CN108152358A - Plasma-mass spectrometry system and its method of work - Google Patents

Plasma-mass spectrometry system and its method of work Download PDF

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Publication number
CN108152358A
CN108152358A CN201711490627.XA CN201711490627A CN108152358A CN 108152358 A CN108152358 A CN 108152358A CN 201711490627 A CN201711490627 A CN 201711490627A CN 108152358 A CN108152358 A CN 108152358A
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CN
China
Prior art keywords
valve
ion
plasma
mass spectrometry
sampling cone
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CN201711490627.XA
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Chinese (zh)
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CN108152358B (en
Inventor
俞晓峰
韩双来
梁炎
徐岳
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Hangzhou Pu Yu Development In Science And Technology Co Ltd
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Hangzhou Pu Yu Development In Science And Technology Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/622Ion mobility spectrometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/64Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using wave or particle radiation to ionise a gas, e.g. in an ionisation chamber
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/04Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns

Abstract

The present invention provides a kind of Plasma Mass Spectrometry analysis system and its method of work, the Plasma Mass Spectrometry analysis system includes mass spectrometer, vacuum unit;Quarter bend, the outlet of the quarter bend is straight up;Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend;First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone;Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and the downstream in the first valve, after the ion deflecting unit, ion deflecting angle α;Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.The present invention has many advantages, such as that accuracy of detection is high.

Description

Plasma-mass spectrometry system and its method of work
Technical field
The present invention relates to mass spectral analyses, more particularly to plasma-mass spectrometry system and its method of work.
Background technology
When ICP-MS is analyzed, torch pipe is goed deep into plasma intercepting wherein all using horizontal positioned using sampling cone Ion enter mass spectrograph carry out quality analysis.Because plasma power is very high, need using water cooling sampling cone and The air cooling system plasma of big flow exhausting, sampling cone heat dissipation not only need the cooling gas (argon gas) of very big flow in this way Torch pipe is protected, in order to avoid burning torch pipe, in addition the air cooling system of big flow inevitably blows plasma, causes Sample intake passage inside plasma can be influenced to generate disturbance by wind, and analysis result is caused to generate unnecessary fluctuation.
In addition the interception cone being deep into plasma is also influenced by plasma high-temperature, with the change of heating time Change, the collected number of ions of ICP-MS is caused to gradually change, reflect that in performance together be exactly that signal gradually deviates, stability is not It is good.
Simultaneously as horizontal positioned torch pipe, by thermodynamic (al) normal effects, the upper space of torch pipe is that temperature is higher naturally, Lower space temperature is relatively low, and plasma is unevenly distributed, Temperature Distribution is also uneven, is easy to cause torch pipe upper space and more holds Easily burn.
Invention content
In order to solve the deficiency in above-mentioned prior art, the present invention provides it is a kind of exclusion neutral ion influence, from Sub- efficiency of transmission is high, stabilization time is short, analytical precision is high, plasma-mass spectrometry system of good reliability.
A kind of plasma-mass spectrometry system, the plasma-mass spectrometry system include mass spectrometer, true Dummy cell;Plasma-the mass spectrometry system further comprises:
Quarter bend, the outlet of the quarter bend is straight up;
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend;
First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone;
Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and under the first valve Trip, after the ion deflecting unit, ion deflecting angle α;
Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.
According to above-mentioned plasma-mass spectrometry system, it is preferable that first valve and/or the second valve use Slide-valve.
According to above-mentioned plasma-mass spectrometry system, optionally, what the sampling cone included setting gradually first takes Sample is bored and the second sampling cone.
According to above-mentioned plasma-mass spectrometry system, it is preferable that angle
According to above-mentioned plasma-mass spectrometry system, it is preferable that the ion deflecting unit uses deflecting electric field.
The present invention also aims to provide the method for work according to above-mentioned plasma-mass spectrometry system, the hair Improving eyesight is achieved by the following technical programs:
According to the method for work of above-mentioned plasma-mass spectrometry system, the method for work is:
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened;
Ion and neutral particle are emitted from the quarter bend and move straight up, sequentially pass through the sampling cone and the first valve Enter the particle deflection unit behind the door, ion deflects in the ion deflecting unit, and the neutral particle is according to original The direction of motion continues up;
(A2) after ion interface vacuum reaches setting, then second valve is opened;
Ion after deflection passes through second valve, into downstream;
(A3) quarter bend is closed, and first valve and the second valve are closed.
Compared with prior art, the device have the advantages that being:
1. compared to traditional off-axis deflection, 90 degree can completely eliminate central particles interference, and ion transmits off axis More efficient, ion transmission efficiency can be greatly improved in the suitable ion-optic system of space layout of turning at 90 degree;
2. plasma design meets the characteristics of hot gas automatic uplink, heat automatic plasma body upper space, for Torch pipe is integrally uniform, and the concentration of temperature will not be locally caused in torch pipe, leads to torch pipe premature breakdown, improves service life;
3. the temperature in vertical plasma torch pipe will be lower, more saved for cooling gas consumption;Conventional The consumption of cooling gas can be reduced to 10L/min hereinafter, reducing by 1/3rd argon gas consumption;
4. the heat of vertical torch pipe is directly taken away by the water cooling interface of top, equipment heat source is more concentrated, and being conducive to concentration will Heat is drained, and will not cause to generate Wen Sheng inside complete machine;
5. the plasma placed vertically integrally excites more symmetrically, plasma is more stablized relative to laterally disposed, Be conducive to improve Instrumental Analysis precision;
It 6. two-stage valve such as slide-valve designs, can preferably ensure the vacuum of ion-optic system, safeguard and adjusting System vacuum can not be influenced when ion-optical interface, reduces vacuum settling time, lowering apparatus stabilization time.
Description of the drawings
With reference to attached drawing, the disclosure will be easier to understand.Skilled addressee readily understands that be:This A little attached drawings are used only for the technical solution illustrated the present invention, and are not intended to and protection scope of the present invention is construed as limiting. In figure:
Fig. 1 is the structure diagram of plasma-mass spectrometry system according to embodiments of the present invention.
Specific embodiment
Fig. 1 and following description describe the present invention optional embodiment with instruct those skilled in the art how to implement and Reproduce the present invention.In order to instruct technical solution of the present invention, simplified or some conventional aspects be omitted.Those skilled in the art should The understanding is originated from the modification of these embodiments or replacement will within the scope of the invention.Under those skilled in the art should understand that Stating feature can combine to form multiple modifications of the invention in various ways.The invention is not limited in following optional as a result, Embodiment, and be only limited by the claims and their equivalents.
Embodiment:
Fig. 1 schematically illustrates the structure diagram of plasma-mass spectrometry system of the embodiment of the present invention, such as Fig. 1 Shown, the plasma-mass spectrometry system includes:
Mass spectrometer, vacuum unit;These are all the state of the art, and concrete structure and working method are herein not It repeats again;
Quarter bend, the outlet of the quarter bend is straight up;
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend;The sampling cone includes setting successively The first sampling cone and the second sampling cone put;
First valve, such as slide-valve, first valve are arranged on the ion exit direction, and in the sampling The downstream of cone;
Ion deflecting unit, such as ion deflecting electric field, the particle deflection unit is arranged on ion exit direction, and is located In the downstream of the first valve, after the ion deflecting unit, ion deflecting angle α, such as angle
Second valve, such as slide-valve, second valve are arranged on the ion after ion deflecting unit deflection On direction.
According to the method for work of above-mentioned plasma-mass spectrometry system, the method for work is:
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened;
Ion and neutral particle are emitted from the quarter bend and move straight up, sequentially pass through the sampling cone and the first valve Enter the particle deflection unit behind the door, ion deflects in the ion deflecting unit, and the neutral particle is according to original The direction of motion continues up;
(A2) after ion interface vacuum reaches setting, then second valve is opened;
Ion after deflection passes through second valve, into downstream;
(A3) quarter bend is closed, and first valve and the second valve are closed.

