CN108227410A - Develop adjuvant - Google Patents
Develop adjuvant Download PDFInfo
- Publication number
- CN108227410A CN108227410A CN201810212622.9A CN201810212622A CN108227410A CN 108227410 A CN108227410 A CN 108227410A CN 201810212622 A CN201810212622 A CN 201810212622A CN 108227410 A CN108227410 A CN 108227410A
- Authority
- CN
- China
- Prior art keywords
- sodium
- development
- ether
- developer solution
- glycol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Abstract
The invention discloses a kind of development adjuvants, are including following each component and each component weight percentage：Organic base：0.01~5%；Inorganic base：0.01~5%；Organic solvent：0.1~10%；Surfactant：0.01~5%；Water：Surplus.Present invention development adjuvant can prevent the generation of residue in dry film developing process, reduce metal covering pollution, promote product yield；Molten film amount can also be promoted, and then reduces developer solution dosage, reduces developer solution wastewater treatment capacity and production cost.
Description
Technical field
The present invention relates to the development adjuvants in a kind of printing industry for metallic circuit.
Background technology
Direction with electronics industry to high speed, micromation is developed, and the requirement to packing density is also higher and higher.Figure
Transfer process is an important link of printed circuit board production.Dry film experienced solvent type, half water-soluble since launch
Property type to water-soluble type evolution.At present generally using material of the water-soluble dry film as pattern transfer.Water solubility is dry
Film contains organic high molecular compound, and main component has：Film-forming resin, photo polymerization monomer, photoinitiator, plasticizer, tackifier,
The ingredients such as hot polymerization inhibitor, colorant and solvent.The principle that dry film is shown is：Dry film is in exposure, small point containing unsaturated carbon bond
Sub- monomer attack organic long-chain, formation cross-linked polymer can play shielding protection under the action of chain initiator in rear process
Effect is to dissolve away no photosensitive film without causing to hinder to photosensitive part in development to photo polymerization dry film
Evil can just obtain remarkable transition diagram in this way.
The developer solution of traditional water-soluble dry films is the natrium carbonicum calcinatum or solution of potassium carbonate of l~2%, is 20 in liquid temperature
It works under conditions of~40 DEG C.But using sodium carbonate as developing powder existing for developer solution is slow, lack of homogeneity, easily
The problems such as crossing aobvious plating.
Current water-soluble developer solution has higher surface tension, therefore, developer solution is difficult to fast when dry film develops
Speed, uniformly spread on entire photopolymer layer, be easy to cause development is uneven, development not exclusively and part development is excessively etc. aobvious
Shadow defect.Moreover, it to be formed when the organic polymer salt dissolved in developer solution can be accumulated gradually when saturation is precipitated in developer solution
Insoluble organic substance eventually forms the residue of water-insoluble.Such residue is readily adsorbed in pixel region, generates non-development section
The remaining of position particle or undissolved object, then be difficult to show accurate pattern.
In addition, in dry film developing process, the dry film developer solution of general 1000L can produce the pcb board of 200-600 ㎡,
Each developing line discharges 2000L-3000L developer solutions once a day, and developer solution belongs to high-concentration waste water, and processing cost is high.
In the developer solution way to manage of the prior art, daily 2000-3000L developer solutions and 15000L washing waters is needed to discharge and handle aobvious
Shadow liquid waste water, since developer solution wastewater treatment capacity is big, concentration is high, and treatment effeciency is low, greatly increases production cost.
Invention content
Goal of the invention：Insufficient existing for developer solution in the prior art in order to solve, the purpose of the present invention is to provide one kind
For the development adjuvant of dry film development, the generation of residue in dry film developing process is prevented, metal covering pollution is reduced, promotes product
Yield；And molten film amount can be promoted, and then reduces developer solution dosage.
To achieve these goals, present invention employs following technical solutions：A kind of development adjuvant, including following
Component and each component weight percentage is：
Organic base：0.01~5%；
Inorganic base：0.01~5%；
Organic solvent：0.1~10%；
Surfactant：0.01~5%；
Water：Surplus.
