CN107604337A - A kind of linear evaporation source arrangement for detecting and its method for detecting - Google Patents
A kind of linear evaporation source arrangement for detecting and its method for detecting Download PDFInfo
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- CN107604337A CN107604337A CN201710751425.XA CN201710751425A CN107604337A CN 107604337 A CN107604337 A CN 107604337A CN 201710751425 A CN201710751425 A CN 201710751425A CN 107604337 A CN107604337 A CN 107604337A
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- 238000001704 evaporation Methods 0.000 title claims abstract description 152
- 230000008020 evaporation Effects 0.000 title claims abstract description 151
- 238000000034 method Methods 0.000 title claims abstract description 12
- 238000001514 detection method Methods 0.000 claims abstract description 52
- 230000008569 process Effects 0.000 claims abstract description 5
- 239000013078 crystal Substances 0.000 claims description 22
- 230000002159 abnormal effect Effects 0.000 claims description 9
- 238000012544 monitoring process Methods 0.000 claims description 9
- 239000010453 quartz Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 230000000903 blocking effect Effects 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000007921 spray Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000006872 improvement Effects 0.000 description 4
- 230000008859 change Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Abstract
The invention discloses a kind of linear evaporation source arrangement for detecting, and applied on the evaporation coating device in evaporation process, the arrangement for detecting is provided with least one set, and the arrangement for detecting is fixed in the cavity wall of evaporation chamber；Wherein, arrangement for detecting described in every group includes multiple detectors, consistent with the distance of the linear evaporation source described in the evaporation chamber on evaporation coating device with detector described in group；The arrangement for detecting is used for the spray nozzle clogging situation of batch (-type) detection linear evaporation source and/or the airflow condition of chamber is deposited.The invention also discloses a kind of method for detecting of linear evaporation source arrangement for detecting.
Description
Technical Field
The invention relates to the field of vacuum coating monitoring and the like, in particular to a linear evaporation source detection device and a detection method thereof.
Background
Organic Light-Emitting diodes (UIV OLEDs) are also called Organic electroluminescent displays and Organic Light-Emitting semiconductors. At present, Organic Light Emitting Diodes (OLEDs) are increasingly used because of their advantages such as wide viewing angle, wide color gamut, high contrast, vivid color, and high reduction. The production process of Organic Light Emitting Diodes (OLEDs) is mainly thermal evaporation, and the performance of an evaporation source is particularly important, so that the improvement of material utilization, the reduction of production cost, and the improvement of device display effects, such as the improvement of film formation uniformity, are a constant theme.
In the production and manufacture of Organic Light Emitting Diodes (OLEDs), accurate and comprehensive monitoring of the evaporation rate of an evaporation source is required to obtain a uniform film layer. The conventional method for detecting the rate of a linear evaporation source is to install a Quartz crystal oscillator monitoring system (QCM) at one end or both ends of the linear evaporation source to monitor and control the evaporation rate of the whole linear evaporation source in real time. The monitoring method has the disadvantages that only local speed and uniformity can be monitored, and if the condition that an individual nozzle (nozzle) is blocked cannot be found in time, batch scrapping can occur in the process of mass production.
Disclosure of Invention
The first object of the present invention is: the linear evaporation source detection device can judge whether a crucible is blocked by a nozzle or not and whether sudden airflow disturbance exists in a cavity or not by intermittently detecting the speed of a plurality of positions of the linear evaporation source so as to avoid product scrapping caused by the change of film forming uniformity and film forming quality.
The technical scheme for realizing the purpose is as follows: a linear evaporation source detection device is applied to an evaporation device in an evaporation process, and at least one group of detection devices is arranged and fixed on the cavity wall of an evaporation cavity; each group of detection devices comprises a plurality of detectors, and the detectors in the same group are consistent with the linear evaporation source on the evaporation device in the evaporation chamber in distance; the detection device is used for intermittently detecting the blocking condition of the nozzle of the linear evaporation source and/or the air flow condition of the evaporation chamber.
In a preferred embodiment of the present invention, the detecting devices are provided in two sets, and are respectively located at one side of the linear evaporation source.
In a preferred embodiment of the invention, the detectors in the detection means of each side are arranged in a line.
In a preferred embodiment of the present invention, the straight line of the detector on each side is parallel to the long side direction of the evaporation device and perpendicular to the reciprocating scanning direction of the linear evaporation source.
In a preferred embodiment of the present invention, the linear evaporation source detection device further includes a crystal oscillator plate disposed on the evaporation device, the detector is a quartz crystal oscillator detector, and the quartz crystal oscillator detector obtains the evaporation rate of the linear evaporation source through the crystal oscillator plate.
In a preferred embodiment of the present invention, the wafer always keeps a monitoring state.
In a preferred embodiment of the present invention, the evaporation apparatus is provided in plurality.
In a preferred embodiment of the present invention, the linear evaporation source detection device further comprises an alarm system, which is connected to the detection device in a signal manner, and is configured to send an alarm when a nozzle of the linear evaporation source is blocked and/or an airflow of the evaporation chamber is abnormal.
A second objective of the present invention is to provide a detection method for a linear evaporation source detection apparatus.
The technical scheme for realizing the purpose is as follows: a detection method of a linear evaporation source detection device comprises the following steps: step S1) defining a threshold value of the evaporation rate difference of the linear evaporation source; step S2) obtaining the real-time evaporation rate of the linear evaporation source detected by each detector; step S3) calculating the maximum difference between all real-time evaporation rates; step S4), the maximum difference value is compared with a set threshold value, and when the maximum difference value reaches the set threshold value, the nozzle of the linear evaporation source is judged to be abnormal.
In a preferred embodiment of the present invention, the threshold of the evaporation rate difference in the step S1) is 2% -10%.
The invention has the advantages that: according to the linear evaporation source detection device and the detection method thereof, the detector is fixed on the cavity wall, so that the monitoring operation is more stable; can monitor whether one evaporation plant (crucible) or a group of evaporation source evaporation rate has the abnormity such as hole blocking and the like at the same time; the intermittent monitoring of the evaporation rate can be realized, and the crystal oscillator plate and the maintenance cost are saved; effectively avoids the phenomenon of product scrapping caused by the change of the uniformity and the quality of the formed film.
Drawings
The invention is further explained below with reference to the figures and examples.
Fig. 1 is a schematic structural diagram of a linear evaporation source detection device according to an embodiment of the invention.
Fig. 2 is a diagram of a scanning state of the linear evaporation source detection apparatus according to the embodiment of the present invention.
Fig. 3 is a flowchart illustrating a detection method of a linear evaporation source detection apparatus according to an embodiment of the invention.
Wherein,
1, a detector; 2, an evaporation device;
3, evaporating a coating chamber; 4, a crystal oscillation sheet;
21 linear evaporation source; 5 a glass substrate.
Detailed Description
The following description of the embodiments refers to the accompanying drawings for illustrating the specific embodiments in which the invention may be practiced. The directional terms used in the present invention, such as "up", "down", "front", "back", "left", "right", "top", "bottom", etc., refer to the directions of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention.
Example (b): as shown in fig. 1 and 2, a linear evaporation source detection device is applied to an evaporation device 2 in an evaporation process, wherein at least one group of detection devices is provided, and two groups of detection devices are provided in this embodiment. Each set of detecting device includes a plurality of detectors 1, 3 in this embodiment. The detecting device is fixed on the wall of the evaporation chamber 3. The detector 1 in the same group is consistent with the linear evaporation source 21 on the evaporation device 2 in the evaporation chamber 3 in distance; the detection device is used for intermittently detecting the blockage condition of the nozzle of the linear evaporation source 21 and/or the air flow condition of the evaporation chamber 3.
In this embodiment, the detecting device performs reciprocating scanning in the evaporation chamber 3, the chamber walls of the evaporation chamber 3 located at two sides of the detecting device performing reciprocating movement are planes parallel to each other, each group of detecting device includes a plurality of detectors 1, the plurality of detectors 1 in the same group are disposed on the plane of the same chamber wall, the plurality of detectors 1 are arranged in a straight line, the straight line of the detector 1 in the plane of each side of the chamber wall is parallel to the long side direction of the evaporation device 2 and perpendicular to the reciprocating scanning direction of the linear evaporation source 21. This makes it easy to keep the distance from the linear evaporation source 21 to each detector 1 substantially uniform. Thus, when the detector 1 detects the evaporation rate of the linear evaporation source 21, the error can be effectively reduced.
