CN108152940A - Reflection and refraction optical system, lamp optical system, exposure device - Google Patents
Reflection and refraction optical system, lamp optical system, exposure device Download PDFInfo
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- CN108152940A CN108152940A CN201711263241.5A CN201711263241A CN108152940A CN 108152940 A CN108152940 A CN 108152940A CN 201711263241 A CN201711263241 A CN 201711263241A CN 108152940 A CN108152940 A CN 108152940A
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- optical system
- refraction
- reflection
- reflecting surface
- plane
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Abstract
The present invention relates to reflection and refraction optical system, lamp optical system, exposure devices.Include in object plane and image planes as the reflection and refraction optical system of telecentric beam path：1st reflecting surface, the 2nd reflecting surface, the 3rd reflecting surface and the 4th reflecting surface；And the plane of refraction with positive refractive power, the plane of refraction is configured between the object plane and the 1st reflecting surface, and the light come out from the object plane reaches the image planes via the plane of refraction, the 1st reflecting surface, the plane of refraction, the 2nd reflecting surface, the plane of refraction, the 3rd reflecting surface, the 4th reflecting surface successively.
Description
Technical field
The present invention relates to reflection and refraction optical system, lamp optical system, exposure device and article manufacturing methods.
Background technology
Exposure device is via projection in the offset printing process for manufacturing semiconductor device, display device and other items
The pattern of master is transferred to the device of photosensitive substrate (surface is formed with the substrate of photoresist layer) by optical system.Example
Such as, it is required to transfer pattern to greater area of substrate with high-resolution as manufacturing the exposure device of display device
Performance.In order to cope with such requirement, it is to have that can obtain high-resolution and can expose the scanning-exposure apparatus of big picture
.Scanning-exposure apparatus scans master and substrate on one side, and substrate is exposed with the light for being shaped to circular shape on one side.
At this point, being illuminated to be shaped to the light of circular shape to master, figure of the light by master for being shaped to circular shape is utilized
Case projects to substrate.
The illumination optical system that the useful light for being shaped to circular shape illuminates master is recorded in patent document 1
System.However, in order to illuminate object with uniform energy according to desired shape, need to make to be set to illumination optical system
The opening portion of the field stop of system images in the imaging optical system of object.In general, such imaging optical system is claimed
To shelter imaging system.In the case where being illuminated to big picture, in order to reduce the optics on field stop periphery member as far as possible
The size of part, mask imaging system are preferably made of mirror system, have enlargement ratio.
The imaging optical system for inhibiting aberration well is recorded in patent document 2.As recorded in patent document 2 into
As optical system is referred to as Ao Funa (offner) optical system, make bendingof light with 3 curvature mirrors to be imaged.Ao Funa optical systems
System is the equal multiplying power system of 1 imaging, but as recorded in patent document 3, can be caused according to the position of 3 curvature mirrors
With enlargement ratio.In addition, as recorded in patent document 4, also using multiple imaging come the optical system of aberration correction.
Existing technical literature
Patent document
Patent document 1：Japanese Patent Publication 04-078002 bulletins
Patent document 2：Japanese Unexamined Patent Publication 2010-20017 bulletins
Patent document 3：Japanese Unexamined Patent Publication 07-146442 bulletins
Patent document 4：Japanese Unexamined Patent Application 61-203419 bulletins
Invention content
But the imaging optical system as recorded in patent document 2,3 is grown since the anti-coke of optical system is poly-, so for example
In the case where being equipped on exposure device, exposure device can be made to become enlargement.In addition, the optical system recorded in patent document 4
Due to being repeatedly imaged, so overall length is elongated, lead to the enlargement of device.
The purpose of the present invention is to provide the catadioptric opticals of structure that is small-sized and having the reduction to aberration advantageous
System and the device including the reflection and refraction optical system.
The 1st aspect of the present invention is related in the reflection and refraction optical system of object plane and image planes as telecentric beam path, this is anti-
Dioptric system is penetrated to include：1st reflecting surface, the 2nd reflecting surface, the 3rd reflecting surface and the 4th reflecting surface；And it is bent with positive
The plane of refraction of luminous power, the plane of refraction are configured between the object plane and the 1st reflecting surface, from the object plane come out light according to
It is secondary via the plane of refraction, it is the 1st reflecting surface, the plane of refraction, the 2nd reflecting surface, the plane of refraction, the described 3rd anti-
Penetrate face, the 4th reflecting surface reaches the image planes.
The 2nd aspect of the present invention is related to lamp optical system, and the lamp optical system has involved by the described 1st aspect
Reflection and refraction optical system.
The 3rd aspect of the present invention is related to exposure device, and the exposure device has the reflection folding involved by the described 1st aspect
Penetrate optical system.
The 4th aspect of the present invention is related to article manufacturing method, and the article manufacturing method includes：Utilize the described 3rd aspect
The process that involved exposure device is exposed substrate；And make the process of the substrate development, from the substrate manufacture
Article.
According to the present invention, provide small-sized and reflection and refraction optical system with the advantageous structure of the reduction to aberration with
And the device including the reflection and refraction optical system.
Description of the drawings
Fig. 1 is the figure of the structure for the lamp optical system for showing 1 embodiment of the present invention.
Fig. 2 is the figure for the outline structure for showing fly's eye optical system.
Fig. 3 is the figure for the outline structure for showing field stop.
Fig. 4 A are the figures of the structure for the reflection and refraction optical system for showing design example 1.
Fig. 4 B are the expanded views for the reflection and refraction optical system for designing example 1.
Fig. 4 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 1.
Fig. 4 D are the figures for showing to be shaped to the illumination light of circular shape.
Fig. 5 A are the figures of the structure for the reflection and refraction optical system for showing design example 2.
Fig. 5 B are the expanded views for the reflection and refraction optical system for designing example 2.
Fig. 5 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 2.
Fig. 6 A are the figures of the structure for the reflection and refraction optical system for showing design example 3.
Fig. 6 B are the expanded views for the reflection and refraction optical system for designing example 3.
Fig. 6 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 3.
Fig. 7 A are the figures of the structure for the reflection and refraction optical system for showing design example 4.
Fig. 7 B are the expanded views for the reflection and refraction optical system for designing example 4.
Fig. 7 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 4.
Fig. 8 A are the figures of the structure for the reflection and refraction optical system for showing design example 5.
Fig. 8 B are the expanded views for the reflection and refraction optical system for designing example 5.
Fig. 8 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 5.
Fig. 9 A are the figures of the structure for the reflection and refraction optical system for showing design example 6.
Fig. 9 B are the expanded views for the reflection and refraction optical system for designing example 6.
Fig. 9 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 6.
Figure 10 is the figure of the structure for the exposure device for showing 1 embodiment of the present invention.
Figure 11 is the figure for illustrating illumination photometry.
Figure 12 A, 12B are the figures for illustrating uneven illumination correction.
