CN107589130B - Method and device for monitoring influence of submarine in-situ X fluorescence measurement - Google Patents
Method and device for monitoring influence of submarine in-situ X fluorescence measurement Download PDFInfo
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Abstract
The invention relates to a method and a device for monitoring influence of submarine in-situ X fluorescence measurement. The method comprises the following steps: establishing a Monte Carlo model, and simulating by the Monte Carlo model to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses; determining the optimal thickness of the beryllium window according to the transmittance and by combining the theoretical analysis result of the safety of the beryllium window; respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window is of the optimal thickness and contains impurities and the beryllium window is of the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result; and judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window contains impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities. The method for monitoring influence of submarine in-situ X fluorescence measurement effectively improves the accuracy of the measurement result.
Description
Technical Field
The invention relates to the technical field of submarine detection, in particular to a submarine in-situ X fluorescence measurement influence monitoring method and device.
Background
The X-ray fluorescence measurement technology is applied to the analysis of the components and the content of the submarine sediments in sequence in a plurality of countries in the west. The in-situ seabed X fluorescence measuring device manufactured by the United states Battle group puts a detection tube into the seabed for in-situ measurement, transmits signals obtained by detection to a transport ship through a cable for analysis, and a detection window of the detection tube is composed of a beryllium window with the thickness of 0.127 mm. However, the probe tube is only used for measurements within a depth of 100 m. The X fluorescence analyzer of the university of Georgia in America is different from the detection mode of a Battle group, a prediction sample is obtained from the seabed, then the prediction sample is processed on a transport ship to be in an analyzable state by an X fluorescence detection system, and finally X fluorescence analysis is carried out, so that various elements and contents in seabed sediments can be detected. The German seabed X fluorescence analysis and detection system can keep the geometric state of the original prediction sample, continuously sample seabed sediments and carry out X fluorescence analysis on a transport ship. The method has a good detection effect on predicting the content of the metal elements from five per thousand to five percent.
As described above, in the prior art, the foreign seabed X fluorescence detection device adopts a field sampling or in-situ measurement mode, and the depth of the sampled or in-line measured seawater is shallow, so that the accuracy of the measurement result is limited. "Yangyong No. 16" in China is used for investigating ocean mineral resources, and an X fluorescence analyzer is carried on the scientific research ship and can be used for detecting elements such as manganese, iron, copper and the like, but in order to achieve the accuracy of measurement, multiple times of measurement are needed. A seabed X fluorescence detection system is successfully developed by the university of science engineers at the end of the 20 th century and the 90 th era, and an isotope is used as an excitation source, a semiconductor detector and a probe are packaged together to be used as probes and are equipped and used on a plurality of scientific research ships.
So far, the submarine X-ray fluorescence detection device tends to be perfect in software and hardware development, the influence of a matrix on measurement is reduced through matrix effect correction, the influence of the environment on the measurement result is reduced through moisture and water layer thickness correction, a semiconductor detector is used on hardware, and an electric refrigeration mode enables detection to be more accurate. And (4) on software, background is deducted by a Fourier transform method and a multiple iteration method. Both of these methods bring the X-fluorescence analysis measurement closer to the true value. However, in the seabed X-ray fluorescence detection device, the beryllium window of the detection tube still has a non-negligible effect on the accuracy of the detection result.
Disclosure of Invention
In view of the above, the present invention provides a method and an apparatus for monitoring influence of submarine in-situ X-ray fluorescence measurement, so as to solve the above problems.
The embodiment of the invention provides a method for monitoring influence of submarine in-situ X fluorescence measurement, which is applied to submarine in-situ X fluorescence measurement equipment and comprises the following steps:
establishing a Monte Carlo model, and simulating by the Monte Carlo model to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses;
determining the optimal thickness of the beryllium window according to the transmittance and by combining the theoretical analysis result of the safety of the beryllium window;
respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window is of the optimal thickness and contains impurities and the beryllium window is of the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
and judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window contains impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities.
Further, the method further comprises:
respectively obtaining the relationship between the beryllium window thickness of 0 and the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
and judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window does not contain impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities.
Further, the step of judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities according to the comparison result comprises the following steps:
respectively obtaining the beryllium window thickness of 0 and the linear correlation coefficient of the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities according to the comparison result, and comparing to obtain the comparison result;
and judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities according to the comparison result.
Further, the step of judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the comparison result comprises the following steps:
respectively obtaining the beryllium window with the optimal thickness and containing impurities and the characteristic X-ray intensity of the target element with the optimal thickness and without impurities when the target element content is the same, and comparing to obtain comparison results;
and judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the comparison result.
