CN108178301A - A kind of denitrifying method of organic wastewater - Google Patents
A kind of denitrifying method of organic wastewater Download PDFInfo
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- CN108178301A CN108178301A CN201810002095.9A CN201810002095A CN108178301A CN 108178301 A CN108178301 A CN 108178301A CN 201810002095 A CN201810002095 A CN 201810002095A CN 108178301 A CN108178301 A CN 108178301A
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- organic wastewater
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F3/00—Biological treatment of water, waste water, or sewage
- C02F3/30—Aerobic and anaerobic processes
- C02F3/302—Nitrification and denitrification treatment
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/38—Organic compounds containing nitrogen
Abstract
The present invention relates to sewage treatment field, more particularly to a kind of denitrifying method of organic wastewater.The denitrifying method is：Step S1：To being filled with a diameter of 3~5 ㎜, specific surface area is 3~5m2The reative cell of the haydite of/g carries out bio-film colonization processing；Step S2：Pending organic wastewater is passed through into bio-film colonization treated the reative cell；The pending organic wastewater is the organic wastewater generated in Thin Film Transistor-LCD production process；Step S3：After reaching preset time, after stopping is passed through pending organic wastewater, it is aerated into the reative cell；Repeat step S2 and S3；The hydraulic detention time for maintaining pending organic wastewater is 8~10 hours, completes denitrogenation processing.In the present invention, the efficient progress of the denitrification processing under the nitrification processing and anaerobic condition of aerobic conditions, water after processing are realized, the removal rate of ammonia nitrogen and total nitrogen can reach more than 80%.
Description
Technical field
The present invention relates to sewage treatment field, more particularly to a kind of denitrifying method of organic wastewater.
Background technology
With the development of liquid crystal flat-panel display technology, Thin Film Transistor-LCD (TFT-LCD) be at present on the market
The display of most mainstream has been obtained for adequately universal.
In Thin Film Transistor-LCD (TFT-LCD) production process, the multinomial technique being related to is required to largely use
Nitrogenous chemicals, such as a large amount of corrosion developments for using TMAH (tetramethylammonium hydroxide) for panel, cause the organic of discharge
Contain a large amount of organic nitrogen in waste water.In order to avoid environmental pollution, generated in Thin Film Transistor-LCD production process
Organic wastewater has to pass through processing, could discharge.
Processing method universal at present is the organic matter decomposed by conventional activated sludge process in water, then passes through nitration reaction
Remove ammonia nitrogen (NH4 +-N).But this kind of processing method is relatively low for the removal efficiency of total nitrogen (TN).As electronics industry pollutes
Total nitrogen (TN) is included in discharge index by the formulation of object discharge standard, it is desirable that the processing of organic wastewater has higher total nitrogen to remove
Rate and ammonia nitrogen removal frank.
Invention content
The technical problem to be solved in the present invention is to provide a kind of denitrifying method of organic wastewater, improve ammonia nitrogen and
The removal rate of total nitrogen.
The invention discloses a kind of denitrifying method of organic wastewater, applied to denitrogenation processing equipment, at the denitrogenation
It manages equipment to include carrying out organic wastewater the reative cell of denitrogenation processing, filled with a diameter of 3~5 ㎜ in the reative cell, compares table
Area is 3~5m2The haydite of/g, the denitrifying method include the following steps：
Step S1：To the reative cell carry out bio-film colonization processing so that be attached on the haydite nitrifying microorganisms and
Denitrifying microorganism and reach more than 50% by the organic wastewater total nitrogen removal efficiency of the reative cell；
Step S2：Pending organic wastewater is passed through into bio-film colonization treated the reative cell；It is described pending
Organic wastewater be the organic wastewater that generates in Thin Film Transistor-LCD production process；
Step S3：After reaching preset time, after stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Repeat step S2 and S3；
The hydraulic detention time for maintaining pending organic wastewater is 8~10 hours, completes denitrogenation processing.
Preferably, step S1 is specially：
Step S1-1：The haydite in carbohydrate aqueous solution soaking reative cell for being 250~300mg/L with COD value, and to reaction
Air is continuously passed through in room, the air inflow of the air is 25~35L/min；
Step S1-2：After 20~30 hours, the COD value for the carbohydrate aqueous solution for impregnating haydite is measured；
If measuring 60% obtained of COD value not less than carbohydrate aqueous solution COD value in the step S1-1, described in removal
Carbohydrate aqueous solution in reative cell is then back to and performs step S1-1；
If measuring 60% obtained of COD value less than carbohydrate aqueous solution COD value in the step S1-1, remove described anti-
The carbohydrate aqueous solution in room is answered, then performs step S1-3；
Step S1-3：The organic wastewater generated in Thin Film Transistor-LCD production process is made to pass through the reaction
Room, and continuous aeration simultaneously, the hydraulic retention for maintaining the organic wastewater are 30~35 hours；
The inflow of the organic wastewater is gradually increased, until hydraulic detention time is 8 hours；
Step S1-4：The carbon-nitrogen ratio of the organic wastewater generated in Thin Film Transistor-LCD production process is adjusted to
4~5：1, and be continually fed into the reative cell, intermittent aerating, until being reached by the organic wastewater total nitrogen removal efficiency of reative cell
More than 50% so that be attached with nitrifying microorganisms and denitrifying microorganism on the haydite.
Preferably, the step S1-3 is specially：
The organic wastewater generated in Thin Film Transistor-LCD production process is made to pass through the reative cell, and is connected simultaneously
Continuous aeration, the hydraulic retention for maintaining organic wastewater are 30~35 hours；
Increase within every 2~4 days the inflow of the primary organic wastewater, until hydraulic detention time is 8 hours.
Preferably, in the step S1-3, gas-water ratio is 3~5:1；After aeration, the dissolving in the organic wastewater
Oxygen concentration is 2~4mg/L.
Preferably, primary every 3~5 hours aerations in the step S1-4, aeration time is 3~5 hours；The exposure
During gas, gas-water ratio is 3~5:1.
Preferably, in the step S1-4, the hydraulic retention of the organic wastewater is 8~10 hours.
Preferably, in the step S3, the time ratio of the preset time and aeration is 0.5~2:1.
Preferably, the preset time is 0.5~1 hour, and the time of the aeration is 0.5~1 hour.
Preferably, within the period for performing an a step S2 and step S3, gas-water ratio is 4~5:1.
In preferably described step S2, it is 3~4 that the pending organic wastewater, which is carbon-nitrogen ratio,：1 thin film transistor (TFT) liquid
The organic wastewater generated in crystal display production process.
Compared with prior art, denitrifying method of the invention makes first to carrying out bio-film colonization processing in reative cell
Attachment nitrifying microorganisms and denitrifying microorganism on haydite are obtained, and reaches certain total nitrogen removal efficiency.Then it uses and is passed through
The mode that the organic wastewater generated in Thin Film Transistor-LCD production process is carried out with aeration interval carries out organic wastewater
Processing；When being wherein aerated, stop being passed through for organic wastewater, the ammonia nitrogen in organic wastewater is converted under the action of nitrobacteria
Nitrate nitrogen, as reaction carries out, carbon source gradually decreases, and reduces competition of the aerobic bacteria for dissolved oxygen.It is being passed through organic wastewater
During, no air is passed through, and the denitrifying bacteria in anaerobic environment occupies advantage, is carried out by the carbon source for supplement of intaking
Nitrate nitrogen is converted into nitrogen discharge by denitrification.In the present invention, bio-film colonization treated haydite cooperation aeration time, water
The control of the denitrogenation processings condition such as power residence time is realized at the denitrification under the nitrification processing and anaerobic condition of aerobic conditions
The removal rate of the efficient progress of reason, water after processing, ammonia nitrogen and total nitrogen can reach more than 80%.
