CN108418093A - Gas composition for carbon dioxide laser and carbon dioxide laser system - Google Patents
Gas composition for carbon dioxide laser and carbon dioxide laser system Download PDFInfo
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- CN108418093A CN108418093A CN201810436625.0A CN201810436625A CN108418093A CN 108418093 A CN108418093 A CN 108418093A CN 201810436625 A CN201810436625 A CN 201810436625A CN 108418093 A CN108418093 A CN 108418093A
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- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 title claims abstract description 190
- 229910002092 carbon dioxide Inorganic materials 0.000 title claims abstract description 95
- 239000001569 carbon dioxide Substances 0.000 title claims abstract description 94
- 239000000203 mixture Substances 0.000 title claims abstract description 63
- 239000007789 gas Substances 0.000 claims abstract description 272
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 58
- 150000008282 halocarbons Chemical class 0.000 claims abstract description 49
- 230000003287 optical effect Effects 0.000 claims abstract description 38
- 229910052734 helium Inorganic materials 0.000 claims abstract description 33
- 239000001307 helium Substances 0.000 claims abstract description 33
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 29
- 238000004140 cleaning Methods 0.000 claims abstract description 20
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 19
- 239000004215 Carbon black (E152) Substances 0.000 claims description 17
- 229930195733 hydrocarbon Natural products 0.000 claims description 17
- 150000002430 hydrocarbons Chemical class 0.000 claims description 16
- 238000003860 storage Methods 0.000 claims description 12
- 230000005284 excitation Effects 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 230000007246 mechanism Effects 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 230000001427 coherent effect Effects 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 4
- 238000012545 processing Methods 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 abstract description 8
- 238000002360 preparation method Methods 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 229960004424 carbon dioxide Drugs 0.000 description 73
- 241000196324 Embryophyta Species 0.000 description 10
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 9
- 239000004810 polytetrafluoroethylene Substances 0.000 description 9
- 241000931526 Acer campestre Species 0.000 description 7
- -1 trifluoro chloroethene Alkene Chemical class 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 239000003344 environmental pollutant Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004452 microanalysis Methods 0.000 description 4
- 231100000719 pollutant Toxicity 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 239000000356 contaminant Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000790917 Dioxys <bee> Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 241000406668 Loxodonta cyclotis Species 0.000 description 1
- 241000283984 Rodentia Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910002090 carbon oxide Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005138 cryopreservation Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 230000026030 halogenation Effects 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 150000005826 halohydrocarbons Chemical class 0.000 description 1
- 150000002372 helium compounds Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000011514 reflex Effects 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2237—Molecular nitrogen (N2), e.g. in noble gas-N2 systems
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Lasers (AREA)
Abstract
A gas composition and carbon dioxide laser system for carbon dioxide laser relates to the laser field, has solved the problem that optical element durability is low, laser maintenance and clean cost are high, laser performance is unstable that current carbon dioxide laser system exists. The gas composition for a carbon dioxide laser of the present invention comprises carbon dioxide, helium and nitrogen, and contains a gaseous halocarbon concentration of less than 100 ppt. The preparation process comprises the following steps: removing halogenated hydrocarbons from one or more gases from carbon dioxide, helium and nitrogen; the carbon dioxide, helium and nitrogen are combined to form a gas composition having a total gaseous halocarbon concentration of less than 100 ppt. The invention can realize the output of high-efficiency and high-power laser, improve the performance of a laser system by limiting the total concentration of halogenated hydrocarbon, obviously reduce the maintenance and cleaning cost of the laser and improve the energy conversion efficiency of the carbon dioxide laser.
Description
Technical field
The present invention relates to field of laser device technology, and in particular to a kind of gas composition for carbon dioxide laser and
Carbon dioxide laser system.
