CN108227290A - Mask plate, the organic protection layer obtained using it and display device - Google Patents
Mask plate, the organic protection layer obtained using it and display device Download PDFInfo
- Publication number
- CN108227290A CN108227290A CN201810098950.0A CN201810098950A CN108227290A CN 108227290 A CN108227290 A CN 108227290A CN 201810098950 A CN201810098950 A CN 201810098950A CN 108227290 A CN108227290 A CN 108227290A
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- Prior art keywords
- protection layer
- area
- pattern
- organic protection
- mask plate
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133504—Diffusing, scattering, diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
The present invention discloses a kind of mask plate, the organic protection layer obtained using it and display device.Mask plate includes transparent area and pattern area; pattern area includes multiple first patterns; adjacent the first pattern spacing setting; first pattern extends to pattern area by transparent area; spacing distance between first pattern can make the light through mask plate that more seam diffraction occur; so as to so that the thickness of the corresponding organic protection layer in pattern area reduces, to be formed excessively.
Description
Technical field
The present invention relates to a kind of display technology field, specifically, related with organic protection layer.
Background technology
Touch screen technology is broadly divided into In-cell touch panel and external hanging type touch screen, the common skill of In-cell touch panel at present
Art includes embedded (on cell), box built-in type (in cell) etc. outside box, and external hanging type touch screen common technique has monolithic to touch
Touch Screen Technology (OGS), bilayer film technology (GFF) etc..Since In-cell touch panel is without additional glass or plastic base
Such as (pet substrate) and do not need to be bonded, have many advantages, such as light, thin, be widely used in the products such as mobile phone, tablet, notebook
On.
Individual layer multiple spot externally embedded type technology is one of embedded most common technology, basic structure outside In-cell touch panel box
It is one layer of electrode layer with touch function to be plated on color film glass substrate, while to prevent cabling area from being influenced by external environment
And corrode, it need to usually increase by one layer of organic protective film, paste polaroid again later.At this point, it is handed in polaroid and organic protection layer
Since drop is big at boundary, air line is easily formed.
Usual liquid crystal display can be handled after polaroid pastes through overbaking, can eliminate the micro-bubble for pasting generation.
But practice have shown that polaroid and the air line that organic protection layer generates are larger, it is difficult to eliminate, so as to influence liquid crystal display
Quality.In order to improve the elimination factor of air line, the method for improving baking temperature or extension baking time usually may be used,
But the shortcomings that above method, is：First, above two method cannot completely eliminate air line；Second is that baking temperature it is excessively high or when
Between the long liquid crystal characteristic that can damage liquid crystal display, it is bad so as to which product be caused to show.
Therefore, a kind of display device for eliminating air line how is improved, is the technology of those skilled in the art's urgent need to resolve
Problem.
Invention content
A primary object of the present invention is to eliminate the air line between organic protection layer and polaroid, provides one kind and cover
Diaphragm plate.
Another main purpose of the present invention is the air line between elimination organic protection layer and polaroid, provides one kind
The organic protection layer obtained using above-mentioned mask plate.
Another main purpose of the present invention is the air line between elimination organic protection layer and polaroid, provides one kind
Display device.
For achieving the above object, the present invention adopts the following technical scheme that：
According to an aspect of the invention, there is provided a kind of mask plate, for organic protection layer, the mask plate includes saturating
Light area and pattern area, the pattern area include multiple first patterns, the setting of adjacent first pattern spacing, first pattern
The pattern area is extended to by the transparent area, the spacing distance between first pattern can make through the mask plate
More seam diffraction occur for light.
According to an embodiment of the present invention, wherein first pattern is triangular structure, quadrilateral structure, pentagon
Structure.
According to an embodiment of the present invention, wherein the edge of first pattern is curve or straight line.
According to an embodiment of the present invention, wherein first pattern is made of chromium metal material.
A specific embodiment according to the present invention, wherein the spacing distance between adjacent first pattern is 3-5 μ
m。
According to another aspect of the present invention, a kind of organic protection layer is provided, the organic protection layer is provided by the invention
Mask plate obtains, the thickness organic protection layer corresponding with the transparent area of the corresponding organic protection layer in the pattern area
The ratio of thickness is 0.3-0.6.
According to an embodiment of the present invention, wherein the thickness of the corresponding organic protection layer in the pattern area with it is described
The ratio of the thickness of the corresponding organic protection layer of transparent area is 0.5.