Figure 13 A are the figures of the structure for the reflection and refraction optical system for showing design example 7.
Figure 13 B are the expanded views for the reflection and refraction optical system for designing example 7.
Figure 13 C are the figures for sharing degree of the hereby valve sum for the reflection and refraction optical system for showing design example 7.
Figure 14 A are the figures for the effective coverage for representing light beam.
Figure 14 B are the figures in the region for representing installation optical film design example 1 or 2.
Figure 14 C are the figures in the region for representing installation optical film design example 3 and 4.
Figure 15 A are the figures for the optical characteristics for representing optical film design example 1.
Figure 15 B are the figures for the optical characteristics for representing optical film design example 2.
Figure 15 C are the figures for the optical characteristics for representing optical film design example 3.
Figure 15 D are the figures for the optical characteristics for representing optical film design example 4.
Reference sign
160：Reflection and refraction optical system；OBJ：Object plane；IMG：Image planes；L1、L2：Lens；M1~M4：Speculum.
Specific embodiment
Hereinafter, with reference to attached drawing, the present invention is illustrated by its illustrative embodiment.
With reference to Fig. 1, Fig. 2 and Fig. 3, illustrate the structure of the reflection and refraction optical system of 1 embodiment of the present invention.Instead
The lamp optical system 100 of exposure device can be for example embedded by penetrating dioptric system.Illumination optical system is shown in FIG. 1
The configuration example of system 100.Lamp optical system 100 can include light source portion 120, wavelength filter 104, the 1st optical system 105,
Deflection mirror 107, the 2nd optical system 140, fly's eye optical system 109, opening diaphragm 110, the 3rd optical system 150, visual field
Diaphragm 111, the 4th optical system 160.Lamp optical system 100 is configured to illuminate the master M for being in illuminated surface.Light
Source portion 120 can include light source 101 and elliptical reflector 102.
Light source 101 for example can be high-pressure mercury-vapor lamp, xenon lamp or excimer laser.Elliptical reflector 102 be for
The condensing optical system of optically focused is carried out to the light come out from light source 101, forms the shape for having used an elliptical part.Light
Source 101 can be configured at the side (the 1st focus) in two focuses of elliptical reflector 102.
Light after coming out from light source 101 and being reflected by elliptical reflector 102, which is condensed to, is configured at the another of elliptical reflector 102
The wavelength filter 104 of the focus (the 2nd focus) of one side nearby.Wavelength filter 104 changes the spatial distribution of light.Pass through wavelength
The light of wave filter 104 is directed to deflection mirror 107 by the 1st optical system 105, is reflected by deflection mirror 107.In Fig. 1 institutes
In the example shown, setting is there are two light source portion 120, but light source portion 120 is either 1 or 3 or more.
1st optical system 105 be configured to face 108 relative to the light essence come out from the 2nd focus of elliptical reflector 102 into
Position for Fourier transformation.The light for coming self-Fourier transform face 108 is directed to fly's eye optical system by the 2nd optical system 140
109.The plane of incidence that 2nd optical system 140 is configured to fly's eye optical system 109 essentially becomes Fourier transformation relative to face 108
Position.
In fig. 2 it is shown that fly's eye optical system 109.As shown in Fig. 2, fly's eye optical system 109 can include two thoroughly
Lens group 131,132.Each lens group can arrange multiple planoconvex spotlights in the plane and form.In the plano-convex for forming lens group 131
The focal position of lens is configured with the planoconvex spotlight for forming lens group 132.In addition, form the convex of the planoconvex spotlight of lens group 131
The convex surface of planoconvex spotlight of the face with forming lens group 132 is configured in opposite directions.In the exit facet of such fly's eye optical system 109
Side is formed with secondary souce distribution (efficient light sources distribution).
Drawn from the light beam that the exit facet of fly's eye optical system 109 projects via opening diaphragm 110 by the 3rd optical system 150
Lead field stop 111.The diaphragm 110 that is open determines incident angle distribution shape (effective light of illuminated surface according to opening shape
Source).The position that 3rd optical system 150 is configured to field stop 111 essentially becomes Fourier's change relative to opening diaphragm 110
Change face.Secondary souce distribution is formed in the outgoing surface side of fly's eye optical system 109, so becoming in field stop 111 equal
Even light intensity distributions.
Fig. 3 exemplifies the shape of field stop 111.Field stop 111 interdicts the light other than the transmissive portions 23 of circular shape.
Master M is equably illuminated via the 4th optical system 160 to be shaped to the light of circular shape by field stop 111.
The shape of the opening portion of field stop 111 is not limited to circular shape or other shapes.Field stop 111 is opened
Oral area can also for example have the rectangular shape being inscribed with circular shape.4th optical system 160 is reflection and refraction optical system.
It is illustrated hereinafter, the 4th optical system 160 is set as reflection and refraction optical system 160.
Hereinafter, with reference to Fig. 4 A, Fig. 5 A, Fig. 6 A, Fig. 7 A, Fig. 8 A, Fig. 9 A, illustrate the illustrative embodiment of the present invention
Reflection and refraction optical system 160.Reflection and refraction optical system 160 is telecentric beam path in object plane OBJ and image planes IMG.Reflection folding
The 1st speculum (the 1st reflecting surface) M1, the 2nd speculum (the 2nd reflecting surface) M2, the 3rd speculum can be included by penetrating optical system 160
(the 3rd reflecting surface) M3 and the 4th speculum (the 4th reflecting surface) M4.In addition, reflection and refraction optical system 160 can include configuration
The plane of refraction with positive refractive power between object plane OBJ and the 1st speculum M1.The plane of refraction can be made of lens L1.
From object plane OBJ come out light successively via the plane of refraction, the 1st speculum M1, the plane of refraction, the 2nd speculum M2, the plane of refraction,
3rd speculum M3, the 4th speculum M4 reach image planes IMG.
The plane of refraction can be both made of 1 lens L1, can also be made of at least two lens.In the latter, until
Few two respective faces of lens can form the mutually different region in the plane of refraction.Lens L1 is reflected there are two can having
Face.The plane of refraction can have aspherical shape.The plane of refraction can be configured to by 3 times hereby valve item be set as P (L1),
When by whole 3 times of the reflection and refraction optical system, hereby valve is with P (sum) is set as, meet | P (sum) |<|P(L1)|.
At least one speculum energy in 1st speculum M1, the 2nd speculum M2, the 3rd speculum M3 and the 4th speculum M4
Enough there is aspherical shape.
Reflection and refraction optical system 160 can be configured to do not have imaging surface between object plane OBJ and image planes IMG.Change speech
It, reflection and refraction optical system 160 can only have the optical system of 1 imaging of imaging surface in image planes IMG.
Reflection and refraction optical system 160 can be configured to the overall length of reflection and refraction optical system 160 being set as TT, by object
Face OBJ with and the distance in the immediate refractive power faces of object plane OBJ be set as S1 when, meet S1/TT>0.1.Reflection and refraction optical system
160 can be configured to will be set as S1 from distances of the object plane OBJ until with the immediate refractive power faces of object plane OBJ, will be from most
When distance until whole refractive power face to image planes IMG is set as Sk, meet Sk/S1<3.0.
Reflection and refraction optical system 160 can be configured to the direction of travel from the object plane OBJ light projected with being incident on image planes
The direction of travel of the light of IMG is identical.Reflection and refraction optical system 160 can be configured to the pupil of reflection and refraction optical system 160
Position is between the 1st speculum M1 and the 2nd speculum M2.Reflection and refraction optical system 160 can near object plane OBJ with
And near image planes IMG at least one party include for the non-spherical lens that corrects telecentricity.
Hereinafter, illustrate the design example of reflection and refraction optical system 160.
(design example 1)
Table 1A shows the optical specification of design example 1.
【Table 1A】
The wavelength of light is 365nm~435nm, and NAil is the numerical aperture at the image planes IMG of reflection and refraction optical system 160
Diameter is 0.09 in example 1 is designed.Exposed width, slit width, circular arc R are provided at the image planes IMG of the 4th optical system 160
The parameter of the shape of illumination light, shows in fig. 4d.Multiplying power is the imaging multiplying power of reflection and refraction optical system 160.
Table 1B shows the structure of the reflection and refraction optical system 160 of design example 1.
【Table 1B】
| It numbers in face | r | d | n | |
| OBJ | 199.67207 | 1 | ||
| 1 | -108472.270 | 57.5 | SiO2 | |
| 2 | -917.221 | 410 | 1 | |
| 3 | -901.547 | -410 | -1 | |
| 4 | -917.221 | -57.5 | SiO2 | |
| 5 | -108472.270 | -58.95021 | 1 | |
| 6 | -1088.406 | 58.95021 | -1 | |
| 7 | -108472.270 | 57.5 | SiO2 | |
| 8 | -917.221 | 154.88871 | 1 | |
| 9 | 1897.102 | -220.41599 | -1 | |
| 10 | 1089.102 | 660.52728 | -1 | |
| 11 | ∞ | 15 | SiO2 | |
| IMG |
R (mm) is the radius of curvature in face, and d (mm) is face interval, and n is glass material.Wherein, the refractive index of air is set as
1, the face for becoming -1 represents reflecting surface.SiO2Represent synthetic quartz.In addition, the center of curvature in each face is located on optical axis.
Fig. 4 A show the sectional view of the reflection and refraction optical system 160 of design example 1.Here, reflection and refraction optical system
160 object plane OBJ has circular shape, and Fig. 4 A show the light come out from the center of circular shape and the light come out from end.
Fig. 4 A show the section at the center via circular shape.Thus, in Figure 4 A, it appears that come out from the end of circular shape
Light is irradiated less than reflecting surface, but the light is irradiated to reflecting surface at the section deviated from Fig. 4 A.This point is in Fig. 5 A, Fig. 6 A, figure
It is also the same in 7A, Fig. 8 A, Fig. 9 A.
In Figure 4 A, OBJ represents object plane, and IMG represents image planes.L1 is the lens with positive refractive power, and there are two roll over for tool
Penetrate face.The total of the refractive power of two planes of refraction has positive refractive power.Thus, at least one plane of refraction has positive dioptric
Power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is the 2nd speculum (the 2nd reflecting surface), and M3 is (the 3rd reflection of the 3rd speculum
Face), M4 is the 4th speculum (the 4th reflecting surface).M1 and M4 be the speculum (reflecting surface) with positive refractive power, M2 and
M3 is the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (face number 10) and be imaged on
IMG.The pupil of reflection and refraction optical system 160 can also have opening diaphragm between M1 and L1 in pupil location.
Fig. 4 B show the expanded view of the reflection and refraction optical system 160 of design example 1.Reflected refraction is defined as shown in Figure 4 B
The overall length TT and S1, Sk of optical system 160.Expanded view is the whole refractive power for making reflection and refraction optical system 160
Understandable reference chart is configured, practical reflection and refraction optical system 160 has speculum.In figure 4b, speculum with
Its equivalent slim lens represents.This point is also the same in Fig. 5 B, Fig. 6 B, Fig. 7 B, Fig. 8 B, Fig. 9 B.
Fig. 4 C show 3 times of L1, M1, M2, M3, M4 hereby whole 3 of valve item and reflection and refraction optical system 160
Secondary hereby valve and (SUM).Here, hereby valve item is by the refractive power divided by refraction of lens L1 and speculum M1, M2, M3, M4
Value obtained from rate.The hereby summation of valve and (SUM) is L1, M1, M2, M3, M4 3 hereby valve items.
Table 1C shows overall length TT, S1, Sk of the reflection and refraction optical system 160 of design example 1.
【Table 1C】
The overall length TT of reflection and refraction optical system 160 is from the object plane OBJ of reflection and refraction optical system 160 to image planes IMG
Until multiple faces interval simple summation.That is, overall length TT is the absolute value of the d of table 1B have been carried out accumulative and obtained
The value arrived.S1 is from object plane OBJ to the 1st refractive power face (refractive power face immediate with object plane OBJ, the face that i.e. face number is 1)
Until distance, Sk is from final refractive power face (face that it is 10 that refractive power face immediate with image planes IMG, i.e. face, which are numbered) to picture
Distance until the IMG of face.
S1/TT for S1 relative to the ratio of TT, if the value is big, such as multiple field stops can be made to be configured at object plane
Near OBJ, the degree of freedom of design increases.Sk/S1 is ratios of the Sk relative to S1, in reflection and refraction optical system 160 to put
In the case of big system, it may be said that be the smaller then compact optical system of the value.
Table 1D shows the optical property of the reflection and refraction optical system 160 of design example 1.
【Table 1D】
P (sum) represents the hereby valve and (SUM) of reflection and refraction optical system 160, and P (L1) represents the hereby valve item of L1.Separately
Outside, luminous point RMS represents the worst-case value of the RMS spot diameters in effective coverage, and dist represents distortion, and telecentricity (range) represents
The deviation of the telecentricity in slit width direction.
As designing example 1, from 3 transmission lens L1 of the light beams of object plane OBJ out.If light beam the 1st time penetrates lens
The 2nd region through lens L1 in the region of L1 and light beam be not be overlapped, then is not necessarily required to use identical lens L1.But
In the case of the separation in region that small situation of big NA of image planes IMG situation, enlargement ratio etc. is difficult to light beam transmission, need
To use identical lens L1.
(design example 2)
Table 2A shows the optical specification of design example 2.
【Table 2A】
The wavelength of light is 365nm~435nm, NAil 0.09.Table 2B1, table 2B2 show the reflected refraction of design example 2
The structure of optical system 160.
【Table 2B1】
| It numbers in face | r | d | n | |
| 0BJ | 60 | 1 | ||
| 1 | ASP | -6697.3063 | 15 | SiO2 |
| 2 | ∞ | 114.50143 | 1 | |
| 3 | ∞ | 37.5 | SiO2 | |
| 4 | -1055.6256 | 410 | 1 | |
| 5 | -825.90428 | -410 | -1 | |
| 6 | -1055.6256 | -57.5 | SiO2 | |
| 7 | ∞ | -38.3257 | 1 | |
| 8 | -938.14879 | 38.3257 | -1 | |
| 9 | ∞ | 57.5 | SiO2 | |
| 10 | -1055.6256 | 154.88871 | 1 | |
| 11 | 1962.84981 | -225.25576 | -1 | |
| 12 | 1020.23538 | 660.36706 | -1 | |
| 13 | ∞ | 20 | SiO2 | |
| IMG |
【Table 2B2】
The ASP of face number 1 represents aspherical, about its shape, using the numerical value recorded in table 2B2, the quilt as formula (1)
It is expressed as the function of h.In formula (1), h is the distance away from optical axis, and Z is the position of optical axis direction.
【Number 1】
Fig. 5 A show the sectional view of the reflection and refraction optical system 160 of design example 2.OBJ represents object plane, and IMG represents picture
Face.L2 is the non-spherical lens with negative refractive power.L1 is the lens for having positive refractive power, and there are two planes of refraction for tool.It should
The total of the refractive power of two planes of refraction has positive refractive power.Thus, at least one plane of refraction has positive refractive power.M1 is
1st speculum (the 1st reflecting surface), M2 are the 2nd speculum (the 2nd reflecting surface),
M3 is the 3rd speculum (the 3rd reflecting surface), and M4 is the 4th speculum (the 4th reflecting surface).M1 and M4 is with positive
The speculum (reflecting surface) of refractive power, M2 and M3 are the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L2 (face number 1,2), L1
3rd, 4), M1 (face number 5), L1 (face number 6,7), M2 (face number 8), L1 (face number 9,10), M3 (face number 11), M4 (faces
Number 12).IMG is imaged on after the light beam.The pupil of reflection and refraction optical system 160 can also between M1 and L1,
Pupil location has opening diaphragm.
Fig. 5 B show the expanded view of the reflection and refraction optical system 160 of design example 2.Fig. 5 C show L1, L2, M1, M2,
Whole 3 times hereby valve and (SUM) of 3 times of M3, M4 hereby valve item and reflection and refraction optical system 160.
Table 2C shows overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of design example 2.
【Table 2C】
Table 2D shows the optical property of the reflection and refraction optical system 160 of design example 2.
【Table 2D】
The reflection and refraction optical system 160 of example 2 is designed compared to the reflection and refraction optical system 160 of design example 1, telecentricity
(range) value is small.This is because correct telecentricity (range) using the non-spherical lens L2 with negative refractive power.
In example 2 is designed, non-spherical lens L2 is configured near object plane OBJ, but non-spherical lens L2 can be configured at
Near image planes IMG.That is, non-spherical lens can be configured near object plane OBJ and near image planes IMG at least one
Side.Wherein, in the case of for amplification system, the effective diameter of the optical element near image planes IMG becomes larger, if so can
Preferred disposition is near object plane OBJ if energy.
(design example 3)
Table 3A shows the optical specification of design example 3.
【Table 3A】
The wavelength of light is 335nm~405nm, NAil 0.126.Table 3B1, table 3B2 show the reflected refraction of design example 3
The structure of optical system 160.
【Table 3B1】
| Face | typ | R | D | n |
| 0BJ | 174.29342 | 1 | ||
| 1 | ∞ | 33.33 | SiO2 | |
| 2 | ASP | -600.57706 | 200.96483 | 1 |
| 3 | -476.56344 | -200.96483 | -1 | |
| 4 | ASP | -600.57706 | -33.33 | SiO2 |
| 5 | ∞ | -3.333 | 1 | |
| 6 | -407.6975 | 3.333 | -1 | |
| 7 | ∞ | 33.33 | SiO2 | |
| 8 | ASP | -600.57706 | 126.22469 | 1 |
| 9 | ∞ | -173.064 | -1 | |
| 10 | 758.10285 | 355.5011 | -1 | |
| 11 | ∞ | 15 | SiO2 | |
| IMG |
【Table 3B2】
| It numbers in face | k | o | b | c | d | e | f | g |
| 2 | 0 | 4.67655E-09 | 3.68927E-14 | 1.01627E-19 | -3.70155E-24 | 0 | 0 | 0 |
| 4 | 0 | 4.67655E-09 | 3.68927E-14 | 1.01627E-19 | -3.70155E-24 | 0 | 0 | 0 |
| 8 | 0 | 4.67655E-09 | 3.68927E-14 | 1.01627E-19 | -3.70155E-24 | 0 | 0 | 0 |
The ASP of face number 2,4,8 represents aspherical, and shape is defined by previously described formula (1).Fig. 6 A show design example 3
The sectional view of reflection and refraction optical system 160.OBJ represents object plane, and IMG represents image planes.L1 is the lens for having positive refractive power,
There are two planes of refraction for tool.The total of the refractive power of two planes of refraction has positive refractive power.Thus, at least one refraction mask
There is positive refractive power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is the 2nd speculum (the 2nd reflecting surface), and M3 is the 3rd speculum
(the 3rd reflecting surface), M4 are the 4th speculum (the 4th reflecting surface).M1 and M4 is the speculum (reflection with positive refractive power
Face), M2 is the speculum (reflecting surface) with negative refractive power, and M3 is plane mirror.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (face number 10) and be imaged on
IMG.The pupil of reflection and refraction optical system 160 can also be located near M2, have opening diaphragm in pupil location.
Fig. 6 B show the expanded view of the reflection and refraction optical system 160 of design example 3.Fig. 6 C show L1, M1, M2, M3,
Whole 3 times hereby valve and (SUM) of 3 times of M4 hereby valve item and reflection and refraction optical system 160.
Table 3C shows overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of design example 3.
【Table 3C】
Table 3D shows the optical property of the reflection and refraction optical system 160 of design example 3.
【Table 3D】
Design reflection and refraction optical system 160, S1/ of the reflection and refraction optical system 160 compared to design example 1,2 of example 3
The value of TT is big.Correct the aberration and telecentricity of optical system well using non-spherical lens L2, thus, it is possible to carry out such as
S1 is made to become larger such refractive power configuration.
(design example 4)
Table 4A shows the optical specification of design example 4.
【Table 4A】
The wavelength of light is 365nm~435nm, NAil 0.09.Table 4B1, table 4B2 show the reflected refraction of design example 4
The structure of optical system 160.
