CN108333298A - Chip apparatus for placing and chip oriented instrument - Google Patents

Chip apparatus for placing and chip oriented instrument Download PDF

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Publication number
CN108333298A
CN108333298A CN201710051656.XA CN201710051656A CN108333298A CN 108333298 A CN108333298 A CN 108333298A CN 201710051656 A CN201710051656 A CN 201710051656A CN 108333298 A CN108333298 A CN 108333298A
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CN
China
Prior art keywords
chip
placing
positioning
baffle
chip apparatus
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Granted
Application number
CN201710051656.XA
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Chinese (zh)
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CN108333298B (en
Inventor
赵向阳
陈强
肖祥凯
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Zing Semiconductor Corp
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Zing Semiconductor Corp
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Priority to CN201710051656.XA priority Critical patent/CN108333298B/en
Priority to TW106123085A priority patent/TWI630676B/en
Publication of CN108333298A publication Critical patent/CN108333298A/en
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N2033/0095Semiconductive materials

Abstract

The present invention provides a kind of chip apparatus for placing and chip oriented instrument, the chip apparatus for placing includes for placing the pedestal of chip, two positioning baffles, groove positioning device, front end baffle and sliding panel;The front end baffle is installed on one end of the pedestal, and the front end baffle has a gap;The sliding panel is installed on the other end of the pedestal, and can slide on the base, to change the distance between the sliding panel and the front end baffle;Two positioning baffles are symmetrically arranged on the sliding panel, have scale on two positioning baffles;The groove positioning device is installed between two positioning baffles, and point-blank with the gap of the front end baffle, the groove positioning device can be along the linear slide at the center of the groove positioning device.The chip apparatus for placing of traditional chip oriented instrument is solved when detecting different wafer sizes, need the adjustment for carrying out board component and calibration and there are problems that metallic pollution risk.