In this embodiment, the two sets of detecting devices are disposed oppositely, i.e., disposed on two parallel cavity wall planes respectively. Thus, the two groups of detecting devices respectively detect the evaporation device 2, so as to ensure the accuracy of the detection data.
In this embodiment, a plurality of evaporation apparatuses 2 are distributed in the same evaporation chamber 3, and the evaporation apparatuses 2 are crucibles or the like, which is not limited in this embodiment. In this way, the detection device in the evaporation chamber 3 can detect the linear evaporation sources 21 on the plurality of evaporation devices 2, and the detection efficiency is effectively improved while the detection data accuracy is ensured.
In this embodiment, the linear evaporation source 21 detecting device further includes a crystal oscillator plate 4 disposed on the evaporation device 2. In the figure, 3 linear crucibles form a group of evaporation sources 2, a crystal oscillator plate 4 is arranged at the front end and the rear end of each crucible respectively to monitor the evaporation rate of the crucible, and the crystal oscillator plates 4 at the two ends are fixed with the crucibles to do reciprocating scanning movement. The detector 1 is a quartz crystal oscillator detector and is used for monitoring whether the evaporation rates of all parts of a linear crucible (strip shape) are consistent or not, and if the evaporation rates are not consistent, an alarm is given. The detector 1 is also a crystal plate monitor. However, the working state of the detector 1 is not necessarily related to the working state of the crystal oscillator plate 4. That is, the evaporation source moves to the vicinity of the detector 1, the detector 1 can monitor the evaporation rate, and the crystal oscillator 4 can monitor the evaporation rate of the evaporation source.
In this embodiment, the detection frequency of the crystal oscillator plate 4 is kept consistent with the complex motion scanning frequency of the linear evaporation source 21. Since the linear evaporation source 21 performs reciprocating scanning, the linear evaporation source 21 and the material (glass substrate 5) are intermittently in contact, and therefore, the detector 1 does not need to detect the linear evaporation source 21 at all times, and the detector 1 only needs to detect the linear evaporation source 21 when the linear evaporation source 21 actually performs evaporation. Therefore, the workload and the working time of the crystal oscillator piece 4 are effectively reduced, the service life of the crystal oscillator piece 4 is further prolonged, and energy is saved.
In this embodiment, the detecting device for the linear evaporation source 21 further comprises an alarm system, which is connected to the detecting device in a signal manner, and is configured to send an alarm when the nozzle of the linear evaporation source 21 is blocked.
In this embodiment, the detecting device may also detect the condition of the air flow in the evaporation chamber 3, and when the air flow in the evaporation chamber 3 is disturbed or other abnormal conditions occur, the alarm system gives an alarm.
As shown in fig. 3, the detection method implemented by the detection device for a linear evaporation source 21 includes the following steps.
Step S1) defines a threshold value of the difference in the evaporation rates of the linear evaporation sources 21. In the step S1), the threshold value of the evaporation rate difference is 2% to 10%.
Step S2) obtains the real-time evaporation rate of the linear evaporation source 21 detected by each detector 1. In step S2), the detector 1 and the wafer 4 are operated intermittently, and the operating frequency thereof is kept consistent with the complex motion scanning frequency of the linear evaporation source 21.
Step S3) calculates the maximum difference between all real-time evaporation rates.
Step S4) comparing the maximum difference value with a set threshold value, and determining that the nozzle of the linear evaporation source 21 is abnormal when the maximum difference value reaches the set threshold value.
In the step S2), the method further includes intermittently acquiring the flow rate of the gas flow in the evaporation chamber 3, and when the flow rate of the gas flow in the evaporation chamber 3 exceeds normal data, determining that the gas flow in the evaporation chamber 3 is abnormal.
In this embodiment, the method further includes a step S5) of alarming by an alarm system when the nozzle of the linear evaporation source 21 is abnormal and/or the gas flow in the evaporation chamber 3 is abnormal.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A linear evaporation source detection device is applied to an evaporation device in an evaporation process, and is characterized in that at least one group of detection devices is arranged, and the detection devices are fixed on the cavity wall of an evaporation cavity; each group of detection devices comprises a plurality of detectors, and the detectors in the same group are consistent with the linear evaporation source on the evaporation device in the evaporation chamber in distance; the detection device is used for intermittently detecting the blocking condition of the nozzle of the linear evaporation source and/or the air flow condition of the evaporation chamber.
2. The linear evaporation source detection device according to claim 1, wherein two sets of the detection devices are respectively disposed at one side of the linear evaporation source.
3. The linear evaporation source detection device according to claim 2, wherein the detectors in the detection devices on each side are arranged in a line.
4. The linear evaporation source detection device according to claim 3, wherein the straight line of the detector on each side is parallel to the long side direction of the evaporation device and perpendicular to the reciprocating scanning direction of the linear evaporation source.
5. The linear evaporation source detection device according to claim 1, further comprising a crystal oscillator plate disposed on the evaporation device, wherein the detector is a quartz crystal oscillator detector, and the quartz crystal oscillator detector obtains the evaporation rate of the linear evaporation source through the crystal oscillator plate.
6. The linear evaporation source detection device according to claim 5, wherein the crystal plate is always kept in a monitoring state.
7. The linear evaporation source detection device according to claim 1, wherein a plurality of evaporation apparatuses are provided.
8. The linear evaporation source detection device according to claim 1, further comprising an alarm system in signal connection with the detection device, wherein the alarm system is configured to give an alarm when a nozzle of the linear evaporation source is clogged and/or a gas flow condition of the evaporation chamber is abnormal.
9. A detection method of the linear evaporation source detection device according to any one of claims 1 to 8,
the method is characterized by comprising the following steps:
step S1) defining a threshold value of the evaporation rate difference of the linear evaporation source;
step S2) obtaining the real-time evaporation rate of the linear evaporation source detected by each detector;
step S3) calculating the maximum difference between all real-time evaporation rates;
step S4), the maximum difference value is compared with a set threshold value, and when the maximum difference value reaches the set threshold value, the nozzle of the linear evaporation source is judged to be abnormal.
10. The method as claimed in claim 9, wherein the threshold of the evaporation rate difference in step S1) is 2-10%.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710751425.XA CN107604337A (en) | 2017-08-28 | 2017-08-28 | A kind of linear evaporation source arrangement for detecting and its method for detecting |
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| CN201710751425.XA CN107604337A (en) | 2017-08-28 | 2017-08-28 | A kind of linear evaporation source arrangement for detecting and its method for detecting |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109468608A (en) * | 2018-12-25 | 2019-03-15 | 苏州方昇光电股份有限公司 | Linear evaporated device and its vapor deposition source control method |
| WO2020186671A1 (en) * | 2019-03-15 | 2020-09-24 | 上海视涯信息科技有限公司 | Evaporation deposition equipment and use method thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101600815A (en) * | 2007-02-01 | 2009-12-09 | 东京毅力科创株式会社 | The manufacture method of evaporation coating device, evaporation coating method and evaporation coating device |
| CN102703866A (en) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | Linear evaporation source device and precise evaporation rate control evaporating unit with same |
| CN103160798A (en) * | 2013-02-26 | 2013-06-19 | 上海和辉光电有限公司 | Device for detecting evaporation source and method |
| CN103866239A (en) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | Linear evaporation source device |
-
2017
- 2017-08-28 CN CN201710751425.XA patent/CN107604337A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101600815A (en) * | 2007-02-01 | 2009-12-09 | 东京毅力科创株式会社 | The manufacture method of evaporation coating device, evaporation coating method and evaporation coating device |
| CN102703866A (en) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | Linear evaporation source device and precise evaporation rate control evaporating unit with same |
| CN103866239A (en) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | Linear evaporation source device |
| CN103160798A (en) * | 2013-02-26 | 2013-06-19 | 上海和辉光电有限公司 | Device for detecting evaporation source and method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109468608A (en) * | 2018-12-25 | 2019-03-15 | 苏州方昇光电股份有限公司 | Linear evaporated device and its vapor deposition source control method |
| WO2020186671A1 (en) * | 2019-03-15 | 2020-09-24 | 上海视涯信息科技有限公司 | Evaporation deposition equipment and use method thereof |
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