CN108505017A - A kind of DLC film layer preparation method accurately controlling DLC film layer thickness - Google Patents
A kind of DLC film layer preparation method accurately controlling DLC film layer thickness Download PDFInfo
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- CN108505017A CN108505017A CN201810450574.7A CN201810450574A CN108505017A CN 108505017 A CN108505017 A CN 108505017A CN 201810450574 A CN201810450574 A CN 201810450574A CN 108505017 A CN108505017 A CN 108505017A
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- CN
- China
- Prior art keywords
- film layer
- wear
- dlc film
- spare part
- resisting spare
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/278—Diamond only doping or introduction of a secondary phase in the diamond
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The present invention relates to a kind of DLC film layer preparation methods accurately controlling DLC film layer thickness, include the following steps：（1）Multiple tracks cleaning is carried out to wear-resisting spare part；（2）Wear-resisting spare part after cleaning is placed on N2It is dried under atmosphere；（3）Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, until the vacuum degree of vacuum cavity is higher than 1 × 10‑6When mbar, DLC plated films are proceeded by；（4）It is bombarded using Ar gas ion pair wear-resisting spare parts；（5）DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane；（6）After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, measures the thickness of DLC film layer.The present invention can accurately control the thickness of DLC film layer, ensure the fit clearance between wear-resisting spare part friction is secondary, and no longer need to carry out match grinding manufacturing procedure, save assembly time, improve the efficiency of assembling of special equipment parts.
Description
Technical field
The present invention relates to special equipment wear-resisting spare part technical fields, and in particular to one kind accurately controlling DLC film layer thickness
DLC film layer preparation method.
Background technology
Currently, the DLC film layer thickness deposited on the special equipment wear-resisting spare part surface of tribological field can not be controlled accurately
System, which results in fit clearance of the friction corresponding to wear-resisting spare part between secondary to be unable to get guarantee, causes to friction
Pair carries out match grinding again, and, to ensure the gap between friction is secondary, match grinding, which is processed, to be increased needed for entire special equipment parts assembly
Time, reduce the efficiency of assembling of entire special equipment parts, affect manufacturing schedule.
Invention content
The purpose of the present invention is to provide a kind of DLC film layer preparation method accurately controlling DLC film layer thickness, this method energy
It is enough that the thickness of DLC film layer is accurately controlled, ensure the fit clearance between wear-resisting spare part friction is secondary, and no longer need into
Row match grinding manufacturing procedure, saves assembly time, improves the efficiency of assembling of special equipment parts.
To achieve the above object, present invention employs following technical schemes：
A kind of DLC film layer preparation method accurately controlling DLC film layer thickness, this approach includes the following steps：
（1）Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part.
（2）Wear-resisting spare part surface oxidisation after cleaning in order to prevent, N is placed on by the wear-resisting spare part after cleaning2Atmosphere
Lower drying.
（3）Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, directly
Vacuum degree to vacuum cavity is higher than 1 × 10-6When mbar, DLC plated films are proceeded by.
（4）It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments
And activate wear-resisting spare part surface.
（5）DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane.DLC film layer packet
SiC layer, SiC and C layers, C layers of trilamellar membrane layer are included, the flow and sedimentation time by controlling n-hexane and tetramethylsilane are sunk
Integrated membrane layer.
（6）After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, using outside micrometer
The change in size before and after its plated film is measured, obtains the thickness of DLC film layer.
Further, step（4）In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
Further, step（5）In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow；Control
The sedimentation time and flow of tetramethylsilane processed are respectively 40min and 92mL/min.
Further, step（6）In, the thickness for the DLC film layer measured is 3 μm.
By above technical scheme it is found that the present invention by it is prepared by DLC film layer the parameters such as raw material, time and flow for being into
Row control, can accurately control the thickness of DLC film layer, ensure the fit clearance between wear-resisting spare part friction is secondary, and
And no longer need to carry out match grinding manufacturing procedure, assembly time is saved, the efficiency of assembling of special equipment parts is improved.The present invention
The densification of DLC film layer, the thickness of preparation can be made uniform, the present invention has the characteristics that simple, reliable, practical.
Description of the drawings
Fig. 1 is the preparation technology flow chart of DLC film layer in the present invention.
Specific implementation mode
The present invention will be further described below in conjunction with the accompanying drawings：
A kind of DLC film layer preparation method accurately controlling DLC film layer thickness as shown in Figure 1, this approach includes the following steps：
（1）Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part.
（2）Wear-resisting spare part surface oxidisation after cleaning in order to prevent, N is placed on by the wear-resisting spare part after cleaning2Atmosphere
Lower drying.
（3）Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, directly
Vacuum degree to vacuum cavity is higher than 1 × 10-6When mbar, DLC plated films are proceeded by.
（4）It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments
And activate wear-resisting spare part surface.
