CN108486529A - A kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique - Google Patents
A kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique Download PDFInfo
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- CN108486529A CN108486529A CN201810124364.9A CN201810124364A CN108486529A CN 108486529 A CN108486529 A CN 108486529A CN 201810124364 A CN201810124364 A CN 201810124364A CN 108486529 A CN108486529 A CN 108486529A
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- matrix
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- titanium carbonitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21J—FIBREBOARD; MANUFACTURE OF ARTICLES FROM CELLULOSIC FIBROUS SUSPENSIONS OR FROM PAPIER-MACHE
- D21J3/00—Manufacture of articles by pressing wet fibre pulp, or papier-mâché, between moulds
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a kind of steel material paper pulp formation mould surface vacuums to plate titanium carbonitride technique, it includes core matrix and cavity matrix to plate titanium carbonitride molding die, the core matrix, with cavity matrix, it matches, the core matrix and the equal vacuum of cavity matrix surface are coated with titanium nitride coating, are provided with carbonization ti interlayer between the core matrix and cavity matrix and titanium nitride coating, technique for vacuum coating includes the following steps：S1：Matrix processing：A, the surface of matrix is processed by shot blasting using sand paper, to go matrix except impurity such as surface and oil contaminant, rusty stains.The Vacuum Deposition titanium carbonitride technique of the present invention can make molding die while keeping higher hardness, improve the toughness of coating and the bond strength between matrix, to improve the impact resistance and wearability of coating, extend molding service life；And coating process is easily mastered, and stable production process is reliable.
Description
Technical field
The present invention relates to paper pulp moulding mould field, more particularly to a kind of steel material paper pulp formation mould surface vacuum
Plate titanium carbonitride technique.
Background technology
Using the moulded paper pulp product that annual herb plant fiber is made as primary raw material, modern society is adapted to and has defended
Raw, convenient, fast, healthy life requirement, it is practical, nontoxic with it, discarded after can degradable, back to nature the characteristics of, have
Wide development prospect, therefore paper mould industry is a kind of environmental protection industry being conducive to Sustainable Socioeconomic Development.
Paper moulded industry is similar to paper industry, and it is several with dryness finalization that molding process has with slurry, molding to be dehydrated
A stage, but Paper moulded production is different from papermaking again, and people are called three-dimensional papermaking again.But Paper moulded industry is still one new
Emerging industry, there are many more the places for demanding perfection urgently and improving for the forming processing technology of product.Such as current paper pulp molding forming
Mold is in order to smoothly demould, and generally use plates the surface treatment mode of Teflon, and there are two major defects for the technique：(1) it produces
After certain number, mold facecoat serious wear needs to remove removing coating and spraying Teflon again, time-consuming and laborious, significantly shadow
Its production efficiency is rung；(2) Teflon easily emits toxic material at high temperature, harmful, not environmentally.
Therefore, a kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique is invented to solve the above problems very
It is necessary to.
Invention content
The purpose of the present invention is to provide a kind of steel material paper pulp formation mould surface vacuums to plate titanium carbonitride technique, with solution
Certainly the problems mentioned above in the background art.
To achieve the above object, the present invention provides the following technical solutions：A kind of steel material paper pulp formation mould surface vacuum
Titanium carbonitride technique is plated, plating titanium carbonitride molding die includes core matrix and cavity matrix, the core matrix and cavity base
Body matches, and the core matrix and the equal vacuum of cavity matrix surface are coated with titanium nitride coating, the core matrix and cavity base
Carbonization ti interlayer is provided between body and titanium nitride coating.
