CN107561861A

CN107561861A - Photosensitive resin composition and application thereof

Info

Publication number: CN107561861A
Application number: CN201710517879.0A
Authority: CN
Inventors: 吴侑儒; 谢柏源
Original assignee: Chi Mei Corp
Current assignee: Chi Mei Corp
Priority date: 2016-06-30
Filing date: 2017-06-29
Publication date: 2018-01-09
Also published as: TW201800499A

Abstract

The invention relates to a photosensitive resin composition and application thereof. A photosensitive resin composition comprises a pigment (A), a dye (B), an alkali-soluble resin (C), an ethylenically unsaturated group-containing compound (D), a photoinitiator (E), and a solvent (F). Wherein the ethylenically unsaturated group-containing compound (D) comprises a compound (D-1) having an alicyclic epoxy group and one ethylenically unsaturated group. The photosensitive resin composition can effectively improve the sputtering resistance of the color filter prepared subsequently by adding the compound (D-1) with the alicyclic epoxy group and the ethylene unsaturated group.

Description

Photosensitive resin composition and its application

Technical field

The present invention relates to a kind of photosensitive resin composition, more particularly to a kind of resistance to preferable colored filter of sputter Photosensitive resin composition and its colored filter and liquid crystal display device of formation.

Background technology

At present, colored filter has been widely used in colour liquid crystal display device, colour facsimile apparatus, colour camera etc. Field.As the market demand increasingly expands, the manufacturing technology of colored filter also tends to variation, developed at present decoration method, The manufacture methods such as print process, galvanoplastic and dispersion method, wherein using dispersion method as main flow processing procedure.

Dispersion method is that first coloring pigment is scattered in photoresist, then the photoresist is coated on into glass base On plate, through steps such as overexposure, imagings, you can specific pattern is made.It is repeated to operate three times, you can red (R), green is made (G) and the pixel shader layer of blue (B) pattern, optionally can apply diaphragm on the pattern of pixel shader layer afterwards.

Photoresist such as Japanese Unexamined Patent Publication 6-95211 publications and Unexamined Patent 8-183819 publications for dispersion method Those disclosed herein, such as the copolymer being polymerized using (methyl) acrylic acid by monomer component, the alkali as photoresist can Soluble resin.

However, in the manufacturing process of colored filter, multiple heat treatment step need to be undergone, such as red (R), green (G) And the pixel dyed layer pattern such as blue (B) formed after rear roasting (post-bake) step and nesa coating (ito film) formation Step etc., need to all be operated at a high temperature of more than 200 DEG C as the step 1, if but above-mentioned existing photoresist in 180 Heated 1 hour or so at DEG C, be then easy to produce the pigment agglutination particle (particle diameter of general pigment agglutination particle in its pixel shader layer Between 1 μm to 10 μm), and the heat resistance of the pixel shader layer is also bad.

To improve above mentioned problem, a kind of photosensitive resin composition is disclosed in Japanese Unexamined Patent Publication 2001-075273, it includes carboxylic The unsaturated monomer of acidic group and the aggregated obtained polymer of the monomer containing glycidyl, can using the alkali as photoresist Soluble resin.However, in the sputter forming process of subsequent clear conducting film, the photoresist group of foregoing prior art is utilized Into colored filter made from thing, but with resistance to sputter it is bad the problem of, especially pixel shader layer is bearing electronic strong beam Sputtering process after, easily cause colourity detraction the problems such as.

In view of this, a kind of photosensitive resin composition of exploitation is needed badly, to overcome the resistance to of existing photosensitive resin composition The problems such as sputter is bad, colourity detraction.

The content of the invention

The first object of the present invention is to provide a kind of photosensitive resin composition, bad to solve known resistance to sputter Problem.Photosensitive resin composition of the present invention, comprising：

Pigment (A)；

Dyestuff (B)；

Alkali soluble resin (C)；

The compound (D) of the unsaturated group containing ethene；

The compound (D) of the unsaturated group containing ethene is included with ester ring type epoxy radicals and ethene unsaturated group Compound (D-1).

Light initiator (E)；And

Solvent (F).

Photosensitive resin composition of the present invention, the chemical combination with ester ring type epoxy radicals and an ethene unsaturated group Thing (D-1) is any one compound represented by below formula D1 to chemical formula D 15：

【Chemical formula D 1】

【Chemical formula D 2】

【Chemical formula D 3】

【Chemical formula D 4】

【Chemical formula D 5】

【Chemical formula D 6】

【Chemical formula D 7】

【Chemical formula D 8】

【Chemical formula D 9】

【Chemical formula D 10】

【Chemical formula D 11】

【Chemical formula D 12】

【Chemical formula D 13】

【Chemical formula D 14】

【Chemical formula D 15】

Chemical formula D 1 is into chemical formula D 15, R^1dRepresent hydrogen atom or methyl；R^2d、R^4d、R^6dSeparately represent that hydrogen is former Son, the alkyl for being unsubstituted or being substituted；R^3dRepresent the alkyl for being unsubstituted or being substituted, the virtue for being unsubstituted or being substituted Base, or the acyl group for being unsubstituted or being substituted；R^5dRepresent the alkyl for being unsubstituted or being substituted, the virtue for being unsubstituted or being substituted Base；R^7dRepresent hydrogen atom or methyl；R^8dRepresent the divalent aliphatic hydrocarbon that carbon number is 1 to 6；X¹To X³Represent that singly-bound or divalence have Machine group.

Photosensitive resin composition of the present invention, the chemical combination with ester ring type epoxy radicals and an ethene unsaturated group Thing (D-1) is by any one compound in the compound represented by the chemical formula D 1 to the chemical formula D 3.

Photosensitive resin composition of the present invention, the smooth initiator (E) include the light with structure shown in chemical formula E1 and risen Beginning agent (E-1)

【Chemical formula E1】

In chemical formula E1, E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Hydrogen atom, carbon number are represented independently of one another as 1 to 20 Alkyl,COE₁₆、OE₁₇, halogen atom, NO₂OrOr

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈Warp is represented independently of one anotherSubstituted carbon number is 2 to 10 alkenyl；Or

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈Common representative-(CH independently of one another₂)_p-W- (CH₂)_q-；Or

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈It is common independently of one another to representA wherein at least E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈For

E₉、E₁₀、E₁₁And E₁₂Each independently represent hydrogen atom, carbon number as 1 to 20 alkyl, the carbon number for 1 to 20 alkane Base is to be unsubstituted or substitute through an at least group as follows, and an at least group be selected from phenyl, halogen atom, CN, OH, SH, alkoxy, (CO) OH or (CO) O (R that carbon number is 1 to 4₁), wherein R₁Carbon number is represented as 1 to 4 alkyl；Or

E₉、E₁₀、E₁₁And E₁₂The phenyl being unsubstituted is represented independently of one another or is substituted through an at least group as follows Phenyl, an at least group be selected from carbon number be 1 to 6 alkyl, halogen atom, CN, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₉、E₁₀、E₁₁And E₁₂Halogen atom, CN, OE are represented independently of one another₁₇、SE₁₈、SOE₁₈、SO₂E₁₈Or NE₁₉E₂₀, its Described in substituent OE₁₇、SE₁₈Or NE₁₉E₂₀It is without or via the group E₁₇、E₁₈、E₁₉And/or E₂₀With one of naphthalene nucleus Carbon atom forms five-membered ring or six membered ring；Or

E₉、E₁₀、E₁₁And E₁₂Represent independently of one anotherCOE₁₆Or NO₂；

W represents O, S, NE₂₆Or singly-bound, p represent 0 to 3 integer, q represents 1 to 3 integer, Z₁Represent CO or singly-bound；

E₁₃Carbon number is represented as 1 to 20 alkyl, the alkyl that the carbon number is 1 to 20 is unsubstituted or through as follows An at least group substitutes, wherein an at least group is selected from halogen atom, E₁₇、COOE₁₇、OE₁₇、SE₁₈、CONE₁₉E₂₀、 NE₁₉E₂₀、PO(OC_kH_2k+1)₂OrOr

E₁₃Carbon number is represented as 2 to 20 alkyl, the carbon number be 2 to 20 alkyl be mixed with have one or more O, S, SO, SO₂、NE₂₆Or CO；Or

E₁₃Carbon number is represented as 2 to 12 alkenyl, the carbon number be 2 to 12 alkenyl be without be mixed with or through be mixed with have one or Multiple O, CO or NE₂₆, wherein through being mixed with and alkyl that carbon number is 2 to 20 and carbon number without being mixed with or through being mixed with are 2 to 12 Alkenyl is to be unsubstituted or substitute through an at least halogen atom；Or

E₁₃Represent carbon number as 4 to 8 cycloalkenyl group, carbon number as 2 to 12 alkynyl or without being mixed with or being mixed with have one or more O, S, CO or NE₂₆Carbon number be 3 to 10 cycloalkyl；Or

E₁₃Phenyl or naphthyl is represented, and the phenyl or the naphthyl are respectively unsubstituted or through an at least base as follows Group's substitution, wherein an at least group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀、COE₁₆、CN、NO₂、 The haloalkyl that alkyl that halogen atom, carbon number are 1 to 20, carbon number are 1 to 4, being mixed with has one or more O, S, CO or NE₂₆And carbon Number is 2 to 20 alkyl；Or the phenyl or the naphthyl respectively substitute through the cycloalkyl that carbon number is 3 to 10 or respectively have one through being mixed with Or multiple O, S, CO or NE₂₆And the cycloalkyl that carbon number is 3 to 10 substitutes；

K represents 1 to 10 integer；

E₁₄Represent hydrogen atom, carbon number as 3 to 8 cycloalkyl, carbon number as 2 to 5 alkenyl, carbon number as 1 to 20 alkoxy Or the alkyl that carbon number is 1 to 20, it is unsubstituted or substituted through one or more groups as follows, and one or more Individual group is selected from halogen atom, phenyl, the alkyl phenyl or CN that carbon number is 1 to 20；Or

E₁₄Represent phenyl or naphthyl, it is respectively unsubstituted or substituted through an at least group as follows, and it is described at least One group is selected from the alkyl that carbon number is 1 to 6, the haloalkyl that carbon number is 1 to 4, halogen atom, CN, OE₁₇、SE₁₈And/or NE₁₉E₂₀；Or

E₁₄Represent carbon number as 3 to 20 heteroaryl, carbon number is 1 to 8 alkoxy, benzyloxy or phenoxy group, the benzyloxy Base and the phenoxy group are to be unsubstituted or substitute through an at least group as follows, and an at least group is selected from carbon number The haloalkyl and/or halogen atom for being 1 to 4 for 1 to 6 alkyl, carbon number；

E₁₅It is 6 to 20 aromatic radical or carbon number as 3 to 20 heteroaryl to represent carbon number, and it is respectively unsubstituted or through following institute Show an at least group substitution, and an at least group be selected from phenyl, halogen atom, carbon number be 1 to 4 haloalkyl, CN, NO₂、OE₁₇、SE₁₈、NE₁₉E₂₀、PO(OC_kH_2k+1)₂, be bonded with SO and alkyl and SO that carbon number is 1 to 10₂Bonding and carbon number are 1 Alkyl to 10, it is mixed with and has one or more O, S or NE₂₆And carbon number is 2 to 20 alkyl；Or its respectively through carbon number be 1 to 20 alkane Base substitutes, wherein the alkyl that the carbon number is 1 to 20 is to be unsubstituted or substitute through an at least group as follows, and it is described An at least group is selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 it is miscellaneous Heteroaryloxycarbonyl that aryloxycarbonyl that aryl, carbon number are 6 to 20, carbon number are 3 to 20, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Represent hydrogen atom, carbon number as 2 to 12 alkenyl, without being mixed with or being mixed with have one or more O, CO or NE₂₆And carbon Number is 3 to 8 cycloalkyl；Or

E₁₅Carbon number is represented as 1 to 20 alkyl, the alkyl that the carbon number is 1 to 20 is unsubstituted or through as follows An at least group substitutes, and an at least group is selected from halogen atom, OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, carbon number Heteroaryloxycarbonyl that the aryloxycarbonyl for being 6 to 20 for 3 to 20 heteroaryl, carbon number, carbon number are 3 to 20, NE₁₉E₂₀、 COOE₁₇、CONE₁₉E₂₀、PO(OC_kH_2k+1)2、Phenyl, wherein the carbon number Alkyl for 1 to 20 is substituted through phenyl, and alkyl that it is 1 to 20 through halogen atom, carbon number that the phenyl, which is, carbon number are 1 to 4 Haloalkyl, OE₁₇、SE₁₈Or NE₁₉E₂₀Substitution；Or

E₁₅Carbon number is represented as 2 to 20 alkyl, the carbon number be 2 to 20 alkyl be mixed with have one or more O, SO or SO₂, the alkyl through being mixed with and carbon number is 2 to 20 is to be unsubstituted or substitute through an at least group as follows, and institute State an at least group and be selected from halogen atom, OE₁₇、COOE₁₇、CONE₁₉E₂₀, phenyl or through OE₁₇、SE₁₈Or NE₁₉E₂₀Substituted benzene Base；Or

E₁₅Carbon number is represented as 2 to 20 alkanoyl or benzoyl, it is unsubstituted or through as follows at least one Group substitutes, and an at least group is selected from the alkyl, halogen atom, phenyl, OE that carbon number is 1 to 6₁₇、SE₁₈Or NE₁₉E₂₀； Or

E₁₅Representative is unsubstituted or through an at least OE₁₇Substituted naphthoyl or the heteroaryl carbonyl that carbon number is 3 to 14 Base；Or

E₁₅Carbon number is represented as 2 to 12 alkoxy carbonyl, the alkoxy carbonyl that the carbon number is 2 to 12 be without being mixed with or Be mixed with through an at least O, wherein through be mixed with or without be mixed with and carbon number be 2 to 12 alkoxy carbonyl be to be unsubstituted or through at least Monohydroxy substitutes；Or

