CN108339406A - Cleaning solution and its preparation, cleaning method and application for ceramic filter plate - Google Patents
Cleaning solution and its preparation, cleaning method and application for ceramic filter plate Download PDFInfo
- Publication number
- CN108339406A CN108339406A CN201711370025.0A CN201711370025A CN108339406A CN 108339406 A CN108339406 A CN 108339406A CN 201711370025 A CN201711370025 A CN 201711370025A CN 108339406 A CN108339406 A CN 108339406A
- Authority
- CN
- China
- Prior art keywords
- ceramic filter
- cleaning
- filter plate
- cleaning solution
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/147—Microfiltration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/20—Accessories; Auxiliary operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
- B01D65/06—Membrane cleaning or sterilisation ; Membrane regeneration with special washing compositions
Abstract
The invention discloses cleaning solution and its preparation, the cleaning methods and application for ceramic filter plate, it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：0.5 1 parts of hydrofluoric acid and 103.5 108 parts of water.The beneficial effects of the invention are as follows EDTA, oxalic acid and hydrofluoric acid to press 10:1:1 ratio is made into the cleaning solution that mass fraction is 10%, and EDTA has preferable solubility at 60 DEG C；Oxalic acid, nitric acid or hydrofluoric acid, which is used alone, cannot be completely dissolved calcium sulfate；EDTA can form chelate at 60 DEG C with calcium, magnesium, iron, the manganese plasma in water, and ceramic wafer is made to clean cleaner；Ceramic wafer cleaning in 1 year is primary, and service life can reach 3 years or so；Cleaning solution can reuse 35 times, and utilization rate is high.
Description
Technical field
The present invention relates to concentrate processing technique fields, the more particularly, to cleaning solution of ceramic filter plate and its preparation.Clearly
Washing method and application.
Background technology
Action principle of the ceramic filter work based on capillary micropore is utilized as filter medium using micropore ceramics
The a large amount of narrow solid-liquid separating equipments with the design of capillarity principle of micropore ceramics.
Disk filter under negative pressure working condition utilizes its air-locked spy of unique water flowing of microporous ceramic filter plate
Property, the vacuum generation of ceramic filter plate inner cavity and external pressure difference are extracted, the material to suspend in hopper is made to be inhaled under the action of negative pressure
Be attached on ceramic filter plate, solid material because that cannot be trapped within ceramic plate surface by microporous ceramic filter plate, and liquid because
The effect of vacuum pressure difference and the hydrophily of ceramic filter plate, which are then passed through, arranges or follows outside into gas liquid dispensing equipment (vacuum barrel)
Ring utilizes to achieve the purpose that separation of solid and liquid.
Ceramic filter ceramic capillary size is generally at 0.1-10 μm.In Tongling Nonferrous Metals mine iron ore concentrate desulfuration operations
In, it adds a large amount of sulfuric acid and adjusts pH values of pulp, be added to large quantities of lime due to selecting early period copper to press down in sulphur operation, cause to generate in ore pulp
A large amount of CaSO4The pervious function of ceramic wafer is made to ceramic wafer generation hole plug and adsorption effect with insoluble matters such as S simple substance
Gradually weaken.Although ceramic filter itself devises nitric acid cleaning, ultrasonic cleaning and water purification back purge system, and every 8
Hour cleaning is primary.But it is then 3 months short, it is long then 6 months, a set of ceramic wafer is just because completely plugged and discarded.Though scene is attempted more
Kind ceramic wafer cleaning technique, effect is bad, causes filter production to be a greater impact, and more transducer set ceramic wafer expense
Costliness seriously affects Business Economic Benefit.
Chemically and physically mixing method of cleaning is currently used method, and chemical cleaning test point selects to close to different filter materials
Suitable cleaning agent, chemical are chemically reacted with the fine grained being blocked in ceramic wafer, achieve the purpose that micronized particles,
In conjunction with cycle backwashing water, fine grained is gone out.Common chemical cleaning mainly has simple pickling, oxidation pickling, oxalic acid clear
Wash with caustic dip etc..