Further, the step of correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities comprises the following steps:
establishing a correction curve according to the comparison result;
and correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the correction curve.
Further, the step of correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities comprises the following steps:
respectively obtaining the average relative deviation of the target element characteristic X-ray intensity when the beryllium window thickness is the optimal thickness and contains impurities and the target element characteristic X-ray intensity when the beryllium window thickness is the optimal thickness and does not contain impurities when the target element content is the same according to the comparison result;
and correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the average relative deviation.
Further, the step of obtaining the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses through Monte Carlo model simulation comprises the following steps:
simulating and recording photon flux of target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses through a Monte Carlo model;
and processing the photon flux to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses.
Further, the beryllium window safety theoretical analysis result is obtained by the following steps:
establishing a beryllium window thickness calculation equation:
wherein: t is beryllium window thickness (mm); p is the pressure intensity (MPa) of water received by the beryllium window; d is the inner diameter (mm) of the submarine detection pipe; n issA safety factor is set; sigmasThe strength limit of beryllium windows.
The embodiment of the invention also provides a device for monitoring influence of the submarine in-situ X fluorescence measurement, which is applied to submarine in-situ X fluorescence measurement equipment, and the device comprises:
the transmittance acquisition module is used for establishing a Monte Carlo model and simulating to acquire the transmittance of the target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses through the Monte Carlo model;
the beryllium window optimal thickness determining module is used for determining the optimal thickness of the beryllium window according to the transmittance and by combining with a beryllium window safety theoretical analysis result;
the first comparison module is used for respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window thickness is the optimal thickness and contains impurities and the beryllium window thickness is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
and the first judgment module is used for judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window contains impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities.
Further, the apparatus further comprises:
the second comparison module is used for respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the thickness of the beryllium window is 0 and the thickness of the beryllium window is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
and the second judgment module is used for judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window does not contain impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities.
According to the method and the device for monitoring influence of submarine in-situ X-ray fluorescence measurement, whether the influence is exerted on the characteristic X-ray intensity of the target element when the beryllium window of the detection tube contains impurities is simulated and researched through the Monte Carlo model, and when the research result indicates that the influence is exerted on the characteristic X-ray intensity of the target element when the beryllium window contains impurities, the characteristic X-ray intensity of the target element when the beryllium window contains impurities is corrected, so that the accuracy of the measurement result is effectively improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
Fig. 1 is a schematic structural block diagram of a seafloor in-situ X fluorescence measurement device provided by an embodiment of the present invention.
Fig. 2 is a flowchart of a method for monitoring influence of subsea in-situ X-ray fluorescence measurement according to an embodiment of the present invention.
Fig. 3 is a schematic view of a seafloor in-situ X fluorescence measurement model established by the seafloor in-situ X fluorescence measurement influence monitoring method provided by the embodiment of the invention.
Fig. 4 is a flowchart illustrating sub-steps of step S100 in fig. 1.
Fig. 5 is a schematic diagram of a relationship between beryllium window thickness and target element characteristic X-ray transmittance obtained by the method for monitoring influence of submarine in-situ X-fluorescence measurement provided by the embodiment of the present invention.
Fig. 6 is a comparison graph of the relationship between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window thickness is the preferred thickness and contains impurities and the beryllium window thickness is the preferred thickness and does not contain impurities, which are obtained by the method for monitoring influence of the submarine in-situ X fluorescence measurement provided by the embodiment of the present invention.
Fig. 7 is a flowchart illustrating sub-steps of step S400 in fig. 1.
Fig. 8 is a flowchart of a method for correcting the characteristic X-ray intensity of a target element according to an embodiment of the present invention.
FIG. 9 is a schematic diagram of a calibration curve of characteristic X-ray intensity obtained by the method for monitoring influence of submarine in-situ X-fluorescence measurement according to the embodiment of the present invention.
FIG. 10 is a flowchart of another method for correcting the characteristic X-ray intensity of a target element according to an embodiment of the present invention.
FIG. 11 is another partial flowchart of a method for monitoring influence of subsea in situ X-ray fluorescence measurement according to an embodiment of the present invention.
Fig. 12 is a flowchart illustrating sub-steps of step S600 in fig. 11.
Fig. 13 is a comparison graph of the relationship between the characteristic X-ray intensity of the target element and the content of the target element when the thickness of the beryllium window is 0mm and 1.35mm, which is obtained by the method for monitoring influence of the submarine in-situ X fluorescence measurement provided by the embodiment of the present invention.
Fig. 14 is a primary ray spectrum distribution diagram obtained by the method for monitoring influence of the submarine in-situ X-ray fluorescence measurement provided by the embodiment of the invention, with and without beryllium windows.