Description

Chip apparatus for placing and chip oriented instrument
Technical field
The present invention relates to semi-conductor device technology fields, and in particular to a kind of chip apparatus for placing and chip oriented instrument.
Background technology
Semiconductor integrated circuit is made in the semiconductor substrate of low index surface, currently, semi-conductor industry is most common Chip is the chip of (111) crystal orientation and (100) crystal orientation.The difference of (111) crystal orientation or (100) crystal orientation is mainly atom Atomic density and atomic distance difference, this characteristic in this direction will produce the areas such as surface state, mobility, impurity diffusion Not.
In order to determine the crystal orientation of chip, current 8 inches, 12 inch wafers generally cut a V-type or U using on chip side The mode of type groove, in this way, some subsequent semiconductor equipments can carry out chip and equipment by this V-type or U-shaped groove Positioning.
It is cut after being formed in V-type or U-shaped groove in view of the importance of above-mentioned V-type either U-shaped groove, it will usually logical It crosses chip oriented instrument and is further verified whether it cuts accurately.The chip apparatus for placing of traditional chip oriented instrument, such as Fig. 1 It is shown, including pedestal 101, set screw 102, set screw 103, groove positioning device 104 and front end baffle 107.The bottom The smaller one end both sides of 101 sizes of seat are equipped with set screw 102 and set screw 103.Front end baffle 107 is mounted on the pedestal The center of the smaller one end of 101 sizes.The front end baffle 107 includes symmetrical two parts, that is, front end baffle first part 105 and front end baffle second part 106, there are a gap, larger-size one end of the baffle 101 to be equipped between two parts The one groove positioning device 104 that can be slided along 101 axis direction of the baffle.
Carry out it is chip oriented when, only chip 201 need to be placed on the pedestal 101, allow the chip 201 with it is described 107 3 points of set screw 102,103 and the front end baffle are tangent, then by being penetrated from the gap of the front end baffle 107 The X-ray entered carries out crystal orientation positioning, and rotation chip 201 is to adjust chip crystal orientation to prescribed direction, finally by groove positioning device It pushes ahead, as can fitting like a glove with groove, i.e. groove cutting is correct, and crystal orientation positioning is correct, otherwise crystal orientation Wrong localization.
But apparatus above has one, that is, when carrying out different wafer sizes orientation, it is necessary to adjust set screw 102, 103 just can guarantee that different wafer sizes can be tangent.As shown in Fig. 2, for the fixed screw 102,103 of same position, It cannot meet the tangent requirement of various sizes of chip.This problem can be more clearly from found out by Fig. 3, if wanted 3 points of tangent positioning that the set screw 102,103 and front end baffle 107 are carried out to various sizes of chip, just must be to institute It states set screw 102,103 to carry out position adjustment and calibrate chip apparatus for placing, this also can in actual mechanical process Human error is introduced, causes positioning inaccurate, and efficiency is very low.
In addition, it has been found that the material that the chip apparatus for placing of traditional chip oriented instrument uses easily is got rusty, with crystalline substance Piece is in direct contact, the risk that Fe metal elements can be brought to pollute.
Invention content
The object of the present invention is to provide a kind of chip apparatus for placing, and the chip to solve traditional chip oriented instrument is put Set the problem that device accuracy is low and efficiency is low.
Another object of the present invention is to solving the chip apparatus for placing of traditional chip oriented instrument, there are metallic pollution wind The problem of danger.
The present invention provides a kind of chip apparatus for placing comprising:For place the pedestal of chip, two positioning baffles, Groove positioning device, front end baffle and sliding panel;
The front end baffle is installed on one end of the pedestal, and the front end baffle has a gap;
The sliding panel is installed on the other end of the pedestal, and can slide on the base, to change the sliding The distance between plate and the front end baffle;
Two positioning baffles are symmetrically arranged on the sliding panel, have scale on two positioning baffles;
The groove positioning device is installed between two positioning baffles, the center of the groove positioning device with it is described before Point-blank, the groove positioning device can be along the linear slide in the gap of end-stopping plate.
Optionally, area of the area of the pedestal at least more than the chip being placed on it.
Optionally, the pedestal is axially symmetric structure.
Optionally, the front end baffle center is located on the symmetry axis of the pedestal.
Optionally, the front end baffle includes two parts.
Optionally, the width in the gap of the front end baffle is 20mm-50mm.
Optionally, the groove positioning device and contact wafers end are the protrusion coincideing with chip V-type groove.
Optionally, the groove positioning device and contact wafers end are the protrusion coincideing with the U-shaped groove of chip.
Optionally, the length of the positioning baffle is 50mm-200mm.
Optionally, the angle between two positioning baffle is 60 ° -150 °.
Optionally, the graduation position on the positioning baffle is different wafer sizes and the tangent position of the positioning baffle It sets.
Optionally, teflon material layer is covered in the one side of the pedestal and contact wafers.
Optionally, teflon material layer is covered in the one side of the positioning baffle and contact wafers.
Optionally, it is covered with teflon material layer in the front end baffle and the one side of contact wafers
Optionally, the thickness of the teflon material layer is 2mm-5mm.
This law invention provides a kind of chip oriented instrument comprising chip apparatus for placing described in any one of the above embodiments.
In conclusion using chip apparatus for placing provided by the invention, since the positioning plate can be with various sizes of crystalline substance Piece can be tangent, it is only necessary to correspond to different wafer sizes on positioning plate and put on scale, you can be positioned to different wafer sizes Detection, without being adjusted and calibrating as conventional wafer apparatus for placing, to improve detection efficiency and accuracy.
In addition, since the region of wafer locating device provided by the invention and contact wafers is all covered with teflon material Layer, to reduce the risk of metallic pollution.
Description of the drawings
Fig. 1 is the upward view of conventional wafer apparatus for placing;
Fig. 2 is the upward view that conventional wafer apparatus for placing positions different wafer sizes;
Fig. 3 is the close-up schematic view that conventional wafer apparatus for placing positions different wafer sizes;
Fig. 4 is the upward view for the chip apparatus for placing that the preferred embodiment of the present invention provides;
Fig. 5 is the schematic diagram of the front end baffle for the chip apparatus for placing that the preferred embodiment of the present invention provides;
Fig. 6 is the depression angle signal that the chip apparatus for placing that the preferred embodiment of the present invention provides positions different wafer sizes Figure;
Fig. 7 is the schematic diagram of the side for the chip apparatus for placing that the preferred embodiment of the present invention provides;
Fig. 8 is the flow chart for the application method that the chip apparatus for placing provided is preferably implemented in the present invention;
The description of symbols of attached drawing 1- attached drawings 7 is as follows:
