CN108490525A - A kind of cut-off film manufacturing method and cut film - Google Patents
A kind of cut-off film manufacturing method and cut film Download PDFInfo
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- CN108490525A CN108490525A CN201810211006.1A CN201810211006A CN108490525A CN 108490525 A CN108490525 A CN 108490525A CN 201810211006 A CN201810211006 A CN 201810211006A CN 108490525 A CN108490525 A CN 108490525A
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- layer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
Abstract
The present invention provides a kind of cut-off film manufacturing method and cut film, are related to thin film technique field.Wherein, the method includes：One substrate, at least one layer of functional film layer of the cut-off type ink and anti-reflection default light-wave band that show pre-set color are provided；Predeterminable area in the first side of the substrate prints the cut-off type ink, obtains developing ink layer；At least one layer of functional film layer is set gradually on the developing ink layer, obtains cut film.In embodiments of the present invention, due to showing specific appearance color, and the coloration allotment difficulty of the cut-off type ink with preliminary cut-off characteristics is low, therefore simple and easy to get, without providing while ensureing the special membrane material of cutoff performance and appearance color, correspondingly, functional film layer can also choose the vapor deposition lower common membrane material of difficulty, therefore the manufacture difficulty of the cut film with specific appearance color can be reduced.In addition, developing the color by the cut-off type ink easily matched colors, the color developing effect of cut-off film outward appearance can be improved.
Description
Technical field
The present invention relates to thin film technique field more particularly to a kind of cut-off film manufacturing method and cut film.
Background technology
Cut film, be it is a kind of can be saturating to the light of specific band, and to the light of its all band cut-off film.Cut film
Application it is very extensive, such as in the camera of the mobile terminals such as mobile phone, cut film can be passed through and carry out middle-low alloy steels etc..
In practical applications, due to demands such as function, accessory matchings, it usually needs the appearance color of cut film is set, because
This, common cut-off film manufacturing method can only rely on the color of membrane material itself, that is to say that selection can show the spy of particular color
Then different membrane material is deposited plural layers by way of vacuum coating and formed, to meet specific appearance color.
However, due to not only can guarantee cutoff performance, but also can guarantee that the special membrane material quantity of appearance color is few, and corresponding steaming
It is big to plate difficulty, therefore, the difficulty for manufacturing the cut film with specific appearance color is higher, and due to the color of special membrane material itself
It is difficult to fully meet specific appearance color, thus the color developing effect for ending film outward appearance also tend to it is bad.
Invention content
A kind of cut-off film manufacturing method of present invention offer and cut film, to solve to meet the special membrane material quantity of particular color
Less and vapor deposition difficulty is big, so as to cause cut film difficulty higher problem of the manufacture with specific appearance color.
In order to solve the above-mentioned technical problem, the invention is realized in this way：A kind of method of cut film manufacture, including：
There is provided a substrate, show pre-set color cut-off type ink and anti-reflection default light-wave band at least one layer of functional membrane
Layer；
Predeterminable area in the first side of the substrate prints the cut-off type ink, obtains developing ink layer；
At least one layer of functional film layer is set gradually on the developing ink layer, obtains cut film.
The embodiment of the present invention additionally provides a kind of cut film, which includes substrate, shows the colour developing oil of pre-set color
At least one layer of functional film layer of layer of ink and anti-reflection default light-wave band；
The developing ink layer is located between the substrate and at least one layer of functional film layer.
In embodiments of the present invention, a substrate, the cut-off type ink for showing pre-set color and anti-reflection default light can be provided
At least one layer of functional film layer of wave wave band, then predeterminable area in the first side of substrate print cut-off type ink, can be with
Developing ink layer is obtained, and then sets gradually at least one layer of functional film layer on developing ink layer, cut film can be obtained.Due to
Show specific appearance color, and the coloration allotment difficulty of the cut-off type ink with preliminary cut-off characteristics is low therefore simple and easy to get,
Without providing while ensureing the special membrane material of cutoff performance and appearance color, correspondingly, functional film layer can also choose steaming
The lower common membrane material of difficulty is plated, therefore the manufacture difficulty of the cut film with specific appearance color can be reduced.In addition, passing through
The cut-off type ink easily matched colors develops the color, and can improve the color developing effect of cut-off film outward appearance.