E₁₅Phenyloxycarbonyl is represented, the phenyloxycarbonyl is to be unsubstituted or taken through an at least group as follows Generation, and an at least group be selected from haloalkyl, phenyl that alkyl, halogen atom, carbon number that carbon number is 1 to 6 are 1 to 4, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Represent CN, CONE₁₉E₂₀、NO₂, carbon number be 1 to 4 haloalkyl, S (O)_r-R₂And S (O)_rThe phenyl of bonding, Wherein described and S (O)_rThe phenyl of bonding be unsubstituted or through carbon number be 1 to 12 alkyl or SO₂-R₂Substitution, and R₂Represent Carbon number is 1 to 6 alkyl；Or

E₁₅Representative and SO₂Phenyl, diphenylphosphino or the two (R of O bondings₃)-phosphono, wherein described and SO₂O is bonded Phenyl be to be unsubstituted or substitute through the alkyl that carbon number is 1 to 12, and R₃Carbon number is represented as 1 to 4 alkoxy；

R represents 1 to 2 integer；

E'₁₄Represent to have and be directed to E₁₄One of in definition wherein；

E'₁₅Represent to have and be directed to E₁₅One of in definition wherein；

Z₂Represent O, S, SO or SO₂；

Z₃Represent O, CO, S or singly-bound；

E₁₆It is 6 to 20 aryl or carbon number as 3 to 20 heteroaryl to represent carbon number, and it is respectively unsubstituted or through as follows An at least group substitution, and an at least group be selected from phenyl, halogen atom, carbon number be 1 to 4 haloalkyl, CN, NO₂、OE₁₇、SE₁₈、NE₁₉E₂₀, be mixed with and have one or more O, S or NE₂₆And carbon number is 1 to 20 alkyl, or carbon number is 1 to 20 Alkyl, wherein the alkyl that the carbon number is 1 to 20 is to be unsubstituted or substitute through an at least group as follows, wherein institute State an at least group and be selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 Heteroaryloxycarbonyl that aryloxycarbonyl that heteroaryl, carbon number are 6 to 20, carbon number are 3 to 20, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₆Hydrogen atom or carbon number are represented as 1 to 20 alkyl, wherein the carbon number be 1 to 20 alkyl be unsubstituted or Substitute through an at least group as follows, and an at least group is selected from halogen atom, phenyl, OH, SH, CN, carbon number 3 Alkenyloxy group, OCH to 6₂CH₂CN、OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁), O (CO)-phenyl or (CO) OH or (CO) O (R₁)；Or

E₁₆Carbon number is represented as 2 to 12 alkyl, described 2 to 12 alkyl is to be mixed with to have one or more O, S or NE₂₆；Or

E₁₆Represent (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 12 alkenyl or carbon number be 3 to 8 Cycloalkyl, wherein R₄Carbon number is represented as 1 to 8 alkyl；Or

E₁₆Represent through SE₁₈Substituted phenyl, wherein E₁₈Representative is bonded to the COE₁₆The attached carbazole moiety The singly-bound of the phenyl or the naphthyl ring；

N represents 1 to 20 integer；

E₁₇Represent hydrogen atom, phenyl-R₅, carbon number be 1 to 20 alkyl, its be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from halogen atom, OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、 OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁)、O(CO)-(R₆), the phenyl, (CO) OH, (CO) O (R that are bonded with O (CO)₁), carbon number For 3 to 20 cycloalkyl, SO₂-(R₇)、O(R₇) or be mixed with through an at least O and cycloalkyl that carbon number is 3 to 20, wherein, R₅Represent Carbon number be 1 to 3 alkyl, R₆Carbon number is represented as 2 to 4 alkenyl, and R₇Carbon number is represented as 1 to 4 haloalkyl；Or

E₁₇Carbon number is represented as 2 to 20 alkyl, and the carbon number be 2 to 20 alkyl be mixed with have one or more O, S or NE₂₆；Or

E₁₇Represent (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 1 to 8 alkanoyl, carbon number be 2 to 12 The cycloalkyl that the enoyl- or carbon number that alkenyl, carbon number are 3 to 6 are 3 to 20, its be without be mixed with or be mixed with have one or more O, S, CO or NE₂₆；Or

E₁₇Represent carbon number and be bonded the group formed, and the base with carbon number as 3 to 10 cycloalkyl by 1 to 8 alkyl Group is without being mixed with or being mixed with through an at least O；Or

E₁₇Benzoyl is represented, the benzoyl is unsubstituted or substituted through an at least group as follows, and institute State the alkoxy that an at least group is 1 to 3 selected from alkyl, halogen atom, OH or the carbon number that carbon number is 1 to 6；Or

E₁₇Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through as follows at least one Group substitutes, and an at least group is selected from the alcoxyl that halogen atom, the alkyl that OH, carbon number are 1 to 12, carbon number are 1 to 12 Base, CN, NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, diphenyl-amino orWherein R₈Carbon number is represented as 1 to 3 alkoxy, and R₉Carbon number is represented as 1 to 12 alkyl；Or

E₁₇With withPhenyl or naphthyl ring one of them Carbon atom forms singly-bound；

E₁₈Represent hydrogen atom, carbon number as 2 to 12 cycloalkyl or phenyl-R as 3 to 20 of alkenyl, carbon number₅, wherein described The cycloalkyl and the phenyl-R that alkenyl that carbon number is 2 to 12, the carbon number are 3 to 20₅Be without be mixed with or be mixed with have one or Multiple O, S, CO, NE₂₆Or COOE₁₇；Or

E₁₈Carbon number is represented as 1 to 20 alkyl, the carbon number be 1 to 20 alkyl be unsubstituted or through following depicted extremely Few group substitution, and an at least group is selected from OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、OCH₂CH₂ (CO)O(R₁)、O(CO)-(R₆)、O(CO)-(R₁), O (CO)-phenyl or (CO) OE₁₇；Or

E₁₈Carbon number is represented as 2 to 20 alkyl, the carbon number be 2 to 20 alkyl be mixed with have one or more O, S, CO, NE₂₆Or COOE₁₇；Or

E₁₈Represent (CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 8 alkanoyl or carbon number be 3 to 6 Enoyl-；Or

E₁₈Benzoyl is represented, the benzoyl is to be unsubstituted or substitute through an at least group as follows, and It is 1 to 4 that an at least group, which is selected from the alkoxy that the alkyl that carbon number is 1 to 6, halogen atom, OH, carbon number are 1 to 4 or carbon number, Alkyl sulfenyl；Or

E₁₈Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, its be respectively be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from the alkyl halide that halogen atom, the alkyl that carbon number is 1 to 12, carbon number are 1 to 4 Base, the alkoxy that carbon number is 1 to 12, CN, NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, diphenyl amino, (CO) O (R₄)、(CO)-R₄、(CO)N(R₄)₂Or