The denitrifying method of the present invention handles the denitrification under the nitrification processing of aerobic conditions and anaerobic condition simultaneously
It is carried out in same denitrogenation processing equipment, reduces occupation area of equipment, reduce operating cost.
Description of the drawings
Fig. 1 shows the flow charts of the denitrifying method of organic wastewater of the present invention；
Fig. 2 represents the structure diagram of denitrogenation processing equipment；
After Fig. 3 represents that the embodiment of the present invention 1 controls the time for being passed through organic wastewater and aeration than carrying out denitrogenation processing, in water
The removal effect figure of ammonia nitrogen and total nitrogen；
After Fig. 4 represents that the embodiment of the present invention 2 carries out denitrogenation processing using different aeration times, ammonia nitrogen and total nitrogen goes in water
Except design sketch；
After Fig. 5 represents that the embodiment of the present invention 3 controls different hydraulic detention times to carry out denitrogenation processing, ammonia nitrogen and total nitrogen in water
Removal effect figure；
After Fig. 6 represents that the embodiment of the present invention 4 controls the water inlet of different carbon-nitrogen ratios to carry out denitrogenation processing, ammonia nitrogen and total nitrogen in water
Removal effect figure；
After Fig. 7 represents that the embodiment of the present invention 5 controls different gas-water ratios to carry out denitrogenation processing, the removal of ammonia nitrogen and total nitrogen in water
Design sketch；
Fig. 8 shows the embodiment of the present invention 6 after denitrogenation processing, the removal effect figure of ammonia nitrogen and total nitrogen in water.
Specific embodiment
For a further understanding of the present invention, the preferred embodiment of the invention is described with reference to embodiment, still
It should be appreciated that these descriptions are only for the feature and advantage that further illustrate the present invention rather than to the claims in the present invention
Limitation.
The invention discloses a kind of denitrifying method of organic wastewater, applied to denitrogenation processing equipment, at the denitrogenation
It manages equipment to include carrying out organic wastewater the reative cell of denitrogenation processing, filled with a diameter of 3~5 ㎜ in the reative cell, compares table
Area is 3~5m2The haydite of/g, the denitrifying method includes the following steps, referring specifically to Fig. 1：
Step S1：To carrying out bio-film colonization processing in the reative cell so that be attached with nitrifying microorganisms on the haydite
Reach more than 50% with denitrifying microorganism and by the organic wastewater total nitrogen removal efficiency of the reative cell；
Step S2：Pending organic wastewater is passed through into bio-film colonization treated the reative cell；It is described pending
Organic wastewater be the organic wastewater that generates in Thin Film Transistor-LCD production process；
Step S3：After reaching preset time, after stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Repeat step S2 and S3；
The hydraulic detention time for maintaining pending organic wastewater is 8~10 hours, is completed at the denitrogenation to organic wastewater
Reason.
According to the present invention, for processed material be the organic waste that is generated in Thin Film Transistor-LCD production process
Water；In the denitrifying method of the organic wastewater, the control of filtrate, that is, haydite and experiment condition in denitrogenation processing equipment
It matches, achievees the effect that preferably to remove ammonia nitrogen and removal total nitrogen.
According to the present invention, filled with a diameter of 3~5 ㎜ in the reative cell, specific surface area is 3~5m2The haydite of/g, institute
The density for stating haydite is preferably 1.6-1.8g/cm3.The haydite is convenient for microorganism adsorption, makes microorganism abundant with organic wastewater
Contact, convenient for the progress of nitrification or anti-nitration reaction.
Below according to the present invention, the denitrifying method of organic wastewater is discussed in detail, includes the following steps：
Step S1：To carrying out bio-film colonization processing in the reative cell so that be attached with nitrifying microorganisms on the haydite
Reach more than 50% with denitrifying microorganism and by the organic wastewater total nitrogen removal efficiency of the reative cell；
Preferably, the step S1 is specially：
Step S1-1：The haydite in carbohydrate aqueous solution soaking reative cell for being 250~300mg/L with COD value, and to reaction
Air is continuously passed through in room, the air inflow of the air is 25~35L/min；
The carbohydrate aqueous solution is water and the mixture of carbohydrate, and the carbohydrate is preferably glucose, sucrose or starch.Root
According to the sugared content in carbohydrate aqueous solution, conversion obtains COD value.This step S1-1 uses carbohydrate of the COD value for 250~300mg/L
Aqueous solution and keep be passed through air, for cultivating microorganism, particularly aerobic microbiological.
Match with the feature of haydite, the COD value is preferably 280~290mg/L, and the air inflow of the air is preferably
30L/min。
Step S1-2：After 20~30 hours, the COD value for the carbohydrate aqueous solution for impregnating haydite is measured；
Preferably, after 24 hours, the COD value for the carbohydrate aqueous solution for impregnating haydite is measured；
After 20~30 hours, after preferably 24 hours, attachment portion microorganism on haydite, microbial consumption sugar
Class declines the COD value in carbohydrate aqueous solution.
If measuring 60% obtained of COD value not less than carbohydrate aqueous solution COD value in the step S1-1, described in removal
Carbohydrate aqueous solution in reative cell is then back to and performs step S1-1；
Obtained COD value is measured not less than 60% of carbohydrate aqueous solution COD value in the step S1-1, that is, is shown on haydite
The content of microorganisms of attachment is inadequate, in that case, then re-replaces the indoor carbohydrate aqueous solution of reaction, continues with carbohydrate
Aqueous solution culture microorganism removes the carbohydrate aqueous solution in the reative cell, be then back to and perform step S1-1；
If measuring 60% obtained of COD value less than carbohydrate aqueous solution COD value in the step S1-1, remove described anti-
The carbohydrate aqueous solution in room is answered, then performs step S1-3；
Obtained COD value is measured less than 60% of carbohydrate aqueous solution COD value in the step S1-1, then is shown attached on haydite
The content of microorganisms reaches standard, removes the carbohydrate aqueous solution in the reative cell, performs step S1-3；
Step S1-3：The organic wastewater generated in Thin Film Transistor-LCD production process is made to pass through the reaction
Room, and continuous aeration simultaneously, the hydraulic retention for maintaining the organic wastewater are 30~35 hours；
The inflow of the organic wastewater is gradually increased, until hydraulic detention time is 8 hours；
The step S1-3 is micro- using the organic wastewater domestication generated in Thin Film Transistor-LCD production process
Nitrobacteria in biology.In the step, organic wastewater is carried out at the same time with aeration.After aeration, in the organic wastewater
Dissolved oxygen concentration is preferably 2~4mg/L.During initial period, the hydraulic detention time of the organic wastewater is 30~35 hours, excellent
It is selected as 32 hours；It is then gradually increased the inflow of the organic wastewater, it is preferable that increase within every 2~4 days the primary organic waste
The inflow of water, until hydraulic detention time is 8 hours.
Step S1-4：The carbon-nitrogen ratio of the organic wastewater generated in Thin Film Transistor-LCD production process is adjusted to
4~5：1, and be continually fed into the reative cell, intermittent aerating, until being reached by the organic wastewater total nitrogen removal efficiency of reative cell
More than 50%, completion has nitrifying microorganisms and denitrifying microorganism in the indoor bio-film colonization processing of the reaction.
The step S1-4 is micro- using the organic wastewater domestication generated in Thin Film Transistor-LCD production process
Denitrifying bacteria in biology.In the step, the organic waste generated in Thin Film Transistor-LCD production process is first adjusted
The carbon-nitrogen ratio of water, the carbon-nitrogen ratio of organic wastewater generated in the Thin Film Transistor-LCD production process are 4~5：1,
Preferably 4:1.The method for adjusting carbon-nitrogen ratio can be addition carbon source, for example, to Thin Film Transistor-LCD production process
Methanol is added in the organic wastewater of middle generation.
The organic wastewater generated in Thin Film Transistor-LCD production process after adjustment carbon-nitrogen ratio is continually fed into instead
It answers in room, intermittent aerating, until reaching more than 50% by the organic wastewater total nitrogen removal efficiency of reative cell.The intermittent aerating is excellent
Choosing carries out in the following way：Primary every 3~5 hours aerations, aeration time is 3~5 hours；During the aeration, gas-water ratio
It is 3~5:1.More preferably mode is：Primary every 3 hours aerations, aeration time is 3 hours；During the aeration, gas-water ratio is
5:1。
It is handled by above-mentioned bio-film colonization, nitrifying microorganisms and denitrifying microorganism is attached with, and organic on the haydite
Waste water total nitrogen removal efficiency reaches more than 50%.It being handled by above-mentioned bio-film colonization, the organic loading of the haydite can reach 0.4~
0.6kg/(m3·d)。
Step S2：Pending organic wastewater is passed through into bio-film colonization treated the reative cell；It is described pending
Organic wastewater be the organic wastewater that generates in Thin Film Transistor-LCD production process；
Preferably, it is 3~4 that the pending organic wastewater, which is carbon-nitrogen ratio,：1 Thin Film Transistor-LCD production
The organic wastewater generated in the process.
Step S3：After reaching preset time, after stopping is passed through pending organic wastewater, it is aerated into the reative cell；
The preset time and the time ratio preferably 0.5~2 of aeration:1, such as 1:1,1:2 or 2:1, more preferably 1:1.
The preset time is preferably 0.5~1 hour, and the time of the aeration is preferably 0.5~1 hour；
Repeat step S2 and S3.
Within the period for performing an a step S2 and step S3, it is preferable that gas-water ratio is 4~5:1.
The hydraulic detention time for maintaining pending organic wastewater is 8~10 hours, is completed at the denitrogenation to organic wastewater
Reason.
Denitrogenation processing equipment of the present invention is preferably integration denitrification processing equipment, as shown in Fig. 2, including：Reaction
Room 7,7 inside bottom right of reative cell is supreme to be sequentially filled pebble layer 2 and haydite layer 1；
Intermittent water inflow pipeline 6 is set in the bottom sidewall of reative cell, and intermittent water inflow pipeline is connect with water distributor 4；Water distribution
Device 4 is for arrangement water in phase reaction chamber；
Interval air inlet pipeline 5 is set on the side wall for the reative cell being in contact with pebble layer 2；
The top of reative cell 7 is provided with effluent weir 1, for discharging treated water.
A diameter of 3~5 ㎜ of haydite in the haydite layer, specific surface area are 3~5m2/ g density is preferably 1.6~1.8g/
cm3。
For a further understanding of the present invention, with reference to embodiment to the denitrogenation processing side of organic wastewater provided by the invention
Method is described in detail, and protection scope of the present invention is not limited by the following examples.
Embodiment 1
Integration denitrification reactor is as shown in Fig. 2, including effluent weir 1, haydite layer 2, pebble layer 3, water distributor 4, interval
Air inlet pipeline 5, intermittent water inflow pipeline 6, reative cell 7.
