CN107574466B - A kind of Pr2(MoO4)3The direct preparation method of film - Google Patents

A kind of Pr2(MoO4)3The direct preparation method of film Download PDF

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CN107574466B
CN107574466B CN201710606799.2A CN201710606799A CN107574466B CN 107574466 B CN107574466 B CN 107574466B CN 201710606799 A CN201710606799 A CN 201710606799A CN 107574466 B CN107574466 B CN 107574466B
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film
moo
solution
rare earth
earth ion
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CN107574466A (en
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武晓鹂
龙飞
张铁
刘俊均
吴一
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Guilin University of Technology
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Guilin University of Technology
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Abstract

The invention discloses a kind of Pr2(MoO4)3The direct preparation method of film.By Pr (NO3)3·6H2O is dissolved in the solution for being configured to that rare earth ion total concentration is 0.005 ~ 1mol/L in deionized water, and EDTA or citric acid, NaOH solution, Na are added wherein2MoO4·2H2O, KCl and HNO3, electric depositing solution is obtained after mixing, is placed in water-bath, its temperature is made to reach required temperature;Three-electrode system is inserted into electric depositing solution, thin film is being deposited on electro-conductive glass by electrodeposit reaction, film is used respectively deionized water, dehydrated alcohol rinse, it is subsequently placed in air dry oven dry, dried electrodeposited film is placed in again and is connected with the tube furnace of nitrogen and is heat-treated, Pr is made2(MoO4)3Film.Operation of the present invention is simple, compared to the conventional method to form a film after powder is first done, greatly simplifies method for manufacturing thin film, while avoiding influence of the powder morphology to quality of forming film;And method provided by the invention is easy to operate, and time-consuming short, film quality is good.