According to above-mentioned steel material paper pulp formation mould, the present invention provides the following technical solutions：A kind of steel material paper pulp molding
Die surface Vacuum Deposition titanium carbonitride technique, specific technique for vacuum coating include the following steps：
S1：Matrix processing：
A, the surface of matrix is processed by shot blasting using sand paper, to go matrix except impurity such as surface and oil contaminant, rusty stains；
B, sandblasting roughening treatment is carried out to the matrix after polishing using closed sand-blasting machine, polishing machine polishing removal table is used in combination
The magnetism in face, is then sequentially placed into alcohol and acetone；
C, the matrix after cleaning is put into baking oven and processing is dried；
S2 arc-plasma plated films：
A, the gasification of evaporation material：Evaporation material and matrix are both placed in the vacuum coating room filled with inert argon, and made
Evaporation material connects anode, and matrix connects cathode, then passes to high voltage direct current, makes to generate arc discharge between evaporation material and matrix, by
In filled with inert argon, being ionized in discharge electric field effect lower part argon gas, to around cathode base in vacuum coating room
A plasma dark space is formed, and positively charged argon ion is attracted by cathode negative high voltage, bombards matrix surface fiercely, is caused
Matrix skin particle and foul are banged to splash and be dished out, to make matrix surface to be plated obtain sufficient icon bombardment cleaning, then,
Evaporation source AC power is connected, the fusing of evaporation material particle is made to evaporate and enters glow discharge zone and is ionized；
B, the migration of plating material atom, molecule or ion：Under the action of electric field, CO is passed through into vacuum coating room2And N2Deng
Reaction gas makes it be ionized out negatively charged carbon ion and Nitrogen ion in glow discharge zone, and under cathode attraction, companion
Positively charged evaporation material ion and positively charged argon ion rush at workpiece together；
C, the deposition of plating material atom, molecule or ion on matrix：It is more than when throwing the plating material ion being plated on matrix surface
When splashing the quantity for losing ion, then it is gradually accumulated to form one layer of secure adhesion in the coating of workpiece surface；
S3：Post-processing：Each power supply, ion source and gas source are closed, plated film terminates.
Preferably, in the S1, matrix is sequentially placed into alcohol and acetone, and using super at a temperature of 55~75 DEG C
Sound wave respectively cleans 30min, is then placed in baking oven dry 20min.
Preferably, in the S2, the initial pressure of vacuum coating chamber interior is controlled in 1.33~13.3Pa.
Preferably, in a of the S2, evaporation material using Titanium, the voltage of high voltage direct current is 3000~
5000V, and the purple for working as plasma dark space no longer changes, meanwhile, the evaporation material vapor pressure in vacuum coating room reaches
When 13.5~14Pa, then it represents that evaporation material has gasified completely.
Preferably, it is that negatively charged carbon ion is combined to be formed with positively charged titanium ion first in the b of the S2
TiC, after the completion of waiting for carbon ion reaction, negatively charged Nitrogen ion is combined to form TiN with positively charged titanium ion again.
Preferably, in the c of the S2, the temperature of plating material deposition is controlled at 500 DEG C.
The technique effect and advantage of the present invention：
1, using the difference of chemical property between carbon and nitrogen, make in entire plated film reaction process, band was negative before this
The carbon ion of charge is combined to form TiC films with positively charged titanium ion, is coated on the surface of matrix, waits for that carbon ion reaction is completed
Afterwards, negatively charged Nitrogen ion is combined to form TiN film with positively charged titanium ion again, is coated on the surface of TiC films, and due to
TiC film stickiness is very strong, and TiN film can be made tightly to be bonded together with matrix surface, improves the toughness of coating and between matrix
Bond strength extends molding service life to improve the impact resistance and wearability of coating；
2, using inert argon glow discharge, plating material steam raising is made to ionize, and plates material ion and accelerates through discharge electric field
Afterwards, matrix surface is bombarded with higher-energy in company with positively charged argon ion one, to make matrix surface to be plated obtain fully
Icon bombardment cleaning, when throw be plated on matrix surface plating material ion be more than splash lose ion quantity when, then be gradually accumulated shape
At one layer of secure adhesion in the titanium carbonitride film of matrix surface.
Description of the drawings
Fig. 1 is the basal body structure schematic diagram of the present invention.
