CN107564942A - Flexible display and preparation method thereof - Google Patents

Flexible display and preparation method thereof Download PDF

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Publication number
CN107564942A
CN107564942A CN201710731733.6A CN201710731733A CN107564942A CN 107564942 A CN107564942 A CN 107564942A CN 201710731733 A CN201710731733 A CN 201710731733A CN 107564942 A CN107564942 A CN 107564942A
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array
flexible substrate
film transistor
thin film
color membrane
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CN201710731733.6A
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Chinese (zh)
Inventor
郭远征
谢明哲
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to CN201710731733.6A priority Critical patent/CN107564942A/en
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Abstract

The present invention proposes flexible display and preparation method thereof, and the flexible display includes:Flexible substrate;Color membrane array, it is arranged on the side of flexible substrate;Protective layer, it is arranged on side of the color membrane array away from flexible substrate;Thin film transistor (TFT) array, it is arranged on side of the protective layer away from flexible substrate;Organic Light Emitting Diode, it is arranged on side of the thin film transistor (TFT) array away from flexible substrate;And encapsulated layer, it is arranged on side of the Organic Light Emitting Diode away from flexible substrate.Flexible display device proposed by the invention, its preparation method is that thin film transistor (TFT) array and Organic Light Emitting Diode are formed directly on color membrane array substrate, the step of can saving to box, so that the display resolution of the flexible display device is higher;Also, the protective layer newly formed on color membrane array not only contributes to the making of thin film transistor (TFT) array, moreover it is possible to which adequately protect the influence that color membrane array structure makes from subsequent thin film transistor array, so that the yields of the flexible display device is higher.

Description

Flexible display and preparation method thereof
Technical field
The present invention relates to display technology field, specifically, the present invention relates to flexible display and preparation method thereof.
Background technology
In recent years, the big factory of the display panels such as Flexible Displays fast development, SAMSUNG, LG, JDI, BOE is in meetings such as SID On put on display the model machine of oneself, while also all in the positive layout Flexible Displays pilot line and volume production line of oneself, Flexible Displays Gradually converted from research and development to volume production.
Flexible display, it is by touch-control (touch), color film (CF) array, polaroid (Pol), cover layer protection film The modular structure of (Cover film) and notacoria composition.At present, large scale, which is shown, generally uses white organic LED (OLED) mode of+color film (CF), white light OLED substrate and color membrane substrates are then encapsulated.However, the day with resolution requirement Benefit gradually steps up, the contraposition difficulty of white light OLED substrate and color membrane substrates also just more and more higher therewith in encapsulation process.
Therefore, the method for making large scale OLED screen at this stage still has much room for improvement.
The content of the invention
It is contemplated that at least solves one of technical problem in correlation technique to a certain extent.
The present invention is the following discovery based on inventor and completed:
The present inventor at present make large scale OLED screen encapsulation process in, easily occur oled substrate with Color membrane substrates align the increased technical problem of difficulty, propose a kind of new OLED+CF flexible display device in this application Structure.Specifically, color membrane array is first formed on flexible substrates, layer protective layer is covered on color membrane array again and then is protecting On cuticula make array architecture of thin film transistor, continuously form Organic Light Emitting Diode, finally encapsulation form encapsulated layer, in this way, Thin film transistor (TFT) array and Organic Light Emitting Diode are formed directly on color membrane substrates, the step of can saving the later stage to box is simultaneously effective The position accuracy between color membrane array and thin film transistor (TFT) array is improved, and the protective layer newly formed on color membrane array can not only The rough color membrane array surface of script is set to become smooth and beneficial to thin film transistor (TFT) array making, moreover it is possible to which adequately protect coloured silk Membrane structure will not be made by subsequent thin film transistor array to be influenceed.
In view of this, it is an object of the present invention to propose a kind of manufacturing process without to box step, color membrane array with The flexible display device that position accuracy is more preferable between thin film transistor (TFT) array or display resolution is higher.
In the first aspect of the present invention, the present invention proposes a kind of flexible display device.