Description

A kind of Pr2(MoO4)3The direct preparation method of film
Technical field
The invention belongs to materialogy technical fields, and in particular to a kind of Pr2(MoO4)3The direct preparation method of film.
Background technique
The rare earth luminescent material of molybdic acid salt system is because it is with good chemical stability and higher fluorescence quantum efficiency The advantages that by the fluorescent material as fields such as solid state lighting, FPD, lasers, and fluorescent material is prepared into accordingly Film is an important premise of luminescent material device.There are many rare earth molybdic acids that method can prepare different-shape at present Salt material, such as sol-gel method, hydro-thermal method, solid phase method, microwave method etc..The principle of sol-gal process is alkoxide or esters It closes object dissolution in organic solvent, by hydrolysis, forms activated monomer, monomer polymerize in turn forms colloidal sol, enables colloidal sol poly- The gel for being formed and there is certain space structure is closed, drying and heat treatment remove organic matter therein, and sintering curing is formed The nano material of required nano material, the molybdic acid salt system of this method preparation is mostly the inhomogenous nanometer rods in surface, and is easy Reunite, the material of such pattern is not suitable for being made into film;Hydro-thermal method is to create the environment of a high temperature and pressure, keeps those big Insoluble or indissoluble substance dissolution under the conditions of gas, or reaction generate the lysate of the substance, by molten in control autoclave The temperature difference of liquid makes reactant generation convection current that growth crystal be precipitated to form hypersaturated state, the molybdic acid salt system of this method preparation Nano material more be rendered as flower shape, each flower is made of multiple nanometer sheets, and these nanometer sheets are sufficiently stable, no Easily dispersion, thus such pattern is also not suitable for being made into film;Solid phase method refers generally to participate in using solid matter and by the variation of phase Manufacture a kind of method of powder, the powder granularity that this method is prepared is not thin enough, and inhomogenous, thus can not be prepared The ideal pattern of high-quality thin film;Heating speed is fast, reaction rate is big, heating is equal because its technical characterstic has for microwave process for synthesizing Even, product purity is high and reactant can selectively adjust the synthesis that the advantages that heating is widely used in nano material Cheng Zhong, but the pattern of the product of microwave method preparation is easy to appear agglomeration, therefore the product obtained is not still to prepare height The ideal chose of quality thin film.
To sum up, above method synthesis condition is relatively high, show that synthesis temperature is high and the requirement to reaction vessel also compared with High two aspects;In addition to microwave method, the synthesis process of other methods is taken a long time;Most importantly received using obtained by the above method The pattern of rice material is not suitable for preparing high quality light-emitting film, this makes its application receive great limitation.
Pr2(MoO4)3With good chemical stability, the present invention is being coated with conduction using three-electrode electro Chemical sedimentation The film directly preparing respective films on the glass substrate of film, and preparing have special microscopic appearance, easily with other objects Matter progress is compound, this is of great significance for the device of material.
Summary of the invention
In view of the above-mentioned problems of the prior art, the object of the present invention is to provide a kind of Pr2(MoO4)3Film it is direct Preparation method, this method directly obtain thin film using three-electrode electro Chemical deposition technique on the glass for be coated with conductive layer, Process is simple, time-consuming shorter, and gained film is smooth and fine and close.
Specific steps are as follows:
(1) by Pr (NO3)3·6H2It is 0.005 ~ 1mol/L's that O, which is dissolved in and is configured to rare earth ion concentration in deionized water, Then rare-earth ion solution EDTA or citric acid is added according to the molar ratio of rare earth ion total amount for the ratio of 1 ~ 5:1 Into above-mentioned rare-earth ion solution, then the NaOH solution of 0.1 ~ 1mol/L is added dropwise until the pH value of mixed solution reaches 12 ~ 13, most After add Na2MoO4·2H2O, KCl and HNO3, wherein Na2MoO4·2H2The additional amount of O and the molar ratio of rare earth ion total amount For 1 ~ 5:1, the additional amount of KCl and the molar ratio of rare earth ion total amount are 1 ~ 50:1, HNO3Additional amount for adjust mixing it is molten The pH value of liquid is 4 ~ 6, obtains electric depositing solution after mixing.
(2) electric depositing solution made from step (1) is placed in water-bath, stirring make the temperature of electric depositing solution reach 30 ~ 80 DEG C, obtain spare electric depositing solution.
(3) glass of transparency conducting layer is coated with using surface as working electrode i.e. anode, Pt net is used as to electrode, that is, cathode, Ag/AgCl/Cl-Electrode forms three-electrode system as reference electrode.
(4) in the spare electric depositing solution for obtaining the three-electrode system inserting step (2) of step (3) composition, setting is heavy Product voltage is 1.3 ~ 3V, and sedimentation time is 15min ~ 3h, deposits one layer of electrodeposited film over transparent conductive layer.
(5) it uses deionized water, dehydrated alcohol to rinse respectively electrodeposited film made from step (4), is subsequently placed in 40 ~ 80 DEG C air dry oven in dry 5min ~ for 24 hours.
(6) the dried electrodeposited film of step (5) is placed in the tube furnace for be connected with nitrogen and is heat-treated, setting rises Warm rate is 1 ~ 10 DEG C/min, is warming up to 300 ~ 700 DEG C of 0.5 ~ 10h of heat preservation, obtains Pr2(MoO4)3Film.
The transparency conducting layer is ITO, FTO or AZO.
Compared with prior art, the features of the present invention and beneficial effect are:
Operation of the present invention is simple, is directly prepared on the glass substrate for be coated with conductive layer using electrochemical deposition method Pr2(MoO4)3Film greatly simplifies method for manufacturing thin film, avoids simultaneously compared to the conventional method to form a film after powder is first done Influence of the powder morphology to quality of forming film;And method provided by the invention is easy to operate, and time-consuming short, film quality is good.
Detailed description of the invention
Fig. 1 is the Pr of preparation of the embodiment of the present invention2(MoO4)3The XRD spectrum of film.
Fig. 2 is the Pr of preparation of the embodiment of the present invention2(MoO4)3The pictorial diagram of film.
Fig. 3 is the Pr of preparation of the embodiment of the present invention2(MoO4)3The SEM spectrum of film.
Specific embodiment
Embodiment:
Nitrate compound, the ethylenediamine tetra-acetic acid (EDTA), NaOH, Na for the spectrum (Pr) that the present embodiment uses2MoO4· 2H2O、KCl、HNO3 It is commercially available analysis pure chemistry reagent.
Specific preparation process is as follows:
(1) by Pr (NO3)3·6H2It is the dilute of 0.2mol/L that O, which is dissolved in and is configured to rare earth ion total concentration in deionized water, Then EDTA is added to above-mentioned rare earth ion according to the molar ratio of rare earth ion total amount for the ratio of 3:1 by native solion In solution, then be added dropwise 0.5mol/L NaOH solution until mixed solution pH be 12.6, finally add Na2MoO4·2H2O、 KCl and HNO3, wherein Na2MoO4·2H2The additional amount of O and the molar ratio of rare earth ion total amount are 2:1, and KCl is total with rare earth ion The molar ratio of amount is 25:1, HNO3Additional amount be used for adjust mixed solution pH value be 6, after mixing obtain electro-deposition it is molten Liquid.
(2) electric depositing solution made from step (1) is placed in water-bath, stirring makes the temperature of electric depositing solution reach 80 DEG C, obtain spare electric depositing solution.
(3) glass of transparency conducting layer ITO is coated with using surface as working electrode i.e. anode, it is yin that Pt net, which is used as to electrode, Pole, Ag/AgCl/Cl-Electrode forms three-electrode system as reference electrode.
(4) in the spare electric depositing solution for obtaining the three-electrode system inserting step (2) of step (3) composition, setting is heavy Product voltage is 2.0V, sedimentation time 1h, deposits one layer of electrodeposited film over transparent conductive layer.
(5) it uses deionized water, dehydrated alcohol to rinse respectively electrodeposited film made from step (4), is subsequently placed in 40 DEG C Air dry oven in dry 5min.
(6) the dried electrodeposited film of step (5) is placed in the tube furnace for be connected with nitrogen and is heat-treated, setting rises Warm rate is 3 DEG C/min, is warming up to 500 DEG C of heat preservation 1h, obtains Pr2(MoO4)3Film.
Pr made from the embodiment of the present invention2(MoO4)3Film carries out XRD material phase analysis using X-ray diffractometer, using field Emit scanning electron microscope and carry out morphology observation and analysis, is specifically shown in Figure of description 1,2 and 3.

