A kind of hydrogen recycling purification system and its control method
Technical field
The present invention relates to chemical field more particularly to a kind of hydrogen recycling purification system and its control methods.
Background technology
With the rapid development of the general semiconductor industries such as IC manufactures, LED, FPD and photovoltaic, electron level hydrogen conduct
The dosage of carrier gas and process gas rises year by year.
However, during actual production, hydrogen is just directly discharged or burnt almost without being utilized.Such as LED
In industry, only as MOCVD, (Metal-organic Chemical Vapor Deposition, metal are organic for electron level hydrogen
Compound chemical vapor deposition) carrier gas, after hydrogen enters exhaust gas treating device just directly discharge, this measure both wasted resource or
The input of production cost is added, while pollution is caused to environment, and with huge security risk.
Currently, in non-general semicon industry hydrogen recycling round-robin method mainly have separation by deep refrigeration, pressure swing adsorption method,
Palladium membrane method of purification and membrane separation process.Separation by deep refrigeration be used for hydrogen purification, but can not by hydrogen purification to very high concentration, and
And input is higher;Pressure swing adsorption method can be by hydrogen purification to higher concentration, but organic efficiency is relatively low, especially when hydrogen
When concentration is less than 50%, recycling amplitude declines to a great extent;Palladium membrane method of purification can by hydrogen purification to higher concentration, but for
In the presence of there are a large amount of foreign gases, purifier apparatus is extremely easily blocked, practicability is relatively low;Membrane separation process, easy to operate, investment
Small, low energy consumption, but purity is difficult to reach more than 99.5%, and the import needs of film reach very high pressure values, generally higher than
30bar.Certainly, also have through the combination of above-mentioned a variety of methods to realize that hydrogen recycles, but be still unable to reach general semiconductor
Requirement of the industry for hydrogen purity.
General semicon industry is very high for the purity requirement of gas, generally require original gas purity reach electron level (>
99.999%, i.e. 5N), also there are harsh requirement, such as stringent limitation O, S, P, Si and transition metal simultaneously for impurity content
Element equal size, therefore recycling, purifying to hydrogen, realization, which recycles, brings higher requirement.And current non-general semiconductor
Hydrogen recycling circulator in industry is not suitable for the hydrogen recycling Xun Huan of general semicon industry.
Therefore, the hydrogen recycling circulator there is an urgent need for a kind of general semicon industry improves this present situation.
The content of the invention
It is an object of the present invention to:A kind of hydrogen recovery and purification system is provided, to solve in the prior art non-general half
Hydrogen recycling circulator in conductor industry is not suitable for the hydrogen recycling circulatory problems of general semicon industry.
It is another object of the present invention to:A kind of control method of hydrogen recovery purifying is provided.
On the one hand, the present invention provides a kind of hydrogen recovery and purification system, including:Exhaust gas treating device, air inlet and industry
The exhaust port connection of equipment,
De-watering apparatus is connected with the exhaust outlet of the exhaust gas treating device, for gas to be dried;
Compressor, input terminal are connected with the de-watering apparatus, and gas compression to pressure is more than or equal to by the compressor
5bar;
First surge tank is connected with the output terminal of the compressor;
First gas seperation film group, air inlet are connected with the first surge tank, and the first gas seperation film group is equipped with
First impurity gas exhaust outlet, the membrane material of the first gas seperation film group are made of ceramic materials;
First hydrogen-storing device is connected with the exhaust outlet of the first gas seperation film group, first hydrogen-storing device
Hydrogen storage material is metal alloy, and first hydrogen-storing device is equipped with the 4th impurity gas exhaust outlet;
Second surge tank, its one end are connected with first hydrogen-storing device, the air inlet of the other end and the industrial equipment
Connection.
Preferably, the second hydrogen-storing device is further included, the both ends of first hydrogen-storing device and second hydrogen storage dress
The both ends put respectively are connected by control valve with the exhaust outlet of the first gas seperation film group and second surge tank,
The hydrogen storage material of second hydrogen-storing device is metal alloy, and second hydrogen-storing device is equipped with the 5th impurity gas exhaust outlet.