E₁₉And E₂₀Represent independently of one another hydrogen atom, carbon number as 1 to 20 hydroxy alkyl, carbon as 2 to 4 of alkyl, carbon number Cycloalkyl that alkenyl that alkoxyalkyl that number is 2 to 10, carbon number are 2 to 5, carbon number are 3 to 20, phenyl-R₅, carbon number be 1 to 8 Alkanoyl, carbon number be 1 to 8 alkanoyl epoxide, carbon number be 3 to 12 enoyl-, SO₂-R₇Or benzoyl；Or

E₁₉And E₂₀Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through as follows An at least group substitutes, and it is 1 to 20 that an at least group, which is selected from halogen atom, the haloalkyl that carbon number is 1 to 4, carbon number, Alkoxy, carbon number be 1 to 12 alkyl, benzoyl or carbon number be 1 to 12 alkoxy；Or

E₁₉And E₂₀It is to be formed to have O, S or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or hexa-atomic Saturation or unsaturation ring, and described five yuan or hexa-atomic saturation or unsaturation ring are unsubstituted or through an at least base as follows Group's substitution, wherein an at least group is selected from the alkyl that carbon number is 1 to 20, the alkoxy that carbon number is 1 to 20 ,=O, OE₁₇、 SE₁₈、NE₂₁E₂₂、(CO)E₂₃、NO₂, halogen atom, carbon number be 1 to 4 haloalkyl, CN, phenyl,Or there are one or more O, S, CO or NE without being mixed with or being mixed with₁₇And carbon number is 3 to 20 ring Alkyl；Or

E₁₉And E₂₀It is that heteroaromatic ring system is formed together with attached nitrogen-atoms, the heteroaromatic ring system is It is unsubstituted or substitutes through an at least group as follows, and an at least group is selected from the alkyl, carbon that carbon number is 1 to 20 Alkoxy that haloalkyl that number is 1 to 4, carbon number are 1 to 20 ,=O, OE₁₇、SE₁₈、NE₂₁E₂₂、(CO)E₂₃、Halogen atom, NO₂, CN, phenyl, or without be mixed with or be mixed with have one or more O, S, CO or NE₁₇And carbon number is 3 to 20 cycloalkyl；

E₂₁And E₂₂Represent independently of one another hydrogen atom, carbon number as 1 to 20 haloalkyl, carbon as 1 to 4 of alkyl, carbon number Cycloalkyl or phenyl of the number for 3 to 10；

E₂₁And E₂₂Formed together with the nitrogen-atoms bonded with it has O, S or NE without being mixed with or being mixed with₂₆Five yuan or hexa-atomic Saturation or unsaturation ring, wherein described five yuan or hexa-atomic saturation or unsaturation ring are uncondensed or condensed with phenyl ring；

E₂₃Represent hydrogen atom, OH, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, be mixed with have an at least O, CO or NE₂₆And carbon number be 2 to 20 alkyl, without being mixed with or being mixed with have O, S, CO or NE₂₆And carbon number is 3 to 20 cycloalkyl； Or

E₂₃Represent phenyl, naphthyl, phenyl-R₁、OE₁₇、SE₁₈Or NE₂₁E₂₂；

E₂₄Represent (CO) OE₁₇、CONE₁₉E₂₀、(CO)E₁₇Or have and be directed to E₁₉And E₂₀One of in definition wherein；

E₂₅Represent COOE₁₇、CONE₁₉E₂₀、(CO)E₁₇；Or E₂₅With for E₁₇One of in definition wherein；

E₂₆Represent hydrogen atom, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, be mixed with and have an at least O or CO And carbon number is 2 to 20 alkyl；Or E₂₆Represent phenyl-R₁, without being mixed with or being mixed with through an at least O or CO and carbon number is 3 to 8 Cycloalkyl；Or E₂₆Represent (CO) E₁₉；Or E₂₆Represent phenyl, E₂₆It is to be unsubstituted or substitute through an at least group as follows, And an at least group is selected from the haloalkyl, OE that alkyl, halogen atom, carbon number that carbon number is 1 to 20 are 1 to 4₁₇、SE₁₈、 NE₁₉E₂₀OrBut condition has at least for the light initiator (E-1) of the structure as shown in chemical formula E1 One

Photosensitive resin composition of the present invention, the smooth initiator (E), which also includes, has structure shown in chemical formula (E2) Light initiator (E-2)

【Chemical formula E2】

In chemical formula E2, E₃₀Represent the organic group containing the cycloalkyl that carbon number is 3 to 20, E₃₁And E₃₂Independently of one another Represent alkyl or aryl, E₃₃Represent alkyl.

Photosensitive resin composition of the present invention, the alkali soluble resin (C) include the first alkali soluble resin (C-1), First alkali soluble resin (C-1) is as obtained by mixture carries out polymerisation, and the mixture is included with least The epoxide (c-1-1) of two epoxy radicals and the change with least one carboxylic acid group and at least one ethene unsaturated group Compound (c-1-2).

Photosensitive resin composition of the present invention, the epoxide (c-1-1) with least two epoxy radicals with Structure as shown in chemical formula C1 or chemical formula C2；

【Chemical formula C1】

【Chemical formula C2】

In chemical formula C1, R^1c、R^2c、R^3cAnd R^4cIt is 1 to 5 to represent hydrogen atom, halogen atom, carbon number independently of one another The aralkyl that the aromatic radical or carbon number that alkoxy that alkyl, carbon number are 1 to 5, carbon number are 6 to 12 are 6 to 12；

In chemical formula C2, R^5cTo R^18cIndependently of one another represent hydrogen atom, halogen atom, carbon number be 1 to 8 alkyl or Carbon number is 6 to 15 aromatic radical；And g represents 0 to 10 integer.

Photosensitive resin composition of the present invention, the usage amount summation based on the alkali soluble resin (C) are 100 weight Part, the usage amount scope of the pigment (A) is 30 parts by weight to 300 parts by weight；The usage amount scope of the dyestuff (B) is 5 weights Part is measured to 50 parts by weight；The usage amount scope of the compound (D) of the unsaturated group containing ethene is 110 parts by weight to 300 weights Measure part；The usage amount scope of the smooth initiator (E) is 20 parts by weight to 200 parts by weight；The usage amount scope of the solvent (F) For 500 parts by weight to 5000 parts by weight.

Photosensitive resin composition of the present invention, the usage amount summation based on the alkali soluble resin (C) are 100 weight Part, the usage amount scope of first alkali soluble resin (C-1) is 0 parts by weight to 90 parts by weight.

Photosensitive resin composition of the present invention, the usage amount summation based on the alkali soluble resin (C) are 100 weight Part, the usage amount scope of the compound (D-1) with ester ring type epoxy radicals and an ethene unsaturated group is 10 weight Part to 100 parts by weight.

Photosensitive resin composition of the present invention, the usage amount summation based on the alkali soluble resin (C) are 100 weight Part, the usage amount scope of the smooth initiator (E-1) is 10 parts by weight to 50 parts by weight.

Photosensitive resin composition of the present invention, the usage amount summation based on the alkali soluble resin (C) are 100 weight Part, the usage amount scope of the smooth initiator (E-2) is 10 parts by weight to 50 parts by weight.

The second object of the present invention is to provide a kind of manufacture method of colored filter.

The manufacture method of colored filter of the present invention, is comprised the steps of：By photosensitive resin composition as described above Form pixel layer.

The third object of the present invention is to provide a kind of colored filter.

Colored filter of the present invention is as obtained by the manufacture method of colored filter as described above.

The fourth object of the present invention is to provide a kind of liquid crystal display device.

Liquid crystal display device of the present invention includes colored filter as described above.

The beneficial effects of the present invention are：The photosensitive resin composition described in addition by having ester ring type epoxy radicals And the compound (D-1) of an ethene unsaturated group, it can effectively lift the colorized optical filtering as made from photosensitive resin composition The resistance to sputter of piece.

Embodiment

Present invention will be illustrated in detail below：

It is described herein to be, as described below " and/or " or " and/or " be herein defined as representing not only to may be present to be defined One of substituent, and may be present it is altogether some defined in substituents, i.e., the mixing of different substitutes (substituent) Thing.

As described below " at least " be define it is one or more, such as one or both or three, preferable one or Both.

In the present invention, unless the context otherwise requires, otherwise word " including (comprise) " or variant (for example, " comprises " or " comprising ") it is interpreted as inferring including the integer or step or integer group or step group, But it is not precluded from other any integers or step or integer group or step group.Described " (methyl) acrylate " is herein In be intended to refer to acrylate and corresponding methacrylate.

Preferably is intended to refer to all technical scheme classifications shown in the word for the compounds of this invention herein, also pointer To the technical scheme of composition, purposes, method, colored filter etc..

《Photosensitive resin composition》

The pigment (A) is such as, but not limited to the combination of inorganic pigment, organic pigment or both.

Above-mentioned inorganic pigment is such as, but not limited to the metallic compounds such as metal oxide, metal mistake salt；It is preferred that the nothing Machine pigment can be selected from the oxide of the metals such as iron, cobalt, aluminium, cadmium, lead, copper, titanium, magnesium, chromium, zinc, antimony, the composite oxygen of aforementioned metal Compound and metal mistake salt.

In the present invention concrete example, above-mentioned organic pigment selected from C.I. pigment yellows 1,3,11,12,13,14,15,16, 17、20、24、31、53、55、60、61、65、71、73、74、81、83、93、95、97、98、99、100、101、104、106、108、 109、110、113、114、116、117、119、120、126、127、128、129、138、139、150、151、152、153、154、 155、156、166、167、168、175；C.I. pigment orange l, 5,13,14,16,17,24,34,36,38,40,43,46,49,51, 61、63、64、71、73；C.I. paratonere l, 2,3,4,5,6,7,8,9,10,11,12,14,15,16,17,18,19,21,22, 23、30、31、32、37、38、40、41、42、48：l、48：2、48：3、48：4、49：l、49：2、50：1、52：l、53：l、57、 57：l、57：2、58：2、58：4、60：l、63：l、63：2、64：l、81：l、83、88、90：l、97、101、102、104、105、 106、108、112、113、114、122、123、144、146、149、150、151、155、166、168、170、171、172、174、 175、176、177、178、179、180、185、187、188、190、193、194、202、206、207、208、209、215、216、 220、224、226、242、243、245、254、255、264、265；C.I. pigment violet l, 14,19,23,29,32,33,36,37, 38、39、40、50；C.I. alizarol saphirol l, 2,15,15：1、15：2、15：3、15：4、15：5、15：6、16、21、22、60、61、64、 66；C.I. pigment Green 7,36,37,42,58；C.I. pigment brown 23,25,28；And C.I. pigment blacks l, 7.Above-mentioned organic pigment Can the individually a kind of or a variety of uses of mixing.

In embodiment, the average grain diameter of the pigment (A) is preferably 10nm to 200nm, more preferably 20nm to 150nm, More preferably 30nm to 130nm again.

In the concrete example of the present invention, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, the face The usage amount scope for expecting (A) is 30 parts by weight to 300 parts by weight；Preferably 40 parts by weight are to 250 parts by weight；More preferably 50 weight Part to 200 parts by weight.

When if necessary, the pigment (A) also can optionally use dispersant, such as, but not limited to：Cation system, the moon The interfacial agent of ionization series, nonionic system, both sexes, polysiloxane series, fluorine system etc..

Foregoing interfacial agent be such as, but not limited to PEO lauryl ether, PEO stearoyl ether, The polyethylene oxide alkyl ethers class of PEO oil ether etc.；PEO octyl group phenylate, PEO nonyl phenylate etc. PEO alkylbenzene ethers interfacial agent；Polyethylene glycol dilaurate, polyglycol distearate etc. gather The esters interfacial agent of ethylene glycol two；Sorbitan fatty acid ester class interfacial agent；The polyesters interface of aliphatic acid modification Activating agent；The polyurethanes interfacial agent of tertiary amine modification；The model KP of SHIN-ETSU HANTOTAI's chemical industry manufacture commodity, The model SF-8427 of Toray Dow Corning Silicon manufactures commodity, the type of common prosperity society oil chemical industry manufacture Number for Polyflow commodity, get Ke Mu companies (Tochem Products Co., Ltd.) manufacture model F-Top business The production of the product for the model Megafac that product, big Japanese ink chemical industry manufacture, the model Fluorad of Sumitomo 3M manufactures Model Asahi Guard and Surflon that product, Asahi Glass manufacture commodity.Above-mentioned interfacial agent can be individually a kind of or mixed Close a variety of uses.

Dyestuff (B) collocation pigment (A) uses, and has usual skill in the technical field of the invention and may be selected The dyestuff (B) of special spectrum.The dyestuff (B) is such as, but not limited to azo dyes, azo metal misfit thing dyestuff, anthraquinone dye Material, bipseudoindoxyl dye, thioindigo color, phthalocyanine dye, diphenylmethane dyes, kiton colors, xanthene dye, thiazine dye, sun Ionic dye, cyanine dyes, nitro dye, quinoline dye, naphthoquinone dyestuff, oxazine dyes etc..

In embodiment, the dyestuff (B) selected from C.I. solvent reds 2, C.I. solvent red 24s, C.I. solvent reds 27, C.I. solvent red 49, C.I. solvent reds 52, C.I. solvent reds 57, C.I. solvent red 8s 9, C.I. solvent reds 111, C.I. solvent reds 114th, C.I. solvent reds 119, C.I. solvent reds 124, C.I. solvent of red 135, C.I. solvent reds 136, C.I. solvent reds 137, C.I. solvent red 138, C.I. solvent reds 139, C.I. solvent reds 143, C.I. solvent reds 144, C.I. solvent reds 145, C.I. are molten Agent is red 146, C.I. solvent reds 147, C.I. solvent reds 148, C.I. solvent reds 149, C.I. solvent reds 150, C.I. solvent reds 151st, C.I. solvent reds 152, C.I. solvent reds 155, C.I. solvent reds 156, C.I. solvent reds 162, C.I. solvent reds 168, C.I. solvent red 169, C.I. solvent reds 170, C.I. solvent reds 171, C.I. solvent reds 172, C.I. solvent reds 177, C.I. are molten Agent is red 178, C.I. solvent reds 179, C.I. solvent reds 181, C.I. solvent reds 190, C.I. solvent reds 191, C.I. solvent reds 194th, C.I. solvent reds 199, C.I. solvent reds 200, C.I. solvent reds 201, C.I. solvent reds 299, C.I. directly red 2, C.I. Directly red 81, C.I. azogeramines, C.I. azogeramines 4, C.I. acid reds 27, C.I. acid reds 52, C.I. acid red 87s, C.I. Acid red 88, C.I. acid reds 289, C.I. alkali red 1:1s, C.I. medium reds 3, C.I. ice dyeings are red 21, C.I. vat reds 1, C.I. Vat red 2, C.I. vat reds 15, C.I. vat reds 23, C.I. vat reds 41, C.I. vat reds 47, C.I. Red-1 200s, C.I. Dispersion red 11, C.I. Red-1 200s 5, C.I. disperse reds 22, C.I. disperse red 60s, C.I. disperse reds 92, C.I. Red-1 200s 46, C.I. disperse red 191, C.I. disperse reds 283, C.I. disperse reds 288, C.I. active reds 12.Above-mentioned dyestuff can be according to required property list The solely a kind of or a variety of uses of mixing.

In the concrete example of the present invention, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, the dye The usage amount scope for expecting (B) is 5 parts by weight to 50 parts by weight；Preferably 10 parts by weight are to 45 parts by weight；More preferably 15 parts by weight To 40 parts by weight.

《First alkali soluble resin (C-1)》

It is preferred that the alkali soluble resin (C) includes the first alkali soluble resin (C-1), first alkali-soluble For resin (C-1) as obtained by mixture carries out polymerisation, the mixture contains the epoxidation with least two epoxy radicals Compound (c-1-1), and the compound (c-1-2) with least one carboxylic acid group and at least one ethene unsaturated group.It is above-mentioned Mixture is also selectively included at least one of compound carboxylic acid anhydride (c-1-3) and the compound (c-1-4) containing epoxy radicals.

It is preferred that the epoxide (c-1-1) with least two epoxy radicals is with such as chemical formula C1 or chemistry Structure shown in formula C2.The narration of " epoxide (c-1-1) can have the structure as shown in chemical formula C1 or chemical formula C2 " It also contemplated the compound with the structure as shown in chemical formula C1 and the compound with the structure as shown in chemical formula C2 be same When exist and as epoxide (c-1-1) situation.

Specifically, the epoxide (c-1-1) with least two epoxy radicals is, for example, with such as chemical formula Structure shown in C1：

【Chemical formula C1】

In chemical formula C1, R^1c、R^2c、R^3cAnd R^4cIt is 1 to 5 to represent hydrogen atom, halogen atom, carbon number independently of one another The aralkyl that the aromatic radical or carbon number that alkoxy that alkyl, carbon number are 1 to 5, carbon number are 6 to 12 are 6 to 12.

The aforementioned Chemistry Figure C1 epoxide (c-1-1) with least two epoxy radicals may include by bisphenol fluorene type Compound (bisphenol fluorene) and the bis-phenol containing epoxy radicals obtained by halogenated epoxy propane (epihalohydrin) reaction Fluorenes type compound, but it is not limited to this.

As the concrete example of above-mentioned bisphenol fluorene type compound, it is such as, but not limited to：Double (4- hydroxy phenyls) fluorenes [9,9- of 9,9- Bis (4-hydroxy phenyl) fluorene], double (the 4- hydroxy-3-methyls phenyl) fluorenes [9,9-bis (4-hydroxy- of 9,9- 3-methylphenyl) fluorene], double (4- hydroxyl -3- chlorphenyls) fluorenes [9,9-bis (4-hydroxy-3- of 9,9- Chlorophenyl) fluorene], double (4- hydroxyl -3- bromophenyls) fluorenes [9,9-bis (4-hydroxy-3- of 9,9- Bromophenyl) fluorene], double (4- hydroxyl -3- fluorophenyls) fluorenes [9,9-bis (4-hydroxy-3- of 9,9- Fluorophenyl) fluorene], double (the 4- hydroxy 3-methoxybenzenes base) fluorenes [9,9-bis (4-hydroxy-3- of 9,9- Methoxyphenyl) fluorene], double (4- hydroxyl -3,5- 3,5-dimethylphenyls) fluorenes of 9,9- [9,9-bis (4-hydroxy-3, 5-dimethylphenyl) fluorene], double (4- hydroxyl -3,5- dichlorophenyls) fluorenes of 9,9- [9,9-bis (4-hydroxy-3, 5-dichlorophenyl) fluorene], double (4- hydroxyl -3,5- dibromo phenyls) fluorenes of 9,9- [9,9-bis (4-hydroxy-3, 5-dibromophenyl) fluorene] etc. compound.

Above-mentioned halogenated epoxy propane (epihalohydrin) is such as, but not limited to epichlorohydrin Or bromo- 1,2 epoxy prapanes of 3- (epibromohydrin) etc. (epichlorohydrin).

The above-mentioned bisphenol fluorene type compound containing epoxy radicals that gained is reacted by bisphenol fluorene type compound and halogenated epoxy propane Including but not limited to：(1) commodity manufactured by Nippon Steel chemical (Nippon Steel Chemical Co., Ltd)：Such as ESF-300 etc.；(2) commodity manufactured by Osaka gas (Osaka Gas Co., Ltd)：Such as PG-100, EG-210 etc.；(3) Commodity manufactured by short message science and technology (S.M.S Technology Co., Ltd)：Such as SMS-F9PhPG, SMS-F9CrG, SMS- F914PG etc..

It is preferred that the epoxide (c-1-1) with least two epoxy radicals also can be with such as chemical formula C2 institutes The structure shown：

【Chemical formula C2】

The aforementioned Chemistry Figure C2 epoxide (c-1-1) with least two epoxy radicals is, for example, by alkali metal In the presence of hydroxide, make that there is the compound of following formula chemical formula C2-1 structures to be reacted and be obtained with halogenated epoxy propane.

【Chemical formula C2-1】

In chemical formula C2-1, R^5cTo R^18cAnd g definition be respectively with the R in chemical formula C2^5cTo R^18cAnd g Define identical, do not repeat separately herein.

The aforementioned Chemistry Figure C2 epoxide (c-1-1) with least two epoxy radicals is, for example, to be deposited in acid catalyst Under, after condensation reaction is carried out with such as compound of below formula C2-2 structures and phenols (phenols), tool is formed There is the compound of chemical formula C2-1 structures.Then, de-hydrogen halide is carried out by adding excessive halogenated epoxy propane (dehydrohalogenation) epoxide (c- with least two epoxy radicals as shown in chemical formula C2, is obtained 1-1)。

【Chemical formula C2-2】

In chemical formula C2-2, R^19cWith R^20cHydrogen atom, halogen atom, the alkyl that carbon number is 1 to 8 are represented independently of one another Or the aromatic radical that carbon number is 6 to 15；T¹And T²Represent alkyl that halogen atom, carbon number are 1 to 6 independently of one another or carbon number be 1 to 6 alkoxy.It is preferred that the halogen atom is, for example, chlorine or bromine, the alkyl is, for example, methyl, ethyl or the tert-butyl group, institute It is, for example, methoxy or ethoxy to state alkoxy.

Above-mentioned phenols is such as, but not limited to：Phenol (phenol), cresols (cresol), diethylstilbestrol (ethylphenol), n- third Phenol (n-propylphenol), isobutyl phenol (isobutylphenol), t- fourths phenol (t-butylphenol), octyl phenol (octylphenol), nonyl phenol (nonylphenol), stubble phenol (xylenol), methyl butyl phenol (methylbutylphenol), di-tert-butylphenol (di-t-butylphenol), phenol ethylene (vinylphenol), propylene benzene Phenol (propenylphenol), acetylene phenol (ethinylphenol), the phenol of ring penta (cyclopentylphenol), cyclohexyl Phenol (cyclohexylphenol) or cyclohexyl cresols (cyclohexylcresol) etc..Above-mentioned phenols can individually a kind of or mixing A variety of uses.

In the concrete example of the present invention, the usage amount based on the above-mentioned compound with chemical formula C2-2 structures is 1 mole, The usage amount scope of the phenols is 0.5 mole to 20 moles, preferably 2 moles to 15 moles.

Above-mentioned acid catalyst is such as, but not limited to：Hydrochloric acid, sulfuric acid, p-methyl benzenesulfonic acid (p-toluenesulfonic Acid), oxalic acid (oxalic acid), boron trifluoride (boron trifluoride), anhydrous Aluminum chloride (anhydrous Aluminium chloride), zinc chloride (zinc chloride) etc., wherein preferable with p-methyl benzenesulfonic acid, sulfuric acid or hydrochloric acid. Above-mentioned acid catalyst can the individually a kind of or a variety of uses of mixing.

Though the usage amount of above-mentioned acid catalyst is not particularly limited, based on the above-mentioned compound with chemical formula C2-2 structures Usage amount be 100wt%, the usage amount scope of acid catalyst is preferably 0.1wt% to 30wt%.

Above-mentioned condensation reaction can be solvent-free or carry out in the presence of an organic.Above-mentioned organic solvent is for example but unlimited In：Toluene (toluene), dimethylbenzene (xylene) or methyl iso-butyl ketone (MIBK) (methyl isobutyl ketone) etc..It is above-mentioned Organic solvent can the individually a kind of or a variety of uses of mixing.

In the concrete example of the present invention, it is based on the compound with chemical formula C2-2 structures and the usage amount summation of phenols 100wt%, the usage amount scope of above-mentioned organic solvent is 50wt% to 300wt%, preferably 100wt% to 250wt%.It is above-mentioned The operation temperature of condensation reaction is 40 DEG C to 180 DEG C, and the operating time is 1 hour to 8 hours.

After above-mentioned condensation reaction is completed, neutralisation treatment or washing process can be carried out.Above-mentioned neutralisation treatment is by after reaction The pH value of solution be adjusted to 3 to 7, preferably 5 to 7.Nertralizer can be used in above-mentioned washing process, and the nertralizer is basic species Matter, such as, but not limited to：The alkali such as sodium hydroxide (sodium hydroxide), potassium hydroxide (potassium hydroxide) Metal hydroxides；The alkaline earths such as calcium hydroxide (calcium hydroxide), magnesium hydroxide (magnesium hydroxide) Metalloid hydroxide；Two sub- second triamines (diethylene triamine), tetramine (triethylene Tetramine), the organic amine such as aniline (aniline), phenylenediamine (phenylene diamine)；And ammonia (ammonia), phosphorus Acid dihydride sodium (sodium dihydrogen phosphate) etc..Above-mentioned washing process can use well-known process to carry out, for example, In solution after the reaction, the aqueous solution containing nertralizer is added, extraction is repeated.Neutralized processing or washing process Afterwards, handled through heating under reduced pressure, unreacted phenols and solvent are given into distillation, and concentrated, you can acquisition has chemical formula The compound of C2-1 structures.

Above-mentioned halogenated epoxy propane is such as, but not limited to such as：Epichlorohydrin (3-chloro-1,2- Epoxypropane), the bromo- 1,2 epoxy prapanes of 3- (3-bromo-1,2-epoxypropane) or combinations of the above.Carry out Before above-mentioned de-hydrogen halide, it can in advance add or the alkali metal hydrogen-oxygens such as sodium hydroxide, potassium hydroxide are added in course of reaction Compound.The operation temperature of above-mentioned de-hydrogen halide is 20 DEG C to 120 DEG C, and operating time scope is 1 hour to 10 hours.

Its aqueous solution can also be used in the alkali metal hydroxide added in above-mentioned de-hydrogen halide.In this concrete example In, can be in decompression or normal while above-mentioned alkali metal hydroxide aqueous solution is continuously added in de-hydrogen halide system Pressure, continuous still water outlet and halogenated epoxy propane, separate and remove water, while can continuously return halogenated epoxy propane whereby It flow in reaction system.

Before above-mentioned de-hydrogen halide is carried out, tetramethyl-ammonium chloride (tetramethyl ammonium can be also added Chloride), tetramethylammonium bromide (tetramethyl ammonium bromide), trimethyl benzyl ammonia chloride (trimethyl Benzyl ammonium chloride) etc. quaternary ammonium salt as catalyst, and at 50 DEG C to 150 DEG C, react 1 hour to 5 Hour, alkali metal hydroxide or its aqueous solution are added, at a temperature of 20 DEG C to 120 DEG C, makes its reaction 1 hour to 10 small When, to carry out de-hydrogen halide.

In the concrete example of the present invention, it is based on the hydroxyl total yield in the above-mentioned compound with chemical formula C2-1 structures 1 equivalent, the usage amount of above-mentioned halogenated epoxy propane can be 1 equivalent to 20 equivalents, preferably 2 equivalents to 10 equivalents.Based on above-mentioned Hydroxyl total yield in compound with chemical formula C2-1 structures is 1 equivalent, the alkali gold added in above-mentioned de-hydrogen halide The usage amount of category hydroxide can be 0.8 equivalent to 15 equivalents, preferably 0.9 equivalent to 11 equivalents.

In order that above-mentioned de-hydrogen halide is smoothed out, except the alcohols such as methanol, ethanol can be added, diformazan can be also added The polarity of the aprotics (aprotic) such as sulfone (dimethyl sulfone), dimethyl sulfoxide (dimethyl sulfoxide) is molten Agent etc. is reacted.In the case of using alcohols, the total amount based on above-mentioned halogenated epoxy propane is 100wt%, alcohols Usage amount can be 2wt% to 20wt%, preferably 4wt% to 15wt%.In the example using the polar solvent of aprotic, Total amount based on halogenated epoxy propane is 100wt%, and the usage amount of the polar solvent of aprotic can be 5wt% to 100wt%, Preferably 10wt% to 90wt%.

