CN107942528A - A kind of bore hole 3D display equipment and preparation method thereof - Google Patents

A kind of bore hole 3D display equipment and preparation method thereof Download PDF

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Publication number
CN107942528A
CN107942528A CN201810003163.3A CN201810003163A CN107942528A CN 107942528 A CN107942528 A CN 107942528A CN 201810003163 A CN201810003163 A CN 201810003163A CN 107942528 A CN107942528 A CN 107942528A
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China
Prior art keywords
ito
thickness
layers
layer
bore hole
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Granted
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CN201810003163.3A
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CN107942528B (en
Inventor
张子敬
袁洪亮
武晓娟
马力
陈会顺
郑琪
赵志强
毕谣
周康迪
马少武
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BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
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Priority to CN201810003163.3A priority Critical patent/CN107942528B/en
Publication of CN107942528A publication Critical patent/CN107942528A/en
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B30/00Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
    • G02B30/20Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes
    • G02B30/26Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type
    • G02B30/27Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images by providing first and second parallax images to an observer's left and right eyes of the autostereoscopic type involving lenticular arrays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

This application discloses a kind of bore hole 3D display equipment and preparation method thereof, it is related to Display Technique, the equipment is provided between CF ITO layers and glass substrate increases layer, its position is corresponding with the first ITO, and, the material for increasing layer is transparent material, and the thickness for increasing layer is less than two times of the sum of the thickness of thickness and the 2nd ITO at PVX layers of corresponding first ITO.By setting this to increase layer, reduce the distance between CF ITO layers and the first ITO, and then reduce the gap of the distance between the distance between CF ITO layers and the first ITO and CF ITO layers and the 2nd ITO, so as to reduce the difference of LC deflections, brightness is different caused by reducing liquid crystal deflection difference, reduces bright line existing for black state.

Description

A kind of bore hole 3D display equipment and preparation method thereof
Technical field
The disclosure relates generally to Display Technique, and in particular to 3D display technology, more particularly to a kind of bore hole 3D display equipment And preparation method thereof.
Background technology
The appearance of bore hole 3D mobile phones has attracted the eyeball of consumer significantly, its basic principle is on common 2D display screens basis One grating of upper addition so that interaction shows R (right eye use) and L (left eye use) image on liquid crystal panel.If in the liquid crystal One slit (for example, longitudinal strip shadow shield) for playing the role of shadow shield is set on panel, then above-mentioned interaction is shown Eye image will only reach right eye, and left-eye image only reaches left eye, as shown in Figure 1, display device includes:Left-eye view 101, right-eye view 102, grating open region 103 and grating are remained silent area 104, and left eye 105 and right eye are also shown in Fig. 1 106.For the beholder immediately ahead of picture, due to generating binocular parallax, stereoscopic vision as a result just can be obtained.
A kind of new switchable grating is currently there are, i.e., pasting one in original display screen above/below can Draining crystalline substance raster box, so as to realize the on off state switching of grid when to voltage.
The basic principle of liquid crystal grating is as shown in Fig. 2, the liquid crystal display includes:Glass substrate 201, CF ITO202, 2nd ITO203, the first ITO204 and PVX layers 205, the liquid crystal grating are TN patterns, and when normal use, ITO does not power, For normal white mode, what is visually seen is normal 2D effects, and when needing 3D display, its corresponding ITO is opened, liquid crystal light Grid are changed into chequered with black and white raster mode, so as to fulfill bore hole 3D effect.
Such grating to electrically as shown in figure 3, show some articles of the 2nd ITO203 and the first ITO204 in Fig. 3, White area represents the 2nd ITO203, and hatched example areas represents the first ITO204, the ITO bars number (being assumed to be x bars) and human eye of black state The width of viewing ratio and ITO are related, and when 3D is opened, adjacent x articles of ITO (includes the first ITO and second at black state ITO rated voltage) is given, adjacent x bars ITO does not give voltage at white state, so as to chequered with black and white grating fringe occur, to occur 3D effect.
But it was found by the inventors of the present invention that the liquid crystal grating of this class formation more or less there are the problem of bright line, this is Although since the first ITO and the 2nd ITO give voltage identical, and the electric field of TN types is longitudinal electric field, its rated voltage and TFT and Distance dependent between the ITO of CF, therefore, in structure as shown in Figure 2, when the first ITO and the 2nd ITO give same voltage, Due to PVX layers of presence so that its D ≠ d so that its VOP is differed, so that cause its corresponding LC deflection to have differences, liquid Crystalline substance deflection difference causes its brightness different, so as to cause the presence for having bright line in black state.
The content of the invention
In view of drawbacks described above of the prior art or deficiency, are intended to provide a kind of bore hole 3D display equipment and its making side Method, to obtain more preferable 3D display effect.
In a first aspect, the embodiment of the present invention provides a kind of bore hole 3D display equipment, including:
To increase layer, be arranged between color film tin indium oxide CF ITO layers and glass substrate, its position is corresponding with the first ITO, Also, the material for increasing layer is transparent material, the thickness for increasing layer is less than the thickness at PVX layers of corresponding first ITO With two times of the sum of the thickness of the 2nd ITO.
Further, the material for increasing layer is insulating materials.
It is further, described that to increase the material that layer uses be organic resin OC materials.
Preferably, the layer that increases is arranged on below CF ITO layers.
Further, the material for increasing layer is ITO
Preferably, it is described increase layer thickness be specially:
The sum of thickness of thickness and the 2nd ITO at PVX layers of the first ITO of correspondence.
Second aspect, the embodiment of the present invention correspondingly provide a kind of bore hole 3D display equipment making method, including:
Made in position corresponding with the first ITO and increase layer, which is transparent material, the layer that increases Thickness is less than two times of the sum of the thickness of thickness and the 2nd ITO at PVX layers of corresponding first ITO;
Make color film tin indium oxide CF ITO layers.
It is further, described that to increase the material that layer uses be organic resin OC materials.
Preferably, it is described increase layer thickness be specially:
The sum of thickness of thickness and the 2nd ITO at PVX layers of the first ITO of correspondence.
The third aspect, the embodiment of the present invention also provide a kind of bore hole 3D display equipment making method, including:
Make color film tin indium oxide CF ITO layers;
In the position of corresponding 2nd ITO, the CF ITO of etch away sections thickness.
The embodiment of the present invention provides a kind of bore hole 3D display equipment and preparation method thereof, and the equipment is in CF ITO layers and glass It is provided between substrate and increases layer, its position is corresponding with the first ITO, also, the material for increasing layer is transparent material, increases layer Thickness is less than two times of the sum of the thickness of thickness and the 2nd ITO at PVX layers of corresponding first ITO.By setting this to increase layer, subtract Small the distance between CF ITO layers and the first ITO, and then reduce the distance between CF ITO layers and the first ITO and CF ITO The gap of layer and the distance between the 2nd ITO, so as to reduce the difference of LC deflections, reduces brightness caused by liquid crystal deflection difference Difference, reduces bright line existing for black state.
Brief description of the drawings
By reading the detailed description made to non-limiting example made with reference to the following drawings, the application's is other Feature, objects and advantages will become more apparent upon:
Fig. 1 is bore hole 3D display principle schematic in the prior art;
Fig. 2 is bore hole 3D display device structure schematic diagram in the prior art;
Fig. 3 is bore hole 3D display equipment grating in the prior art to electrically schematic diagram;
Fig. 4 is bore hole 3D display device structure schematic diagram provided in an embodiment of the present invention;
Fig. 5 is one of bore hole 3D display equipment making method flow diagram provided in an embodiment of the present invention;
Fig. 6 is the two of bore hole 3D display equipment making method flow diagram provided in an embodiment of the present invention.
Embodiment
The application is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched The specific embodiment stated is used only for explaining related invention, rather than the restriction to the invention.It also should be noted that in order to It illustrate only easy to describe, in attached drawing with inventing relevant part.
It should be noted that in the case where there is no conflict, the feature in embodiment and embodiment in the application can phase Mutually combination.Describe the application in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
Please refer to Fig.4, bore hole 3D display equipment provided in an embodiment of the present invention, including:
Increase layer 206, be arranged on CF ITO (color film tin indium oxide) between layer 202 and glass substrate 201, its position and the One ITO204 is corresponded to, also, the material for increasing layer 206 be transparent material, and increasing the thickness of layer 206, (silicon nitride is blunt less than PVX Change) layer 205 corresponds to two times of the sum of thickness of thickness and the 2nd ITO203 at the first ITO204.
Increase layer since the position of corresponding first ITO204 between CF ITO layers 202 and glass substrate 201 is increased 206, the distance between 202 and the first ITO204 of CF ITO layers is reduced, and then reduce 202 and the first ITO204 of CF ITO layers The distance between the distance between 202 and the 2nd ITO203 of CF ITO layers gap, so as to reduce the difference of LC deflections, subtract Brightness caused by few liquid crystal deflection difference is different, reduces bright line existing for black state.
Preferably, the thickness of layer 206 is increased specifically, PVX layers 206 correspond to the thickness and second at the first ITO204 The sum of thickness of ITO203, at this time, D=d, brightness caused by avoiding liquid crystal deflection difference is different, and then avoids black state from existing Bright line.
Increase layer 206 in the embodiment of the present invention, select insulating materials to make preferable, can be to avoid using non-insulating material Equipment performance is impacted.
In general, the material of OC (organic resin) layer is exactly the material that layer is increased in more satisfactory making.That is, layer is increased The material used can be OC.At this time it is also possible to be interpreted as, between CF ITO layers 202 and glass substrate 201, increase by one layer For the OC layers increased, the position of the OC layers of setting is corresponding with the first ITO204.
Influence caused by increasing layer 206 to equipment is possible for reduction, can will increase layer 206 and be arranged on CF ITO layers 202 In the following, so as to both make it that 202 corresponding position of CF ITO layers is increased, it also avoid changing CF ITO layers 202 and glass base Other layers of position, impacts between plate 201.
To reduce manufacturing process steps, reducing technology difficulty, ITO materials can also directly be used by increasing layer 206, at this time, Can be considered as by increasing layer 206 and CF ITO layers 202 by one layer, when layer 206 and CF ITO layers 202 are increased in making, first be made thicker CF ITO layers, its thickness is increases the sum of layer and original CF ITO layers, then in the position of the 2nd ITO203 of correspondence, etch away sections The CF ITO of thickness, form the difference in height of corresponding first ITO204 and the 2nd ITO203.
The embodiment of the present invention correspondingly provides a kind of bore hole 3D display equipment making method, as shown in figure 5, including:
Step S501, made in position corresponding with the first ITO and increase layer, which is transparent material, is increased High-rise thickness is less than two times of the sum of the thickness of thickness and the 2nd ITO at PVX layers of corresponding first ITO;
Step S502, CF ITO layers are made.
Due to before CF ITO layers are made, adding the making for increasing layer, so that CFITO layers of the first ITO of correspondence Position increased, and then reduce the distance between CF ITO layers and the first ITO.
Further, it is OC materials to increase the material that layer uses.
Preferably, the thickness for increasing layer is specially:
PVX layers 205 correspond to the sum of thickness of thickness and the 2nd ITO203 at the first ITO204.At this time, CF ITO layers 202 The distance between first ITO204 and CF ITO layers 202 are identical with the distance between the 2nd ITO203, avoid going out for bright line It is existing.
The embodiment of the present invention also provides a kind of bore hole 3D display equipment making method, as shown in fig. 6, including:
Step S601, CF ITO layers are made;
Step S602, in the position of corresponding 2nd ITO, the CF ITO of etch away sections thickness.
At this time, in the position of corresponding first ITO, the thickness of its CF ITO layer is thicker, between CF ITO layers and the first ITO Distance be also reduced so that the distance between CF ITO layers and the first ITO between CF ITO layers and the first ITO away from From gap reduce, when the thickness of CF ITO layers is suitable, may be such that the distance between CF ITO layers and the first ITO and CF ITO The gap of layer and the distance between the first ITO is zero, and then avoids the generation of bright line, obtains preferable display effect.
It should be noted that although in the accompanying drawings with the operation of particular order the invention has been described method, still, this is not required that Or imply and must perform these operations according to the particular order, or the operation having to carry out shown in whole could realize the phase The result of prestige.On the contrary, the step of describing in flow chart can change execution sequence.Additionally or alternatively, it is convenient to omit some Multiple steps are merged into a step and performed by step, and/or a step is decomposed into execution of multiple steps.
Above description is only the preferred embodiment of the application and the explanation to institute's application technology principle.People in the art Member should be appreciated that invention scope involved in the application, however it is not limited to the technology that the particular combination of above-mentioned technical characteristic forms Scheme, while should also cover in the case where not departing from the inventive concept, carried out by above-mentioned technical characteristic or its equivalent feature The other technical solutions for being combined and being formed.Such as features described above has similar work(with (but not limited to) disclosed herein The technical solution that the technical characteristic of energy is replaced mutually and formed.

Claims (10)

  1. A kind of 1. bore hole 3D display equipment, it is characterised in that including:
    To increase layer, be arranged between color film tin indium oxide CF ITO layers and glass substrate, its position is corresponding with the first ITO, also, The material for increasing layer is transparent material, and the thickness for increasing layer is less than the thickness and second at PVX layers of corresponding first ITO Two times of the sum of the thickness of ITO.
  2. 2. equipment as claimed in claim 1, it is characterised in that the material for increasing layer is insulating materials.
  3. 3. equipment as claimed in claim 2, it is characterised in that described to increase the material that layer uses be organic resin OC materials.
  4. 4. equipment as claimed in claim 1, it is characterised in that the layer that increases is arranged on below CF ITO layers.
  5. 5. equipment as claimed in claim 4, it is characterised in that the material for increasing layer is ITO.
  6. 6. the equipment as described in claim 1-5 is any, it is characterised in that it is described increase layer thickness be specially:
    The sum of thickness of thickness and the 2nd ITO at PVX layers of the first ITO of correspondence.
  7. A kind of 7. bore hole 3D display equipment making method, it is characterised in that including:
    Made in position corresponding with the first ITO and increase layer, which is transparent material, the thickness for increasing layer Two times of the sum of the thickness of thickness and the 2nd ITO at the first ITO corresponding less than PVX layers;
    Make color film tin indium oxide CF ITO layers.
  8. 8. the method for claim 7, it is characterised in that described to increase the material that layer uses be organic resin OC materials.
  9. 9. the method for claim 7, it is characterised in that it is described increase layer thickness be specially:
    The sum of thickness of thickness and the 2nd ITO at PVX layers of the first ITO of correspondence.
  10. A kind of 10. bore hole 3D display equipment making method, it is characterised in that including:
    Make color film tin indium oxide CF ITO layers;
    In the position of corresponding 2nd ITO, the CF ITO of etch away sections thickness.
CN201810003163.3A 2018-01-02 2018-01-02 Naked eye 3D display device and manufacturing method thereof Active CN107942528B (en)

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