Preferably, further including the first hydrogen gas concentration sensor, it is used to detect the row of the first gas seperation film group
The concentration of hydrogen, the exhaust outlet of the first gas seperation film group pass through the first pipeline and the compression in the gas of gas port discharge
The input terminal connection of machine, first pipeline are equipped with control valve.
Preferably, further include the second hydrogen gas concentration sensor, second hydrogen gas concentration sensor is mounted on described the
Between the air inlet of two surge tanks and the industrial equipment, second surge tank passes through the second pipeline and the first gas point
Exhaust outlet from film group connects, on second pipeline and between second surge tank and the air inlet of the industrial equipment
It is equipped with control valve.
It is sensed preferably, further including the 3rd density of hydrogen between the exhaust gas treating device and the de-watering apparatus
Device and control valve, the exhaust outlet of the exhaust gas treating device are connected by the 3rd pipeline with the air inlet of the exhaust gas treating device, institute
The 3rd pipeline is stated equipped with control valve.
Preferably, second gas seperation film group is further included, the air inlet of the second gas seperation film group and described
One surge tank connects, and exhaust outlet is connected with the air inlet of the first gas seperation film group, and the second gas seperation film group is set
There is the second impurity gas exhaust outlet, the membrane material of the second gas seperation film group is made of ceramic materials.
Preferably, further include third gas seperation film group, the air inlet of the third gas seperation film group is respectively with
One impurity gas exhaust outlet and the connection of the second impurity gas exhaust outlet, exhaust outlet are connected by the air inlet of pipeline and the compressor
It connects, the third gas seperation film group is equipped with the 3rd impurity gas exhaust outlet, and the membrane material of the third gas seperation film group is by making pottery
Ceramic material is made.
On the other hand, a kind of control method of hydrogen recovery and purification system is provided, one suitable for above-mentioned arbitrary scheme
Kind hydrogen recovery and purification system, including:
The tail gas that industrial equipment discharges is handled by exhaust gas treating device, the content of hydrogen is at least in tail gas
10%;
By exhaust gas treating device, treated that gas is dried by de-watering apparatus;
By dried gas by compressor compresses at least 5bar, gas is then made into the by the first surge tank
One gas separation membrane group;
The foreign gas for separating out first gas separation membrane component, is discharged by the first impurity gas exhaust outlet;
Making the gas after the purification of first gas seperation film group, the first hydrogen-storing device carries out suction hydrogen into the first hydrogen-storing device,
After the hydrogen saturation that the first hydrogen-storing device absorbs, the first hydrogen-storing device carries out putting hydrogen;
Make the hydrogen that the first hydrogen-storing device discharges into the second surge tank, subsequently into industrial equipment;
The foreign gas for isolating the first hydrogen-storing device is discharged by the 4th impurity gas exhaust outlet.
The hydrogen in gas is purified specifically, inhaling hydrogen by the first hydrogen-storing device and putting hydrogen.
Preferably, the hydrogen recovery and purification system further includes the second hydrogen-storing device;
When the first hydrogen-storing device carries out putting hydrogen, the gas after the purification of first gas seperation film group is made to be filled into the second hydrogen storage
It puts, the second hydrogen-storing device is made to carry out suction hydrogen, after the second hydrogen-storing device saturation, the second hydrogen-storing device is made to carry out putting hydrogen, at this point, making
Gas after the purification of first gas seperation film group enters the first hydrogen-storing device.
The hydrogen in gas is purified specifically, inhaling hydrogen by the second hydrogen-storing device and putting hydrogen, the second hydrogen storage dress
The foreign gas isolated is put to discharge by the 5th impurity gas exhaust outlet.