Description of the drawings
Fig. 1 shows a kind of flow chart of cut-off film manufacturing method in the embodiment of the present invention one；
Fig. 2 shows a kind of flow charts of cut-off film manufacturing method in the embodiment of the present invention two；
Fig. 3 shows a kind of light transmittance spectrum of cut-off type ink in the embodiment of the present invention two；
Fig. 4 shows a kind of light transmittance spectrum of functional film layer in the embodiment of the present invention two；
Fig. 5 show a kind of functional film layer in the embodiment of the present invention two infrared band amplification light transmittance spectrum；
Fig. 6 shows a kind of light transmittance spectrum of cut film in the embodiment of the present invention two；
Fig. 7 shows a kind of structural schematic diagram of cut film in the embodiment of the present invention three.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are some of the embodiments of the present invention, instead of all the embodiments.Based on this hair
Embodiment in bright, the every other implementation that those of ordinary skill in the art are obtained without creative efforts
Example, shall fall within the protection scope of the present invention.
Embodiment one
Referring to Fig.1, the flow chart for showing the cut-off film manufacturing method of the embodiment of the present invention one, can specifically include as follows
Step：
Step 101, provide a substrate, show pre-set color cut-off type ink and anti-reflection default light-wave band at least one
Layer function film layer.
In embodiments of the present invention, the basic material needed for cut film can be made first, including substrate, display preset face
At least one layer of functional film layer of the cut-off type ink of color and anti-reflection default light-wave band, wherein default light-wave band is cut film
Service band namely permeable cut film light corresponding to wave band.Wherein, substrate is printable ink, and can be propped up
Support the plate material of functional film layer.To ensure the functional requirement and cutoff performance of cut film script, selection itself is needed to have just
The ink for walking cutoff performance that is to say that in service band light transmittance height, its all band cut-off property except service band is good
Cut-off type ink.Further, cut-off type ink can keep it aobvious by allocating different color inks, and the proportioning of different color inks
Show different colors, so as to mix the cut-off type ink of display specific appearance color.
For functional film layer, raw material of at least one membrane material as functional film layer can be chosen, may then based on and cut
The only refractive index of type ink determines the number of plies of at least one layer functional film layer and the thickness per layer function film layer, for every layer function
Then film layer can produce the functional film layer of setting thickness using the thickness determined as Fabrication parameter by filming equipment.
Wherein, the refractive index of each membrane material is typically different, to by the functional film layer that different refractivity is arranged, realize cut film
Antireflective properties useful.In addition, the refractive index and cut-off type ink of the anti-reflection light-wave band and itself membrane material of at least one layer of functional film layer
Refractive index it is related, therefore, when the membrane material of functional film layer and the material difference of cut-off type ink, at least one layer of functional film layer
Anti-reflection light-wave band will also change therewith.In order to ensure that at least one layer of functional film layer is anti-reflection to the service band of cut film, at least
The anti-reflection light-wave band of one layer function film layer should include at least the service band of cut film, namely at least one layer of functional film layer is at least
It can be with anti-reflection default light-wave band.
Step 102, the predeterminable area in the first side of substrate prints cut-off type ink, obtains developing ink layer.
In embodiments of the present invention, substrate can be fixed on manufacturing platform, at this time a wherein face Facing to Manufacturing for substrate
Then platform, another side namely first side can be printed backwards to manufacturing platform in the predeterminable area in the first side of substrate
Cut-off type ink can obtain developing ink layer after cut-off type ink parches, to which the developing ink layer can ensure base
While this functional requirement and cutoff performance, specific appearance color is shown.
Step 103, at least one layer of functional film layer is set gradually on developing ink layer, obtains cut film.
In embodiments of the present invention, the coating techniques such as vacuum coating may be used, set gradually on developing ink layer to
A few layer function film layer, to obtain cut film.Device in usual terminal using infrared ray work is more, such as infrared photography
Head, range sensor etc., correspondingly, the cut film for being set to above-mentioned device, which can wrap
At least one layer of anti-reflection film for including anti-reflection infrared band, can enhance the light transmittance of the light of infrared band, so as to ensure to end
The excellent light transmission of film, in order to which subsequent module is utmostly worked using the light of infrared band.