Chinese invention patent publication number CN104593172A discloses the cleaning agent of ceramic filter plate, including following weight
The raw material components of number：Host agent 0.1 ~ 1, auxiliary agent 0.11 ~ 0.6, oxidant 0.01 ~ 0.1, acid regulator 1.7 ~ 6.5；Described
Host agent is one or both of 1-hydroxy ethylidene-1,1-diphosphonic acid or 1-hydroxy ethylidene-1,1-diphosphonic acid salt, and auxiliary agent is the nitrate of solubility, chlorine
It is one or more of in salt dissolving, fluoride salt, fluosilicate, can effectively will be in the micropore surface of ceramic filter plate and hole it is stifled
Plug thing carries out cleaning removal, which can effectively remove the CaSO of ceramic filter plate micropore surface4Equal insoluble matters, but nothing
Method removes the sulphur simple substance of ceramic filter plate micropore surface.
Invention content
The technical problem to be solved by the present invention is to the cleaning solutions of existing ceramic filter plate can not remove impure list simultaneously
Matter sulphur mixture and CaSO4Equal insoluble matters provide a kind of cleaning solution for ceramic filter plate and its preparation, cleaning method thus
And application.
The technical scheme is that：For the cleaning solution of ceramic filter plate, it includes in parts by mass：10 parts of EDTA, 1
Part oxalic acid：0.5-1 parts of hydrofluoric acid and 103.5-108 parts of water.
The preparation method of cleaning solution for ceramic filter plate, it includes the following steps：Under the conditions of 60 DEG C, by EDTA,
Oxalic acid, hydrofluoric acid are according to 10:1:（0.5-1）Ratio be made into mass fraction be 10% solution.
The cleaning method of cleaning solution for ceramic filter plate, it includes the following steps：（1）, ceramic filter stop work
Make, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）, ceramic wafer is placed in cleaning solution,
It is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion.
The improvement of said program is the step（3）Ultrasonic oscillator interval use, intermittent time 10-20min,
Paraffin particles are sprinkled into cleaning solution within this intermittent time.
Being further improved for said program is step（3）Ultrasonic oscillator interval use, intermittent time 10-20s,
Paraffin particles are sprinkled into cleaning solution within this intermittent time.
The application of the cleaning method of cleaning solution for ceramic filter plate, it is applied to ceramics of the cleaning for desulfuration operations
The ceramic filter plate of filter.
The beneficial effects of the invention are as follows EDTA, oxalic acid and hydrofluoric acid to press 10:1:It is 10% that 1 ratio, which is made into mass fraction,
Cleaning solution, EDTA has preferable solubility at 60 DEG C；Oxalic acid, nitric acid or hydrofluoric acid, which is used alone, cannot be completely dissolved sulfuric acid
Calcium；EDTA can form chelate at 60 DEG C with calcium, magnesium, iron, the manganese plasma in water, and ceramic wafer is made to clean more dry
Only；Ceramic wafer cleaning in 1 year is primary, and service life can reach 3 years or so；Cleaning solution can reuse 3-5 times, and utilization rate is high.
Description of the drawings
Fig. 1 is the front and back ceramic filter plate surface layer comparison photo of present invention cleaning；
Fig. 2 is the front and back ceramic filter plate cross-section comparison's photo of present invention cleaning.
Specific implementation mode
The cleaning solution for ceramic filter plate of one of the present invention, it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：
0.5-1 parts of hydrofluoric acid and 103.5-108 parts of water.
The preparation method of above-mentioned cleaning solution, it includes the following steps：Under the conditions of 60 DEG C, EDTA, oxalic acid, hydrofluoric acid are pressed
According to 10:1:（0.5-1）Ratio be made into mass fraction be 10% solution.
According to the technological process entirely picked up, the source of sulphur simple substance may have following several possibility：
1, contain sulphur in the raw ore gangue produced, be dissolved in ore pulp.
2, molybdenum medicament is selected largely to use industrial sodium sulfide, in industrial sodium sulfide, sodium sulfide content only has 60.0% left side
The right side, wherein containing a large amount of impurity sodium thiosulfate.Vulcanized sodium is placed in short term in air can generate sodium polysulfide, sodium polysulfide
It easily decomposes and generates sulphur simple substance, and vulcanized sodium can deliquesce in air, sodium thiosulfate meets acid and generates sulphur simple substance：
Vulcanized sodium deliquesces：
Sodium thiosulfate is reacted with acid：
3. the S in dust technology ore pulp2-It is reacted with cuprous sulfide and generates sulphur simple substance：
Dust technology and S2-Reaction：
Dust technology is reacted with cuprous sulfide：
In order to remove the sulphur simple substance on ceramic filter plate, once attempt using mechanical grinding method to ceramic plate surface attachments into
Row is removed, and ceramic plate will keep preferable Penetration ration after attachment is removed.It is found during using polishing ceramic plate, due to ceramic plate
The film on surface is also buffed off, and the mineral of the micro-size fraction in ore pulp are easy to cause filtrate muddy by ceramic plate micropore, make pottery simultaneously
The vacuum degree of machine also is difficult to reach standard requirement.
It attempts to carry out soaking and washing to ceramic plate using oxalic acid, effect mainly derusting and some heavy metal ion are rotten
It is serious to lose stainless steel, is exactly caused with some metal reactions in stainless steel, so it should not be added directly into pottery machine cleaning system
System.Several pieces of used ceramic plates are impregnated with oxalic acid, after reinstalling to use, platform effect variation is little.
The entitled ethylenediamine tetra-acetic acid of EDTA Chinese, chemical formula C10H16N2O8 are white powder under normal temperature and pressure.It
It is a kind of chelating agent that can be combined with bivalent metal ions such as Mg2+, Ca2+, Mn2+, Fe2+.But its solubility is very low, energy
It is dissolved in boiling water, is slightly soluble in cold water, it is difficult to which a effective amount of chelating agent is made.And generally can not be used together with highly basic, otherwise can
Generate the effect that precipitation loses chelating.But the present invention be found through experiments that under the conditions of 60 DEG C EDTA, oxalic acid, hydrofluoric acid according to
10:1:（0.5-1）Ratio be made into mass fraction be 10% solution have preferable solubility, the molten of 0.52g/L can be made
Xie Du, in water considerably beyond EDTA（22℃）0.2g/L solubility.If it is 50 DEG C or 70 DEG C hairs to change temperature condition
The solubility of existing EDTA can drop to 0.3g/L and 0.4g/L.One of the innovation of the present invention is that overcome original technology inclined
See, is mixed using EDTA, oxalic acid, hydrofluoric acid and used at a certain temperature as chelating agent in specific proportions.
The cleaning method of cleaning solution for ceramic filter plate, it includes the following steps：（1）, ceramic filter stop work
Make, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）, ceramic wafer is placed in cleaning solution,
It is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion.
With reference to embodiment, the present invention will be further described.
Embodiment 1：For the cleaning solution of ceramic filter plate, it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：0.5
Part hydrofluoric acid and 103.5 parts of water.
The preparation method of cleaning solution for ceramic filter plate, it includes the following steps：Under the conditions of 60 DEG C, by EDTA,
Oxalic acid, hydrofluoric acid are according to 10:1:0.5 ratio is made into the solution that mass fraction is 10%.
The cleaning method of cleaning solution for ceramic filter plate, it includes the following steps：（1）, ceramic filter stop work
Make, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）, ceramic wafer is placed in cleaning solution,
It is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion.
Embodiment 2：For the cleaning solution of ceramic filter plate, it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：1 part
Hydrofluoric acid and 108 parts of water.
The preparation method of cleaning solution for ceramic filter plate, it includes the following steps：Under the conditions of 60 DEG C, by EDTA,
Oxalic acid, hydrofluoric acid are according to 10:1:1 ratio is made into the solution that mass fraction is 10%.
The cleaning method of cleaning solution for ceramic filter plate, it includes the following steps：（1）, ceramic filter stop work
Make, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）, ceramic wafer is placed in cleaning solution,
It is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion.
Embodiment 3：For the cleaning solution of ceramic filter plate, it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：1 part
Hydrofluoric acid and 108 parts of water.
The preparation method of cleaning solution for ceramic filter plate, it includes the following steps：Under the conditions of 60 DEG C, by EDTA,
Oxalic acid, hydrofluoric acid are according to 10:1:1 ratio is made into the solution that mass fraction is 10%.
The cleaning method of cleaning solution for ceramic filter plate, it includes the following steps：（1）, ceramic filter stop work
Make, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）, ceramic wafer is placed in cleaning solution,
It is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion, ultrasonic oscillator interval use,
The time have a rest as 10s, paraffin particles are sprinkled into cleaning solution within this intermittent time.
Embodiment 4：Difference lies in the steps in the cleaning method for the cleaning solution of ceramic filter plate with embodiment 3
（3）Ultrasonic oscillator interval uses, intermittent time 20s.
In order to effectively remove the sulphur simple substance in ceramic filter plate surface pore, pass through the ultrasonic oscillator of embodiment 3 and 4
Interval use, in the idle hours of ultrasonic oscillator（10-20s）Paraffin particles are inside sprinkled into, paraffin can be attached to pottery first
The surface of porcelain filter plate, the paraffin particles that can adhere on the surface of ceramic filter plate when ultrasonic oscillator works are formed about
Vortex is strengthened and is cleared up the depth of the intrapore elemental sulfur of ceramic filter plate, and do not injure the surface of ceramic filter plate, subsequent stone
Wax can dissolve in the environment of 60 DEG C, form one layer of oil film on the surface of ceramic filter plate, one can adsorb by ceramic filter
The CaSO of plate stripping4The water content after ceramic filter plate cleaning can be reduced with sulphur simple substance impurity, two, is directly put in storage.
Ceramic filter plate of the cleaning solution and its application method of the present invention especially suitable for the ceramic filter of desulfuration operations.
Using the cleaning solution and its cleaning method of the present invention, ceramic filter plate can be primary with cleaning in 1 year, and service life can
Reach 3 years or so.And cleaning solution can reuse 3-5 times, improve cleaning efficiency, reduce cleaning cost.
As seen from Figure 1, the impurity such as the ceramic filter plate insoluble matter after being cleaned using the cleaning solution of the present invention are subtracted significantly
Few, new ceramic plate surface layer is that loose shape corundum in granules is accumulated, and hole is clear between corundum in granules, constitutes filtration channel.Cleaning
Preceding ceramic plate surface layer is covered by remaining metal sulfide and impure elemental sulfur mixture, and ceramic plate surface pore is invisible.Cleaning
Ceramic plate coating metal sulfide significantly reduces afterwards, and the crystallization of visible needle column elemental sulfur is precipitated.As seen from Figure 2, ceramic plate by
Thinner corundum surface layer and thicker alumino-silicate ceramic inner layer are constituted.In new ceramic plate surface layer and inner layer hole, it is apparent that
It is evenly distributed.The visible apparent thin mud layer of ceramic plate is covered on surface layer before cleaning.Ceramic plate thin mud layer is cleaned out after cleaning, containing miscellaneous
Matter elemental sulfur mixture also greatly reduces.