A specific embodiment according to the present invention, wherein the thickness of the corresponding organic protection layer in the pattern area is
0.8-2μm。
A specific embodiment according to the present invention, wherein the thickness 1- of the corresponding organic protection layer in the pattern area
1.5μm。
According to another aspect of the present invention, a kind of display device is provided, including glass substrate, is set in turn in the glass
Touch electrode layer, organic protection layer and polaroid structure on substrate, the touch electrode layer include what is covered by polaroid
The electrode layer area of coverage and the electrode layer uncovering area for being unpolarized piece covering, the organic protection layer are one kind provided by the invention
Organic protection layer, the organic protection layer are covered in the electrode layer uncovering area and are covered in the one of the electrode layer area of coverage
Part.
As shown from the above technical solution, mask plate of the invention, the organic protection layer that is obtained using it and display device
The advantages of and good effect be：The pattern area of mask plate provided by the invention includes multiple first figures of spaced setting
Case, the spacing distance between the first adjacent pattern can make the light through mask plate that more seam diffraction occur, so as to so that
The thickness of the corresponding organic protection layer in pattern area reduces, excessive to be formed.Further, since the thickness of organic protection layer has
It is above-mentioned excessively, so as to avoid due to height occur cataclysm and caused by organic protection layer formed with polaroid structure intersection
Bubble.
Description of the drawings
Consider following the following detailed description of the embodiment of the present invention in conjunction with the accompanying drawings, various targets of the invention,
Feature and advantage will become apparent.Attached drawing is only the exemplary diagram of the present invention, is not necessarily drawn to scale.
In the accompanying drawings, same reference numeral always shows same or similar component.Wherein：
Fig. 1 is the vertical view according to a kind of display device shown in an illustrative embodiments.
Fig. 2 is the A-A sectional views of Fig. 1.
Fig. 3 is the structure chart according to a kind of mask plate shown in an illustrative embodiments.
Fig. 4 is the structure chart according to another mask plate shown in an illustrative embodiments.
Fig. 5 is the schematic diagram of the organic protection layer obtained using the mask plate provided in Fig. 3 or Fig. 4.
Fig. 6 is the vertical view for the organic protection layer that Fig. 5 is obtained.
Fig. 7 is the longitudinal sectional view of display device of the prior art.
Fig. 8 is the partial enlarged view of the encircled portion in Fig. 7.
Wherein, the reference numerals are as follows：
101st, mask plate；102nd, transparent area；
103rd, pattern area；104th, the first pattern；
105th, shading region；106th, glass substrate；
107th, polaroid structure；108th, the electrode layer area of coverage；
109th, electrode layer uncovering area；110th, touch electrode layer；
111st, organic protection layer；112nd, bubble；
113rd, effective display area domain.
Specific embodiment
Example embodiment is described more fully with reference to the drawings.However, example embodiment can be with a variety of shapes
Formula is implemented, and is not understood as limited to embodiment set forth herein；On the contrary, these embodiments are provided so that the present invention will
Fully and completely, and by the design of example embodiment comprehensively it is communicated to those skilled in the art.Identical attached drawing in figure
Label represents same or similar structure, thus will omit their detailed description.
With reference to Fig. 3 to Fig. 5, according to an aspect of the invention, there is provided a kind of mask plate, for organic protection layer 111,
Mask plate 101 can include transparent area 102 and pattern area 103, and wherein transparent area 102 can be disposed adjacent with pattern area 103, example
It such as but is not limited to, pattern area 103 can be set to the edge of transparent area 102, and pattern area 103 can include multiple first patterns
104, multiple first patterns 104 can be adjacent successively and be set up in parallel, which can be by the edge of transparent area 102
Extension.The first adjacent pattern 104 can be arranged at intervals, which can extend to pattern area by transparent area 102
103, the spacing distance between the first pattern 104 can make the light through mask plate 101 that more seam diffraction occur.Mask plate 101
It can include shading region 105, transparent area 102 and pattern area 103, which can be made of chromium metal, pattern area
103 the first pattern 104 can also be made of chromium metal, and but not limited to this.Same intensity of illumination can be selected to blocking
Plate carries out illumination, and organic protection layer can be negative photoresist, and in exposure, since shading region 105 is blocked, light is unable to light transmission and blocks
Plate then can develop to fall corresponding to the organic protection layer 111 of the shading region 105, and the thickness of the organic protection layer 111 of the part can be with
For first thickness or even it is fully developed；For transparent area 102, light is completely through transparent area 102 is corresponding has with this
Machine protective layer 111 is then fully retained, will not it is developed fall, the thickness of the organic protection layer 111 of the part can be second thickness；
And for pattern area 103, due to being provided with interval between the first adjacent pattern 104, light can with light transmission this occurred at intervals it is more
Diffraction is stitched, the intensity for the light which penetrates corresponding has between transparent area 102 and blocked area
Machine protective layer 111 it is developed fall thickness can be third thickness, wherein third thickness can be more than first thickness, and the third
Thickness can be less than second thickness, be referred to shown in Fig. 5.It, can be by adjusting mask plate 101 according to more seam diffraction principles
On pattern printing opacity degree, to adjust the thickness of corresponding organic protection layer 111, so as to fulfill it is gentle excessively, avoid having a common boundary
Occurs air line on face.