In figure：1 core matrix, 2 cavity matrixes, 3 titanium nitride coatings, 4 carbonization ti interlayers
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
A kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique, specific technique for vacuum coating include such as
Lower step：
S1：Matrix processing：
A, the surface of matrix is processed by shot blasting using sand paper, to go matrix except impurity such as surface and oil contaminant, rusty stains；
B, sandblasting roughening treatment is carried out to the matrix after polishing using closed sand-blasting machine, polishing machine polishing removal table is used in combination
The magnetism in face, is then sequentially placed into alcohol and acetone, and 30min is respectively cleaned using ultrasonic wave at a temperature of 55~75 DEG C；
C, the matrix after cleaning is placed in oven and dried processing 20min；
S2 arc-plasma plated films：
A, the gasification of evaporation material：Titanium evaporation material and matrix are both placed in the vacuum film coating chamber filled with inert argon
It is interior, and the initial pressure of vacuum coating chamber interior is controlled in 1.33~13.3Pa, evaporation material is then connect anode, matrix connects the moon
Then pole passes to the high voltage direct current of 3000~5000V, make to generate arc discharge between evaporation material and matrix, due to Vacuum Deposition
Filled with inert argon in film room, it is ionized in discharge electric field effect lower part argon gas, it is first-class to be formed around cathode base
Ion dark space, and positively charged argon ion is attracted by cathode negative high voltage, bombards matrix surface fiercely, causes matrix skin
Particle and foul are banged to splash and be dished out, and to make matrix surface to be plated obtain sufficient icon bombardment cleaning, then, connect evaporation
Source AC power makes the fusing of evaporation material particle evaporate and enter and glow discharge zone and is ionized, when plasma dark space purple not
It changes again, meanwhile, when the evaporation material vapor pressure in vacuum coating room reaches 13.5~14Pa, then it represents that gas is expected in evaporation
Change complete；
B, the migration of plating material atom, molecule or ion：Under the action of electric field, CO is passed through into vacuum coating room2And N2Deng
Reaction gas makes it be ionized out negatively charged carbon ion and Nitrogen ion in glow discharge zone, and under cathode attraction, companion
Positively charged evaporation material ion and positively charged argon ion rush at workpiece together, in entire plated film reaction process, before this
Negatively charged carbon ion is combined to form TiC with positively charged titanium ion, after the completion of waiting for carbon ion reaction, negatively charged nitrogen
Ion is combined to form TiN with positively charged titanium ion again；
C, the deposition of plating material atom, molecule or ion on matrix：During plating material deposition, always by plating material deposition
Temperature control at 500 DEG C, when throw be plated on matrix surface plating material ion be more than splash lose ion quantity when, then be gradually accumulated
One layer of secure adhesion is formed in the coating of workpiece surface；
S3：Post-processing：Each power supply, ion source and gas source are closed, plated film terminates.
Embodiment：
Steel material paper pulp formation mould according to figure 1, including core matrix 1 and cavity matrix 2, the core matrix
1 and cavity matrix 2 match, the equal vacuum of the core matrix 1 and 2 surface of cavity matrix is coated with titanium nitride coating 3, the core
Carbonization ti interlayer 4 is provided between matrix 1 and cavity matrix 2 and titanium nitride coating 3.
During carrying out empty plating titanium carbonitride to steel material paper pulp formation mould surface, first with sand paper to matrix
Outer surface carries out rough polishing light processing, and to go matrix to remove the impurity such as surface and oil contaminant, rusty stain, then the matrix by rough polishing light processing is put into
In closed sand-blasting machine processing cabin, powdery sand grains grain (1~4mm of diameter) is transported to another place from one using compressed air,
During sand grains kinetic energy is converted into potential energy, the sand grains that high-speed motion is made to wash away matrix surface, reaches improvement matrix surface
The effect of quality is further processed the matrix after sandblasting roughening treatment followed by polishing machine, and motor is made to drive installation
Sponge on polishing machine or wool polishing disk high speed rotation, due to polishing disk and polishing agent collective effect and with surface to be thrown into
Row friction, and then achievees the purpose that remove pollution, oxide layer, shallow trace and the magnetism on surface to be thrown, then, general's treated matrix
It is sequentially placed into alcohol and acetone, 30min is respectively cleaned using ultrasonic wave at a temperature of 55~75 DEG C, then by the base after cleaning
Body is placed in oven and dried processing 20min, to remove the alcohol or acetone of matrix surface attachment, and then evaporates titanium and expects
It is both placed in the vacuum coating room filled with inert argon with the matrix after drying process, and by the initial of vacuum coating chamber interior
Pressure is controlled in 1.33~13.3Pa, then, evaporation material is connect anode, matrix connects cathode, then passes to the height of 3000~5000V
Straightening galvanic electricity makes to generate arc discharge between evaporation material and matrix, due in vacuum coating room filled with inert argon so that putting
Under electric field effect, part argon gas is ionized, and then a plasma dark space is formed around cathode base, and positively charged argon
