

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104289115A (en) * 2014-08-25 2015-01-21 南京工业大学 High silicon CHA type SSZ-13 zeolite membrane preparation method
WO2015081648A1 (en) * 2013-12-04 2015-06-11 北京化工大学 Method for synthesizing molecular sieve ssz-13
CN107029561A (en) * 2017-05-05 2017-08-11 南京工业大学 A kind of preparation method of the MFI-type molecular screen membrane of h0h orientations
CN107570018A (en) * 2017-10-25 2018-01-12 大连理工大学 A kind of method of the zeolite molecular sieve films of Fast back-projection algorithm SSZ 13

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015081648A1 (en) * 2013-12-04 2015-06-11 北京化工大学 Method for synthesizing molecular sieve ssz-13
CN104289115A (en) * 2014-08-25 2015-01-21 南京工业大学 High silicon CHA type SSZ-13 zeolite membrane preparation method
CN107029561A (en) * 2017-05-05 2017-08-11 南京工业大学 A kind of preparation method of the MFI-type molecular screen membrane of h0h orientations
CN107570018A (en) * 2017-10-25 2018-01-12 大连理工大学 A kind of method of the zeolite molecular sieve films of Fast back-projection algorithm SSZ 13

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109569320A (en) * 2018-12-26 2019-04-05 韩小学 A method of mixing crystal seed method prepares pure phase SSZ-13 molecular screen membrane
US20220203307A1 (en) * 2019-04-09 2022-06-30 Georgia Tech Research Corporation Zeolite membranes, molecular separation methods, and manufacturing processes for zeolite membranes
US11964242B2 (en) * 2019-04-09 2024-04-23 Georgia Tech Research Corporation Zeolite membranes, molecular separation methods, and manufacturing processes for zeolite membranes
CN110182826A (en) * 2019-05-17 2019-08-30 大连理工大学 A method of synthesizing hollow SSZ-13 molecular sieve
KR20210092070A (en) * 2020-01-15 2021-07-23 고려대학교 산학협력단 Method of Controlling Structure of Defects in Chabazite Zeolite Membranes Through Low Temperature Heat Treatment
KR102316205B1 (en) * 2020-01-15 2021-10-25 고려대학교 산학협력단 Method of Controlling Structure of Defects in Chabazite Zeolite Membranes Through Low Temperature Heat Treatment
US11904282B2 (en) 2020-01-15 2024-02-20 Korea University Research And Business Foundation Method of controlling structure of defects in chabazite zeolite membranes through low temperature heat treatment
CN111547735A (en) * 2020-04-30 2020-08-18 上海工程技术大学 Controllable synthesis method of pure silicon and high-silicon CHA molecular sieve
CN114437844A (en) * 2020-11-03 2022-05-06 中国石油化工股份有限公司 Automatic optimization method for parameters of selective denitrification process of natural gas by computer
CN112499642A (en) * 2020-12-02 2021-03-16 南京工业大学 Preparation method of multichannel SSZ-13 molecular sieve membrane
CN112499642B (en) * 2020-12-02 2023-11-21 南京工业大学 Preparation method of multichannel SSZ-13 molecular sieve membrane
CN114634162A (en) * 2020-12-15 2022-06-17 南京工业大学 Hydrogen purification process adopting CHA type molecular sieve membrane
CN114669201A (en) * 2022-03-09 2022-06-28 南京工业大学 Preparation method of composite SSZ-13/MFI molecular sieve membrane
CN114560475A (en) * 2022-03-09 2022-05-31 南京工业大学 Preparation method of metal modified M-SSZ-13 molecular sieve membrane

Also Published As

Publication number Publication date
CN108579449B (en) 2019-12-17

Similar Documents

Publication Publication Date Title
CN108579449A (en) A kind of method of the high silicon SSZ-13 molecular screen membranes of Fast back-projection algorithm
US11554348B2 (en) Method of preparing hierarchical porous channel molecular sieve membrane and application thereof
Li et al. Preparation, mechanism and applications of oriented MFI zeolite membranes: A review
US20120272826A1 (en) Zeolite membrane and process for producing zeolite membrane
CN103933871B (en) A kind of preparation method of high stability all-silica MFI type molecular screen membrane
Xia et al. Microstructure manipulation of MFI-type zeolite membranes on hollow fibers for ethanol–water separation
Jiang et al. Fabrication of pure-phase CHA zeolite membranes with ball-milled seeds at low K+ concentration
Zhang et al. Synthesis of silicalite-1 membranes with high ethanol permeation in ultradilute solution containing fluoride
CN107570018A (en) A kind of method of the zeolite molecular sieve films of Fast back-projection algorithm SSZ 13
CN111348660B (en) Medium-silicon CHA type molecular sieve and preparation method and application thereof
CN106552480B (en) For separating the zeolite molecular sieve film and its preparation method and application of hydrogen isotope and inert gas
Wang et al. A crystal seeds-assisted synthesis of microporous and mesoporous silicalite-1 and their CO2/N2/CH4/C2H6 adsorption properties
CN101259384B (en) T type molecular sieve membrane containing rich erionite, preparation and application in gas separation
CN106241830A (en) A kind of phosphate aluminium molecular sieve film of ERI configuration and its preparation method and application
CN101837989B (en) Preparation method of fluorine-containing T-type zeolite membrane
CN107628630B (en) Hollow B-ZSM-5 molecular sieve and preparation method and application thereof
CN110508158B (en) Method for preparing ultrathin SAPO-34 molecular sieve membrane
CN111137904A (en) CHA type molecular sieve and synthesis method and application thereof
Yan et al. Fabrication of zeolite NaA membranes on hollow fibers using nano-sized seeds exfoliated from mesoporous zeolite crystals
Yang et al. Induction of zeolite membrane formation by implanting zeolite crystals into the precursor of ceramic supports
Xia et al. Seeding-free synthesis of FAU-type membrane with dry gel modified α-alumina support
CN102502685B (en) Preparation method of mesoporous LTA zeolite
WO2018218736A1 (en) Aluminosilicate zeolite molecular sieve having bog structure and preparation method therefor
CN110357123B (en) High-crystallinity hierarchical-pore nano X-type molecular sieve and preparation method thereof
CN112850742B (en) Hierarchical pore Y-type molecular sieve and synthesis method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant