CN107818902A - Microchannel plate and preparation method thereof - Google Patents
Microchannel plate and preparation method thereof Download PDFInfo
- Publication number
- CN107818902A CN107818902A CN201710966941.4A CN201710966941A CN107818902A CN 107818902 A CN107818902 A CN 107818902A CN 201710966941 A CN201710966941 A CN 201710966941A CN 107818902 A CN107818902 A CN 107818902A
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- Prior art keywords
- microchannel plate
- preparation
- salt
- ion exchange
- rubidium
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/12—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes
- H01J9/125—Manufacture of electrodes or electrode systems of photo-emissive cathodes; of secondary-emission electrodes of secondary emission electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J43/00—Secondary-emission tubes; Electron-multiplier tubes
- H01J43/04—Electron multipliers
- H01J43/06—Electrode arrangements
- H01J43/18—Electrode arrangements using essentially more than one dynode
- H01J43/24—Dynodes having potential gradient along their surfaces
- H01J43/246—Microchannel plates [MCP]
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Micromachines (AREA)
Abstract
The present invention is that its preparation method includes on a kind of microchannel plate and preparation method thereof：1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtain microchannel plate blank；2) described microchannel plate blank is subjected to ion exchange in fused salt, cleans, high temperature reduction, plated film, obtain microchannel plate；Wherein, described fused salt includes rubidium salt and/or cesium salt.The present invention by microchannel plate blank by carrying out ion exchange, thick atom amount, the rubidium of thick atom radius, cesium ion part are substituted to potassium, the sodium ion in emission layer, increase and volume " jammed " effect by alkali metal ion atom amount, improve the resistance to electronic Scrubbing performance of emission layer, so as to improve the service life of microchannel plate and gain performance, 30% and more than 20% is respectively increased in microchannel plate service life, gain.
Description
Technical field
The present invention relates to a kind of micro optical element manufacturing technology field, more particularly to a kind of microchannel plate and its preparation side
Method.
Background technology
Microchannel plate (Microchannel Plate, MCP) is that a kind of millions of micron order glazing channel is formed
Sheet type electron multiplication array, each of which passage is all an electron multiplication system, has conductive layer and emission layer, conductive layer carries
Supplied for electronic, emission layer transmitting secondary electron, when incident electron enters passage and hits vias inner walls, Secondary Emission electricity can be produced
Son, in the presence of electric field, these secondary emission electrons are accelerated to be continued to hit vias inner walls, after multiple impacts, in passage
Output end form substantial amounts of outgoing electron, so as to form the enhancing to small-signal.
Microchannel plate with its small volume, it is in light weight, room and time resolving power is high the advantages that, lll night vision, particle visit
It is used widely in the fields such as survey, medical consultations.But in use due to for a long time by electronic Scrubbing, microchannel plate transmitting
Potassium, sodium ion in layer occur migration or overflowed, and cause its bad stability, gain reduction, have a strong impact on its service life.
The content of the invention
It is a primary object of the present invention to, there is provided a kind of new microchannel plate and preparation method thereof, skill to be solved
Art problem is the increase and volume " jammed " effect for making it by alkali metal ion atom amount, to improve the punching of the resistance to electronics of emission layer
Brush performance, the service life and gain performance of microchannel plate are improved, thus more suitable for practicality.
The object of the invention to solve the technical problems is realized using following technical scheme.Itd is proposed according to the present invention
A kind of microchannel plate preparation method, it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained
Microchannel plate blank；
2) described microchannel plate blank is subjected to ion exchange in fused salt, cleans, high temperature reduction, plated film, obtain micro-
Channel plate；
Wherein, described fused salt includes rubidium salt and/or cesium salt.
The object of the invention to solve the technical problems can be also applied to the following technical measures to achieve further.
Preferably, the preparation method of foregoing microchannel plate, wherein described rubidium salt is rubidium nitrate.
Preferably, the preparation method of foregoing microchannel plate, wherein described cesium salt is cesium nitrate.
Preferably, the preparation method of foregoing microchannel plate, wherein the temperature of described ion exchange is 200-400 DEG C.
Preferably, the preparation method of foregoing microchannel plate, wherein the time of described ion exchange is 2-30min.
The object of the invention to solve the technical problems is also realized using following technical scheme.Itd is proposed according to the present invention
A kind of microchannel plate, be prepared by foregoing method.
The object of the invention to solve the technical problems can be also applied to the following technical measures to achieve further.
Preferably, foregoing microchannel plate, wherein the aperture of described microchannel plate is 4-25 μm.
Preferably, foregoing microchannel plate, wherein the service life of described microchannel plate is more than 20000h, gain exists
It is more than 10000 during 800V voltages.
By above-mentioned technical proposal, microchannel plate of the present invention and preparation method thereof at least has following advantages：
The present invention by microchannel plate blank by carrying out ion exchange, by thick atom amount, the rubidium of thick atom radius, cesium ion
Potassium, sodium ion in part substitution emission layer, increase and volume " jammed " effect by alkali metal ion atom amount, improve hair
The resistance to electronic Scrubbing performance of layer is penetrated, so as to improve the service life of microchannel plate and gain performance, microchannel plate service life, is increased
30% and more than 20% is respectively increased in benefit.
Described above is only the general introduction of technical solution of the present invention, in order to better understand the technological means of the present invention,
And can be practiced according to the content of specification, described in detail below with presently preferred embodiments of the present invention as after.
Embodiment
Further to illustrate the present invention to reach the technological means and effect that predetermined goal of the invention is taken, below in conjunction with
Preferred embodiment, to according to microchannel plate proposed by the present invention and preparation method thereof its embodiment, structure, feature and its
Effect, describe in detail as after.In the following description, what different " embodiment " or " embodiment " referred to is not necessarily same implementation
Example.In addition, the special characteristic, structure or feature in one or more embodiments can be combined by any suitable form.
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes, it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained
Microchannel plate blank；
2) described microchannel plate blank is subjected to ion exchange in fused salt, cleaning removes the fused salt of remained on surface, high
Temperature reduction, plated film, obtains microchannel plate；
Wherein, described fused salt includes rubidium salt and/or cesium salt.The component of fused salt can also include sylvite and sodium salt, be used for
Adjust fused salt fusing point and ion exchange activity.
Preferably, rubidium salt is rubidium nitrate, and cesium salt is cesium nitrate.The fusing point of nitrate is low, no more than the inversion point of glass, fits
Cooperate as fused salt；And nitrate is soluble in water, easily cleaning；In addition nitrate corrosivity is low, and microchannel plate will not be caused
Damage.Fused salt is not limited to nitrate, when the conversion temperature of glass is high, can select phosphate, oxalates etc..According to difference
Process conditions, chloride, sulfate, phosphate etc., or multicomponent fused salt mixt also can be selected.
Preferably, the temperature of ion exchange is 200-400 DEG C, and the time of ion exchange is 2-30min.The temperature of ion exchange
Degree is not above glass transition temperature.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by foregoing method.The hole of microchannel plate
Footpath is 4-25 μm, and service life is more than 20000h, and gain is more than 10000 in 800V voltages.
Embodiment 1
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes, it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained
Diameter 25mm, thickness 0.38mm, the microchannel plate blank in 6 μm of passage aperture；
2) described microchannel plate blank is subjected to ion exchange, 350 DEG C of temperature of molten salt, ion-exchange time in fused salt
15min, the fused salt for removing remained on surface is cleaned by ultrasonic with deionized water, cleans 15min every time, cleaned 3 times, high temperature reduction, plating
Film, obtain microchannel plate；
Wherein, described fused salt is the fused salt mixt of rubidium nitrate and cesium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.
The aperture of the microchannel plate of embodiment 1 is 6 μm, and service life is more than 20000h, and gain is more than in 800V voltages
10000。
Embodiment 2
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes, it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained
Diameter 30mm, thickness 0.50mm, the microchannel plate blank in 25 μm of passage aperture；
2) described microchannel plate blank is subjected to ion exchange, 400 DEG C of temperature of molten salt, ion-exchange time in fused salt
2min, the fused salt for removing remained on surface is cleaned by ultrasonic with deionized water, cleans 15min every time, cleaned 3 times, high temperature reduction, plating
Film, obtain microchannel plate；
Wherein, described fused salt is the fused salt mixt of rubidium nitrate, cesium nitrate and potassium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.Embodiment 1
The aperture of microchannel plate is 25 μm, and service life is more than 20000h, and gain is more than 10000 in 800V voltages.
Embodiment 3
A kind of preparation method for microchannel plate that one embodiment of the present of invention proposes, it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained
Diameter 20mm, thickness 0.30mm, the microchannel plate blank in 4 μm of passage aperture；
2) described microchannel plate blank is subjected to ion exchange, 200 DEG C of temperature of molten salt, ion-exchange time in fused salt
30min, the fused salt for removing remained on surface is cleaned by ultrasonic with deionized water, cleans 15min every time, cleaned 3 times, high temperature reduction, plating
Film, obtain microchannel plate；
Wherein, described fused salt is rubidium nitrate.
Another embodiment of the present invention proposes a kind of microchannel plate, is prepared by the method for embodiment 1.Embodiment 1
The aperture of microchannel plate is 4 μm, and service life is more than 20000h, and gain is more than 10000 in 800V voltages.
The above described is only a preferred embodiment of the present invention, any formal limitation not is made to the present invention, according to
Any simple modification, equivalent change and modification made according to the technical spirit of the present invention to above example, still falls within this hair
In the range of bright technical scheme.
Claims (8)
1. a kind of preparation method of microchannel plate, it is characterised in that it includes：
1) core rod and skin glass tube are subjected to the combination of rod pipe, wire drawing, row's plate, fusion pressure, machining, pickling, obtained micro- logical
Guidance tape blank；
2) described microchannel plate blank is subjected to ion exchange in fused salt, cleans, high temperature reduction, plated film, obtain microchannel
Plate；
Wherein, described fused salt includes rubidium salt and/or cesium salt.
2. the preparation method of microchannel plate according to claim 1, it is characterised in that described rubidium salt is rubidium nitrate.
3. the preparation method of microchannel plate according to claim 1, it is characterised in that described cesium salt is cesium nitrate.
4. the preparation method of microchannel plate according to claim 1, it is characterised in that the temperature of described ion exchange is
200-400℃。
5. the preparation method of microchannel plate according to claim 1, it is characterised in that the time of described ion exchange is
2-30min。
6. a kind of microchannel plate, it is characterised in that be prepared as the method described in claim any one of 1-5.
7. microchannel plate according to claim 6, it is characterised in that the aperture of described microchannel plate is 4-25 μm.
8. microchannel plate according to claim 6, it is characterised in that the service life of described microchannel plate is more than
20000h, gain are more than 10000 in 800V voltages.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710966941.4A CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710966941.4A CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN107818902A true CN107818902A (en) | 2018-03-20 |
| CN107818902B CN107818902B (en) | 2019-06-14 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710966941.4A Active CN107818902B (en) | 2017-10-17 | 2017-10-17 | Microchannel plate and preparation method thereof |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108922646A (en) * | 2018-07-02 | 2018-11-30 | 中国建筑材料科学研究总院有限公司 | collimator and preparation method |
| CN111863582A (en) * | 2020-07-24 | 2020-10-30 | 北方夜视技术股份有限公司 | Ultrasonic suspension rotary type microchannel plate corrosion method |
| CN113436947A (en) * | 2021-06-28 | 2021-09-24 | 北方夜视技术股份有限公司 | Method for improving gain of microchannel plate and chemical stability of inner wall of micropore |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4365150A (en) * | 1978-05-08 | 1982-12-21 | Tektronix, Inc. | Gain stabilized microchannel plates and MCP treatment method |
| CN1717770A (en) * | 2002-11-26 | 2006-01-04 | Itt制造企业公司 | Microchannel plate having microchannels with deep funneled and/or step funneled openings and method of manufacturing same |
-
2017
- 2017-10-17 CN CN201710966941.4A patent/CN107818902B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4365150A (en) * | 1978-05-08 | 1982-12-21 | Tektronix, Inc. | Gain stabilized microchannel plates and MCP treatment method |
| CN1717770A (en) * | 2002-11-26 | 2006-01-04 | Itt制造企业公司 | Microchannel plate having microchannels with deep funneled and/or step funneled openings and method of manufacturing same |
Non-Patent Citations (1)
| Title |
|---|
| 闫金良等: "《微通道板增益疲劳机理研究》", 《应用光学》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108922646A (en) * | 2018-07-02 | 2018-11-30 | 中国建筑材料科学研究总院有限公司 | collimator and preparation method |
| CN111863582A (en) * | 2020-07-24 | 2020-10-30 | 北方夜视技术股份有限公司 | Ultrasonic suspension rotary type microchannel plate corrosion method |
| CN111863582B (en) * | 2020-07-24 | 2022-04-22 | 北方夜视技术股份有限公司 | Ultrasonic suspension rotary type microchannel plate corrosion method |
| CN113436947A (en) * | 2021-06-28 | 2021-09-24 | 北方夜视技术股份有限公司 | Method for improving gain of microchannel plate and chemical stability of inner wall of micropore |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107818902B (en) | 2019-06-14 |
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