With reference to Fig. 3 and Fig. 4, a specific embodiment according to the present invention, wherein mask plate 101 can include pattern area
103 and transparent area 102, according to actual needs, shading region 105 can also be included, all within the scope of the present invention.According to this
Invention an embodiment, wherein the first pattern 104 can be triangular structure, quadrilateral structure, pentagonal configuration, but not with
This is limited, and can be selected according to actual needs, and an edge of the first pattern 104 can be with the coincident of transparent area 102.
A specific embodiment according to the present invention, wherein triangular structure can be isosceles triangular structure, the isosceles triangle knot
The base of structure can be with the coincident of transparent area 102, such as shown in Fig. 3, but not limited to this, can select according to actual needs
The concrete shape of triangular structure and the side with the coincident of transparent area 102 are selected, all within the scope of the present invention.
A specific embodiment according to the present invention, wherein the first pattern 104 can also be quadrangle, such as, but not limited to can be square
Shape structure, the short side of the rectangular configuration can be with the coincidents of transparent area 102, such as shown in Fig. 4, but not limited to this, should
Quadrilateral structure can also be the other structures such as diamond shape, and the side with the coincident of transparent area 102 can also be according to actual needs
It is selected, all within the scope of the present invention.
According to an embodiment of the present invention, wherein in order to occur stitch diffraction, the interval between the first pattern 104
Distance can be suitable with the level of resolution of litho machine, and such as, but not limited to, which can be the resolution ratio of litho machine
Limiting value, the period can be suitable with spacing distance.A specific embodiment according to the present invention, wherein the first pattern 104 it
Between spacing distance can be 3-5 μm.A specific embodiment according to the present invention, wherein the interval between the first pattern 104
Distance can be 4 μm.According to an embodiment of the present invention, wherein the edge of the first pattern 104 can be curve or straight line,
All within the scope of the present invention.
With reference to Fig. 1, Fig. 2 and Fig. 6, according to another aspect of the present invention, a kind of organic protection layer, organic protection layer are provided
111 can be obtained using mask plate provided by the invention, the thickness of 103 corresponding organic protection layer 111 of pattern area with
The ratio of the thickness of 102 corresponding organic protection layer 111 of transparent area can be 0.3-0.6, that is to say, that be referred to Fig. 2
Part in ellipse circle, organic protection layer 111 can include the protective layer area of coverage and protective layer uncovering area, the protective layer area of coverage
The ratio of thickness of edge thickness size and protective layer uncovering area can be 0.3-0.6, but not limited to this, identical
Intensity of illumination, and in the case of identical light application time, the spacing distance between the first pattern 104 of mask plate 101 can be passed through
Size control the thickness of the 103 corresponding organic protection layer 111 of pattern area.According to an embodiment of the present invention,
The wherein thickness of the thickness of 103 corresponding organic protection layer 111 of pattern area and 102 corresponding organic protection layer 111 of transparent area
The ratio for spending size can be 0.5, that is to say, that the edge thickness size of the protective layer area of coverage and the thickness of protective layer uncovering area
The ratio of size can be 0.5.
With continued reference to Fig. 1 and Fig. 2, according to another aspect of the present invention, a kind of display device is provided, which can be with
Including glass substrate 106, such as, but not limited to, which is color membrane substrates.106 top of glass substrate can be arranged
There is touch electrode layer 110, polaroid structure 107 can be disposed on touch electrode layer 110, polaroid structure 107 is in glass base
Frontal projected area on plate 106 can be less than frontal projected area of the touch electrode layer 110 on glass substrate 106, so that
Touch electrode layer 110 can be divided into the electrode layer area of coverage 108 and electrode layer uncovering area 109, on the electrode layer uncovering area 109
One layer of organic protection layer 111 can be disposed with, is corroded to avoid being influenced by external environment, such as, but not limited to, by
High temperature and humidity influences and corrodes or influenced and corrode by sweat.In order to which touch electrode layer 110 is covered completely, You Jibao
Sheath 111 can be covered in the whole of the electrode layer uncovering area 109 of touch electrode layer 110 and be covered in the touch electrode layer
A part for the 110 electrode layer area of coverage 108, that is to say, that the organic protection layer 111 can be by the electricity of touch electrode layer 110
The top of pole layer uncovering area 109 extends to the top of the electrode layer area of coverage 108.
With continued reference to Fig. 2, a specific embodiment according to the present invention, wherein 103 corresponding organic protection layer of pattern area
111 thickness can be 0.8-2 μm, that is to say, that the edge thickness size of the protective layer area of coverage can be 0.8-2 μm.
