CN108220875A - A kind of Ti-Al nitride laminated coating cutter and preparation method thereof - Google Patents
A kind of Ti-Al nitride laminated coating cutter and preparation method thereof Download PDFInfo
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- CN108220875A CN108220875A CN201810038868.9A CN201810038868A CN108220875A CN 108220875 A CN108220875 A CN 108220875A CN 201810038868 A CN201810038868 A CN 201810038868A CN 108220875 A CN108220875 A CN 108220875A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
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Abstract
The present invention provides a kind of Ti Al nitride laminated coating cutter, including tool matrix and the Ti Al nitride laminated coatings for being compounded in the tool matrix surface；The Ti Al nitride laminated coating includes Al layers of Ti layers of richness and richness, and Ti layers of the richness is with Al layers of alternating deposit of richness on the tool matrix；The Ti Al nitride laminated coating includes the component of following atomic percent：Al：20~35%, Ti：10~30%, N：50~60%.The coating can realize the good effect of high rigidity, high-wearing feature and high-temperature oxidation resistance, and simple for process, operability is strong, and controllability is good, of low cost, and adaptability is good, suitable for the protection of the product surfaces such as component of machine, knife mold, have preferable economic benefit.The present invention also provides a kind of preparation methods of Ti Al nitride laminated coating cutter.
Description
Technical field
The invention belongs to material coating technical field more particularly to a kind of Ti-Al nitride laminated coating cutter and its systems
Preparation Method.
Background technology
At a high speed and DRY CUTTING becomes today of mainstream, the fast-developing improvement to cutting performance of coating technology and cut
The progress TiN in important symbol .70 ages that coated cutting tool has become modern cutter that plays a crucial role for cutting processing technology applies floor height
Warm oxidation resistance temperature is at 600 DEG C hereinafter, can not meet the requirement of high-speed cutting.The nineties research find TiAlN hard coats because
It becomes high speed cutting tool coating master with the excellent performances such as high rigidity, corrosion-resistant, high antioxidant, high-wearing feature
Stream, shows extremely wide application prospect in industries such as cutters.
But with the increasingly higher demands that high-speed cutting and DRY CUTTING propose cutter, TiAlN coatings are in practical height
In speed cutting and DRY CUTTING application, the temperature of cutting zone can be usually reached the heat decomposition temperature of even higher than AlTiN coatings
(about 950 DEG C), so as to cause the appearance of the failure modes such as cutter oxidation, point of a knife softening, the abrasion of cutter moment.This just force into
One step, which improves the comprehensive mechanical property of TiAlN coatings and high temperature oxidation resistance, becomes important development direction.
It has now been found that TiAlN/TiN nano-multilayer films are prepared using the method that coating structure is modulated.With monofilm
TiAlN coatings are compared, and high-temperature oxidation resistant is increased to 850 DEG C from 800 DEG C and the coated cutting tool service life improves 1 times.However in reality
In high-speed cutting and DRY CUTTING application, the temperature of cutting zone up to 950 DEG C or so, TiAlN/TiN nano-multilayer films it is hard
It is also insufficient in terms of degree, inoxidizability.
Invention content
The purpose of the present invention is to provide a kind of Ti-Al nitride laminated coating cutter and preparation method thereof, in the present invention
Coating hardness it is high and high-temperature oxidation resistance is good.
The present invention provides a kind of Ti-Al nitride laminated coating cutter, including tool matrix and is compounded in the cutter base
The Ti-Al nitride laminated coatings in body surface face；
The Ti-Al nitride laminated coating includes Al layers of Ti layer of richness and richness, Ti layers of the richness and Al layers of alternating deposit of richness
On the tool matrix；
The Ti-Al nitride laminated coating includes the component of following atomic percent：
Al：20~35%, Ti：10~30%, N：50~60%.
Preferably, the tool matrix is metal simple-substance, hard alloy or ceramics.
Preferably, the thickness of the Ti-Al nitride laminated coating is 2~10 μm.
Preferably, the thickness in monolayer of Ti layers of the richness is 2~20nm；
The thickness in monolayer of Al layers of the richness is 5~100nm.
