CN108486526A - A kind of preparation method of ganoine thin film - Google Patents

A kind of preparation method of ganoine thin film Download PDF

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Publication number
CN108486526A
CN108486526A CN201810626508.0A CN201810626508A CN108486526A CN 108486526 A CN108486526 A CN 108486526A CN 201810626508 A CN201810626508 A CN 201810626508A CN 108486526 A CN108486526 A CN 108486526A
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thin film
ganoine thin
nano
film
preparation
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裘友玖
张鑫
朱华
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Foshan Ling Chao New Material Co Ltd
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Foshan Ling Chao New Material Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/24—Nitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a kind of preparation methods of ganoine thin film, belong to ganoine thin film technical field.The present invention uses ionic nitriding technology and spatter film forming technology, forms nitration case in carbide surface, enhances the abrasion resistance properties of ganoine thin film and the bond strength with matrix；Porous alumina formwork is immersed in Ludox by the present invention using direct colloidal sol completion method, Ludox is set to be deposited on the hole wall of porous alumina formwork, Colloidal Nanosize Silica Template is made, under oxygen atmosphere, asymmetric nano-form is made, with silica in asymmetric nano-form, titanium dioxide, aluminium oxide is target, pass through spatter film forming technology, the film layer produced is smooth, the strong adhesive force of film layer and matrix, sputter coating density is high, pin hole is few, and the purity of film layer is higher, controllability and reproducible, silica and titanium dioxide share, the film layer of sputtering is activity stabilized, improve weatherability, pass through Ar+Glow discharge effect carries out sputter clean, reduces bulky grain pollution.