【Table 481】
| Face | typ | R | D | n |
| OBJ | 155 | 1 | ||
| 1 | 2000 | 50 | SiO2 | |
| 2 | ASP | -1553.89283 | 205.3 | 1 |
| 3 | -587.50766 | -205.3 | -1 | |
| 4 | ASP | -1553.89283 | -50 | SiO2 |
| 5 | 2000 | -5 | 1 | |
| 6 | -560.57916 | 5 | -1 | |
| 7 | 2000 | 50 | SiO2 | |
| 8 | ASP | -1553.89283 | 200.4 | 1 |
| 9 | ASP | -2098.19187 | -400.3 | -1 |
| 10 | 1477.03615 | 774.4 | -1 | |
| 11 | ∞ | 20 | SiO2 | |
| IMG |
【Table 4B2】
| Face | k | a | b | c | d | e | f | g |
| 2 | 0 | 1.75744E-09 | 1.20660E-14 | -1.89024E-22 | -3.30179E-27 | -7.25895E-32 | 0 | 0 |
| 4 | 0 | 1.75744E-09 | 1.20660E-14 | -1.89024E-22 | -3.30179E-27 | -7.25895E-32 | 0 | 0 |
| 8 | 0 | 1.75744E-09 | 1.20660E-14 | -1.89024E-22 | -3.30179E-27 | -7.25895E-32 | 0 | 0 |
| 9 | 0 | 4.30333E-10 | -4.78650E-16 | -2.96640E-23 | 1.54127E-29 | 0 | 0 | 0 |
The ASP of face number 2,4,8,9 represents aspherical, and shape is defined by previously described formula (1).Fig. 7 A show design example 4
Reflection and refraction optical system 160 sectional view.OBJ represents object plane, and IMG represents image planes.L1 is have positive refractive power saturating
Mirror, there are two planes of refraction for tool.The total of the refractive power of two planes of refraction has positive refractive power.Thus, at least one plane of refraction
With positive refractive power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is the 2nd speculum (the 2nd reflecting surface), and M3 is the 3rd reflection
Mirror (the 3rd reflecting surface), M4 are the 4th speculum (the 4th reflecting surface).M1, M3 and M4 are that the speculum with positive refractive power is (anti-
Penetrate face), M2 is the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (face number 10).Then, the light
IMG is imaged on after beam.The pupil of reflection and refraction optical system 160 can also be located near L1, have in pupil location and open
Mouth diaphragm.
Fig. 7 B show the expanded view of the reflection and refraction optical system 160 of design example 4.Fig. 7 C show L1, M1, M2, M3,
Whole 3 times hereby valve and (SUM) of 3 times of M4 hereby valve item and reflection and refraction optical system 160.Table 4C, which is shown, to be set
Count overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of example 4.
【Table 4C】
Table 4D shows the optical property of the reflection and refraction optical system 160 of design example 4.
【Table 4D】
The reflection and refraction optical system 160 of example 4 is designed compared to the reflection and refraction optical system 160 of design example 1, overall length TT
It is short.Using non-spherical lens L1 and non-spherical reflector M3 correct well the aberration of reflection and refraction optical system 160 with
And telecentricity, thus, it is possible to integrally realize compact refractive power configuration.
(design example 5)
Table 5A shows the optical specification of design example 5.
【Table 5A】
The wavelength of light is 335nm~405nm, NAil 0.108.Table 5B1, table 5B2 show the reflected refraction of design example 5
The structure of optical system 160.
【Table 5B1】
| Face | typ | R | D | n |
| OBJ | 183.6 | 1 | ||
| 1 | ∞ | 50 | SiO2 | |
| 2 | ASP | -739.70823 | 207.7 | 1 |
| 3 | -544.37166 | -207.7 | -1 | |
| 4 | ASP | -739.70823 | -50 | SiO2 |
| 5 | ∞ | -5 | 1 | |
| 6 | -667.34739 | 5 | -1 | |
| 7 | ∞ | 50 | SiO2 | |
| 8 | ASP | -739.70823 | 176.6 | 1 |
| 9 | ASP | 2476.59779 | -192.3 | -1 |
| 10 | 853.05678 | 417.9 | -1 | |
| 11 | ∞ | 20 | SiO2 | |
| IMG |
【Table 5B2】
| Face | k | a | b | c | d | e | f | g |
| 2 | 0 | -2.23404E-10 | 8.90172E-14 | -7.13365E-19 | -3.39191E-24 | 1.16141E-28 | 8.93782E-34 | -1.59573E-38 |
| 4 | 0 | -2.23404E-10 | 8.90172E-14 | -7.13365E-19 | -3.39191E-24 | 1.16141E-28 | 8.93782E-34 | -1.59573E-38 |
| 8 | 0 | -2.23404E-10 | 8.90172E-14 | -7.13365E-19 | -3.39191E-24 | 1.16141E-28 | 8.93782E-34 | -1.59573E-38 |
| 9 | 0 | -6.37287E-10 | 6.31814E-15 | 6.71838E-20 | -1.22096E-24 | 3.45242E-30 | 2.35166E-35 | -1.15500E-40 |
The ASP of face number 2,4,8,9 represents aspherical, and shape is defined by previously described formula (1).Fig. 8 A show design example 5
Reflection and refraction optical system 160 sectional view.Represent the sectional view of optical system.OBJ represents object plane, and IMG represents image planes.L1
It is the lens with positive refractive power, there are two planes of refraction for tool.The total of the refractive power of two planes of refraction has positive dioptric
Power.Thus, at least one plane of refraction has positive refractive power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is the 2nd speculum (the
2 reflectings surface), M3 is the 3rd speculum (the 3rd reflecting surface), and M4 is the 4th speculum (the 4th reflecting surface).M1 and M4 is with positive
The speculum (reflecting surface) of refractive power, M2 and M3 are the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (face number 10) and be imaged on
IMG.The pupil of reflection and refraction optical system 160 can also be located near L1, have opening diaphragm in pupil location.
Fig. 8 B show the expanded view of the reflection and refraction optical system 160 of design example 5.Fig. 8 C show L1, M1, M2, M3,
Whole 3 times hereby valve and (SUM) of 3 times of M4 hereby valve item and reflection and refraction optical system 160.Fig. 8 B show design
The expanded view of the reflection and refraction optical system 160 of example 5.Fig. 8 C show 3 times of L1, M1, M2, M3, M4 hereby valve items and anti-
Penetrate whole 3 times of dioptric system 160 hereby valve and (SUM).
Table 5C shows overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of design example 5.
【Table 5C】
Table 5D shows the optical property of the reflection and refraction optical system 160 of design example 5.
【Table 5D】
Design reflection and refraction optical system 160, Sk/S1 of the reflection and refraction optical system 160 compared to design example 4 of example 5
Value it is small.This is because compared to design example 4, the value of NAil is big, so in order to make light reflect in M3 and from M4 towards image planes
The light separation of IMG, makes M4 be moved to image planes IMG sides.
(design example 6)
Table 6A shows the optical specification of design example 6.
【Table 6A】
Light wave a length of 335nm~405nm, NAil 0.126.Table 6B1, table 6B2 show the reflected refraction light of design example 6
The structure of system 160.
【Table 6B1】
| Face | typ | R | D | n |
| OBJ | 115.19739 | 1 | ||
| 1 | ∞ | 33.33 | SiO2 | |
| 2 | ASP | -490.17339 | 137.52353 | 1 |
| 3 | -353.51049 | -137.52353 | -1 | |
| 4 | ASP | -490.17339 | -33.33 | SiO2 |
| 5 | ∞ | -3.333 | 1 | |
| 6 | -425.28929 | 3.333 | -1 | |
| 7 | ∞ | 33.33 | SiO2 | |
| 8 | ASP | -490.17339 | 125.87854 | 1 |
| 9 | ASP | ∞ | -141.2866 | -1 |
| 10 | 671.25491 | 240.66053 | -1 | |
| 11 | ∞ | 15 | SiO2 | |
| IMG |
【Table 6B2】
| Face | k | a | b | c | d | e | f | g |
| 2 | 0 | 9.82544E-10 | 4.44382E-13 | -1.29665E-17 | 2.29940E-22 | 9.09303E-27 | -3.35412E-32 | -4.50930E-36 |
| 4 | 0 | 9.82544E-10 | 4.44382E-13 | -1.29665E-17 | 2.29940E-22 | 9.09303E-27 | -3.35412E-32 | -4.50930E-36 |
| 8 | 0 | 9.82544E-10 | 4.44382E-13 | -1.29665E-17 | 2.29940E-22 | 9.09303E-27 | -3.35412E-32 | -4.50930E-36 |
| 9 | 0 | -2.18722E-09 | 4.17035E-14 | 1.37265E-18 | -3.91572E-23 | 1.21585E-28 | 4.34299E-33 | -3.46322E-38 |
The ASP of face number 2,4,8,9 represents aspherical, and shape is defined by previously described formula (1).Fig. 9 A show design example 6
Reflection and refraction optical system 160 sectional view.OBJ represents object plane, and IMG represents image planes.L1 is have positive refractive power saturating
Mirror, there are two planes of refraction for tool.The total of the refractive power of two planes of refraction has positive refractive power.Thus, at least one plane of refraction
With positive refractive power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is the 2nd speculum (the 2nd reflecting surface), and M3 is the 3rd reflection
Mirror (the 3rd reflecting surface), M4 are the 4th speculum (the 4th reflecting surface).M1 and M4 is the speculum (reflection with positive refractive power
Face), M2 and M3 are the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (face number 10) and be imaged on
IMG.The pupil of reflection and refraction optical system 160 can also be located near L1, have opening diaphragm in pupil location.
Fig. 9 B show the expanded view of the reflection and refraction optical system 160 of design example 6.Fig. 9 C show L1, M1, M2, M3,
Whole 3 times hereby valve and (SUM) of 3 times of M4 hereby valve item and reflection and refraction optical system 160.
Table 6C shows overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of design example 6.
【Table 6C】
Table 6D shows the optical property of the reflection and refraction optical system 160 of design example 6.
【Table 6D】
Design reflection and refraction optical system 160, Sk/S1 of the reflection and refraction optical system 160 compared to design example 4 of example 6
Value it is small.This is because compared to design example 4, the value of NAil is big, so in order to make light reflect in M3 and from M4 towards image planes
The light separation of IMG, makes M4 be located at more by the position near image planes.
(exposure device)
Figure 10 shows the structure of the exposure device 400 of 1 embodiment of the present invention.Exposure device 400 includes illumination
Optical system 100 is scanned substrate exposure using the slit light from lamp optical system 100.Lamp optical system 100
Has the slit mechanism 181 for the shape that can adjust opening portion.
Exposure device 400, which has, to be kept the master mounting table 300 of master, keeps the substrate-placing platform 302 of substrate and incite somebody to action
The pattern of master projects to the projection optical system 301 of substrate.Projection optical system 301 is, for example, in the light from object plane to image planes
The projection optical system that the 1st recessed reflecting surface 71, convex reflecting surface 72, the 2nd recessed reflecting surface 73 form is arranged in sequence in road.
Exposure device 400 also is able to have measurement portion 304, which reaches substrate-placing platform 302 by measurement
The Illumination Distribution of light measures the uneven illumination in the exposure area of substrate.In addition, slit plate 303 be located at substrate-placing platform 302 with
Between measurement portion 304.Slit plate 303 can schemed under the control of control unit (not shown) using driving portion (not shown)
Turntable driving is carried out on the exposed width direction of 4D.
As shown in Figure 10, measurement portion 304 can include sensor 305 and for the light for having passed through slit plate 303 to be drawn
Lead the optical system of sensor 305.The action of measurement portion 304 approximately as.
As shown in figure 11, for the region 401 for the light for imaging in substrate-placing platform 302, make slit plate 303 in the X direction
It is scanned.At this point, the light of the opening portion 306 for imaging in slit plate 303 in only imaging in the light in region 401 is incident on measurement
In portion 304.The light being incident in measurement portion 304 is directed to sensor 305 via optical system.Made in the X direction by one side
Slit plate 303 is scanned the energy for reading the light for reaching sensor 305 on one side, the photograph of each position in measured zone 401
Degree.Thus, it is possible to calculate uneven illumination.
As described above, the opening width by adjusting slit mechanism 181 possessed by lamp optical system 100, can drop
Low-light (level) is uneven.For example, it is set as measuring uneven illumination as illustrated in fig. 12 by measurement portion 304.In this case, partly
Expand the width of the slit mechanism 181 for the part that illumination declines, and the partly slit mechanism 181 for the part that constriction illumination rises
Width, so as to which Illumination Distribution is made to become uniform as Figure 12 B.
The article manufacturing method of 1 embodiment of the present invention can expose substrate including the use of exposure device 400
The exposure process of light and the developing procedure that the substrate is made to develop.The substrate being exposed in exposure process has on surface
There is photoresist, in exposure process, the sub-image of the pattern of master can be made to be formed in the photoresist.In developing procedure
In, the image development can be made and form Resist patterns.After developing procedure, such as can be via the Resist patterns to base
Plate is etched or injects ion to substrate.The article that can be formed so for example can include display device (display panel),
Semiconductor device (semiconductor chip) etc..(design example 7)
Table 7A shows the optical specification of design example 7.
【Table 7A】
Light wave a length of 335nm~405nm, NAil 0.09.Table 7B shows the reflection and refraction optical system of design example 7
160 structure.
【Table 7B】
| It numbers in face | r | d | n | |
| OBJ | 175.4332 | 1 | ||
| 1 | -2210.615 | 57.5 | SiO2 | |
| 2 | -649.807 | 430.97578 | 1 | |
| 3 | -887.577 | -410.22676 | -1 | |
| 4 | -887.157 | -57.5 | SiO2 | |
| 5 | -23480.432 | -57.18638 | 1 | |
| 6 | -1138.936 | 57.18638 | -1 | |
| 7 | -23480.432 | 57.5 | SiO2 | |
| 8 | -887.157 | 152.91037 | 1 | |
| 9 | 1937.089 | -212.4938 | -1 | |
| 10 | 1103.352 | 606.7433 | -1 | |
| 11 | ∞ | 15 | SiO2 | |
| IMG |
Figure 13 A show the sectional view of the reflection and refraction optical system 160 of design example 7.OBJ represents object plane, and IMG represents picture
Face.L1, L2 are the lens for having positive refractive power respectively, and there are two planes of refraction for tool.The refractive power of two planes of refraction adds up to
With positive refractive power.Thus, at least one plane of refraction has positive refractive power.M1 is the 1st speculum (the 1st reflecting surface), and M2 is
2nd speculum (the 2nd reflecting surface), M3 are the 3rd speculum (the 3rd reflecting surface), and M4 is the 4th speculum (the 4th reflecting surface).M1 and
M4 is the speculum (reflecting surface) with positive refractive power, and M2 and M3 are the speculum (reflecting surface) with negative refractive power.
The light beam come out from object plane OBJ with scheduled NA (is numbered in face from OBJ sequentially through L1 (face number 1,2), M1
3), L2 (face number 4,5), M2 (face number 6), L2 (face number 7,8), M3 (face number 9), M4 (face number 10) and be imaged on
IMG.The pupil of reflection and refraction optical system 160 can also be located near L2, have opening diaphragm in pupil location.
Figure 13 B show the expanded view of the reflection and refraction optical system 160 of design example 6.Figure 13 C show L1, L2, M1,
Whole 3 times hereby valve and (SUM) of 3 times of M2, M3, M4 hereby valve item and reflection and refraction optical system 160.
L1, the L2 for designing example 7 are an examples, as long as being the lens with positive refractive power respectively, are not limited to
Current example.
Table 7C shows overall length TT, S1, Sk, S1/TT, Sk/S1 of the reflection and refraction optical system 160 of design example 7.
【Table 7C】
Table 7D shows the optical property of the reflection and refraction optical system 160 of design example 7.
【Table 7D】
L1, the L2 for designing example 7 are an examples, as long as being the lens with positive refractive power respectively, are not limited to
Current example.
(antireflection film 1)
Illustrate the antireflection film of lens L1 formed in the reflection and refraction optical system 160 of design example 4.
As Fig. 7 A, from object plane OBJ with scheduled NA come out light beam from OBJ sequentially through L1 (face number 1,
2), M1 (face number 3), L1 (face number 4,5), M2 (face number 6), L1 (face number 7,8), M3 (face number 9), M4 (are numbered in face
10).Then, it is imaged on IMG after the light beam.
Figure 14 A are figures obtained from the R1 faces (the close face with OBJ sides) of the lens L1 from OBJ sides.Figure 14 A's is empty
The region 500 that line surrounds be from the OBJ light beams come out be initially incident on the R1 faces of L1 when effective coverage, be equivalent to table 4B1's
Face 1.Face incident angle by the light in region 500 is 5 °~20 °.In addition, the region 501 surrounded by chain-dotted line of Figure 14 A is
Effective coverage during the R1 faces for being incident on L1 the 2nd time is equivalent to the face 5 of table 4B1.Pass through the face incident angle of the light in region 501
It is 35 °~50 °.When the region 502 surrounded by double dot dash line recorded in Figure 14 A is the R1 faces that the 3rd time is incident on lens L1
Effective coverage.It is equivalent to the face 7 of table 4B1.Face incident angle by the light in region 502 is 35 °~50 °.Figure 14 B by solid line
The region 503 of encirclement is the region for including region 500,501 and 502.Can the optics as table 8A be set in region 503
Film designs the optical film of example 1.
【Table 8A】
| Material name | Film thickness no [nm] | |
| Top layer | air | 0 |
| 3 | MgF2 | 108.88 |
| 2 | ZrO2 | 196.70 |
| 1 | Al2O5 | 95.88 |
| Substrate layer | SiO2 | 0 |
Optical film design example 1 is the antireflection film for the 3-tier architecture for having used dielectric substance.In the SiO as substrate layer2
On stack gradually Al2O5, ZrO2, MgF2Thin layer.The film thickness of each layer is set as value recorded in table.Wherein, with film type
The product nd of the thickness d physically of corresponding refractive index n and film is represented.
Figure 15 A show the reflectivity Characteristics of optical film design example 1.With wavelength for 350nm~450nm, incident angle
The characteristic that reflectivity is less than 2% when being 5 °~20 ° and 35 °~50 °.
(antireflection film 2)
The optical film of optical film design example 2 as shown in table 8B can also be set in region 503.
【Table 8B】
| Material name | Film thickness no [nm] | |
| Top layer | air | 0 |
| 7 | MgF2 | 110.33 |
| 6 | ZrO2 | 227.18 |
| 5 | Al2O5 | 57.07 |
| 4 | ZrO2 | 69.35 |
| 3 | Al2O5 | 25.01 |
| 2 | ZrO2 | 295.33 |
| 1 | Al2O5 | 107.36 |
| Substrate layer | SiO2 | 0 |
Optical film design example 2 is the antireflection film for 7 layers of structure for having used dielectric substance.Figure 15 B show that optical film is set
Count the reflectivity Characteristics of example 2.Be 350nm~450nm in wavelength, incident angle is 5 °~20 ° and 35 °~50 ° when it is anti-
Penetrate the characteristic that rate is less than 1%.Optical film designs the effect of the number of plies of the example 2 due to increasing film, is set with the optical film of 3 layers of construction
Meter example 1 is compared, it is suppressed that reflectivity.
(antireflection film 3 and 4)
The region 505 surrounded by solid line recorded in Figure 14 C is the region for including region 500.In addition, Figure 14 C by reality
The region 506 that line surrounds is the region for including region 501 and region 502.The optics as table 8C1 is installed to region 505
Film designs example 3, and example 4 is designed to the installation optical film as table 8C2 of region 505.
【Table 8C1】
| Material name | Film thickness no [nm] | |
| Top layer | air | 0 |
| 3 | MgF2 | 95.30 |
| 2 | ZrO2 | 169.68 |
| 1 | Al2O5 | 66.95 |
| Substrate layer | SiO2 | 0 |
【Table 8C2】
| Material name | Film thickness no [nm] | |
| Top layer | air | 0 |
| 3 | MgF2 | 112.47 |
| 2 | ZrO2 | 178.57 |
| 1 | Al2O5 | 73.94 |
| Substrate layer | SiO2 | 0 |
Optical film design example 3,4 is the antireflection film for the 3-tier architecture for having used dielectric substance respectively.Figure 15 C1 show light
The reflectivity Characteristics of film design example 3 are learned, Figure 15 C2 show the reflectivity Characteristics of optical film design example 4.
Optical film design example 3 have wavelength be 350nm~450nm, incident angle 5°~20°When reflectivity for 1% with
Under characteristic.In addition, optical film design example 4 have wavelength be 350nm~450nm, incident angle 35°~50°When reflectivity
For less than 1% characteristic.
In this way, type optical film different due to the difference of region is installed to the R1 faces of lens L1.Antireflection film 1~4 is one
A example, material, the number of plies, the film thickness of film etc. is not limited to the example.
About the antireflection film recorded in this specification, luminous point is irradiated to the R1 faces of lens L1 and is illustrated, but is anti-
Reflectance coating should be applied in the plane of incidence or exit facet of optical element.Thus, in the case where there is multiple optical elements,
Preferably make the structure optimization of film in a manner of meeting desired optical characteristics in each face.In addition, about optical reflection portion
Part, be preferably configured reflectance coating (as under desired wavelength reflectivity increase film) rather than form antireflection film.
Claims (17)
1. a kind of reflection and refraction optical system is in the reflection and refraction optical system of object plane and image planes as telecentric beam path, institute
Reflection and refraction optical system is stated to be characterised by comprising：
1st reflecting surface, the 2nd reflecting surface, the 3rd reflecting surface and the 4th reflecting surface；And
Plane of refraction with positive refractive power, the plane of refraction are configured between the object plane and the 1st reflecting surface,
The light come out from the object plane is successively via the plane of refraction, the 1st reflecting surface, the plane of refraction, the 2nd reflection
Face, the plane of refraction, the 3rd reflecting surface, the 4th reflecting surface reach the image planes.
2. reflection and refraction optical system according to claim 1, which is characterized in that
The plane of refraction is made of 1 lens.
3. reflection and refraction optical system according to claim 1, which is characterized in that
The plane of refraction is made of at least two lens.
4. reflection and refraction optical system according to claim 1, which is characterized in that
Two planes of refraction including the plane of refraction are configured between the object plane and the 1st reflecting surface.
5. reflection and refraction optical system according to claim 1, which is characterized in that
Do not have imaging surface between the object plane and the image planes.
6. reflection and refraction optical system according to claim 1, which is characterized in that
Plane of refraction with the positive refractive power is with aspherical shape.
7. reflection and refraction optical system according to claim 1, which is characterized in that
At least one reflection in 1st reflecting surface, the 2nd reflecting surface, the 3rd reflecting surface and the 4th reflecting surface
Face has aspherical shape.
8. reflection and refraction optical system according to claim 1, which is characterized in that
Plane of refraction with the positive refractive power by 3 times hereby valve item be set as P (L1), by the reflection and refraction optical system
The hereby valve and when being set as P (sum) of whole 3 times, meet
|P(sum)|<|P(L1)|。
9. reflection and refraction optical system according to claim 1, which is characterized in that
The overall length of the reflection and refraction optical system is being set as TT, by the object plane and with the immediate refractive power of the object plane
When the distance in face is set as S1, meet
S1/TT>0.1。
10. reflection and refraction optical system according to claim 1, which is characterized in that
Will be set as S1 from distance of the object plane until with the immediate refractive power face of the object plane, will be from final refractive power
When distance until face to the image planes is set as Sk, meet
Sk/S1<3.0。
11. reflection and refraction optical system according to claim 1, which is characterized in that
The direction of travel of light of the direction of travel of the light projected from the object plane with being incident on the image planes is identical.
12. reflection and refraction optical system according to claim 1, which is characterized in that
The pupil location of the reflection and refraction optical system is between the 1st reflecting surface and the 2nd reflecting surface.
13. reflection and refraction optical system according to claim 1, which is characterized in that
The reflection and refraction optical system near the object plane and near the image planes at least one party further include
Non-spherical lens, the non-spherical lens are used to correct telecentricity.
14. reflection and refraction optical system according to claim 1, which is characterized in that
It is formed in the type for the optical film of plane of refraction being configured between the object plane and the 1st reflecting surface and is formed in institute
It is mutually different to state the type of the optical film of plane of refraction being configured between the 2nd reflecting surface and the 3rd reflecting surface.
15. a kind of lamp optical system, which is characterized in that
With the reflection and refraction optical system described in any one in claim 1 to 14.
16. a kind of exposure device, which is characterized in that
With the reflection and refraction optical system described in any one in claim 1 to 14.
17. a kind of article manufacturing method, which is characterized in that including：
The process being exposed using the exposure device described in claim 16 to substrate；And
Make the process of the substrate development,
From the substrate manufacture article.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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| JP2017090239A JP6882053B2 (en) | 2016-12-05 | 2017-04-28 | Catadioptric optics, illumination optics, exposure equipment and article manufacturing methods |
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| CN1535392A (en) * | 2000-10-23 | 2004-10-06 | 株式会社尼康 | Catadioptric systema and exposure device having this system |
| US6873476B2 (en) * | 2000-01-14 | 2005-03-29 | Carl-Zeiss-Stiftung | Microlithographic reduction projection catadioptric objective |
| CN101523294A (en) * | 2006-08-14 | 2009-09-02 | 卡尔蔡司Smt股份公司 | Catadioptric projection objective with pupil mirror. projection exposure apparatus and method |
| CN102725673A (en) * | 2009-08-07 | 2012-10-10 | 卡尔蔡司Smt有限责任公司 | Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus |
| CN102819197A (en) * | 2007-10-26 | 2012-12-12 | 卡尔蔡司Smt有限责任公司 | Imaging optical system, projection exposure installation, micro-lithography, and producing method thereof |
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|---|---|---|---|---|
| US6873476B2 (en) * | 2000-01-14 | 2005-03-29 | Carl-Zeiss-Stiftung | Microlithographic reduction projection catadioptric objective |
| CN1535392A (en) * | 2000-10-23 | 2004-10-06 | 株式会社尼康 | Catadioptric systema and exposure device having this system |
| CN101523294A (en) * | 2006-08-14 | 2009-09-02 | 卡尔蔡司Smt股份公司 | Catadioptric projection objective with pupil mirror. projection exposure apparatus and method |
| CN102819197A (en) * | 2007-10-26 | 2012-12-12 | 卡尔蔡司Smt有限责任公司 | Imaging optical system, projection exposure installation, micro-lithography, and producing method thereof |
| CN102725673A (en) * | 2009-08-07 | 2012-10-10 | 卡尔蔡司Smt有限责任公司 | Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus |
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