101,301- pedestals;102,103- set screws;104,304- grooves positioning device;105,305- front end baffles A part;106,306- front end baffles second part;107,307- front end baffles;201,401- chips;302,303- positioning gear Plate;308- sliding panels;309,310,311- teflon material layers;Angle between α-two positioning baffles;D1- front end baffles first Part and front end baffle second part are away from each other the distance between one end;D2- front end baffles first part and front end baffle second Gap width between part;The height of h- front end baffles.
Specific implementation mode
Chip apparatus for placing proposed by the present invention is described in detail below in conjunction with the drawings and specific embodiments.Under Face illustrates and claims, advantages and features of the invention will become apparent from.It should be noted that attached drawing is all made of very simplification Form and use non-accurate ratio, only for the purpose of facilitating and clarifying the purpose of the embodiments of the invention.
It is the upward view for the chip apparatus for placing that the preferred embodiment of the present invention provides refering to Fig. 4.This implementation The chip apparatus for placing that example provides comprising:301, two positioning baffles 302 of pedestal and 303, groove for placing chip are fixed Position device 304, front end baffle 307 and sliding panel 308;
The front end baffle 307 is installed on one end of the pedestal 301, and the front end baffle 307 has a gap;
The sliding panel 308 is installed on the other end of the pedestal 301, and can be slided on the pedestal 301, to change The distance between the sliding panel 308 and the front end baffle 307;
Two positioning baffles 302,303 are symmetrically arranged on the sliding panel 308, are had on two positioning baffles 302,303 There is scale;
The groove positioning device 304 is installed between two positioning baffles 302,303, the groove positioning device 304 Center and the front end baffle 307 gap point-blank, the groove positioning device 304 can be along the linear slide.
Specifically, the length of the positioning baffle 302,303 is preferably 50mm-200mm, the positioning baffle 302 and institute It is preferably 60 ° -150 ° to state the angle α between positioning baffle 303.Certainly in practical applications, the positioning baffle 302,303 Length can be adjusted according to actual conditions, and the angle α between the positioning baffle 302 and the positioning baffle 303 can also be done Appropriate adjustment.
Specifically, the pedestal 301 is an axially symmetric structure, the e.g. sector of unfilled corner.The area of the pedestal 301 is big It is located on the symmetry axis of the pedestal 301 in the center of the area for the chip 401 being placed on it, the front end baffle 307.When So in practical applications, the pedestal 301 or non-axis symmetry figure, 301 area of the pedestal are also smaller than or are equal to The chip 401 being placed on it, it is only necessary to which the length of the pedestal 301 in the X-axis is more than the chip 401 being placed on it i.e. Can, the position of the front end baffle 307 can be also adjusted.
Specifically, the groove positioning device 304 is the protrusion coincideing with V-type groove with 401 contact jaw of chip.Certainly exist In illustrative application, the groove on chip 401 may be U-shaped or other shapes, correspondingly, the groove positioning device 304 Protrusion also changes therewith, and the protrusion of the groove positioning device 304 can coincide with it.
Specifically, as shown in figure 5, the front end baffle 307 includes front end baffle first part 305 and front end baffle second It is excellent that part 306, the front end baffle first part 305 and front end baffle second part 306 are away from each other the distance between one end d1 Select ranging from 50mm-100mm, the gap width between the front end baffle first part 305 and front end baffle second part 306 D2 preferred scopes are 20mm-50mm, and the gap is located at 307 center of the front end baffle, the height h of the front end baffle 307 Preferred scope is 3-6mm.Certainly in practical applications, the size of the front end baffle can be adjusted according to actual conditions, institute The gap width d2 stated between front end baffle first part 305 and front end baffle second part 306 also can be in front end baffle 307 Center is moved left and right, and the front end baffle 307 can not also be divided into two parts, for example, being integral structure and wherein Between have a groove.
It is and described fixed specifically, as shown in fig. 6, when the different chip 401 of size is positioned at the chip apparatus for placing Position baffle 302,303 has the point of contact of different location.Positioning is carried out with the various sizes of chip of standard and by tangency location mark High scale, you can be detected for different wafer sizes during localization examination later, without carrying out board adjustment Or calibration, it is greatly improved compared with conventional wafer apparatus for placing efficiency and accuracy.
In preferred embodiment, the bottom plate 301 of the chip apparatus for placing and 401 contact surface of chip, the front end baffle 307 with Contact wafers face and two positioning baffles 302,303 are all covered with teflon material layer with 401 contact surface of chip.Specifically, such as Shown in Fig. 7, bottom plate 301 and 401 contact surface of chip of the chip apparatus for placing are covered with teflon material layer 311, before described End-stopping plate 307 is covered with teflon material layer 310, two positioning baffles 302,303 (in conjunction with shown in Fig. 4) and crystalline substance with contact wafers face 401 contact surface of piece is covered with teflon material layer 309, and the thickness of the teflon material layer 309,310,311 is preferably 2mm- 5mm.Certainly in practical applications, the bottom plate 301 also can not whole face cover the teflon material layer 309,310,311, only Covered with 401 contact portion of the chip, the thickness of the teflon material layer 309,310,311 also can according to technique and Actual state is adjusted.
In conjunction with shown in Fig. 4 to Fig. 8, the application method of the chip apparatus for placing is as follows:
The sliding panel 308 of S1, the sliding chip apparatus for placing make the pedestal 301 of the chip apparatus for placing expose most Large area;
S2, chip 401 to be measured is positioned on the pedestal 301 of the chip apparatus for placing;
The sliding panel 308 of S3, the sliding chip apparatus for placing make chip 401 to be measured and the chip apparatus for placing Two positioning plates 302,303 and front end baffle 307 be tangent, and observing the chip 401 is cut with two positioning plate 302,303 Whether corresponding graduation position is consistent for point, if unanimously, chip 401 is of the required size, into next step;If inconsistent, Then 401 size of chip is undesirable;
S4, the rotation chip 401 to be measured, adjust its crystal orientation to prescribed direction;
The groove positioning device 304 of S5, the sliding chip apparatus for placing, keep it tight with 401 edge of chip to be measured Patch, if the edge groove of itself and the chip 401 to be measured is just coincide, you can illustrate that crystal orientation positioning is correct.
In conclusion using chip apparatus for placing provided by the invention, due to the positioning plate and various sizes of chip It can be tangent, it is only necessary to different wafer size table high scales are corresponded on positioning plate, you can positioning inspection is carried out to different wafer sizes It surveys, without being adjusted and calibrating as conventional wafer apparatus for placing, to improve detection efficiency and accuracy;Due to The region of wafer locating device and contact wafers provided by the invention is all covered with teflon material layer, thus greatly reduces gold Belong to the risk of pollution.
Foregoing description is only the description to present pre-ferred embodiments, not to any restriction of the scope of the invention, this hair Any change, the modification that the those of ordinary skill in bright field does according to the disclosure above content, belong to the protection of claims Range.