Claims (6)

1. a kind of plasma-mass spectrometry system, the plasma-mass spectrometry system includes mass spectrometer;It is special Sign is:Plasma-the mass spectrometry system further comprises:
Quarter bend, the outlet of the quarter bend is straight up;
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend;
First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone;
Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and the downstream in the first valve, warp After crossing the ion deflecting unit, ion deflecting angle α;
Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.
2. plasma-mass spectrometry system according to claim 1, it is characterised in that:First valve and/or Two valves use slide-valve.
3. plasma-mass spectrometry system according to claim 1, it is characterised in that:The sampling cone is included successively The first sampling cone and the second sampling cone of setting.
4. plasma-mass spectrometry system according to claim 1, it is characterised in that:Angle
5. plasma-mass spectrometry system according to claim 1, it is characterised in that:The ion deflecting unit is adopted Use deflecting electric field.
6. according to the method for work of any plasma-mass spectrometry systems of claim 1-5, the method for work For:
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened;
Ion and neutral particle are emitted from the quarter bend and move straight up, after sequentially passing through the sampling cone and the first valve Into the particle deflection unit, ion deflects in the ion deflecting unit, and the neutral particle is moved according to original Direction continues up;
(A2) after ion interface vacuum reaches setting, then second valve is opened;
Ion after deflection passes through second valve, into downstream;
(A3) quarter bend is closed, and first valve and the second valve are closed.
CN201711490627.XA 2017-12-30 2017-12-30 Plasma-mass spectrometry system and working method thereof Active CN108152358B (en)

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CN108152358B CN108152358B (en) 2024-02-02

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112241132A (en) * 2020-09-20 2021-01-19 杭州谱育科技发展有限公司 Control device and method for scanning speed of quadrupole mass spectrometer
CN112863997A (en) * 2020-12-31 2021-05-28 杭州谱育科技发展有限公司 ICP-MS with particle elimination function
WO2022104448A1 (en) * 2020-11-18 2022-05-27 Kimia Analytics Inc. Air-cooled interface for inductively coupled plasma mass spectrometer (icp-ms)

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05325885A (en) * 1992-05-26 1993-12-10 Hitachi Ltd Mass spectrometer
JP2000311650A (en) * 1999-02-26 2000-11-07 Hitachi Ltd Plasma ion source mass spectrometer
CN2514344Y (en) * 2001-12-27 2002-10-02 北京有色金属研究总院 Induction coupled plasma mass spectrum sample feeding system
JP2004071470A (en) * 2002-08-08 2004-03-04 Yokogawa Analytical Systems Inc Atmospheric pressure plasma ionizing source mass spectrometer
US20070228272A1 (en) * 2006-04-03 2007-10-04 Loboda Alexandre V Method and apparatus for providing ion barriers at the entrance and exit ends of a mass spectrometer
CN103269561A (en) * 2013-05-15 2013-08-28 浙江大学 Waveguide direct-feed-type microwave plasma torch device
CN103456610A (en) * 2013-08-21 2013-12-18 中国人民解放军国防科学技术大学 SiC optical material processing device
CN103681204A (en) * 2012-09-08 2014-03-26 复旦大学 Ion transmission system for inductively coupled plasma mass spectrometry
CN104347343A (en) * 2014-09-30 2015-02-11 聚光科技(杭州)股份有限公司 Analysis device and method
CN206057248U (en) * 2016-08-17 2017-03-29 东华理工大学 A kind of mass spectrometer of utilization microwave plasma torch ionization source
CN207730704U (en) * 2017-12-30 2018-08-14 杭州谱育科技发展有限公司 Plasma-mass spectrometry system

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05325885A (en) * 1992-05-26 1993-12-10 Hitachi Ltd Mass spectrometer
JP2000311650A (en) * 1999-02-26 2000-11-07 Hitachi Ltd Plasma ion source mass spectrometer
CN2514344Y (en) * 2001-12-27 2002-10-02 北京有色金属研究总院 Induction coupled plasma mass spectrum sample feeding system
JP2004071470A (en) * 2002-08-08 2004-03-04 Yokogawa Analytical Systems Inc Atmospheric pressure plasma ionizing source mass spectrometer
US20070228272A1 (en) * 2006-04-03 2007-10-04 Loboda Alexandre V Method and apparatus for providing ion barriers at the entrance and exit ends of a mass spectrometer
CN103681204A (en) * 2012-09-08 2014-03-26 复旦大学 Ion transmission system for inductively coupled plasma mass spectrometry
CN103269561A (en) * 2013-05-15 2013-08-28 浙江大学 Waveguide direct-feed-type microwave plasma torch device
CN103456610A (en) * 2013-08-21 2013-12-18 中国人民解放军国防科学技术大学 SiC optical material processing device
CN104347343A (en) * 2014-09-30 2015-02-11 聚光科技(杭州)股份有限公司 Analysis device and method
CN206057248U (en) * 2016-08-17 2017-03-29 东华理工大学 A kind of mass spectrometer of utilization microwave plasma torch ionization source
CN207730704U (en) * 2017-12-30 2018-08-14 杭州谱育科技发展有限公司 Plasma-mass spectrometry system

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
A.R.戴特等, 北京:冶金工业出版社, pages: 112 *
GARETH PEARSON ET AL: "A highly efficient sample introduction system for interfacing microfluidic chips with ICP-MS", JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, no. 22, pages 657 - 662 *
郝金女, 李顺利: "水平式炬管电感耦合等离子体发射光谱仪的应用", 现代仪器, no. 01, pages 112 - 27 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112241132A (en) * 2020-09-20 2021-01-19 杭州谱育科技发展有限公司 Control device and method for scanning speed of quadrupole mass spectrometer
WO2022104448A1 (en) * 2020-11-18 2022-05-27 Kimia Analytics Inc. Air-cooled interface for inductively coupled plasma mass spectrometer (icp-ms)
CN112863997A (en) * 2020-12-31 2021-05-28 杭州谱育科技发展有限公司 ICP-MS with particle elimination function

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