CN107571141B - Offline debugging system and method for CMP process end point determination - Google Patents
Offline debugging system and method for CMP process end point determination Download PDFInfo
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- CN107571141B CN107571141B CN201710713099.3A CN201710713099A CN107571141B CN 107571141 B CN107571141 B CN 107571141B CN 201710713099 A CN201710713099 A CN 201710713099A CN 107571141 B CN107571141 B CN 107571141B
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Abstract
The invention discloses a kind of offline debugging systems and method for CMP process end point determination, the system includes: data read module, for reading pre-stored power of motor data, wherein, power of motor data are the power of motor signal of polishing disk motor driver during chemical-mechanical polisher wafer polishing；Debugging module, for determining the parameter value of terminal Capture window according to power of motor data.The system and method for the embodiment can make technologist's line Imitating end point determination process, and effectively adjust movement window parameter, and then while facilitating parameter testing, reduce production cost and improve production efficiency.
Description
Technical field
The present invention relates to chemical Mechanical Polishing Technique fields, more particularly to a kind of CMP process terminal that is used for examine
The offline debugging system and method surveyed.
Background technique
Chemical Mechanical Polishing Technique (Chemical Mechanical Polishing, abbreviation CMP) is current integrated circuit
Most effective wafer global planarizartion method in manufacture, it realizes the super of wafer surface layer using chemistry and mechanical synergistic effect
It is precise polished.
During CMP process, in order to effectively solve the problems, such as to owe to throw or cross throwing, end point determination need to be integrated
Technology to judge whether CMP process reaches desired terminal online.Generally, in order to reach satisfied technology controlling and process effect, technique
Personnel should in conjunction with actual process condition with as a result, repeatedly adjust end point determination module parameter, such as adjustment terminal Capture window
Window height value and window width value.By offline playback end point change in detection signal process, the present invention can make technologist's line
Lower adjusting end point determination parameter simulates end point determination process, and then while facilitating module parameter to debug, reduces production cost
And improve production efficiency.
Summary of the invention
The present invention is directed to solve at least some of the technical problems in related technologies.For this purpose, of the invention
One purpose is to propose that a kind of offline debugging system for CMP process end point determination, the system pass through offline
Entire end point determination process is simulated, facilitates adjusting end point determination module parameter under technologist's line, and then improve process debugging
Efficiency.
Second object of the present invention is to propose a kind of offline debugging for CMP process end point determination
Method.
To achieve the goals above, first aspect present invention propose for CMP process end point determination from
Line debugging system, comprising: data read module, for reading stored power of motor data file, wherein the motor function
During rate data are chemical-mechanical polisher wafer polishing, the power of motor signal of polishing disk motor driver；Debugging
Module, for determining the parameter value of terminal Capture window according to the power of motor signal.
The offline debugging system for CMP process end point determination of the embodiment of the present invention, passes through reading data
Module reads pre-stored power of motor data, and determines that terminal captures according to power of motor signal curve by debugging module
The parameter value of window.As a result, by the entire process endpoint detection process of off-line simulation, facilitates and adjust terminal inspection under technologist's line
Module parameter is surveyed, and then improves the efficiency of process debugging.
To achieve the goals above, what second aspect of the present invention proposed is chemical using being used for described in first aspect embodiment
The offline adjustment method that the offline debugging system of mechanical polishing process end point determination is carried out, which comprises read preparatory
The power of motor data of storage, wherein the power of motor data are polishing during chemical-mechanical polisher wafer polishing
The power of motor signal of coil motor driver；The parameter value of terminal Capture window is determined according to the power of motor signal.
The offline adjustment method for CMP process end point determination of the embodiment of the present invention, reading are stored in advance
Power of motor data, and determine according to power of motor data the parameter value of terminal Capture window.It is whole by off-line simulation as a result,
A process endpoint detection process facilitates adjusting end point determination module parameter under technologist's line, and then improves the effect of process debugging
Rate.