According to an embodiment of the invention, the flexible display device includes:Flexible substrate;Color membrane array, the color film battle array Row are arranged on the side of the flexible substrate;Protective layer, the protective layer are arranged on the color membrane array away from the flexible liner The side at bottom;Thin film transistor (TFT) array, the thin film transistor (TFT) array are arranged on the protective layer away from the flexible substrate Side;Organic Light Emitting Diode, the Organic Light Emitting Diode are arranged on the thin film transistor (TFT) array away from the flexible liner The side at bottom;And encapsulated layer, the encapsulated layer are arranged on side of the Organic Light Emitting Diode away from the flexible substrate.
Inventor is it was unexpectedly observed that the flexible display device of the embodiment of the present invention, its preparation method are directly in color film base Thin film transistor (TFT) array and Organic Light Emitting Diode are formed on plate, the step of can saving to box and effectively improve color membrane array with it is thin Position accuracy between film transistor array, so that the display resolution of the flexible display device is higher;Also, color membrane array On the protective layer that is newly formed can not only make originally rough color membrane array surface become smooth and be beneficial to thin film transistor (TFT) battle array The making of row, moreover it is possible to the influence that the color membrane structure that adequately protects makes from subsequent thin film transistor array, so that the flexibility is aobvious Show that the yields of device is higher.
In addition, flexible display device according to the above embodiment of the present invention, can also have technical characteristic additional as follows:
According to an embodiment of the invention, the flexible substrate and the protective layer visible region with more than 85% it is saturating Light rate.
According to an embodiment of the invention, the protective layer is formed by polyimide material.
According to an embodiment of the invention, the thickness of the protective layer is 1.5~20 microns.
According to an embodiment of the invention, the thickness of the flexible substrate is 5~20 microns.
According to an embodiment of the invention, the flexible display device further comprises:Block water oxidation prevention layer, the oxygen that blocks water Layer is arranged on side of the encapsulated layer away from the flexible substrate.
According to an embodiment of the invention, it is described to block water what oxidation prevention layer was formed by copper or aluminium.
In the second aspect of the present invention, the present invention proposes a kind of method for preparing flexible display device.
According to an embodiment of the invention, methods described includes:In the side of flexible substrate, color membrane array is formed;Described Side of the color membrane array away from the flexible substrate, form protective layer;In side of the protective layer away from the flexible substrate, Form thin film transistor (TFT) array;In side of the thin film transistor (TFT) array away from the flexible substrate, organic light emission two is formed Pole pipe;In side of the Organic Light Emitting Diode away from the flexible substrate, encapsulated layer is formed.
Inventor it was unexpectedly observed that using the embodiment of the present invention preparation method, directly continuously formed on color membrane substrates Thin film transistor (TFT) array and Organic Light Emitting Diode, the step of later stage can be saved to box and to effectively improve color membrane array brilliant with film Position accuracy between body pipe array, and the protective layer newly formed on color membrane array can not only make rough color film originally Array surface becomes smooth and beneficial to thin film transistor (TFT) array making, moreover it is possible to which the color membrane structure that adequately protects will not be by subsequent thin film The influence that transistor array makes, so as to prepare the flexible display device that display resolution is higher, yields is higher.
In addition, preparation method according to the above embodiment of the present invention, can also have technical characteristic additional as follows:
According to an embodiment of the invention, the making temperature for forming thin film transistor (TFT) array is below 230 degrees Celsius.
According to an embodiment of the invention, methods described further comprises:In the encapsulated layer away from the flexible substrate Side, form the oxidation prevention layer that blocks water.
The additional aspect and advantage of the present invention will be set forth in part in the description, and will partly become from the following description Obtain substantially, or recognized by the practice of the present invention.
Brief description of the drawings
The above-mentioned and/or additional aspect and advantage of the present invention will become in the description from combination accompanying drawings below to embodiment Substantially and it is readily appreciated that, wherein:
Fig. 1 is the structural representation of the flexible display device of one embodiment of the invention;
Fig. 2 is the structural representation of the flexible display device of another embodiment of the present invention;
Fig. 3 is the method flow schematic diagram for preparing flexible display device of one embodiment of the invention;
Fig. 4 is the method flow schematic diagram for preparing flexible display device of another embodiment of the present invention.
Reference
100 flexible substrates
200 color membrane arrays
300 protective layers
400 thin film transistor (TFT) arrays
500 Organic Light Emitting Diodes
600 encapsulated layers
700 block water oxidation prevention layer
Embodiment
Embodiments of the invention are described below in detail, those skilled in the art is it will be appreciated that example below is intended to be used to solve The present invention is released, and is not construed as limitation of the present invention.Unless stated otherwise, it is not expressly recited in embodiment below specific Technology or condition, those skilled in the art can be according to conventional technology in the art or condition or according to product description Carry out.
In one aspect of the invention, the present invention proposes a kind of flexible display device.Reference picture 1~2, to the present invention's Flexible display device is described in detail.
According to an embodiment of the invention, reference picture 1, the flexible display device include:Flexible substrate 100, color membrane array 200, protective layer 300, thin film transistor (TFT) array 400, Organic Light Emitting Diode 500 and encapsulated layer 600.Wherein, color membrane array 200 are arranged on the side of flexible substrate 100;Protective layer 300 is arranged on color side of the membrane array 200 away from flexible substrate 100;It is thin Film transistor array 400 is arranged on side of the protective layer 400 away from flexible substrate 100;Organic Light Emitting Diode 500 is arranged on thin Side of the film transistor array 400 away from flexible substrate 100;And encapsulated layer 600 is arranged on Organic Light Emitting Diode 500 away from soft The side of property substrate 100.
The present inventor makes large scale OLED screen and easily gone out in encapsulation process at present by the discovery that studies for a long period of time The technical problem that existing oled substrate gradually increases with color membrane substrates contraposition difficulty.So the application proposes a kind of new OLED+ CF flexible display device structure.Specifically, thin film transistor (TFT) array 400 and organic light emission two are formed directly on color membrane substrates Pole pipe 500, the step of can saving the later stage to box, simultaneously effectively improve the position between color membrane array 200 and thin film transistor (TFT) array 400 Accuracy is put, and the protective layer 300 newly formed on color membrane array 200, the rough color table of membrane array 200 originally can not only be made Face becomes smooth and beneficial to thin film transistor (TFT) array 400 making, moreover it is possible to which the structure for the color membrane array 200 that adequately protects will not be by rear The influence that continuous thin film transistor (TFT) array 400 makes.
According to an embodiment of the invention, flexible substrate 100 and protective layer 300 have more than 85% printing opacity in visible region Rate, in this way, light is sent from Organic Light Emitting Diode 500, and passes through thin film transistor (TFT) array 400, through protective layer 300, color film After array 200 and flexible substrate 100, frame out is shown, so that the picture display effect of flexible display is more preferable.
According to an embodiment of the invention, the specific material of flexible substrate 100 is not particularly limited, as long as the material is formed Flexible substrate 100 can reach more than 85% in the light transmittance of visible region, those skilled in the art can be aobvious according to flexibility Show that the flexibility requirements of device are selected.In some embodiments of the invention, flexible substrate 100 can be by polyimides (PI) Formed, in this way, the flexible substrate 100 formed by above-mentioned material has high transmission rate and well flexibility.
According to an embodiment of the invention, the specific thickness of flexible substrate 100 is not particularly limited, as long as the thickness is soft Property substrate 100 surfacing and can and color membrane array 200 between have cohesive force, those skilled in the art can be according to flexibility The bent degree of display device is adjusted.In some embodiments of the invention, the thickness of flexible substrate 100 can be 5 ~20 microns, in this way, using the flexible substrate 100 of above-mentioned thickness, its surfacing degree is advantageous to well the system of color membrane array 200 It is standby, and can also make flexible display device that there is suitable bent performance.
According to an embodiment of the invention, the specific material of protective layer 300 is not particularly limited, if what the material was formed Protective layer 300 can reach more than 85% in the light transmittance of visible region, can effectively protect color membrane array 200 and be resistant to 200 to 300 degrees Celsius of temperature, those skilled in the art can be according to the flexibility requirements and subsequent thin film transistor of flexible display The specific preparation method of array 400 is selected.In some embodiments of the invention, protective layer 300 can be sub- by polyamides Amine (PI) material formed, in this way, have above-mentioned material formed protective layer 300, both can effectively protect color membrane array 200 from The corrosion of etching liquid, there is outgoing effect of the good light transmittance without influenceing light again.