Further, the organic base is monoethanolamine, diethanol amine, triethanolamine, tetramethylammonium hydroxide, second two
At least one of amine, monomethyl amine, dimethylamine, trimethylamine, 2-amino-2-methyl-1-propanol.
Further, the inorganic base is sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium metasilicate, sodium acetate, first
At least one of sour sodium, sodium peroxydisulfate, sodium sulphate, sodium citrate, sodium oxalate, sodium sulfite.
Further, the organic solvent is methyl pyrrolidone, butyl, butyl glycol ether, dimethyl Asia
At least one of sulfone, dimethylformamide, dimethylacetylamide, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, isopropanol.
Further, the surfactant for polyethers, isomerous tridecanol polyoxyethylene ether, ethoxylated dodecyl alcohol,
In isooctanol polyethoxylate, polyethylene glycol, polypropylene glycol, neopelex, octyl phenol polyoxyethylene ether at least
It is a kind of.
Advantages of the present invention and advantageous effect：
1st, the generation of residue in dry film developing process is prevented, metal covering pollution is reduced, promotes product yield；
2nd, molten film amount is promoted, and then reduces developer solution dosage, reduces developer solution wastewater treatment capacity and production cost.
Specific embodiment：
Further explanation is done to the present invention below.
The present invention a kind of development adjuvant, be including following each component and each component weight percentage：
Organic base：0.01~5%；
Inorganic base：0.01~5%；
Organic solvent：0.1~10%；
Surfactant：0.01~5%；
Water：Surplus.
Wherein：The developing powder of dry film can be accelerated by adding in organic base, add in inorganic base can make dry film obtain one it is stable
Developing powder, the molten film amount of developer solution can be increased by adding in organic solvent, and the surface of dry film, wet film can be reduced by adding in surfactant
Tension makes developer solution uniformly spread on entire photopolymer layer.
Preferably, the organic base for monoethanolamine, diethanol amine, triethanolamine, tetramethylammonium hydroxide, ethylenediamine,
At least one of monomethyl amine, dimethylamine, trimethylamine, 2-amino-2-methyl-1-propanol.
Preferably, the inorganic base is sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium metasilicate, sodium acetate, formic acid
At least one of sodium, sodium peroxydisulfate, sodium sulphate, sodium citrate, sodium oxalate, sodium sulfite.
Preferably, the organic solvent for methyl pyrrolidone, butyl, butyl glycol ether, dimethyl sulfoxide (DMSO),
At least one of dimethylformamide, dimethylacetylamide, propylene glycol monomethyl ether, propylene glycol methyl ether acetate, isopropanol.
Preferably, the surfactant be polyethers, it is isomerous tridecanol polyoxyethylene ether, ethoxylated dodecyl alcohol, different
At least one in octanol polyoxyethylene ether, polyethylene glycol, polypropylene glycol, neopelex, octyl phenol polyoxyethylene ether
Kind.
It is several groups of comparative examples below：
Comparative example 1
Preparation conventional developer solution is weighed by following composition mass percent：
Sodium carbonate：1%；
Water：99%.
Comparative example 2
Preparation development adjuvant is weighed by following composition mass percent：
Monoethanolamine：0.3%；
Sodium peroxydisulfate：0.2%；
Isopropanol：0.5%；
Ethoxylated dodecyl alcohol：0.2%；
Water：98.8%.
The development adjuvant of preparation is added in 1% sodium carbonate development liquor.
Comparative example 3
Preparation development adjuvant is weighed by following composition mass percent：
Monoethanolamine：2%；
Sodium peroxydisulfate：1.5%；
Isopropanol：5%；
Ethoxylated dodecyl alcohol：1%；
Water：90.5%.
The development adjuvant of preparation is added in 1% sodium carbonate development liquor.