Ion is attracted by cathode negative high voltage, bombards matrix surface fiercely, cause matrix skin particle and foul by Hong splash and dish out, from
And matrix surface to be plated is made to have obtained sufficient icon bombardment cleaning, then, evaporation source AC power is connected, makes evaporation material particle
Fusing, which evaporates simultaneously to enter, glow discharge zone and to be ionized, in the vaporescence of evaporation material, when plasma dark space purple no longer
It changes, meanwhile, when the evaporation material vapor pressure in vacuum coating room reaches 13.5~14Pa, then it represents that evaporation material has gasified
Completely, after evaporation material gasification is complete, under the action of electric field, CO is passed through into vacuum coating room2And N2Equal reaction gas,
Make CO2And N2Negatively charged carbon ion and Nitrogen ion are ionized out in glow discharge zone, and under cathode attraction, just in company with band
The evaporation material ion of charge and positively charged argon ion rush at workpiece together, when plating material starts to deposit to deposition in matrix surface
During end, the temperature of plating material deposition is controlled at 500 DEG C always, is more than when throwing the plating material ion being plated on matrix surface
When splashing the quantity for losing ion, then it is gradually accumulated to form one layer of secure adhesion in the coating of workpiece surface, in entirely plating film reaction mistake
Cheng Zhong, carbon ion negatively charged before this are combined to form TiC films with positively charged titanium ion, are coated on the surface of matrix, are waited for
After the completion of carbon ion reaction, negatively charged Nitrogen ion is combined to form TiN film with positively charged titanium ion again, is coated on TiC
The surface of film can make TiN film tightly be bonded together with matrix surface, improve the toughness of coating since TiC film stickiness is very strong
And the bond strength between matrix extends molding service life to improve the impact resistance and wearability of coating.
Finally it should be noted that：The foregoing is only a preferred embodiment of the present invention, is not intended to restrict the invention,
Although the present invention is described in detail referring to the foregoing embodiments, for those skilled in the art, still may be used
With technical scheme described in the above embodiments is modified or equivalent replacement of some of the technical features,
All within the spirits and principles of the present invention, any modification, equivalent replacement, improvement and so on should be included in the present invention's
Within protection domain.
Claims (7)
1. a kind of steel material paper pulp formation mould surface vacuum plates titanium carbonitride technique, it is characterised in that：Plate titanium carbonitride molding
Mold includes core matrix (1) and cavity matrix (2), and the core matrix (1) and cavity matrix (2) match, the core
The equal vacuum of matrix (1) and cavity matrix (2) surface is coated with titanium nitride coating (3), the core matrix (1) and cavity matrix (2)
Carbonization ti interlayer (4) is provided between titanium nitride coating (3).
2. a kind of steel material paper pulp formation mould surface vacuum according to claim 1 plates titanium carbonitride technique, feature
It is：Technique for vacuum coating includes the following steps：
S1：Matrix processing：
A, the surface of matrix is processed by shot blasting using sand paper, to go matrix except impurity such as surface and oil contaminant, rusty stains；
B, sandblasting roughening treatment is carried out to the matrix after polishing using closed sand-blasting machine, polishing machine polishing removal surface is used in combination
Then magnetism is sequentially placed into alcohol and acetone；
C, the matrix after cleaning is put into baking oven and processing is dried；
S2 arc-plasma plated films：
A, the gasification of evaporation material：Evaporation material and matrix are both placed in the vacuum coating room filled with inert argon, and make evaporation
Material connects anode, and matrix connects cathode, then passes to high voltage direct current, makes to generate arc discharge between evaporation material and matrix, due to true
Filled with inert argon in empty coating chamber, it is ionized in discharge electric field effect lower part argon gas, to be formed around cathode base
One plasma dark space, and positively charged argon ion is attracted by cathode negative high voltage, bombards matrix surface fiercely, causes matrix
Surface layer particle and foul are banged to splash and be dished out, and to make matrix surface to be plated obtain sufficient icon bombardment cleaning, then, are connected
Evaporation source AC power makes the fusing of evaporation material particle evaporate and enters glow discharge zone and be ionized；
B, the migration of plating material atom, molecule or ion：Under the action of electric field, CO is passed through into vacuum coating room2And N2Deng reaction
Gas makes it be ionized out negatively charged carbon ion and Nitrogen ion in glow discharge zone, and under cathode attraction, just in company with band
The evaporation material ion of charge and positively charged argon ion rush at workpiece together；
C, the deposition of plating material atom, molecule or ion on matrix：It is more than to splash mistake when throwing the plating material ion being plated on matrix surface
When the quantity of ion, then it is gradually accumulated to form one layer of secure adhesion in the coating of workpiece surface；
S3：Post-processing：Each power supply, ion source and gas source are closed, plated film terminates.