Detailed description of the invention
Fig. 1 is the offline debugging system according to an embodiment of the invention for CMP process end point determination
Structural schematic diagram；
Fig. 2 is that the offline debugging in accordance with another embodiment of the present invention for CMP process end point determination is
The structural schematic diagram of system；
Fig. 3 is that the offline debugging for CMP process end point determination of another embodiment according to the present invention is
The structural schematic diagram of system；
Fig. 4 is that the offline debugging in accordance with another embodiment of the present invention for CMP process end point determination is
The structural schematic diagram of system；
Fig. 5 is the offline adjustment method according to an embodiment of the invention for CMP process end point determination
Flow chart；
Fig. 6 is the refined flow chart that the parameter value of terminal Capture window is determined according to power of motor data；
Fig. 7 is the offline debugging side in accordance with another embodiment of the present invention for CMP process end point determination
The flow chart of method.
Specific embodiment
The embodiment of the present invention is described below in detail, examples of the embodiments are shown in the accompanying drawings, wherein from beginning to end
Same or similar label indicates same or similar element or element with the same or similar functions.Below with reference to attached
The embodiment of figure description is exemplary, it is intended to is used to explain the present invention, and is not considered as limiting the invention.
Below with reference to the accompanying drawings the offline debugging for chemical mechanical polishing apparatus end point determination of the embodiment of the present invention is described
System and method.
Fig. 1 is the offline debugging system according to an embodiment of the invention for CMP process end point determination
Structural schematic diagram.
As shown in Figure 1, the offline debugging system for being used for CMP process end point determination includes reading data mould
Block 110 and debugging module 120, in which:
Data read module 110 is for reading pre-stored power of motor signal.
Wherein, during power of motor signal is chemical-mechanical polisher wafer polishing, polishing disk motor driver
Power of motor signal.
Wherein, it should be noted that read power of motor signal is online end point determination system in offline debugging system
It is obtained in the preparatory chemically mechanical polishing device of system.
The embodiment of property as an example, during chemical-mechanical polisher wafer polishing, if online
End point determination control system starts online end point determination function, and wafer polishing can be automatically stored in online end point determination control system
During polishing disk motor driver power of motor signal.
Wherein, it is to be understood that during passing through chemical-mechanical polisher wafer polishing, online end point determination
Control system can in real time or timing chemically obtain and store in mechanical polishing device polishing disk motor driver electricity
Machine power signal.
Wherein, it is to be understood that the wafer and process conditions of different materials, corresponding to power of motor signal be not
It is identical.
The embodiment of property as an example, online end point determination control system can polish chemical-mechanical polisher
Power of motor signal obtained is stored in the file under specified path during wafer.
Corresponding, when being debugged offline, data read module 110 can be read in advance from the file under specified path
The power of motor signal of storage.
In one embodiment of the invention, it is assumed that during online end point determination, online end point determination control system
It is the power of motor signal for periodically obtaining and storing polishing disk motor driver according to the default sampling period, it is corresponding
, offline debugging system can control data read module 110 to read power of motor signal according to the default sampling period.
Debugging module 120 is used to determine the parameter value of terminal Capture window according to power of motor signal.
Wherein, the parameter value of terminal Capture window includes the window width value and window height value of terminal Capture window.
The embodiment of property as an example, the debugging system can also include memory module (not shown), should
Memory module facilitates parameter setting when On-line Control, Jin Erti for saving the terminal Capture window parameter for having debugged completion
High service efficiency.
In one embodiment of the invention, on the basis of shown in Fig. 1, as shown in Fig. 2, debugging module 120 can wrap
It includes:
Curve generates submodule 121 for generating power signal curve corresponding with power of motor signal；
Debugging submodule 122 is used to determine that the window width value of terminal Capture window and window are high according to power signal curve
Angle value.
Wherein, it should be noted that terminal Capture window is moved synchronously with power signal curve at any time, and terminal is caught
It catches window and the relative position of power signal curve current point remains unchanged.
In one embodiment of the invention, in order to ensure terminal Capture window can capture each of power signal curve
Kind state, debugging submodule 122 are specifically used for: determining ascending curve section or decline curve section in power signal curve；According to
The consecutive numbers strong point of ascending curve section or decline curve section determine the window width value of terminal Capture window value range and
The value range of window height value；By the value model of the value range of the window width value of terminal Capture window and window height value
It encloses and is supplied to user, and determine the window width value and window height value of terminal Capture window according to the user's choice.
Specifically, debugging submodule 122 is determining ascending curve section or decline curve in power signal curve
Section the smooth change phase, can according to the data coordinates information at the smooth change phase both ends of ascending curve section or decline curve section,
The absolute value for calculating the slope of ascending curve section or decline curve section, being according to the absolute value of the slope is window height
With the reference ratio of window width.
Wherein, the smooth change phase of the ascending curve section or decline curve section of ascending curve section or decline curve section,
The stabilization sub stage that material removes in polishing process is corresponded to, slope is basicly stable.
Wherein, it is to be understood that the ratio of ideal window height and window width should be substantially equal to the ascent stage at this time or
The absolute value of the slope of person's descending branch, technologist on this basis, can suitably finely tune according to actual condition further progress.One
As, window width can use 1-5 (unit is the second), if window width is excessive, it will cause biggish delays.
That is, generally for biggish delay is avoided, user can set preset range (example for the value of window width
Such as, preset range be -5 seconds 1 second) in any value, according to the window width value and window width and window height of user setting
Ratio relation be that can determine that the value of window height.
As an alternative embodiment, in the value range and window of the window width value for determining terminal Capture window
It, can also be according to the value range and window of preset rules and the window width value of terminal Capture window after the value range of height value
The value range of open height value determines the window width value and window height value of terminal Capture window.
The embodiment of property as an example, preset rules can be with are as follows: by ascending curve section in power signal curve or
Aspect ratio of the minimum value of slope absolute value as window in decline curve section.
Wherein, it should be noted that terminal Capture window is used for the corresponding power signal of real-time judge power of motor signal
The state of curve, and according to the detection of the state change of power signal curve realization process endpoint.
Wherein, the state of power signal curve includes propradation, decline state and steady state.
Wherein, the state of power signal curve is that steady state refers to that the performance number in certain certain time keeps steady substantially
It is fixed.
Usually in the case where the certain rubbing head of polish pressure or disk rotating speed are constant, when the current material on polishing wafer surface layer
When material changes, polishing pad and wafer are polished the frictional force between surface layer and can change, corresponding, and polishing coil motor drives
The power of motor signal of dynamic device can also send corresponding variation.It therefore, can when the present material on wafer surface layer is completely removed
Process endpoint is determined by the state change of power signal curve.
For example, the state of power signal curve becomes decline state (or propradation) from steady state, then become flat
Steady state indicates the present material polishing that wafer surface layer is completed, then if it is determined that the state change of power signal curve meets
When above-mentioned changing rule, the terminal of CMP process can be determined.
Wherein, the state of power signal curve is that propradation or decline state indicate that the present material on wafer surface layer is opened
Begin to change.
Wherein, the state of power signal curve is that steady state indicates that the present material on wafer surface layer does not change.
Wherein, it should be noted that the state of the power signal curve in the embodiment be according to power signal curve with
What the positional relationship of terminal Capture window determined.
Wherein, the pass between the state of the positional relationship and power signal curve of power signal curve and terminal Capture window
It is as follows:
Wherein, terminal Capture window is made of four edges, is divided into for the left side, the right, bottom and upper segment.
When power signal curve penetrates the right from the left side of terminal Capture window and is pierced by (left side goes out into the right side), it may be determined that power
The state of signal curve is steady state；
In power signal curve from terminal Capture window when penetrating the right below and being pierced by (under into the right side go out), it may be determined that power
The state of signal curve is propradation；
When power signal curve penetrates the right from the top of terminal Capture window and is pierced by (the enterprising right side goes out), it may be determined that power
The state of signal curve is decline state.
The embodiment of property as an example can determine power signal curve and terminal Capture window by following manner
Positional relationship: obtain power signal curve in abscissa be terminal Capture window the left side abscissa corresponding to performance number
Then P obtains the ordinate value L1 and following ordinate value L2 of terminal Capture window top, compare performance number P, vertical seat
The size relation of scale value L1 and ordinate value L2, and determine according to comparison result the position of power signal curve Yu terminal Capture window
Set relationship.
If L2 < P < L1, it is determined that the positional relationship of power signal curve and terminal Capture window is power signal curve
The right is penetrated from the left side of terminal Capture window to be pierced by.
If P >=L1, it is determined that the positional relationship of power signal curve and terminal Capture window be power signal curve from
The top of terminal Capture window penetrates the right and is pierced by.
If P≤L2, it is determined that the positional relationship of power signal curve and terminal Capture window be power signal curve from
The right that penetrates below of terminal Capture window is pierced by.
Wherein, power signal curve is continually changing with the time, in order to ensure terminal Capture window can capture
To the various states of power signal curve, terminal Capture window is moved synchronously with time and power signal curve, also, terminal
The relative position of Capture window and power signal curve current point is to maintain constant.It in summary it can be seen, the embodiment is offline
Debugging system is to facilitate technologist to carry out parameter tune by the entire detection process of line Imitating (power of motor signal intensity)
Examination, it is not necessary to repeat technological experiment, to reduce production cost.The parameter debugged offline can be applied to real process,
Or it need to only carry out small amendment.
The offline debugging system for CMP process end point determination of the embodiment of the present invention, passes through reading data
Module reads pre-stored power of motor signal, and determines terminal Capture window according to power of motor signal by debugging module
Parameter value.As a result, by the entire process endpoint detection process of off-line simulation, facilitate adjusting end point determination mould under technologist's line
Block parameter, and then improve the efficiency of process debugging.
Fig. 3 is that the offline debugging for CMP process end point determination of another embodiment according to the present invention is
The structural schematic diagram of system.
As shown in figure 3, the offline debugging system for being used for CMP process end point determination includes reading data mould
Block 110, debugging module 120 and data processing module 130, in which:
It should be noted that the aforementioned explanation to data read module 110 is also applied in the embodiment, herein not
It repeats again.
Data processing module 130 is used to carry out noise reduction process to power of motor signal.
Debugging module 120 is used to determine the parameter value of terminal Capture window according to the power of motor signal after noise reduction process.
In one embodiment of the invention, data processing module 130 is specifically used for the smooth window according to preset length
Power of motor signal is smoothed.
Wherein, preset length is the length of pre-set smooth window, and preset length can be in offline debugging system
Default, it can also be that user is pre-set according to demand.
For example, preset length is 100, at this point, smooth window calculates being averaged for the 1-100 power of motor value first
Value, and using the average value as current motor power signal value, then, control smooth window is translated, and calculates 2-101
The average value of a power of motor value, and so on, realize smooth window to the smooth of subsequent power of motor signal.
The embodiment of property as an example, data processing module 130 are also used to cache power of motor signal, and true
When determining the power of motor signal in buffer zone more than preset capacity threshold value, the power of motor signal on head in buffer zone is deleted
It removes, and the new value for the power of motor signal for needing to save is saved to the tail portion of buffer zone.
Wherein, preset capacity threshold value is the upper limit value of the data cached number in buffer zone.
For example, preset capacity threshold value is 1000, when having cached 1000 power of motor signals in buffer zone, such as
Fruit needs to continue in buffer zone to cache power of motor signal, then by the data cached deletion of first position in buffer zone,
And by data cached Forward one in other positions, and the power of motor signal cached will be needed to save into buffer zone
On the last one position.
In one embodiment of the invention, on the basis of shown in Fig. 3, as shown in figure 4, debugging module 120 can wrap
It includes curve and generates submodule 121 and debugging submodule 122, in which:
Curve generates submodule 121 and is specifically used for: it is bent to generate power signal according to the power of motor signal after smoothing processing
Line.That is, curve generates power signal song corresponding to the power of motor signal after submodule 121 produces smoothing processing
Line.
Debugging submodule 122 is used to determine that the window width value of terminal Capture window and window are high according to power signal curve
Angle value.
Wherein, it should be noted that the above-mentioned offline debugging system to for CMP process end point determination
Explanation is also applied for the embodiment, and details are not described herein again.
The offline debugging system for CMP process end point determination of the embodiment of the present invention, passes through reading data
Module reads pre-stored power of motor signal, and determines terminal Capture window according to power of motor signal by debugging module
Parameter value.As a result, by the entire process endpoint detection process of off-line simulation, facilitate adjusting end point determination mould under technologist's line
Block parameter, and then improve the efficiency of process debugging.
In order to realize above-described embodiment, the invention also provides it is a kind of for CMP process end point determination from
Line adjustment method.
Fig. 5 is the offline adjustment method according to an embodiment of the invention for CMP process end point determination
Flow chart.As shown in figure 5, the offline adjustment method the following steps are included:
S51 reads pre-stored power of motor signal.
Wherein, power of motor signal is the electricity of polishing disk motor driver during chemical-mechanical polisher wafer polishing
Machine power signal.
Specifically, it is specified from system and reads the pre-stored motor function of online end point determination control system in local folders
Rate signal.
Wherein, it is to be understood that during passing through chemical-mechanical polisher wafer polishing, online end point determination
Control system can in real time or timing acquisition and the power of motor signal for depositing polishing disk motor driver automatically.
The embodiment of property as an example, online end point determination control system can be periodical according to the default sampling period
Ground obtains and stores the power of motor signal of the motor driver of polishing disk.
Wherein, the default sampling period can be system default setting, can also be what user was arranged according to demand, the reality
It applies example and this is not construed as limiting.
Wherein, it is to be understood that the wafer and process conditions of different materials, corresponding to power of motor signal be not
It is identical.
The embodiment of property as an example, online end point determination control system is by institute during the entire process of polishing wafer
The power of motor signal of acquisition is stored in the file under specified path.
S52 determines the parameter value of terminal Capture window according to power of motor signal.
In one embodiment of the invention, as shown in fig. 6, determining the ginseng of terminal Capture window according to power of motor signal
The process of numerical value may include:
S61 generates power signal curve corresponding with power of motor signal.
S62 determines the window width value and window height value of terminal Capture window according to power signal curve.
Wherein, terminal Capture window is moved synchronously with power signal curve at any time, and terminal Capture window and power
The relative position of signal curve current point remains unchanged.
The embodiment of property as an example, in order to ensure terminal Capture window can capture power signal curve
Various states determine ascending curve section or decline curve section in power signal curve；It is bent according to ascending curve section or decline
The consecutive numbers strong point of line segment determines the value range of the window width value of terminal Capture window and the value range of window height value；
The value range of the value range of the window width value of terminal Capture window and window height value is supplied to user, and according to
The selection at family determines the window width value and window height value of terminal Capture window.
Specifically, determine the smooth change phase of the ascending curve section or decline curve section in power signal curve,
According to the data coordinates at ascending curve section perhaps smooth change phase both ends of decline curve section calculate ascending curve section or under
The absolute value of the slope of curved section drops, and the absolute value according to the slope is the reference ratio of window height and window width.
Wherein, the smooth change phase of ascending curve section or decline curve section corresponds to what material in polishing process removed
Stage, slope are basicly stable.
Wherein, it is to be understood that the ratio of ideal window height and window width should be substantially equal to the ascent stage or
The absolute value of the slope of person's descending branch.Technologist on this basis, further can suitably finely tune according to actual condition.Generally
Ground, window width can use 1-5 (unit is the second), if window width is excessive, it will cause biggish delays.
That is, generally for biggish delay is avoided, user can set preset range (example for the value of window width
Such as, preset range be -5 seconds 1 second) in any value, according to the window width value and window width and window height of user setting
Ratio relation be that can determine that the value of window height.
As an alternative embodiment, in the value range and window of the window width value for determining terminal Capture window
It, can also be according to the value range and window of preset rules and the window width value of terminal Capture window after the value range of height value
The value range of open height value determines the window width value and window height value of terminal Capture window.
The embodiment of property as an example, preset rules can be with are as follows: by ascending curve section in power signal curve or
Aspect ratio of the minimum value of slope absolute value as window in decline curve section.
That is, the window width value and window height value of the terminal Capture window in the embodiment should ensure that terminal is caught
Catching window can recognize that the state change of power signal curve.
Wherein, it should be noted that terminal Capture window is used for the corresponding power signal of real-time judge power of motor signal
The state of curve, and according to the detection of the state change of power signal curve realization process endpoint.
Wherein, the state of power signal curve includes propradation, decline state and steady state.
Wherein, the state of power signal curve is that steady state refers to that the performance number in certain certain time remains unchanged.
Usually in the case where the certain rubbing head of polish pressure or disk rotating speed are constant, when the current material on polishing wafer surface layer
When material changes, polishing pad and wafer are polished the frictional force between surface layer and can change, and accordingly, polishing coil motor drives
The power of motor signal of dynamic device can also occur to change accordingly.It therefore, can when the present material on wafer surface layer is completely removed
Process endpoint is determined by the state change of power signal curve.
For example, the state of power signal curve becomes decline state (or propradation) from steady state, then become flat
Steady state indicates the present material polishing that wafer surface layer is completed.If it is determined that the state change of power signal curve meets
When stating changing rule, the terminal of CMP process can be determined.
Wherein, the state of power signal curve is that propradation or decline state indicate that the present material on wafer surface layer is opened
Begin to change.
Wherein, the state of power signal curve is that steady state indicates that the present material of wafer layer does not change.
Wherein, it should be noted that the state of the power signal curve in the embodiment be according to power signal curve with
What the relative positional relationship of terminal Capture window determined.
Wherein, between the state about the positional relationship and power signal curve of power signal curve and terminal Capture window
The associated description of relationship can be found in the aforementioned associated description to system embodiment, details are not described herein again.
In one embodiment of the invention, after the parameter value for determining terminal Capture window, terminal can also be saved and caught
The parameter value for catching window facilitates parameter setting when On-line Control, and then improves service efficiency.
The offline adjustment method for CMP process end point determination of the embodiment of the present invention, reading are stored in advance
Power of motor data, and determine according to power of motor signal intensity curve the parameter value of terminal Capture window.As a result, by from
Line simulates entire process endpoint detection process, facilitates adjusting end point determination module parameter under technologist's line, and then improve technique
The efficiency of debugging.
Fig. 7 is the offline adjustment method according to an embodiment of the invention for CMP process end point determination
Flow chart.As shown in fig. 7, the offline adjustment method may comprise steps of:
S71 reads pre-stored power of motor signal.
Wherein, it should be noted that step S71 is identical as step S51, and the aforementioned explanation to step S51 is also suitable
In step S71, details are not described herein again.
S72 carries out smoothing and noise-reducing process to power of motor signal.
In one embodiment of the invention, power of motor signal can be carried out according to the smooth window of preset length smooth
Processing.
Wherein, preset length is the length of pre-set smooth window, and preset length can be in offline debugging system
Default, it can also be that user is pre-set according to demand.
In one embodiment of the invention, this method can also include: caching power of motor signal, and cache determining
When power of motor signal in region is more than preset capacity threshold value, the power of motor signal on head in buffer zone is deleted, and
The new motor power signal saved will be needed to save to the tail portion of buffer zone.
Wherein, preset capacity threshold value is the upper limit value of the data cached number in buffer zone.
For example, preset capacity threshold value is 1000, when having cached 1000 power of motor signals in buffer zone, such as
Fruit needs to continue in buffer zone to cache power of motor signal, then by the data cached deletion of first position in buffer zone,
And by data cached Forward one in other positions, and the new motor power signal cached will be needed to save into buffer zone
The last one position on.
S73 determines the parameter value of terminal Capture window according to the power of motor signal after noise reduction process.
Specifically, power signal curve is generated according to the power of motor signal after smoothing processing, then, according to power signal
Curve determines the window width value and window height value of terminal Capture window.
Wherein, aforementioned to the window width value for determining terminal Capture window according to power signal curve and window height value
Explanation is also applied for the embodiment, and details are not described herein again.
Wherein, it should be noted that the aforementioned offline debugging system to for CMP process end point determination
The offline adjustment method for chemical mechanical polishing apparatus end point determination for being also applied for the embodiment is illustrated, herein no longer
It repeats.
The offline adjustment method for CMP process end point determination of the embodiment of the present invention, reading are stored in advance
Power of motor signal, and smoothing and noise-reducing process is carried out to power of motor signal, and according to the power of motor after noise reduction process
Signal determines the parameter value of terminal Capture window.As a result, by the entire process endpoint detection process of off-line simulation, facilitate technique people
End point determination module parameter is adjusted under member's line, and then improves the efficiency of process debugging.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show
The description of example " or " some examples " etc. means specific features, structure, material or spy described in conjunction with this embodiment or example
Point is included at least one embodiment or example of the invention.In the present specification, schematic expression of the above terms are not
It must be directed to identical embodiment or example.Moreover, particular features, structures, materials, or characteristics described can be in office
It can be combined in any suitable manner in one or more embodiment or examples.In addition, without conflicting with each other, the skill of this field
Art personnel can tie the feature of different embodiments or examples described in this specification and different embodiments or examples
It closes and combines.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include at least one this feature.In the description of the present invention, the meaning of " plurality " is two or more, unless separately
There is clearly specific restriction.
Any process described otherwise above or method description are construed as in flow chart or herein, and expression includes
It is one or more for realizing specific logical function or process the step of executable instruction code module, segment or portion
Point, and the range of the preferred embodiment of the present invention includes other realization, wherein can not press shown or discussed suitable
Sequence, including according to related function by it is basic simultaneously in the way of or in the opposite order, Lai Zhihang function, this should be of the invention
Embodiment person of ordinary skill in the field understood.
Claims (8)
1. a kind of offline debugging system for CMP process end point determination, which is characterized in that the system comprises:
Data read module, for reading pre-stored power of motor data, wherein the power of motor data are chemical machine
The power of motor signal of polishing disk motor driver during tool polissoir wafer polishing；
Debugging module, for determining the parameter value of terminal Capture window according to the power of motor data；
The debugging module, comprising:
Curve generates submodule, for generating the power signal curve of the power of motor data；
Submodule is debugged, for determining the window width value and window of the terminal Capture window according to the power signal curve
Height value, wherein the terminal Capture window is moved synchronously with the power signal curve at any time, and the terminal captures
Window and the relative position of the power signal curve current point remain unchanged.
2. the system as claimed in claim 1, which is characterized in that the system also includes:
Data processing module, for carrying out smoothing and noise-reducing process to the power of motor data.
3. system as claimed in claim 2, which is characterized in that the debugging submodule is specifically used for:
Determine ascending curve section or decline curve section in the power signal curve；
Determine that the window of the terminal Capture window is wide according to the consecutive numbers strong point of the ascending curve section or decline curve section
The value range of angle value and the value range of window height value；
The value range of the value range of the window width value of the terminal Capture window and window height value is supplied to user,
And the window width value and window height value of the terminal Capture window are determined according to the user's choice.
4. system as claimed in claim 2, which is characterized in that
The data processing module, is specifically used for: being carried out according to the smooth window of preset length to the power of motor signal flat
Sliding processing；
The curve generates submodule, is specifically used for: generating power signal curve according to the power of motor signal after smoothing processing.
5. system as claimed in claim 4, which is characterized in that the data processing module is also used to cache the motor function
Rate signal, and when determining that the power of motor signal in buffer zone is more than preset capacity threshold value, by head in the buffer zone
The power of motor signal in portion is deleted, and the new motor power signal saved will be needed to save to the tail portion of the buffer zone.
6. a kind of use the offline debugging as described in any one in claim 1-5 for CMP process end point determination
The offline adjustment method that system is carried out, which is characterized in that the described method includes: pre-stored power of motor signal is read,
Wherein, the power of motor signal is the electricity of polishing disk motor driver during the chemical-mechanical polisher wafer polishing
Machine power signal；
The parameter value of terminal Capture window is determined according to the power of motor signal；
The parameter value that terminal Capture window is determined according to the power of motor signal, comprising:
Generate power signal curve corresponding with the power of motor signal；
The window width value and window height value of the terminal Capture window are determined according to the power signal curve, wherein institute
It states terminal Capture window to move synchronously with the power signal curve at any time, and the terminal Capture window and the power
The relative position of signal curve current point remains unchanged.
7. method as claimed in claim 6, which is characterized in that determine that terminal captures according to the power of motor signal described
When the parameter value of window, the method also includes:
Smoothing and noise-reducing process is carried out to the power of motor signal.
8. the method for claim 7, which is characterized in that described to determine that the terminal is caught according to the power signal curve
Catch the window width value and window height value of window, comprising:
Determine ascending curve section or decline curve section in the power signal curve；
Determine that the window of the terminal Capture window is wide according to the consecutive numbers strong point of the ascending curve section or decline curve section
The value range of angle value and the value range of window height value；
The value range of the value range of the window width value of the terminal Capture window and window height value is supplied to user,
And the window width value and window height value of the terminal Capture window are determined according to the user's choice.
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Citations (5)
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|---|---|---|---|---|
| JPH01207929A (en) * | 1988-01-25 | 1989-08-21 | Internatl Business Mach Corp <Ibm> | Method and apparatus for polishing |
| JPH10202523A (en) * | 1997-01-22 | 1998-08-04 | Ebara Corp | Polishing end point detecting method |
| CN1458673A (en) * | 2002-05-15 | 2003-11-26 | 旺宏电子股份有限公司 | Terminal detection system for chemical and mechanical polisher |
| CN101121242A (en) * | 2006-08-10 | 2008-02-13 | 中芯国际集成电路制造(上海)有限公司 | Method for detecting chemical and mechanical flattening endpoint |
| CN102126181A (en) * | 2010-01-14 | 2011-07-20 | 中芯国际集成电路制造(上海)有限公司 | Chemical mechanical polishing method |
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2017
- 2017-08-18 CN CN201710713099.3A patent/CN107571141B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01207929A (en) * | 1988-01-25 | 1989-08-21 | Internatl Business Mach Corp <Ibm> | Method and apparatus for polishing |
| JPH10202523A (en) * | 1997-01-22 | 1998-08-04 | Ebara Corp | Polishing end point detecting method |
| CN1458673A (en) * | 2002-05-15 | 2003-11-26 | 旺宏电子股份有限公司 | Terminal detection system for chemical and mechanical polisher |
| CN101121242A (en) * | 2006-08-10 | 2008-02-13 | 中芯国际集成电路制造(上海)有限公司 | Method for detecting chemical and mechanical flattening endpoint |
| CN102126181A (en) * | 2010-01-14 | 2011-07-20 | 中芯国际集成电路制造(上海)有限公司 | Chemical mechanical polishing method |
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