Claims (16)

1. a kind of chip apparatus for placing, which is characterized in that including:Pedestal, two positioning baffles, grooves for placing chip are fixed Position device, front end baffle and sliding panel;
The front end baffle is installed on one end of the pedestal, and the front end baffle has a gap;
The sliding panel is installed on the other end of the pedestal, and can slide on the base, with change the sliding panel with The distance between described front end baffle;
Two positioning baffles are symmetrically arranged on the sliding panel, have scale on two positioning baffles;
The groove positioning device is installed between two positioning baffles, the center of the groove positioning device and the preceding terminal block Point-blank, the groove positioning device can be along the linear slide in the gap of plate.
2. chip apparatus for placing as described in claim 1, which is characterized in that the area of the pedestal is at least more than being placed on it Chip area.
3. chip apparatus for placing as described in claim 1, which is characterized in that the pedestal is axially symmetric structure.
4. chip apparatus for placing as claimed in claim 3, which is characterized in that the center of the front end baffle is located at the pedestal On symmetry axis.
5. chip apparatus for placing as described in claim 1, which is characterized in that the front end baffle includes two parts.
6. chip apparatus for placing as described in claim 1, which is characterized in that the width in the gap of the front end baffle is 20mm- 50mm。
7. the chip apparatus for placing as described in any one of claim 1 to 6, which is characterized in that the groove positioning device and crystalline substance One end of piece contact is the protrusion coincideing with the V-type groove of chip.
8. the chip apparatus for placing as described in any one of claim 1 to 6, which is characterized in that the groove positioning device and crystalline substance One end of piece contact is the protrusion coincideing with the U-shaped groove of chip.
9. the chip apparatus for placing as described in any one of claim 1 to 6, which is characterized in that the length of the positioning baffle is 50mm-200mm。
10. the chip apparatus for placing as described in any one of claim 1 to 6, which is characterized in that the folder between two positioning baffles Angle is 60 ° -150 °.
11. chip apparatus for placing as described in claim 1, which is characterized in that the position of the scale on the positioning baffle is not Chip with size and the tangent position of the positioning baffle.
12. chip apparatus for placing as described in claim 1, which is characterized in that covered in the one side of the pedestal and contact wafers There is teflon material layer.
13. chip apparatus for placing as described in claim 1, which is characterized in that in the one side of the positioning baffle and contact wafers It is covered with teflon material layer.
14. chip apparatus for placing as described in claim 1, which is characterized in that in the front end baffle and the one side of contact wafers It is covered with teflon material layer.
15. the chip apparatus for placing as described in any one of claim 12 to 14, which is characterized in that the teflon material layer Thickness is 2mm-5mm.
16. a kind of chip oriented instrument, which is characterized in that include the chip placement dress as described in any one of claim 1 to 15 It sets.
CN201710051656.XA 2017-01-19 2017-01-19 Wafer placing device and wafer orientation instrument Active CN108333298B (en)