According to an embodiment of the invention, the specific thickness of protective layer 300 is not particularly limited, as long as the protection of the thickness Layer 300 can effectively protect color membrane array 200, and those skilled in the art can be according to the recessed of the color surface of membrane array 200 reality Convex degree is adjusted.In some embodiments of the invention, the thickness of protective layer 300 can be 1.5~20 microns, in this way, Using the protective layer 300 of above-mentioned thickness, not only it can fully protect color membrane array 200 will not be by subsequent thin film transistor array 400 influences made, the outgoing effect of light is not interfered with also.
According to an embodiment of the invention, the concrete structure of color membrane array 200 is not particularly limited, as long as the coloured silk of the structure Membrane array 200 can accurately selectively allow for the light wave of wave band in the range of small in white light to pass through, those skilled in the art Can correspondingly it be designed according to the pixel resolution and color saturation of the flexible display.In some embodiments of the present invention In, color membrane array 200 can be by red (R) optical filter, green (G) optical filter and blue (B) optical filter according to certain arrangement side Formula arrangement, in this way, diverse location of this red bluish-green three primary colors on the display screen of flexible display can be shown, so as to make The service life of three kinds of colors equally grow without the feux rouges life-span it is shorter the problem of, and then make the long-term of the flexible display The display effect used is more stable.It should be noted that in the color structure of membrane array 200 in addition to RGB filter, also Including other necessary compositions or structure, specifically such as black matrix, those skilled in the art can be according to the color membrane array 200 Specifically used requirement is supplemented and designed, and will not be repeated here.
According to an embodiment of the invention, the concrete structure of thin film transistor (TFT) array 400 is not particularly limited, as long as the knot The thin film transistor (TFT) array 400 of structure can drive and control the self light emission function of Organic Light Emitting Diode 500, art technology Personnel can carry out correspondingly selecting and designing according to the screen size and horsepower requirements of the flexible display device.The one of the present invention In a little embodiments, in order to realize the high-resolution of large scale flexible display device, thin film transistor (TFT) array 400 can use active The actively driving structure of (AM), in this way, low voltage drive and low energy consumption, so as to contribute to large-sized flexible display device to use Life-time dilatation, and meet full-color high-resolution development trend.
According to an embodiment of the invention, the concrete structure of Organic Light Emitting Diode 500 is not particularly limited, in the art Conventional organic LED structure, as long as the Organic Light Emitting Diode 500 of the structure can be spontaneous under voltage driving Light, those skilled in the art can correspondingly be designed according to the particular type of the flexible display device.The present invention's In some embodiments, Organic Light Emitting Diode 500 can be white organic LED (OLED), in this way, flexible display The colour purity of part is higher and energy consumption is lower.In some specific examples, white organic LED 500 is away from flexible substrate It can include successively on 100 direction:Transparent cathode layer, white-light organic light-emitting layer and reflective anode layer, in this way, in film Under the voltage driving of the thin film transistor (TFT) of transistor array 400, reflection of the white light through anode layer that white-light organic light-emitting layer is sent, It is emitted after being then passed through transparent cathode layer, so as to the spontaneous light effect of the bottom emitting of satiable white organic LED.
According to an embodiment of the invention, 600 specific material of encapsulated layer and thickness are not particularly limited, as long as the material Material and thickness encapsulated layer 600 can effectively starvation and aqueous vapor, those skilled in the art can be according to flexible displays The packaging technology requirement of part is correspondingly selected, and will not be repeated here.
According to an embodiment of the invention, the oxidation prevention layer 700 that blocks water can also be further comprised with reference to figure 2, the flexible display device, The oxidation prevention layer 700 that blocks water is arranged on side of the encapsulated layer 600 away from flexible substrate 100.