Reative cell 7 is made of organic glass, and appearance is cylindrical, height 1.25m, and diameter 0.1m, the interior 5L haydites that are equipped with are filtered
Material, haydite 3~5mm of diameter, density 1.75g/cm3, specific surface area is about 4m2/g。
(1) bio-film colonization processing stage：
The amidin for being 300mg/L with COD value impregnates the haydite in reative cell, and sky is continuously passed through into reative cell
Gas, the air inflow of the air is 30L/min；
After 24 hours, the COD value for measuring the carbohydrate aqueous solution for impregnating haydite is 250mg/L；
The carbohydrate aqueous solution in the reative cell is removed, the amidin for being again 300mg/L with COD value impregnates reaction
Haydite in room, and air is continuously passed through into reative cell, the air inflow of the air is 30L/min；
After 24 hours, the COD value for measuring the carbohydrate aqueous solution for impregnating haydite is 200mg/L；
The carbohydrate aqueous solution in the reative cell is removed, the amidin for being again 300mg/L with COD value impregnates reaction
Haydite in room, and air is continuously passed through into reative cell, the air inflow of the air is 30L/min；
After 24 hours, the COD value for measuring the carbohydrate aqueous solution for impregnating haydite is 170mg/L；
Remove the carbohydrate aqueous solution in the reative cell；
The organic wastewater generated in Thin Film Transistor-LCD production process is taken, by the reative cell, and simultaneously
Continuous aeration, the hydraulic retention for maintaining the organic wastewater are 30~35 hours；
The every 2 days inflows for increasing the primary organic wastewater, until at the 4th day, the hydraulic detention time of organic wastewater is steady
It is scheduled on 8 hours；
Methanol is added in the organic wastewater generated into Thin Film Transistor-LCD production process, carbon-nitrogen ratio is adjusted
It is 4:1, and be continually fed into the reative cell, it is aerated 3 hours, stops aeration 3 hours, repeat to be aerated and stop aeration, until
Reach more than 50% by the organic wastewater total nitrogen removal efficiency of reative cell, completion has nitrifying microorganisms and denitrifying microorganism in institute
State the indoor bio-film colonization processing of reaction.The organic loading of haydite is 0.4~0.6kg/ (m3·d)。
(2) nitrogen removal stage：
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after reaching preset time,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
After aeration reaches the predetermined time, stop aeration, continue to be passed through organic wastewater；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, completes the denitrogenation processing to organic wastewater.
Pending organic wastewater is once passed through with performing in the period being once aerated performing, and control is passed through organic wastewater
Time is with aeration time than being respectively 1:1、1:2、2:1, each parameter stability is run 4~7 days, measures COD, the ammonia of water outlet daily
Nitrogen (NH4 +- N), the indexs such as total nitrogen (TN), select and compare between the more suitable exposure stopping time.
After denitrogenation processing is completed in test daily, the content of ammonia nitrogen and total nitrogen in water, as a result shown in Figure 3, control is passed through
Organic wastewater from the time being aerated than different, denitrification effect difference, time for being passed through organic wastewater most preferably and aeration time
Time ratio is 1:1.
Embodiment 2
(1) it is bio-film colonization processing stage, same as Example 1；
(2) nitrogen removal stage：
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 0.5 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 0.5 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；It performs and is once passed through the week that organic wastewater is once aerated with execution
In phase, gas-water ratio 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 2 hours,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 2 hours；
It is passed through organic wastewater and aeration process alternately；It performs and is once passed through the week that organic wastewater is once aerated with execution
In phase, gas-water ratio 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 4 hours,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 4 hours；
It is passed through organic wastewater and aeration process alternately；It performs and is once passed through the week that organic wastewater is once aerated with execution
In phase, gas-water ratio 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
After denitrogenation processing is completed in test daily, the content of ammonia nitrogen and total nitrogen in water is as a result shown in Figure 4, control aeration
Time it is different, denitrification effect is different, and best aeration time is 1 hour.
Embodiment 3
(1) it is bio-film colonization processing stage, same as Example 1；
(2) nitrogen removal stage：
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 has a Thin Film Transistor-LCD
The organic wastewater generated in production process, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time (HRT) for maintaining pending organic wastewater is 8 hours, and days running is 5 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 6 hours, and days running is 5 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 4 hours, and days running is 5 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 2 hours, and days running is 5 days.
After denitrogenation processing is completed in test daily, the content of ammonia nitrogen and total nitrogen in water is as a result shown in Figure 5, controls waterpower
Residence time is different, and denitrification effect is different, and best hydraulic detention time ratio is 8 hours.