Description

A kind of preparation method of ganoine thin film
Technical field
The present invention relates to a kind of preparation methods of ganoine thin film, belong to ganoine thin film technical field.
Background technology
Ganoine thin film can significantly improve the cutting ability of cutter and the wear resistance of tool, improve its service life and The aesthetics for increasing product is widely used in cutting industry, mould industry, automobile making, machine-building, textile industry, geology The fields such as probing and aerospace.In machinery manufacturing industry, there are the various forming parts works such as casting, forging, weldering, vehicle, milling, plane, mill, boring Skill, but there is still a need for be made up of machining for most machine components.In addition, in order to reduce product cost, product matter is improved Amount and production efficiency, countries in the world are all widely having 60%~80% in currently manufactured industry according to statistics using mould-forming process Parts be to be molded.Coated cutting tool has an apparent advantage than non-coating knife, service life can be improved 2~10 times with On, cutting speed improves several times, and stock-removing efficiency improves 80% or more.The height of die life and the surface quality of mold are to weigh The important indicator of die quality, because mold is substantially more expensive, more mold exchange not only reduces production efficiency, also adds into This, can not only significantly extend die life after die surface plating ganoine thin film, moreover it is possible to improve its surface quality, reduce table Surface roughness improves machining accuracy, has larger economic benefit.
With the reach of science, the progress of technology, the use of highly difficult rapidoprint is more frequent in industry, cutter and The abrasion of mold has become their dominant failure mode, and universal cutter or mold have been unable to meet new requirement.It is right Cutter is improved by certain method coated cutting tool that coating hard film forms on tool matrix in cutter material Hardness, toughness and wearability, extend cutting-tool's used life, and the revolution become in cutter material development history is broken through.
Ganoine thin film refers to the micron order size hard surface film deposited in matrix surface by certain method, is high property One of the important development direction of energy protective coating.Ganoine thin film is generally carbide, nitride, the carbon nitridation of high-melting-point high rigidity The materials such as object, boride, silicide, oxide, diamond, diamond-film-like and cube BN.The application of ganoine thin film can have Effect improves the performance of workpiece, improves working efficiency, extends the service life of workpiece, widen the application range of workpiece, answered extensively For cutting the fields such as industry, mould industry, automobile making, machine-building, textile industry, geological drilling and aerospace.It will be hard Matter film is applied in cutting industry, and coated cutting tool combines the advantage of basis material and ganoine thin film, improves the cutting model of cutter It encloses, cuts precision and stock-removing efficiency.Because it is with tough, wear-resisting, self-lubricating advantage, high in machining efficiency, high precision machining, Service life is long, and one of the key technology of cutting tool manufacturing field is known as by insider, is also considered as in cutting history Revolution.Ganoine thin film is applied in die industry, coating mold improves mold while keeping or improving mold toughness Surface strength, wearability and thermal stability can also improve die surface quality, reduce friction coefficient, improve product plus Working medium amount extends die life, has huge economic benefit and engineering significance.
Ganoine thin film can improve the performance of workpiece, improve working efficiency, extend the service life of workpiece, improve processing matter Amount, widens the application range of workpiece.With being constantly progressive for processing technology, the application market of ganoine thin film is even more constantly to expand Greatly, it has been widely used in cutting industry, mould industry, automobile making, machine-building, textile industry, geological drilling and aviation boat The fields such as it, and play increasingly important role.Currently, the application overwhelming majority of ganoine thin film concentrate on cutter coat and Mold coatings art.
In cutting industry, the coated cutting tool that coating hard film forms on the cutter material of toughness improves bite Hardness, toughness and the wearability of tool, extend cutting-tool's used life.It is reported that the coating that western industrial developed country uses Cutter is up to ninety percent or more, has 80% or so to use coated cutting tool in cutting tool used in western countries' Novel numerical control machine, sends out It is each coated with ganoine thin film, the hard alloy rotatable knife of 75% or more foreign countries up to the most carbide tool surface of country Piece is coated with coating, and with the development of science and technology, the use ratio of coated cutting tool will be further increased.In die industry, Plating ganoine thin film is remarkably improved the surface strength of mold on flexible mold, and wearability extends the service life of mold.At present The mould applications applied have：Printed circuit board mold, the stretching die of camera, molding for epoxy resin mould, connector mould Tool, the mold of beryllium copper manufacture, electric conduit compression mod, auto parts shaping mould and blanking die, stretching die, punch die etc., effect All it is obvious that 2~20 times of service life can be improved；Also researcher is by battery case forming terrace die, hot die steel, Plating ganoine thin film and significant effect is obtained on the matrixes such as H13 mould steel.
Invention content
The technical problems to be solved by the invention：Film is caused to be easy to fall off for ganoine thin film film/base junction is too small with joint efforts, It is polluted containing bulky grain in arc ion plating film, the larger problem of the roughness of film of deposition provides a kind of hard The preparation method of film.
In order to solve the above technical problems, the technical solution adopted by the present invention is：
（1）Woelm Alumina is impregnated into drying in Ludox, obtains nano-form, nano-form is fixed in coating machine, Under oxygen atmosphere, using titanium dioxide as evaporation source, plated film is carried out to nano-form, obtains asymmetric nano-form；
（2）It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then dried up after being cleaned by ultrasonic with absolute ethyl alcohol, at nitriding Reason, obtains pretreatment hard alloy；
（3）Pretreatment hard alloy is placed in ion plating equipment, Ar is passed through+Glow discharge effect carries out sputter clean；
（4）Control substrate bias is -300~-200V, and using asymmetric nano-form as target, spatter film forming obtains ganoine thin film.
Step（1）It is that Woelm Alumina impregnates 2~4h in Ludox that the immersion, which is dried, is taken out, at 100 DEG C Baking oven in dry 1~2h.
Step（2）The Nitrizing Treatment step is：Pressure is 10~100Pa, temperature is 300~350 DEG C, voltage is Under 400~700V, 2~3h of Nitrizing Treatment.
Step（3）The sputter clean condition is that the vacuum degree of coating chamber is 2 × 10-3Pa is passed through nitrogen to vacuum chamber For 0.6~0.8Pa, arc current is 50~60A, and base material temperature is 200~250 DEG C, substrate bias -600~-800V.
Step（4）The spatter film forming condition is that sputtering power is 60~200W, and sedimentation time is 10~20s, target The distance between hard alloy is 25~30cm.
Compared with other methods, advantageous effects are the present invention：
The present invention uses ionic nitriding technology and spatter film forming technology, and nitration case, Nitrizing Treatment energy are formed in carbide surface Enhance the abrasion resistance properties of ganoine thin film and the bond strength with matrix；The present invention uses direct colloidal sol completion method by porous oxidation Aluminum alloy pattern plate is immersed in Ludox, and Ludox is made to be deposited on the hole wall of porous alumina formwork, and nano silicon dioxide mould is made Plate is made asymmetric using titanium dioxide as evaporation source with vacuum vapour deposition under oxygen atmosphere in nano-form surface coating Nano-form passes through spatter film forming technology, system using silica, titanium dioxide, aluminium oxide in asymmetric nano-form as target The film layer taken is smooth, the strong adhesive force of film layer and matrix, and sputter coating density is high, and pin hole is few, and the purity of film layer is higher, controllably Property and it is reproducible, silica and titanium dioxide share, and the film layer of sputtering is activity stabilized, improve weatherability, pass through Ar+Aura Discharge effect carries out sputter clean, reduces bulky grain pollution.
Specific implementation mode
Woelm Alumina is impregnated into 2~4h in Ludox, is taken out, dry 1~2h, obtains nanometer in 100 DEG C of baking oven Nano-form is fixed in coating machine by template, under oxygen atmosphere, using titanium dioxide as evaporation source, is carried out to nano-form Plated film obtains asymmetric nano-form；It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then be cleaned by ultrasonic with absolute ethyl alcohol After dry up, in the case where pressure is 10~100Pa, temperature is 300~350 DEG C, voltage is 400~700V, 2~3h of Nitrizing Treatment is obtained Pre-process hard alloy；Pretreatment hard alloy is placed in ion plating equipment, the vacuum degree of coating chamber is 2 × 10-3Pa is passed through Nitrogen to vacuum chamber is 0.6~0.8Pa, and arc current is 50~60A, and base material temperature is 300~350 DEG C, substrate bias -600~- 800V passes through Ar+Glow discharge effect carries out sputter clean；Control substrate bias is -300~-200V, with asymmetric nanometer mould Plate is target, and sputtering power is 60~200W, and sedimentation time is 10~20s, the distance between target and hard alloy for 25~ 30cm, spatter film forming obtain ganoine thin film.
Woelm Alumina is impregnated into 2h in Ludox, is taken out, dry 1h, obtains nano-form in 100 DEG C of baking oven, will Nano-form is fixed in coating machine, under oxygen atmosphere, using titanium dioxide as evaporation source, is carried out plated film to nano-form, is obtained Asymmetric nano-form；It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then dried up after being cleaned by ultrasonic with absolute ethyl alcohol, In the case where pressure is 10Pa, temperature is 300 DEG C, voltage is 400V, Nitrizing Treatment 2h obtains pretreatment hard alloy；It will pre-process hard Matter alloy is placed in ion plating equipment, and the vacuum degree of coating chamber is 2 × 10-3Pa, it is 0.6Pa, arc electricity to be passed through nitrogen to vacuum chamber Stream is 50A, and base material temperature is 300 DEG C, and substrate bias -600V passes through Ar+Glow discharge effect carries out sputter clean；Control base Material bias is -300V, and using asymmetric nano-form as target, sputtering power 60W, sedimentation time 10s, target are closed with hard The distance between gold is 25cm, and spatter film forming obtains ganoine thin film.
Woelm Alumina is impregnated into 3h in Ludox, is taken out, dry 1h, obtains nano-form in 100 DEG C of baking oven, will Nano-form is fixed in coating machine, under oxygen atmosphere, using titanium dioxide as evaporation source, is carried out plated film to nano-form, is obtained Asymmetric nano-form；It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then dried up after being cleaned by ultrasonic with absolute ethyl alcohol, In the case where pressure is 50Pa, temperature is 320 DEG C, voltage is 550V, Nitrizing Treatment 2h obtains pretreatment hard alloy；It will pre-process hard Matter alloy is placed in ion plating equipment, and the vacuum degree of coating chamber is 2 × 10-3Pa, it is 0.7Pa, arc electricity to be passed through nitrogen to vacuum chamber Stream is 55A, and base material temperature is 320 DEG C, and substrate bias -700V passes through Ar+Glow discharge effect carries out sputter clean；Control base Material bias is -250V, using asymmetric nano-form as target, sputtering power 130W, sedimentation time 15s, and target and hard The distance between alloy is 28cm, and spatter film forming obtains ganoine thin film.
Woelm Alumina is impregnated into 4h in Ludox, is taken out, dry 2h, obtains nano-form in 100 DEG C of baking oven, will Nano-form is fixed in coating machine, under oxygen atmosphere, using titanium dioxide as evaporation source, is carried out plated film to nano-form, is obtained Asymmetric nano-form；It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then dried up after being cleaned by ultrasonic with absolute ethyl alcohol, In the case where pressure is 100Pa, temperature is 350 DEG C, voltage is 700V, Nitrizing Treatment 3h obtains pretreatment hard alloy；It will pre-process hard Matter alloy is placed in ion plating equipment, and the vacuum degree of coating chamber is 2 × 10-3Pa, it is 0.8Pa, arc electricity to be passed through nitrogen to vacuum chamber Stream is 60A, and base material temperature is 350 DEG C, and substrate bias -800V passes through Ar+Glow discharge effect carries out sputter clean；Control base Material bias is -200V, using asymmetric nano-form as target, sputtering power 200W, sedimentation time 20s, and target and hard The distance between alloy is 30cm, and spatter film forming obtains ganoine thin film.
Reference examples：The Coating Materials of Shenzhen Science and Technology Ltd. production.
The Coating Materials of example and reference examples is detected, specific detection is as follows：
Mechanics test system：Hardness and film/base junction resultant force are the important mechanical performance indexs of ganoine thin film, it directly affects thin The wearability of film.
Hardness test：It using HV-1000 type microhardness testers, is produced by Shanghai Material Testing Machine factory, which has high power Rate optical measuring system, the technologies such as photoelectric sensing.Use the method that survey multiple spot is averaged to reduce measurement error, general measure 5-10 point is averaged, and is measured loaded load and is taken 25g, load time 10s, since film thickness is relatively thin in this experiment, profit The composite hardness that hardness number is film and matrix is measured with this microhardness testers, not the true hardness value of film, only right in this way Film hardness carries out qualitative analysis.
Film substrate bond strength is tested：Scarification.Using MST type nano impress instrument, which is had by Switzerland CSM instrument shares Limit company produces.When scarification measures binding force, cut syringe needle is along film surface linear slide and continuously loads, when loading force increases Greatly to a certain extent after, film will appear crackle or obscission, at this time cut syringe needle and film（Or matrix）Between frictional force It can mutate, acoustic emission signal also occurs to feed back accordingly.But acoustic emission signal also with the type of matrix, hardness, roughness Related, it does not correspond to critical load sometimes, need to be by the cut pattern of its included optical microphotograph sem observation sample, with verification The accuracy of acoustic emission test signal, the comprehensive critical load LC values for determining film.Film is during scratch experiment, with survey The increase of test point head loading force, film will appear crackle or fall off a little, but this not necessarily results in the failure of film, thin at this time Film still has the ability for inhibiting crack propagation, i.e. toughness, so, when testing binding force with this equipment, chooses film and take place brokenly The minimum load split is low critical load LC1, and the completely peeled off load of film is high critical load LC2, and film/base junction of film is closed Power should consider LC1 and LC2.
Roughness measurement：Surface roughness represents the degree of surface microscopic error in geometrical form, is the one of tool coating The critically important index of item, the smaller surface that represents of surface roughness is more smooth, this not only ensure that machining accuracy, can also reduce Friction factor between cutter and mold and workpiece improves toughness of the wearability of cutter and mold without reducing matrix, can Significantly extend the service life of cutter and mold.This experiment is using TALYSURFCLI1000 synthesis measuring profilometers to sample Scanning calculates the surface roughness for determining plating membrane sample.
Specific testing result such as table 1.
Table 1
As shown in Table 1, the Coating Materials that prepared by the present invention has surface quality good, and hardness is high, even film layer, densification, film and base The advantages that being tightly combined between body.

Claims (5)

1. a kind of preparation method of ganoine thin film, which is characterized in that its specific steps are：
（1）Woelm Alumina is impregnated into drying in Ludox, obtains nano-form, nano-form is fixed in coating machine, Under oxygen atmosphere, using titanium dioxide as evaporation source, plated film is carried out to nano-form, obtains asymmetric nano-form；
（2）It will be cleaned by ultrasonic with acetone after hard alloy sanding and polishing, then dried up after being cleaned by ultrasonic with absolute ethyl alcohol, at nitriding Reason, obtains pretreatment hard alloy；
（3）Pretreatment hard alloy is placed in ion plating equipment, Ar is passed through+Glow discharge effect carries out sputter clean；
（4）Control substrate bias is -300~-200V, and using asymmetric nano-form as target, spatter film forming obtains ganoine thin film.
2. a kind of preparation method of ganoine thin film according to claim 1, it is characterised in that：Step（1）The immersion It is that Woelm Alumina impregnates 2~4h in Ludox to be dried, and is taken out, dry 1~2h in 100 DEG C of baking oven.
3. a kind of preparation method of ganoine thin film according to claim 1, it is characterised in that：Step（2）The nitriding Processing step is：In the case where pressure is 10~100Pa, temperature is 300~350 DEG C, voltage is 400~700V, Nitrizing Treatment 2~ 3h。
4. a kind of preparation method of ganoine thin film according to claim 1, it is characterised in that：Step（3）The sputtering Cleaning condition is that the vacuum degree of coating chamber is 2 × 10-3Pa, be passed through nitrogen to vacuum chamber be 0.6~0.8Pa, arc current be 50~ 60A, base material temperature are 200~250 DEG C, substrate bias -600~-800V.
5. a kind of preparation method of ganoine thin film according to claim 1, it is characterised in that：Step（4）The sputtering It is 60~200W that membrance casting condition, which is sputtering power, and sedimentation time is 10~20s, the distance between target and hard alloy for 25~ 30cm。
CN201810626508.0A 2018-06-19 2018-06-19 A kind of preparation method of ganoine thin film Withdrawn CN108486526A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109706452A (en) * 2018-12-12 2019-05-03 中北大学 A kind of method that high-carbon steel surface prepares ceramic coating
CN112813389A (en) * 2019-11-18 2021-05-18 河北召飞科技服务有限公司 Method for reducing large liquid drops in multi-arc ion plating process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109706452A (en) * 2018-12-12 2019-05-03 中北大学 A kind of method that high-carbon steel surface prepares ceramic coating
CN109706452B (en) * 2018-12-12 2020-11-27 中北大学 Method for preparing ceramic coating on surface of high-carbon steel
CN112813389A (en) * 2019-11-18 2021-05-18 河北召飞科技服务有限公司 Method for reducing large liquid drops in multi-arc ion plating process

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