（5）DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane.DLC film layer packet
SiC layer, SiC and C layers, C layers of trilamellar membrane layer are included, specifically, the DLC film layer includes being covered in wear-resisting spare part surface
SiC layer, the SiC layer for being covered in SiC layer surface and C layers, the C layers for being covered in SiC layer and C layer surfaces.By control n-hexane and
The flow and sedimentation time of tetramethylsilane carry out depositional coating.
（6）After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, using outside micrometer
The change in size before and after its plated film is measured, obtains the thickness of DLC film layer.
Further, step（4）In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
Further, step（5）In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow；Control
The sedimentation time and flow of tetramethylsilane processed are respectively 40min and 92mL/min.
Further, step（6）In, the thickness for the DLC film layer measured is 3 μm.
Embodiment described above is only that the preferred embodiment of the present invention is described, not to the model of the present invention
It encloses and is defined, under the premise of not departing from design spirit of the present invention, technical side of the those of ordinary skill in the art to the present invention
The various modifications and improvement that case is made should all be fallen into the protection domain of claims of the present invention determination.
Claims (4)
1. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness, it is characterised in that：This approach includes the following steps：
（1）Multiple tracks cleaning is carried out to wear-resisting spare part, removes greasy dirt and surface attachments on wear-resisting spare part；
（2）Wear-resisting spare part after cleaning is placed on N2It is dried under atmosphere；
（3）Wear-resisting spare part after drying is placed in vacuum cavity, and vacuumize process is carried out to vacuum cavity, until true
The vacuum degree of cavity body is higher than 1 × 10-6When mbar, DLC plated films are proceeded by；
（4）It is bombarded using Ar gas ion pair wear-resisting spare parts, further to remove wear-resisting spare part surface attachments, and it is living
Change wear-resisting spare part surface；
（5）DLC films deposited layer is carried out on the surface of wear-resisting spare part using n-hexane and tetramethylsilane；DLC film layer includes SiC
Layer, SiC and C layers, C layers of trilamellar membrane layer, flow and sedimentation time by controlling n-hexane and tetramethylsilane carry out deposition film
Layer；
（6）After DLC films deposited layer, after progress vacuum breaker is cooled to room temperature, wear-resisting spare part is taken out, is measured using outside micrometer
Change in size before and after its plated film obtains the thickness of DLC film layer.
2. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that：
Step（4）In, the bombardment time of Ar gas ions is 20min, flow 60mL/min.
3. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that：
Step（5）In, it is respectively 35min and 60mL/min to control the sedimentation time of n-hexane and flow；Control the heavy of tetramethylsilane
Product time and flow are respectively 40min and 92mL/min.
4. a kind of DLC film layer preparation method accurately controlling DLC film layer thickness according to claim 1, it is characterised in that：
Step（6）In, the thickness for the DLC film layer measured is 3 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810450574.7A CN108505017A (en) | 2018-05-11 | 2018-05-11 | A kind of DLC film layer preparation method accurately controlling DLC film layer thickness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810450574.7A CN108505017A (en) | 2018-05-11 | 2018-05-11 | A kind of DLC film layer preparation method accurately controlling DLC film layer thickness |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108505017A true CN108505017A (en) | 2018-09-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810450574.7A Pending CN108505017A (en) | 2018-05-11 | 2018-05-11 | A kind of DLC film layer preparation method accurately controlling DLC film layer thickness |
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| Country | Link |
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| CN (1) | CN108505017A (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864553A (en) * | 2010-05-21 | 2010-10-20 | 南京理工大学 | Integrated manufacturing method of microminiature parts based on surface coating |
| CN103484834A (en) * | 2013-09-02 | 2014-01-01 | 河南省中原内配股份有限公司 | Production process of DLC (Diamond Like Carbon) composite coating cylinder liner |
| US20140178637A1 (en) * | 2012-12-21 | 2014-06-26 | Exxonmobil Research And Engineering Company | Low friction coatings with improved abrasion and wear properties and methods of making |
-
2018
- 2018-05-11 CN CN201810450574.7A patent/CN108505017A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864553A (en) * | 2010-05-21 | 2010-10-20 | 南京理工大学 | Integrated manufacturing method of microminiature parts based on surface coating |
| US20140178637A1 (en) * | 2012-12-21 | 2014-06-26 | Exxonmobil Research And Engineering Company | Low friction coatings with improved abrasion and wear properties and methods of making |
| CN103484834A (en) * | 2013-09-02 | 2014-01-01 | 河南省中原内配股份有限公司 | Production process of DLC (Diamond Like Carbon) composite coating cylinder liner |
Non-Patent Citations (2)
| Title |
|---|
| 杜昊等: "硬质合金表面SiC/DLC涂层组织和性能研究", 《工具技术》 * |
| 陈文涛: "《LED技术基础及封装岗位任务解析》", 31 August 2013, 华中科技大学出版社 * |
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| PB01 | Publication | ||
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Application publication date: 20180907 |