Fig. 15 is a schematic structural block diagram of an in-situ seafloor X fluorescence measurement influence monitoring device according to an embodiment of the present invention.
Fig. 16 is a schematic structural block diagram of another part of the seabed in-situ X fluorescence measurement influence monitoring device provided by the embodiment of the invention.
Icon: 10-a seafloor in situ X fluorescence measurement device; 100-a seabed in-situ X fluorescence measurement influence monitoring device; 110-transmittance acquisition module; a 120-beryllium window preferred thickness determination module; 130-a first comparison module; 140-a first determination module; 150-a second comparison module; 160-a second judgment module; 200-a processor; 300-memory.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
Referring to fig. 1, a schematic structural block diagram of an in-situ seafloor X-ray fluorescence measurement apparatus 10 according to an embodiment of the present invention is shown. In this embodiment, the subsea in situ X-fluorescence measurement device 10 comprises a subsea in situ X-fluorescence measurement impact supervision apparatus 100, a processor 200 and a memory 300. Wherein, the processor 200 is electrically connected with the memory 300 directly or indirectly to realize the data transmission or interaction. The subsea in situ X-fluorescence measurement impact supervision apparatus 100 comprises at least one software functional module which may be stored in the form of software or firmware in the memory 300 or be solidified in the operating system of the subsea in situ X-fluorescence measurement device 10. The processor 200 is used to execute executable modules stored in the memory 300, for example, software functional modules or computer programs included in the seafloor in situ X-fluorescence measurement impact monitoring device 100, to study and correct for the effects of beryllium windows on seafloor in situ X-fluorescence measurements.
In this embodiment, the seafloor in-situ X-ray fluorescence measuring device 10 can be, but is not limited to, a computer, a network server, a database server, or a data processing device installed in a server.
Please refer to fig. 2, which is a flowchart illustrating a monitoring method for measuring influence according to an embodiment of the present invention. The method is applied to the seafloor in-situ X-ray fluorescence measurement device 10, and it should be noted that the method provided by the embodiment is not limited by the sequence shown in fig. 2 and described below. The specific process shown in fig. 2 will be described in detail below.
And S100, establishing a Monte Carlo model, and simulating through the Monte Carlo model to obtain the transmittance of the target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses.
The Monte Carlo method is characterized in that a probability statistics model is used for carrying out a large number of statistical tests by using random numbers, and the obtained average value or the relevant characteristic value with statistics is used as the approximate solution of the actual problem. The method uses a stochastic statistical principle, which is significantly different from numerical calculations. Compared with a numerical method, the method is more intuitive and easier to understand, a corresponding physical model is established according to the reality, a complex numerical calculation expression does not need to be established, the simulation data of the physical model can be obtained, and even the problem that a mathematical formula cannot be tabulated can be simulated and solved. Meanwhile, the method is less limited by geometrical conditions, and is particularly prominent when the random integration area and complicated and tedious random problems are faced. For example, for solving the design of the radiation protection shielding layer, if the probability of ray penetration of layers with different thicknesses is to be solved, only the maximum thickness needs to be set, and a relevant counter needs to be set at the corresponding thickness.
The seabed in-situ X fluorescence measurement model mainly comprises 4 parts of an X light pipe, a detection window, a sample to be detected and a detector. The detection window is a beryllium window. In this embodiment, the seafloor in situ X fluorescence measurement model can be established by monte carlo simulation software MCNP5, as shown in fig. 3. A coordinate system as shown in fig. 3 is established with the center of the lower surface of the beryllium window as the origin. The photons of the X-ray tube are uniformly sampled in a Gaussian distribution mode in a surface source with the radius of 0.04cm, the reference-Y direction included angle of the emergent particle direction is 45 degrees, and the energy of the sampled particles is 0.050 MeV. The beryllium window density is 1.84, and the thickness is changed according to actual requirements. The sample to be tested is modeled by referring to the components of Chinese shallow sea sediments, the size is phi 6cm x 2cm, the density is 2.7, the sample mainly comprises elements such as Si, Na, Mg, Al, O and the like, and the target elements comprise elements such as Mn, Fe, Cu, Zn, Pb and the like. The detector uses an F5 detector, the model counting adopts an F5 point detection counting card, the reference angle of the detection particles in the + Y direction is 45 degrees, the energy card is matched with the point detector for use, the photon flux of the point is recorded, and the number of the sampling particles is 109.
Referring to fig. 4, in particular, in the present embodiment, the step S100 may include two substeps, i.e., a step S110 and a step S120.
And step S110, simulating and recording the photon flux of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses through a Monte Carlo model.
