CN108237062A - A kind of method of nano silicon dioxide self assembly deposition film forming - Google Patents
A kind of method of nano silicon dioxide self assembly deposition film forming Download PDFInfo
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- CN108237062A CN108237062A CN201611203325.5A CN201611203325A CN108237062A CN 108237062 A CN108237062 A CN 108237062A CN 201611203325 A CN201611203325 A CN 201611203325A CN 108237062 A CN108237062 A CN 108237062A
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- silicon dioxide
- nano silicon
- deposition film
- solution
- film forming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/10—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an adhesive surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/54—No clear coat specified
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Laminated Bodies (AREA)
Abstract
The present invention relates to a kind of methods of nano silicon dioxide self assembly deposition film forming in oil drilling borehole wall reinforcement technique field.Technical solution is：At room temperature, solid thin-sheet is immersed in polymer solution, nanosilica solution respectively successively, carry out alternating sorbent, dipping adsorption time 5min ~ 10min every time, it with the redundant solution do not adsorbed on deionized water cleaning sheet shape solid in interval, and is dried up with nitrogen, this is a cycle period, after alternating invades 20 ~ 200 cycle periods of stain, you can the deposition film layer of nano silicon dioxide is obtained on solid thin-sheet surface.This method makes nano silicon dioxide adsorb deposition in the surface of solids using self-assembling technique, and formation compatibility is good, has the film layer of layer structure, is reinforced especially suitable for drilling shaft lining.
Description
Technical field
The present invention relates to a kind of nano silicon dioxide self assemblies in oil drilling borehole wall reinforcement technique field to deposit film forming
Method.
Background technology
The development of self-assembled film technology mainly experienced three phases, i.e. Langmuir-Blodgett (LB) membrane technology, change
Learn absorption self-assembling technique and Electrostatic Absorption self-assembling technique.LB films are using special device, be will be dispersed in solution not
Molten object according to certain arrangement mode, is transferred on solid support, so as to form monolayer or polymolecular tunic.Chemistry
Self-assembling technique, the mainly atom of adsorption molecule and the surface of solids, molecule etc. are adsorbed, electronics transfer, exchange or public occurs
Have, so as to form sorption chemical key between adsorbate and the surface of solids, this absorption usually only has monolayer.Electrostatic Absorption
Self assembly is to carry out alternating sorbent by the polyelectrolyte to two or more oppositely chargeds, so as to replace in the surface of solids
Deposition forms the technology of multilayer film.
Inorganic nano sheet layer material with unique material property can also be combined with laminated assembling technology,
Ferguson etc. is reported is assembled into multilayer film using the polyelectrolyte of nominal price with silicate nano piece.Thickness is the more of 200nm
Film structure is regular, and X-ray diffraction signal is apparent.Podsiadlo etc. is prepared using polyvinyl alcohol (PVA) and montmorillonite (MTM)
Superpower polymer nanocomposite membrane material.Nanoscale twins are tightly packed and have clearly planar orientation.Pass through mechanicalness
It can test, author obtains the final tensile strength of simple PVA/MTM composite membranes and Young's modulus is pure PVA polymer films respectively
4 times and 10 times, and by glutaraldehyde cross-linking after, every mechanical performance parameter of multilayer film is even more to increase substantially.It is different from
After mechanical performance, Hammond and its partner have studied addition inorganic nano sheet layer material, the ion transport property of multilayer film.
Such as biomimetic mineralization material is prepared using laminated assembling technology, so that it may it is widely used for oil drilling many aspects, such as drilling well
Borehole wall reinforcing etc..Existing researcher proposes crystalline structure, shape and the side of assembling in control calcium carbonate crystal growth course
Method.Patent application No. is 200710042997.7 proposes a kind of nano layered calcium carbonate bionic composite material material, it be by
Low-molecular-weight organic matter participates in calcium chloride and sodium carbonate reaction process, is oriented to calcite and forms nanometer thin layer structure, and then make
The multilayered structure of layer structure directional assembly nano thin-layer.These researchs play the bio-mimetic syntheses of biomineralization material important
Impetus, but still fail to grow into biomimetic material or method and material property with natural whiting structure and need
It further improves.
Invention content
In order to solve the problems in the prior art, the purpose of the present invention is to provide a kind of nano silicon dioxide self assembly and be deposited into
The method of film, this method make nano silicon dioxide adsorb deposition in the surface of solids using self-assembling technique, and formation compatibility is good, tool
There is the film layer of layer structure.
In order to reach the purpose of the present invention, the technical scheme is that be achieved：
At room temperature, solid thin-sheet is immersed in polymer solution, nanosilica solution respectively successively, carries out alternating sorbent,
Dipping adsorption time 5min ~ 10min every time, it is extra molten with not adsorbed on deionized water cleaning sheet shape solid in interval
Liquid, and dried up with nitrogen, this is a cycle period, after alternating invades 20 ~ 200 cycle periods of stain, you can in solid thin-sheet table
Face obtains the deposition film layer of nano silicon dioxide.
In the technical program, the polymer solution is PAA（Polyacrylic acid）、PVA（Polyvinyl alcohol）、PVS（Polyethylene sulphur
Sour sodium）、PAH（Polycyclic aromatic hydrocarbon）The combination of one or more of solution.
The mass percent of the polymer solution is 0.1 ~ 0.2%wt, and pH value is 4.0 ~ 4.5；The nano silicon dioxide
The mass percent of solution is 0.5 ~ 1%wt, and pH value is 8.0 ~ 8.5.
The nano silicon dioxide be parental type, i.e., hydrophilic simultaneously and oleophylic.
The solid thin-sheet can be one or more of silicon chip, sheet metal, potsherd, Rock laminate, sheet glass, filter paper
Combination.
The present invention has the advantage that compared with prior art：
This method makes nano silicon dioxide adsorb deposition in the surface of solids using self-assembling technique, and formation compatibility is good, has layer
The film layer of shape structure is reinforced especially suitable for drilling shaft lining.
Specific embodiment
Embodiment 1：
At room temperature, solid thin-sheet is alternately immersed to PAA solution respectively successively（0.1%wt, pH=4.0）, nanosilica solution
（0.5%wt, pH=8.0）In, alternating sorbent is carried out, adsorption time 5min is impregnated every time, deionized water cleaning sheet shape is used in interval
The redundant solution do not adsorbed on solid, and dried up with nitrogen, this is a cycle period, and alternating invades 20 cycle periods of stain
Afterwards, you can the deposition film layer of nano silicon dioxide is obtained on solid thin-sheet surface.
Embodiment 2：
At room temperature, solid thin-sheet is alternately immersed to PVA solution respectively successively（0.2%wt, pH=4.5）, nanosilica solution
（1%wt, pH=8）In, alternating sorbent is carried out, adsorption time 10min is impregnated every time, deionized water cleaning sheet shape solid is used in interval
On the redundant solution do not adsorbed, and dried up with nitrogen, this is a cycle period, after alternating invades 200 cycle periods of stain,
The deposition film layer of nano silicon dioxide can be obtained on solid thin-sheet surface.
Embodiment 3：
At room temperature, solid thin-sheet is alternately immersed to PAH solution respectively successively（0.2%wt, pH=4.5）, nanosilica solution
（0.8%wt, pH=8.5）In, alternating sorbent is carried out, adsorption time 5min is impregnated every time, deionized water cleaning sheet shape is used in interval
The redundant solution do not adsorbed on solid, and dried up with nitrogen, this is a cycle period, and alternating invades 100 circulating cycles of stain
After phase, you can the deposition film layer of nano silicon dioxide is obtained on solid thin-sheet surface.
Claims (5)
- A kind of 1. method of nano silicon dioxide self assembly deposition film forming, it is characterised in that：At room temperature, solid thin-sheet is divided successively Alternating sorbent Jin Ru not be carried out, impregnate adsorption time 5min ~ 10min every time in polymer solution, nanosilica solution, It with the redundant solution do not adsorbed on deionized water cleaning sheet shape solid in interval, and is dried up with nitrogen, this is a cycle Period, after alternating invades 20 ~ 200 cycle periods of stain, you can obtain the deposition film of nano silicon dioxide on solid thin-sheet surface Layer.
- 2. the method for nano silicon dioxide self assembly deposition film forming according to claim 1, it is characterised in that：The polymerization Object solution is the combination of one or more of polyacrylic acid, polyvinyl alcohol, sodium apolate, polycyclic aromatic hydrocarbon solution.
- 3. the method for nano silicon dioxide self assembly deposition film forming according to claim 1 or 2, it is characterised in that：It is described The mass percent of polymer solution is 0.1 ~ 0.2%wt, and pH value is 4.0 ~ 4.5；The quality hundred of the nanosilica solution Divide than being 0.5 ~ 1%wt, pH value is 8.0 ~ 8.5.
- 4. the method for nano silicon dioxide self assembly deposition film forming according to claim 3, it is characterised in that：The nanometer Silica is hydrophilic and lipophilic simultaneously.
- 5. the method for nano silicon dioxide self assembly deposition film forming according to claim 1, it is characterised in that：Solid thin-sheet Include the combination of one or more of silicon chip, sheet metal, potsherd, Rock laminate, sheet glass, filter paper.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611203325.5A CN108237062A (en) | 2016-12-23 | 2016-12-23 | A kind of method of nano silicon dioxide self assembly deposition film forming |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611203325.5A CN108237062A (en) | 2016-12-23 | 2016-12-23 | A kind of method of nano silicon dioxide self assembly deposition film forming |
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| CN108237062A true CN108237062A (en) | 2018-07-03 |
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| CN201611203325.5A Pending CN108237062A (en) | 2016-12-23 | 2016-12-23 | A kind of method of nano silicon dioxide self assembly deposition film forming |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113275188A (en) * | 2021-04-08 | 2021-08-20 | 赖花林 | Device for accelerating automatic deposition and film formation of nano silicon dioxide on surface of metal sheet |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105479876A (en) * | 2014-09-27 | 2016-04-13 | 中国石油化工集团公司 | Nano-bionic laminar film and preparation method therefor |
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2016
- 2016-12-23 CN CN201611203325.5A patent/CN108237062A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105479876A (en) * | 2014-09-27 | 2016-04-13 | 中国石油化工集团公司 | Nano-bionic laminar film and preparation method therefor |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113275188A (en) * | 2021-04-08 | 2021-08-20 | 赖花林 | Device for accelerating automatic deposition and film formation of nano silicon dioxide on surface of metal sheet |
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Application publication date: 20180703 |