In embodiments of the present invention, a substrate, the cut-off type ink for showing pre-set color and anti-reflection default light can be provided
At least one layer of functional film layer of wave wave band, then predeterminable area in the first side of substrate print cut-off type ink, can be with
Developing ink layer is obtained, and then sets gradually at least one layer of functional film layer on developing ink layer, cut film can be obtained.Due to
Show specific appearance color, and the coloration allotment difficulty of the cut-off type ink with preliminary cut-off characteristics is low therefore simple and easy to get,
Without providing while ensureing the special membrane material of cutoff performance and appearance color, correspondingly, functional film layer can also choose steaming
The lower common membrane material of difficulty is plated, therefore the manufacture difficulty of the cut film with specific appearance color can be reduced.In addition, passing through
The cut-off type ink easily matched colors develops the color, and can improve the color developing effect of cut-off film outward appearance.
Embodiment two
With reference to Fig. 2, shows the flow chart of the cut-off film manufacturing method of the embodiment of the present invention two, can specifically include as follows
Step：
Step 201, provide a substrate, show pre-set color cut-off type ink and anti-reflection default light-wave band at least one
Layer function film layer.
In embodiments of the present invention, substrate typically glass baseplate.Pre-set color is the appearance face needed for cut film
Color can be adjusted by the selection and proportioning of color ink.The thickness of the number of plies of at least one layer of functional film layer and every layer function film layer can
To be set based on the refractive index of cut-off type ink, in practical applications, the number of plies of at least one layer of functional film layer and every layer function film
The thickness of layer can be calculated by optical design method, such as using optical design software calculate etc..In reality
In, at least one layer of functional film layer of anti-reflection default light-wave band may include at least one layer of anti-reflection of anti-reflection infrared band
Film, anti-reflection film can inhibit the reflectivity of service band by the alternate collocation of high refractive index layer and low-index film, from
And the light transmittance of service band is improved, further to be optimized to the preliminary cutoff performance of cut-off type ink.
For example, the performance requirement of cut film can be：The light transmittance for ending wavelength band 420nm-680nm is less than 5%, work
The light transmittance for making wavelength band 900nm-1000nm is more than 90%, and appearance color requires black, to have hiding.Accordingly
, a GG3 can be provided for glass baseplate as substrate, empire DS-HF 71212VI IR BLACK (90%) cut-off type is provided
Ink chooses titanium dioxide as the anti-reflection membrane material of high refractive index, chooses two as the cut-off type ink of display appearance of black color
Silica is as the anti-reflection membrane material of low-refraction, after determining membrane material, can join the refractive index 1.51 of cut-off type ink as input
Number determines that the number of plies of functional film layer is 4, wherein the 1st layer function film layer is titanium dioxide by optical design software TFCALC35
Film layer, physical thickness 44.17nm, layer 2 feature film layer are silica coating, physical thickness 48.10nm, the 3rd layer of work(
Energy film layer is titanium oxide film layer, and physical thickness 90.00nm, the 4th layer function film layer is silica coating, and physical thickness is
170.30nm。
Fig. 3 shows empire DS-HF 71212VI IR BLACK (90%) cut-off type ink provided in an embodiment of the present invention
In the light transmittance spectrum of different wave length.With reference to Fig. 3, the light transmittance of the cut-off type ink in the wavelength band of 420nm-680nm
Approximately less than 5%, and the light transmittance in the wavelength band of 900nm-1000nm is generally higher than 90%.It should be noted that
Since the factors such as material purity, test equipment error are inevitable, in actual test, cut-off type ink corresponds to each tool
The light transmittance of bulk wave length not necessarily all meets performance requirement, therefore in the range of can bear, cut-off type ink corresponds to work
Light transmittance in wave band, can allow that there are a degree of errors with the standard of performance requirement.
Fig. 4 show four layer functions film layer provided in an embodiment of the present invention different wave length light transmittance spectrum.With reference to figure
4, which is more than 90%, is cut so as to improve
Only type ink infrared band anti-reflection performance, though and four layer function film layers in the visible light wave segment limit of 400nm-500nm
Right light transmittance is larger, but since cut-off type ink is extremely low in this wave band light transmittance, and final cut film is in this wave band light transmittance
Also extremely low, still the light of this wave band can be ended.
Fig. 5 be four layer function film layers in the amplification light transmittance spectrum of infrared band, can be seen that four layer functions with reference to Fig. 5
Light transmittance of the film layer within the scope of the infrared band of 900nm-1000nm is more than 95%, can be good at raising cut-off type ink and exists
The anti-reflection performance of infrared band.
Step 202, the predeterminable area silk-screen printing cut-off type ink in the first side of substrate, obtains developing ink
Layer.