The present invention provides a kind of preparation method of Ti-Al nitride laminated coating cutter, includes the following steps：
A) cutter is placed in the sample disc at edge of sample turntable mounting, tool matrix surface is sputtered using Ar gas
Cleaning, then lights Cr targets, with Cr ion bombardment tool matrix, activated matrix surface；
B) it is passed through N2Gas lights the rotating speed of Al-Ti targets, the revolution of adjustment sample disc and rotation, depositing Ti-Al nitride multilayers
Coating obtains Ti-Al nitride laminated coating cutters；
In the Al-Ti targets, the atomic percent that the atomic percent of Al is 30~70%, Ti is 20~60%；
The rotating speed of the sample disc revolution is 0~5r/min；The rotating speed of the sample disc rotation is 1~6r/min.
Preferably, the step A) in, vacuum degree is 1.0~8.0 × 10-3Pa；
The step A) in temperature be 300~500 DEG C.
Preferably, the step A) in Ar gas flow be 200~300sccm；
The time of the Ar gas sputter clean is 10~20min；
During the Ar gas sputter clean, apply the bias of -800~-1000V on tool matrix.
Preferably, the step A) in, the target current of Cr targets is 60~150A；
The bombardment time of the Cr ions is 3~15min；
During the Cr ion bombardments activation, apply the bias of -600~-800V on tool matrix.
Preferably, the step B) in air pressure be 1.0~3.0Pa；
The electric current of the Al-Ti targets is 60~150A；
The step B) in, the bias of -60~-200V of application on tool matrix.
Preferably, the step B) in deposit time be 0.5~2 hour；
The step B) in deposit temperature be 300~500 DEG C.
The present invention provides a kind of Ti-Al nitride laminated coating cutter, including tool matrix and is compounded in the cutter base
The Ti-Al nitride laminated coatings in body surface face；The Ti-Al nitride laminated coating includes Al layers of Ti layers of richness and richness, the richness
Ti layers with Al layers of alternating deposit of richness on the tool matrix；The Ti-Al nitride laminated coating includes following atomic percent
The component of ratio：Al：20~35%, Ti：10~30%, N：50~60%.The coating can realize high rigidity, high-wearing feature and height
The effect of warm good in oxidation resistance, simple for process, operability is strong, and controllability is good, of low cost, and adaptability is good, suitable for machinery
The protection of the product surfaces such as parts, knife mold has preferable economic benefit.
The present invention also provides a kind of preparation method of Ti-Al nitride laminated coating cutter, this method is with titanium aluminium nitrogen
Based on compound coating, prepared using traditional PVD technique (arc ion plating), generated according to the difference of target elements ionization level
The difference phenomenon that sputtering positive ion density is unevenly distributed by adjusting the rotation of sample pivoted frame and revolution speed, changes sample in difference
Different sputtering positive ion density region residence time prepares novel self-assembled nanometer multilayer Ti-Al nitride coatings, can be with
Suitable for the working environment under mal-condition.
Description of the drawings
In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, to embodiment or will show below
There is attached drawing needed in technology description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
The embodiment of invention, for those of ordinary skill in the art, without creative efforts, can also basis
The attached drawing of offer obtains other attached drawings.
Fig. 1 is the structure diagram of Ti-Al nitride laminated coating cutters in the present invention；
Fig. 2 is the structure diagram of arc deposited device that the present invention uses；
Fig. 3 is TEM and the SEM figure of Ti-Al nitride laminated coating cutters in the embodiment of the present invention 1.
Specific embodiment
The present invention provides a kind of Ti-Al nitride laminated coating cutters, including tool matrix and are compounded in the cutter
The Ti-Al nitride laminated coatings of matrix surface；
The Ti-Al nitride laminated coating includes Al layers of Ti layer of richness and richness, Ti layers of the richness and Al layers of alternating deposit of richness
On the tool matrix；
The Ti-Al nitride laminated coating includes the component of following atomic percent：
Al：20~35%, Ti：10~30%, N：50~60%.
Ti-Al nitride laminated coatings cutter in the present invention has structure shown in Fig. 1, the Ti-Al nitride multilayer
The thickness of coating is preferably 2~10 μm, more preferably 3~9 μm, most preferably 4~8 μm, specifically, can be 2 μm, 3 μm, 4 μ
M, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm or 10 μm；Described Ti layers of thickness in monolayer of richness are preferably 2~20nm, more preferably 5~15nm,
Specifically, can be 2nm, 8nm or 20nm；The thickness in monolayer of Al layers of the richness is preferably 5~100nm, more preferably 20~
80nm, specifically, can be 5nm, 30nm or 100nm.