Claims (1)

1. a kind of Pr2(MoO4)3The direct preparation method of film, it is characterised in that specific steps are as follows:
(1) by Pr (NO3)3·6H2O is dissolved in the rare earth for being configured to that rare earth ion concentration is 0.005 ~ 1mol/L in deionized water Then edta edta or citric acid are 1 ~ 5:1's according to the molar ratio of rare earth ion total amount by solion Ratio is added in above-mentioned rare-earth ion solution, then the NaOH solution of 0.1 ~ 1mol/L is added dropwise until the pH of mixed solution reaches 12.0 ~ 13.0, finally add Na2MoO4·2H2O, KCl and HNO3, wherein Na2MoO4·2H2The additional amount and rare earth ion of O The molar ratio of total amount is 1 ~ 5:1, and the additional amount of KCl and the molar ratio of rare earth ion total amount are 1 ~ 50:1, HNO3Additional amount use It is 4 ~ 6 in the pH value for adjusting mixed solution, obtains electric depositing solution after mixing;
(2) electric depositing solution made from step (1) being placed in water-bath, stirring makes the temperature of electric depositing solution reach 30 ~ 80 DEG C, Obtain spare electric depositing solution;
(3) glass of transparency conducting layer is coated with using surface as working electrode i.e. anode, Pt net is used as to electrode, that is, cathode, Ag/ AgCl/Cl-Electrode forms three-electrode system as reference electrode;
(4) in the spare electric depositing solution for obtaining the three-electrode system inserting step (2) of step (3) composition, setting deposition electricity Pressure is 2.0 ~ 3V, and sedimentation time is 15min ~ 3h, deposits one layer of electrodeposited film over transparent conductive layer;
(5) it uses deionized water, dehydrated alcohol to rinse respectively electrodeposited film made from step (4), is subsequently placed in 40 ~ 80 DEG C Dry 5min in air dry oven ~ for 24 hours;
(6) the dried electrodeposited film of step (5) is placed in the tube furnace for be connected with nitrogen and is heat-treated, setting heating speed Rate is 1 ~ 10 DEG C/min, is warming up to 300 ~ 700 DEG C of 0.5 ~ 10h of heat preservation, obtains Pr2(MoO4)3Film;
The transparency conducting layer is ITO, FTO or AZO.
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