CN108083499A - A kind of processing method of integrated circuit plate cleaning solution waste water - Google Patents
A kind of processing method of integrated circuit plate cleaning solution waste water Download PDFInfo
- Publication number
- CN108083499A CN108083499A CN201711410373.6A CN201711410373A CN108083499A CN 108083499 A CN108083499 A CN 108083499A CN 201711410373 A CN201711410373 A CN 201711410373A CN 108083499 A CN108083499 A CN 108083499A
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- CN
- China
- Prior art keywords
- waste water
- cleaning solution
- solution waste
- integrated circuit
- circuit plate
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Classifications
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/281—Treatment of water, waste water, or sewage by sorption using inorganic sorbents
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Water Treatment By Sorption (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
The present invention provides a kind of processing methods of integrated circuit plate cleaning solution waste water, are uniformly processed after the cleaning solution wastewater collection that integrated circuit plate each process generates is summarized, the processing of cleaning solution waste water includes the following steps：Step 1：The flocculant of 15~30mg/L is added into cleaning solution waste water, 30~100min is stood after stirring 20min；Step 2：Treated that cleaning solution waste water enters and exits the first adsorption column and the second adsorption column being connected in series successively for step 1；Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, into reuse water treatment system, wherein, flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide of 15wt% and the ligninsulfonate of 19wt% of 66wt%.The present invention realizes effective removal, and water carries out reuse by treated, realizes Xun Huan green production according to the characteristic in IC chip cleaning solution waste water to containing pollutant component especially heavy metal in waste water.
Description
Technical field
The present invention relates to integrated circuit plate fields.It is more particularly related to a kind of integrated circuit plate cleaning solution gives up
The processing method of water.
Background technology
Integrated circuit directly determines electronic system product as the core component in electronic product, the quality of quality
Performance And Reliability height.In the preparation process of integrated circuit, the dirts such as particle, organic matter, metal of surface adhesion
Dye object seriously affects the performance of device.With the increasingly micromation of unit pattern in integrated circuit plate and increasingly carrying for integrated level
Height, the requirement to the performance of device, reliability, yields, service life etc. are higher and higher.Therefore, in IC manufacturing mistake
Before all multiple operation such as silicon oxidation, photoetching, extension, diffusion and lead evaporation in journey, can method physically or chemically be used to go
Except the pollutant of silicon chip surface and autoxidation object, to obtain meeting the silicon chip of cleannes requirement, but thus also generate a large amount of
Waste water.
In integrated circuit plate cleaning process in institute's effluent containing the pollution such as fibrous material, chromium, nickel, zinc, soda acid into
Part, if without effectively handling or dealing with improperly, environment will be caused seriously to pollute.Natural water body is subject to acid, alkali, heavy metal-polluted
The cushioning effect of water body is destroyed after dye, is made water quality deterioration, inhibition or is prevented microbial activities, reduces the self-purification capacity of water,
It can also damage simultaneously to crops, heavy metal ion has health high risks, and the heavy metal ion in water is not
Can be degraded by microorganisms, they can be adsorbed in vivo, accumulated and be enriched with, to the mankind, fish, planktonic organism harm pole
Greatly, the death of crop production reduction or livestock may be caused when serious.
The content of the invention
It is excellent it is an object of the invention to solve at least the above and/or defect, and provide at least to will be described later
Point.
It is a still further object of the present invention to provide a kind of processing method of integrated circuit plate cleaning solution waste water, basis is collecting
Substantial amounts of water is consumed into circuit chip manufacturing process, while uses substantial amounts of chemical reagent, ingredient ten in the waste water of discharge
Divide complicated characteristic, effective removal is realized to containing pollutant component especially heavy metal in waste water, and by treated
Water carries out reuse, realizes Xun Huan green production.
In order to realize these purposes and further advantage according to the present invention, a kind of integrated circuit plate cleaning solution waste water is provided
Processing method, be uniformly processed after the cleaning solution wastewater collection that integrated circuit plate each process generates is summarized, the cleaning
The processing of liquid waste water includes the following steps：
Step 1：Into the cleaning solution waste water add 10~20mg/L flocculant, stir 20min after stand 30~
100min removes suspended material and part heavy metal component in waste water；
Step 2：Step 1 treated cleaning solution waste water enters and exits successively the first adsorption column being connected in series and the second absorption
Column is, it can be achieved that efficient absorption to heavy metal in waste water and other inorganic impurities, and operating cost is low；
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system；
Wherein, the flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide and 19wt% of 15wt% of 66wt%
Ligninsulfonate.
Preferably, wherein, the microorganism is Nocard's bacillus.
Preferably, wherein, first adsorption column is palygorskite adsorption column.
Preferably, wherein, second adsorption column is active carbon adsorption column.
Preferably, wherein, the grain size of the palygorskite is 0.3~1.5mm.
Preferably, wherein, the aperture of the palygorskite is 10~20nm.
Preferably, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
The present invention includes at least following advantageous effect：
(1) present invention is to the obvious processing effect of integrated circuit waste water, can effectively realize organic substance in waste water, copper, vanadium,
The heavy metals such as nickel, chromium and other such as ammonia, sulfate and containing inorganic substances such as iodine compounds, treatment effeciency is high；
(2) waste water in the present invention after processing enters reclaiming system, is used directly for the work not high to water quality requirement
Sequence or again through nanofiltration, the processing of reverse osmosis even depth for needing the process of pure water or ultra-pure water；
(3) technical solution of the present invention uses physical absorption or membrane filtration technique, will not introduce new polluter, simply,
Operating cost, applicability is wide, easy to spread.
Part is illustrated to embody by further advantage, target and the feature of the present invention by following, and part will also be by this
The research and practice of invention and be understood by the person skilled in the art.
Specific embodiment
With reference to embodiment, the present invention is described in further detail, to make those skilled in the art with reference to specification
Word can be implemented according to this.
It should be appreciated that such as " having ", "comprising" and " comprising " term used herein do not allot one or more
The presence or addition of a other elements or its combination.
<Example 1>
A kind of processing method of integrated circuit plate cleaning solution waste water, the cleaning solution waste water that integrated circuit plate each process is generated
Collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The flocculant of 10mg/L is added into the cleaning solution waste water, 30min is stood after stirring 20min, wherein,
The flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide of 15wt% and the ligninsulfonate of 19wt% of 66wt%,
The microorganism is Nocard's bacillus；
Step 2：Treated that cleaning solution waste water enters and exits the palygorskite adsorption column and activated carbon being connected in series successively for step 1
Adsorption column, wherein the grain size of the palygorskite is 0.3~1.0mm, the aperture of the palygorskite is 10~20nm.
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
<Example 2>
A kind of processing method of integrated circuit plate cleaning solution waste water, the cleaning solution waste water that integrated circuit plate each process is generated
Collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The flocculant of 20mg/L is added into the cleaning solution waste water, 100min is stood after stirring 20min,
In, the flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide of 15wt% and the lignosulfonic acid of 19wt% of 66wt%
Salt, the microorganism are Nocard's bacillus；
Step 2：Treated that cleaning solution waste water enters and exits the palygorskite adsorption column and activated carbon being connected in series successively for step 1
Adsorption column, wherein the grain size of the palygorskite is 1.0~1.5mm, the aperture of the palygorskite is 10~20nm.
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
<Example 3>
A kind of processing method of integrated circuit plate cleaning solution waste water, the cleaning solution waste water that integrated circuit plate each process is generated
Collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The flocculant of 15mg/L is added into the cleaning solution waste water, 70min is stood after stirring 20min, wherein,
The flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide of 15wt% and the ligninsulfonate of 19wt% of 66wt%,
The microorganism is Nocard's bacillus；
Step 2：Treated that cleaning solution waste water enters and exits the palygorskite adsorption column and activated carbon being connected in series successively for step 1
Adsorption column, wherein the grain size of the palygorskite is 0.5~1.2mm, the aperture of the palygorskite is 10~20nm.
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
<Example 4>
A kind of processing method of integrated circuit plate cleaning solution waste water, the cleaning solution waste water that integrated circuit plate each process is generated
Collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The microbial flocculant of 13mg/L is added into the cleaning solution waste water, is stood after stirring 20min
50min, wherein, the flocculant includes the microbial flocculant of 66wt%, the poly- silicon ferric aluminum oxide of 15wt% and 19wt%
Ligninsulfonate, the microorganism are Nocard's bacillus；
Step 2：Treated that cleaning solution waste water enters and exits the palygorskite adsorption column and activated carbon being connected in series successively for step 1
Adsorption column, wherein the grain size of the palygorskite is 0.3~1.5mm, the aperture of the palygorskite is 10~20nm.
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
<Example 5>
A kind of processing method of integrated circuit plate cleaning solution waste water, the cleaning solution waste water that integrated circuit plate each process is generated
Collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The microbial flocculant of 18mg/L is added into the cleaning solution waste water, is stood after stirring 20min
85min, wherein, the flocculant includes the microbial flocculant of 66wt%, the poly- silicon ferric aluminum oxide of 15wt% and 19wt%
Ligninsulfonate, the microorganism are Nocard's bacillus；
Step 2：Treated that cleaning solution waste water enters and exits the palygorskite adsorption column and activated carbon being connected in series successively for step 1
Adsorption column, wherein the grain size of the palygorskite is 0.3~0.7mm, the aperture of the palygorskite is 10~20nm.
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, at recycle-water
Reason system, wherein, the ultrafiltration membrane retains the substance that molecular weight is 1000~5000.
As it can be seen that the present invention can effectively realize organic substance in waste water, a huge sum of money to the obvious processing effect of integrated circuit waste water
The removal of category and other inorganic substances, and by treated, water carries out reuse, realizes cycle green production, the technology of the present invention
Scheme uses physical absorption or membrane filtration technique, will not introduce new polluter, simply, operating cost, applicability is wide, is easy to
It promotes.
Although the embodiments of the present invention have been disclosed as above, but its be not restricted in specification and embodiment it is listed
With.It can be applied to various suitable the field of the invention completely.It, can be easily for those skilled in the art
Realize other modification.Therefore without departing from the general concept defined in the claims and the equivalent scope, it is of the invention and unlimited
In specific details and shown here as the embodiment with description.
Claims (7)
1. a kind of processing method of integrated circuit plate cleaning solution waste water, which is characterized in that generate integrated circuit plate each process
Cleaning solution wastewater collection is uniformly processed after summarizing, and the processing of the cleaning solution waste water includes the following steps：
Step 1：The flocculant of 10~20mg/L is added into the cleaning solution waste water, 30~100min is stood after stirring 20min；
Step 2：Treated that cleaning solution waste water enters and exits the first adsorption column and the second adsorption column being connected in series successively for step 1；
Step 3：To step 1, treated after cleaning solution waste water carries out micro-filtration and hyperfiltration treatment successively, into recycle-water processing system
System；
Wherein, the flocculant includes microbial flocculant, the poly- silicon ferric aluminum oxide of 15wt% and the wood of 19wt% of 66wt%
Matter sulfonate.
2. the processing method of integrated circuit plate cleaning solution waste water as described in claim 1, which is characterized in that the microorganism is
Nocard's bacillus.
3. the processing method of integrated circuit plate cleaning solution waste water as described in claim 1, which is characterized in that first absorption
Column is palygorskite adsorption column.
4. the processing method of integrated circuit plate cleaning solution waste water as described in claim 1, which is characterized in that second absorption
Column is active carbon adsorption column.
5. the processing method of integrated circuit plate cleaning solution waste water as claimed in claim 3, which is characterized in that the palygorskite
Grain size is 0.3~1.5mm.
6. the processing method of integrated circuit plate cleaning solution waste water as claimed in claim 3, which is characterized in that the palygorskite
Aperture is 10~20nm.
7. the processing method of integrated circuit plate cleaning solution waste water as described in claim 1, which is characterized in that by the ultrafiltration membrane
The substance that molecular weight is 1000~5000 is retained.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711410373.6A CN108083499A (en) | 2017-12-23 | 2017-12-23 | A kind of processing method of integrated circuit plate cleaning solution waste water |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711410373.6A CN108083499A (en) | 2017-12-23 | 2017-12-23 | A kind of processing method of integrated circuit plate cleaning solution waste water |
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| CN108083499A true CN108083499A (en) | 2018-05-29 |
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| CN201711410373.6A Pending CN108083499A (en) | 2017-12-23 | 2017-12-23 | A kind of processing method of integrated circuit plate cleaning solution waste water |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108911287A (en) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | Cleaning solution process of regenerating and device for IC manufacturing |
| CN111422995A (en) * | 2020-04-08 | 2020-07-17 | 刘水平 | Flocculant containing microcapsule and preparation method thereof |
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| DE19923607A1 (en) * | 1999-05-25 | 2000-12-21 | Barfknecht Guenter | Treatment of waste rinsing water from an electrolytic bath using ultrafiltration and active carbon treatment to allow nearly all the metal ions to be recycled to the bath |
| CN102815831A (en) * | 2012-09-19 | 2012-12-12 | 北京格瑞奥环境科技有限公司 | Device and method for treating heavy metal wastewater and recovering heavy metal |
| JP5524299B2 (en) * | 2012-09-05 | 2014-06-18 | 株式会社東芝 | Membrane filtration system |
| CN105540932A (en) * | 2016-01-25 | 2016-05-04 | 奥士康科技股份有限公司 | PCB waste water treatment process |
| CN106145381A (en) * | 2016-07-07 | 2016-11-23 | 马鞍山市顺达环保设备有限公司 | A kind of high efficiency sewage treating agent and preparation method thereof |
| CN106315918A (en) * | 2016-09-22 | 2017-01-11 | 东莞市联洲知识产权运营管理有限公司 | Efficient environment-friendly treatment method of electric plating waste water |
-
2017
- 2017-12-23 CN CN201711410373.6A patent/CN108083499A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19923607A1 (en) * | 1999-05-25 | 2000-12-21 | Barfknecht Guenter | Treatment of waste rinsing water from an electrolytic bath using ultrafiltration and active carbon treatment to allow nearly all the metal ions to be recycled to the bath |
| JP5524299B2 (en) * | 2012-09-05 | 2014-06-18 | 株式会社東芝 | Membrane filtration system |
| CN102815831A (en) * | 2012-09-19 | 2012-12-12 | 北京格瑞奥环境科技有限公司 | Device and method for treating heavy metal wastewater and recovering heavy metal |
| CN105540932A (en) * | 2016-01-25 | 2016-05-04 | 奥士康科技股份有限公司 | PCB waste water treatment process |
| CN106145381A (en) * | 2016-07-07 | 2016-11-23 | 马鞍山市顺达环保设备有限公司 | A kind of high efficiency sewage treating agent and preparation method thereof |
| CN106315918A (en) * | 2016-09-22 | 2017-01-11 | 东莞市联洲知识产权运营管理有限公司 | Efficient environment-friendly treatment method of electric plating waste water |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108911287A (en) * | 2018-07-23 | 2018-11-30 | 华进半导体封装先导技术研发中心有限公司 | Cleaning solution process of regenerating and device for IC manufacturing |
| CN111422995A (en) * | 2020-04-08 | 2020-07-17 | 刘水平 | Flocculant containing microcapsule and preparation method thereof |
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Application publication date: 20180529 |
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