CN108051347A - A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle - Google Patents
A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle Download PDFInfo
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- CN108051347A CN108051347A CN201711219064.0A CN201711219064A CN108051347A CN 108051347 A CN108051347 A CN 108051347A CN 201711219064 A CN201711219064 A CN 201711219064A CN 108051347 A CN108051347 A CN 108051347A
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- testing cassete
- nitrogen cabinet
- silicon chip
- particles
- test
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 95
- 239000002245 particle Substances 0.000 title claims abstract description 65
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 58
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 52
- 239000010703 silicon Substances 0.000 title claims abstract description 52
- 229910052757 nitrogen Inorganic materials 0.000 title claims abstract description 47
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000003860 storage Methods 0.000 title claims abstract description 13
- 238000001514 detection method Methods 0.000 title claims description 15
- 238000012360 testing method Methods 0.000 claims abstract description 79
- 238000010998 test method Methods 0.000 claims description 2
- 238000012544 monitoring process Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 description 6
- 239000008187 granular material Substances 0.000 description 5
- 230000007547 defect Effects 0.000 description 3
- 230000001360 synchronised effect Effects 0.000 description 3
- 241000208340 Araliaceae Species 0.000 description 2
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 2
- 235000003140 Panax quinquefolius Nutrition 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 235000008434 ginseng Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- -1 Front end Chemical compound 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
- G01N15/06—Investigating concentration of particle suspensions
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
The present invention relates to a kind of for detecting the method for storage silicon chip nitrogen cabinet internal environment particle, described method includes following steps：(1) surface particles of skip test silicon chip are detected, record amounts of particles is K1；(2) test silicon wafer is positioned in film magazine, and retains gap, obtain testing cassete；(3) testing cassete is positioned in nitrogen cabinet, after placing setting time, takes out testing cassete；(4) surface particles of the test silicon wafer in the testing cassete that determination step (3) takes out, record amounts of particles are K2；(5) judge：When | K2‑K1| it is unqualified during ＞ 5；When | K2‑K1| it is qualified when≤5.The method is easy to operate, of low cost, by monitoring testing piece, can obtain the reliability of other products in nitrogen cabinet.
Description
Technical field
The invention belongs to the storage arts of semi-conductor silicon chip, are related to a kind of for detection storage silicon chip nitrogen cabinet internal environment
The method of particle.
Background technology
Silicon chip is most important semi-conducting material, and current more than 90% chip and sensor are based on single crystal silicon semiconductor
Piece is fabricated, and as the technique progress of semiconductor manufacturing industry, the expansion of die size and the continuous reduction of feature sizes are
The two main lines of integrated circuit industry technological progress, thus it is also increasingly stringenter to the quality requirement of silicon chip.The quality ginseng of silicon chip
Number mainly includes：The ginsengs such as surface particles or defect, surface metal levels, in-vivo metal FE contents, minority carrier life time, diffusion length
Number.During silicon chip is produced and processed, there is huge meaning to semiconductor manufacturings such as follow-up IC to the stringent control of these parameters.
The particle (such as dust) of silicon chip surface can influence the electric property in integrated circuit, and the particle on surface can excessively influence
Subsequent extension processing, device are formed, and cause graphic defects, epitaxy defect, component failure, the integrality for influencing wiring, and then
Product quality is caused to be lost, causes finished product rate low.So need the particle situation during stringent control Si wafer quality.
Semi-conductor silicon chip by processing, cleaning, detection, when granule number meet the requirements can mounted box (such as film magazine), after preventing
Occur silicon chip in continuous shipment returns particle, returns mist phenomenon, can be in closing lid preposition a few hours dry in nitrogen cabinet.But due to
Most of nitrogen cabinet design is all totally-enclosed environment, and without self-purification function, therefore inside may accumulate dust, these dusts are most probably
It is adhered on storage product.Lack the device of internal environment particle monitoring above the design of general nitrogen cabinet；If if pass through improvement
The structure of nitrogen cabinet increases ambient particle detector and is monitored, and will increase in cost, in addition there are one drawback, adds outside
The ambient particle detector gone cannot carry out interior school, it is necessary to which external censorship, manpower and materials cost but will increase.From this angle of drop
Degree, is solved the problems, such as using own resource.
This field needs to develop a kind of method for the granularity that can detect nitrogen cabinet internal environment, the method operation letter
It is single, without carrying out equipment improvement to nitrogen cabinet.
The content of the invention
In view of the deficiencies of the prior art, one of the objects of the present invention is to provide one kind for detecting storage silicon chip nitrogen cabinet
The method of internal environment particle, described method includes following steps：
(1) surface particles of skip test silicon chip are detected, record amounts of particles is K1；
(2) test silicon wafer is positioned in film magazine, and retains gap, obtain testing cassete；
(3) testing cassete is positioned in nitrogen cabinet, after placing setting time, takes out testing cassete；
(4) surface particles of the test silicon wafer in the testing cassete that determination step (3) takes out, record amounts of particles are K2；
(5) judge：When | K2-K1| it is unqualified during ＞ 5；When | K2-K1| it is qualified when≤5.
The present invention is the film magazine group for being mounted with skip test silicon chip by placing testing cassete, the testing cassete in nitrogen cabinet
Into, and keeping the placement status with silicon chip in nitrogen cabinet identical, such as identical film magazine, identical gap size etc. is being placed
After setting time, the amounts of particles on detection test silicon wafer surface is made comparisons with the amounts of particles on skip test silicon chip before, is sentenced
The above are to be unqualified 5 for fixed front and rear difference.
The present invention is not specifically limited for the specification of film magazine, and any film magazine that can be used in silicon chip storage is used equally for this
Invention.The film magazine specification of testing cassete of the present invention is preferably identical with the film magazine specification of silicon chip storage.
Preferably, the rated full load the piece number of the film magazine of the testing cassete is 25.
It is not specifically limited for the " loaded " position and the useful load present invention of testing cassete close beta silicon chip, but suitable dress
The accuracy in detection of internal environment particle can be improved by carrying position and useful load, and particle degree is returned especially for storage silicon chip
It can more accurately show.
Preferably, the front end of the testing cassete, middle part and rear end portion each at least place 2 built-in testing silicon chips, such as
Front end, middle part and the rear end portion of testing cassete each place 3 built-in testing silicon chips, 4 built-in testing silicon chips, 5 built-in testing silicon chips, 6
Test silicon wafer, 7 built-in testing silicon chips etc..
The front end and rear end portion of testing cassete of the present invention are to distinguish the statement of progress, and actual testing cassete is not
With front and rear point, it may be otherwise and be interpreted as one end and the other end.
Test silicon wafer is placed in the front end of testing cassete, middle part and rear end portion to be conducive to grasp nitrogen cabinet inner loop comprehensively
There is the situation for returning particle in border particle situation and storage silicon chip.
Preferably, step (3) described setting time be more than 2h, such as 3h, 4h, 5h, 6h, 7h, 8h, 9h, 10h, 11h,
12h, 13h, 14h, 15h, 16h, 17h are with first-class.
Preferably, the detection of the surface particles degree is detected using particle detector, and step (1) and step (4) are described
The test method of surface particles degree is identical.
Preferably, the operation meets ten grades of purity requirements of environment.
Described ten grades of requirements of environment, which refer to, reaches every cubic feet of 0.5 μm of Nei Ke Li≤10ea@, and every cubic feet of endoparticle
0.3 μm of≤30ea@, and every cubic feet of 0.2 μm of Nei Ke Li≤75ea@, and every cubic feet of 0.1 μm of Nei Ke Li≤350ea@,
Reach the particle of every cubic feet of 0.5 μm of endoparticle grain size or more within 10, grain size is in 0.3 μm or more of particle 30
Within, grain size is in 0.2 μm or more of particle within 75, and grain size is in 0.1 μm or more of particle within 350.
Preferably, the temperature of the nitrogen cabinet is 21~25 DEG C (such as 22 DEG C, 23 DEG C, 24 DEG C etc.), humidity for 10~
15% (such as 11%, 12%, 13%, 14% etc.).
Preferably, the nitrogen flow of the nitrogen cabinet is 95~105L/min, such as 96L/min, 97L/min, 98L/
Min, 99L/min, 100L/min, 101L/min, 102L/min, 103L/min, 104L/min etc..
The present invention is not specifically limited for the size in the gap that testing cassete retains, as long as the gap enables to nitrogen
Into testing cassete, preferably select similar to the gap that the film magazine of storage silicon chip is retained.
Compared with prior art, the present invention has the advantages that：
The present invention provides a kind of for storing the detection method of the particle of the nitrogen cabinet internal environment of silicon chip, the method
It is easy to operate, it is only necessary to the testing cassete setting time for being mounted with test silicon wafer is placed inside nitrogen cabinet, detects test silicon afterwards
Piece surface particles are compared with the granule number of skip test silicon chip, detect nitrogen cabinet in internal environment particle number, this
The method that invention provides need not be transformed nitrogen cabinet, of low cost.
Description of the drawings
Fig. 1 is the structure diagram of testing cassete.
In Fig. 1,1 is piece box cover, and 2 be film magazine, and 3 be test silicon wafer.
It is only a schematic diagram on Fig. 1, the placing direction of opening direction, test silicon wafer for test box cover,
Those skilled in the art can be adjusted as needed.
Specific embodiment
Of the invention for ease of understanding, it is as follows that the present invention enumerates embodiment.Those skilled in the art are it will be clearly understood that the implementation
Example is only to aid in understanding the present invention, is not construed as the concrete restriction to the present invention.
Embodiment 1
A kind of detection method of nitrogen cabinet internal environment particle, includes the following steps：
(1) take 68 cun silicon polished, 1 cleaning, 8 cun of film magazines, the silicon chip after detection polishing as skip test silicon chip,
Optical particulate detector Tencor SP1 are selected, calling test program recipe, (the test program recipe is that can test
The program of amounts of particles below 0.2 μm of grain size), the surface particles number of skip test silicon chip is detected, record amounts of particles is K1；
(2) test silicon wafer is positioned over No. 1 card slot of the film magazine, No. 5 card slots, No. 10 card slots, No. 15 card slots, 20
In number card slot, No. 25 card slots, film magazine lid half covers, and retains sufficiently large gap, enters nitrogen, and when operation can be by piece box cover one
Side buckle fastening, opposite side buckle nature, which is fallen, not to be detained, obtains testing cassete, schematic construction is as shown in Figure 1；
(3) testing cassete that step (2) obtains is positioned in nitrogen cabinet, the temperature of nitrogen cabinet sets 23 ± 2 DEG C, humidity
10%~15%, flow 100 ± 5L/min flows place 2h, take out testing cassete afterwards；
(4) the test program recipe detections for selecting optical particulate detector Tencor SP1 invocation steps (1) identical are surveyed
The surface particles degree of test silicon wafer in box is tried, record amounts of particles is K2；
(5) calculate | K2-K1|, result of calculation is as shown in table 1：
Table 1
As it can be seen from table 1 test silicon wafer before testing after, the increase of amounts of particles is less than 3, in the error of detection device
Within, it can be determined that for nitrogen cabinet described in the 2h periods during silicon chip is stored, internal environment amounts of particles is qualified.
Checking test 1：
It is synchronous to utilize existing ambient particle detector (air atom sub-count device KA-82) above step (3),
Sample tap is placed in nitrogen cabinet, particle situation of the dynamically recording in this 2h nitrogen cabinet, the setting of ambient particle detector is every
1.5min records a data, every cubic feet of endoparticle of the results show>@0.1um are 0ea, it can therefore be seen that nitrogen cabinet
Internal environment granule number is qualified, coincide with the conclusion of embodiment 1.
Embodiment 2
Difference lies in be positioned over the testing cassete that step (2) obtains in nitrogen cabinet, place 4h, Zhi Houqu with embodiment 1
Go out testing cassete, test result is as shown in table 2：
Table 2
From table 2 it can be seen that test silicon wafer before testing after, the increase of amounts of particles is less than 3, in the error of detection device
Within, it can be determined that during the nitrogen cabinet stores silicon chip in this 4h, internal environment amounts of particles is qualified.
Checking test 2：
It is synchronous to utilize existing ambient particle detector (air atom sub-count device KA-82) above step (3),
Sample tap is placed in nitrogen cabinet, particle situation of the dynamically recording in this 4h nitrogen cabinet, the setting of ambient particle detector is every
1.5min records a data, every cubic feet of endoparticle of the results show>0.1 μm of maximum of@is 2ea, it can therefore be seen that nitrogen
Gas holder internal environment granule number is qualified, coincide with the conclusion of embodiment 2.
Embodiment 3
Difference lies in be positioned over the testing cassete that step (2) obtains in nitrogen cabinet, place 6h, Zhi Houqu with embodiment 1
Go out testing cassete, test result is as shown in table 3：
Table 3
From table 3 it can be seen that test silicon wafer before testing after, the increase of amounts of particles is more than 5, more than acceptable model
It encloses, nitrogen cabinet environmental abnormality, these testing pieces are stain.
Checking test 3：
It is synchronous to utilize existing ambient particle detector (air atom sub-count device KA-82) above step (3),
Sample tap is placed in nitrogen cabinet, particle situation of the dynamically recording in this 6h nitrogen cabinet, the setting of ambient particle detector is every
1.5min records a data, every cubic feet of endoparticle of the results show>0.3 μm of maximum of@is 36ea, abnormal exceeded, therefore
As can be seen that nitrogen cabinet internal environment granule number is unqualified, it coincide with the conclusion of embodiment 3.
Applicant states that the present invention illustrates the detailed process equipment of the present invention and technological process by above-described embodiment,
But the invention is not limited in above-mentioned detailed process equipment and technological processes, that is, it is above-mentioned detailed not mean that the present invention has to rely on
Process equipment and technological process could be implemented.Person of ordinary skill in the field it will be clearly understood that any improvement in the present invention,
The addition of equivalence replacement and auxiliary element to each raw material of product of the present invention, selection of concrete mode etc. all fall within the present invention's
Within protection domain and the open scope.
Claims (8)
- A kind of 1. method for detection storage silicon chip nitrogen cabinet internal environment particle, which is characterized in that the described method includes such as Lower step：(1) surface particles of skip test silicon chip are detected, record amounts of particles is K1；(2) test silicon wafer is positioned in film magazine, and retains gap, obtain testing cassete；(3) testing cassete is positioned in nitrogen cabinet, after placing setting time, takes out testing cassete；(4) surface particles of the test silicon wafer in the testing cassete that determination step (3) takes out, record amounts of particles are K2；(5) judge：When | K2-K1| it is unqualified during ＞ 5；When | K2-K1| it is qualified when≤5.
- 2. the method as described in claim 1, which is characterized in that the rated full load the piece number of the film magazine of the testing cassete is 25.
- 3. the method as described in claim 1, which is characterized in that the front end of the testing cassete, middle part and rear end portion are respective At least place 2 built-in testing silicon chips.
- 4. the method as described in claim 1, which is characterized in that step (3) described setting time is more than 2h.
- 5. the method as described in claim 1, which is characterized in that the detection of the surface particles degree is examined using particle detector It surveys, and step (1) is identical with the test method of step (4) the surface particles degree.
- 6. the method as described in claim 1, which is characterized in that the operation meets ten grades of purity requirements of environment.
- 7. the method as described in claim 1, which is characterized in that the temperature of the nitrogen cabinet is 21~25 DEG C, humidity for 10~ 15%.
- 8. the method as described in claim 1, which is characterized in that the nitrogen flow of the nitrogen cabinet is 95~105L/min.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711219064.0A CN108051347A (en) | 2017-11-28 | 2017-11-28 | A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle |
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| CN201711219064.0A CN108051347A (en) | 2017-11-28 | 2017-11-28 | A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle |
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| CN201711219064.0A Pending CN108051347A (en) | 2017-11-28 | 2017-11-28 | A kind of method for detection storage silicon chip nitrogen cabinet internal environment particle |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109904087A (en) * | 2019-01-14 | 2019-06-18 | 全球能源互联网研究院有限公司 | A kind of detection method and device of semiconductor wafer surface granularity |
| CN111879542A (en) * | 2020-07-30 | 2020-11-03 | 徐州鑫晶半导体科技有限公司 | Method and device for detecting cleaning capacity of cleaning machine |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02281548A (en) * | 1989-04-24 | 1990-11-19 | Sumitomo Eaton Noba Kk | Particle measurement device in wafer processing room |
| JP2000019095A (en) * | 1998-06-30 | 2000-01-21 | Nec Kyushu Ltd | Device and method for measuring degree of cleanness of clean room |
| US20020142617A1 (en) * | 2001-03-27 | 2002-10-03 | Stanton Leslie G. | Method for evaluating a wafer cleaning operation |
| US20090064760A1 (en) * | 2007-09-07 | 2009-03-12 | Tokyo Electron Limited | Container cleanliness measurement apparatus and method, and substrate processing system |
| CN104716069A (en) * | 2015-03-23 | 2015-06-17 | 上海华力微电子有限公司 | Method and device for monitoring internal environment of wafer acceptability testing machine |
| CN106898559A (en) * | 2015-12-18 | 2017-06-27 | 有研半导体材料有限公司 | A kind of semiconductor crystal wafer film magazine particle detection technique |
-
2017
- 2017-11-28 CN CN201711219064.0A patent/CN108051347A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02281548A (en) * | 1989-04-24 | 1990-11-19 | Sumitomo Eaton Noba Kk | Particle measurement device in wafer processing room |
| JP2000019095A (en) * | 1998-06-30 | 2000-01-21 | Nec Kyushu Ltd | Device and method for measuring degree of cleanness of clean room |
| US20020142617A1 (en) * | 2001-03-27 | 2002-10-03 | Stanton Leslie G. | Method for evaluating a wafer cleaning operation |
| US20090064760A1 (en) * | 2007-09-07 | 2009-03-12 | Tokyo Electron Limited | Container cleanliness measurement apparatus and method, and substrate processing system |
| CN104716069A (en) * | 2015-03-23 | 2015-06-17 | 上海华力微电子有限公司 | Method and device for monitoring internal environment of wafer acceptability testing machine |
| CN106898559A (en) * | 2015-12-18 | 2017-06-27 | 有研半导体材料有限公司 | A kind of semiconductor crystal wafer film magazine particle detection technique |
Non-Patent Citations (1)
| Title |
|---|
| 张吉光 等: "《净化空调》", 30 September 2003 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109904087A (en) * | 2019-01-14 | 2019-06-18 | 全球能源互联网研究院有限公司 | A kind of detection method and device of semiconductor wafer surface granularity |
| CN111879542A (en) * | 2020-07-30 | 2020-11-03 | 徐州鑫晶半导体科技有限公司 | Method and device for detecting cleaning capacity of cleaning machine |
| CN111879542B (en) * | 2020-07-30 | 2023-02-28 | 徐州鑫晶半导体科技有限公司 | Method and device for detecting cleaning capacity of cleaning machine |
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Application publication date: 20180518 |