Background technology
Gas laser is typically to generate light by the excitation of gas medium, and carbon dioxide laser is to use titanium dioxide
The mixture of carbon, nitrogen and helium is as gas medium.Carbon dioxide passes through the energy excitation that is added in gas mixing to higher
Energy state, the carbon dioxide that is stimulated returns to low energy state and forms the transition of energy to generate laser, and nitrogen contributes to
Excitation carbon dioxide simultaneously improves the efficiency for generating light；And the intervention of helium, buffer gas can be played the role of, helped in gas medium
Heat transfer, and carbon dioxide is helped to drop to ground state from low-lying level.Carbon dioxide laser resonant cavity gas is in a variety of manners
It provides, to meet the requirement of specific laser design and laser manufacturer.For example, there is some carbon dioxide laser resonant cavity gases
It is to convey and mix by separate gas cylinder, is carried out before entering laser resonator or in laser resonance intracavitary
Mixing.Also some laser resonator gases are pre-mixed, and are supplied directly to laser resonator.Also some cases
Under, it is that the laser resonator gas that will be mixed has been sealed directly in Optical Maser System.
Under normal conditions, contain a large amount of halogenated hydrocarbons in Optical Maser System in the gas of compression, storage or conduction.Halogenated hydrocarbons
Quantity can be changed according to the difference of design, also with laser generate the situation of equipment it is related.Halogenated hydrocarbon compound is comprising carbon
With at least one halogen such as bromine, chlorine, the compound of fluorine or iodine.Two subclass of halohydrocarbon are that chlorocarbon and carbon fluorination are closed
Object.Chlorocarbon includes carbon and chlorine, and fluorocarbon includes carbon and fluorine.Typical halogenated hydrocarbon compound such as trifluoro chloroethene
Alkene (CTFE) and perfluoropolyether (PFPE) are used for lubricant, such as gas compressor lubricant, sealing element and are generated for laser
The O-ring of equipment.Sometimes fluorocarbons and chlorocarbon can also be mixed to obtain required operating characteristic.
The transfer efficiency of carbon dioxide laser resonant cavity gas containing halogenated hydrocarbons and service life are usually by laser system
It can all decrease after system component.When halogenated hydrocarbon compound is present in laser resonator gas with the concentration more than about 100ppt
When middle, what halogenated hydrocarbon compound can cause to send out from laser resonator is usually that pink is existing to the white flicker of the light of purple
The interruption of elephant.In addition, in the case of given laser power output, contain the total halogenated hydrocarbons concentration for having more than 100ppt with using
The laser of carbon dioxide laser resonant cavity gas-operated compare, include the titanium dioxide that total halogenated hydrocarbons concentration is less than about 100ppt
The input energy that carbon laser resonator gas generates needed for laser wants low.Above-mentioned two mentioned problems can all lead to laser
The reduction of power efficiency, in the case of no any detailed theoretical foundation, it is believed that these problems are all by humorous in laser
Caused by the dissociation of the halogenated hydrocarbon compound chemical chain of length in the high energy field generated in chamber of shaking.The chemical chain of dissociation group again
Synthesis contaminant compound unrelated and rodent with system, such as hydrogen chloride (HCl), hydrogen fluoride (HF) and other destructivenesses
Chemical chain.When laser is reflected and projected in resonant cavity, these contaminant compounds can influence laser and effectively pass through
Optical element.As a result, the durability of these optical elements is greatly lowered.
Further, since the pollutant gathered on optical element in Optical Maser System, it is generally necessary to stop laser
Operation, such as the optical element in laser resonator was cleaned or replaced per every about 600-1200 hours.In general, laser manufactures
Quotient suggests that optical element is cleaned or replaced after using about 2000 hours.Determine other of the frequency of cleaning or replacement optical element
Factor include the purity of gas, the integrality of gas supply device, laser resonator operation power, optical element quality with
And the work period of laser.Cost may be reduced when in addition, though cleaning optical element every time, rather than replaces swash every time
Optical element will be replaced when optical resonator, but the cost for safeguarding or cleaning laser is still very high, because this cost may
It can be repeated as many times every year.
In general, with the increase of laser output power, the purity requirement for carbon dioxide laser resonant cavity gas
Become more stringent.For carbon dioxide laser, the output power for generating about 2.5 to 6 kilowatts is very typical, and
The purity that the carbon dioxide laser of early stage uses is relatively low, and carbon dioxide laser resonant cavity gas generates about 1 to 1.5 kilowatt defeated
Go out power.The purity of compressed gas is defined as follows：
| Purity | Rank | Total impurities |
| 99.9999% | 6N | 1ppm |
| 99.9995% | 5N5 | 5ppm |
| 99.999% | 5N | 10ppm |
| 99.995% | 4N5 | 50ppm |
| 99.99% | 4N | 100ppm |
Limitation on the harmful or bad pollutant that may influence laser performance, such as moisture or total hydrocarbon contain
It measures (THC), has usually dictated otherwise to certain number of 9 purity or " 9 grades ", as shown above.For example, carbon dioxide laser
The gas purity of device industry requires：
The standard carbon dioxide laser resonant cavity gas used in industry can be with about 35 to 50ppm gross contamination object.It is high
It can frequently result in laser resonator in these limitations moisture and total hydrocarbon content and go wrong.Although not measuring usually
Or the concentration of control halogenated hydrocarbons, but since the condition of natural gas plant equipment limits, the Laser industry calibrating gas from gasification plant
In gas halogenated hydrocarbons concentration range be about 0.5ppm to 1ppm.It is halogenated there are many may containing in total halogenated hydrocarbons in these gases
Hydrocarbon compound.
Invention content
In order to solve, optical element durability existing for existing carbon dioxide laser system is low, laser is safeguarded and cleaning
Problem of high cost, laser performance is unstable, the present invention provide a kind of gas composition for carbon dioxide laser and
Carbon dioxide laser system.
The present invention is that technical scheme applied to solve the technical problem is as follows：
The gas composition for carbon dioxide laser of the present invention, including carbon dioxide, helium and nitrogen, it is contained
Gas halogenated hydrocarbons concentration be less than 100ppt.
As preferred embodiment, contained moisture is less than 0.5ppm, and total hydrocarbon concentration is less than 0.1ppm.
Embodiment more preferably further includes the oxygen that concentration is less than 2ppm.
As preferred embodiment, the concentration of volume percent of the carbon dioxide is 1~20%, the body of the nitrogen
Product percent concentration is 10~80%, and surplus is helium.
The preparation method of the gas composition for carbon dioxide laser of the present invention, includes the following steps：
Step 1: removing halogenated hydrocarbons in one or more gases from from carbon dioxide, helium and nitrogen；
Step 2: merging carbon dioxide, helium and nitrogen, wherein at least one gas is generated by step 1,
The gas composition that total gas halogenated hydrocarbons concentration is less than 100ppt is consequently formed.
A kind of carbon dioxide laser system of the present invention mainly realizes that this is using above-mentioned gas composition
It unites and includes mainly：
By tail portion optical element and the laser resonator that forms of output optical device, by tail portion optical element by light reflection
Laser resonator is returned, a part of light reflection is returned into laser resonator by exporting optical device, another part light swashs as relevant
Light is exported from laser resonator；
The first gas conduit device being connected with laser resonator；
The gas supply device being connected with first gas conduit device, for supplying gas composition as laser resonance
Chamber gas, laser resonator gas are directed to laser resonator by first gas conduit device；
Be connected excitation mechanism with laser resonator, and input energy is provided for the laser resonator gas into laser resonator
Amount；
The second gas conduit device being connected with laser resonator；
The gas treatment equipment being connected with second gas conduit device will come from laser by second gas conduit device
The laser resonator gas transport of resonant cavity carries out laser resonator gas to gas treatment equipment, by gas treatment equipment
Laser resonator is transmitted to after recycling processing to be recycled.
As preferred embodiment, the gas supply device includes one or more gas storage devices, Mei Geqi
Body storage device includes：Compressor, the mixer being connected by valve and conduit with compressor with mixer by valve and are led
Manage connected gas cylinder, the pressure holding valve being installed on gas cylinder.
As preferred embodiment, the gas supply device includes one or more gas generating units, Mei Geqi
Body generating means includes：Gas compressor, the mixer and mixer being connected by valve and gas pipeline with gas compressor
The gas cleaning plant being connected by valve and gas pipeline, the gas being connected by valve and gas pipeline with gas cleaning plant
Body storage device.
