CN107614743A - The rotating cathode unit of magnetic control sputtering device - Google Patents
The rotating cathode unit of magnetic control sputtering device Download PDFInfo
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- CN107614743A CN107614743A CN201680028805.4A CN201680028805A CN107614743A CN 107614743 A CN107614743 A CN 107614743A CN 201680028805 A CN201680028805 A CN 201680028805A CN 107614743 A CN107614743 A CN 107614743A
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- target
- loop
- adjustable plate
- fluid circulation
- outer cylinder
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention provides one kind quickly can reliably discharge the rotating cathode unit (RC) of the magnetic control sputtering device of the cooling water of residual in target (Tg) as far as possible.It is provided with the first outlet (46) using the inner space of the drive block of rotation driving target (Db) inner barrel (42) as fluid circulation channel (Fp), the first loop (47) is in space between inner barrel and outer cylinder body (43), the second outlet (26) connected with the first outlet and the second servo loop (27) with the first circuit communication are set on the body (23,24) in target.The discoidal adjustable plate (48) of the right-end openings of fixed closed target in the left part of outer cylinder body, the associated channel (48e) diametrically extended untill towards the position in the first loop from the outer rim of adjustable plate is formed on the face on the right side of adjustable plate, the flowing of the fluid between second servo loop and the first loop is adjusted by associated channel.Radial front end with detection associated channel points to the detection means (64) of the posture of the adjustable plate of the lower section of vertical direction.
Description
Technical field
The present invention relates to a kind of rotating cathode unit used in magnetic control sputtering device.
Background technology
For example there is patent document 1 known to this rotating cathode unit.Device in the previous example has columnar
Target, the drive block of the rotation driving target and with the fluid circulation for making cooling water or the circulation canal of compressed air fluid circulation
Device.Fluid entry port and flow export are provided with drive block, inside it, the fluid circulation communicated with inflow entrance is provided with and leads to
First outlet in road and the first loop of the fluid circulation channel communicated with flow export.On the other hand, body is set in target,
While space between target and body forms the second outlet of the fluid circulation channel communicated with the first outlet, the inside of body
Space forms the second servo loop of the fluid circulation channel communicated with the first loop.
The open-ended cap body of closing target is installed on the end of the drive block side of target.Fluid is formed in cap body to lead to
Road, the inlet opening for allowing fluid to be flowed into fluid passage from the second outlet is partially formed with the outer rim of cap body, second goes
Road is connected with second servo loop.Also, during applying electric power to target and target is sputtered, supply and cool down to fluid circulation channel
Water so as to cooling water full of the second outlet in target and second servo loop, with rotation of the drive block to target by with cooling water
Heat exchange carry out cooled target, the cooling water is to flow to second from the second outlet by the inlet opening of the cap body rotated together with target
The cooling water in loop.
However, because target suffers erosion because of sputtering, so needing to regularly replace, now, it is contemplated that maintainability etc., having must
The cooling water remained in target reliably to be discharged (draining) in advance.In the device of above-mentioned previous example, with sputtering when it is identical,
Cooling water is provided to refrigerant circulation channel interior and compressed air is provided while rotary target, the cooling water drainage that will be remained in target
Go out (drain operation).Herein, when carrying out drain operation in the case of being in horizontal attitude in the axis of target, remain in the second outlet
Cooling water first is provided from the upper end of second servo loop compressed air promotion, inflow of the cooling water promoted from cap body
The fluid passage that opening is flowed into cap body, flow to the dirty end of second servo loop through the fluid passage and then discharged from target.Therewith
Water level in the vertical direction in two outlets declines downwards.Now, in the device of above-mentioned previous example, due to cooling water only
Second servo loop can be flowed to by the fluid passage through cap body during water submerged in the inlet opening of the cap body of rotation, so with water level
Decline, the drainage speed of cooling water declines, and the problem of discharge cooling water needs the time be present.
Prior art literature
Patent document
【Patent document 1】U.S. Patent Publication 2010/243428
The content of the invention
Invention technical problems to be solved
In view of the above circumstances, problem of the invention be to provide one kind can as far as possible rapidly and reliably discharge target in residual it is cold
But the rotating cathode unit of the magnetic control sputtering device of water.
Solve the means of technical problem
To solve above-mentioned problem, magnetic control sputtering device rotating cathode unit of the invention has tubular target, rotation driving
The drive block of target and the fluid circulating device with the fluid circulation channel for making fluid circulation, magnetic control sputtering device rotation
Cathode electrode unit is characterised by：Drive block have along target axis direction extend inner barrel, with inner barrel concentric arrangement and with
The drive device of the outer cylinder body and rotation driving of the connection of axis direction one end of the target outer cylinder body, the inner space structure of inner barrel
Into the first outlet of fluid circulation channel, meanwhile, the space between inner barrel and outer cylinder body forms the first of fluid circulation channel
Loop, target are enclosed on along outside the body of its axis direction extension, the fluid circulation connected with the first outlet are provided with body and is led to outside
Second outlet in road and the second servo loop with the fluid circulation channel of the first circuit communication, using from target towards drive block side as the right side
Side, using from drive block towards target side as left side, the disc of the right-end openings of fixed closed target in the left part of outer cylinder body
Adjustable plate, formed on the face on the right side of adjustable plate from the outer rim of adjustable plate untill the position towards the first loop radially
The associated channel of upper extension and the flowing that the fluid between second servo loop and the first loop is adjusted by the associated channel, have inspection
Survey the detection means of the posture of the adjustable plate of the lower section of the radial front end sensing vertical direction of associated channel.
Using the present invention, rotating cathode unit is installed in a vacuum chamber, by drive block with defined in vacuum atmosphere
Rotary speed rotation driving target, and simultaneously by applying the electric power with negative potential to target and sputtering target.In sputtering, make conduct
The cooling water of fluid circulates in fluid circulation channel, cools down target by the heat exchange with cooling water.Also, for the dimension of target
Shield etc., includes the replacing of target, when taking out rotating cathode unit from vacuum chamber, carries out the drain operation in target in advance.
Herein, in the present invention, because the radial front end with detection associated channel points to the tune of the lower section of vertical direction
Save the detection means of the posture of plate, thus by drive block stop the rotation driving target when or when will carry out drain operation,
Testing result based on detection means make the posture of adjustable plate be changed into associated channel radial front end point to vertical direction lower section,
And keep the state.Also, cooling water is not supplied to the first outlet, and compressed air is supplied to first outlet.Thus, with pressure
Contracting air promotes the cooling water in fluid circulation channel successively, through in the first outlet in drive block, the second outlet in target, target
Second servo loop and drive block in the first loop discharge.Now, although water level in second servo loop in target is to vertical direction
Lower section decline, but the inflow entrance (i.e. the outer rim of adjustable plate) of the fluid of the associated channel due to flowing to adjustable plate is always located in erecting
Nogata to bottom, so untill the cooling water in second servo loop is pushed out entirely, it is excellent that only compressed air will not be formed
The path first passed through, the cooling water that will reliably remove in fluid circulation channel.Even if the also, water in the second servo loop in target
Position declines, because the inflow entrance of associated channel is almost by water submerged, so can make cooling water and compressed air together as soon as possible to
Discharge in the first loop.So in the present invention, in the component parts for adjusting the drive device for flowing into rotation driving target is set
While the adjustable plate of the flowing of fluid, due to taking the composition of its controllable posture in drain operation, so quickly can may be used
By the cooling water remained in ground discharge target.
In the present invention, the drive device is configured to motor, and drive shaft and outer barrel wound on the motor
Band between the outer peripheral face of body；The detection is formed to be arranged in the drive shaft and wind the sensor connected on the belt wheel of band
Device.Thus, simply achieve that very much the front end of the adjustable plate when carrying out drain operation always towards under vertical direction
The posture of side.
Brief description of the drawings
Fig. 1 is the figure of the structure for the rotating cathode unit for illustrating the sputter equipment of the present invention.
Fig. 2 is the enlarged fragmentary cross section for the key component for showing rotating cathode unit.
Fig. 3 is the stereogram for illustrating adjustable plate.
Embodiment
Illustrate the embodiment of the rotating cathode unit of the magnetic control sputtering device of the present invention referring to the drawings.Wherein,
Rotating cathode unit shown in Fig. 1 is arranged in the vacuum chamber outside figure with horizontal attitude, as benchmark, uses the vertical side of expression
The term in the direction such as upward " on ", " under " and "left", "right".
Reference picture 1, rotating cathode unit R C have in vacuum chamber outside figure with the substrate W as film forming object upper
Columnar target Tg that lower section is oppositely disposed upwards and by the clip Cp drive block Db being connected with target Tg right-hand member and pass through
The support block Sb that clip Cp is connected with target Tg left end.The driven shaft 12 supported by bearing 11 is provided with support block Sb, is supported
Target Tg one end rotates freely.Target Tg by tubular substrate tube 21 and pass through the adhesives such as indium or tin (not shown) and substrate tube
The target 22 of 21 tubulars engaged is formed.As target 22, according to the composition for the film to be formed on substrate W from metal or
Suitable material is selected in metallic compound.
It is enclosed on outside substrate tube 21 outside the outer tube 23 as the body extended along target Tg axial direction i.e. left and right directions substantially total length,
The inner tube 24 as body is arranged concentrically in outer tube 23.The opening at the left and right directions both ends of outer tube 23 is respectively by the envelope of cap body 25
Close, axial through hole 25a is had in cap body 25.Also, the inner space of inner tube 24 forms the of fluid circulation channel Fp
Two outlets 26, the fluid circulation channel Fp are formed in the sputter procedure of target 22 or make cooling water or pressure during drain operation
The fluid circulating device Fu of the fluid circulation of contracting air.Space between outer tube 23 and inner tube 24 forms fluid circulation channel Fp's
Second servo loop 27.In addition, illustrate although not shown, but assembling has known tie in the space for example between outer tube 23 and inner tube 24
The magnet unit of structure, in the sputter procedure of target 22, the space between substrate W and target Tg produces vertical point by magnetic field
Approximately axially total length of the line for the position that amount is zero along target 22 extends and closes into the stray field of runway shape.Further, as pipe
Body, exemplified is the two-layer pipe by inner tube 24 and the concentric arrangement of outer tube 23, it is not limited to this, no matter form is such as
What, as long as the structure of the second outlet 26 and second servo loop 27 can be provided while target Tg is supported.
Drive block Db has shell 41 as shown in Figure 2, sets up on the right inwall of shell 41 and prolongs in the lateral direction vertically
The inner barrel 42 stretched, the left end of inner barrel 42 are connected in liquid-tight manner with inner tube 24.On shell 41 around fixed inner barrel 42,
Outer cylinder body 43 is configured with one heart with the inner barrel 42.The annular recessed portion formed with radial depressions on the inner peripheral surface of outer cylinder body 43
It is embedded with 43a, recess 43a and is contacted respectively with the outer surface of inner barrel 42 and the inner surface of outer cylinder body 43 and the two is electrically connected
The brush 44 connect.Now, the inner space of inner barrel 42 forms fluid circulation channel Fp the first outlet 45, inner barrel 42 and outer
Space between cylinder 43 forms fluid circulation channel Fp the first loop 46.In addition, offered on brush 44 in left and right directions
The through hole 44a of upper insertion, form the part in the first loop 46.
Outer cylinder body 43 by support member 5 of multiple bearings 51 and inner sleeve in shell 41 by rotatably being supported.Oil
Sealing 52 bearing 51 left and right directions both sides overcoat on outer cylinder body 43.Further, it is provided with drive block Db outside rotation driving
The drive device 6 of cylinder 43 and the coupled target Tg of rotation driving.Drive device 6 has motor 61 and wound on motor 61
Drive shaft on band 63 between the belt wheel 62 that sets and the outer peripheral face of outer cylinder body 43.Further, it is connected with belt wheel 62 as inspection
The sensor 64 of device is surveyed, by sensor 64, such as following records, detection associated channel 48e radial front end is that otch 48c refers to
To the posture of the adjustable plate 48 of the lower section of vertical direction.Due to known product can be used as sensor 64, so including tune
Including the detection method for saving the posture of plate 48, detailed description will be omitted.In addition, as detection means, the rotation of detection motor can be used
The device of corner or origin position i.e. sensor or encoder etc. according to known to the species use of motor 61 used, such as
The motor 61 that once stops the rotation is may be set to, then motor 61, which is parked in, returns in the state of origin position, now adjustable plate 48
The posture of the lower section of vertical direction is pointed in otch 48c.
Further, being provided with the flange 47 of electric conductivity on the left end of outer cylinder body 43 in liquid-tight manner, it is spaced the flange 47 and passes through clip
Cp is connected with substrate tube 21.Once thus motor 61 and rotation driving outer cylinder body 43, then target Tg and the quilt of outer cylinder body 43
Together with defined revolution rotation driving.It is also equipped with closely sealed with the left side of flange 47 on the left end of outer cylinder body 43 and closes substrate tube
The adjustable plate 48 of 21 right-end openings.Fig. 3 is referred again to, is offered on adjustable plate 48 by the central opening of the break-through of inner barrel 42
48a, three through hole 48b are offered around it.Also, together it is bolted and (is not schemed with flange 47 by through hole 48b adjustable plates 48
Show) it is fixed on the left end of outer cylinder body 43.
Further, in the outer rim of adjustable plate 48, interval as defined in being formed between the inner peripheral surface of substrate tube 21 is partially formed
Otch 48c, the inflow entrance of fluid is limited with otch 48c.It is concavely provided with the face on the right side of adjustable plate 48 from otch 48c to court
To the first loop 46 position untill the groove portion 48d that radially extends, form phase between the left surface of groove portion 48d and flange 47
Communication channel 48e.Now, the interval between the inner peripheral surface of otch 48c length and substrate tube 21 and groove portion 48d width root
It is suitable according to the flow of the cooling water circulated in sputter procedure or the supply gas pressure of compressed air etc. of drain operation described below
Work as setting, then the width for having groove portion 48d may be alternatively formed to from outer rim to the tapered taper in the first loop 46.Pass through the adjustable plate 48
Adjust the flow of the fluid between the loop 46 of second servo loop 27 and first.
Internal on shell 41 to be respectively arranged with total outlet 71 and total loop 72, front end sets and led with what inner barrel 42 was connected
Electrical house steward 7.And total outlet 71 connects with the first outlet 45 in inner barrel 42, and total loop 72 connects with the first loop 46
Logical, house steward 7 is connected with handpiece Water Chilling Units Ch.Further, being connected with branch pipe 81 on house steward 7, by switch valve 82 and there are known features
Compressor 8 be connected.Now, fluid circulation channel Fp, handpiece Water Chilling Units Ch and the fluid of the composition present embodiment of compressor 8 follow
Loop device Fu.Further, the output cable 9 for the shielding power supply being connected with house steward 7 outside figure.Inner barrel 42 is through brush 44 and outside
Cylinder 43 turns on, and the outer cylinder body 43 turns on that (i.e. inner barrel 42 and target 22 is same through flange 47 with substrate tube 21 and then with target 22
Current potential).Thus, by the rotation driving outer cylinder body 43 of motor 61 and rotation driving target Tg, and simultaneously can be by through from sputtering electricity
The regulation electric power that the output cable 9 in source applies for example with negative potential to target 22 carrys out sputtering target material 22, in sputter procedure, leads to
Subcooled water unit Ch makes cooling water be circulated in fluid circulation channel Fp, cools down target 22 by the heat exchange with cooling water.
Herein, because above-mentioned target 22 suffers erosion because of sputtering, so needing the regular rotating cathode unit R C that takes out to enter
Row is changed, and carries out discharging the operation (drain operation) of the cooling water remained in target Tg before the replacing.In the present embodiment,
When motor 61 stops, according to the testing result from sensor 64, make adjustable plate 48 in associated channel 48e radial front end i.e.
Otch 48c points to the posture of the lower section of vertical direction.Also, in drain operation, stop the water supply from handpiece Water Chilling Units Ch, beat
Open switching valve 82 provides the compressed air from compressor 8 into total outlet 71.Thus, through the first outlet in drive block Db
45th, the second outlet 26 in target Tg, the first loop 46 in second servo loop 27 and drive block Db in target Tg and total loop is passed through
72 discharges.
Now, although the water level in second servo loop 27 declines to the lower section of vertical direction, due to as adjustable plate 48
The inflow entrance of otch 48c fluid is always located in the bottom of vertical direction, so until the cooling water in second servo loop 27 is complete
The path that only compressed air preferentially passes through will not be formed untill being pushed out, it is cold in fluid circulation channel Fp by reliably removing
But water.Even if also, the water level decreasing in second servo loop 27, because the inflow entrance of associated channel is almost by water submerged, so can
Cooling water and compressed air are together discharged to the first loop 46 as early as possible through associated channel 48e.So as to can discharge fast and reliablely
The cooling water of residual in target Tg.Further, due to being fixed with adjustable plate 48 on drive block Db sides outer cylinder body 43, even if so removing
Clip Cp pulls down target Tg from drive block Db, and adjustable plate 48 also remains mounted on constant on outer cylinder body 43.Therefore, target is being changed
Deng maintenance terminate after, such as can be without be adjusted such that adjustable plate 48 is in sensor 64 to the position of adjustable plate 48 again
Inspection positions otch 48c point to vertical direction lower section posture, maintainability can be improved.
Embodiments of the present invention are illustrated above, but the present invention is not limited to the above.In above-mentioned implementation
In mode, to be set as in the state of motor 61 is parked in and returns to origin position, adjustable plate 48 in associated channel 48e footpath forward
End is to be illustrated exemplified by otch 48c points to the posture below vertical direction, but when the control of centralized Control sputter equipment action
When unit processed has drain operation instruction, it is in otch that adjustable plate 48 can be also made according to the detected value electric rotating machine 61 of detection means 64
48c points to the posture of the lower section of vertical direction.
Description of reference numerals
RC ... rotating cathodes unit, Db ... drive blocks, Fp ... fluid circulation channels, Fu ... fluid circulating devices, Tg ... targets,
42 ... inner barrels, 43 ... outer cylinder bodies (cylinder), 45 ... first outlets (fluid circulation channel), 46 ... first loop (fluid circulations
Passage), 48 ... adjustable plates, 48e ... associated channels (fluid circulation channel), 23 ... outer tubes (body), 61 ... motors (driving dress
Put), 64 ... sensors (detection means).
Claims (2)
1. a kind of magnetic control sputtering device rotating cathode unit, its with tubular target, rotation driving target drive block and with
Make the fluid circulating device of the fluid circulation channel of fluid circulation, it is characterised in that：
Drive block have along target axis direction extend inner barrel, with inner barrel concentric arrangement and with axis direction one end of target
The drive device of the outer cylinder body and rotation driving of the connection outer cylinder body, the inner space of inner barrel form fluid circulation channel
First outlet, meanwhile, the space between inner barrel and outer cylinder body forms the first loop of fluid circulation channel, is enclosed on outside target along it
Outside the body of axis direction extension, the second outlet of the fluid circulation channel connected with the first outlet is provided with body and with the
The second servo loop of the fluid circulation channel of primary Ioops connection；
Using from target towards drive block side as right side, using from drive block towards target side as left side, it is solid in the left part of outer cylinder body
Surely the discoidal adjustable plate of the right-end openings of target is closed, is formed on the face on the right side of adjustable plate from the outer rim of adjustable plate to court
To the first loop position untill the associated channel that diametrically extends, and pass through the associated channel and adjust second servo loop and first
The flowing of fluid between loop, there is the appearance of the adjustable plate of the lower section of the radial front end sensing vertical direction of detection associated channel
The detection means of state.
2. magnetic control sputtering device according to claim 1 rotating cathode unit, it is characterised in that：The drive device tool
There is a motor, and the band between drive shaft wound on the motor and the outer peripheral face of outer cylinder body；With the sensor connected on belt wheel
The detection means is formed, the belt wheel is arranged in the drive shaft and winds band.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015-102213 | 2015-05-19 | ||
| JP2015102213 | 2015-05-19 | ||
| PCT/JP2016/002409 WO2016185714A1 (en) | 2015-05-19 | 2016-05-17 | Rotating cathode unit for magnetron sputtering device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107614743A true CN107614743A (en) | 2018-01-19 |
| CN107614743B CN107614743B (en) | 2019-10-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680028805.4A Active CN107614743B (en) | 2015-05-19 | 2016-05-17 | The rotating cathode unit of magnetic control sputtering device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6205527B2 (en) |
| KR (1) | KR102053286B1 (en) |
| CN (1) | CN107614743B (en) |
| TW (1) | TWI634223B (en) |
| WO (1) | WO2016185714A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111455326A (en) * | 2020-06-11 | 2020-07-28 | 中国航发航空科技股份有限公司 | Vacuum arc plating device for reducing target material cooling time |
| CN116057199A (en) * | 2020-10-08 | 2023-05-02 | 株式会社爱发科 | Driving block for rotary cathode unit |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10727034B2 (en) * | 2017-08-16 | 2020-07-28 | Sputtering Components, Inc. | Magnetic force release for sputtering sources with magnetic target materials |
| JP6552590B2 (en) * | 2017-12-20 | 2019-07-31 | キヤノントッキ株式会社 | Sputtering apparatus and method of using the same |
| JP6646798B1 (en) * | 2018-10-17 | 2020-02-14 | 株式会社アルバック | Contact type power supply device and contact unit |
| WO2020079881A1 (en) | 2018-10-17 | 2020-04-23 | 株式会社アルバック | Contact-type power supply device and contact unit |
| JP7303393B2 (en) * | 2020-09-16 | 2023-07-04 | 株式会社アルバック | Drive block for rotating cathode unit |
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| JPH05230634A (en) * | 1992-02-20 | 1993-09-07 | Kobe Steel Ltd | Arc ion plating device |
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| JP4641014B2 (en) * | 2006-09-11 | 2011-03-02 | 新明和工業株式会社 | Mounting structure of plasma gun to chamber |
| KR101147484B1 (en) * | 2007-01-26 | 2012-05-22 | 가부시끼가이샤 오오사까 신꾸우기끼 세이사꾸쇼 | Sputter method and sputter device |
| US20100200395A1 (en) * | 2009-02-06 | 2010-08-12 | Anton Dietrich | Techniques for depositing transparent conductive oxide coatings using dual C-MAG sputter apparatuses |
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2016
- 2016-05-17 JP JP2017518765A patent/JP6205527B2/en active Active
- 2016-05-17 CN CN201680028805.4A patent/CN107614743B/en active Active
- 2016-05-17 WO PCT/JP2016/002409 patent/WO2016185714A1/en active Application Filing
- 2016-05-17 KR KR1020177036221A patent/KR102053286B1/en active IP Right Grant
- 2016-05-19 TW TW105115559A patent/TWI634223B/en active
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| CN2808932Y (en) * | 2005-03-14 | 2006-08-23 | 深圳南玻南星玻璃加工有限公司 | High power sputtering film coating source |
| US8182662B2 (en) * | 2009-03-27 | 2012-05-22 | Sputtering Components, Inc. | Rotary cathode for magnetron sputtering apparatus |
| CN202181345U (en) * | 2011-06-20 | 2012-04-04 | 肇庆市前沿真空设备有限公司 | Rotary target device for vacuum magnetron sputtering |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111455326A (en) * | 2020-06-11 | 2020-07-28 | 中国航发航空科技股份有限公司 | Vacuum arc plating device for reducing target material cooling time |
| CN116057199A (en) * | 2020-10-08 | 2023-05-02 | 株式会社爱发科 | Driving block for rotary cathode unit |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2016185714A1 (en) | 2016-11-24 |
| CN107614743B (en) | 2019-10-22 |
| TWI634223B (en) | 2018-09-01 |
| JPWO2016185714A1 (en) | 2017-11-02 |
| TW201708584A (en) | 2017-03-01 |
| KR102053286B1 (en) | 2019-12-06 |
| JP6205527B2 (en) | 2017-09-27 |
| KR20180006977A (en) | 2018-01-19 |
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