In this embodiment, after the point radiation source is collimated, the point detector is arranged to record photon flux of target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses, and the point source energy refers to the target element characteristic X-ray energy. Alternatively, in this embodiment, the photon flux was recorded at beryllium window thicknesses of 0, 0.45mm, 0.90mm, 1.35mm, 1.80mm, and 2.25mm, respectively.
And step S120, processing the photon flux to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses.
And processing the photon flux to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses, wherein the abscissa in the graph 5 is the beryllium window thickness (Bethickness) and the ordinate is the transmittance of the target element characteristic X-ray (Transmittanoe), as shown in FIG. 5. As the thickness of the beryllium window is increased, the transmittance of the X-ray characteristic of the target element is exponentially attenuated, and the Mn element is attenuated most quickly. When the beryllium window is from 0.45mm to 1.35mm and the thickness is increased by 0.9mm, the transmittance of Mn element characteristic X-rays is reduced from 80% to 52%, the transmittance of Fe element characteristic X-rays is reduced from 84% to 60%, the transmittance of Cu element characteristic X-rays is reduced from 92% to 76%, the transmittance of Zn element characteristic X-rays is reduced from 93% to 80%, and the transmittance of Pb element characteristic X-rays is reduced from 96% to 87%. When the beryllium window is increased by 0.9mm from 1.35mm to 2.25mm, the transmittance of Mn element characteristic X-rays is changed from 52% to 34%, the transmittance of Fe element characteristic X-rays is changed from 60% to 42%, the transmittance of Cu element characteristic X-rays is changed from 76% to 64%, the transmittance of Zn element characteristic X-rays is changed from 80% to 69%, and the transmittance of Pb element characteristic X-rays is changed from 87% to 80%. From this, it is found that the beryllium window having a thickness of 1.35mm can ensure a transmittance of about 80% for Pb, Zn, and Cu, and a transmittance of 50% or more for Mn and Fe.
And step S200, determining the optimal thickness of the beryllium window according to the transmittance and the theoretical analysis result of the safety of the beryllium window.
The beryllium window safety theoretical analysis result can be obtained through the following modes:
establishing a beryllium window thickness calculation equation:
wherein: t is beryllium window thickness (mm); p is the pressure intensity (MPa) of water received by the beryllium window; d is the inner diameter (mm) of the submarine detection pipe; n issA safety factor is set; sigmasThe strength limit of beryllium windows.
The beryllium window belongs to a brittle material, has the characteristics of hard texture, high X-ray transmittance and the like, and has the strength limit of 1000 MPa. The seabed in-situ X fluorescence measurement system is required to work in a 1200m deep water environment, and the pressure is 12 MPa. In this embodiment, the inner diameter of the submarine probe pipe is set to be 90, and the safety factor is 2.5, and at this time, the minimum thickness of the beryllium window can be calculated to be 1.35mm according to the equation (1). Therefore, under the deep water pressure, the thickness of the beryllium window must be not less than 1.35mm to ensure the safety of the probe tube.
In this embodiment, according to the transmittance and by combining with the theoretical analysis result of safety of the beryllium window, the thickness of the beryllium window can be set to 1.35mm by considering the process design technology.
And S300, respectively obtaining the relation between the beryllium window thickness and the impurities when the beryllium window thickness is the optimal thickness and contains no impurities and the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window thickness is the optimal thickness and contains no impurities through Monte Carlo model simulation, and comparing to obtain a comparison result.
The pure beryllium window is made of beryllium, and the effect that the beryllium window does not contain impurities cannot be achieved due to the practical process and technology. If the beryllium window contains metal impurities which are the same as the target elements, the characteristic X-rays generated by the excitation of the impurity elements by the primary rays enter the detector, and the characteristic X-ray intensity of the target elements in the submarine sediments can be increased. Even if the beryllium window does not contain the same metal impurities as the target element, the presence of the impurity elements affects the characteristic X-ray intensity of the target element. The method mainly comprises two aspects, namely that the characteristic X-ray energy of the impurity elements is slightly larger than the absorption limit energy of the target elements, so that the characteristic X-ray intensity of the target elements can be increased, and the characteristic X-ray energy of the impurity elements is slightly smaller than the characteristic X-ray energy of the target elements, so that the characteristic X-ray intensity of the target elements can be reduced. Therefore, when acquiring the characteristic X-ray intensity of the target element in the submarine sediment, not only the characteristic X-ray intensity of the target element increased by the impurity element in the beryllium window needs to be deducted, but also the characteristic X-ray intensity of the target element reduced by the impurity element needs to be compensated. Optionally, in this embodiment, the content of the beryllium window material of the probe tube in the subsea in-situ X-ray fluorescence measurement model is set as shown in table 1.