Embodiment 4
(1) it is bio-film colonization processing stage, same as Example 1；
(2) nitrogen removal stage：
It is 3 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 5 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
After denitrogenation processing is completed in test daily, the content of COD, ammonia nitrogen and total nitrogen, as a result shown in Figure 6 in water, control
The organic wastewater carbon-nitrogen ratio that is generated in Thin Film Transistor-LCD production process is different, and denitrification effect is different, it is best into
Water is that carbon-nitrogen ratio is 4:The organic wastewater generated in 1 Thin Film Transistor-LCD production process.
Embodiment 5
(1) it is bio-film colonization processing stage, same as Example 1；
(2) nitrogen removal stage：
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
Produce the organic wastewater that generates in the process, when being passed through 1 after,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
After when being aerated 1, stop aeration, continue to be passed through organic wastewater；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 10：1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
Produce the organic wastewater that generates in the process, when being passed through 1 after,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
After when being aerated 1, stop aeration, continue to be passed through organic wastewater；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 5：1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
Produce the organic wastewater that generates in the process, when being passed through 1 after,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
After when being aerated 1, stop aeration, continue to be passed through organic wastewater；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 2.5：1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, is run 4~7 days.
After denitrogenation processing is completed in test daily, the content of ammonia nitrogen and total nitrogen in water is as a result shown in Figure 7, control aeration
Amount is different, and denitrification effect is different, best, execution is once passed through organic wastewater and aeration process, gas-water ratio 5：1.
Embodiment 6
(1) it is bio-film colonization processing stage, same as Example 1；
(2) nitrogen removal stage：
It is 4 that carbon-nitrogen ratio is passed through into bio-film colonization treated the reative cell：1 Thin Film Transistor-LCD life
The organic wastewater generated in the process is produced, after being passed through 1 hour,
After stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Aeration stops aeration, continues to be passed through organic wastewater after 1 hour；
It is passed through organic wastewater and aeration process alternately；Execution is once passed through organic wastewater and aeration process, gas-water ratio
It is 4:1.
The hydraulic detention time for maintaining pending organic wastewater is 8 hours, completes the denitrogenation processing to organic wastewater.
After denitrogenation processing is completed in test daily, the content of ammonia nitrogen and total nitrogen in water, experimental result is referring to Fig. 8.Experimental result
Show that in water inlet TN be 120~130mg/L, NH4 +In the case that-N is 40~60mg/L, by the denitrogenation processing of the present embodiment,
The average removal rate of TN is 85.98%, NH4 +The average removal rate of-N is 83.13%.
The explanation of above example is only intended to facilitate the understanding of the method and its core concept of the invention.It should be pointed out that pair
For those skilled in the art, without departing from the principle of the present invention, the present invention can also be carried out
Some improvements and modifications, these improvement and modification are also fallen within the protection scope of the claims of the present invention.
The foregoing description of the disclosed embodiments enables professional and technical personnel in the field to realize or use the present invention.
A variety of modifications of these embodiments will be apparent for those skilled in the art, it is as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, it is of the invention
The embodiments shown herein is not intended to be limited to, and is to fit to and the principles and novel features disclosed herein phase one
The most wide range caused.
Claims (10)
1. a kind of denitrifying method of organic wastewater, applied to denitrogenation processing equipment, the denitrogenation processing equipment is included to having
Machine waste water carries out the reative cell of denitrogenation processing, which is characterized in that filled with a diameter of 3~5 ㎜, specific surface area in the reative cell
For 3~5m2The haydite of/g, the denitrifying method include the following steps：
Step S1：Bio-film colonization processing is carried out to the reative cell so that nitrifying microorganisms and anti-nitre are attached on the haydite
Change microorganism and reach more than 50% by the organic wastewater total nitrogen removal efficiency of the reative cell；
Step S2：Pending organic wastewater is passed through into bio-film colonization treated the reative cell；Described pending has
Machine waste water is the organic wastewater generated in Thin Film Transistor-LCD production process；
Step S3：After reaching preset time, after stopping is passed through pending organic wastewater, it is aerated into the reative cell；
Repeat step S2 and S3；
The hydraulic detention time for maintaining pending organic wastewater is 8~10 hours, completes denitrogenation processing.
