CN107673625A - Glass etching liquid and glass etching method - Google Patents
Glass etching liquid and glass etching method Download PDFInfo
- Publication number
- CN107673625A CN107673625A CN201711084774.7A CN201711084774A CN107673625A CN 107673625 A CN107673625 A CN 107673625A CN 201711084774 A CN201711084774 A CN 201711084774A CN 107673625 A CN107673625 A CN 107673625A
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- CN
- China
- Prior art keywords
- glass
- glass etching
- etching liquid
- pure water
- liquid according
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The present invention relates to a kind of glass etching method, it is characterised in that including：Glass is placed in the first service sink and cleaned, and the first ultrasonic generator is provided with first service sink, is cleaned successively by running water, pure water, ultra-pure water three phases；The glass, which is placed on inside etch bath, utilizes the glass etching liquid etching described in any of the above-described；Glass is placed in the second service sink and cleaned, and the second ultrasonic generator is provided with second service sink, is cleaned successively by running water, pure water, ultra-pure water three phases；The glass is dried using circulating air.Above-mentioned glass etching method, the etching quality of LCD glass substrate can be further improved, etch quality better.
Description
Technical field
The present invention relates to glass industry, more particularly to glass etching liquid and glass etching method.
Background technology
As people are to point of the degree of concern more and more higher of the display effect of liquid crystal display, particularly liquid crystal display
The requirement of resolution is constantly lifted；So in the glass substrate process of liquid crystal display, its line-spacing, line width need to etch
Must be more and more thinner, uniformity also requires more and more stricter.In order to meet the requirement in market, it is necessary to provide a kind of etching of high request
Method.
The content of the invention
Based on this, it is necessary to for above-mentioned technical problem, there is provided a kind of glass etching method, can further improve liquid
The etching quality of crystal display glass substrate, etch quality better.
A kind of glass etching liquid, including：It is made up of the composition by following weight：10 parts of fluorochloroparaffins, nothing
15 parts of machine acid, 15 parts of polyol, 20 parts of 5 parts of water-soluble polymer and pure water, the inorganic acid be hydrochloric acid, dilute sulfuric acid,
Phosphoric acid or nitric acid.
In other one embodiment, the polyol is to include glucose, starch, sucrose, fructose, sorb
One or more in alcohol, propane diols, isopropanol, glycerine and ethylene glycol.
In other one embodiment, it is fine that the water-soluble polymer includes guar gum, hydroxymethyl cellulose, carboxymethyl
One or more in dimension element, sodium carboxymethylcellulose or hydroxyethyl cellulose.
In other one embodiment, HCl weight/mass percentage composition is 45% in the hydrochloric acid.
In other one embodiment, H2SO4 weight/mass percentage composition is 40% in the dilute sulfuric acid.
In other one embodiment, H3PO4 weight/mass percentage composition is 60% in the phosphoric acid.
In other one embodiment, HNO3 weight/mass percentage composition is 55% in the nitric acid.
A kind of glass etching method, including：
Glass is placed in the first service sink and cleaned, and the first ultrasonic generator is provided with first service sink, according to
It is secondary to be cleaned by running water, pure water, ultra-pure water three phases；
The glass, which is placed on inside etch bath, utilizes the glass etching liquid etching described in any of the above-described；
Glass is placed in the second service sink and cleaned, and the second ultrasonic generator is provided with second service sink, according to
It is secondary to be cleaned by running water, pure water, ultra-pure water three phases；
The glass is dried using circulating air.
Above-mentioned glass etching method, the etching quality of LCD glass substrate can be further improved, etch product
Matter is good.
In other one embodiment, the temperature in the etch bath is 75 degrees Celsius.
In other one embodiment, the temperature difference in the etch bath is controlled at 2 degrees Celsius.
Brief description of the drawings
Fig. 1 is a kind of flow chart for glass etching method that the embodiment of the present application provides.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.
A kind of glass etching liquid, including：It is made up of the composition by following weight：10 parts of fluorochloroparaffins, nothing
15 parts of machine acid, 15 parts of polyol, 20 parts of 5 parts of water-soluble polymer and pure water, the inorganic acid be hydrochloric acid, dilute sulfuric acid,
Phosphoric acid or nitric acid.
In other one embodiment, the polyol is to include glucose, starch, sucrose, fructose, sorb
One or more in alcohol, propane diols, isopropanol, glycerine and ethylene glycol.
In other one embodiment, it is fine that the water-soluble polymer includes guar gum, hydroxymethyl cellulose, carboxymethyl
One or more in dimension element, sodium carboxymethylcellulose or hydroxyethyl cellulose.
In other one embodiment, HCl weight/mass percentage composition is 45% in the hydrochloric acid.
In other one embodiment, H2SO4 weight/mass percentage composition is 40% in the dilute sulfuric acid.
In other one embodiment, H3PO4 weight/mass percentage composition is 60% in the phosphoric acid.
In other one embodiment, HNO3 weight/mass percentage composition is 55% in the nitric acid.
A kind of glass etching method, including：
S110, glass are placed in the first service sink and cleaned, and are filled in first service sink provided with the first ultrasonic wave
Put, cleaned successively by running water, pure water, ultra-pure water three phases.
S120, the glass, which are placed on inside etch bath, utilizes the glass etching liquid etching described in any of the above-described.
S130, glass are placed in the second service sink and cleaned, and are filled in second service sink provided with the second ultrasonic wave
Put, cleaned successively by running water, pure water, ultra-pure water three phases.
S140, utilize the circulating air drying glass.
Above-mentioned glass etching method, the etching quality of LCD glass substrate can be further improved, etch product
Matter is good.
In other one embodiment, the temperature in the etch bath is 75 degrees Celsius.
In other one embodiment, the temperature difference in the etch bath is controlled at 2 degrees Celsius.
Each technical characteristic of embodiment described above can be combined arbitrarily, to make description succinct, not to above-mentioned reality
Apply all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited
In contradiction, the scope that this specification is recorded all is considered to be.
Embodiment described above only expresses the several embodiments of the present invention, and its description is more specific and detailed, but simultaneously
Can not therefore it be construed as limiting the scope of the patent.It should be pointed out that come for one of ordinary skill in the art
Say, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
- A kind of 1. glass etching liquid, it is characterised in that including：It is made up of the composition by following weight：Dichlorodifluoromethan 20 parts of 10 parts of hydrocarbon, 15 parts of inorganic acid, 15 parts of polyol, 5 parts of water-soluble polymer and pure water, the inorganic acid are salt Acid, dilute sulfuric acid, phosphoric acid or nitric acid.
- 2. glass etching liquid according to claim 1, it is characterised in that the polyol be include glucose, One or more in starch, sucrose, fructose, sorbierite, propane diols, isopropanol, glycerine and ethylene glycol.
- 3. glass etching liquid according to claim 1, it is characterised in that the water-soluble polymer includes guar gum, hydroxyl One or more in methylcellulose, carboxymethyl cellulose, sodium carboxymethylcellulose or hydroxyethyl cellulose.
- 4. glass etching liquid according to claim 1, it is characterised in that HCl weight/mass percentage composition is in the hydrochloric acid 45%.
- 5. glass etching liquid according to claim 1, it is characterised in that H2SO4 quality percentage contains in the dilute sulfuric acid Measure as 40%.
- 6. glass etching liquid according to claim 1, it is characterised in that H3PO4 weight/mass percentage composition in the phosphoric acid For 60%.
- 7. glass etching liquid according to claim 1, it is characterised in that HNO3 weight/mass percentage composition is in the nitric acid 55%.
- A kind of 8. glass etching method, it is characterised in that including：Glass is placed in the first service sink and cleaned, and is provided with the first ultrasonic generator in first service sink, passes through successively Cross running water, pure water, the cleaning of ultra-pure water three phases；The glass, which is placed on inside etch bath, utilizes the glass etching liquid etching described in any one of claims 1 to 7；Glass is placed in the second service sink and cleaned, and is provided with the second ultrasonic generator in second service sink, passes through successively Cross running water, pure water, the cleaning of ultra-pure water three phases；The glass is dried using circulating air.
- 9. glass etching liquid according to claim 8, it is characterised in that the temperature in the etch bath is 75 degrees Celsius.
- 10. glass etching liquid according to claim 8, it is characterised in that the temperature difference control in the etch bath is Celsius 2 Degree.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711084774.7A CN107673625A (en) | 2017-11-07 | 2017-11-07 | Glass etching liquid and glass etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711084774.7A CN107673625A (en) | 2017-11-07 | 2017-11-07 | Glass etching liquid and glass etching method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107673625A true CN107673625A (en) | 2018-02-09 |
Family
ID=61146564
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711084774.7A Pending CN107673625A (en) | 2017-11-07 | 2017-11-07 | Glass etching liquid and glass etching method |
Country Status (1)
| Country | Link |
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| CN (1) | CN107673625A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110102537A (en) * | 2019-06-13 | 2019-08-09 | 宁波永新光学股份有限公司 | A kind of cleaning method of the low chemical stability optical glass of high abrasion degree |
| CN115650595A (en) * | 2022-10-20 | 2023-01-31 | 济宁海富光学科技有限公司 | Glass cover plate forming method, forming equipment and storable medium |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN103241957A (en) * | 2013-05-28 | 2013-08-14 | 湖北优尼科光电技术有限公司 | Method for thinning and etching glass substrate |
| CN103288355A (en) * | 2013-05-30 | 2013-09-11 | 苏州新吴光电科技有限公司 | System and method for automatically etching glass |
| CN104109908A (en) * | 2014-07-23 | 2014-10-22 | 深圳市宇顺电子股份有限公司 | Sapphire glass etching solution and sapphire glass etching method |
| CN104230175A (en) * | 2014-09-05 | 2014-12-24 | 长沙市宇顺显示技术有限公司 | Glass etching liquid and glass etching method |
-
2017
- 2017-11-07 CN CN201711084774.7A patent/CN107673625A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102432185A (en) * | 2011-09-30 | 2012-05-02 | 郑州恒昊玻璃技术有限公司 | Etching liquid and etching process for anti-dazzle glass product |
| CN103241957A (en) * | 2013-05-28 | 2013-08-14 | 湖北优尼科光电技术有限公司 | Method for thinning and etching glass substrate |
| CN103288355A (en) * | 2013-05-30 | 2013-09-11 | 苏州新吴光电科技有限公司 | System and method for automatically etching glass |
| CN104109908A (en) * | 2014-07-23 | 2014-10-22 | 深圳市宇顺电子股份有限公司 | Sapphire glass etching solution and sapphire glass etching method |
| CN104230175A (en) * | 2014-09-05 | 2014-12-24 | 长沙市宇顺显示技术有限公司 | Glass etching liquid and glass etching method |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110102537A (en) * | 2019-06-13 | 2019-08-09 | 宁波永新光学股份有限公司 | A kind of cleaning method of the low chemical stability optical glass of high abrasion degree |
| CN115650595A (en) * | 2022-10-20 | 2023-01-31 | 济宁海富光学科技有限公司 | Glass cover plate forming method, forming equipment and storable medium |
| CN115650595B (en) * | 2022-10-20 | 2024-04-26 | 济宁海富光学科技有限公司 | Glass cover plate forming method, forming equipment and storable medium |
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Application publication date: 20180209 |