In the present invention, can be rich Ti layers to contact with the tool matrix or Al layers of richness and the cutter base
Body contacts.
In the Ti-Al nitride laminated coating, the atomic percent of each element is as follows：
Al：20~35%, more preferably 25~30%, specifically, can be 20%, 25% or 30%；Ti：10~
30%, more preferably 15~25%, specifically, can be 10%, 15% or 30%；N：50~60%, specifically, can be
50%th, 55% or 60%.
The present invention also provides a kind of preparation methods of Ti-Al nitride laminated coating cutter, include the following steps：
A) cutter is placed in the sample disc at edge of sample turntable mounting, tool matrix surface is sputtered using Ar gas
Cleaning, then lights Cr targets, with Cr ion bombardment tool matrix, activated matrix surface；
B) it is passed through N2Gas lights the rotating speed of Al-Ti targets, the revolution of adjustment sample disc and rotation, depositing Ti-Al nitride multilayers
Coating obtains Ti-Al nitride laminated coating cutters；
In the Al-Ti targets, the atomic percent that the atomic percent of Al is 30~70%, Ti is 20~60%；
The rotating speed of the sample disc revolution is 0~5r/min；The rotating speed of the sample disc rotation is 1~6r/min.
Ti-Al nitride coatings are deposited on tool matrix surface by the present invention using the method for PVD (physical vapour deposition (PVD)).
Used equipment is as shown in Figure 2.Fig. 2 is the schematic diagram that the present invention uses arc deposited device.During depositing coating
Matrix rotates, and since the ionization level (~80%) of titanium is higher than the ionization level (~50%) of aluminium, Ti ions are close when matrix is far from target
The higher and target-substrate distance of degree is larger, and easily reaction generates relatively thin rich Ti layers of nanometer layer；Aluminium ion density is higher during matrix face target
And target-substrate distance is smaller, easily reaction generates thicker rich Al layers of nanometer layer, therefore can self assembly generation nanometer in coating preparation process
Multilayered structure.
The present invention preferably first by matrix polishing treatment, is then successively cleaned by ultrasonic 10~20min, then is used with acetone, alcohol
It is fitted into the indoor sample disc of vacuum after nitrogen drying.
Heater is opened, environment temperature is made to be warming up to 300~500 DEG C, more preferably 350~450 DEG C, specifically, can be with
It it is 300 DEG C, 350 DEG C or 500 DEG C, by vacuum chamber to vacuum degree 1.0~8.0 × 10-3Pa, preferably 3.0~6.0 ×
10-3Pa can be 1.0 × 10-3Pa、5.0×10-3Pa or 8.0 × 10-3Pa；The Ar gas of 200~300sccm is then passed to, it is excellent
It is selected as 250sccm；Work support is set to bias -800~-1000V, preferably -900V；Sputter clean is carried out to matrix surface,
10~20min of bombardment time；
Then bias is down to -600~-800V, preferably -700V；Light Cr targets, 60~150A of target current, preferably
For 80~120A, specifically, can be 60A, 120A or 150A；With high energy Cr ion bombardment 3~15min of matrix, activated metal
Matrix surface is to improve the binding force of film and matrix.
Then nano laminated coating is deposited：It is passed through N2, adjust sample pivoted frame rotational velocity and revolution speed, control pressure exist
1.0~3.0Pa, preferably 1.5~2.5Pa can be 1.0Pa, 1.5Pa or 3.0Pa；Light Al-Ti targets, target current 60~
150A, preferably 80~120A can be 60A, 80A or 150A；- 60~-200V, preferably -100~-150V are biased, it can be with
It is -60V, -150V or -200V；0.5~2h of sedimentation time, preferably 1 hour；
In the Al-Ti targets, the atomic percent of Al is 30~70%, preferably 40~60%, more preferably 50%；Ti
Atomic percent for 20~60%, preferably 30~50%, more preferably 40%.