According to an embodiment of the invention, the specific material of oxidation prevention layer 700 of blocking water is not particularly limited, as long as the material shape Into the oxidation prevention layer 700 that blocks water can effectively act as obstructing water blocking oxygen so as to strengthening packaging effect, art technology Personnel can be selected according to the requirement of the packaging technology of flexible display device.In some embodiments of the invention, block water oxygen Layer 700 can be the paper tinsel film of light tight metal, in this way, the oxygen barrier effect that can effectively block water, so as to improve the flexible display device Service life.In some specific examples, the oxidation prevention layer 700 that blocks water can be formed by copper or aluminium, in this way, not only can be effective Ground resistance water oxygen barrier effect will not also excessively increase the thickness of flexible display device so as to improve the service life of flexible display device Or weight, so as to the lightening design beneficial to the flexible display device.
In summary, according to an embodiment of the invention, the present invention proposes a kind of flexible display device, and its preparation method is Thin film transistor (TFT) array and Organic Light Emitting Diode are formed directly on color membrane substrates, the step of can saving to box simultaneously effectively improves Position accuracy between color membrane array and thin film transistor (TFT) array, so that the display resolution of the flexible display device is higher; Also, the protective layer newly formed on color membrane array can not only make the rough color membrane array surface of script become smooth and be beneficial to The making of thin film transistor (TFT) array, moreover it is possible to the influence that the color membrane structure that adequately protects makes from subsequent thin film transistor array, from And make the yields of the flexible display device higher.
In another aspect of the present invention, the present invention proposes a kind of method for preparing flexible display device.Reference picture 3~ 4, the preparation method of the present invention is described in detail.According to an embodiment of the invention, reference picture 3, this method include:
S100:In the side of flexible substrate, color membrane array is formed.
In this step, color membrane array 200 is formed in the side of flexible substrate 100, to obtain color membrane substrates.In this hair In some bright embodiments, the polyimides (PI) to form that a layer thickness is 5~20 microns can be coated with the glass substrate in advance Flexible substrate 100, in this way, the surfacing of the flexible substrate 100 obtained, and by the good glass substrate energy of supporting role Smooth each Rotating fields are obtained in subsequent manufacturing processes.According to an embodiment of the invention, the specific side of color membrane array 200 is formed Method is not particularly limited, and it is suitable that those skilled in the art can select according to the color 200 specific structure and material of membrane array Forming method, it will not be repeated here.
S200:In side of the color membrane array away from flexible substrate, protective layer is formed.
In this step, on the basis of the color membrane substrates that step S100 is obtained, in color membrane array 200 away from flexible substrate 100 side forms protective layer 300, in this way, protective layer 300 can make the color membrane array 200 of script surface irregularity become flat Integralization, and be advantageous to the making of subsequent thin film transistor array 400, and protective layer 300 can also adequately protect color membrane array 200 Structure will not be impacted in the manufacturing process of subsequent thin film transistor array 400, it is perfect so as to obtain functional performance Color membrane array 200, and then make the yields of making flexible display device higher.
According to an embodiment of the invention, the specific method for forming protective layer 300 is not particularly limited, as long as this method obtains Protective layer 300 can make color membrane array 200 surface flattening and the color membrane array 200 that can adequately protect is not influenceed i.e. by etching liquid Can, those skilled in the art can specifically concavo-convex degree and 300 specific material of protective layer be carried out according to the color surface of membrane array 200 Selection.In some embodiments of the invention, a thickness can be coated with color side of the membrane array 200 away from flexible substrate 100 Spend for the protective layer 300 of 1.5~20 microns of thick polyimides (PI), in this way, can be in color membrane array 200 away from flexible substrate 100 surface forms protective layer 300.
S300:In side of the protective layer away from flexible substrate, thin film transistor (TFT) array is formed.
In this step, continue, in side of the protective layer 300 away from flexible substrate 100, to form thin film transistor (TFT) array 400, in this way, the step of color membrane substrates often used in follow-up encapsulation process and array base palte are to box is eliminated, so as to more have Effect ground improves the position accuracy between color membrane array 200 and thin film transistor (TFT) array 400, and it is flexible aobvious to be advantageously implemented large scale Show the high-resolution of device.
