A kind of polycrystalline sheet stock cleaning method
Technical field
The present invention relates to a kind of polycrystalline sheet stock cleaning method, applied to the semi-automatic post of cooking process.
Background technology
Polycrystalline sheet stock is the fragment that the small side's ingot of polycrystalline is formed after mortar cutting or Buddha's warrior attendant wire cutting, is contained in its fragment
There are a large amount of non-silicon impurities(Glass, adhesive tape, steel wire, screw etc.), slurry, metal ion, oxide layer, conventional method are also adhered in surface
Uniformly take alkali cleaning --- rinsing --- nitration mixture neutralization --- rinsing --- drying --- sorting --- packaging, usual this method
There are the non-silicon impurities of alkaline spot, water spots, and glass, adhesive tape, steel wire, screw etc. in the fractal surfaces cleaned out, worker sorts difficult
Degree is big, and is difficult to all sub-elect, and fragment material quality is unable to reach high-purity requirement, then to melt down quality fluctuation big.
The content of the invention
The defects of it is an object of the invention to overcome prior art, there is provided one kind is for non-silicon present in polycrystalline chip material
The cleaning method that impurity removes one by one, to improve polycrystalline sheet stock purity.
The present invention specifically adopts the following technical scheme that:
The first step:Fragment material suctions out the Ferromagnetic Impurities wherein contained by magnetic roller type conveyer belt tramp iron separator;
Second step:By the non-ferrous metal filter using electromagnetic coupled balance reception principle, the metal impurities in fragment are gone
Remove;
3rd step:Using 800-850 degree high-temperature calcinations, by substance decomposition containing glue in fragment material into powdered;
4th step:Fragment material 24h-48h is soaked using pure hydrofluoric acid solution more than 70% concentration, by glass biodissolution in fragment material
And remove fragment material surface oxide layer;
5th step:Corrode fragment material using sodium hydrate aqueous solution more than 99% purity, dosage is per the corrosion of 4kg sodium hydroxides
Fragment material 30kg, removes slurry, impurity of fragment material surface attachment etc., and etching time was controlled in 3-4 minutes;
6th step:Using hydrofluoric acid and hydrochloric acid by weight 1:The solution that 5 ratios neutralize rinses to fragment material, then carries out
Drying, sorting, packaging.
By improvement of the present invention to polycrystalline chip material cleaning method, gone one by one for various non-silicon impurities in fragment material
Remove, not only can effectively remove the impurity contained in polycrystalline chip material and the slurry of surface attachment, metal etc., lift fragment material
Cleaning quality so that the quality of polycrystalline chip material reaches the requirement of high-purity silicon material, while can reduce sorting labor strength,
Improve production efficiency and economic benefit.
Embodiment
Embodiment one
The high-purity polycrystalline sheet stock cleaning method of the present invention comprises the following steps:
The first step:Fragment material suctions out by magnetic roller type conveyer belt tramp iron separator wherein contains Ferromagnetic Impurities, the magnetic field intensity of magnetic roller
For background 14000GS, gradient 18000GS;
Second step:By the non-ferrous metal filter using electromagnetic coupled balance reception principle, the metal impurities in fragment are gone
Remove;
3rd step:Using 800 degree of high-temperature calcinations, by substance decomposition containing glue in fragment material into powdered;
4th step:Fragment material 48h is soaked using the pure hydrofluoric acid solution of 70% concentration, by glass biodissolution in fragment material and removes table
Face oxide layer;
5th step:Corrode fragment material using sodium hydroxide solution more than 99% purity, dosage is broken per the corrosion of 4kg sodium hydroxides
Sheet stock 30kg, removes slurry, impurity of fragment material surface attachment etc., and etching time is controlled in 3-4 minutes, can corroded in theory
The picometre of silicon face 2.5.
6th step:Using hydrofluoric acid and hydrochloric acid by weight 1:The solution that 5 ratios neutralize rinses to fragment material, then
Dried, sorted, packed.
Embodiment two
The high-purity polycrystalline sheet stock cleaning method of the present invention comprises the following steps:
The first step:Fragment material suctions out by magnetic roller type conveyer belt tramp iron separator wherein contains Ferromagnetic Impurities, the magnetic field intensity of magnetic roller
For background 14000GS, gradient 18000GS;
Second step:By the non-ferrous metal filter using electromagnetic coupled balance reception principle, the metal impurities in fragment are gone
Remove;
3rd step:Using 825 degree of high-temperature calcinations, by substance decomposition containing glue in fragment material into powdered;
4th step:Fragment material 36h is soaked using the pure hydrofluoric acid solution of 73% concentration, by glass biodissolution in fragment material and removes table
Face oxide layer;
5th step:Corrode fragment material using sodium hydroxide solution more than 99% purity, dosage is broken per the corrosion of 4kg sodium hydroxides
Sheet stock 30kg, removes slurry, impurity of fragment material surface attachment etc., and etching time is controlled in 3-4 minutes, can corroded in theory
The picometre of silicon face 2.5;
6th step:Using hydrofluoric acid and hydrochloric acid by weight 1:The solution that 5 ratios neutralize rinses to fragment material, then carries out
Drying, sorting, packaging.
Embodiment three
The high-purity polycrystalline sheet stock cleaning method of the present invention comprises the following steps:
The first step:Fragment material suctions out by magnetic roller type conveyer belt tramp iron separator wherein contains Ferromagnetic Impurities, the magnetic field intensity of magnetic roller
For background 14000GS, gradient 18000GS;
Second step:By the non-ferrous metal filter using electromagnetic coupled balance reception principle, the metal impurities in fragment are gone
Remove;
3rd step:Using 850 degree of high-temperature calcinations, by substance decomposition containing glue in fragment material into powdered;
4th step:Fragment material 24h is soaked using the pure hydrofluoric acid solution of 75% concentration, by glass biodissolution in fragment material and removes table
Face oxide layer;
5th step:Corrode fragment material using sodium hydroxide solution more than 99% purity, dosage is broken per the corrosion of 4kg sodium hydroxides
Sheet stock 30kg, removes slurry, impurity of fragment material surface attachment etc., and etching time is controlled in 3-4 minutes, can corroded in theory
The picometre of silicon face 2.5.
6th step:Using hydrofluoric acid and hydrochloric acid by weight 1:The solution that 5 ratios neutralize rinses to fragment material, then
Dried, sorted, packed.