The rotating speed of the rotation of the sample disc is 1~6r/min, more preferably 2~5r/min, specifically, can be 1r/
Min, 2r/min, 3r/min, 4r/min, 5r/min or 6r/min；The rotating speed of the sample disc revolution is preferably 0~5r/min,
More preferably 1~4r/min, specifically, can be 0r/min, 1r/min, 2r/min, 3r/min, 4r/min, 5r/min or 6r/
min。
After the deposition for completing above-mentioned nano laminated coating, arc power is closed, treats that vacuum room temperature is down to room temperature, opens vacuum
Matrix is taken out in room, in the coating that matrix surface is formed, as self-assembled nanometer multilayer Ti-Al nitride coatings.
The present invention provides a kind of Ti-Al nitride laminated coating cutter, including tool matrix and is compounded in the cutter base
The Ti-Al nitride laminated coatings in body surface face；The Ti-Al nitride laminated coating includes Al layers of Ti layers of richness and richness, the richness
Ti layers with Al layers of alternating deposit of richness on the tool matrix；The Ti-Al nitride laminated coating includes following atomic percent
The component of ratio：Al：20~35%, Ti：10~30%, N：50~60%.The coating can realize high rigidity, high-wearing feature and height
The effect of warm good in oxidation resistance, simple for process, operability is strong, and controllability is good, of low cost, and adaptability is good, suitable for machinery
The protection of the product surfaces such as parts, knife mold has preferable economic benefit.
The present invention also provides a kind of preparation method of Ti-Al nitride laminated coating cutter, this method is with titanium aluminium nitrogen
Based on compound coating, prepared using traditional PVD technique (arc ion plating), generated according to the difference of target elements ionization level
The difference phenomenon that sputtering positive ion density is unevenly distributed by adjusting the rotation of sample pivoted frame and revolution speed, changes sample in difference
Different sputtering positive ion density region residence time prepares novel self-assembled nanometer multilayer Ti-Al nitride coatings, can be with
Suitable for the working environment under mal-condition.
In order to further illustrate the present invention, with reference to embodiments to a kind of Ti-Al nitride multilayer provided by the invention
Coated cutting tool and preparation method thereof is described in detail, but cannot be understood as limiting the scope of the present invention.
Embodiment 1
A kind of self-assembled nanometer multilayer Ti-Al nitride coatings, including rich Ti layers and Al layers of richness.Wherein, thickness Ti layers rich
It spends for 2nm, thickness Al layers rich is 5nm, and the atom percentage content of each element is in coating：Al:20at.%, Ti:
30at.%, N:50at.%.
By high speed steel substrate polishing treatment, it is cleaned by ultrasonic 10min through acetone, alcohol, then vacuum is packed into after being dried up with nitrogen
It is indoor.It opens heater and is warming up to 300 DEG C, vacuum chamber to vacuum degree 1.0 × 10-3Below Pa.It is passed through the Ar of 300sccm
Gas sets work support bias -1000V, and sputter clean, bombardment time 10min are carried out to matrix surface.Bias is dropped later
To -600V, Cr targets, target current 150A, with high energy Cr ion bombardment matrixes 15min are lighted.Bias is adjusted to -200V, is passed through
The N of 300sccm2Gas by adjusting throttle valve control air pressure in 3.0Pa, lights AlTi targets, target current 60A, sedimentation time
0.5 hour, transfer rack revolution speed was 0r/min, rotational velocity 6r/min.After completing plated film, treat that vacuum room temperature is down to
Room temperature opens vacuum chamber and takes out matrix.
Fig. 3 is that the TEM (a) and SEM (b) of self-assembled nanometer multilayer Ti-Al nitride coatings in the embodiment of the present invention 1 shine
Piece.As can be seen that coating structure densification fails to significantly distinguish multilayered structure from Fig. 3 (b), and coating part is carried out
Find that there are nano-multilayered structures in coating after TEM test observations, wherein the brighter thinner thickness of color is Ti layers rich, and color
Thicker compared with deep thickness is rich Al layers.
Coating testing result shows：Scarification detects more than binding force 84N, and Nanoindentation detection hardness is 38GPa；This
The coating high-temp oxidation onset temperature of invention makes up to 950 DEG C or so (using thermogravimetric analyzer), illustrates the self assembly of the present invention
Nanometer multilayer Al-Ti nitride coatings antioxygenic properties are further enhanced.