TABLE 1 beryllium window materials element content table
In this embodiment, the relationship between the target element characteristic X-ray intensity and the target element Content when the beryllium window thickness is the preferred thickness and contains impurities and when the beryllium window thickness is the preferred thickness and does not contain impurities is obtained through monte carlo model simulation, as shown in fig. 6, the abscissa is the target element Content (Content), and the ordinate is the target element characteristic X-ray count (Counts), that is, the target element characteristic X-ray intensity. Comparing the two results, it is found that beryllium window impurities have a small influence on the target elements Mn, Cu, and Pb, and that Fe and Zn have a large influence.
And step S400, judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window contains impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities.
It can be understood that, in this embodiment, the comparison result described in step S300 and step S400 is the change of the intensity of the characteristic element X-ray when the beryllium window contains impurities relative to the intensity of the characteristic element X-ray when the beryllium window does not contain impurities.
Referring to fig. 7, in particular, in the present embodiment, the step S400 may include two substeps, i.e., a step S410 and a step S420.
And S410, respectively obtaining the target element characteristic X-ray intensities with the same content, the beryllium window thickness being the optimal thickness and containing impurities, and the beryllium window thickness being the optimal thickness and not containing impurities, and comparing to obtain comparison results.
And step S420, judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the comparison result.
Optionally, in this embodiment, when the change rate of the X-ray intensity of the characteristic element when the beryllium window contains the impurity relative to the X-ray intensity of the characteristic element when the beryllium window does not contain the impurity is greater than the first preset threshold, it may be determined that the beryllium window contains the impurity and has an influence on the characteristic X-ray intensity of the target element. In this embodiment, the first preset threshold may be set according to an actual requirement, for example, may be set to 1% or may also be set to 5%. In this embodiment, the first preset threshold is set to be 5%. According to the comparison result, at a low content, the variation of the characteristic X-ray intensity of Fe element caused by impurities in the beryllium window is more than 15%, and the variation of the characteristic X-ray intensity of Zn element is more than 5%. Therefore, it is determined that the characteristic X-ray intensity of the Fe element and the characteristic X-ray intensity of the Zn element need to be corrected.
Referring to fig. 8, in this embodiment, when it is determined that the beryllium window contains impurities and has an influence on the characteristic X-ray intensity of the target element, the characteristic X-ray intensity of the target element when the beryllium window contains impurities may be corrected through the following steps.
And step S431, establishing a correction curve according to the comparison result.
According to step S300, the relationship between the beryllium Window thickness and the content of the target element when the beryllium Window thickness is the preferred thickness and contains impurities, and the relationship between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium Window thickness is the preferred thickness and does not contain impurities are obtained through monte carlo model simulation, and the obtained comparison results are compared to respectively establish a calibration curve of the characteristic X-ray intensity of the Fe element and the characteristic X-ray intensity of the Zn element, as shown in fig. 9, the abscissa is the characteristic X-ray intensity value (inpurity Be Window Counts) of the target element when the impurities are contained, and the ordinate is the characteristic X-ray intensity value (PurityBe Window Counts) of the target element when the impurities are not contained.
And S432, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the correction curve.
In this example, Fe and Zn contents of 0.8% were corrected based on the correction curve, and the results are shown in table 2.
TABLE 2 comparison of the results of the corrections
| Element(s) | Fe | Zn |
| Analog value without impurities | 5.95E-09 | 8.77E-09 |
| Corrected value for inclusion of impurities | 6.06E-09 | 8.68E-09 |
| Relative error (%) | 1.85 | -1.48 |
As can be seen from Table 2, when the beryllium window contains impurities, the relative error between the corrected value of the characteristic X-ray intensity of the target element and the analog value without the impurities is less than 2 percent, and therefore, the correction effect is good.
Referring to fig. 10, in this embodiment, when it is determined that the beryllium window contains impurities and has an influence on the characteristic X-ray intensity of the target element, the characteristic X-ray intensity of the target element when the beryllium window contains impurities may be corrected by the following steps.
And step S441, respectively obtaining the average relative deviation of the target element characteristic X-ray intensities when the content of the target element is the same, the beryllium window thickness is the optimal thickness and contains impurities, and the beryllium window thickness is the optimal thickness and does not contain impurities.
And step S442, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the average relative deviation.
In this embodiment, the influence on the characteristic X-ray intensity of the target element, that is, the influence of beryllium itself, which is a material of a pure beryllium window, on the characteristic X-ray intensity of the target element can be obtained through monte carlo model simulation when the beryllium window has the thickness that is the preferred thickness and does not contain impurities. Thus, referring to fig. 11, the method of the present embodiment may further include the following steps.
