CN108203096A - The preparation method of high-purity silicon dioxide - Google Patents
The preparation method of high-purity silicon dioxide Download PDFInfo
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- CN108203096A CN108203096A CN201611188310.6A CN201611188310A CN108203096A CN 108203096 A CN108203096 A CN 108203096A CN 201611188310 A CN201611188310 A CN 201611188310A CN 108203096 A CN108203096 A CN 108203096A
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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- Inorganic Chemistry (AREA)
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Abstract
The invention discloses a kind of methods of high-purity silicon dioxide, using diatomite as raw material, are reacted at a certain temperature with ammonium fluoride aqueous solution, by precipitating, filtering, centrifuging and obtain ammonium fluosilicate solution;High-purity fluorine ammonium silicate solid is obtained by evaporative crystallization;High-purity fluorine ammonium silicate solid is by thermally decomposing to yield high-purity silicon tetrafluoride;Silicon tetrafluoride gas is reacted with high-purity ammonium hydroxide, is generated precipitation of silica, by separation of solid and liquid, washing, vacuum drying, is prepared high-purity silicon dioxide powder.The silicon-dioxide powdery purity that this method cost of material is relatively low, operating procedure is simple, contamination-free is generated and prepared in production process is more than 6N.
Description
Technical field
The present invention relates to Inorganic Chemicals preparation field, more particularly to a kind of preparation side of high-purity silicon dioxide
Method.
Background technology
(N represents after decimal point 9 digit to high-purity silicon dioxide (more than 5N), such as:5N represents that purity is
99.99999%) it is that the indispensable important foundation material of the industries such as polysilicon, optoelectronics industry and application are increasingly extensive
New and high technology material.
The method of traditional production high-purity silicon dioxide mainly has:Silica method for refining, gas phase synthesis method (dry method) and heavy
Shallow lake method (wet method) etc..Silica method for refining is by being refining to obtain high-purity titanium dioxide using the very high quartz of natural purity, silica
Silicon.The method is limited by the limitation of raw material, not only limited amount, but also is also difficult to meet wanting for new high-tech material field in quality
It asks.Vapor phase method is using the halide of silicon or silanol as raw material, higher price, and has flammable, strong corrosive, to process units requirement
Greatly, production cost is high, is not suitable for mass producing for high, investment.The precipitation method are usually using sodium metasilicate or ammonium fluosilicate as raw material, price
Relatively low, operation is comparatively safe, but the difficulty purified is larger, and product quality is easily influenced by material purity, and production process has dirt
Contaminate object discharge.
Invention content
The object of the present invention is to provide a kind of low raw-material cost, operating procedure is simple and production process non-pollutant discharge
High-purity silicon dioxide preparation method.
For this purpose, technical scheme is as follows:
A kind of preparation method of high-purity silicon dioxide, includes the following steps:
1) diatomite and ammonium fluoride aqueous solution react generation ammonium fluosilicate solution and ammonia, the fluorine silicon at 80~90 DEG C
Acid ammonium solution is filtered, removes impurity after centrifugation purification;High-purity ammonia water is made through absorbing pure water in the ammonia;
2) ammonium fluosilicate solution after preliminary purification is realized into separation of solid and liquid by multiple evaporative crystallization, then passes through washing
High-purity fluorine ammonium silicate solid is obtained, the high-purity fluorine ammonium silicate solid purity is preferably not below 4N;
3) the high-purity fluorine ammonium silicate solid is heated to 100~150 DEG C, make its decompose generation silicon tetrafluoride gas and
Ammonium fluoride gas;
4) ocratation and ammonium fluoride gas are imported into consersion unit, makes it anti-with high-purity ammonia water progress ammonolysis
Should, generate precipitation of silica;
5) precipitation of silica is dehydrated by high speed centrifugation, washed and is dried in vacuo, obtain purity more than 6N high
Purity silica powder.
In above-mentioned step 2), the ammonium fluosilicate solution after the purification is put into triple effect evaporation crystallizer, is passed through
Evaporative crystallization realizes separation of solid and liquid three times;In above-mentioned step 3), the high-purity fluorine ammonium silicate solid is put into thermal decomposition
Heat resolve in reactor.The content of SiO 2 is 95% or so in the diatomite.
Method cost of material of the invention is relatively low, operating procedure is simple, and the ammonia that production process generates is only absorbed by the water, so
Contamination-free generates.It is more than 6N with silicon-dioxide powdery purity prepared by this method, so disclosure satisfy that new and high technology material pair
The requirement of its purity.
Specific embodiment
The method of the present invention is described in detail with reference to specific embodiment.