According to an embodiment of the invention, the specific method for forming thin film transistor (TFT) array 400 is not particularly limited, as long as The making temperature of thin film transistor (TFT) array 400 is below 230 degrees Celsius of the upper limit temperature of heat tolerance of color membrane array 200, ability Field technique personnel can be selected according to 400 specific structure and material of thin film transistor (TFT) array, will not be repeated here.
S400:In side of the thin film transistor (TFT) array away from flexible substrate, Organic Light Emitting Diode is formed.
In this step, on the basis of the thin film transistor (TFT) array 400 that step S300 makes, in thin film transistor (TFT) battle array Side of the row 400 away from flexible substrate 100, Organic Light Emitting Diode 500 is formed, it is complete flexible aobvious to obtain functional structure Show device.
According to an embodiment of the invention, the specific method for forming Organic Light Emitting Diode 500 is not particularly limited, ability Field technique personnel can correspondingly be selected according to the concrete structure and material of Organic Light Emitting Diode 500.The one of the present invention In a little embodiments, layer of transparent first can be deposited or sputtered in side of the thin film transistor (TFT) array 400 away from flexible substrate 100 Cathode layer then evaporation one layer of white-light organic light-emitting layer, finally deposit or sputter one layer of reflective anode layer, in this way, can quickly, Efficiently obtain the self-illuminating structure for the bottom emitting for meeting white organic LED.
S500:In side of the Organic Light Emitting Diode away from flexible substrate, encapsulated layer is formed.
In this step, then encapsulated layer is formed in side of the Organic Light Emitting Diode 500 away from flexible substrate 100 600, in this way, color membrane array 200, thin film transistor (TFT) array 400 and Organic Light Emitting Diode 500 can be protected well, and seal The step of dress process is also eliminated to box, so as to improve the yields for making flexible display device.According to the implementation of the present invention Example, the specific method for forming encapsulated layer 600 are not particularly limited, and those skilled in the art can be specific according to encapsulated layer 600 Material and the specific packaging technology requirement of flexible display device are selected, and will not be repeated here.
In some embodiments of the invention, reference picture 4, the preparation method may further include:
S600:In side of the encapsulated layer away from flexible substrate, the oxidation prevention layer that blocks water is formed.
In this step, finally the oxidation prevention layer 700 that blocks water is formed, such as in side of the encapsulated layer 600 away from flexible substrate 100 This, can further improve the effect for the oxygen that blocks water, so that the sealing effectiveness of the flexible display is more preferably.According to the reality of the present invention Apply example, the specific method for forming the oxidation prevention layer 700 that blocks water is not particularly limited, and those skilled in the art can block water oxygen according to this 700 specific material of layer are selected.In some embodiments of the invention, can be in encapsulated layer 600 away from flexible substrate 100 Side, one layer of oxidation prevention layer 700 that blocks water formed by copper or aluminium is attached, in this way, the oxygen barrier effect that can effectively block water is soft so as to improve Property display device service life, will not also excessively increase the thickness or weight of flexible display device, so as to show beneficial to flexibility Show the lightening design of device.
In some embodiments of the invention, the flexible display device that step S600 makes can be shelled from glass substrate From getting off, i.e., flexible substrate 100 is separated with glass substrate, in this way, surfacing, flexible flexible display can be obtained Part, and the preparation method is easy, is continuously made on same glass substrate.
In summary, according to an embodiment of the invention, the present invention proposes a kind of preparation method, directly on color membrane substrates Thin film transistor (TFT) array and Organic Light Emitting Diode are continuously formed, the step of can saving the later stage to box simultaneously effectively improves color membrane array Position accuracy between thin film transistor (TFT) array, and the protective layer newly formed on color membrane array can not only make script concavo-convex not Flat color membrane array surface becomes smooth and beneficial to thin film transistor (TFT) array making, moreover it is possible to which the color membrane structure that adequately protects will not be by The influence that subsequent thin film transistor array makes, so as to prepare the Flexible Displays that display resolution is higher, yields is higher Device.
