CN108467664A - 一种激光清洗用辅助涂层配方和涂覆清洗工艺 - Google Patents

一种激光清洗用辅助涂层配方和涂覆清洗工艺 Download PDF

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CN108467664A
CN108467664A CN201810179674.0A CN201810179674A CN108467664A CN 108467664 A CN108467664 A CN 108467664A CN 201810179674 A CN201810179674 A CN 201810179674A CN 108467664 A CN108467664 A CN 108467664A
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戴峰泽
周文广
周建忠
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Jiangsu University
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Abstract

本发明公开了一种激光清洗用辅助涂层配方和涂覆清洗工艺，辅助涂层主要成分包括丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒。辅助涂层的涂敷工艺主要包括以下步骤：第一步，将丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒按比例均匀混合；第二步，将均匀混合的辅助涂层均匀涂覆在待处理工件表面；第三步，将涂覆有辅助涂层的待处理工件放入去离子水中，加压至2～3MPa，同时用紫外线辐照烘干辅助涂层；第四步，将工件从去离子水中取出吹干备用。第五步，采用脉冲激光辐照在辅助涂层表面，清洗整个硅片表面，将固化在辅助涂层内部的颗粒污物随辅助涂层一起从硅片表面清除。本发明可应用于集成电路板硅片表面的颗粒污物清除。

Description

一种激光清洗用辅助涂层配方和涂覆清洗工艺
技术领域
本发明属于表面涂层技术领域，具体涉及一种激光清洗用辅助涂层配方和涂覆清洗工艺。
背景技术
集成电路板硅片在封装前通常需要进行清洗，以去除加工过程中附着在硅片表面的颗粒污物，从而提高硅片的性能。微纳米级的颗粒污物在镜片表面的粘着机制与较大尺寸的颗粒污物的粘着机制完全不同，在自身的重量下，会产生塑性变形，从而使黏着力大幅度上升，导致常规的化学清洗和超声清洗无法去除，因此清洗掉微纳米尺寸的颗粒污物是硅片后处理工艺中的一个难题。激光清洗是一种新型高效的清洗手段，可以有效去除多种类型的表面污物，然而，由于激光直接作用在硅片表面会破坏原有的表面结构，因此无法直接用来清洗硅片表面，可以在硅片表面涂覆一层保护涂层，保护涂层将颗粒污物固化在涂层内部，通过激光清洗去除保护涂层的同时去除固化在涂层内部的颗粒污物，需要研发适用于激光清洗的涂层配方和涂覆工艺。
发明内容
本发明的目的在于提出一种激光清洗用辅助涂层配方和涂覆清洗工艺，使颗粒污物可以固化在涂层内部，同时保护涂层可以通过激光清洗方便去除。
为了解决以上技术问题，本发明提供了一种激光清洗用辅助涂层配方，主要成份为丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒，其中丙烯酸环氧树脂的体积含量为60-70％，纳米硅酮粉的体积含量为5-8％，聚氨酯匀泡剂的体积含量为6-8％，纳米碳粉颗粒的体积含量为20-25％。
适用于该涂层的涂覆工艺主要包括以下步骤：第一步，将丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒按比例均匀混合；第二步，将均匀混合的辅助涂层均匀涂覆在待清洗工件表面；第三步，将涂覆有辅助涂层的待清洗工件放入去离子水中，加压的同时用紫外线辐照，将辅助涂层烘干；第四步，将清洗工件从去离子水中取出吹干备用；第五步，采用脉冲激光辐照在辅助涂层表面，清洗整个硅片表面，将固化在辅助涂层内部的颗粒污物随辅助涂层一起从硅片表面清除。
所述涂覆的辅助涂层厚度为30-100微米。
所述紫外线辐照时间为30～50min。
所述脉冲激光的脉宽为10～300ns，功率密度为106～107GW/cm2。
所述的加压指加压至2～3MPa。
本发明的原理是：在硅片表面涂覆保护涂层，将颗粒污物固化在涂层内部，利用激光辐照保护涂层，使固化有颗粒污物的涂层从硅片表面剥离，达到清洗效果，同时涂层可以使硅片表面免受激光辐照损伤，从而获得清洗效果。
本发明具有的有益效果。丙烯酸环氧树脂具有极佳的粘性，可以很好的附着在硅片表面和颗粒污物表面；颗粒污物通常是硅，纳米硅酮粉与颗粒污物具有很好的吸附效果，纳米硅酮粉与丙烯酸环氧树脂一起作用可以使涂层固化颗粒污物的效果更佳；聚氨酯匀泡剂可以较好的去除涂层内部的气泡，从而使涂层获得较好的颗粒污物固化效果；将涂覆有辅助涂层的待处理工件放入去离子水中，加压至2～3MPa，同时用紫外线辐照烘干辅助涂层，可以去除涂层内部99％以上的气泡，涂层固化颗粒污物的效果极佳；纳米碳粉颗粒的加入使涂层对激光不再透明，可以保护基体不受激光辐照损伤，同时纳米碳粉颗粒的加入可以提高涂层对激光吸收率，从而提高激光清洗效果；辅助涂层烘干后，在激光作用下可以从硅片表面开裂剥离。激光清洗后，附着在硅片表面的涂层残留物易溶于丙酮等有机溶剂，易被清除。
具体实施方式
为更好的阐述本发明的实施细节，下面对本发明的一种激光清洗用辅助涂层配方和涂覆工艺进行详细说明。
具体实施实例：
第一步，将体积含量为65％的丙烯酸环氧树脂、体积含量为5％的纳米硅酮粉、体积含量为6％的聚氨酯匀泡剂和体积含量为24％的纳米碳粉颗粒均匀混合；第二步，将丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒的混合物均匀涂覆在硅片待处理表面上，涂层厚度为60微米；第三步；将涂覆有辅助涂层的待处理硅片放入去离子水中，加压至 2～3MPa，同时用紫外线辐照烘干辅助涂层，紫外线辐照时间为40min；第四步，将硅片从去离子水中取出吹干备用；第五步，采用脉宽为100ns，频率为100KHZ，功率密度为 5×106GW/cm2脉冲激光辐照在辅助涂层表面，清洗整个硅片表面，将固化在辅助涂层内部的颗粒污物随辅助涂层一起从硅片表面清除。
激光清洗效率为2.4m2/h。经检测，激光清洗前硅片表面的颗粒污物密度为17.5颗/cm2，激光清洗后，硅片表面的颗粒污物密度为1.3颗/cm2。