And S500, respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the thickness of the beryllium window is 0 and the thickness of the beryllium window is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result.
And step S600, judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window does not contain impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities.
Referring to fig. 12, in particular, in the present embodiment, the step S600 may include two substeps, i.e., a step S610 and a step S620.
And step S610, respectively obtaining the beryllium window thickness of 0 and the linear correlation coefficient of the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities according to the comparison result, and comparing to obtain the comparison result.
And step S620, judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when not containing impurities according to the comparison result.
And respectively obtaining the characteristic X-ray intensity conditions of 0 beryllium window thickness and 0.5%, 1%, 2%, 3%, 4% and 5% of the target element content when the beryllium window thickness is the optimal thickness and the impurity is not contained through Monte Carlo model simulation. Fig. 13 shows the relationship between the target element characteristic X-ray intensity and the target element Content when the beryllium window has a thickness of 0mm and 1.35mm in this embodiment, and in fig. 13, the abscissa represents the target element Content (Content), and the ordinate represents the target element characteristic X-ray count (Counts), that is, the target element characteristic X-ray intensity. When the thickness of the beryllium window is 1.35mm, the characteristic X-ray intensity of the target element is reduced compared with that when the thickness of the beryllium window is 0. When the thickness of the beryllium window is 0mm and 1.35mm, the difference between the linear correlation coefficients of the characteristic X-ray intensity and the content of the same target element is not large, and therefore, when the thickness of the beryllium window is determined, the content of the target element is in direct proportion to the characteristic X-ray intensity.
In order to verify the above conclusion obtained by the embodiment of the present invention, that is, when the thickness of the beryllium window is determined, the accuracy of the content of the target element in direct proportion to the characteristic X-ray intensity, the beryllium window of the detection tube and the detector are set to be unchanged, and the relationship between the variation dIx of the characteristic X-ray intensity of the target element in the submarine sediment and the variation dH of the thickness of the beryllium window is as follows:
dIx＝-(μ0/sinα+μ1/sinβ)IxdH (2)
wherein H is the thickness of the beryllium window, Ix is the intensity of the target element characteristic X-ray when the thickness of the beryllium window is H, mu 0 and mu 1 are the linear absorption coefficients of the beryllium window to the primary ray and the target element characteristic X-ray respectively, α and β are the incidence angle and the emergence angle respectively0/sinα+μ1in sin β, when the initial condition H is 0, Ix is Ix0, and the integral of equation (2) can be obtained:
Ix＝Ix0e-μH(3)
as can be seen from the equation (3), when the beryllium window thickness of the probe tube is determined and the variation of the substrate of the submarine sediment sample is not large, e-μHIs a constant value, then Ix is proportional to Ix0 and is proportional to the target element content.
From the above results, it can be seen that the beryllium window thickness has no influence on the target element characteristic X-ray intensity when the beryllium window thickness is the preferred thickness and contains no impurities, or the influence on the target element characteristic X-ray intensity when the beryllium window thickness is the preferred thickness and contains no impurities can be ignored. It is understood that, in the implementation, the steps S500 and S600 may be performed before the steps S300 and S400 shown in fig. 1.
It should be noted that, optionally, in this embodiment, the method further includes a step of detecting an influence of the beryllium window on the primary ray through monte carlo model simulation.
Specifically, in this embodiment, to detect the effect of the beryllium window on the primary radiation, the model in fig. 1 is adjusted by first setting the sample grid to vacuum and setting the spot detector F15 in the direction of symmetry about the Y axis at F5, F15 counting the primary radiation photon flux with the beryllium window, and secondly setting both the beryllium window and the sample grid to vacuum and F15 counting the primary radiation photon flux without the beryllium window. In this way, the primary ray spectrum distribution with and without the beryllium window can be obtained, as shown in fig. 14, the abscissa is Energy (Energy) and the ordinate is primary ray count (Counts), i.e., primary ray intensity. As can be seen from fig. 14, the beryllium window has a certain absorption effect on the primary rays, and therefore, when considering the influence of the beryllium window on the seabed in-situ X-fluorescence measurement, the absorption effect of the beryllium window on the characteristic X-rays of the target element is mainly considered.
Referring to fig. 15, a schematic structural block diagram of a monitoring apparatus 100 for monitoring influence of subsea in-situ X-ray fluorescence measurement according to an embodiment of the present invention is shown. The apparatus 100 is applied to a seafloor in situ X-ray fluorescence measurement device 10. In this embodiment, the apparatus includes a transmittance obtaining module 110, a beryllium window preferred thickness determining module 120, a first comparing module 130, and a first determining module 140.
The transmittance acquisition module 110 is configured to establish a monte carlo model, and obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses through monte carlo model simulation. Specifically, the transmittance obtaining module 110 may be configured to execute step S100 shown in fig. 2, and the detailed description of step S100 may be referred to for a specific operation method.
The beryllium window preferred thickness determining module 120 is used for determining the preferred thickness of the beryllium window according to the transmittance and the analysis result of the beryllium window safety theory. Specifically, the beryllium window preferred thickness determining module 120 can be used to perform step S200 shown in fig. 2, and the detailed operation method can refer to the detailed description of step S200.
The first comparison module 130 is configured to obtain, through monte carlo model simulation, a relationship between the characteristic X-ray intensity of the target element and the content of the target element when the thickness of the beryllium window is the preferred thickness and contains impurities, and compare the obtained relationship to obtain a comparison result. Specifically, the first comparison module 130 may be configured to perform step S300 shown in fig. 2, and the detailed description of step S300 may be referred to for a specific operation method.
The first judging module 140 is configured to judge whether the beryllium window contains impurities and affects the characteristic X-ray intensity of the target element, and if so, correct the characteristic X-ray intensity of the target element when the beryllium window contains impurities. Specifically, the first determining module 140 may be configured to execute step S400 shown in fig. 2, and the detailed description of step S400 may be referred to for a specific operation method.
Referring to fig. 16, optionally, in the present embodiment, the apparatus further includes a second comparing module 150 and a second determining module 160.
The second comparison module 150 is configured to obtain, through monte carlo model simulation, a relationship between the beryllium window thickness and the target element characteristic X-ray intensity when the beryllium window thickness is 0 and the beryllium window thickness is the preferred thickness and does not contain impurities, and compare the obtained results. Specifically, the second comparison module 150 may be configured to perform step S500 shown in fig. 11, and the detailed description of step S500 may be referred to for a specific operation method.
The second determination module 160 is configured to determine whether the beryllium window does not contain impurities and affects the characteristic X-ray intensity of the target element, and if so, correct the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities. Specifically, the second determining module 160 may be configured to execute step S600 shown in fig. 11, and the detailed description of step S600 may be referred to for a specific operation method.
In summary, the method and the device for monitoring influence of submarine in-situ X-ray fluorescence measurement provided by the embodiments of the present invention simulate and research whether the beryllium window has influence on the characteristic X-ray intensity of the target element when containing impurities through the monte carlo model, and correct the characteristic X-ray intensity of the target element when the beryllium window contains impurities when the research result indicates that the beryllium window has influence on the characteristic X-ray intensity of the target element, thereby effectively improving the accuracy of the measurement result.
In the embodiments provided in the present application, it should be understood that the disclosed method and apparatus may be implemented in other ways. The apparatus embodiments described above are merely illustrative and, for example, the flowchart and block diagrams in the figures illustrate the architecture, functionality, and operation of possible implementations of apparatus, methods and computer program products according to embodiments of the present invention. In this regard, each block in the flowchart or block diagrams may represent a module, segment, or portion of code, which comprises one or more executable instructions for implementing the specified logical function(s). It should also be noted that, in some alternative implementations, the functions noted in the block may occur out of the order noted in the figures. For example, two blocks shown in succession may, in fact, be executed substantially concurrently, or the blocks may sometimes be executed in the reverse order, depending upon the functionality involved. It will also be noted that each block of the block diagrams and/or flowchart illustration, and combinations of blocks in the block diagrams and/or flowchart illustration, can be implemented by special purpose hardware-based systems which perform the specified functions or acts, or combinations of special purpose hardware and computer instructions.
In addition, the functional modules in the embodiments of the present invention may be integrated together to form an independent part, or each module may exist separately, or two or more modules may be integrated to form an independent part.
The functions, if implemented in the form of software functional modules and sold or used as a stand-alone product, may be stored in a computer readable storage medium. Based on such understanding, the technical solution of the present invention may be embodied in the form of a software product, which is stored in a storage medium and includes instructions for causing a computer device (which may be a personal computer, a server, or a network device) to execute all or part of the steps of the method according to the embodiments of the present invention. And the aforementioned storage medium includes: u disk, removable hard disk, read only memory, random access memory, magnetic or optical disk, etc. for storing program codes.