In embodiments of the present invention, silk-screen technology may be used, the predeterminable area screen printing in the first side of substrate
Brush cut-off type ink that is to say the region silk-screen printing cut-off type ink for needing to make cut film in substrate, so as to
To developing ink layer.
For example, can be in GG3 for the predeterminable area in the first side of glass baseplate, silk-screen printing empire DS-HF
71212VI IR BLACK (90%) cut-off type ink, to obtain to show the developing ink layer of black, to cut film
Appearance black can be presented, reach concealment effect.
Step 203, the vacuum evaporation at least one layer functional film layer successively on developing ink layer, obtains cut film.
In embodiments of the present invention, vacuum coating technology may be used, vacuum evaporation is at least successively on developing ink layer
One layer function film layer, to obtain cut film.Device in usual terminal using infrared ray work is more, such as infrared photography
Head, range sensor etc., correspondingly, the cut film for being set to above-mentioned device, which can wrap
At least one layer of anti-reflection film for including anti-reflection infrared band, can enhance the light transmittance of the light of infrared band, so as to ensure to end
The excellent light transmission of film, in order to which subsequent module is utmostly worked using the light of infrared band.
The 2350 model coating machines for example, filming equipment can speed for light, can the vacuum evaporation successively on developing ink layer
1st layer of titanium oxide film layer, the 2nd layer of silica coating, the 3rd layer of titanium oxide film layer and the 4th layer of silica coating, to
The light transmittance that cut-off wavelength band 420nm-680nm can be obtained meeting is less than 5%, service band range 900nm-1000nm's
Light transmittance is more than 90%, and appearance color requires the cut film of black, the light transmittance spectrum such as Fig. 6 of the cut film in different-waveband
Shown, infrared band range light transmittance of the cut film in 900nm-1000nm is about 95%, in the wave band model of 420nm-680nm
It encloses light transmittance and is less than 5%, while can show the appearance color of black, meet the needs of hiding.
In embodiments of the present invention, a substrate, the cut-off type ink for showing pre-set color and anti-reflection default light can be provided
At least one layer of functional film layer of wave wave band, the then predeterminable area silk-screen printing cut-off type ink in the first side of substrate,
Developing ink layer, and then the vacuum evaporation at least one layer functional film layer successively on developing ink layer can be obtained, can be cut
Only film.Due to showing specific appearance color, and the coloration allotment difficulty of the cut-off type ink with preliminary cut-off characteristics is low, therefore
It is simple and easy to get, without providing while ensureing the special membrane material of cutoff performance and appearance color, correspondingly, functional film layer also may be used
The lower common membrane material of difficulty is deposited to choose, therefore the manufacture difficulty of the cut film with specific appearance color can be reduced.
In addition, developing the color by the cut-off type ink easily matched colors, the color developing effect of cut-off film outward appearance can be improved.
Embodiment three
With reference to Fig. 7, show a kind of structure chart of cut film of the embodiment of the present invention three, can specifically include substrate 01,
Show at least one layer of functional film layer 03 of the developing ink layer 02 and anti-reflection default light-wave band of pre-set color；
The developing ink layer 02 is located between the substrate 01 and at least one layer of functional film layer 03.
Optionally, the number of plies of at least one layer of functional film layer and the thickness per layer function film layer are based on cut-off type oil
The refractive index setting of ink.
Optionally, at least one layer of functional film layer of the anti-reflection default light-wave band includes at least the one of anti-reflection infrared band
Layer anti-reflection film.
Optionally, the substrate is glass baseplate.
In embodiments of the present invention, cut film may include substrate, show the cut-off type ink of pre-set color and anti-reflection pre-
If at least one layer of functional film layer of light-wave band, wherein developing ink layer can be located at substrate and at least one layer of functional film layer it
Between.Due to showing specific appearance color, and the coloration allotment difficulty of the cut-off type ink with preliminary cut-off characteristics is low, therefore letter
It is singly easy to get, without providing while ensureing the special membrane material of cutoff performance and appearance color, correspondingly, functional film layer can also
The vapor deposition lower common membrane material of difficulty is chosen, therefore the manufacture difficulty of the cut film with specific appearance color can be reduced.Separately
Outside, it is developed the color by the cut-off type ink easily matched colors, the color developing effect of cut-off film outward appearance can be improved.
It should be noted that herein, the terms "include", "comprise" or its any other variant are intended to non-row
His property includes, so that process, method, article or device including a series of elements include not only those elements, and
And further include other elements that are not explicitly listed, or further include for this process, method, article or device institute it is intrinsic
Element.In the absence of more restrictions, the element limited by sentence " including one ... ", it is not excluded that including
There is also other identical elements in the process of the element, method, article or device.
Through the above description of the embodiments, those skilled in the art can be understood that above-described embodiment side
Method can add the mode of required general hardware platform to realize by software, naturally it is also possible to by hardware, but in many cases
The former is more preferably embodiment.Based on this understanding, technical scheme of the present invention substantially in other words does the prior art
Going out the part of contribution can be expressed in the form of software products, which is stored in a storage medium
In (such as ROM/RAM, magnetic disc, CD), including some instructions are used so that a station terminal (can be mobile phone, computer, service
Device, air conditioner or network equipment etc.) execute method described in each embodiment of the present invention.
The embodiment of the present invention is described with above attached drawing, but the invention is not limited in above-mentioned specific
Embodiment, the above mentioned embodiment is only schematical, rather than restrictive, those skilled in the art
Under the inspiration of the present invention, without breaking away from the scope protected by the purposes and claims of the present invention, it can also make very much
Form belongs within the protection of the present invention.
Claims (10)
1. a kind of cut-off film manufacturing method, which is characterized in that the method includes：
One substrate, at least one layer of functional film layer of the cut-off type ink and anti-reflection default light-wave band that show pre-set color are provided；
Predeterminable area in the first side of the substrate prints the cut-off type ink, obtains developing ink layer；
At least one layer of functional film layer is set gradually on the developing ink layer, obtains cut film.
2. according to the method described in claim 1, it is characterized in that, the number of plies and the every layer function of at least one layer functional film layer
Refractive index setting of the thickness of film layer based on the cut-off type ink.
3. according to the method described in claim 1, it is characterized in that, the predeterminable area in the first side of the substrate
The step of printing the cut-off type ink, obtaining developing ink layer, including：
Cut-off type ink described in predeterminable area silk-screen printing in the first side of the substrate, obtains developing ink layer.
4. according to the method described in claim 1, it is characterized in that, at least one layer of functional membrane of the anti-reflection default light-wave band
Layer includes at least one layer of anti-reflection film of anti-reflection infrared band.
5. according to the method described in claim 1, it is characterized in that, it is described set gradually on the developing ink layer it is described extremely
The step of lacking a layer function film layer, obtaining cut film, including：
At least one layer of functional film layer described in vacuum evaporation successively on the developing ink layer, obtains cut film.
6. according to the method described in claim 1, it is characterized in that, the substrate is glass baseplate.
7. a kind of cut film, which is characterized in that the cut film includes substrate, shows the developing ink layer of pre-set color and anti-reflection
At least one layer of functional film layer of default light-wave band；
The developing ink layer is located between the substrate and at least one layer of functional film layer.
8. cut film according to claim 7, which is characterized in that the number of plies and every layer of work(of at least one layer functional film layer
Refractive index setting of the thickness of energy film layer based on the cut-off type ink.
9. cut film according to claim 7, which is characterized in that at least one layer of function of the anti-reflection default light-wave band
Film layer includes at least one layer of anti-reflection film of anti-reflection infrared band.
10. cut film according to claim 7, which is characterized in that the substrate is glass baseplate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810211006.1A CN108490525A (en) | 2018-03-14 | 2018-03-14 | A kind of cut-off film manufacturing method and cut film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810211006.1A CN108490525A (en) | 2018-03-14 | 2018-03-14 | A kind of cut-off film manufacturing method and cut film |
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| Publication Number | Publication Date |
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| CN108490525A true CN108490525A (en) | 2018-09-04 |
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ID=63339369
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| CN201810211006.1A Pending CN108490525A (en) | 2018-03-14 | 2018-03-14 | A kind of cut-off film manufacturing method and cut film |
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Cited By (1)
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| CN113341490A (en) * | 2021-05-19 | 2021-09-03 | 东莞市晶博光电股份有限公司 | Infrared light anti-reflection functional film and preparation method and application thereof |
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| CN113341490A (en) * | 2021-05-19 | 2021-09-03 | 东莞市晶博光电股份有限公司 | Infrared light anti-reflection functional film and preparation method and application thereof |
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Application publication date: 20180904 |