As preferred embodiment, the gas cleaning plant is activated carbon, filter, lasso, trap or has
The film of selectivity；The gas treatment equipment is activated carbon, filter or selective film.
As preferred embodiment, the excitation mechanism is in DC voltage, alternating voltage, radio frequency source and repetition pulse
It is one or more, for applying energy to laser resonator gas.
The beneficial effects of the invention are as follows：
The present invention provides a kind of preparations of gas composition and the gas composition for carbon dioxide laser
Method and a kind of carbon dioxide laser system realized using the gas composition.High efficiency and Gao Gong may be implemented in the present invention
The output of rate laser, while maintenance cost is reduced, and improve the performance of laser system by limiting the total concentration of halogenated hydrocarbons.
By using a kind of unique laser resonator admixture of gas provided by the invention, optics member can be significantly reduced
The formation of pollutant on part reduces cleaning and replaces the frequency of optical element, so as to significantly reduce the maintenance of laser
And cleaning cost so that the maintenance and cleaning of laser become more convenient and easy.
The laser resonator admixture of gas of the present invention contributes to the whole performance for improving Optical Maser System.Using the present invention
Laser resonator admixture of gas comprise more than total halogenated hydrocarbons concentration phase of 100ppt with using existing laser resonator gas
Than the transformation efficiency of carbon dioxide laser energy is significantly promoted.
Description of the drawings
Fig. 1 is a kind of structural schematic diagram of carbon dioxide laser system of the present invention.
Specific implementation mode
Below in conjunction with attached drawing, invention is further described in detail.
Specific implementation mode one
A kind of gas composition for carbon dioxide laser provided by the invention includes mainly carbon dioxide, helium
And nitrogen, gas halogenated hydrocarbons concentration contained therein are less than 100ppt.
Embodiment more preferably, a kind of gas composition for carbon dioxide laser provided by the invention,
Include mainly carbon dioxide, helium and nitrogen, wherein water content is less than 0.5ppm, and total hydrocarbon (THC) concentration is less than
0.1ppm, gas halides hydrocarbon concentration are less than 100ppt.
As the most preferred embodiment, a kind of gas composition for carbon dioxide laser provided by the invention,
Include mainly carbon dioxide, helium, nitrogen and oxygen, wherein moisture is less than 0.5ppm, and total hydrocarbon (THC) is dense
Degree is less than 0.1ppm, and gas halides hydrocarbon concentration is less than 100ppt, and oxygen concentration is less than 2ppm.
As preferred embodiment, in a kind of gas composition for carbon dioxide laser of the invention, dioxy
The concentration of volume percent for changing carbon is 1~20%, and the concentration of volume percent of nitrogen is 10~80%, and surplus is helium.As
Further preferred embodiment, the concentration of volume percent of carbon dioxide are 1~15%, the concentration of volume percent of nitrogen is 10~
75%, surplus is helium.As the most preferred embodiment, the concentration of volume percent of carbon dioxide is 1~10%, nitrogen
Concentration of volume percent is 10~70%, and surplus is helium.
Specific implementation mode two
The method for preparing a kind of gas composition for carbon dioxide laser described in specific implementation mode one, the party
Method includes mainly：(a) halogenated hydrocarbons is removed in one or more gases from from carbon dioxide, helium and nitrogen；(b) merge
Carbon dioxide, helium and nitrogen, wherein at least one gas are generated by step (a), and it is halogenated that total gas is consequently formed
Hydrocarbon concentration is less than the gas composition of 100ppt.
Specific implementation mode three
Laser is generated using a kind of gas composition for carbon dioxide laser described in specific implementation mode one
Method mainly operates carbon dioxide laser by exciting the gas composition.For example, a kind of utilizing laser cutting, table
The method of face modification or welded articles, this method include mainly：(a) by a kind of gas composition described in specific implementation mode one
It is transferred to laser resonance intracavitary；(b) excited gas composition is to generate coherent beam；(c) coherent beam for generating step (b)
It is directed on product.Described product includes but not limited to timber, metal (such as steel, stainless steel, aluminium, titanium, nickel, copper etc.), rock
Stone, ceramics, plastics and textile etc..
In the above method, the mixing accuracy of used gas composition is ± 5%, ± 4% or ± 3%, preferably ±
2% or ± 1%, more preferably less than ± 1%.Laser resonator gas or laser resonator gas group can be arranged at one or more
In a gas supply device 5, such as aluminum gas cylinder, it can be arranged with pressure holding valve, pressure holding valve makes in aluminum gas cylinder
Portion keeps cleaning, and can prevent external contaminant from entering.Other valves, such as non-pressure retaining valve can also use.Other may
Small gas group (include but not limited to CO, O2, Xe and H2) purity be likely lower than 99.9995%.This is provided with rational purity
A little light gas components are very important, and quality should be reasonable, effectively to control total halogenated hydrocarbon content.
Using the above method, the gas composition of the present invention is placed in carbon dioxide laser and runs the long period, so
Periodicmaintenance is carried out to the optical element in Optical Maser System respectively afterwards.Compared with the method that existing laser generates, this is utilized
The gas composition of invention generates in the method for laser, and the service life of optical element extends.
Using the present invention there is the gas composition of low concentration halogenated hydrocarbons can effectively facilitate the cleaning of Optical Maser System simultaneously
Prevent more frequent laser from interrupting, and then cost-effective.For example, a kind of gas for carbon dioxide laser of the present invention
In composition, contained gas halogenated hydrocarbons concentration is less than 10ppb or is less than 1ppb.In other experiments, make the gas of the present invention
In body composition, gas halogenated hydrocarbons concentration be less than 800ppb, less than 500ppt, less than 300ppt, less than 200ppt, be less than
100ppt, it is less than 100ppt, is less than 75ppt, is less than 50ppt, is less than 25ppt, is less than 10ppt, proves above-mentioned conclusion.
The present invention a kind of gas composition for carbon dioxide laser in, including moisture, hydrocarbon
(THC) and oxygen impurities are further improved the performance and Optical Maser System optical element of carbon dioxide laser by limitation
Durability.For example, in the gas composition of the present invention, moisture is less than 0.5ppm, is less than 0.3ppm, is less than 0.2ppm or small
It is less than 0.1ppm in 0.1ppm and total hydrocarbon (THC) content, is less than 0.05ppm or is less than 0.01ppm.As preferred
Embodiment, the oxygen concentration in gas composition of the invention is less than 4ppm, is less than 2ppm or is less than 1ppm；The gas of the present invention
Total impurities concentration in body composition is less than 10ppm or is less than 5ppm, except total impurities are by removing carbon dioxide, nitrogen and helium
Compound forms；Embodiment more preferably, other than total impurities are by removing carbon dioxide, nitrogen, helium and carbon monoxide
Compound forms.
The gas composition of the present invention is suitable for various carbon dioxide laser systems, including but not limited to seal pipe laser
Device, waveguide laser, axis stream laser, atmospheric laser cross-flow laser (also referred to as cross-flow laser) and laterally excited
Device.
Specific implementation mode four
The present invention provides a kind of carbon dioxide laser systems, include mainly：Laser resonator 1, gas supply device
5, first gas conduit device 6, excitation mechanism 7, second gas conduit device 8, gas treatment equipment 9.
Gas supply device 5 is connected with first gas conduit device 6, first gas conduit device 6 and laser resonator 1
It is connected, excitation mechanism 7 is connected with laser resonator 1, and gas treatment equipment 9 is connected with second gas conduit device 8, and second
Gas conduit device 8 is connected with laser resonator 1.
Laser resonator 1 is made of tail portion optical element 2 and output optical device 3.Optical device 2 generally use in tail portion is complete
Speculum reflects light back into laser resonator 1 by the reflex of tail portion optical element 2.Export 3 generally use of optical device
A part of light reflection is returned laser resonator 1, another part light conduct by half-reflecting half mirror, the effect by exporting optical device 3
Coherent laser 4 is exported from laser resonator 1.
Excitable media, i.e. laser resonator gas, such as the gas composition described in specific implementation mode one, by gas
Feeding mechanism 5 provides.The structure design of gas supply device 5 can make excitable media (laser resonator gas or the present invention
Gas composition) contact between any material containing halogenated hydrocarbons minimizes.
As preferred embodiment, gas supply device 5 includes one or more gas storage devices, each gas storage
Cryopreservation device includes：Gas cylinder, pressure holding valve, conduit, mixer and compressor.Gas cylinder, pressure holding valve, mixer and compressor
It is connected by conduit, compressor is connected with mixer by valve and conduit, and mixer passes through valve and conduit phase with gas cylinder
Even, pressure holding valve is installed on gas cylinder.Gas is compressed by compressor, it, will by mixer by each gas mixing
The final gas composition obtained is stored in gas cylinder.Gas cylinder, conduit, pressure holding valve are used to prevent the additional dirt of excitable media
Dye.Conduit connection is carried out using straight pipe thread, leads to halogen to reduce any polytetrafluoroethylene (PTFE) (PTFE) used on screw thread band
The possibility increased for hydrocarbon.In other preferred embodiments, polytetrafluoroethylene (PTFE) (PTFE) band or halogenated to prevent is not used
Hydrocarbon enters the mode deflated in excitable media and uses polytetrafluoroethylene (PTFE) (PTFE) band.
As preferred embodiment, gas supply device 5 includes one or more gas generating units, each gas hair
Generating apparatus includes：Gas compressor, mixer, valve, gas pipeline, gas storage device and gas cleaning plant, gas pressure
Contracting machine is connected with mixer by valve and gas pipeline, and mixer passes through valve and gas pipeline phase with gas cleaning plant
Even, gas cleaning plant is connected with gas storage device by valve and gas pipeline.Gas is carried out by gas compressor
Compression carries out purified treatment, most by acquisition by gas cleaning plant by mixer by each gas mixing to mixed gas
Whole gas composition is stored in gas storage device.Gas cleaning plant can be activated carbon, filter, lasso, trap
With selective film, for removing halogenated hydrocarbons from laser resonator gas or laser resonator gas component gas.
In other preferred embodiments, threaded fittings are replaced using compression fitting, for example, connecting using VCR connectors manufacture gas pipeline
Fitting.
The excitable media provided by gas supply device 5 is directed to laser resonator via first gas conduit device 6
1.First gas conduit device 6 includes mainly gas conduit, valve and accessory.The structure design of first gas conduit device 6 can
So that the contact between component gas or laser resonator gas and any material containing halogenated hydrocarbons minimizes.
Excitation mechanism 7 is used to provide input to the excitable media (laser resonator gas) included in laser resonator 1
Energy.Excitation mechanism 7 includes voltage or radio frequency source, such as direct current (DC) exchanges (AC), radio frequency (RF), repetition pulse or its
Meaning combination, for applying energy to laser resonator gas.
Second gas conduit device 8, will swashing from laser resonator 1 mainly including gas conduit, valve and accessory
It encourages medium and is transferred to gas treatment equipment 9.The structure design of second gas conduit device 8 can make component gas or laser humorous
The contact shaken between device gas and any material containing halogenated hydrocarbons minimizes.
Gas treatment equipment 9 is a kind of waste treatment equipment or a kind of gas regenerating device, such as can be activity
Charcoal, filter or selective membrane are transmitted to laser resonance after excitable media is carried out recycling processing by gas treatment equipment 9
Chamber 1 is recycled.The structure design of gas treatment equipment 9 can make component gas or laser resonator gas with it is any
Contact between material containing halogenated hydrocarbons minimizes.
Invention is further described in detail with reference to embodiments.
The gas composition for carbon dioxide laser of the present invention, using following gas generation, each gas can be from
Praxair China is commercially available：
Helium：Praxair PartNo.HE 5.5TG micro-analysis grades, halogenated hydrocarbon content are less than 50ppt；
Nitrogen：Praxair PartNo.NI 5.5TG micro-analysis grades, halogenation carbon content are less than 50ppt；
Carbon dioxide：Praxair PartNo.CD 48SE micro-analysis grades, halogenated hydrocarbon content are less than 100ppt；General Lake
This PartNo.CD 5.5LS, halogenated hydrocarbon content are less than 100ppt；
Carbon monoxide：Praxair PartNo.CO 3.0UH.
Embodiment 1
In the present embodiment, using Fa Nake laser resonators (model is respectively TF-3500A and TF-3500A), in 4kw and
The gas of the present invention is used in the carbon dioxide laser (model is respectively LMX-225 and LMX-325) of 6kw Japan Tanaka TANAKA
Body composition, 6000B.
In laser resonator, Laser industry calibrating gas is replaced by the gas composition of the present invention.The gas group of replacement
Close contain in object about 5% carbon dioxide, about 40% helium and about 55% nitrogen (by concentration of volume percent), moisture,
Total hydrocarbon and oxygen content are restricted, and control the accuracy of gas composition to limit gas halogenated hydrocarbons concentration
It makes less than 100ppt, carbon dioxide component gas contains the not more than moisture of 5ppm, the not more than total hydrocarbon of 10ppb
The not more than oxygen of 2ppm, helium component gas contain the not more than moisture of 1ppm, the not more than total hydrocarbon of 0.1ppm
The not more than oxygen of 1ppm, nitrogen component gas contain the not more than moisture of 1ppm, not more than total nytron of 0.1ppm
The oxygen of object and not more than 1ppm；The gross contamination object content of gas composition is less than 5ppm.
It is required using the gas composition of the present invention compared with using the frequency of maintenance needed for Laser industry calibrating gas
Optics frequency of maintenance decrease.
Embodiment 2
In the present embodiment, use the present invention's in 3.5kw Mitsubishis carbon dioxide laser (model 3015LVP-35CF)
Gas composition is as laser resonator gas.
Using existing laser resonator gas, the rated input power of carbon dioxide laser is 480 volts and is multiplied by 161
Ampere.161 ampere-hours, the i.e. maximum operating currenbt of laser resonator are multiplied by when input power reaches 480 volts, carbon dioxide swashs
Light device usually would turn off to be safeguarded.After daily maintenance, carbon dioxide laser under 480 volts of input voltages electric current from
About 150 amperes start to operate.
Then it uses the gas composition of the present invention to be used as laser resonator gas, about 4% 1 is contained in the gas composition
Carbonoxide, about 8% carbon dioxide, about 28% helium and about 60% nitrogen.Use this laser resonator gas, initial input work(
Rate demand is down to 144 amperes at 480 volts, generates 3.5 kilowatts.Primary current, which reduces 6 amperes, means that electricity needs is reduced about
2.88 kilowatts, it is assumed that the electricity charge are 1 yuan/kilowatt hour, and the electricity charge of laser operations reduce about 2.88 yuan/hour.Therefore, by by laser
Halogenated hydrocarbons concentration in resonant cavity gas is limited to less than about 100ppt, and the power efficiency of carbon dioxide laser obtains further
Improve.
Embodiment 3
In the present embodiment, the gas group of the present invention is used in the auspicious bodyguards of 2kw hundred surpass carbon dioxide laser (model 3015)
Object is closed as laser resonator gas.
The gas composition containing 60% helium, 35% nitrogen and 5% carbon dioxide is used first, when this gas of use
When composition, carbon dioxide laser is not up to rated output power.Then using the helium contained less than 50ppt halogenated hydrocarbons
Gas, containing less than 50ppt halogenated hydrocarbons nitrogen and containing the carbon dioxide less than 100ppt halogenated hydrocarbons in the same scale, when making
When with this gas composition, carbon dioxide laser is run with rated output power without accident occurs.Thus it proves, this
The gas composition of invention includes the gas halogenated hydrocarbons less than about 100ppt.
With high-purity research grade 6N helium (purity 99.9999%) (Praxair PartNo.HE 6-0RS, Danbury
CT) it is less than the helium component gas of 50ppt (HE 5.5TG micro-analysis grade) instead of halogenated hydrocarbon content.Research grade 6N helium exists
Handle 9 kinds of different pollutant (O2, H2O, CO2, CO, N2, Ar, Ne, H2With total hydrocarbon content (THC)) on ability be very weak.
Although research grade 6N helium does not test halogenated hydrocarbon content, halogenated hydrocarbons concentration is significantly greater than the laser resonator gas of the present invention
The halogenated hydrocarbons concentration less than 100ppt.With the laser resonator gas phase ratio of the present invention, led using the helium ingredient of higher purity
Significantly more interruption is caused, to reduce the power efficiency of carbon dioxide laser.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications are also answered
It is considered as protection scope of the present invention.
Claims (10)
1. the gas composition for carbon dioxide laser, which is characterized in that contained including carbon dioxide, helium and nitrogen
Some gas halogenated hydrocarbons concentration is less than 100ppt.
2. the gas composition according to claim 1 for carbon dioxide laser, which is characterized in that contained water
Divide and be less than 0.5ppm, total hydrocarbon concentration is less than 0.1ppm.
3. the gas composition according to claim 2 for carbon dioxide laser, which is characterized in that further include concentration
Oxygen less than 2ppm.
4. the gas composition according to claim 1 for carbon dioxide laser, which is characterized in that the titanium dioxide
The concentration of volume percent of carbon is 1~20%, and the concentration of volume percent of the nitrogen is 10~80%, and surplus is helium.
5. the method for preparing the gas composition described in any one of Claims 1-4, which is characterized in that including following step
Suddenly：
Step 1: removing halogenated hydrocarbons in one or more gases from from carbon dioxide, helium and nitrogen；
Step 2: merging carbon dioxide, helium and nitrogen, wherein at least one gas is generated by step 1, thus
Form the gas composition that total gas halogenated hydrocarbons concentration is less than 100ppt.
6. a kind of carbon dioxide laser system realized using the gas composition described in any one of Claims 1-4,
It is characterised in that it includes：
The laser resonator being made of tail portion optical element and output optical device, is reflected light back into sharp by tail portion optical element
Optical cavity, by export optical device by a part of light reflection return laser resonator, another part light as coherent laser from
Laser resonator exports；
The first gas conduit device being connected with laser resonator；
The gas supply device being connected with first gas conduit device, for supplying gas composition as laser resonator gas
Body, laser resonator gas are directed to laser resonator by first gas conduit device；
Be connected excitation mechanism with laser resonator, and input energy is provided for the laser resonator gas into laser resonator；
The second gas conduit device being connected with laser resonator；
The gas treatment equipment being connected with second gas conduit device will come from laser resonance by second gas conduit device
The laser resonator gas transport of chamber is followed laser resonator gas to gas treatment equipment, by gas treatment equipment again
Laser resonator is transmitted to after ring processing to be recycled.
7. a kind of carbon dioxide laser system according to claim 6, which is characterized in that the gas supply device packet
One or more gas storage devices are included, each gas storage device includes：Compressor passes through valve and conduit phase with compressor
Mixer even, the gas cylinder being connected by valve and conduit with mixer, the pressure holding valve being installed on gas cylinder.
8. a kind of carbon dioxide laser system according to claim 6, which is characterized in that the gas supply device packet
One or more gas generating units are included, each gas generating unit includes：Gas compressor passes through valve with gas compressor
It is the mixer that is connected with gas pipeline, the gas cleaning plant being connected by valve and gas pipeline with mixer, net with gas
The gas storage device being connected with gas pipeline by valve is set in makeup.
9. a kind of carbon dioxide laser system according to claim 8, which is characterized in that the gas cleaning plant is
Activated carbon, filter, lasso, trap or selective film；The gas treatment equipment is activated carbon, filter or tool
Selective film.
10. a kind of carbon dioxide laser system according to claim 6, which is characterized in that the excitation mechanism is straight
It is one or more in galvanic electricity pressure, alternating voltage, radio frequency source and repetition pulse, for applying energy to laser resonator gas
Body.
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040004986A1 (en) * | 2002-06-03 | 2004-01-08 | Cherne Larry W. | Carbon dioxide laser resonator gas |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US20040004986A1 (en) * | 2002-06-03 | 2004-01-08 | Cherne Larry W. | Carbon dioxide laser resonator gas |
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Application publication date: 20180817 |