2. denitrifying method according to claim 1, which is characterized in that step S1 is specially：
Step S1-1：The haydite in carbohydrate aqueous solution soaking reative cell for being 250~300mg/L with COD value, and into reative cell
Continuous to be passed through air, the air inflow of the air is 25~35L/min；
Step S1-2：After 20~30 hours, the COD value for the carbohydrate aqueous solution for impregnating haydite is measured；
If measuring obtained COD value not less than 60% of carbohydrate aqueous solution COD value in the step S1-1, the reaction is removed
Carbohydrate aqueous solution in room is then back to and performs step S1-1；
If measuring obtained COD value less than 60% of carbohydrate aqueous solution COD value in the step S1-1, the reative cell is removed
In carbohydrate aqueous solution, then perform step S1-3；
Step S1-3：The organic wastewater generated in Thin Film Transistor-LCD production process is made to pass through the reative cell, and
Continuous aeration simultaneously, the hydraulic retention for maintaining the organic wastewater are 30~35 hours；
The inflow of the organic wastewater is gradually increased, until hydraulic detention time is 8 hours；
Step S1-4：The carbon-nitrogen ratio of the organic wastewater generated in Thin Film Transistor-LCD production process is adjusted to 4~
5：1, and be continually fed into the reative cell, intermittent aerating, until being reached by the organic wastewater total nitrogen removal efficiency of reative cell
More than 50%, and to be attached with nitrifying microorganisms and denitrifying microorganism on the haydite.
3. denitrifying method according to claim 2, which is characterized in that the step S1-3 is specially：
The organic wastewater generated in Thin Film Transistor-LCD production process is made to pass through the reative cell, and continuous exposure simultaneously
Gas, the hydraulic retention for maintaining organic wastewater are 30~35 hours；
Increase within every 2~4 days the inflow of the primary organic wastewater, until hydraulic detention time is 8 hours.
4. denitrifying method according to claim 3, which is characterized in that in the step S1-3, gas-water ratio is 3~5:
1；After aeration, the dissolved oxygen concentration in the organic wastewater is 2~4mg/L.
5. denitrifying method according to claim 2, which is characterized in that in the step S1-4, every 3~5 hours
Aeration is primary, and aeration time is 3~5 hours；During the aeration, gas-water ratio is 3~5:1.
6. denitrifying method according to claim 2, which is characterized in that in the step S1-4, the organic wastewater
Hydraulic retention be 8~10 hours.
7. denitrifying method according to claim 1, which is characterized in that in the step S3, the preset time with
The time ratio of aeration is 0.5~2:1.
8. denitrifying method according to claim 7, which is characterized in that the preset time is 0.5~1 hour, institute
The time for stating aeration is 0.5~1 hour.
9. denitrifying method according to claim 1, which is characterized in that performing an a step S2 and step S3
Period in, gas-water ratio be 4~5:1.
10. denitrifying method according to claim 1, which is characterized in that in the step S2, described pending has
Machine waste water is that carbon-nitrogen ratio is 3~4：The organic wastewater generated in 1 Thin Film Transistor-LCD production process.
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| CN105217901A (en) * | 2015-11-21 | 2016-01-06 | 杭州绿夏环境科技有限公司 | A kind of method of wastewater biochemical removing total nitrogen |
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| CN105217901A (en) * | 2015-11-21 | 2016-01-06 | 杭州绿夏环境科技有限公司 | A kind of method of wastewater biochemical removing total nitrogen |
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