The present invention compared with the cleaning agent of ceramic filter plate disclosed in Chinese invention patent publication number CN104593172A,
It has the advantage that：
1, the solid-liquid separation efficiency of the ceramic filter plate after cleaning agent cleaning disclosed in CN104593172A is merely able to be returned to
70-82% originally, and the cleaning agent of the present invention can be returned to 85-88% after being cleaned；2, the cleaning of CN104593172A
The use damped cycle of ceramic wafer after medicament cleaning, was increased to 6 months by original 3 months, and the pottery after present invention cleaning
Porcelain filter plate tests its service life in Technology of Anqing practical application and can reach 2-3 or so；3, CN104593172A is disclosed
Cleaning agent can only be disposable, not reproducible utilization, cleaning solution can reuse 3-5 times, and utilization rate is high.
Claims (5)
1. for the cleaning solution of ceramic filter plate, it is characterized in that it includes in parts by mass：10 parts of EDTA, 1 part of oxalic acid：0.5-1
Part hydrofluoric acid and 103.5-108 parts of water.
2. the preparation method for the cleaning solution of ceramic filter plate as described in claim 1, it is characterized in that it includes following step
Suddenly：Under the conditions of 60 DEG C, by EDTA, oxalic acid, hydrofluoric acid according to 10:1:（0.5-1）Ratio be made into mass fraction be 10% it is molten
Liquid.
3. the cleaning method for the cleaning solution of ceramic filter plate as described in claim 1, it is characterized in that it includes following step
Suddenly：（1）, ceramic filter be stopped, ceramic filter plate is unloaded from ceramic filter, is cleaned up with clear water；（2）、
Ceramic wafer is placed in cleaning solution, is impregnated for 24 hours at 60 DEG C；（3）, in step（2）External application ultrasonic oscillator while immersion.
4. the cleaning method for the cleaning solution of ceramic filter plate as claimed in claim 3, it is characterized in that the step（3）'s
Ultrasonic oscillator interval uses, and intermittent time 10-2s is sprinkled into paraffin particles into cleaning solution within this intermittent time.
5. the application for the cleaning method of the cleaning solution of ceramic filter plate as claimed in claim 3, it is characterized in that it is applied
In ceramic filter plate of the cleaning for the ceramic filter of desulfuration operations.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711370025.0A CN108339406A (en) | 2017-12-19 | 2017-12-19 | Cleaning solution and its preparation, cleaning method and application for ceramic filter plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711370025.0A CN108339406A (en) | 2017-12-19 | 2017-12-19 | Cleaning solution and its preparation, cleaning method and application for ceramic filter plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108339406A true CN108339406A (en) | 2018-07-31 |
Family
ID=62963456
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711370025.0A Pending CN108339406A (en) | 2017-12-19 | 2017-12-19 | Cleaning solution and its preparation, cleaning method and application for ceramic filter plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108339406A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109126413A (en) * | 2018-08-29 | 2019-01-04 | 山东迅达化工集团有限公司 | Prepare sulphur/aluminium oxide mercury removal agent method of macropore |
| CN109529631A (en) * | 2018-12-13 | 2019-03-29 | 合肥信达膜科技有限公司 | A kind of ceramic membrane cleaning method for ceramic filter |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1978027A (en) * | 2005-12-09 | 2007-06-13 | 安徽铜都特种环保设备股份有限公司 | On-line washing method of ceramic filtering machine |
| CN1978616A (en) * | 2005-12-09 | 2007-06-13 | 安徽铜都特种环保设备股份有限公司 | Detergent for cleaning ceramic filtering plate |
| CN101564650A (en) * | 2009-05-22 | 2009-10-28 | 南京中医药大学 | Ceramic membrane cleaning agent and preparation method and application thereof |
