CN107613054B - Processing method, shell and the mobile terminal of shell - Google Patents
Processing method, shell and the mobile terminal of shell Download PDFInfo
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- CN107613054B CN107613054B CN201710932442.3A CN201710932442A CN107613054B CN 107613054 B CN107613054 B CN 107613054B CN 201710932442 A CN201710932442 A CN 201710932442A CN 107613054 B CN107613054 B CN 107613054B
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Abstract
The invention discloses a kind of processing methods of shell, comprising: provides shell, shell has day linear slit and non-signal shielding material, and non-signal shielding material is set in the day linear slit of shell, and shell has the first Mixed Zone, metallic region and the second Mixed Zone；Polishing metallic region；It polishes the first Mixed Zone；It polishes the second Mixed Zone.The handover line polished twice (the first default polishing position and the second default polishing position) is located in the all-metal region of shell by the processing method of shell provided in an embodiment of the present invention, so that there is polishing consumptive material metallic region when the handover line is polished enough intensity to support the polishing, the yield of polishing is improved.The present invention also provides a kind of shell and mobile terminals.
Description
Technical field
The present invention relates to field of electronic device more particularly to a kind of processing methods of shell, shell and mobile terminal.
Background technique
Polishing is one kind of process for modifying surface, refers generally to change material surface physics by friction by rough object
A kind of processing method of performance, main purpose are to obtain particular surface roughness.
The polishing of existing mobile phone battery cover generally disposably polishes to whole surface, then such as specific position
Marginal position is polished, to form fillet or cambered surface.
Summary of the invention
The purpose of the present invention is to provide a kind of processing methods of shell.
The embodiment of the invention provides a kind of processing methods of shell, comprising:
Shell is provided, the shell has day linear slit and non-signal shielding material, and the non-signal shielding material is set to
In the day linear slit of the shell, the shell has the first Mixed Zone, metallic region and the second Mixed Zone being disposed adjacent,
The metallic region is the region that metal is coherent in the shell, and first Mixed Zone and second Mixed Zone are all
The region of sequentially connected metal, non-signal shielding material and metal in the shell；
The first polishing consumptive material is set to be polishing to the shell from the first default polishing position in the metallic region of the shell
Metallic region on the second default polishing position on；
Make the second polishing consumptive material preset polishing position from the first of the metallic region to polish and pass through adjacent described the
One Mixed Zone is until on an edge of the shell；
Make the second polishing consumptive material preset polishing position the second of the metallic region to polish and pass through adjacent described the
Two Mixed Zones are until in the other edge of the shell.
The embodiment of the invention also provides a kind of shell, the shell is process by the processing method of shell.
The embodiment of the invention also provides a kind of mobile terminals, including shell.
The process of the entire outer surface for shell of polishing is broadly divided by the processing method of shell provided in an embodiment of the present invention
It polishes: first polishing the all-metal region of shell twice, then the Mixed Zone of shell (is mixed the first Mixed Zone and second
Close region) it polishes, wherein by the handover line polished twice (the first default polishing position and the second default polishing position) position
In in the all-metal region of shell so that the handover line polished twice is far from day linear slit so that polishing consumptive material the handover line into
There is metallic region enough intensity to support the polishing when row polishing, improve the yield of polishing.
Detailed description of the invention
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in embodiment
Attached drawing is briefly described, it should be apparent that, the accompanying drawings in the following description is some embodiments of the present invention, general for this field
For logical technical staff, without creative efforts, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is a kind of flow diagram of the processing method of shell provided in an embodiment of the present invention；
Fig. 2 is the schematic diagram of the shell in one of Fig. 1 mobile terminal；
Fig. 3 is another schematic diagram of the mobile moderate in Fig. 2；
Fig. 4 is the schematic diagram of the shell in Fig. 1；
Fig. 5 is the flow diagram of the processing method of another shell provided in an embodiment of the present invention；
Fig. 6 is the schematic diagram of the shell in one of Fig. 5 mobile terminal.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those of ordinary skill in the art are obtained every other under that premise of not paying creative labor
Embodiment shall fall within the protection scope of the present invention.
In the description of new embodiment of the present invention, it is to be understood that the orientation of the instructions such as term " thickness " or position are closed
System is merely for convenience of description of the present invention and simplification of the description to be based on the orientation or positional relationship shown in the drawings, rather than implies
Or the device or element of instruction meaning must have a particular orientation, be constructed and operated in a specific orientation, therefore cannot understand
For limitation of the present invention.
Below in conjunction with attached drawing 1 and attached drawing 5, it is situated between in detail to the processing method of shell provided in an embodiment of the present invention
It continues.
Referring to Figure 1, be a kind of shell provided in an embodiment of the present invention processing method flow diagram.Such as Fig. 1 institute
Show, the method for the embodiment of the present invention may comprise steps of S101- step S109.
S101: shell 1 is provided.
Specifically, referring to figure 2. and Fig. 3, providing shell 1, the shell 1 has day linear slit 11 and non-signal shielding material
12, the non-signal shielding material 12 is set in the day linear slit 11 of the shell 1, and the shell 1 has the be disposed adjacent
One Mixed Zone D1, metallic region D3 and the second Mixed Zone D2, the metallic region D3 are that metal is coherent in the shell 1
Region, the first Mixed Zone D1 and the second Mixed Zone D2 are all sequentially connected metal, non-letter in the shell 1
The region of number shielding material 12 and metal.
Shell 1 is made according to actual needs, it is possible to understand that, shell 1 can be the rear shell 1 of mobile terminal.Wherein, shell
1 there is outer surface 1a and inner surface 1b, outer surface 1a to be exposed to the surface in air for shell 1, i.e. user uses mobile terminal
When the surface that can directly touch；Inner surface 1b is then component such as mainboard, battery inside mobile terminal etc.
Surface.
Rear shell 1 has backboard and encloses the side being connected on backboard.The junction of its dorsulum and the side is cambered surface.
It should be understood that making shell 1 in the following manner: sheet metal being put into mold and strikes out preset shape
Metal plate；The processing of internal structure and external styling is carried out, to the metal plate of the preset shape on numerically-controlled machine tool to obtain
Shell 1.Wherein, sheet metal is aluminium plate, and the aluminium plate of bulk is cut into the aluminium plate of fritter, the fritter aluminium that will have been cut
Plate is put into the metal plate for carrying out being stamped and formed out preset shape in mold, it is possible to understand that, the punching press number of aluminium plate can be
Once, or multiple continuous punching；Metal plate is processed on numerically-controlled machine tool, forms required shell 1.
It should be understood that the day linear slit 11 on shell 1 is process in the following manner:
Day linear slit 11 is opened up on shell 1, the day linear slit 11 has two groups, and day linear slit 11 is respectively close to institute described in two groups
The end setting for stating shell 1, so that the shell 1 forms sequentially connected first Mixed Zone D1, metallic region D3 and second
Mixed Zone D2；
Non-signal shielding material 12 is filled in the day linear slit 11, the non-signal shielding material 12 protrudes the antenna
Seam 11 is on the outer surface 1a of the shell 1.
In one embodiment, referring to figure 2. and Fig. 3, the day linear slit 11 on shell 1 has two groups, and every group of day linear slit 11 has
There are two strip antennas to stitch 11.Non-signal shielding material 12 is filled in every strip antenna seam 11.Every strip antenna stitches 11 from the side of shell 1
The side that extends to shell 1 along the direction of the short side S1 or short side S2 of shell 1 an edge L1 other edge L2 on.Wherein
Its linear slit 11 is arc, the junction setting close to backboard and side.Certainly, in other embodiments, day linear slit 11 can be with
For on the junction of backboard and side.
In one embodiment, nanometer mould filling is carried out to day linear slit 11 to realize that day linear slit 11 fills non-signal shielding material
Material 12.Non-signal shielding material 12 can be glue or plastic cement.It certainly, in other embodiments, can also be by day linear slit
11 progress dispensings are to realize that day linear slit 11 fills non-signal shielding material 12.
S103: polishing metallic region D3.
Specifically, referring to figure 2., beating the first polishing consumptive material from first on the metallic region D3 of the shell 1 is default
Mill position A1 is polishing on the on the metallic region D3 of the shell 1 second default polishing position A2.
The polishing track of first polishing consumptive material is X1 as shown in Figure 2.
