CN107619198A - Anti-reflection self-cleaning photovoltaic coated glass and preparation method thereof - Google Patents

Anti-reflection self-cleaning photovoltaic coated glass and preparation method thereof Download PDF

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Publication number
CN107619198A
CN107619198A CN201610562257.5A CN201610562257A CN107619198A CN 107619198 A CN107619198 A CN 107619198A CN 201610562257 A CN201610562257 A CN 201610562257A CN 107619198 A CN107619198 A CN 107619198A
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film layer
glass
cleaning
coated
coated glass
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陈志刚
郭松昌
杨柯
魏永强
陈明
孙向阳
李江涛
李福明
李超
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Henan Ancai Hi Tech Co Ltd
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Henan Ancai Hi Tech Co Ltd
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Abstract

The present invention relates to a kind of anti-reflection self-cleaning photovoltaic coated glass, glass substrate is included, it is characterised in that:Also include antireflection film layer and automatically cleaning film layer, the antireflection film layer is arranged on the surface of glass substrate side, and the automatically cleaning film layer is arranged on the antireflection film layer;The thickness of wherein described antireflection film layer is 70 to 120nm;The thickness of the automatically cleaning film layer is 10 to 50nm.The invention further relates to the preparation method of the anti-reflection self-cleaning photovoltaic coated glass.

Description

Anti-reflection self-cleaning photovoltaic coated glass and preparation method thereof
Technical field
The present invention relates to anti-reflection self-cleaning photovoltaic coated glass and preparation method thereof.
Background technology
Solar cell module can deposit dust during being placed in external environment use in photovoltaic glass surface, while can also Contamination atmosphere pollution in organic matter and sky flying bird excreta formed it is dirty, so as to influence the transmitance of light, reduce The conversion efficiency of photovoltaic cell.At present, photovoltaic module is substantially all has used the photovoltaic glass for being coated with antireflective coating, antireflective Film layer is usually porous nano silica structure, there is larger porosity, is easier to inhale compared with uncoated photovoltaic glass Pollutant in attached air.Titanium dioxide film has photocatalysis, can be by the organic matter on surface under the irradiation of ultraviolet light The carbon dioxide and water of low molecule amount are decomposed into, so as to go out Superhydrophilic in surface exhibits, is reached via rainwash can To self-cleaning effect.Thus titanium dioxide film is widely used on self-cleaning glass.Current pair have simultaneously it is anti-reflection and from The research of the photovoltaic coated glass of clean function is to be mixed silica and TiO 2 sol mostly, is then prepared compound Film, for example, preparing silica using sol-gal process in Chinese patent application CN201310069502.5 and titanium dioxide is answered Colloidal sol is closed, then plates the anti-reflection glass with clean of film preparation using czochralski method.The film layer of titanium dioxide film prepared by sol-gal process causes Close, its refractive index is about 2.2, and if the more folding that can improve composite film of the content of TiO 2 sol in complex sol Rate is penetrated, so as to substantially reduce the antireflective effect of film layer.In addition, it is very low to prepare coated glass efficiency using czochralski method, it is impossible to suitable The needs that should be mass produced.
The content of the invention
It is an object of the invention in order to solve problem of the prior art, there is provided a kind of anti-reflection self-cleaning photovoltaic plated film glass Glass, include glass substrate, it is characterised in that:Also include antireflection film layer and automatically cleaning film layer, the antireflection film layer is arranged on On the surface of glass substrate side, the automatically cleaning film layer is arranged on the antireflection film layer;
The thickness of wherein described antireflection film layer is 70 to 120nm;The thickness of the automatically cleaning film layer is 10 to 50nm.
Present invention also offers a kind of preparation method of anti-reflection self-cleaning photovoltaic coated glass, comprise the steps of:
A) it is coated with antireflective coating:Antireflective film liquid is coated with the surface of glass substrate side using rolling method, it is then low Temperature is formed by curing antireflection film layer;With
B) it is coated with automatically cleaning film:It is coated with the antireflection film layer formed using rolling method or spraying process in step a) from clear Clean film liquid, then carries out High temperature tempered, is formed and includes the tempering coated glass of automatically cleaning film layer.
The anti-reflection self-cleaning photovoltaic coated glass of the present invention, particularly using very white rolled glass as substrate, is applied on its matte There are the antireflective coating and automatically cleaning film of specific thicknesses, by controlling the thickness of antireflective coating and automatically cleaning film that coated glass can be made same When be provided with anti-reflection and self-cleaning function, overcome single layer anti reflective coating antifouling property difference it is low with individual layer self-cleaning film transmitance the problem of. In the preparation process in accordance with the present invention, it is coated with antireflective film liquid on the glass substrate using rolling method and utilizes rolling method or spraying process It is coated with automatically cleaning film liquid so that preparation method of the invention has the characteristics of technique is simple, cost-effective, production efficiency is high, non- Often suitable large area production.
Brief description of the drawings
Fig. 1 is anti-reflection self-cleaning photovoltaic coated glass structural representation;
Fig. 2 is the flow chart of anti-reflection self-cleaning photovoltaic glass preparation method;
Fig. 3 is rolling method structural representation;
Fig. 4 is the film layer ESEM sectional drawing of embodiment 1;
Fig. 5 is the film layer ESEM exterior view of embodiment 1.
Wherein, description of reference numerals is as follows:
1- glass substrates, 2- antireflection film layers, 3- automatically cleanings film layer, 4- applicator rolls, 5- antireflectives film liquid or automatically cleaning film, 6- anilox rolls, 7- support rollers
Embodiment
The anti-reflection self-cleaning photovoltaic coated glass of the present invention, includes glass substrate, it is characterised in that:Also include antireflection film layer With automatically cleaning film layer, the antireflection film layer is arranged on the surface of glass substrate side, and the automatically cleaning film layer is arranged on this On antireflection film layer;
The thickness of wherein described antireflection film layer is 70 to 120nm;The thickness of the automatically cleaning film layer is 10 to 50nm.
Fig. 1 shows the structural representation of the above-mentioned anti-reflection self-cleaning photovoltaic coated glass comprising duplicature of the present invention.
Glass substrate used in the present invention can be any glass conventionally used for printing opacity in solar energy photovoltaic glass field Substrate.The preferably glass substrate is very white rolled glass substrate in this application., must be through the past before glass baseplate surface plated film Ionized water is cleaned and dried, and is then equably applied in plating solution on glass baseplate surface that is clean and drying and is formed coating.
The antireflection film layer in the present invention is silica coating, its thickness be 80 to 120nm, preferably 90 to 120nm, more preferably 100 to 120nm;Its refractive index is 1.28-1.35.Form the antireflective film liquid of silica coating (preferably Ludox) it is preferably particle diameter (particle diameter) in 10-30nm, preferably 20-30nm;Antireflective film liquid is preferably single dispersing titanium dioxide Silicon organic silicon sol.SiO in antireflective film liquid (preferably Ludox)2Content be 2wt%-10wt%, preferably 2wt%- 5wt%, more preferably 2.5wt%-3.5wt%.Glued in the power of the antireflective film liquid (preferably Ludox) used in the inventive method Spend for 1.2-5.0cP, preferably 2.0-3.0cP, the viscosity is according to GB 10247-1988《Viscosity Measurement Methods》, using Ubbelohde Viscosity meter;The solids content of antireflective film liquid (preferably Ludox) is 2wt%-10wt%, and its method of testing is by anti-reflection Penetrate high temperature of the film liquid more than 600 DEG C to be sintered more than enough long-times, such as 6 hours, after organic principle is completely burned off The quality of remaining solid is tested, and the ratio of antireflective film liquid quality is its solid content;The pH value of antireflective film liquid is 1-4. Antireflective film liquid voluntarily can be synthesized or bought, as long as wherein silica dispersion meets aforementioned condition.For example, silicon is molten Glue can useMethod synthesizes (WernerArthur Fink,Controlled Growth of Monodisperse Silica Spheres in the Micron Size Range,Journal of Colloid and Interface Science 26,62-69 (1968)), Ludox used can also be bought certainly, such as purchased from Dutch DSM Company.
The automatically cleaning film layer in the present invention is the titanium dioxide film of titanium oxide film layer, particularly Detitanium-ore-type structure Layer, its thickness are 10 to 50nm, preferably 10 to 40nm, more preferably 10 to 30nm;Its refractive index is 1.48 to 2.2, preferably 1.48 To 1.60.
Titanium oxide film layer using titanium ore type structure has excellent photocatalysis, can under the irradiation of ultraviolet light The organic matter on surface is decomposed into the carbon dioxide and water of low molecule amount, so as to go out Superhydrophilic in surface exhibits, via rainwater Wash away the self-cleaning effect that can reach good.
Automatically cleaning film liquid used in the present invention is titanium dioxide film liquid commonly used in the art, such as available commercially from Sai Na companies of BeiJing ZhongKe.
The invention further relates to the preparation method of anti-reflection self-cleaning photovoltaic coated glass, comprise the steps of:
A) it is coated with antireflective coating:Antireflective film liquid is coated with the basic side surface of glass using rolling method, it is then low Temperature is formed by curing antireflection film layer;With
B) it is coated with automatically cleaning film:It is coated with the antireflection film layer formed using rolling method or spraying process in step a) from clear Clean film liquid, then carries out High temperature tempered, is formed and includes the tempering coated glass of automatically cleaning film layer.
Fig. 2 shows the flow chart of the anti-reflection self-cleaning photovoltaic glass preparation method.
The present invention step a) in, described low temperature curing conditions be temperature less than 300 DEG C, heating 2-5 minutes.It is described Low-temperature setting temperature is, for example, preferably 150 to 250 DEG C at 100 to 300 DEG C.
In the step a) of the present invention, antireflective film liquid is coated with using rolling method, the roll coating apparatus of rolling method is this area Conventional equipment, for example, include the parts such as applicator roll, anilox roll and support roller composition roll coater, the applicator roll is by polyurethane Rubber coated, rubber shore hardness are preferably 30-40HA, and anilox roll mesh number is preferably 60-100 mesh;Applicator roll during film On the contrary, i.e. inverse coating method, the applicator roll rotating speed (peripheral velocity) of roll coater can be 6-8m/ for rotation direction and glass method of advance Min, the transmission speed of glass substrate is 5.5-6.5m/min, and coating terminates rear low-temperature setting and forms transparent antireflection film layer. Roll coater can be the commercially available roll coater of any suitable coating.The technical indicator of antireflective film liquid, and preferable antireflective film liquid It is such as foregoing.
In the step b) of the present invention, described High temperature tempered condition is more than 650 DEG C, such as in 650-690 DEG C of temperature Between degree, the 140-160 seconds are heated in annealing furnace, room temperature is then rapidly cooled to and forms tempering coated glass.The tempering is Using the glass tempering process of routine, used annealing furnace is not particularly limited.Coated glass substrate tempering is handled, The combination between film layer and glass substrate is enhanced while strength of glass is increased.
In the present invention by obtained coated glass substrate using annealing furnace (for example, STG-A0713, purchased from department of Foshan City Up to glass machinery Co., Ltd) tempering processing, 650-690 DEG C of heating 140-160 second, then removes glass substrate in stove Stove, then high pressure cold air is blowed to bull nozzle the two sides of glass substrate, it is rapidly and uniformly cooled to room temperature, be made Tempering coated glass;The titanium oxide film layer formed after tempering, its thickness are 10 to 50nm.
In the step b) of the present invention, automatically cleaning film liquid, the roll coating apparatus of rolling method are coated with using rolling method or spraying process For the conventional equipment of this area, the roll coater that the parts such as applicator roll, anilox roll and support roller form, the applicator roll are for example, included Coated by polyurethane rubber, rubber shore hardness is preferably 30-40HA, and anilox roll mesh number is preferably 60-100 mesh;Apply membrane process Middle applicator roll direction and glass method of advance are on the contrary, i.e. inverse coating method, the applicator roll rotating speed (peripheral velocity) of roll coater Can be 3.5-5m/min, the transmission speed of glass substrate is 3.5-4.5m/min, and coating terminates rear High temperature tempered formation automatically cleaning Film layer.Roll coater can be the commercially available roll coater of any suitable coating.
Fig. 3 show step a) and b) in used rolling method structural representation.
Spraying rule is moved back and forth using spray gun, and self-cleaning film liquid is uniformly sprayed on into glass table in glass traveling process Face.Height of the shower nozzle of spray gun away from glass substrate is 150-500mm, preferably 200-300mm;The pressure of shower nozzle is 0.1- 2MPa, preferably 0.3-0.5MPa.Spray gun can be the commercially available spray gun of any suitable coating.Compared with the czochralski method phase in technology Than two kinds of coating methods greatly improve production efficiency, have saved production cost.Additionally rolling method can be coated with anti-reflection The technique that film liquid is penetrated with rolling method or spraying process coating automatically cleaning film liquid connects, and is especially suitable for the production of extensive coated glass.
Titanium dioxide film liquid used is for example foregoing.
When preparing anti-reflection self-cleaning photovoltaic coated glass, the thickness of film layer can be obtained the present invention by adjusting process parameter Obtain the thickness of preferable film layer:When preparing film layer using rolling method, the rotating speed and glass substrate transporting velocity of applicator roll are adjusted To obtain different thicknesses of layers;When preparing film layer using spraying process, the speed of travel with liquid measure and shower nozzle of shower nozzle is adjusted To obtain different thicknesses of layers.
In a preferred embodiment of the invention, antireflective film liquid is coated with using rolling method and rolling method is coated with automatically cleaning film The technique connection of liquid, to prepare anti-reflection self-cleaning photovoltaic coated glass.
In the present invention, if without opposite explanation, operation is carried out in normal temperature and pressure conditionses.
In the present invention, unless otherwise indicated, otherwise all numbers, percentage are based on the weight meter of first colloidal sol.
In the present invention, material used is known substance, commercially available or synthesized by known method.
In the present invention, equipment therefor or equipment are conventional equipment or equipment known to the field, commercially available.
The present invention is described in further detail with reference to embodiment.
Embodiment
Raw material information used is as follows in embodiment:
Silica dioxide antireflection film liquid, purchased from Dutch DSM N. V.
Titanium dioxide automatically cleaning film liquid, purchased from Sai Na companies of BeiJing ZhongKe
Annealing furnace, model STG-A0713, purchased from Si Da glass machineries Co., Ltd of Foshan City
Roll coater, model TS-1420, purchased from Foshan Tai Shang Machinery Co., Ltd.s
Embodiment 1
Very white rolled glass (long 300mm, wide 300mm, thick 3.2mm, is carried by Ancai Hi-Tech Co., Ltd., Henan For) cleaning machine clean up after with roll coater silica dioxide antireflection film liquid is applied on glass matte, wherein applied in roll coater Cloth rewinder roll rotating speed is 7m/min, and glass delivery speed is 6m/min.It is painted with after antireflective coating in the insulating box at a temperature of 150 DEG C solid Change 5 minutes, it is 100nm silica dioxide antireflection films to form thickness, is then coated with the self-cleaning film liquid of titanium dioxide using roll coater, its The rotating speed of middle applicator roll is 4m/min, and glass delivery speed is 9m/min, after the completion of coating, is sent into High temperature tempered stove and carries out steel Change, 650 DEG C are heated 150 seconds in annealing furnace, glass substrate then are removed into stove, then blowed to high pressure cold air with bull nozzle The two sides of glass substrate, makes it rapidly and uniformly be cooled to room temperature, and reinforced glass substrate, the titanium dioxide formed after tempering is made The self-cleaning film thickness of titanium is 20nm, is derived from the anti-reflection self-cleaning photovoltaic coated glass comprising antireflection film layer and automatically cleaning film layer. The ESEM sectional drawing and ESEM exterior view of the film layer of prepared anti-reflection self-cleaning photovoltaic coated glass respectively such as Fig. 4 and Shown in Fig. 5.
Embodiment 2
Very white rolled glass (long 300mm, wide 300mm, thick 3.2mm, is carried by Ancai Hi-Tech Co., Ltd., Henan For) cleaning machine clean up after with roll coater silica dioxide antireflection film liquid is applied on glass matte, wherein applied in roll coater Cloth rewinder roll rotating speed is 7.5m/min, and glass delivery speed is 6m/min.It is painted with after antireflective coating in the insulating box at a temperature of 150 DEG C Solidification 5 minutes, it is 120nm silica dioxide antireflection films to form thickness, is then coated with the self-cleaning film liquid of titanium dioxide using roll coater, Wherein the rotating speed of applicator roll is 4m/min, and glass delivery speed is 9m/min, after the completion of coating, is sent into High temperature tempered stove and carries out steel Change, 650 DEG C are heated 150 seconds in annealing furnace, glass substrate then are removed into stove, then blowed to high pressure cold air with bull nozzle The two sides of glass substrate, makes it rapidly and uniformly be cooled to room temperature, and reinforced glass substrate, the titanium dioxide formed after tempering is made The self-cleaning film thickness of titanium is 20nm, is derived from the anti-reflection self-cleaning photovoltaic coated glass comprising antireflection film layer and automatically cleaning film layer.
Embodiment 3
Very white rolled glass (long 300mm, wide 300mm, thick 3.2mm, is carried by Ancai Hi-Tech Co., Ltd., Henan For) cleaning machine clean up after with roll coater silica dioxide antireflection film liquid is applied on glass matte, wherein applied in roll coater Cloth rewinder roll rotating speed is 7.5m/min, and glass delivery speed is 6m/min.It is painted with after antireflective coating in the insulating box at a temperature of 150 DEG C Solidification 5 minutes, it is 120nm silica dioxide antireflection films to form thickness, is then coated with the self-cleaning film liquid of titanium dioxide using roll coater, Wherein the rotating speed of applicator roll is 4.5m/min, and glass delivery speed is 9m/min, after the completion of coating, is sent into High temperature tempered stove and carries out Tempering, 650 DEG C are heated 150 seconds in annealing furnace, glass substrate then are removed into stove, then blown high pressure cold air with bull nozzle To the two sides of glass substrate, it is rapidly and uniformly cooled to room temperature, reinforced glass substrate, the dioxy formed after tempering is made It is 30nm to change the self-cleaning film thickness of titanium, is derived from the anti-reflection self-cleaning photovoltaic plated film glass comprising antireflection film layer and automatically cleaning film layer Glass.
In order to be contrasted with embodiment 1-3, independent silica dioxide antireflection film glass is made and has carried out transmitance Test, it is as a result as shown in table 2 below.
Comparative example 1
Very white rolled glass (long 300mm, wide 300mm, thick 3.2mm, is carried by Ancai Hi-Tech Co., Ltd., Henan For) cleaning machine clean up after with roll coater silica dioxide antireflection film liquid is applied on glass matte, wherein applied in roll coater Cloth rewinder roll rotating speed is 7m/min, and glass delivery speed is 6m/min.It is painted with after antireflective coating in the insulating box at a temperature of 150 DEG C solid Change 5 minutes, it is 100nm silica dioxide antireflection films to form thickness.Then, it is sent into High temperature tempered stove and carries out tempering, in annealing furnace In 650 DEG C heat 150 seconds, glass substrate is then removed into stove, then high pressure cold air is blowed into glass substrate with bull nozzle Two sides, it is rapidly and uniformly cooled to room temperature, reinforced glass substrate is made.
Comparative example 2
Very white rolled glass (long 300mm, wide 300mm, thick 3.2mm, is carried by Ancai Hi-Tech Co., Ltd., Henan For) cleaning machine clean up after with roll coater silica dioxide antireflection film liquid is applied on glass matte, wherein applied in roll coater Cloth rewinder roll rotating speed is 7.5m/min, and glass delivery speed is 6m/min.It is painted with after antireflective coating in the insulating box at a temperature of 150 DEG C Solidification 5 minutes, it is 120nm silica dioxide antireflection films to form thickness.Then, it is sent into High temperature tempered stove and carries out tempering, in tempering 650 DEG C are heated 150 seconds in stove, glass substrate then are removed into stove, then high pressure cold air is blowed into glass substrate with bull nozzle Two sides, it is rapidly and uniformly cooled to room temperature, be made reinforced glass substrate.
Performance test
Following performance test is carried out to the anti-reflection self-cleaning photovoltaic coated glass prepared by embodiment 1-3:
(1) test of light transmittance
When being applied on solar cell, due to battery absorb be sunshine energy, and monocrystalline silicon, polysilicon electricity The absorption region of pond semiconductor layer concentrates on 380-1100nm scopes, beyond the scope of visible ray, therefore is tested in the present invention Light transmittance be effective transmissivity in the wavelength band.
Visible light transmissivity, according to " the Glass in building-Determination of light of ISO 9050 transmittance,solar direct transmittance,total solar energy transmittance, Ultraviolet transmittance and related glazing factors ", using the desk-top solar energy glass of air supporting Spectral transmission test equipment (being purchased from Beijing AoBoTai Science Co., Ltd) determines;Test result is listed in the table below in 1.
(2) photodegradation rate is tested
Using the photocatalysis performance for making the anti-reflection self-cleaning duplicature of photocatalysis experimental rig test by oneself, the present invention uses methyl blue The aqueous solution is organic matter to be measured, concentration 10-30mg/L.Ultraviolet source by 1 8W 365nm black light lamps and 4 8W 254nm UV lamps form, and the vertical range of fluorescent tube and sample is 10cm.Ventilation equipment is equipped with irradiation unit.Self-cleaning glass is cut Sample into 60 × 60mm sizes is lain in a diameter of 100mm culture dish, and the amount of methyl blue solution used is complete to cover Glass surface is defined.After ultraviolet light 2.5 hours, Japanese Shimadzu Uvmini-1240 ultra-violet and visible spectrophotometers are utilized The absorbance tested after solution pre-irradiation, and calculate photodegradation rate.The absorbance of methyl blue is greatest around in wavelength 600nm, this The absorbance of text test is all the value in 600nm wavelength.
Self-cleaning glass is immersed in methyl blue solution, in order to exclude methyl blue decomposition of itself under illumination condition, From not soaking the methyl blue aqueous solution of glass as a comparison.If the absorbance of the methyl blue aqueous solution is A before illumination0, have certainly The absorbance cleaned after glass and methyl blue aqueous solution illumination without self-cleaning glass is respectively Am、A0m, keep first before and after illumination Base indigo plant aqueous solution constancy of volume, photodegradation rate are:
(3) thicknesses of layers method of testing
Thicknesses of layers is measured using the alpha-SE ellipsometers of J.A.Woollam Co. companies, the original of ellipsometer Reason is the change by measuring light beam irradiating sample surface light polarization after reflection, normal to obtain the optics of sample Number.Test result is listed in the table below in 1.
(4) surface antireflection film outward appearance
Surface antireflection film outward appearance is according to GB/T18915.1-2002 " coated glass part 1s:Solar control coated glass glass Glass " determines;Test result is listed in the table below in 1.
Table 1 lists embodiments of the invention 1-3 light transmittance and the test result of photocatalysis effect
The anti-reflection self-cleaning photovoltaic glass that the present invention makes it can be seen from the content of table 1 has excellent anti-reflective effect And automatically cleaning effect.(the qualified finger of film layer outward appearance is observed under 20 power microscopes, and film layer is smooth, continuous, pin-free.)
Table 2 lists the test result of the comparative example 1-2 of present invention light transmittance
It can be seen from the content in Tables 1 and 2 compared with independent antireflective coating glass, the present invention make it is anti-reflection from Clean photovoltaic glass is coated with after titanium dioxide film on antireflection film layer, and its transmitance does not almost decay.

Claims (9)

1. a kind of anti-reflection self-cleaning photovoltaic coated glass, includes glass substrate, it is characterised in that:Also include antireflection film layer and from clearly Clean film layer, the antireflection film layer are arranged on the surface of glass substrate side, and the automatically cleaning film layer is arranged on the antireflective In film layer;
The thickness of wherein described antireflection film layer is 70 to 120nm;The thickness of the automatically cleaning film layer is 10 to 50nm.
2. anti-reflection self-cleaning photovoltaic coated glass according to claim 1, wherein the glass substrate is very white rolled glass substrate.
3. anti-reflection self-cleaning photovoltaic coated glass according to claim 1, wherein the antireflection film layer is silica coating, its Thickness is 80 to 120nm, preferably 90 to 120nm, more preferably 100 to 120nm;Its refractive index is 1.28-1.35.
4. anti-reflection self-cleaning photovoltaic coated glass according to claim 1, wherein the automatically cleaning film layer is titanium oxide film layer, its Thickness is 10 to 50nm, preferably 10 to 40nm, more preferably 10 to 30nm;Its refractive index be 1.48 to 2.2, preferably 1.48 to 1.60。
5. anti-reflection self-cleaning photovoltaic coated glass according to claim 4, wherein the automatically cleaning film layer is Detitanium-ore-type structure Titanium oxide film layer.
6. the preparation method of the anti-reflection self-cleaning photovoltaic coated glass such as any one of claim 1-5, is comprised the steps of:
A) it is coated with antireflective coating:Antireflective film liquid is coated with the surface of glass substrate side using rolling method, then low-temperature solid Change forms antireflection film layer;With
B) it is coated with automatically cleaning film:Automatically cleaning film is coated with the antireflection film layer formed using rolling method or spraying process in step a) Liquid, then carries out High temperature tempered, is formed and includes the tempering coated glass of automatically cleaning film layer.
7. preparation method according to claim 6, it is characterised in that described low temperature curing conditions be below 300 DEG C of temperature, Heat 2-5 minutes.
8. preparation method according to claim 6, it is characterised in that described High temperature tempered condition is the tempering more than 650 DEG C The 140-160 seconds are heated in stove, room temperature is then rapidly cooled to and forms tempering coated glass.
9. preparation method according to claim 6, it is characterised in that low-temperature setting temperature is 100 to 300 DEG C.
CN201610562257.5A 2016-07-15 2016-07-15 Anti-reflection self-cleaning photovoltaic coated glass and preparation method thereof Pending CN107619198A (en)

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* Cited by examiner, † Cited by third party
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CN108424007A (en) * 2018-06-13 2018-08-21 宁波纳诺特新材料科技有限公司 A kind of photovoltaic glass antireflective film
CN108424007B (en) * 2018-06-13 2021-03-02 宁波纳诺特新材料科技有限公司 Photovoltaic glass antireflection film
CN109867452A (en) * 2019-01-10 2019-06-11 晶澳太阳能有限公司 A kind of film plating process and solar cell module of tempered glass
EP3968060A1 (en) * 2020-09-15 2022-03-16 Applied Materials, Inc. Anti-reflective and anti-viral protective shield, method for manufacturing an anti-reflective and anti-viral protective shield and/or an anti-reflective and anti-viral visor for a face protection system, and anti-reflective and anti-viral visor for a face protection system

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Application publication date: 20180123