| US20120009788A1 (en) * | 2010-07-06 | 2012-01-12 | United Microelectronics Corp. | Cleaning solution, cleaning method and damascene process using the same |
| CN107446712A (en) * | 2017-09-09 | 2017-12-08 | 宋红英 | A kind of ceramic filtering plate cleaning agent |
-
2017
- 2017-12-19 CN CN201711370025.0A patent/CN108339406A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1978027A (en) * | 2005-12-09 | 2007-06-13 | 安徽铜都特种环保设备股份有限公司 | On-line washing method of ceramic filtering machine |
| CN1978616A (en) * | 2005-12-09 | 2007-06-13 | 安徽铜都特种环保设备股份有限公司 | Detergent for cleaning ceramic filtering plate |
| CN101564650A (en) * | 2009-05-22 | 2009-10-28 | 南京中医药大学 | Ceramic membrane cleaning agent and preparation method and application thereof |
| US20120009788A1 (en) * | 2010-07-06 | 2012-01-12 | United Microelectronics Corp. | Cleaning solution, cleaning method and damascene process using the same |
| CN107446712A (en) * | 2017-09-09 | 2017-12-08 | 宋红英 | A kind of ceramic filtering plate cleaning agent |
Non-Patent Citations (1)
| Title |
|---|
| 严莲苛: "《水处理药剂及配方手册》", 31 January 2004, 中国石化出版社 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109126413A (en) * | 2018-08-29 | 2019-01-04 | 山东迅达化工集团有限公司 | Prepare sulphur/aluminium oxide mercury removal agent method of macropore |
| CN109126413B (en) * | 2018-08-29 | 2021-05-11 | 山东迅达化工集团有限公司 | Process for preparing macroporous sulfur/alumina mercury removal agents |
| CN109529631A (en) * | 2018-12-13 | 2019-03-29 | 合肥信达膜科技有限公司 | A kind of ceramic membrane cleaning method for ceramic filter |
| CN109529631B (en) * | 2018-12-13 | 2021-07-23 | 合肥信达膜科技有限公司 | Ceramic membrane cleaning method for ceramic filter |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100523162C (en) | Detergent for cleaning ceramic filtering plate | |
| CN104176737B (en) | Method for recovering silicon powder from cut mortar waste | |
| US3207577A (en) | Method for the recovery of copper from a slurry containing the same | |
| JPWO2007015392A1 (en) | Method and apparatus for recovering indium from waste liquid crystal display | |
| CN102134077B (en) | Method for purifying polycrystalline silicon by wet method | |
| CN108339406A (en) | Cleaning solution and its preparation, cleaning method and application for ceramic filter plate | |
| CN109402415A (en) | A kind of preparation of low grade natural rutile can chlorination rich-titanium material method | |
| CN110015855A (en) | Treatment method of lithium slag | |
| CN102229113B (en) | Method for recovering sapphire powder | |
| CN104313330B (en) | A kind of with iron sulfate for the method for heavy metal in solvent recovery discarded hard alloy | |
| CN104671498A (en) | Treatment method and device of wastewater containing superfine silicon powder | |
| CN102275926B (en) | Recovery method of silicon powder | |
| CN105907986A (en) | Extracting method for lead in silver separating residues | |
| CN108128780A (en) | A kind of method of cycle pickling quartz sand | |
| KR101690819B1 (en) | Method for extracting rare earth elements from phosphogypsum | |
| CN100450596C (en) | Micro-filtering or super-filtering film regenerating agent and preparing method | |
| JPS627254B2 (en) | ||
| CN115069313A (en) | Ion exchange column desorption regeneration process | |
| JPH10182128A (en) | Production of high purity silicon powder | |
| US3476554A (en) | Process for recovering copper from leach solutions | |
| CN109136553A (en) | A kind of your liquid impurity-removing method of indirect heap leaching of gold ores technique | |
| JP2003253352A (en) | Process for refining cadmium | |
| CN104762637B (en) | The molten method of comprehensive utilization and its device for extracting valuable element ferrochrome silicon magnalium nickel of chromite acid | |
| CN107601509A (en) | The minimizing technology of iron ion in silicon carbide micro-powder | |
| CN109943707A (en) | A kind of preparation method of secondary zinc oxide |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |