CN107896413A - The dielectric impedance low-temperature plasma device and method of work of liquid waterfall type processing - Google Patents
The dielectric impedance low-temperature plasma device and method of work of liquid waterfall type processing Download PDFInfo
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- CN107896413A CN107896413A CN201711283491.5A CN201711283491A CN107896413A CN 107896413 A CN107896413 A CN 107896413A CN 201711283491 A CN201711283491 A CN 201711283491A CN 107896413 A CN107896413 A CN 107896413A
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- quartz
- liquid
- corundum ceramic
- ceramic medium
- inner tube
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Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2431—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes using cylindrical electrodes, e.g. rotary drums
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
Abstract
The invention belongs to field of waste water treatment.The invention provides a kind of double-dielectric barrier discharge low-temperature plasma apparatus of liquid waterfall type processing, coaxial structure is formed by inside and outside two groups quartz or corundum ceramic medium tube, quartz or corundum ceramic medium outer tube sleeve are in quartz or the outside of corundum ceramic medium inner tube, quartz or corundum ceramic medium outer tube outer wall covering layer of metal layer or net are as high-field electrode, the inside of quartz or corundum ceramic medium inner tube is full of conducting liquid as grounding electrode, the bottom-up inside full of quartz or corundum ceramic medium inner tube of the liquid, and the first uniform flow mouth above quartz ampoule is diffused out always, water is with gravity and its outer pump pressure, by along quartz or corundum ceramic medium inner tube outer wall to flow down.Present invention also offers method of work.Device provided by the invention does not need chemical method to liquid waste processing, pollution-free, simple to operate, and liquid can be uniformly processed to.Liquid after processing can be collected smoothly, be recycled to.
Description
Technical field
The invention belongs to the field of waste water treatment in environmental project, more particularly to a kind of medium resistance of liquid waterfall type processing
Keep off discharging low-temperature plasma device and method of work.
Background technology
To the microorganism in raw water and waste water and/or dissolubility toxic organic compound, existing processing method has to be entered to raw water
Row chlorination, ozone oxidation, qi exhaustion and oxidation are carried out to waste water or carries out biodegradation etc..With the majority in raw water during chlorination
The micro-content organism chloro thing bigger by toxicity is chlorinated into, and Ozonation is costly.To can only have with qi exhaustion method
Malicious organic matter is transferred in atmospheric environment from aqueous phase triggers secondary pollution.Have with the trace toxic in chemical reagent oxidized aqueous phase
Machine thing cost is high.During with biological degradation method, many toxic organic compounds in aqueous phase will suppress the growth and breeding of biological inoculum.
The content of the invention
1st, technical problem to be solved：
Existing method for treating liquids mainly utilizes chemical method.Cost for wastewater treatment is high, and easily by toxic organic compound
It is transferred to from aqueous phase in atmospheric environment and triggers secondary pollution.
2nd, technical scheme：
In order to solve problem above, the invention provides a kind of dielectric barrier discharge low-temperature plasma of liquid waterfall type processing
Device, this device using when need to liquid to be processed be passed through this device, by heating region, liquid passes through plasma
It is into waterfall state and downward uniform flow during region.Concrete structure is：It is made up of together inside and outside two groups quartz or corundum ceramic medium tube
Axis structure, produces uniform discharge of plasma in low temperature in big spacing, and quartz or corundum ceramic medium outer tube 5 are enclosed on quartz
Or the outside of corundum ceramic medium inner tube 4, quartz or the inwall of corundum ceramic medium tube outer tube 5 with quartz or corundum ceramic medium in
The outer wall of pipe 4 forms discharge of plasma in low temperature region, quartz or the outer wall of corundum ceramic medium outer tube 5 covering layer of metal layer or net
7 are used as high-field electrode, and quartzy or corundum ceramic medium inner tube 4 inside is full of conducting liquid as grounding electrode, the liquid
The bottom-up inside full of quartz or corundum ceramic medium inner tube 4, and the first uniform flow mouth 3 above quartz ampoule is diffused out always,
Water is with gravity and its outer pump pressure, and by along the outer wall of quartz or corundum ceramic medium inner tube 4 to flowing down, the liquid is to enter
The liquid of row processing.
Collection chamber 2 is provided with above the quartz ampoule, the collection chamber 2 is provided with atmosphere mouth.
Liquid is stored in the first storage tank 14, and the liquid enters quartz by water inlet 9 through water pump 13 or corundum is made pottery
In the inwall of ceramic dielectric inner tube 4.
Quartz or the insulation sleeve of 5 inner wall sleeve of corundum ceramic medium outer tube one, prevent first uniform flow mouth 3 of the liquid from inner tube upper end
Quartz or the inwall of corundum ceramic medium outer tube 5 are flowed to after diffusing out.
Collecting chamber 16 is provided with below quartz or corundum ceramic medium tube, along quartz or the outer wall stream of corundum ceramic medium inner tube 4
Under water collecting chamber 16 is flowed into by the second equal head piece 11, the lower section of the collecting chamber 16 is provided with delivery port 12.
Gap 10 is provided with above the outer wall of the collecting chamber 16.
Described delivery port 12 connects the second storage tank 15.
Described the second storage tank 15 and the first storage tank 14 connects, and the liquid of second storage tank 15 enters first
In storage tank 14.
Present invention also offers a kind of method of work of the medium discharge low-temperature plasma device of liquid waterfall type processing.
3rd, beneficial effect：
The double-dielectric barrier discharge low-temperature plasma device of liquid waterfall type processing provided by the invention is put using high-voltage pulse
Electricity produces the technology of low temperature plasma, carries out that hydroxyl free radical, hydration can be produced while high pressure pulse discharge in water
The particle such as electronics, hydrogen peroxide, ozone and oxygen atom under different excited states, hydrogen atom.The redox of these high energy particles
Effect can efficiently and rapidly kill microorganism in water environment and by organic matter degradation therein be molecular weight is smaller, toxicity more
Low organic matter is until be degraded to carbon monoxide, carbon dioxide and water.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention.
Fig. 2 is structural representation Fig. 2 of the present invention.
Embodiment
Below by accompanying drawing, the present invention is described in detail.
As shown in figure 1, a kind of double-dielectric barrier discharge low-temperature plasma device of liquid waterfall type processing, by inside and outside two
Group quartz or corundum ceramic medium tube composition coaxial structure, produce uniform discharge of plasma in low temperature, stone in big spacing
English or corundum ceramic medium outer tube 5 be enclosed on quartz or corundum ceramic medium inner tube 4 outside, quartz or corundum ceramic medium tube outside
The inwall of pipe 5 forms discharge of plasma in low temperature region with quartz or the outer wall of corundum ceramic medium inner tube 4, and quartz or corundum ceramic are situated between
The outer wall of matter outer tube 5 covers layer of metal layer or net 7 is used as high-field electrode, and quartzy or corundum ceramic medium inner tube 4 inside is full of
Conducting liquid is as grounding electrode, the bottom-up inside full of quartz or corundum ceramic medium inner tube 4 of the liquid, and always
The first uniform flow mouth 3 above quartz ampoule is diffused out, water, will be along quartz or corundum ceramic medium inner tube with gravity and its outer pump pressure
For 4 outer wall to flowing down, the liquid is the liquid that need to be handled.
As quartz or the liquid level of corundum ceramic medium tube inner tube 4 rise, the first uniform flow mouth 3 has liquid spilling, forms waterfall
Cloth-like.
Quartz or the outer wall of corundum ceramic medium outer tube 5 covering layer of metal layer or net 7 are used as high-field electrode, quartz or corundum
The inwall of ceramic dielectric inner tube 4 full of conducting liquid as ground connection, so quartz or the inwall of corundum ceramic medium tube outer tube 5 with it is interior
The outer wall of pipe 4 forms plasma discharge, to being handled through the liquid on quartz or the outer wall of corundum ceramic medium inner tube 4,
Hydroxyl free radical, aqueous electron, hydrogen peroxide, ozone and difference can be produced by being carried out in water while high pressure pulse discharge swashs
Encourage the particles such as oxygen atom under state, hydrogen atom.The redox of these high energy particles can efficiently and rapidly kill water ring
Microorganism in border and be molecular weight is smaller, toxicity is lower organic matter until being degraded to an oxidation by organic matter degradation therein
Carbon, carbon dioxide and water
Collection chamber 2 is provided with above the quartz ampoule, the collection chamber 2 is provided with atmosphere import 1, and the big I of atmosphere determines first
The speed of equal head piece current；Gas with various is inputted simultaneously, the low temperature plasma of different atmosphere can be produced, for example increase oxygen
Content, hydroxyl and more heavy oxygen excitation state materials can be increased, increase the deep oxidation effect of processed liquid.
Quartz or the insulation sleeve of 5 inner wall sleeve of corundum ceramic medium outer tube one, prevent first uniform flow mouth 3 of the liquid from inner tube upper end
The inwall of outer tube 5 is flowed to after diffusing out, to prevent short circuit.
As shown in Fig. 2 described the second storage tank 15 and the first storage tank 14 connects, the described internal memory of the second storage tank 15
Storage for treated liquid, the memory storage of the first storage tank 14 for pending liquid, second storage tank 15
Liquid is entered in the first storage tank 14.The liquid of second storage tank 15 can enter the first storage tank 14 by water circulating pump
In, conducting liquid is stored in the first storage tank 14, and the liquid in the second storage tank enters quartz through water pump 13 by water inlet 9
In the inwall of inner tube 4, handle treated liquid circulation.
A kind of double-dielectric barrier discharge low-temperature plasma device of liquid waterfall type processing provided by the invention is to waste liquid
Processing does not need chemical method, pollution-free, simple to operate, can be by target liq uniform treatment by the mixed processing of aqueous vapor.
Liquid after processing can be collected, and be recycled to.
A kind of method of work of the double-dielectric barrier discharge low-temperature plasma device of liquid waterfall type processing of the present invention
For this device is flat on a platform, the pending liquid in the first storage tank 14 is squeezed into water by water pump 13
Mouth 9, by the pipe full quartz or corundum ceramic medium inner tube 4 in collecting chamber 16, with quartz or corundum ceramic medium
The liquid level of pipe 4 rises, and the first uniform flow mouth 3 has liquid spilling, forms waterfall shape, can squeeze into mixed gas by atmosphere import 1,
The big I of atmosphere determines the speed of the first equal current of head piece 3 and by the more of various active particles caused by plasma
It is few, high-field electrode 7 is connected with plasma electrical source, heat dissipation exhaust mouth 6 is connected with blower fan, device is started working, plasma
Body region of discharge is formed in the outer wall and the inwall of quartz or corundum ceramic medium outer tube 5 of quartz or corundum ceramic medium inner tube 4,
Liquid is along quartz or corundum ceramic medium inner tube outer wall of inner tube to flowing down, by plasma discharge, eventually through the
Two uniform flow mouths 11, second storage tank 15 is entered by delivery port 12 into collecting chamber 16, by the first storage tank 14 and the second storage tank
Liquid after processing can be continued towards into the first storage tank 14, can so form circular treatment by a circulating pump between 15.
Although the present invention disclosed as above with preferred embodiment, they be not for limit the present invention, it is any ripe
This those skilled in the art is practised, without departing from the spirit and scope of the invention, can make various changes or retouch from working as, therefore the guarantor of the present invention
What shield scope should be defined by claims hereof protection domain is defined.
Claims (9)
- A kind of 1. dielectric impedance low-temperature plasma device of liquid waterfall type processing, it is characterised in that：By inside and outside two groups quartz Or corundum ceramic medium tube composition coaxial structure, uniform discharge of plasma in low temperature, quartz or firm are produced in big spacing Beautiful ceramic dielectric outer tube（5）It is enclosed on quartz or corundum ceramic medium inner tube（4）Outside, quartz or corundum ceramic medium tube outer tube （5）Inwall and quartz or corundum ceramic medium inner tube（4）Outer wall forms discharge of plasma in low temperature region, quartz or corundum ceramic Medium outer tube（5）Outer wall covers layer of metal layer or net（7）As high-field electrode, quartz or corundum ceramic medium inner tube（4）'s Inside is bottom-up full of quartz or corundum ceramic medium inner tube as grounding electrode, the liquid full of conducting liquid（4）'s Inside, and the first uniform flow mouth above quartz ampoule is diffused out always（3）, water, will be along quartz or firm with gravity and its outer pump pressure Beautiful ceramic dielectric inner tube（4）Outer wall to flowing down, the liquid is the liquid that need to be handled.
- 2. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 1, its feature exist In：Collection chamber is provided with above the quartz ampoule（2）, the collection chamber（2）It is provided with atmosphere import（1）.
- 3. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 1 or 2, its feature It is：Liquid is stored in the first storage tank（14）Interior, the liquid is through water pump（13）Pass through water inlet（9）Into quartz or corundum Ceramic dielectric quartz inner pipe（4）In inwall.
- 4. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 1 or 2, its feature It is：Quartz outer tube（5）The insulation sleeve of inner wall sleeve one, prevent first uniform flow mouth of the liquid from inner tube upper end（3）Stone is flowed to after diffusing out English outer tube（5）Inwall.
- 5. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 1 or 2, its feature It is：Collecting chamber is provided with below quartz or corundum ceramic medium tube（16）, along quartz or corundum ceramic medium inner tube（4）Outer wall stream Under water pass through the second equal head piece（11）It is flowed into collecting chamber（16）, the collecting chamber（16）Lower section be provided with delivery port（12）.
- 6. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 5, its feature exist In：The collecting chamber（16）Outer wall above be provided with gap（10）.
- 7. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 5, its feature exist In：Described delivery port（12）Connect the second storage tank（15）.
- 8. a kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing as claimed in claim 7, its feature exist In：The second described storage tank（15）With the first storage tank（14）Connection, second storage tank（15）Liquid enter One storage tank（14）In.
- 9. a kind of method of work of the double-dielectric barrier discharge low-temperature plasma device of liquid waterfall type processing, its feature exist In：Device is flat on a platform, by the first storage tank（14）In pending liquid pass through water pump（13）Squeeze into water Mouthful（9）, pass through collecting chamber（16）In pipe full quartz or corundum ceramic medium inner tube（4）, with quartz or corundum ceramic Medium inner tube（4）Liquid level rise, the first uniform flow mouth（3）There is liquid spilling, form waterfall shape, mixed gas can be passed through atmosphere Import（1）Squeeze into, the big I of atmosphere determines the first equal head piece（3）The speed of current and by each caused by plasma Kind of active particle number, by high-field electrode（7）It is connected with plasma electrical source, by heat dissipation exhaust mouth（6）It is connected, fills with blower fan Start-up operation is put, plasma discharge is in quartz or corundum ceramic medium inner tube（4）Outer wall and quartz or corundum ceramic Medium outer tube（5）Inwall formed, liquid along quartz or corundum ceramic medium inner tube（4）Outer wall passes through plasma to flowing down Body region of discharge, eventually through the second uniform flow mouth（11）, into collecting chamber（16）By delivery port（12）Into the second storage tank （15）, by the first storage tank（14）With the second storage tank（15）Between liquid after processing can be continued towards by a circulating pump First storage tank（14）, form circular treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711283491.5A CN107896413A (en) | 2017-12-07 | 2017-12-07 | The dielectric impedance low-temperature plasma device and method of work of liquid waterfall type processing |
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| CN201711283491.5A CN107896413A (en) | 2017-12-07 | 2017-12-07 | The dielectric impedance low-temperature plasma device and method of work of liquid waterfall type processing |
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| CN107896413A true CN107896413A (en) | 2018-04-10 |
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| CN201711283491.5A Pending CN107896413A (en) | 2017-12-07 | 2017-12-07 | The dielectric impedance low-temperature plasma device and method of work of liquid waterfall type processing |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109796067A (en) * | 2019-03-12 | 2019-05-24 | 安徽理工大学 | A kind of homemade reaction of low temperature plasma device and implementation method |
| CN112624269A (en) * | 2019-09-24 | 2021-04-09 | 中国科学院过程工程研究所 | Wastewater treatment device and wastewater treatment method |
| CN114262031A (en) * | 2021-12-30 | 2022-04-01 | 重庆大学 | Gas-liquid two-phase discharge dielectric barrier type low-temperature plasma water treatment device |
| CN114409021A (en) * | 2021-12-30 | 2022-04-29 | 重庆大学 | Method for treating wastewater by low-temperature plasma device |
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| CN202542934U (en) * | 2012-03-15 | 2012-11-21 | 大连海事大学 | Dielectric barrier discharge water treatment device |
| CN104370346A (en) * | 2014-11-04 | 2015-02-25 | 青岛科技大学 | Novel two-stage dielectric barrier discharge plasma wastewater treatment device |
| CN204185280U (en) * | 2014-11-04 | 2015-03-04 | 青岛科技大学 | Two-stage novel medium barrier discharge plasma wastewater treatment equipment |
| CN207573691U (en) * | 2017-12-07 | 2018-07-03 | 南京苏曼等离子科技有限公司 | A kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing |
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2017
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN202542934U (en) * | 2012-03-15 | 2012-11-21 | 大连海事大学 | Dielectric barrier discharge water treatment device |
| CN104370346A (en) * | 2014-11-04 | 2015-02-25 | 青岛科技大学 | Novel two-stage dielectric barrier discharge plasma wastewater treatment device |
| CN204185280U (en) * | 2014-11-04 | 2015-03-04 | 青岛科技大学 | Two-stage novel medium barrier discharge plasma wastewater treatment equipment |
| CN207573691U (en) * | 2017-12-07 | 2018-07-03 | 南京苏曼等离子科技有限公司 | A kind of dielectric impedance low-temperature plasma device of liquid waterfall type processing |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109796067A (en) * | 2019-03-12 | 2019-05-24 | 安徽理工大学 | A kind of homemade reaction of low temperature plasma device and implementation method |
| CN112624269A (en) * | 2019-09-24 | 2021-04-09 | 中国科学院过程工程研究所 | Wastewater treatment device and wastewater treatment method |
| CN114262031A (en) * | 2021-12-30 | 2022-04-01 | 重庆大学 | Gas-liquid two-phase discharge dielectric barrier type low-temperature plasma water treatment device |
| CN114409021A (en) * | 2021-12-30 | 2022-04-29 | 重庆大学 | Method for treating wastewater by low-temperature plasma device |
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