Preferably, the hydrogen recovery and purification system further includes second gas seperation film group and third gas seperation film
Group;
The gas after the first surge tank voltage stabilizing is made into the second gas seperation film group second gas to be made to separate membrane component
The impurity gas separated out enters third gas seperation film group, and the gas after the purification of second gas seperation film group enters first gas separation
Film group;The impurity gas that third gas separation membrane component separates out is made to be discharged by the 3rd impurity gas exhaust outlet, separates third gas
Gas after the purification of film group enters compressor
Beneficial effects of the present invention are:Preliminary purification is carried out to the hydrogen in tail gas by exhaust gas treating device, passes through ceramics
Seperation film purifies again made of material, and density of hydrogen is made to reach 99%, is further purified by the first hydrogen-storing device, alloy type
Hydrogen storage material hydrogen and put hydrogen through inhaling, the concentration of hydrogen is allow to be further increased to 5N grade, solve in the prior art it is non-it is general partly
Hydrogen recycling circulator in conductor industry is not suitable for the hydrogen recycling circulatory problems of general semicon industry.Using ceramic material
Manufactured ceramic separation film can also reduce first gas seperation film group compared to the seperation film used in existing membrane separation process technology
The pressure of air inlet, the minimum air pressure for needing 5bar in the present embodiment, far below in existing membrane separation process for separation
The pressure demand of film air inlet.
Description of the drawings
Fig. 1 is a kind of structure diagram of hydrogen recovery and purification system in the embodiment of the present invention one;
Fig. 2 is a kind of structure diagram of hydrogen recovery and purification system in the embodiment of the present invention two;
Fig. 3 is a kind of structure diagram of hydrogen recovery and purification system in the embodiment of the present invention three.
In figure:
1st, exhaust gas treating device;2nd, de-watering apparatus;3rd, the 3rd hydrogen gas concentration sensor;4th, control valve;5th, the 3rd pipeline;6th, press
Contracting machine;7th, the first surge tank;8th, first gas seperation film group;81st, the first impurity gas exhaust outlet;9th, the first hydrogen-storing device;91st,
Four impurity gas exhaust outlets;10th, the first hydrogen gas concentration sensor;11st, the first pipeline;12nd, the second surge tank;13rd, the second hydrogen is dense
Spend sensor;14th, the second pipeline;15th, the second hydrogen-storing device;151st, the 5th impurity gas exhaust outlet 16, second gas seperation film group;
161st, the second impurity gas exhaust outlet;17th, third gas seperation film group;171st, the 3rd impurity gas exhaust outlet;
100th, industrial equipment.
Specific embodiment
Technical solution to further illustrate the present invention below with reference to the accompanying drawings and specific embodiments.
Embodiment one
The present embodiment provides a kind of hydrogen recovery and purification system, as shown in Figure 1, including exhaust gas treating device 1, de-watering apparatus 2,
Compressor 6, the first surge tank 7, first gas seperation film group 8, the 3rd hydrogen gas concentration sensor 3, the first hydrogen gas concentration sensor
10th, the second hydrogen gas concentration sensor 13;
The air inlet of exhaust gas treating device 1 is connected with the exhaust port of industrial equipment 100, and exhaust gas treating device 1 passes through spray
Hydrogen in the tail gas that the mode of chemical agent will be flowed through in exhaust gas treating device 1 purifies, for example, can be acid by spraying
Liquid removes the ammonia in tail gas, by spraying carbon dioxide, sulfur dioxide in limewash removal tail gas etc., exhaust gas treating device
1 is the prior art, then this is repeated no more.It should be noted that according to practical condition, the vent gas treatment dress in the present embodiment
Putting can set multiple, and corresponding gas componant in tail gas is removed respectively by multiple exhaust gas treating devices 1.
The exhaust outlet of exhaust gas treating device 1 is connected by control valve 4 with de-watering apparatus 2, is dried by de-watering apparatus 2 from tail gas
The gas discharged in processor 1, separates aqueous vapor.The 3rd density of hydrogen biography is additionally provided between exhaust gas treating device 1 and control valve 4
Sensor 3, and the connecting line between the 3rd hydrogen gas concentration sensor 3 and control valve 4 passes through the 3rd pipeline 5 and exhaust gas treating device
1 air inlet connects, and control valve 4 is again provided on the 3rd pipeline 5.The present embodiment is examined by the 3rd hydrogen gas concentration sensor 3
Survey the concentration of the hydrogen in gas after the processing of exhaust gas treating device 1, when the concentration of hydrogen in tail gas is more than the first default value, tail
Control valve 4 between treatment apparatus 1 and de-watering apparatus 2 is opened, and the control valve 4 on the 3rd pipeline 5 is closed, and gas is from vent gas treatment
Device 1 enters de-watering apparatus 2;When the concentration of hydrogen in tail gas is less than or equal to the first default value, exhaust gas treating device 1 and water removal fill
The control valve 4 put between 2 is closed, and the control valve 4 on the 3rd pipeline 5 is opened, the gas warp that exhaust outlet is discharged in exhaust gas treating device 1
3rd pipeline 5 reenters exhaust gas treating device 1 and is purified again.
De-watering apparatus 2 is connected with the input terminal of compressor 6, and the output terminal of compressor 6 is connected with the first surge tank 7, is passed through
Compressor 6 is by the gas boosting flowed through at least 5bar, and into after the first surge tank 7, the first surge tank 7 plays pressure stabilization function,
When 6 fluctuation of service of compressor, it is ensured that larger fluctuation will not occur for the gas pressure in the first surge tank 7.
First surge tank 7 is connected with the air inlet of first gas seperation film group 8, and first gas seperation film group 8 is equipped with the
One impurity gas exhaust outlet 81, the seperation film of first gas seperation film group 8 are made of ceramic material, which is thin-walled
Multi-channel structure, be equipped with above very multipotency enough allow liquid and/or gas by micropore, when gas passes through the ceramic separation film
When, hydrogen by speed much larger than other impurities gas by speed, effectively hydrogen can be purified, in this implementation
In example, ceramic separation film only needs the operating air pressure of 5bar that can efficiently be purified to the hydrogen in gas very much, effectively
The pressure requirements for using membrane separation process higher to film inlet end in non-general semicon industry are reduced, thus, do not have for compressor 6
Have excessively high performance requirement, for pipeline air-tightness also without excessively high requirement, effectively reduce production cost, can be with
It is widely suitable for big, medium-sized and small enterprises.Gas after being purified is flowed out from the exhaust outlet of first gas seperation film group 8, impurity gas from
First impurity gas exhaust outlet 81 is discharged.
It is understood that the seperation film of first gas seperation film group 8 can also be made of high molecular material, for example, it is fine
Ethyl cellulose, nitrocellulose in the plain esters of dimension;Polyimide in non-cellulose esters, polysulfones, fluorinated gather
Ester, olefines etc. are based particularly on the material of polyimides modified.
The exhaust outlet of first gas seperation film group 8 is connected by pipeline with the first hydrogen-storing device 9, and therebetween
Connecting line is equipped with the first hydrogen gas concentration sensor 10 and control valve 4, and the pipeline of control valve 4 and hydrogen gas concentration sensor 10 is also
It is connected by the first pipeline 11 with the input terminal of compressor 6, the first hydrogen gas concentration sensor 10 divides for detecting from first gas
Concentration from hydrogen in the gas discharged in film group 8, when the concentration of the hydrogen is less than or equal to the second default value, the first pipeline
Control valve 4 on 11 is opened, and the control valve 4 between first gas seperation film group 8 and the first hydrogen-storing device 9 is closed, first gas
The gas that 8 exhaust outlet of seperation film group comes out enters compressor 6 by the first pipeline 11, and re-starts purification;It is dense when hydrogen
When degree is more than the second default value, the control valve 4 on the first pipeline 11 is closed, first gas seperation film group 8 and the first hydrogen storage dress
The control valve 4 put between 9 is opened, and gas enters the first hydrogen-storing device 9.
First hydrogen-storing device 9 and the second surge tank 12 connect, and connecting line between the two is equipped with control valve 4,
Using the hydrogen-absorbing material of metal alloy class, the hydrogen-absorbing material of alloy type compares other materials can absorb more first hydrogen-storing device 9
More hydrogen, and very stable can also release hydrogen.Such as titanium base hydrogen storage alloy, alloy composition general formula are
Ti12.5Mn40Cr17.5V20(V4Fe)2;Alloy is the two-phase coexistent structure comprising C14Laves phases based on BCC phases;The alloy exists
Effective hydrogen capacity at 75 DEG C is 1.84wt%.It is of course also possible to use the alloy of the series such as magnesium system, Rare Earth, MmNi5 systems.
When the first hydrogen-storing device 9 inhales hydrogen, the control valve 4 between the first hydrogen-storing device 9 and the second surge tank 12 is closed, the first hydrogen storage dress
It puts the control valve 4 between 9 and first gas seperation film group 8 close to the first hydrogen-storing device 9 to open, when the first hydrogen-storing device 9 inhales hydrogen
After saturation, the control valve 4 between the first hydrogen-storing device 9 and the second surge tank 12 is opened, the first hydrogen-storing device 9 and first gas point
It is closed from the control valve 4 close to the first hydrogen-storing device 9 between film group 8, the hydrogen of storage is discharged into second by the first hydrogen-storing device 9
In surge tank 12, inhale hydrogen by the first hydrogen-storing device 9 and put hydrogen and hydrogen can further be purified, the first hydrogen-storing device
9 foreign gases isolated are discharged by the 4th impurity gas exhaust outlet 91.
Second surge tank 12 is connected with the air inlet of industrial equipment 100, and the hydrogen after purification is input to industrial equipment 100
It recycles.The second hydrogen gas concentration sensor is equipped on pipeline between 100 air inlet of the second surge tank 12 and industrial equipment
13 and control valve 4, control valve 4 is with respect to the second hydrogen gas concentration sensor 13 close to industrial equipment 100, the second hydrogen gas concentration sensor
Pipeline between 13 and the control valve 4 is also connected by the second pipeline 14 with the inlet end of the first hydrogen-storing device 9.Second hydrogen is dense
Sensor 13 is spent for detecting the concentration of the hydrogen into industrial equipment 100, when the concentration of hydrogen is more than the 3rd default value
When, the control valve 4 between 100 air inlet of the second surge tank 12 and industrial equipment is opened, and the control valve 4 on the second pipeline 14 closes
It closes, the hydrogen after purification enters industrial equipment 100;When the concentration of hydrogen is less than or equal to three default values, the second surge tank
Control valve 4 between 12 and 100 air inlet of industrial equipment is closed, and the control valve 4 on the second pipeline 14 is opened, and gas enters first
Hydrogen-storing device 9 purifies again, it is ensured that the density of hydrogen into industrial equipment 100 reaches the 3rd default value.
It should be noted that the control valve 4 in the present embodiment is preferably solenoid valve, naturally it is also possible to be hand control valve.
The present embodiment carries out preliminary purification by exhaust gas treating device 1 to the hydrogen in tail gas, by made of ceramic material
Seperation film purifies again, and density of hydrogen is made to reach 99%, passes through the first further purification of hydrogen-storing device 9, the hydrogen storage material of alloy type
Material allows the concentration of hydrogen to be further increased to 5N grades through inhaling hydrogen and putting hydrogen.Using ceramic separation film made of ceramic material,
Compared to the pressure that the seperation film used in existing membrane separation process technology can also reduce by 8 air inlet of first gas seperation film group, sheet
The minimum air pressure for needing 5bar in embodiment is needed far below the pressure for seperation film air inlet in existing membrane separation process
It asks.
Embodiment two
The present embodiment provides a kind of hydrogen recovery and purification system, as shown in Fig. 2, compared to embodiment one, the present embodiment and reality
Applying example one, difference lies in hydrogen recovery and purification system provided in this embodiment further includes the second hydrogen-storing device 15, the second hydrogen storage
Device 15 is identical with the structure of the first hydrogen-storing device 9, the second hydrogen-storing device 15 be equipped with the 5th impurity gas exhaust outlet 151, second
One end of hydrogen-storing device 15 is connected by 4 and second surge tank 12 of control valve, and the other end passes through 4 and first hydrogen-storing device of control valve
Connecting line connection between 9 and first gas seperation film group 8, specifically, being connected to 4 and first density of hydrogen of control valve sensing
On pipeline between device 10.So as to, when the first hydrogen-storing device 9 carries out putting hydrogen, the second hydrogen-storing device 15 can be made to carry out suction hydrogen,
It treats 15 saturation of the second hydrogen-storing device, when carrying out putting hydrogen, the first hydrogen-storing device 9 can be made to carry out suction hydrogen.Second hydrogen-storing device 15 divides
The foreign gas separated out is discharged by the 5th impurity gas exhaust outlet 151.
The present embodiment carries out inhaling hydrogen and puts hydrogen, Neng Gouyou by cycling the first hydrogen-storing device 9 and the second hydrogen-storing device 15
Effect improves the organic efficiency of hydrogen.
Embodiment three
The present embodiment provides a kind of hydrogen recovery and purification system, as shown in figure 3, compared to embodiment two, the present embodiment and reality
Applying example two, difference lies in hydrogen recovery and purification system provided in this embodiment further includes second gas seperation film group 16 and the 3rd
Gas separation membrane group 17, second gas seperation film group 16 is identical with the structure of third gas seperation film group 17, second gas separation
Film group 16 and third gas seperation film group 17 are mounted between the first surge tank 7 and first gas seperation film group 8, specifically, the
The air inlet of two gas separation membrane groups 16 and the first surge tank 7 connect, the exhaust outlet and the first gas of second gas seperation film group 16
The air inlet of body seperation film group 8 connects, the second impurity gas exhaust outlet 161 and first gas in second gas seperation film group 16
Air inlet of the first impurity gas exhaust outlet 81 with third gas seperation film group 17 in seperation film group 8 is connected, third gas point
Exhaust outlet from film group 17 is connected by pipeline with the air inlet of compressor 6, and discharge is additionally provided in third gas seperation film group 17
3rd impurity gas exhaust outlet 171 of impurity gas.
The present embodiment for the gas in the first surge tank 7 out carry for the first time by second gas seperation film group 16
Pure, gas enters the progress secondary purification of first gas seperation film group 8 after purification, and second gas seperation film group 16 purifies surplus for the first time
Remaining impurity gas enters third gas seperation film group 17 after remaining 8 second purification of impurity gas and first gas seperation film group
It is purified again, the gas after proposition is transported to the input terminal and de-watering apparatus of compressor 6 by third gas seperation film group 17
Gas mixing in 2 out;Third gas seperation film group 17 purifies remaining impurity gas and passes through 171 row of the 3rd impurity gas exhaust outlet
Go out.The purity that hydrogen is purified can be ensured by second gas seperation film group 16 and first gas seperation film group 8, pass through the 3rd
Gas separation membrane group 17 can ensure the recovery utilization rate of hydrogen.
Example IV
The present embodiment provides a kind of control method of hydrogen recovery and purification system, one suitable for any of the above-described embodiment
Kind hydrogen recovery and purification system, including:
The tail gas that industrial equipment 100 discharges is handled by exhaust gas treating device 1, the content of hydrogen is at least in tail gas
10%.
By exhaust gas treating device 1, treated that gas is dried by de-watering apparatus 2.
It should be noted that work as hydrogen in gas after the 3rd hydrogen gas concentration sensor 3 detection exhaust gas treating device 1 is handled
When concentration is more than 20%, gas is directly entered de-watering apparatus 2;When the concentration of hydrogen is less than or equal to 20%, gas passes through the 3rd
Pipeline 5 is purified into the air inlet of exhaust gas treating device 1 again through exhaust gas treating device 1.It is removed by de-watering apparatus 2 logical
Cross the moisture in its gas.
Dried gas is compressed at least 5bar by compressor 6, then enters gas by the first surge tank 7
First gas seperation film group 8.
The foreign gas for isolating first gas seperation film group 8 is discharged by the first impurity gas exhaust outlet 81.Make first
Gas after gas separation membrane group 8 purifies enters the first hydrogen-storing device 9, and the first hydrogen-storing device 9 carries out suction hydrogen, treats that the first hydrogen storage fills
After putting the hydrogen saturation of 9 absorptions, the first hydrogen-storing device 9 carries out putting hydrogen;
It should be noted that work as the gas that the first hydrogen gas concentration sensor 10 detection first gas seperation film group 8 is purified
In, when the concentration of hydrogen is less than or equal to 99%, gas, into the input terminal of compressor 6, is re-started by the first pipeline 11
Compression and purification;When the concentration of hydrogen is more than 99%, gas enters the first hydrogen-storing device 9.