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Application Number Priority Date Filing Date Title
CN201710051656.XA CN108333298B (en) 2017-01-19 2017-01-19 Wafer placing device and wafer orientation instrument
TW106123085A TWI630676B (en) 2017-01-19 2017-07-10 Chip mounting equipment and chip position finder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710051656.XA CN108333298B (en) 2017-01-19 2017-01-19 Wafer placing device and wafer orientation instrument

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CN108333298A true CN108333298A (en) 2018-07-27
CN108333298B CN108333298B (en) 2021-03-09

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TW (1) TWI630676B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114178931A (en) * 2021-12-27 2022-03-15 江西兆驰半导体有限公司 Chamfering positioning device and method for V-shaped NOTCH groove of sapphire wafer

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1336008A (en) * 1998-12-02 2002-02-13 纽波特公司 Specimen holding robotic arm end effector
JP3578194B2 (en) * 1997-03-18 2004-10-20 株式会社東京精密 Wafer positioning method and apparatus
CN1947223A (en) * 2004-04-23 2007-04-11 艾克塞利斯技术公司 Simplified wafer alignment
CN102189542A (en) * 2010-03-19 2011-09-21 东京毅力科创株式会社 Manipulator for conveying semiconductor wafers
CN202229978U (en) * 2011-09-09 2012-05-23 武汉钢铁(集团)公司 Sample centering device for tensile experiment
CN103811392A (en) * 2014-03-10 2014-05-21 上海华虹宏力半导体制造有限公司 Mounting method for wafer Y-piece
TWI561539B (en) * 2010-12-09 2016-12-11 Kyoritsu Chemical & Co Ltd

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030064902A1 (en) * 2001-10-03 2003-04-03 Memc Electronic Materials Inc. Apparatus and process for producing polished semiconductor wafers

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3578194B2 (en) * 1997-03-18 2004-10-20 株式会社東京精密 Wafer positioning method and apparatus
CN1336008A (en) * 1998-12-02 2002-02-13 纽波特公司 Specimen holding robotic arm end effector
CN1947223A (en) * 2004-04-23 2007-04-11 艾克塞利斯技术公司 Simplified wafer alignment
CN102189542A (en) * 2010-03-19 2011-09-21 东京毅力科创株式会社 Manipulator for conveying semiconductor wafers
TWI561539B (en) * 2010-12-09 2016-12-11 Kyoritsu Chemical & Co Ltd
CN202229978U (en) * 2011-09-09 2012-05-23 武汉钢铁(集团)公司 Sample centering device for tensile experiment
CN103811392A (en) * 2014-03-10 2014-05-21 上海华虹宏力半导体制造有限公司 Mounting method for wafer Y-piece

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114178931A (en) * 2021-12-27 2022-03-15 江西兆驰半导体有限公司 Chamfering positioning device and method for V-shaped NOTCH groove of sapphire wafer

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Publication number Publication date
CN108333298B (en) 2021-03-09
TWI630676B (en) 2018-07-21
TW201828385A (en) 2018-08-01

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