Embodiment 2
A kind of self-assembled nanometer multilayer Al-Ti nitride coatings, including rich Ti layers and Al layers of richness.Wherein, thickness Ti layers rich
It spends for 8nm, thickness Al layers rich is 30nm, and the atom percentage content of each element is in coating：Al:35at.%, Ti:
10at.%, N:55at.%.
By hard alloy substrate polishing treatment, it is cleaned by ultrasonic 15min through acetone, alcohol, then is packed into after being dried up with nitrogen true
In empty room.It opens heater and is warming up to 350 DEG C, vacuum chamber to vacuum degree 5.0 × 10-3Below Pa.It is passed through 250sccm's
Ar gas sets work support bias -800V, and sputter clean, bombardment time 20min are carried out to matrix surface.Bias is dropped later
To -800V, Cr targets, target current 120A, with high energy Cr ion bombardment matrixes 3min are lighted.Bias is adjusted to -150V, is passed through
The N of 300sccm2Gas, control pressure light AlTi targets in 1.5Pa, target current 80A, sedimentation time 1 hour, and transfer rack is public
Rotary speed is 2r/min, rotational velocity 4r/min.It after completing plated film, treats that vacuum room temperature is down to room temperature, opens vacuum chamber and take
Go out matrix.
Coating testing result shows：Scarification detects more than binding force 84N, and Nanoindentation detection hardness is 39GPa；This
The coating high-temp oxidation onset temperature of invention makes up to 950 DEG C or so (using thermogravimetric analyzer), illustrates the self assembly of the present invention
Nanometer multilayer Ti-Al nitride coatings antioxygenic properties are further enhanced.
Embodiment 3
A kind of self-assembled nanometer multilayer oxygen Ti-Al nitride coatings, including rich Ti layers and Al layers of richness.Wherein, it is Ti layers rich
Thickness is 20nm, and thickness Al layers rich is 100nm, and the atom percentage content of each element is in coating：Al：25at.%, Ti:
15at.%, N：60at.%.
By ceramic matrix polishing treatment, it is cleaned by ultrasonic 20min through acetone, alcohol, then vacuum chamber is packed into after being dried up with nitrogen
It is interior.It opens heater and is warming up to 500 DEG C, vacuum chamber to vacuum degree 8.0 × 10-3Below Pa.It is passed through the Ar of 200sccm
Gas, setting work support bias -900~-1000V, and sputter clean, bombardment time 20min are carried out to matrix surface.It later will be inclined
Pressure drop lights Cr targets, target current 60A, with high energy Cr ion bombardment matrixes 15min to -800V.Bias is adjusted to -100V, is led to
Enter the N of 200sccm2Gas adjusts air pressure to 1.0Pa, deposition CrN transition 5min.It is passed through N2, control pressure is lighted in 3.0Pa
AlTi targets, target current 150A, bias -150V, sedimentation time 2 hours, transfer rack revolution speed be 5r/min, rotational velocity
For 1r/min.It after completing plated film, treats that vacuum room temperature is down to room temperature, opens vacuum chamber and take out matrix.
Coating testing result shows：Scarification detects more than binding force 84N, and Nanoindentation detection hardness is 40GPa；This
The coating high-temp oxidation onset temperature of invention makes up to 950 DEG C or so (using thermogravimetric analyzer), illustrates the self assembly of the present invention
Nanometer multilayer Ti-Al nitride coatings antioxygenic properties are further enhanced.
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should
It is considered as protection scope of the present invention.
Claims (10)
1. a kind of Ti-Al nitride laminated coating cutter, including tool matrix and the Ti-Al for being compounded in the tool matrix surface
Nitride laminated coating；
The Ti-Al nitride laminated coating includes Al layers of Ti layers of richness and richness, and Ti layers of the richness is with Al layers of alternating deposit of richness in institute
It states on tool matrix；
The Ti-Al nitride laminated coating includes the component of following atomic percent：
Al：20~35%, Ti：10~30%, N：50~60%.
2. Ti-Al nitride laminated coating cutter according to claim 1, which is characterized in that the tool matrix is gold
Belong to simple substance, hard alloy or ceramics.