In the description of the invention, it is to be understood that term " " center ", " longitudinal direction ", " transverse direction ", " length ", " width ", " thickness ", " on ", " under ", "front", "rear", "left", "right", " vertical ", " level ", " top ", " bottom ", " interior ", " outer ", " up time The orientation or position relationship of the instruction such as pin ", " counterclockwise ", " axial direction ", " radial direction ", " circumference " be based on orientation shown in the drawings or Position relationship, it is for only for ease of and describes the present invention and simplify description, rather than indicates or imply that signified device or element must There must be specific orientation, with specific azimuth configuration and operation, therefore be not considered as limiting the invention.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " example ", " specifically show The description of example " or " some examples " etc. means specific features, structure, material or the spy for combining the embodiment or example description Point is contained at least one embodiment or example of the present invention.In this manual, to the schematic representation of above-mentioned term not Identical embodiment or example must be directed to.Moreover, specific features, structure, material or the feature of description can be with office Combined in an appropriate manner in one or more embodiments or example.In addition, in the case of not conflicting, the skill of this area Art personnel can be tied the different embodiments or example and the feature of different embodiments or example described in this specification Close and combine.
Although embodiments of the invention have been shown and described above, it is to be understood that above-described embodiment is example Property, it is impossible to limitation of the present invention is interpreted as, one of ordinary skill in the art within the scope of the invention can be to above-mentioned Embodiment is changed, changed, replacing and modification.

Claims (10)

  1. A kind of 1. flexible display device, it is characterised in that including:
    Flexible substrate;
    Color membrane array, the color membrane array are arranged on the side of the flexible substrate;
    Protective layer, the protective layer are arranged on the side of the color membrane array away from the flexible substrate;
    Thin film transistor (TFT) array, the thin film transistor (TFT) array are arranged on side of the protective layer away from the flexible substrate;
    Organic Light Emitting Diode, the Organic Light Emitting Diode are arranged on the thin film transistor (TFT) array away from the flexible substrate Side;And
    Encapsulated layer, the encapsulated layer are arranged on side of the Organic Light Emitting Diode away from the flexible substrate.
  2. 2. flexible display device according to claim 1, it is characterised in that the flexible substrate and the protective layer are can Jian Guang areas have more than 85% light transmittance.
  3. 3. flexible display device according to claim 1, it is characterised in that the protective layer is by polyimide material shape Into.
  4. 4. flexible display device according to claim 1, it is characterised in that the thickness of the protective layer is 1.5~20 micro- Rice.
  5. 5. flexible display device according to claim 1, it is characterised in that the thickness of the flexible substrate is 5~20 micro- Rice.
  6. 6. flexible display device according to claim 1, it is characterised in that further comprise:
    Block water oxidation prevention layer, and the oxidation prevention layer that blocks water is arranged on side of the encapsulated layer away from the flexible substrate.
  7. 7. flexible display device according to claim 6, it is characterised in that the oxidation prevention layer that blocks water is formed by copper or aluminium 's.
  8. A kind of 8. method for preparing flexible display device, it is characterised in that including:
    In the side of flexible substrate, color membrane array is formed;
    In the side of the color membrane array away from the flexible substrate, protective layer is formed;
    In side of the protective layer away from the flexible substrate, thin film transistor (TFT) array is formed;
    In side of the thin film transistor (TFT) array away from the flexible substrate, Organic Light Emitting Diode is formed;
    In side of the Organic Light Emitting Diode away from the flexible substrate, encapsulated layer is formed.
  9. 9. according to the method for claim 8, it is characterised in that the making temperature of the formation thin film transistor (TFT) array is all low In 230 degrees Celsius.
  10. 10. according to the method for claim 8, it is characterised in that further comprise:
    In side of the encapsulated layer away from the flexible substrate, the oxidation prevention layer that blocks water is formed.
CN201710731733.6A 2017-08-23 2017-08-23 Flexible display and preparation method thereof Withdrawn CN107564942A (en)

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Cited By (2)

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CN112382666A (en) * 2020-11-05 2021-02-19 中国科学院上海微系统与信息技术研究所 Flexible device and preparation method thereof
CN113840106A (en) * 2021-09-23 2021-12-24 浙江清华柔性电子技术研究院 Image forming apparatus and image forming method

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Application publication date: 20180109