CN107966362A - A kind of metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig - Google Patents
A kind of metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig Download PDFInfo
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- CN107966362A CN107966362A CN201710935304.0A CN201710935304A CN107966362A CN 107966362 A CN107966362 A CN 107966362A CN 201710935304 A CN201710935304 A CN 201710935304A CN 107966362 A CN107966362 A CN 107966362A
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- 239000001257 hydrogen Substances 0.000 title claims abstract description 117
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 117
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 title claims abstract description 113
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 43
- 239000002184 metal Substances 0.000 title claims abstract description 43
- 238000005530 etching Methods 0.000 title claims abstract description 25
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000009413 insulation Methods 0.000 claims abstract description 23
- 125000006850 spacer group Chemical group 0.000 claims abstract description 16
- 230000005518 electrochemistry Effects 0.000 claims abstract description 14
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 13
- 238000005276 aerator Methods 0.000 claims abstract description 11
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims 1
- 230000007797 corrosion Effects 0.000 abstract description 5
- 238000005260 corrosion Methods 0.000 abstract description 5
- 229910000831 Steel Inorganic materials 0.000 abstract description 2
- 238000004458 analytical method Methods 0.000 abstract description 2
- 238000001514 detection method Methods 0.000 abstract description 2
- 238000009776 industrial production Methods 0.000 abstract description 2
- 238000005259 measurement Methods 0.000 abstract description 2
- 239000010959 steel Substances 0.000 abstract description 2
- 238000010998 test method Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000012360 testing method Methods 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000003792 electrolyte Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 230000006378 damage Effects 0.000 description 3
- 238000005242 forging Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/08—Investigating strength properties of solid materials by application of mechanical stress by applying steady tensile or compressive forces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/02—Details
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/02—Details
- G01N3/04—Chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/0014—Type of force applied
- G01N2203/0016—Tensile or compressive
- G01N2203/0017—Tensile
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/022—Environment of the test
- G01N2203/0236—Other environments
- G01N2203/024—Corrosive
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/026—Specifications of the specimen
- G01N2203/0262—Shape of the specimen
- G01N2203/0278—Thin specimens
- G01N2203/0282—Two dimensional, e.g. tapes, webs, sheets, strips, disks or membranes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/04—Chucks, fixtures, jaws, holders or anvils
- G01N2203/0423—Chucks, fixtures, jaws, holders or anvils using screws
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Sampling And Sample Adjustment (AREA)
- Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
Abstract
The present invention relates to metal to be flushed with hydrogen test method and stress corrosion fields of measurement, is specially that a kind of metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, suitable for more demanding to hydrogen concentration condition and sample loading is carried out at the same time the system being flushed with hydrogen.The device includes sample insulation loading device and electrochemistry hydrogen aerator, it is mainly provided with one group of dielectric holder, one group of plate tensile sample fixture, a tensile sample, a pair of of insulation spacer, a pair of of loading nut, a pair of of connecting screw, one section of platinized platinum and a DC power supply, its is easy to operate, it is flushed with hydrogen while can realizing and sample is loaded, and can accurately controls and be flushed with hydrogen concentration, be easy to Real Time Observation sample stress corrosion state.The device overall dimensions are smaller, are adapted to promote the use of in the lab, also can extensive use in fields such as the large-scale industrial production such as steel, coloured, detection and analysis.
Description
Technical field
The present invention relates to metal to be flushed with hydrogen test method and stress corrosion fields of measurement, is specially a kind of metal plate-like sample
Dynamic is flushed with hydrogen tensile stress etching experimental rig, suitable for more demanding to hydrogen concentration condition and sample loading is carried out at the same time and fills
In the system of hydrogen.
Background technology
Hydrogen in metal is a kind of harmful but is difficult to the impurity element avoided completely, and hydrogen is from air or in hydrogeneous ring
The hydrogen of material internal is entered when being on active service in border and hydrogen that electrochemical cathode reflection process produces, its harm to metal are mainly
Cause the reduction of metal toughness, the failure of metal forging can be caused when serious, this phenomenon is referred to as hydrogen embrittlement.
Hydrogen embrittlement can be divided into two classes according to the relation of strain rate when itself and loading:1. Hydrogen Embrittlement is with judgement of speed change during loading
The increase of rate and raise, the white point in large forgings i.e. belong to first kind hydrogen embrittlement.Before loading, hydrogen forms damage in a metal
Wound, with the increase of loading strain rate, initial hydrogen loss injury forms great stress concentration so that crack propagation velocity increases
Greatly, brittleness is caused to increase;2. Hydrogen Embrittlement reduces, the delayed fracture of metal and large-scale with the increase of strain rate during loading
The putting to split of forging belongs to the second class hydrogen embrittlement.Before loading, hydrogen embrittlement source is not yet formed in metal, but during loading, with
Stress, the reciprocation of strain, the continuous diffusion aggregation of hydrogen, gradually forms hydrogen embrittlement source and cause brittleness to increase.For guarantee fund
Belong to material security in use, it is necessary to research understand the basic mechanism that hydrogen content influences brittleness, it is necessary to
Sensitivity of Stress Corrosion test is carried out to the sample of different hydrogen contents in laboratory conditions.
The process that hydrogen enters metal inside is divided into four-stage:
1. gas molecule is spread to metal surface;
2. absorption, decomposition and the chemisorption of molecule on the metal surface;
3. from atom transfer of the chemisorption layer into lattice;
4. the transfer of atom in metal lattice.
Hydrogen is separated out from metal, is made of three continuous process:
1. the hydrogen of dissolving is from metal inside to surface migration (diffusion phase)
2. state of atom hydrogen escapes metal surface and forms hydrogen molecule;
3. hydrogen molecule is from metal surface, desorption enters gas phase.
It is commonplace at present that method is flushed with hydrogen on static state of the sample under the conditions of not loaded, such as:
First, room temperature gas phase is flushed with hydrogen:Sample is placed directly within High Purity Hydrogen at room temperature, hydrogen by by absorption, dissolving, diffusion
Process enters sample.The rule dissolved according to physics, the rule of chemisorbed and hydrogen, the higher hydrogen of hydrogen pressure enter the speed of sample more
It hurry up, the amount that time longer hydrogen enters sample is more.Method is flushed with hydrogen due to this, even if entering material using very high hydrogen pressure energy
Hydrogen content is also limited;
2nd, high temperature and pressure is flushed with hydrogen:Need to carry out in autoclave, remain that the hydrogen in autoclave is dense under high temperature and pressure
Degree, usual laboratory is difficult to possess such experimental condition, and there is also very big hidden danger from a security point of view;
3rd, electrochemistry is flushed with hydrogen:It is the cathode that sample is placed on to electrolytic cell that conventional electrochemistry, which is flushed with hydrogen, and platinized platinum is cooked anode,
Sample does cathode, hydrogen is entered metal inside using the cathode effect of electrolytic process.The H for ionizing out in electrolyte+In cathode
Electronics is obtained, hydrogen atom is formed and adsorbs in cathode surface, a hydrogen atom part for absorption is by going adsorption and diffusion to enter sample;
Another part is combined into hydrogen molecule in specimen surface, becomes H2Bubble escapes electrolyte.When electrolysis is flushed with hydrogen, the component of electrolyte,
The temperature of electrolyte and the material status of sample itself etc. all have an impact the effect being flushed with hydrogen when being flushed with hydrogen current density, being flushed with hydrogen.
In addition, sample is fetched into formal test from being flushed with hydrogen in environment after being flushed with hydrogen, this process needs the regular hour, at this time greatly
The hydrogen of amount can be escaped from sample, this just makes inside sample it cannot be guaranteed that fixed hydrogen concentration.
In summary, it is necessary to develop a kind of simple equipment, operation facility, the dynamic of precise control and be flushed with hydrogen experiment dress
Put.
The content of the invention
For problems of the prior art, present invention is primarily aimed at provide a kind of metal plate-like sample dynamic to fill
Hydrogen tensile stress etching experimental rig, the amount of being flushed with hydrogen is limited in the prior art for solution, the problem of spilling there are security risk and hydrogen.
Technical scheme is as follows:
A kind of metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, the device include insulation loading device and
Electrochemistry hydrogen aerator, wherein:
The loading device that insulate is equipped with a pair of plate tensile sample one, plate tensile sample fixture, dielectric holder a pair, loading nut one
A pair of to, connecting screw, dielectric holder is connected to the collet up and down of stretching-machine by pin during work, plate tensile sample it is upper and lower
Bare terminal end is connected by pin with the plate tensile sample fixture being put into, by matching between plate tensile sample fixture and dielectric holder
Loading nut connected with connecting screw;
Electrochemistry hydrogen aerator is equipped with DC power supply one, one section of platinized platinum, and when work connects plate tensile sample by conducting wire
In the cathode of DC power supply, platinized platinum is connected to the anode of DC power supply.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, dielectric holder symmetrical above and below difference
It is connected by dielectric holder pinned hole with stretching-machine, two insulation spacers are respectively fitted over the outer of connecting screw symmetrical above and below
Face, two loading nuts are threaded on the external screw thread of lower symmetrical connecting screw one end respectively, and dielectric holder passes through connecting screw
The external screw thread of the other end is connected with plate tensile sample fixture.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and the shape of dielectric holder is column,
It radially opens up dielectric holder pinned hole with stretching-machine connected component, it is opened up with connecting screw connected component along central axis
The structure of stepped hole and side band opening, the stepped hole are used to accommodate loading nut and insulation spacer, and the opening is with adding
Carry nut and connecting screw is corresponding, connected loading nut and connecting screw is clamped by opening and dielectric holder, insulation
Gasket is between loading nut and dielectric holder corresponding surface.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, the upper and lower ends difference of plate tensile sample
It is placed in plate tensile sample fixture placing groove symmetrical above and below, and be connected by plate tensile sample pin hole with plate tensile sample fixture.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and the shape of plate tensile sample fixture is column
Shape, it opens up the internal thread coordinated with connecting screw with connecting screw connected component along central axis, it is connected with plate tensile sample
Part radially opens up plate tensile sample fixture placing groove, and plate tensile sample fixture opens up tabular in plate tensile sample fixture placing groove both sides
Sample pin hole, bare terminal end and the inserting of plate tensile sample fixture placing groove of plate tensile sample coordinate, the bare terminal end perforate of plate tensile sample
It is connected with plate tensile sample pin hole by pin.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and platinized platinum is placed in parallel in plate tensile sample
Gauge length section on the outside of.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and the outside diameter for loading nut should be with insulation
The internal diameter matching of fixture, the external screw thread of the internal thread and connecting screw that load nut match.
Described metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and the dielectric holder on dielectric holder is worn
The collet up and down of pin hole and stretching-machine is connected in a manner of wearing pin.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, electrochemistry hydrogen aerator and insulating blanked clamper
The connected connecting screw outer sheath of tool has insulation spacer made of zirconia ceramics.
The metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, and electrochemistry hydrogen aerator passes through sample
The surface area of gauge length section and the input current of DC power supply calculate current density size when sample is flushed with hydrogen.
The present invention design philosophy be:
The existing method that is flushed with hydrogen needs to carry out in high temperature and high pressure environment, and usual laboratory does not possess such condition, and
High temperature and pressure is flushed with hydrogen that there is also larger hidden danger.In addition, the conventional method that is flushed with hydrogen carries out tension test again after being flushed with hydrogen.It is first
First, by sample since be flushed with hydrogen under environment be fetched into it is formal test this process and need the regular hour;Secondly, proceeding by
Since strain rate is relatively low during slow strain rate test, experiment is often also required to longer time;This process causes greatly
The hydrogen of amount is escaped from sample, this just makes inside sample it cannot be guaranteed that certain hydrogen concentration.Pass through the method for the present invention, it is possible to achieve
Metal material is flushed with hydrogen while tension test is carried out, and both without security risk, also allows for laboratory's operation, while can be with
Ensure fixed hydrogen concentration.In addition, the present invention use lamellar tensile sample, since specimen size is small, it is therefore desirable to raw material
It is few, it is easy to process;Simultaneously because sample thickness is small, be conducive to uniform diffusion of the hydrogen inside sample.
The present invention has the advantage that and beneficial effect:
1. sample holder end of the present invention is by the force axis connection of dielectric holder and stretching-machine, can accurately control load it is big
It is small.
2. the present invention will be insulated by zirconium oxide insulation spacer between sample and fixture, can be while electrochemistry is flushed with hydrogen
The loading of sample is carried out, effectively avoids the spilling of hydrogen.
3. the present invention can save test material by being located at the loading nut at sample holder end and realize insulation spacer
Place.
4. the present invention can obtain higher hydrogen concentration.
5. the present invention can directly be calculated by adjusting the input current of DC power supply and the surface area of sample marking distance section
Current density size when sample is flushed with hydrogen, realizes that control is flushed with hydrogen current density and is flushed with hydrogen the purpose of time.
6. the present invention is easy to operate, relatively low without security risk, equipment cost.
7. the present invention use lamellar tensile sample, since specimen size is small, it is therefore desirable to raw material it is few, it is easy to process;
Simultaneously as sample thickness is small, be conducive to uniform diffusion of the hydrogen inside sample.
Brief description of the drawings
Fig. 1 is the structure diagram of the present invention;
In figure, 1. dielectric holders;2. dielectric holder pinned hole;3. load nut;4. insulation spacer;5. connecting screw;6.
Plate tensile sample fixture;7. plate tensile sample fixture placing groove;8. plate tensile sample pin hole;9. plate tensile sample;10. platinized platinum;11. direct current
Power supply;12. bare terminal end;13. bare terminal end perforate;14. stepped hole;15. opening.
Embodiment
In specific implementation process, the present invention includes sample insulation loading device and electrochemistry hydrogen aerator, is mainly provided with
One group of dielectric holder, one group of plate tensile sample fixture, a tensile sample, a pair of of insulation spacer, a pair of of loading nut, a pair of connection
Screw rod, one section of platinized platinum and a DC power supply.The device is easy to operate, is flushed with hydrogen while can realizing and sample is loaded,
And it can accurately control and be flushed with hydrogen concentration, be easy to Real Time Observation sample stress corrosion state.
Structure of the present invention is described in detail with reference to the accompanying drawings and examples.
Embodiment
As shown in Figure 1, the present embodiment dynamic electric chemical hydrogen charged experimental rig is structure symmetrical above and below, including insulation loading dress
Put with electrochemistry hydrogen aerator, which is mainly provided with a pair of of dielectric holder 1, and (each one), a pair of of insulation spacer 4 are (each up and down up and down
One), ((each one), a pair of of connecting screw 5 are (each up and down up and down for each one), a pair of of loading nut 3 up and down for a pair of plate-shaped specimen holder 6
One), 9, one sections of plate tensile sample DC power supply 11 of platinized platinum 10, one etc., concrete structure is as follows:
Dielectric holder 1 symmetrical above and below is connected by dielectric holder pinned hole 2 with stretching-machine respectively, two insulation spacers
4 are respectively fitted over the outside of connecting screw 5 symmetrical above and below, and two loading nuts 3 are threaded on lower symmetrical connecting screw 5 one respectively
On the external screw thread at end, dielectric holder 1 is connected by the external screw thread of 5 other end of connecting screw with plate tensile sample fixture 6.Dielectric holder
1 shape is column, it radially opens up dielectric holder pinned hole 2 with stretching-machine connected component, its portion that is connected with connecting screw 5
Divide the structure that stepped hole 14 and side band opening 15 are opened up along central axis, the stepped hole 14 accommodates loading 3 He of nut respectively
Wear connecting screw 5, it is corresponding with loading nut 3 and connecting screw 5 at the opening 15, make connected loading nut 3 and company
Connect screw rod 5 to be clamped by opening 15 and dielectric holder 1, insulation spacer 4 is between loading 1 corresponding surface of nut 3 and dielectric holder.
The upper and lower ends of plate tensile sample 9 are individually positioned in the plate tensile sample fixture placing groove 7 of specimen holder 6 symmetrical above and below
It is interior, and be connected by plate tensile sample pin hole 8 with plate tensile sample fixture 6.The shape of plate tensile sample fixture 6 is column, it is with connecting
Connect 5 connected component of screw rod and the internal thread coordinated with connecting screw 5, itself and 9 connected component edge of plate tensile sample are opened up along central axis
Plate tensile sample fixture placing groove 7 is radially opened up, plate tensile sample fixture 6 opens up tabular examination in 7 both sides of plate tensile sample fixture placing groove
Sample pin hole 8, bare terminal end 12 and the inserting of plate tensile sample fixture placing groove 7 of plate tensile sample 9 coordinate, the bare terminal end of plate tensile sample 9
Perforate 13 is connected with plate tensile sample pin hole 8 by pin.
Platinized platinum 10 is placed in parallel on the outside of the gauge length section of plate tensile sample 9, and platinized platinum 10 is connected with the anode of DC power supply 11, plate
Shape sample 9 is connected with the cathode of DC power supply 11.
In the present embodiment, connecting screw 5 is connected with dielectric holder 1 by loading nut 3, therefore loads the outer of nut 3
Footpath should be matched with the internal diameter of dielectric holder 1, and the internal thread of loading nut 3 should match with the external screw thread of connecting screw 5.
In the present embodiment, by the collet up and down of the dielectric holder pinned hole 2 on dielectric holder 1 and stretching-machine to wear pin
Mode connects.
In the present embodiment, insulation spacer 4 is made with zirconia ceramics, and the gauge length section of plate tensile sample 9 is with external application silica gel sealing.
Embodiment the result shows that, apparatus of the present invention are easy to operate, without security risk, and equipment cost is relatively low, can be in electrification
The loading tested while be flushed with hydrogen is learned, effectively avoids hydrogen from overflowing, and can be controlled and be flushed with hydrogen current density and be flushed with hydrogen the time.Should
Device overall dimensions are smaller, are adapted to promote the use of in the lab, in the large-scale industrial production such as steel, coloured, detection and analysis
Also can extensive use Deng field.
Claims (10)
1. a kind of metal plate-like sample dynamic is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that the device includes insulation
Loading device and electrochemistry hydrogen aerator, wherein:
The loading device that insulate be equipped with plate tensile sample one, plate tensile sample fixture are a pair of, dielectric holder is a pair of, loading nut is a pair of,
Connecting screw is a pair of, and dielectric holder is connected to the collet up and down of stretching-machine, the upper and lower clamping of plate tensile sample by pin during work
End is connected by pin with the plate tensile sample fixture being put into, and is added between plate tensile sample fixture and dielectric holder by matching used
Nut is carried to connect with connecting screw;
Electrochemistry hydrogen aerator is equipped with DC power supply one, one section of platinized platinum, and plate tensile sample is connected to directly by when work by conducting wire
The cathode in galvanic electricity source, platinized platinum are connected to the anode of DC power supply.
2. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
Dielectric holder symmetrical above and below is connected by dielectric holder pinned hole with stretching-machine respectively, and two insulation spacers are respectively fitted over
The outside of symmetrical connecting screw down, two loading nuts are threaded on the external screw thread of lower symmetrical connecting screw one end respectively,
Dielectric holder is connected by the external screw thread of the connecting screw other end with plate tensile sample fixture.
3. being flushed with hydrogen tensile stress etching experimental rig according to the metal plate-like sample dynamic described in claim 1 or 2, its feature exists
In:The shape of dielectric holder is column, it radially opens up dielectric holder pinned hole with stretching-machine connected component, it is with being connected spiral shell
Bar connected component opens up the structure of stepped hole and side band opening along central axis, and the stepped hole is used to accommodate loading nut
And insulation spacer, the opening is corresponding with loading nut and connecting screw, leads to connected loading nut and connecting screw
Cross opening to be clamped with dielectric holder, insulation spacer is between loading nut and dielectric holder corresponding surface.
4. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
The upper and lower ends of plate tensile sample are individually positioned in plate tensile sample fixture placing groove symmetrical above and below, and pass through plate tensile sample pin
Hole is connected with plate tensile sample fixture.
5. being flushed with hydrogen tensile stress etching experimental rig according to the metal plate-like sample dynamic described in claim 1 or 4, its feature exists
In:The shape of plate tensile sample fixture is column, it is opened up with connecting screw connected component along central axis coordinates with connecting screw
Internal thread, it radially opens up plate tensile sample fixture placing groove with plate tensile sample connected component, and plate tensile sample fixture is in tabular
Specimen holder placing groove both sides open up plate tensile sample pin hole, and bare terminal end and the plate tensile sample fixture placing groove of plate tensile sample insert
Coordinate, the bare terminal end perforate of plate tensile sample is connected with plate tensile sample pin hole by pin.
6. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
Platinized platinum is placed in parallel on the outside of the gauge length section of plate tensile sample.
7. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
The outside diameter of loading nut should be matched with the internal diameter of dielectric holder, load the internal thread of nut and the external screw thread phase of connecting screw
Match somebody with somebody.
8. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
The collet up and down of dielectric holder pinned hole and stretching-machine on dielectric holder is connected in a manner of wearing pin.
9. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, it is characterised in that:
The connecting screw outer sheath that electrochemistry hydrogen aerator is connected with dielectric holder has insulation spacer made of zirconia ceramics.
10. metal plate-like sample dynamic described in accordance with the claim 1 is flushed with hydrogen tensile stress etching experimental rig, its feature exists
In:Electrochemistry hydrogen aerator is calculated when sample is flushed with hydrogen by the surface area of sample marking distance section and the input current of DC power supply
Current density size.
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CN201710935304.0A CN107966362B (en) | 2017-10-10 | 2017-10-10 | Dynamic hydrogen-charging tensile stress corrosion test device for metal plate-shaped sample |
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CN201710935304.0A CN107966362B (en) | 2017-10-10 | 2017-10-10 | Dynamic hydrogen-charging tensile stress corrosion test device for metal plate-shaped sample |
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CN107966362B CN107966362B (en) | 2024-05-17 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN110161105A (en) * | 2019-06-25 | 2019-08-23 | 南京工业大学 | A kind of original position is flushed with hydrogen experimental provision |
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