A specific embodiment according to the present invention, the thickness of wherein 103 corresponding organic protection layer 111 of pattern area can be 1-
1.5 μm, that is to say, that the edge thickness of the protective layer area of coverage can be 1-1.5 μm.A specific embodiment party according to the present invention
Formula, the wherein thickness of 102 corresponding organic protection layer 111 of transparent area can be 1.6-4 μm, that is to say, that protective layer does not cover
The thickness in area can be 1.6-4 μm.A specific embodiment according to the present invention, wherein transparent area 102 are corresponding organic
The thickness of protective layer 111 can be 2-3 μm, that is to say, that the thickness of protective layer uncovering area can be 2-3 μm.
The quilt of the sectional view, wherein organic protection layer 111 of the display device of the prior art is shown with reference to Fig. 7 and Fig. 8, Fig. 7
The edge in the region that polaroid structure 107 covers, drop is larger, leads to the friendship in organic protection layer 111 and polaroid structure 107
A large amount of bubble 112 is generated on interface, is referred to Fig. 8, the length of these bubbles 112 differs, different sizes, even if passing through baking
Curing process also is difficult to completely eliminate in these bubbles 112.Since bubble 112 occurs sometimes in effective display area domain 113, so as to
Affect product quality.The loop configuration of the closing being made of dotted line in Fig. 1 can be shown as effective display area domain 113.
Described feature, structure or characteristic can be incorporated in one or more embodiments in any suitable manner
In.In above description, many details are provided, embodiments of the present invention are fully understood so as to provide.However,
It will be appreciated by persons skilled in the art that technical scheme of the present invention can be put into practice without one in the specific detail or more
It is more or other methods, component, material etc. may be used.In other cases, be not shown in detail or describe known features,
Material or operation are to avoid fuzzy each aspect of the present invention.
Claims (10)
1. a kind of mask plate, for organic protection layer, which is characterized in that the mask plate includes transparent area and pattern area, described
Pattern area includes multiple first patterns, the setting of adjacent first pattern spacing, which is extended by the transparent area
To the pattern area, the spacing distance between first pattern can make the more seams of light generation through the mask plate spread out
It penetrates.
2. mask plate as described in claim 1, which is characterized in that first pattern for triangular structure, quadrilateral structure,
Pentagonal configuration.
3. mask plate as claimed in claim 2, which is characterized in that the edge of first pattern is curve or straight line.
4. mask plate as described in claim 1, which is characterized in that first pattern is made of chromium metal material.
5. mask plate as described in claim 1, which is characterized in that the spacing distance between adjacent first pattern is 3-
5μm。
6. a kind of organic protection layer, which is characterized in that the organic protection layer is use according to any one of claim 1 to 5
The mask plate obtains, thickness organic guarantor corresponding with the transparent area of the corresponding organic protection layer in the pattern area
The thickness ratio of sheath is 0.3-0.6.
7. organic protection layer as claimed in claim 6, which is characterized in that the thickness of the corresponding organic protection layer in the pattern area
The ratio of the thickness of size organic protection layer corresponding with the transparent area is 0.5.
8. organic protection layer as claimed in claim 6, which is characterized in that the thickness of the corresponding organic protection layer in the pattern area
Size is 0.8-2 μm.
9. organic protection layer as claimed in claim 8, which is characterized in that the thickness of the corresponding organic protection layer in the pattern area
Size is 1-1.5 μm.
10. a kind of display device, including glass substrate, the touch electrode layer, the You Jibao that are set in turn on the glass substrate
Sheath and polaroid structure, which is characterized in that the touch electrode layer include the electrode layer area of coverage that cover by polaroid with
The electrode layer uncovering area of piece covering is unpolarized, the organic protection layer is having as described in any one of claim 6 to 9
Machine protective layer, the organic protection layer are covered in the electrode layer uncovering area and are covered in one of the electrode layer area of coverage
Point.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810098950.0A CN108227290A (en) | 2018-01-31 | 2018-01-31 | Mask plate, the organic protection layer obtained using it and display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810098950.0A CN108227290A (en) | 2018-01-31 | 2018-01-31 | Mask plate, the organic protection layer obtained using it and display device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108227290A true CN108227290A (en) | 2018-06-29 |
Family
ID=62670028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810098950.0A Pending CN108227290A (en) | 2018-01-31 | 2018-01-31 | Mask plate, the organic protection layer obtained using it and display device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108227290A (en) |
Cited By (2)
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| CN109581716A (en) * | 2019-01-24 | 2019-04-05 | 京东方科技集团股份有限公司 | Display base plate, display panel and mask plate |
| CN110488528A (en) * | 2019-08-30 | 2019-11-22 | 昆山国显光电有限公司 | A kind of display device |
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Application publication date: 20180629 |