Shell 1 is fixed on polishing jig, the first polishing consumptive material is clamped using manipulator, positions manipulator to first
Default polishing position A1, and it is gradually moved to the second default polishing position A2 along the first default polishing position A1, to metal
Region D3 polishes.
It should be understood that the non-signal shielding material 12 in the first Mixed Zone D1 is far from the described first default polishing
Region included by the position of related features band of position A1；Non-signal shielding material 12 in the second Mixed Zone D2 is far from described
Region included by the position of related features band of second default polishing position A2.
In one embodiment, the non-signal closed in the described first default polishing position A1 and the first Mixed Zone D1
The distance between shielding material 12 is 1mm~2mm.And/or described second default polishing position A2 and second Mixed Zone
The distance between non-signal shielding material 12 closed in D2 is 1mm~2mm.
Specifically, between the non-signal shielding material 12 closed in the first default polishing position A1 and the first Mixed Zone D1
Distance be 2mm.Between the non-signal shielding material 12 closed in second default polishing position A2 and the second Mixed Zone D2
Distance is 2mm.Certainly, in other embodiments, the non-letter closed in the first default polishing position A1 and the first Mixed Zone D1
The distance between number shielding material 12 can also be 1mm, 1.5mm etc..Second default polishing position A2 and the second Mixed Zone D2
In the distance between the non-signal shielding material 12 that closes on can also be 1mm, 1.5mm etc..
Wherein, it should be noted that manipulator is during positioning, due to the influence of manipulator positioning accuracy, first
The i.e. actual polishing position in the position that polishing consumptive material is fallen on shell 1 will receive the influence of positioning accuracy and preset polishing first
The fluctuation is defined as the first polishing consumptive material and default beaten in first by the two sides fluctuation of the default polishing position A1 of position A1 and first
Grind the position of related features band of position A1.Second default polishing position A2 is also in this way, details are not described herein again.
By the way that the first default default polishing position A2 of polishing position A1 and second is entirely limited the metallic region in shell 1
D3, even if even if so that the practical polishing position of the first polishing consumptive material is influenced to deviate and will not also polish by positioning accuracy
Onto the non-signal shielding material 12 of Mixed Zone, and lead to that non-signal shielding material 12 becomes the handover line polished twice and by
It is not enough likely to occur and collapses in turn in intensity, greatly optimize polishing operation.
S105: the first Mixed Zone D1 of polishing.
S107: the second Mixed Zone D2 of polishing.
Specifically, referring to figure 2., making the second polishing consumptive material preset polishing position A1 from the first of the metallic region D3 and beating
Adjacent the first Mixed Zone D1 is ground and passed through until on an edge of the shell 1；
So that the second polishing consumptive material is polished in the second default polishing position A2 of the metallic region D3 and passes through adjacent institute
The second Mixed Zone D2 is stated until in the other edge of the shell 1.
The polishing track of second polishing consumptive material X2 as shown in Figure 2；Third polish consumptive material polishing track it is as shown in Figure 3
X3。
It should be noted that the polishing of the first Mixed Zone D1 and the second Mixed Zone D2 can be while carrying out, may be used also
To be that front and back carries out.
Polish the first Mixed Zone D1 when, the first default polishing position A1, which is polishing metallic region D3, first to be mixed with polishing
The handover line of region D1, since the first default polishing position A1 is entirely limited the metallic region D3 in shell 1, even if so that the
Even if the practical polishing position of a dozen abrasion materials is influenced to deviate by positioning accuracy will not also be polished to Mixed Zone
On non-signal shielding material 12, and lead to that non-signal shielding material 12 becomes the handover line polished twice and due to intensity not enough into
And be likely to occur and collapse, greatly optimize polishing operation.
Polish the second Mixed Zone D2 when, the second default polishing position A2, which is polishing metallic region D3, second to be mixed with polishing
The handover line of region D2, since the second default polishing position A2 is entirely limited the metallic region D3 in shell 1, even if so that the
Even if the practical polishing position of two polishing consumptive materials is influenced to deviate by positioning accuracy will not also be polished to Mixed Zone
On non-signal shielding material 12, and lead to that non-signal shielding material 12 becomes the handover line polished twice and due to intensity not enough into
And be likely to occur and collapse, greatly optimize polishing operation.
It should be understood that the first polishing consumptive material and the second polishing consumptive material are different consumptive materials.
It should be noted that the non-signal shielding material 12 of protrusion can be buffed off in the process of polishing.
S109: the whole polishing of shell 1.
Specifically, referring to figure 2., third polishing consumptive material is made to start to polish and successively pass through in an edge S1 of the shell 1
The first Mixed Zone D1, the metallic region D3 and the second Mixed Zone D2 are crossed up to the other edge S2 of the shell 1
On.
The polishing track of third polishing consumptive material X4 as shown in Figure 2.
The polishing of an entirety is carried out to shell 1 by third polishing consumptive material, further unified first Mixed Zone D1, gold
Belong to the polishing of region D3 and the second Mixed Zone D2, so that shell 1 has a preferable, smoother buffed surface.
The process of the entire outer surface 1a for shell 1 of polishing is broadly divided into and beats twice by shell 1 provided in an embodiment of the present invention
Mill: first polishing to the all-metal region D3 of shell 1, then (the first Mixed Zone D1 and second is mixed to the Mixed Zone of shell 1
Close region D2) it polishes, wherein by the handover line polished twice (the first default default polishing position polishing position A1 and second
A2) in the all-metal region D3 of shell 1, so that the handover line polished twice is far from day linear slit 11, so that polishing consumptive material exists
There is metallic region D3 enough intensity to support the polishing when handover line is polished, and improve the yield of polishing.
Fig. 5 is referred to, is a kind of flow diagram of the processing method of shell provided in an embodiment of the present invention.Such as Fig. 5 institute
Show, the method for the embodiment of the present invention may comprise steps of S201- step S211.
S201: shell 1 is provided.
Specifically, please referring to Fig. 6, shell 1 is provided, the shell 1 has day linear slit 11 and non-signal shielding material 12, institute
It states non-signal shielding material 12 to be set in the day linear slit 11 of the shell 1, the shell 1 has the first mixing being disposed adjacent
Region D1, metallic region D3 and the second Mixed Zone D2, the metallic region D3 are the region that metal is coherent in the shell 1,
The first Mixed Zone D1 and the second Mixed Zone D2 is all sequentially connected metal, non-signal screen in the shell 1
Cover the region of material 12 and metal.
Shell 1 is made according to actual needs, it is possible to understand that, shell 1 can be the rear shell 1 of mobile terminal.Wherein, shell
1 there is outer surface 1a and inner surface 1b, outer surface 1a to be exposed to the surface in air for shell 1, i.e. user uses mobile terminal
When the surface that can directly touch；Inner surface 1b is then component such as mainboard, battery inside mobile terminal etc.
Surface.
Rear shell 1 has backboard and encloses the side being connected on backboard.The junction of its dorsulum and the side is cambered surface.
It should be understood that making shell 1 in the following manner: sheet metal being put into mold and strikes out preset shape
Metal plate；The processing of internal structure and external styling is carried out, to the metal plate of the preset shape on numerically-controlled machine tool to obtain
Shell 1.Wherein, sheet metal is aluminium plate, and the aluminium plate of bulk is cut into the aluminium plate of fritter, the fritter aluminium that will have been cut
Plate is put into the metal plate for carrying out being stamped and formed out preset shape in mold, it is possible to understand that, the punching press number of aluminium plate can be
Once, or multiple continuous punching；Metal plate is processed on numerically-controlled machine tool, forms required shell 1.
S203: opening up day linear slit 11, and non-signal shielding material 12 is filled in the day linear slit 11.
Wherein, day linear slit 11 is opened up, non-signal shielding material 12, the non-signal shielding are filled in the day linear slit 11
Material 12 protrudes the day linear slit 11 on the outer surface 1a of the shell 1, and 12 overflow of non-signal shielding material is to institute
State the metallic region D3 of shell 1.
Specifically, opening up day linear slit 11 on shell 1, the day linear slit 11 has two groups, and day linear slit 11 described in two groups divides
It is not arranged close to the end of the shell 1, so that the shell 1 forms sequentially connected first Mixed Zone D1, metallic region
D3 and the second Mixed Zone D2；
Non-signal shielding material 12 is filled in the day linear slit 11, the non-signal shielding material 12 protrudes the antenna
Seam 11 is on the outer surface 1a of the shell 1, and 12 overflow of non-signal shielding material is to the metallic region of the shell 1
D3。
In one embodiment, referring to figure 2. and Fig. 3, the day linear slit 11 on shell 1 has two groups, and every group of day linear slit 11 has
There are two strip antennas to stitch 11.Non-signal shielding material 12 is filled in every strip antenna seam 11.Every strip antenna stitches 11 from the side of shell 1
The side that extends to shell 1 along the direction of the short side S1 or short side S2 of shell 1 an edge L1 other edge L2 on.Wherein
Its linear slit 11 is arc, the junction setting close to backboard and side.Certainly, in other embodiments, day linear slit 11 can be with
For on the junction of backboard and side.
In one embodiment, nanometer mould filling is carried out to day linear slit 11 to realize that day linear slit 11 fills non-signal shielding material
Material 12.Non-signal shielding material 12 can be glue or plastic cement.It certainly, in other embodiments, can also be by day linear slit
11 progress dispensings are to realize that day linear slit 11 fills non-signal shielding material 12.
In one embodiment, Fig. 6 is please referred to, non-signal shielding material 12 is during carrying out nanometer injection molding, so that leaning on
The non-signal shielding material 12 of nearly metallic region D3 is overflowed from day linear slit 11, and overflow is to the metallic region D3 closed on,
So that 12 layers of non-signal shielding material are formed on the part metals region D3 of non-signal shielding material 12, using as subsequent
The surplus of polishing.
It should be understood that please referring to Fig. 6, drainage trough 13, one end connection of the drainage trough 13 are opened up on the shell 1
In on the day linear slit 11, the other end of the drainage trough 13 extends towards the direction close to the metallic region D3, so that institute
Drainage trough 13 is stated to preset the first of 12 overflow of non-signal shielding material to the shell 1 the default polishing position A1 and second
Polish position A2.
In one embodiment, Fig. 6 is please referred to, drainage trough 13 is just arranged in the day linear slit 11 close to metallic region D3, so that drawing
Non-signal shielding material 12 in day linear slit 11 can be drained to (the first default polishing position metallic region D3 closed on by chute 13
Set the default polishing position A2 of A1 or second), to serve as the subsequent machining allowance of metallic region D3.
S205: polishing metallic region D3.
Specifically, please referring to Fig. 6, beat the first polishing consumptive material from first on the metallic region D3 of the shell 1 is default
Mill position A1 is polishing on the on the metallic region D3 of the shell 1 second default polishing position A2.
The polishing track of first polishing consumptive material is X1 as shown in Figure 2.
Shell 1 is fixed on polishing jig, the first polishing consumptive material is clamped using manipulator, positions manipulator to first
Default polishing position A1, and it is gradually moved to the second default polishing position A2 along the first default polishing position A1, to metal
Region D3 polishes.
It should be understood that the non-signal shielding material 12 in the first Mixed Zone D1 is far from the described first default polishing
Region included by the position of related features band of position A1；Non-signal shielding material 12 in the second Mixed Zone D2 is far from described
Region included by the position of related features band of second default polishing position A2.
In one embodiment, the non-signal closed in the described first default polishing position A1 and the first Mixed Zone D1
The distance between shielding material 12 is 1mm~2mm.And/or described second default polishing position A2 and second Mixed Zone
The distance between non-signal shielding material 12 closed in D2 is 1mm~2mm.
Specifically, between the non-signal shielding material 12 closed in the first default polishing position A1 and the first Mixed Zone D1
Distance be 2mm.Between the non-signal shielding material 12 closed in second default polishing position A2 and the second Mixed Zone D2
Distance is 2mm.Certainly, in other embodiments, the non-letter closed in the first default polishing position A1 and the first Mixed Zone D1
The distance between number shielding material 12 can also be 1mm, 1.5mm etc..Second default polishing position A2 and the second Mixed Zone D2
In the distance between the non-signal shielding material 12 that closes on can also be 1mm, 1.5mm etc..
Wherein, it should be noted that manipulator is during positioning, due to the influence of manipulator positioning accuracy, first
The i.e. actual polishing position in the position that polishing consumptive material is fallen on shell 1 will receive the influence of positioning accuracy and preset polishing first
The fluctuation is defined as the first polishing consumptive material and default beaten in first by the two sides fluctuation of the default polishing position A1 of position A1 and first
Grind the position of related features band of position A1.Second default polishing position A2 is also in this way, details are not described herein again.
By the way that the first default default polishing position A2 of polishing position A1 and second is entirely limited the metallic region in shell 1
D3, even if even if so that the practical polishing position of the first polishing consumptive material is influenced to deviate and will not also polish by positioning accuracy
Onto the non-signal shielding material 12 of Mixed Zone, and lead to that non-signal shielding material 12 becomes the handover line polished twice and by
It is not enough likely to occur and collapses in turn in intensity, greatly optimize polishing operation.
S207: the first Mixed Zone D1 of polishing.
S209: the second Mixed Zone D2 of polishing.
Specifically, please referring to Fig. 6, so that the second polishing consumptive material is preset polishing position A1 from the first of the metallic region D3 and beat
Adjacent the first Mixed Zone D1 is ground and passed through until on an edge S1 of the shell 1；
So that the second polishing consumptive material is polished in the second default polishing position A2 of the metallic region D3 and passes through adjacent institute
The second Mixed Zone D2 is stated until on the other edge S2 of the shell 1.
The polishing track of second polishing consumptive material X2 as shown in Figure 2；Third polish consumptive material polishing track it is as shown in Figure 3
X3。
It should be noted that the polishing of the first Mixed Zone D1 and the second Mixed Zone D2 can be while carrying out, may be used also
To be that front and back carries out.
Polish the first Mixed Zone D1 when, the first default polishing position A1, which is polishing metallic region D3, first to be mixed with polishing
The handover line of region D1, since the first default polishing position A1 is entirely limited the metallic region D3 in shell 1, even if so that the
Even if the practical polishing position of a dozen abrasion materials is influenced to deviate by positioning accuracy will not also be polished to Mixed Zone
On non-signal shielding material 12, and lead to that non-signal shielding material 12 becomes the handover line polished twice and due to intensity not enough into
And be likely to occur and collapse, greatly optimize polishing operation.
Polish the second Mixed Zone D2 when, the second default polishing position A2, which is polishing metallic region D3, second to be mixed with polishing
The handover line of region D2, since the second default polishing position A2 is entirely limited the metallic region D3 in shell 1, even if so that the
Even if the practical polishing position of two polishing consumptive materials is influenced to deviate by positioning accuracy will not also be polished to Mixed Zone
On non-signal shielding material 12, and lead to that non-signal shielding material 12 becomes the handover line polished twice and due to intensity not enough into
And be likely to occur and collapse, greatly optimize polishing operation.
It should be understood that the first polishing consumptive material and the second polishing consumptive material are different consumptive materials.
Also, since 12 overflow of non-signal shielding material in antenna slot is default to the first default polishing position A1 and second
Polish position A2, therefore when carrying out the polishing of the first Mixed Zone D1, the second Mixed Zone D2, the first default polishing position A1 and
Non-signal shielding material 12 on second default polishing position A2 all can provide intensity to a certain degree for handover line, further excellent
Change technique for grinding.
It should be noted that drainage trough 13 and non-signal shielding material 12 can be all buffed off in the process of polishing.
S211: the whole polishing of shell 1.
Specifically, please referring to Fig. 6, third polishing consumptive material is made to start to polish and successively pass through in an edge S1 of the shell 1
The first Mixed Zone D1, the metallic region D3 and the second Mixed Zone D2 are crossed up to the other edge S2 of the shell 1
On.
The polishing track of third polishing consumptive material X4 as shown in Figure 2.
The polishing of an entirety is carried out to shell 1 by third polishing consumptive material, further unified first Mixed Zone D1, gold
Belong to the polishing of region D3 and the second Mixed Zone D2, so that shell 1 has a preferable, smoother buffed surface.
The process of the entire outer surface 1a for shell 1 of polishing is broadly divided into and beats twice by shell 1 provided in an embodiment of the present invention
Mill: first polishing to the all-metal region D3 of shell 1, then (the first Mixed Zone D1 and second is mixed to the Mixed Zone of shell 1
Close region D2) it polishes, wherein by the handover line polished twice (the first default default polishing position polishing position A1 and second
A2) in the all-metal region D3 of shell 1, so that the handover line polished twice is far from day linear slit 11, so that polishing consumptive material exists
There is metallic region D3 enough intensity to support the polishing when handover line is polished, and improve the yield of polishing.
Below in conjunction with attached drawing 2 to 4 and Fig. 6, describe in detail to mobile terminal 100 provided in an embodiment of the present invention.
It should be noted that the method for the shell 1 of attached mobile terminal shown in Fig. 2 100 Fig. 1 and embodiment illustrated in fig. 5 through the invention
It is fabricated, for ease of description, only parts related to embodiments of the present invention are shown, and it is disclosed by specific technical details,
Please refer to Fig. 1 of the present invention and embodiment shown in fig. 5.
The present embodiments relate to mobile terminal 100 can be any equipment for having communication and store function, such as:
Tablet computer, mobile phone, electronic reader, remote controler, personal computer (PersonalComputer, PC), laptop, vehicle
Carry the smart machine with network function such as equipment, Web TV, wearable device.
Referring to figure 2. and Fig. 4, mobile terminal 100 include shell 1.In the present embodiment, shell 1 is mobile terminal 100
Back-cover.Shell 1 is made of signal shielding material, it is possible to understand that, signal shielding material is metal, in the present embodiment, shell 1
Material is aluminium.
It should be understood that referring to figure 4., shell 1 has backboard and encloses all frames being connected on backboard.Wherein, shell 1 has
Outer surface 1a and inner surface 1b, outer surface 1a are that shell 1 is exposed to the surface in air, i.e., when user uses mobile terminal 100
The surface that can directly touch；Inner surface 1b is then component such as mainboard, battery inside mobile terminal 100 etc.
Surface.
Referring to figure 2. and Fig. 3, the day linear slit 11 on shell 1 has two groups, and every group of day linear slit 11 has two strip antennas seam
11.Non-signal shielding material 12 is filled in every strip antenna seam 11.Every strip antenna seam 11 from an edge of the side of shell 1 along
The direction of the short side of shell 1 extends in the other edge of the side of shell 1.Wherein day linear slit 11 is arc, close to backboard and
The junction of side is arranged.Certainly, in other embodiments, day linear slit 11 can also for on the junction of backboard and side.
In one embodiment, nanometer mould filling is carried out to day linear slit 11 to realize that day linear slit 11 fills non-signal shielding material
Material 12.Non-signal shielding material 12 can be glue or plastic cement.It certainly, in other embodiments, can also be by day linear slit
11 progress dispensings are to realize that day linear slit 11 fills non-signal shielding material 12.
The precision of the outer surface 1a of the shell 1 polish by the processing method of Fig. 1 and shell shown in fig. 6
It arrives.
Shell 1 and mobile terminal 100 provided in an embodiment of the present invention by polish shell 1 entire outer surface 1a process master
It is divided into and polishes twice: first polishes the all-metal region D3 of shell 1, then to Mixed Zone (the first mixed zone of shell 1
Domain D1 and the second Mixed Zone D2) it polishes, wherein by the handover line polished twice (the first default polishing position A1 and second
Default polishing position A2) it is located in the all-metal region D3 of shell 1, so that the handover line polished twice makes far from day linear slit 11
There is the consumptive material metallic region D3 when the handover line is polished that must polish enough intensity to support the polishing, improve polishing
Yield.
The module or unit of the embodiment of the present invention can be combined or be split according to actual needs.
It is the embodiment of the embodiment of the present invention above, it is noted that those skilled in the art are come
It says, without departing from the principles of the embodiments of the present invention, several improvements and modifications can also be made, these improvements and modifications
It is considered as protection scope of the present invention.
Claims (10)
1. a kind of processing method of shell characterized by comprising
Shell is provided, the shell has day linear slit and non-signal shielding material, and the non-signal shielding material is set to described
In the day linear slit of shell, the shell has the first Mixed Zone, metallic region and the second Mixed Zone being disposed adjacent, described
Metallic region is the region that metal is coherent in the shell, and first Mixed Zone and second Mixed Zone are all described
The region of sequentially connected metal, non-signal shielding material and metal in shell；
The first polishing consumptive material is set to be polishing to the gold of the shell from the first default polishing position in the metallic region of the shell
Belong on the second default polishing position on region；
Make the second polishing consumptive material polish from the first default polishing position of the metallic region and pass through adjacent described first to mix
Region is closed until on an edge of the shell；
Make the second polishing consumptive material polish in the second default polishing position of the metallic region and pass through adjacent described second to mix
Region is closed until in the other edge of the shell；Wherein, the handover line of polishing for the first time and the second polishing is located at the shell
All-metal region in so that the handover line is far from the day linear slit.
2. the method according to claim 1, wherein the non-signal shielding material in first Mixed Zone is remote
Region included by position of related features band from the described first default polishing position；Non-signal shielding in second Mixed Zone
Region included by position of related features band of the material far from the described second default polishing position.
3. according to the method described in claim 2, it is characterized in that, the described first default polishing position and first mixed zone
The distance between non-signal shielding material closed in domain is 1mm~2mm；And/or
Described second, which presets the distance between the non-signal shielding material closed in polishing position and second Mixed Zone, is
1mm~2mm.
4. according to claim 1 to method described in 3 any one, which is characterized in that the described method includes:
Third polishing consumptive material is set to start to polish and successively by the first Mixed Zone, the metal area at an edge of the shell
Domain and second Mixed Zone are until in the other edge of the shell.
5. the method according to claim 1, wherein in the step of offer shell, comprising:
A day linear slit is opened up on shell, the antenna sewer there are two groups, end of the day linear slit respectively close to the shell described in two groups
Portion's setting, so that the shell forms sequentially connected first Mixed Zone, metallic region and the second Mixed Zone；
Non-signal shielding material is filled in the day linear slit, the non-signal shielding material protrudes the antenna and is sewn in the shell
On the outer surface of body, and the non-signal shielding material overflow is beaten to the first default polishing position of the shell and second are default
Grind position.
6. according to the method described in claim 5, it is characterized in that, open up drainage trough on the housing, the drainage trough
One end is connected to the antenna and sews on, and the other end of the drainage trough extends towards the direction close to the metallic region, so that
Polishing is preset in the first of the non-signal shielding material overflow to the shell default polishing position and second by the drainage trough
Position.
7. according to the method described in claim 5, it is characterized in that, carrying out nanometer mould filling to the day linear slit to realize
The day linear slit fills non-signal shielding material.
8. the method according to claim 1, wherein the first polishing consumptive material and the second polishing consumptive material
Type is not identical.
9. a kind of shell, which is characterized in that the processing side that the shell passes through shell described in claim 1 to 8 any one
Method is fabricated.
10. a kind of mobile terminal, which is characterized in that the mobile terminal includes shell as claimed in claim 9.
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| CN201710932442.3A CN107613054B (en) | 2017-09-30 | 2017-09-30 | Processing method, shell and the mobile terminal of shell |
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| CN201710932442.3A CN107613054B (en) | 2017-09-30 | 2017-09-30 | Processing method, shell and the mobile terminal of shell |
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| CN107613054B true CN107613054B (en) | 2019-10-18 |
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| CN110732954B (en) * | 2019-11-05 | 2021-07-06 | 东莞信柏结构陶瓷股份有限公司 | Method for polishing joint line between mobile phone rear cover and middle frame |
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| CN105979740A (en) * | 2016-06-20 | 2016-09-28 | 东莞劲胜精密组件股份有限公司 | 3C electronic product shell and preparation method thereof |
| CN106102389A (en) * | 2016-08-16 | 2016-11-09 | 广东欧珀移动通信有限公司 | The processing method of a kind of housing, housing and mobile terminal |
| CN106659016A (en) * | 2016-11-29 | 2017-05-10 | 广东欧珀移动通信有限公司 | Shell and manufacturing method therefor, and mobile terminal |
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| KR100737933B1 (en) * | 2006-03-03 | 2007-07-10 | 김성철 | Manufacturing method of titanium case of portable phone and home appliances |
| CN103990880A (en) * | 2014-06-06 | 2014-08-20 | 哈尔滨工业大学 | Non-metallic material and metal material brazing method capable of forming interpenetrating network structure brazing seams |
| CN105979740A (en) * | 2016-06-20 | 2016-09-28 | 东莞劲胜精密组件股份有限公司 | 3C electronic product shell and preparation method thereof |
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| CN107613054A (en) | 2018-01-19 |
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