Comparative example 4
Preparation development adjuvant is weighed by following composition mass percent：
Tetramethylammonium hydroxide：1%；
Sodium peroxydisulfate：0.8%；
Butyl：2%；
Ethoxylated dodecyl alcohol：1%；
Water：95.2%.
The development adjuvant of preparation is added in 1% sodium carbonate development liquor.
Comparative example 5
Preparation development adjuvant is weighed by following composition mass percent：
Tetramethylammonium hydroxide：0.25%；
Sodium peroxydisulfate：2%；
Butyl：4%；
Ethoxylated dodecyl alcohol：2%；
Water：91.75%.
The development adjuvant of preparation is added in 1% sodium carbonate development liquor.
The development liquor that each embodiment obtains is subjected to dry film development respectively, operating procedure is as follows：
1) 1 liter of development liquor is put into thermostat water bath, is heated to 30 degree；
2) 0.2 ㎡ of dry film is dissolved by the liquor that develops, compares developer solution clarity；
3) development has exposed dry film, records circuit quality after developing time and comparison development；
4) hydrochloric acid is added into development liquor, is acidified to PH ＜ 3, situation is precipitated in dry film in comparison development liquor.
It is carried out according to situation after circuit quality, acidification after the developer solution clarity of each comparative example, developing time, development
Comparison, comparing result are as follows：
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (5)
1. a kind of development adjuvant, it is characterised in that be including following each component and each component weight percentage：
Organic base：0.01~5%；
Inorganic base：0.01~5%；
Organic solvent：0.1~10%；
Surfactant：0.01~5%；
Water：Surplus.
2. a kind of development adjuvant according to claim 1, it is characterised in that：The organic base is monoethanolamine, diethyl
Hydramine, triethanolamine, tetramethylammonium hydroxide, ethylenediamine, monomethyl amine, dimethylamine, trimethylamine, 2-amino-2-methyl-1-propanol
At least one of.
3. a kind of development adjuvant according to claim 1, it is characterised in that：The inorganic base is sodium hydroxide, hydrogen-oxygen
Change potassium, sodium carbonate, potassium carbonate, sodium metasilicate, sodium acetate, sodium formate, sodium peroxydisulfate, sodium sulphate, sodium citrate, sodium oxalate, sulfurous
At least one of sour sodium.
4. a kind of development adjuvant according to claim 1, it is characterised in that：The organic solvent is crassitude
Ketone, butyl, butyl glycol ether, dimethyl sulfoxide (DMSO), dimethylformamide, dimethylacetylamide, propylene glycol monomethyl ether, third
At least one of glycol methyl ether acetate, isopropanol.
5. a kind of development adjuvant according to claim 1, it is characterised in that：The surfactant is polyethers, isomery
Tridecanol polyoxyethylene ether, ethoxylated dodecyl alcohol, isooctanol polyethoxylate, polyethylene glycol, polypropylene glycol, dodecyl
At least one of benzene sulfonic acid sodium salt, octyl phenol polyoxyethylene ether.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810212622.9A CN108227410A (en) | 2018-03-15 | 2018-03-15 | Develop adjuvant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810212622.9A CN108227410A (en) | 2018-03-15 | 2018-03-15 | Develop adjuvant |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108227410A true CN108227410A (en) | 2018-06-29 |
Family
ID=62659386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810212622.9A Pending CN108227410A (en) | 2018-03-15 | 2018-03-15 | Develop adjuvant |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108227410A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020056627A1 (en) * | 2018-09-18 | 2020-03-26 | 周连惠 | High-concentration developing solution stock solution composition |
| CN113504715A (en) * | 2021-09-10 | 2021-10-15 | 深圳市板明科技股份有限公司 | Printed circuit board developing additive |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753421A (en) * | 1994-03-31 | 1998-05-19 | Tokyo Ohka Kogya Co., Ltd. | Stock developer solutions for photoresists and developer solutions prepared by dilution thereof |