It should be noted that, in this document, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
Claims (6)
1. A submarine in-situ X-ray fluorescence measurement influence supervision method is applied to submarine in-situ X-ray fluorescence measurement equipment, and is characterized by comprising the following steps:
establishing a Monte Carlo model, and simulating by the Monte Carlo model to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses;
determining the optimal thickness of the beryllium window according to the transmittance and by combining the theoretical analysis result of the safety of the beryllium window;
respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window is of the optimal thickness and contains impurities and the beryllium window is of the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
judging whether the beryllium window contains impurities and influences the characteristic X-ray intensity of the target element, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities;
the method further comprises the following steps:
respectively obtaining the relationship between the beryllium window thickness of 0 and the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
judging whether the beryllium window does not contain impurities and influences the characteristic X-ray intensity of the target element, if so, correcting the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities;
judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities according to the comparison result, wherein the step comprises the following steps of:
respectively obtaining the beryllium window thickness of 0 and the linear correlation coefficient of the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities according to the comparison result, and comparing to obtain the comparison result;
judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities according to the comparison result;
the beryllium window safety theoretical analysis result is obtained by the following steps:
establishing a beryllium window thickness calculation equation:
wherein: t is the thickness of the beryllium window, and the unit is mm; p is the pressure of water borne by the beryllium window and has the unit of MPa; d is the inner diameter of the submarine detection pipe, and the unit is mm; n issA safety factor is set; sigmasThe strength limit of beryllium windows.
2. The method for supervising influence of submarine in-situ X-ray fluorescence measurement according to claim 1, wherein the step of judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the comparison result comprises:
respectively obtaining the beryllium window with the optimal thickness and containing impurities and the characteristic X-ray intensity of the target element with the optimal thickness and without impurities when the target element content is the same, and comparing to obtain comparison results;
and judging whether the beryllium window has influence on the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the comparison result.
3. The seafloor in-situ X-fluorescence measurement influence supervision method according to claim 1, wherein the step of correcting the target element characteristic X-ray intensity when the beryllium window contains impurities comprises:
establishing a correction curve according to the comparison result;
and correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the correction curve.
4. The seafloor in-situ X-fluorescence measurement influence supervision method according to claim 1, wherein the step of correcting the target element characteristic X-ray intensity when the beryllium window contains impurities comprises:
respectively obtaining the average relative deviation of the target element characteristic X-ray intensity when the beryllium window thickness is the optimal thickness and contains impurities and the target element characteristic X-ray intensity when the beryllium window thickness is the optimal thickness and does not contain impurities when the target element content is the same according to the comparison result;
and correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities according to the average relative deviation.
5. The subsea in situ X-ray fluorescence measurement impact monitoring method of claim 1, wherein the step of obtaining the transmittance of target element characteristic X-rays under impurity-free and different thickness beryllium windows by monte carlo model simulation comprises:
simulating and recording photon flux of target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses through a Monte Carlo model;
and processing the photon flux to obtain the transmittance of the target element characteristic X-ray under beryllium windows which do not contain impurities and have different thicknesses.
6. A seabed in-situ X fluorescence measurement influence supervision device is applied to seabed in-situ X fluorescence measurement equipment, and is characterized by comprising:
the transmittance acquisition module is used for establishing a Monte Carlo model and simulating to acquire the transmittance of the target element characteristic X-rays under beryllium windows which do not contain impurities and have different thicknesses through the Monte Carlo model;
the beryllium window optimal thickness determining module is used for determining the optimal thickness of the beryllium window according to the transmittance and by combining with a beryllium window safety theoretical analysis result;
the first comparison module is used for respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the beryllium window thickness is the optimal thickness and contains impurities and the beryllium window thickness is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
the first judgment module is used for judging whether the influence on the characteristic X-ray intensity of the target element is caused when the beryllium window contains impurities according to the comparison result, and if so, correcting the characteristic X-ray intensity of the target element when the beryllium window contains impurities;
the device further comprises:
the second comparison module is used for respectively obtaining the relation between the characteristic X-ray intensity of the target element and the content of the target element when the thickness of the beryllium window is 0 and the thickness of the beryllium window is the optimal thickness and does not contain impurities through Monte Carlo model simulation, and comparing to obtain a comparison result;
the second judgment module is used for respectively obtaining the beryllium window thickness of 0 and the linear correlation coefficient of the target element characteristic X-ray intensity and the target element content when the beryllium window thickness is the optimal thickness and does not contain impurities according to the comparison result, and comparing to obtain the comparison result;
judging whether the beryllium window does not contain impurities and influences the characteristic X-ray intensity of the target element, if so, correcting the characteristic X-ray intensity of the target element when the beryllium window does not contain impurities;
the beryllium window safety theoretical analysis result is obtained by the following steps:
establishing a beryllium window thickness calculation equation:
wherein: t is the thickness of the beryllium window, and the unit is mm; p is the pressure of water borne by the beryllium window and has the unit of MPa; d is the inner diameter of the submarine detection pipe, and the unit is mm; n issA safety factor is set; sigmasThe strength limit of beryllium windows.
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