Make the hydrogen that the first hydrogen-storing device 9 discharges into the second surge tank 12, subsequently into industrial equipment 100.It needs to note
Meaning, when in the gas that exports in 13 the first hydrogen-storing devices 9 of detection of the second density of hydrogen sensing, when the concentration of hydrogen is less than etc.
In 99.999%, gas, into the inlet port of the first hydrogen-storing device 9, re-starts purification by the second pipeline 14;Work as hydrogen
Concentration be more than 99.999% when, gas enters in industrial equipment 100.
The foreign gas for isolating the first hydrogen-storing device 9 is discharged by the 4th impurity gas exhaust outlet 91.
When hydrogen recovery and purification system is provided with the second hydrogen-storing device 15, which further includes:
When the first hydrogen-storing device 9 carries out putting hydrogen, the gas after the purification of first gas seperation film group 8 is made to enter the second hydrogen storage
Device 15 makes the second hydrogen-storing device 15 carry out suction hydrogen, after 15 saturation of the second hydrogen-storing device, is put the second hydrogen-storing device 15
Hydrogen, at this point, the gas after the purification of first gas seperation film group 8 is made to separate the second hydrogen-storing device 15 into the first hydrogen-storing device 9
The foreign gas gone out is discharged by the 5th impurity gas exhaust outlet 151.
It should be noted that when the first hydrogen-storing device 9 inhales hydrogen, the second hydrogen-storing device 15 puts hydrogen, and the first hydrogen storage fills at this time
The control valve 4 put between 9 and first gas seperation film group 8 is opened, the control between the first hydrogen-storing device 9 and the second surge tank 12
Valve 4 is closed, and the control valve 4 between the second hydrogen-storing device 15 and first gas seperation film group 8 is closed, the second hydrogen-storing device 15 and
Control valve 4 between two surge tanks 12 is opened;When the first hydrogen-storing device 9 puts hydrogen, the second hydrogen-storing device 15 inhales hydrogen, and at this time first
Control valve 4 between hydrogen-storing device 9 and first gas seperation film group 8 is closed, between the first hydrogen-storing device 9 and the second surge tank 12
Control valve 4 open, the control valve 4 between the second hydrogen-storing device 15 and first gas seperation film group 8 is opened, the second hydrogen-storing device
15 and the second control valve 4 between surge tank 12 close.
When hydrogen recovery and purification system further includes second gas seperation film group 16 and third gas seperation film group 17, the control
Method processed further includes:
Dried gas is compressed at least air pressure of 5bar through compressor 6, and into the after 7 voltage stabilizing of the first surge tank
Two gas separation membrane groups 16, the impurity gas that second gas seperation film group 16 is isolated is through the second impurity gas exhaust outlet 161 into the
Three gas separation membrane groups 17, the gas after second gas seperation film group 16 purifies enter first gas seperation film group 8;
It is miscellaneous into ceramic separation film purification of the impurity gas through third gas seperation film group 17 of third gas seperation film group 17
Matter gas is discharged through the 3rd impurity gas exhaust outlet 171, and exhaust outlet of the gas after purification through third gas seperation film group 17 is through pipe
Road enters compressor 6.
It is dense can be purified to hydrogen by control method provided in this embodiment for tail gas of the initial density of hydrogen not less than 10%
Degree reaches 5N grades.
Obviously, the above embodiment of the present invention is just for the sake of clearly illustrating example of the present invention, and it is pair to be not
The restriction of embodiments of the present invention.For those of ordinary skill in the art, may be used also on the basis of the above description
To make other variations or changes in different ways.There is no necessity and possibility to exhaust all the enbodiments.It is all this
All any modification, equivalent and improvement made within the spirit and principle of invention etc., should be included in the claims in the present invention
Protection domain within.