3. Ti-Al nitride laminated coating cutter according to claim 1, which is characterized in that the Ti-Al nitride is more
The thickness of layer coating is 2~10 μm.
4. Ti-Al nitride laminated coating cutter according to claim 1, which is characterized in that the individual layer of Ti layers of the richness
Thickness is 2~20nm；
The thickness in monolayer of Al layers of the richness is 5~100nm.
5. a kind of preparation method of Ti-Al nitride laminated coating cutter, includes the following steps：
A) cutter is placed in the sample disc at edge of sample turntable mounting, tool matrix surface sputter using Ar gas clear
It washes, then lights Cr targets, with Cr ion bombardment tool matrix, activated matrix surface；
B) it is passed through N2Gas lights Al-Ti targets, and adjustment sample disc revolves round the sun and the rotating speed of rotation, depositing Ti-Al nitride laminated coatings,
Obtain Ti-Al nitride laminated coating cutters；
In the Al-Ti targets, the atomic percent that the atomic percent of Al is 30~70%, Ti is 20~60%；
The rotating speed of the sample disc revolution is 0~5r/min；The rotating speed of the sample disc rotation is 1~6r/min.
6. preparation method according to claim 5, which is characterized in that the step A) in, vacuum degree for 1.0~8.0 ×
10-3Pa；
The step A) in temperature be 300~500 DEG C.
7. preparation method according to claim 5, which is characterized in that the step A) in Ar gas flow for 200~
300sccm；
The time of the Ar gas sputter clean is 10~20min；
During the Ar gas sputter clean, apply the bias of -800~-1000V on tool matrix.
8. preparation method according to claim 5, which is characterized in that the step A) in, the target current of Cr targets is 60
~150A；
The bombardment time of the Cr ions is 3~15min；
During the Cr ion bombardments activation, apply the bias of -600~-800V on tool matrix.
9. preparation method according to claim 5, which is characterized in that the step B) in air pressure be 1.0~3.0Pa；
The electric current of the Al-Ti targets is 60~150A；
The step B) in, the bias of -60~-200V of application on tool matrix.
10. preparation method according to claim 5, which is characterized in that the step B) in deposit time be 0.5~2
Hour；
The step B) in deposit temperature be 300~500 DEG C.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201810038868.9A CN108220875B (en) | 2018-01-16 | 2018-01-16 | Self-assembled Ti-Al nitride multilayer coating cutter and preparation method thereof |
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| CN201810038868.9A CN108220875B (en) | 2018-01-16 | 2018-01-16 | Self-assembled Ti-Al nitride multilayer coating cutter and preparation method thereof |
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| CN114196909A (en) * | 2021-12-03 | 2022-03-18 | 广东振华科技股份有限公司 | Method for improving bonding strength of wear-resistant protective coating on surface of insulating substrate |
| WO2024060667A1 (en) * | 2022-09-20 | 2024-03-28 | 株洲钻石切削刀具股份有限公司 | Coating cutting tool |
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| CN1962926A (en) * | 2005-11-08 | 2007-05-16 | 中国科学院金属研究所 | Metal materials protection method (2) |
| CN107107203A (en) * | 2014-11-13 | 2017-08-29 | 三菱综合材料株式会社 | Surface-coated cutting tool |
| CN107287555A (en) * | 2017-05-15 | 2017-10-24 | 广东工业大学 | A kind of self-assembled nanometer oxynitride coating and its preparation method and application |
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| CN1361308A (en) * | 2000-12-29 | 2002-07-31 | 中国科学院金属研究所 | Ionic TiALN coating for blade of air compressor in naval aircraft engine |
| CN1962926A (en) * | 2005-11-08 | 2007-05-16 | 中国科学院金属研究所 | Metal materials protection method (2) |
| CN107107203A (en) * | 2014-11-13 | 2017-08-29 | 三菱综合材料株式会社 | Surface-coated cutting tool |
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| CN114196909A (en) * | 2021-12-03 | 2022-03-18 | 广东振华科技股份有限公司 | Method for improving bonding strength of wear-resistant protective coating on surface of insulating substrate |
| WO2024060667A1 (en) * | 2022-09-20 | 2024-03-28 | 株洲钻石切削刀具股份有限公司 | Coating cutting tool |
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| CN108220875B (en) | 2020-04-28 |
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