Claims (6)

1.一种激光清洗用辅助涂层配方，其特征在于，所述涂层配方成份为丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒，其中丙烯酸环氧树脂的体积含量为60-70％，纳米硅酮粉的体积含量为5-8％，聚氨酯匀泡剂的体积含量为6-8％，纳米碳粉颗粒的体积含量为20-25％。
2.利用如权利要求1所述的辅助涂层配方进行涂覆清洗的工艺，其特征在于，具体步骤如下：
第一步，将丙烯酸环氧树脂、纳米硅酮粉、聚氨酯匀泡剂和纳米碳粉颗粒按比例均匀混合；第二步，将均匀混合的辅助涂层均匀涂覆在待清洗工件表面；第三步，将涂覆有辅助涂层的待清洗工件放入去离子水中，加压的同时用紫外线辐照，将辅助涂层烘干；第四步，将清洗工件从去离子水中取出吹干备用；第五步，采用脉冲激光辐照在辅助涂层表面，清洗整个硅片表面，将固化在辅助涂层内部的颗粒污物随辅助涂层一起从硅片表面清除。
3.如权利要求2所述的工艺，其特征在于：所述涂覆的辅助涂层厚度为30-100微米。
4.如权利要求2所述的工艺，其特征在于：所述紫外线辐照时间为30～50min。
5.如权利要求2所述的工艺，其特征在于：所述脉冲激光的脉宽为10～300ns，功率密度为106～107GW/cm2。
6.如权利要求2所述的工艺，其特征在于：所述的加压指加压至2～3MPa。
CN201810179674.0A 2018-02-28 2018-03-05 一种激光清洗用辅助涂层配方和涂覆清洗工艺 Withdrawn CN108467664A (zh)

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CN201910044747.XA CN109671616B (zh) 2018-02-28 2019-01-17 一种激光清洗硅片或透镜表面颗粒的方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112574673A (zh) * 2020-11-30 2021-03-30 中国电力科学研究院有限公司武汉分院 一种激光清除废旧涂层辅助剂

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112574673A (zh) * 2020-11-30 2021-03-30 中国电力科学研究院有限公司武汉分院 一种激光清除废旧涂层辅助剂
CN112574673B (zh) * 2020-11-30 2022-03-25 中国电力科学研究院有限公司武汉分院 一种激光清除废旧涂层辅助剂

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