3. a kind of steel material paper pulp formation mould surface vacuum according to claim 2 plates titanium carbonitride technique, feature
It is：In the S1, matrix is sequentially placed into alcohol and acetone, and is respectively cleaned using ultrasonic wave at a temperature of 55~75 DEG C
30min is then placed in baking oven dry 20min.
4. a kind of steel material paper pulp formation mould surface vacuum according to claim 2 plates titanium carbonitride technique, feature
It is：In the S2, the initial pressure of vacuum coating chamber interior is controlled in 1.33~13.3Pa.
5. a kind of steel material paper pulp formation mould surface vacuum according to claim 2 plates titanium carbonitride technique, feature
It is：In a of the S2, for evaporation material using Titanium, the voltage of high voltage direct current is 3000~5000V, and when etc. from
The purple of sub- dark space no longer changes, meanwhile, when the evaporation material vapor pressure in vacuum coating room reaches 13.5~14Pa, then
Indicate that evaporation material has gasified completely.
6. a kind of steel material paper pulp formation mould surface vacuum according to claim 2 plates titanium carbonitride technique, feature
It is：In the b of the S2, it is that negatively charged carbon ion is combined to form TiC with positively charged titanium ion first, waits for carbon ion
After the completion of reaction, negatively charged Nitrogen ion is combined to form TiN with positively charged titanium ion again.
7. a kind of steel material paper pulp formation mould surface vacuum according to claim 2 plates titanium carbonitride technique, feature
It is：In the c of the S2, the temperature of plating material deposition is controlled at 500 DEG C.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810124364.9A CN108486529A (en) | 2018-02-07 | 2018-02-07 | A kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810124364.9A CN108486529A (en) | 2018-02-07 | 2018-02-07 | A kind of steel material paper pulp formation mould surface vacuum plating titanium carbonitride technique |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114381685A (en) * | 2021-12-10 | 2022-04-22 | 昆山英利悦电子有限公司 | Titanium carbonitride coating process for aluminum alloy car key |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103158296A (en) * | 2013-03-15 | 2013-06-19 | 烟台鲁东泵业有限公司 | Titanium carbide/titanium nitride nano multi-coating impeller and preparation method thereof |
| CN106834864A (en) * | 2017-02-09 | 2017-06-13 | 江苏汇诚机械制造有限公司 | A kind of preparation method of tough ultra-high manganese steel base TiC/TiN steel bonded carbide high |
| CN107058901A (en) * | 2017-02-09 | 2017-08-18 | 江苏汇诚机械制造有限公司 | A kind of preparation method of high-toughness heat-resistant TiC/TiN steel bonded carbide |
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2018
- 2018-02-07 CN CN201810124364.9A patent/CN108486529A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103158296A (en) * | 2013-03-15 | 2013-06-19 | 烟台鲁东泵业有限公司 | Titanium carbide/titanium nitride nano multi-coating impeller and preparation method thereof |
| CN106834864A (en) * | 2017-02-09 | 2017-06-13 | 江苏汇诚机械制造有限公司 | A kind of preparation method of tough ultra-high manganese steel base TiC/TiN steel bonded carbide high |
| CN107058901A (en) * | 2017-02-09 | 2017-08-18 | 江苏汇诚机械制造有限公司 | A kind of preparation method of high-toughness heat-resistant TiC/TiN steel bonded carbide |
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| Title |
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| 戴永年等: "《有色金属材料的真空冶金》", 31 March 2000, 冶金工业出版社 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114381685A (en) * | 2021-12-10 | 2022-04-22 | 昆山英利悦电子有限公司 | Titanium carbonitride coating process for aluminum alloy car key |
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