The present invention method with diatomite (2 contents of SiO are about 95wt%) be raw material, with ammonium fluoride aqueous solution certain
At a temperature of dissolving, reaction, by precipitating, filtering, centrifuging and obtain ammonium fluosilicate solution;High-purity fluorine silicon is obtained by evaporative crystallization
Sour ammonium solid;High-purity fluorine ammonium silicate solid is by thermally decomposing to yield high-purity silicon tetrafluoride;Silicon tetrafluoride gas and high purity ammonia
Water reacts, and generates precipitation of silica, by separation of solid and liquid, washing, vacuum drying, prepares high-purity silicon dioxide powder.
In the process, high-purity ammonia water is obtained by the reaction by the first step, and final step reaction generation silica and ammonium fluoride, ammonium fluoride can
Continue cycling through use.
Embodiment 1
1) diatomite (2 contents of SiO about 95%) and ammonium fluoride (NH 4F) aqueous solution stir molten under the conditions of 80~90 DEG C
Solution, reaction generation ammonium fluosilicate solution and ammonia.Through precipitation, filter, centrifuge and etc. remove impurity, obtain purity for 99 with
On ammonium fluosilicate solution, more than 99.99% high-purity ammonium hydroxide is made through absorbing pure water in ammonia.Reaction equation is as follows:
SiO 2+6NH 4F→(NH 4)2SiF 6+2H 2O+4NH 3↑ (1)
2) obtained ammonium fluosilicate solution is imported in triple effect evaporation crystallizer, solid-liquid is realized by evaporative crystallization three times
Then separation obtains high-purity fluorine ammonium silicate solid of the purity not less than 4N by washing, part dissolved impurity quilt in solution
Removal.
3) obtained high-purity fluorine ammonium silicate solid in thermal decomposition reactor is heated to 100~150 DEG C, makes its point
It solves and generates ocratation (SiF 4) gas and ammonium fluoride (NH 4F) gas, micro impurity is separated in solid.Reaction
Equation is as follows:
(NH 4)2SiF 6→SiF 4↑+NH 4F↑ (2)
4) Gaseous silicon tetrafluoride and gaseous state ammonium fluoride are imported into consersion unit, with high purity ammonia obtained in step 1
Water carries out ammonolysis reaction, generates precipitation of silica.Reaction equation is as follows:
SiF 4+2NH 4F+2H 2O+4NH 3→SiO 2↓+6NH 4F (3)
5) it by precipitation of silica obtained by centrifuging, washing more than twice, is then dried in vacuo, obtains purity>6N
High-purity silicon dioxide powder.
If in above-mentioned step 4), purity≤4N of ammonium fluosilicate solid should then observe whether it influences subsequently to walk
Rapid purity 5), if influenced, the ammonium fluosilicate solid of purity≤4N needs return to step 2) re-start crystallization;If no
It influences, can not consider.
The washing of step 5) is usually no more than 3 times, and the influence of the washing of excessive pass to purity is limited.
Product made from this method, the 1/3 of the similary purity product of cost deficiency import, compared with the domestic prior art,
The production technology of the present invention is easy, and production process does not have pollutant emission, and ammonium fluoride can be recycled.
Claims (3)
1. a kind of preparation method of high-purity silicon dioxide, it is characterised in that include the following steps:
1) diatomite and ammonium fluoride aqueous solution react generation ammonium fluosilicate solution and ammonia, the ammonium fluosilicate at 80~90 DEG C
Solution is filtered and high speed centrifugation after remove impurity, realize preliminary purification;High-purity ammonia water is made through absorbing pure water in the ammonia;
2) ammonium fluosilicate solution after preliminary purification is subjected to secondary purification, so by multiple evaporative crystallization by separation of solid and liquid
High-purity fluorine ammonium silicate solid is obtained by washing afterwards;
3) the high-purity fluorine ammonium silicate solid is heated to 100~150 DEG C, it is made to decompose generation silicon tetrafluoride gas and fluorination
Ammonium gas;
4) ocratation and ammonium fluoride gas are imported into consersion unit, it are made to carry out ammonolysis reaction with high-purity ammonia water,
Generate precipitation of silica;
5) precipitation of silica is dehydrated by high speed centrifugation, washed and is dried in vacuo, it is high-purity more than 6N to obtain purity
Spend silicon-dioxide powdery.
2. preparation method according to claim 1, it is characterised in that:In step 2), by the fluosilicic acid after the purification
Ammonium salt solution is put into triple effect evaporation crystallizer, and separation of solid and liquid is realized by evaporative crystallization three times.
3. preparation method according to claim 1, it is characterised in that:In step 3), by the high-purity fluorine ammonium silicate
Solid is put into heat resolve in thermal decomposition reactor.
Priority Applications (1)
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CN201611188310.6A CN108203096A (en) | 2016-12-20 | 2016-12-20 | The preparation method of high-purity silicon dioxide |
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CN201611188310.6A CN108203096A (en) | 2016-12-20 | 2016-12-20 | The preparation method of high-purity silicon dioxide |
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2016
- 2016-12-20 CN CN201611188310.6A patent/CN108203096A/en active Pending
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Application publication date: 20180626 |