CN108370620B - 弧光灯的电极端头 - Google Patents
弧光灯的电极端头 Download PDFInfo
- Publication number
- CN108370620B CN108370620B CN201680070425.7A CN201680070425A CN108370620B CN 108370620 B CN108370620 B CN 108370620B CN 201680070425 A CN201680070425 A CN 201680070425A CN 108370620 B CN108370620 B CN 108370620B
- Authority
- CN
- China
- Prior art keywords
- arc lamp
- electrode tip
- interface
- electrode
- end surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B31/00—Electric arc lamps
- H05B31/02—Details
- H05B31/06—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/04—Electrodes; Screens; Shields
- H01J61/06—Main electrodes
- H01J61/073—Main electrodes for high-pressure discharge lamps
- H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
- H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
- H01J61/523—Heating or cooling particular parts of the lamp
- H01J61/526—Heating or cooling particular parts of the lamp heating or cooling of electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
- H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B31/00—Electric arc lamps
- H05B31/02—Details
- H05B31/24—Cooling arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/47—Generating plasma using corona discharges
- H05H1/477—Segmented electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/48—Generating plasma using an arc
Abstract
Description
Claims (19)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562272921P | 2015-12-30 | 2015-12-30 | |
US62/272,921 | 2015-12-30 | ||
PCT/US2016/066882 WO2017116740A1 (en) | 2015-12-30 | 2016-12-15 | Electrode tip for arc lamp |
Publications (2)
Publication Number | Publication Date |
---|---|
CN108370620A CN108370620A (zh) | 2018-08-03 |
CN108370620B true CN108370620B (zh) | 2020-11-03 |
Family
ID=59225355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201680070425.7A Active CN108370620B (zh) | 2015-12-30 | 2016-12-15 | 弧光灯的电极端头 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20170194133A1 (zh) |
KR (1) | KR102155100B1 (zh) |
CN (1) | CN108370620B (zh) |
TW (1) | TWI744269B (zh) |
WO (1) | WO2017116740A1 (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022115275A1 (en) * | 2020-11-24 | 2022-06-02 | Mattson Technology, Inc. | Arc lamp with forming gas for thermal processing systems |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1120015B (de) * | 1960-03-10 | 1961-12-21 | Conradty Fa C | Anode fuer Hochleistungskohlebogenlampen |
CN1941269A (zh) * | 2005-09-27 | 2007-04-04 | 株式会社Orc制作所 | 短弧型放电灯 |
CN101329981A (zh) * | 2007-06-22 | 2008-12-24 | 株式会社Orc制作所 | 放电灯 |
CN102446695A (zh) * | 2010-10-01 | 2012-05-09 | 优志旺电机株式会社 | 短弧型放电灯 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6771895B2 (en) * | 1999-01-06 | 2004-08-03 | Mattson Technology, Inc. | Heating device for heating semiconductor wafers in thermal processing chambers |
MXPA01011058A (es) * | 1999-04-30 | 2002-06-04 | Cogent Light Tech | Acoplamiento mejorado de luz desde una lampara de arco electrico pequeno hacia un objetivo mayor. |
JP4512968B2 (ja) * | 2000-08-03 | 2010-07-28 | ウシオ電機株式会社 | ショートアーク型高圧放電ランプ |
US6594446B2 (en) * | 2000-12-04 | 2003-07-15 | Vortek Industries Ltd. | Heat-treating methods and systems |
CN1401728A (zh) * | 2001-08-13 | 2003-03-12 | 新Qu能源有限公司 | 使用高速率传热介质之装置 |
JP3899898B2 (ja) * | 2001-10-30 | 2007-03-28 | ウシオ電機株式会社 | ショートアーク型水銀ランプ |
CN1926658B (zh) * | 2004-02-12 | 2012-10-10 | 加拿大马特森技术有限公司 | 高强度电磁辐射装置与方法 |
CN2742565Y (zh) * | 2004-10-12 | 2005-11-23 | 朱忠明 | 封闭式金属卤化物弧光灯 |
US7670336B2 (en) * | 2005-03-25 | 2010-03-02 | Boston Scientific Scimed, Inc. | Ablation probe with heat sink |
JP5115396B2 (ja) * | 2008-08-20 | 2013-01-09 | ウシオ電機株式会社 | 放電ランプ用陰極および放電ランプ |
JP5299132B2 (ja) * | 2009-07-07 | 2013-09-25 | ウシオ電機株式会社 | デジタルプロジェクター用キセノンショートアークランプ |
-
2016
- 2016-12-15 US US15/380,221 patent/US20170194133A1/en not_active Abandoned
- 2016-12-15 WO PCT/US2016/066882 patent/WO2017116740A1/en active Application Filing
- 2016-12-15 CN CN201680070425.7A patent/CN108370620B/zh active Active
- 2016-12-15 KR KR1020187014795A patent/KR102155100B1/ko active IP Right Grant
- 2016-12-21 TW TW105142458A patent/TWI744269B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1120015B (de) * | 1960-03-10 | 1961-12-21 | Conradty Fa C | Anode fuer Hochleistungskohlebogenlampen |
CN1941269A (zh) * | 2005-09-27 | 2007-04-04 | 株式会社Orc制作所 | 短弧型放电灯 |
CN101329981A (zh) * | 2007-06-22 | 2008-12-24 | 株式会社Orc制作所 | 放电灯 |
CN102446695A (zh) * | 2010-10-01 | 2012-05-09 | 优志旺电机株式会社 | 短弧型放电灯 |
Also Published As
Publication number | Publication date |
---|---|
KR102155100B1 (ko) | 2020-09-14 |
CN108370620A (zh) | 2018-08-03 |
WO2017116740A1 (en) | 2017-07-06 |
TW201729294A (zh) | 2017-08-16 |
KR20180063342A (ko) | 2018-06-11 |
TWI744269B (zh) | 2021-11-01 |
US20170194133A1 (en) | 2017-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20181206 Address after: American California Applicant after: Mattson Tech Inc. Applicant after: Beijing Yitang Semiconductor Technology Co., Ltd. Address before: American California Applicant before: Mattson Tech Inc. |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: California, USA Patentee after: MATTSON TECHNOLOGY, Inc. Patentee after: Beijing Yitang Semiconductor Technology Co.,Ltd. Address before: California, USA Patentee before: MATTSON TECHNOLOGY, Inc. Patentee before: Beijing Yitang Semiconductor Technology Co.,Ltd. |