| CN1503064A (en) * | 2002-11-19 | 2004-06-09 | 东进半导体化学株式会社 | Photoresist developer compositions |
| CN1585914A (en) * | 2001-11-13 | 2005-02-23 | 三星电子株式会社 | Chemical rinse composition |
| CN105676599A (en) * | 2016-04-06 | 2016-06-15 | 东莞市广华化工有限公司 | Developing solution based on new polymers and applied to image developing technology |
| CN106406037A (en) * | 2015-06-11 | 2017-02-15 | 易安爱富科技有限公司 | Photoresist developer |
-
2018
- 2018-03-15 CN CN201810212622.9A patent/CN108227410A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5753421A (en) * | 1994-03-31 | 1998-05-19 | Tokyo Ohka Kogya Co., Ltd. | Stock developer solutions for photoresists and developer solutions prepared by dilution thereof |
| CN1585914A (en) * | 2001-11-13 | 2005-02-23 | 三星电子株式会社 | Chemical rinse composition |
| CN1503064A (en) * | 2002-11-19 | 2004-06-09 | 东进半导体化学株式会社 | Photoresist developer compositions |
| CN106406037A (en) * | 2015-06-11 | 2017-02-15 | 易安爱富科技有限公司 | Photoresist developer |
| CN105676599A (en) * | 2016-04-06 | 2016-06-15 | 东莞市广华化工有限公司 | Developing solution based on new polymers and applied to image developing technology |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020056627A1 (en) * | 2018-09-18 | 2020-03-26 | 周连惠 | High-concentration developing solution stock solution composition |
| CN113504715A (en) * | 2021-09-10 | 2021-10-15 | 深圳市板明科技股份有限公司 | Printed circuit board developing additive |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR910008790B1 (en) | Photopolymerizable resin composition | |
| TW200731016A (en) | Composition for forming upper film and method for forming photoresist pattern | |
| US5149776A (en) | Cross-linking hardenable resin composition, metal laminates thereof and metal surface processing method therewith | |
| CN104845435B (en) | A kind of photosensitive-ink cleaning agent | |
| CN101657511A (en) | The composition that contains lactan that is used on the photo-resist pattern, applying | |
| US5981147A (en) | Stable, ionomeric photoresist emulsion and process of preparation and use thereof | |
| CN108227410A (en) | Develop adjuvant | |
| KR101763940B1 (en) | Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography | |
| US7150960B2 (en) | Developer composition | |
| GB2123162A (en) | Developing solution for light-sensitive printing plates | |
| TW200304165A (en) | Processing solution preparation and supply method and apparatus | |
| CN104211867A (en) | Acrylic copolymer with narrow molecular weight distribution and photosensitive resist composition of acrylic copolymer with narrow molecular weight distribution | |
| KR20030035838A (en) | Alkali type treating liquid, treating liquid adjusting method and equipment, treating liquid providing method and equipment | |
| CN102150085A (en) | Substrate treating solution and method employing the same for treating a resist substrate | |
| KR970009609B1 (en) | Cross-linking-curable resin composition | |
| CN105573071A (en) | Efficient and environment-friendly film-stripping solution capable of keeping copper surface bright and concentrated solution of film-stripping solution | |
| CN101473271A (en) | Method of forming microfined resist pattern | |
| CN106842834A (en) | A kind of developer solution for heat-sensitive positive picture CTP plate | |
| CN101523295A (en) | Solution for treatment of resist substrate after development processing, and method for treatment of resist substrate using the same | |
| TW200307856A (en) | Residue reducing stable concentrate | |
| CN1310731A (en) | Water soluble positive-working photoresist composition | |
| CN107340693B (en) | A kind of dry film developer solution and preparation method thereof for printed circuit board | |
| CN110531583A (en) | Photosensitive polymer combination, dry film resist layer | |
| CN104965389A (en) | FPD/TP positive photoresist used for flexible substrate | |
| JP3154474B2 (en) | Color resist developer |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |