CN107604337A - A kind of linear evaporation source arrangement for detecting and its method for detecting - Google Patents
A kind of linear evaporation source arrangement for detecting and its method for detecting Download PDFInfo
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- CN107604337A CN107604337A CN201710751425.XA CN201710751425A CN107604337A CN 107604337 A CN107604337 A CN 107604337A CN 201710751425 A CN201710751425 A CN 201710751425A CN 107604337 A CN107604337 A CN 107604337A
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Abstract
The invention discloses a kind of linear evaporation source arrangement for detecting, and applied on the evaporation coating device in evaporation process, the arrangement for detecting is provided with least one set, and the arrangement for detecting is fixed in the cavity wall of evaporation chamber；Wherein, arrangement for detecting described in every group includes multiple detectors, consistent with the distance of the linear evaporation source described in the evaporation chamber on evaporation coating device with detector described in group；The arrangement for detecting is used for the spray nozzle clogging situation of batch (-type) detection linear evaporation source and/or the airflow condition of chamber is deposited.The invention also discloses a kind of method for detecting of linear evaporation source arrangement for detecting.
Description
Technical field
The present invention relates to field, specially a kind of linear evaporation source arrangement for detecting and its detecting sides such as vacuum coating monitoring
Method.
Background technology
Organic Light Emitting Diode (Organic Light-Emitting Diode, UIV OLED) is also known as organic electric laser
Display, organic luminous semiconductor.At present, because Organic Light Emitting Diode (OLED) has wide viewing angle, wide colour gamut, high-contrast, color
The advantages that color bright-coloured, reduction degree is high, its application is more extensive.And the manufacturing process of Organic Light Emitting Diode (OLED) is still
Based on hot evaporation, the performance of evaporation source is particularly important, and improves stock utilization, reduces production cost, improves device
Display effect, it is permanent theme such as to improve into film uniformity.
It is to obtain uniform film layer it is necessary to the steaming to evaporation source in the manufacturing of Organic Light Emitting Diode (OLED)
Plate speed and realize precisely comprehensive monitoring.The conventional method of linear evaporation source speed detection is in one end of linear evaporation source or two
Quartz crystal oscillator monitoring system (Quartz CrystalMonitor, QCM) is installed whole linear evaporation to be monitored and controlled in real time in end
The evaporation rate in source.The drawbacks of this monitoring method is can only to monitor local speed and uniformity, and individual nozzles such as occur
(nozzle) situation about blocking can not be found in time, be possible to occur to scrap in batches during volume production.
The content of the invention
The first object of the present invention is：A kind of linear evaporation source arrangement for detecting is provided, linear evaporation is detected by batch (-type)
The speed of the multiple positions in source, it can be determined that go out crucible and whether occur whether spray nozzle clogging, cavity there are the exceptions such as burst flow perturbation,
Product rejection caused by avoid the uniformity because of film forming, the change brought into film quality.
Realizing the technical scheme of above-mentioned purpose is：A kind of linear evaporation source arrangement for detecting, applied to the steaming in evaporation process
On plating appts, the arrangement for detecting is provided with least one set, and the arrangement for detecting is fixed in the cavity wall of evaporation chamber；Wherein, every group
The arrangement for detecting includes multiple detectors, with detector described in group and the line described in the evaporation chamber on evaporation coating device
The distance of property evaporation source is consistent；The arrangement for detecting is used for spray nozzle clogging situation and/or the steaming of batch (-type) detection linear evaporation source
Plate the airflow condition of chamber.
In a preferred embodiment of the present invention, the arrangement for detecting is provided with two groups, respectively positioned at the linear evaporation source
Side.
In a preferred embodiment of the present invention, the detector in the arrangement for detecting per side is aligned.
In a preferred embodiment of the present invention, straight line parallel is in the evaporation coating device where the detector per side
Long side direction, and perpendicular to the reciprocating motion scanning direction of the linear evaporation source.
In a preferred embodiment of the present invention, described linear evaporation source arrangement for detecting also includes crystal-vibration-chip, located at described
On evaporation coating device, the detector is quartz crystal oscillator detector, and the quartz crystal oscillator detector obtains institute by the crystal-vibration-chip
State the evaporation rate of linear evaporation source.
In a preferred embodiment of the present invention, the crystal-vibration-chip is always maintained at monitor state.
In a preferred embodiment of the present invention, the evaporation coating device is provided with multiple.
In a preferred embodiment of the present invention, described linear evaporation source arrangement for detecting also includes warning system, and signal connects
The arrangement for detecting is connected to, when abnormal, institute occurs for the spray nozzle clogging situation of linear evaporation source and/or the airflow condition of evaporation chamber
Warning system is stated to be used to send alarm.
A kind of it is a second object of the invention to provide method for detecting of linear evaporation source arrangement for detecting.
Realizing the technical scheme of above-mentioned purpose is：A kind of method for detecting of linear evaporation source arrangement for detecting, including following step
Suddenly：Step S1) define linear evaporation source evaporation rate difference threshold value；Step S2) obtain the line that each detector detects
The real-time evaporation rate of property evaporation source；Step S3) calculate all maximum differences between evaporation rates in real time；Step S4) compare
The maximum difference and set threshold value, when the maximum difference reaches set threshold value, then judge the nozzle of linear evaporation source.
In a preferred embodiment of the present invention, the step S1) described in the threshold value of evaporation rate difference be 2%-
10%.
It is an advantage of the invention that：The linear evaporation source arrangement for detecting and its method for detecting of the present invention, detector is fixed on
In cavity wall, monitoring operation is more stable；A vaporising device (crucible) or one group of evaporation source evaporation rate can be monitored simultaneously whether
Have and the exception such as plug-hole occurs；It can realize that batch (-type) monitors to evaporation rate, save crystal-vibration-chip and maintenance cost；Effectively avoid
Uniformity because of film forming, product rejection phenomenon caused by the change brought into film quality.
Brief description of the drawings
The present invention is further explained with reference to the accompanying drawings and examples.
Fig. 1 is the linear evaporation source arrangement for detecting structural representation of the embodiment of the present invention.
Fig. 2 is that the linear evaporation source arrangement for detecting of the embodiment of the present invention moves back and forth scanning mode figure.
Fig. 3 is the linear evaporation source arrangement for detecting method for detecting flow chart of steps of the embodiment of the present invention.
Wherein,
1 detector；2 evaporation coating devices；
3 evaporation chambers；4 crystal-vibration-chips；
21 linear evaporation sources；5 glass substrates.
Embodiment
The explanation of following examples is with reference to additional schema, to illustrate the particular implementation that the present invention can be used to implementation
Example.The direction term that the present invention is previously mentioned, such as " on ", " under ", "front", "rear", "left", "right", " top ", " bottom " etc., only it is
With reference to the direction of annexed drawings.Therefore, the direction term used is to illustrate and understand the present invention, and is not used to limit this hair
It is bright.
Embodiment：As shown in Figure 1 and Figure 2, a kind of linear evaporation source arrangement for detecting, applied to the evaporation dress in evaporation process
Put on 2, wherein, the arrangement for detecting is provided with least one set, and two groups are provided with the present embodiment.Every group of arrangement for detecting includes multiple
Detector 1,3 are provided with the present embodiment.The arrangement for detecting is fixed in the cavity wall of evaporation chamber 3.Detected with described in group
Device 1 is consistent with the distance of the linear evaporation source 21 described in the evaporation chamber 3 on evaporation coating device 2；The arrangement for detecting is used for
The spray nozzle clogging situation of batch (-type) detection linear evaporation source 21 and/or the airflow condition that chamber 3 is deposited.
In the present embodiment, arrangement for detecting scanning reciprocating in the evaporation chamber 3, positioned at the detecting
The cavity wall of the evaporation chamber 3 of the reciprocating both sides of device is the plane being parallel to each other, and every group of arrangement for detecting includes multiple detect
Device 1 is surveyed, multiple detectors 1 with group are arranged in the plane of same cavity wall, and multiple detectors 1 are mutually arranged straight into one
Line, the place straight line parallel of the detector 1 of plane of the cavity wall per side hang down in the long side direction of the evaporation coating device 2
Directly in the reciprocating motion scanning direction of the linear evaporation source 21.So it is easy for linear evaporation source 21 is arrived each detector 1
Distance be consistent substantially.In this way, when detector 1 detects the evaporation rate of linear evaporation source 21, can effectively reduce
Error.
In the present embodiment, arrangement for detecting described in two groups is oppositely arranged, that is, is separately positioned on two cavity walls being parallel to each other
In plane.So, arrangement for detecting is detected to evaporation coating device 2 respectively described in two groups, to ensure the accuracy of detecting data.
In the present embodiment, multiple evaporation coating devices 2 are distributed in same evaporation chamber 3, the evaporation coating device 2 is crucible etc.,
The present embodiment is not construed as limiting to this.So, the arrangement for detecting in the evaporation chamber 3 can be to the line on multiple evaporation coating devices 2
Property evaporation source 21 is detected, and while detecting data accuracy is ensured, effectively improves the efficiency of detecting.
In the present embodiment, the described arrangement for detecting of linear evaporation source 21 also includes crystal-vibration-chip 4, located at the evaporation coating device 2
On.There are 3 linear crucibles in figure, form one group of evaporation source 2, each crucible rear and front end respectively has a crystal-vibration-chip 4 to monitor earthenware
The evaporation rate of crucible in itself, crystal-vibration-chip 4 and the crucible at both ends, which are fixed together, does round scanning motion.The detector 1 is stone
English crystal oscillator detector, it is whether consistent for monitoring the evaporation rate of linear crucible (strip) everywhere, as inconsistent, occurs
Alarm.Detector 1 and crystal-vibration-chip monitoring.But the working condition of detector 1 and the working condition of crystal-vibration-chip 4 do not join necessarily
System.That is evaporation source is moved near detector 1, and detector 1 can just monitor speed, and crystal-vibration-chip 4 be can be always
Monitor the evaporation rate of evaporation source.
In the present embodiment, the detection frequency of the crystal-vibration-chip 4 and the multiple moving sweep frequency of the linear evaporation source 21 are protected
Hold consistent.Due to the 21 reciprocating scanning of linear evaporation source, therefore, the linear evaporation source 21 and material (glass base
Plate 5) contact as batch (-type), therefore, the detector 1 and the moment linear evaporation source 21 need not be detected, only
Need to be when the linear evaporation source 21 actually to make evaporation work, the detector 1 is stated linear evaporation source 21 to this and detected i.e.
Can.Workload and the working time of crystal-vibration-chip 4 are so effectively reduced, further increases the service life of crystal-vibration-chip 4, together
When save the energy.
In the present embodiment, the arrangement for detecting of linear evaporation source 21 also includes warning system, and signal is connected to the detecting
Device, when exception occurs for the spray nozzle clogging situation of the linear evaporation source 21, the warning system is used to send alarm.
In the present embodiment, the arrangement for detecting can also be detected to the airflow condition in evaporation chamber 3, when evaporation chamber
Air-flow in room 3 gets muddled, or other abnormal conditions occurs, and the warning system sends alarm.
As shown in figure 3, the method for detecting realized based on the above-mentioned arrangement for detecting of linear evaporation source 21, is specifically included following
Step.
Step S1) define linear evaporation source 21 evaporation rate difference threshold value.In the step S1) in, described steaming
The threshold value for plating speed difference is 2%-10%.
Step S2) obtain the real-time evaporation rate of the linear evaporation source 21 that each detector 1 detects.In step S2) in,
Detector 1 and crystal-vibration-chip 4 service intermittent, its working frequency and the multiple moving sweep frequency of the linear evaporation source 21 are protected
Hold consistent.
Step S3) calculate all maximum differences between evaporation rates in real time.
Step S4) maximum difference and set threshold value, when the maximum difference reaches set threshold value, then judge line
The nozzle of property evaporation source 21.
In the step S2) in, in addition to the air current flow speed in the acquisition evaporation chamber 3 of batch (-type), work as steaming
When air current flow speed in plating chamber 3 exceedes normal data, then judge that the air-flow in evaporation chamber 3 is abnormal.
It is further comprising the steps of in the present embodiment, step S5) when the nozzle and/or evaporation chamber of linear evaporation source 21
Air-flow in room 3 is abnormal, and warning system carries out alarm.
These are only presently preferred embodiments of the present invention, be not intended to limit the invention, it is all the present invention spirit and
All any modification, equivalent and improvement made within principle etc., should be included in the scope of the protection.
Claims (10)
- A kind of 1. linear evaporation source arrangement for detecting, applied on the evaporation coating device in evaporation process, it is characterised in that the detecting Device is provided with least one set, and the arrangement for detecting is fixed in the cavity wall of evaporation chamber；Wherein, arrangement for detecting described in every group includes more Individual detector, with the distance one of detector described in group and the linear evaporation source described in the evaporation chamber on evaporation coating device Cause；The arrangement for detecting is used for the spray nozzle clogging situation of batch (-type) detection linear evaporation source and/or the airflow condition of chamber is deposited.
- 2. linear evaporation source arrangement for detecting according to claim 1, it is characterised in that the arrangement for detecting is provided with two groups, It is located at the side of the linear evaporation source respectively.
- 3. linear evaporation source arrangement for detecting according to claim 2, it is characterised in that in the arrangement for detecting per side Detector it is aligned.
- 4. linear evaporation source arrangement for detecting according to claim 3, it is characterised in that where the detector per side Straight line parallel is in the long side direction of the evaporation coating device, and perpendicular to the reciprocating motion scanning direction of the linear evaporation source.
- 5. linear evaporation source arrangement for detecting according to claim 1, it is characterised in that also including crystal-vibration-chip, located at described On evaporation coating device, the detector is quartz crystal oscillator detector, and the quartz crystal oscillator detector obtains institute by the crystal-vibration-chip State the evaporation rate of linear evaporation source.
- 6. linear evaporation source arrangement for detecting according to claim 5, it is characterised in that the crystal-vibration-chip is always maintained at monitoring State.
- 7. linear evaporation source arrangement for detecting according to claim 1, it is characterised in that the evaporation coating device is provided with multiple.
- 8. linear evaporation source arrangement for detecting according to claim 1, it is characterised in that also connect including warning system, signal The arrangement for detecting is connected to, when abnormal, institute occurs for the spray nozzle clogging situation of linear evaporation source and/or the airflow condition of evaporation chamber Warning system is stated to be used to send alarm.
- 9. a kind of method for detecting of linear evaporation source arrangement for detecting according to any one of claim 1-8,It is characterised in that it includes following steps：Step S1) define linear evaporation source evaporation rate difference threshold value；Step S2) obtain the real-time evaporation rate of the linear evaporation source that each detector detects；Step S3) calculate all maximum differences between evaporation rates in real time；Step S4) maximum difference and set threshold value, when the maximum difference reaches set threshold value, then judge linear steam The nozzle to rise.
- 10. the method for detecting of linear evaporation source arrangement for detecting according to claim 9, it is characterised in that the step S1) Described in the threshold value of evaporation rate difference be 2%-10%.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710751425.XA CN107604337A (en) | 2017-08-28 | 2017-08-28 | A kind of linear evaporation source arrangement for detecting and its method for detecting |
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| CN201710751425.XA CN107604337A (en) | 2017-08-28 | 2017-08-28 | A kind of linear evaporation source arrangement for detecting and its method for detecting |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109468608A (en) * | 2018-12-25 | 2019-03-15 | 苏州方昇光电股份有限公司 | Linear evaporated device and its vapor deposition source control method |
| WO2020186671A1 (en) * | 2019-03-15 | 2020-09-24 | 上海视涯信息科技有限公司 | Evaporation deposition equipment and use method thereof |
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| CN101600815A (en) * | 2007-02-01 | 2009-12-09 | 东京毅力科创株式会社 | The manufacture method of evaporation coating device, evaporation coating method and evaporation coating device |
| CN102703866A (en) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | Linear evaporation source device and precise evaporation rate control evaporating unit with same |
| CN103160798A (en) * | 2013-02-26 | 2013-06-19 | 上海和辉光电有限公司 | Device for detecting evaporation source and method |
| CN103866239A (en) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | Linear evaporation source device |
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2017
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101600815A (en) * | 2007-02-01 | 2009-12-09 | 东京毅力科创株式会社 | The manufacture method of evaporation coating device, evaporation coating method and evaporation coating device |
| CN102703866A (en) * | 2012-01-13 | 2012-10-03 | 东莞宏威数码机械有限公司 | Linear evaporation source device and precise evaporation rate control evaporating unit with same |
| CN103866239A (en) * | 2012-12-18 | 2014-06-18 | 北京汉能创昱科技有限公司 | Linear evaporation source device |
| CN103160798A (en) * | 2013-02-26 | 2013-06-19 | 上海和辉光电有限公司 | Device for detecting evaporation source and method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN109468608A (en) * | 2018-12-25 | 2019-03-15 | 苏州方昇光电股份有限公司 | Linear evaporated device and its vapor deposition source control method |
| WO2020186671A1 (en) * | 2019-03-15 | 2020-09-24 | 上海视涯信息科技有限公司 | Evaporation deposition equipment and use method thereof |
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