After de-hydrogen halide is completed, washing process is optionally carried out.Afterwards, removed using the mode of heating decompression Remove polar solvent of halogenated epoxy propane, alcohols and aprotic etc..Above-mentioned heating decompression be, for example, in temperature be 110 DEG C extremely 250 DEG C, and pressure is to be carried out under the environment of 1.3kPa (10mmHg) below.

In order to avoid the epoxy resin of formation contains hydrolyzable halogen, the solution after de-hydrogen halide can be added Toluene, methyl iso-butyl ketone (MIBK) (methyl isobutyl ketone) equal solvent, and add the alkali such as sodium hydroxide, potassium hydroxide gold Belong to hydroxide aqueous solution, carry out de-hydrogen halide again.In de-hydrogen halide, there is chemical formula C2-1 based on above-mentioned Hydroxyl total yield in the compound of structure is 1 equivalent, and the usage amount of alkali metal hydroxide is 0.01 equivalent to 0.3 equivalent, Preferably 0.05 equivalent is to 0.2 equivalent.The operating temperature range of above-mentioned de-hydrogen halide is 50 DEG C to 120 DEG C, the operating time Scope is 0.5 hour to 2 hours.

After de-hydrogen halide is completed, salt is removed by the step such as filtering and washing.Heating decompression can also be used Mode, toluene, methyl iso-butyl ketone (MIBK) equal solvent are given into distillation, and can obtain has at least two rings as shown in chemical formula C2 The epoxide (c-1-1) of epoxide.Above-mentioned chemical formula C2 epoxide (c-1-1) example with least two epoxy radicals Such as but it is not limited to the Japanese chemical drug of trade name NC-3000, NC-3000H, NC-3000S and NC-3000P (Nippon Kayaku Co.Ltd. the commodity manufactured by).

The foregoing compound (c-1-2) with least one carboxylic acid group and at least one ethene unsaturated group is selected from In the group being made up of following (1) to (3)：(1) acrylic acid, methacrylic acid, 2- methylacryoyloxyethyl succinic acid (2-methacryloyloxyethylbutanedioic acid), 2- methacryl oxygen-butyls succinic acid, 2- metering systems Acyloxyethyl adipic acid, 2- methacryl oxygen-butyls adipic acid, 2- methylacryoyloxyethyls hexahydrophthalic acid, 2- first Base acrylyl oxy-ethyl maleic acid, 2- methacryloxypropyls maleic acid, 2- methacryl oxygen-butyls maleic acid, 2- methyl Acryloxypropyl succinic acid, 2- methacryloxypropyls adipic acid, 2- methacryloxypropyls tetrahydrophthalic acid, 2- methacryloxypropyls phthalic acid, 2- methacryl oxygen-butyl phthalic acids or 2- methacryloxypropyl fourths Base hydrogen phthalic acid；(2) compounds as obtained by (methyl) acrylate of hydroxyl with dicarboxylic acid compound's reaction, Wherein dicarboxylic acid compound is including but not limited to adipic acid, succinic acid, maleic acid, phthalic acid；And (3) is by hydroxyl (methyl) acrylate and compound carboxylic acid anhydride reaction obtained by half ester compound, wherein hydroxyl (methyl) acrylate Such as, but not limited to 2- hydroxyethylmethacry,ates [(2-hydroxyethyl) acrylate], 2- hydroxy ethyl methyl acrylic acid Ester [(2-hydroxyethyl) methacrylate], 2- acrylates [(2-hydroxypropyl) Acrylate], 2- hydroxy propyl methacrylates [(2-hydroxypropyl) methacrylate], 4- hydroxybutyls third Olefin(e) acid ester [(4-hydroxybutyl) acrylate], 4- hydroxybutyl methacrylates [(4-hydroxybutyl) Methacrylate] or pentaerythritol acrylate trimethyl etc..Compound carboxylic acid anhydride described herein can be with following first alkali Compound carboxylic acid anhydride (c-1-3) contained by the mixture of soluble resin (C-1) is identical, therefore is repeated no more in this.

The mixture of above-mentioned first alkali soluble resin (C-1) is more selectively included compound carboxylic acid anhydride (c-1-3) And at least one of compound (c-1-4) containing epoxy radicals.Above-mentioned compound carboxylic acid anhydride (c-1-3) may be selected from by following (1) extremely (2) group formed：(1) succinic anhydrides (butanedioic anhydride), maleic anhydride (maleic Anhydride), itaconic anhydride (Itaconic anhydride), phthalic anhydride (phthalic anhydride), tetrahydrochysene Phthalic anhydride (tetrahydrophthalic anhydride), hexahydrophthalic anhydride (hexahydrophthalic Anhydride), methyl tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methylendomethylene tetrahydrochysene O-phthalic Acid anhydrides (methyl endo-methylene tetrahydro phthalic anhydride), chlorendic anhydride (chlorendic Anhydride), glutaric anhydride or inclined three benzoyl oxides (1,3-dioxoisobenzofuran-5-carboxylic The dicarboxylic acid anhydride compound such as anhydride)；And (2) benzophenone tetracarboxylic dianhydrides (benzophenone Tetracarboxylic dianhydride, abbreviation BTDA), the quaternary such as double PMDAs or double phenylate tetracarboxylic acid dianhydrides Compound carboxylic acid anhydride.

The above-mentioned compound (c-1-4) containing epoxy radicals is selected from GMA, 3,4- epoxycyclohexyls Methyl (methyl) acrylate, the glycidyl ether compound containing unsaturated group, the unsaturated compound containing epoxy radicals or above-mentioned The group that is formed of combination.The foregoing glycidyl ether compound containing unsaturated group is such as, but not limited to trade name Denacol EX-111、EX-121Denacol、Denacol EX-141、Denacol EX-145、Denacol EX-146、Denacol EX- 171st, Denacol EX-192 etc. compound (being above the commodity of Chang Lai chemical conversion industries Co., Ltd.).

Foregoing first alkali soluble resin (C-1) can be by the chemical formula C1 epoxide with least two epoxy radicals (c-1-1) with the compound (c-1-2) with least one carboxylic acid group and at least one ethene unsaturated group polymerize instead Should, the reaction product of hydroxyl is formed, then, then is added obtained by compound carboxylic acid anhydride (c-1-3) reacted.Based on above-mentioned The hydroxyl total yield of the reaction product of hydroxyl is 1 equivalent, the equivalent of the anhydride group contained by compound carboxylic acid anhydride (c-1-3) compared with Good is 0.4 equivalent to 1 equivalent, more preferably 0.75 equivalent to 1 equivalent., can be in when using multiple compound carboxylic acid anhydrides (c-1-3) Sequentially add or add simultaneously in reaction.When using dicarboxylic acid anhydride compound and quaternary compound carboxylic acid anhydride as carboxylic acid anhydridization During compound (c-1-3), the molar ratio of dicarboxylic acid anhydride compound and quaternary compound carboxylic acid anhydride are preferably 1/99 to 90/10, More preferably 5/95 to 80/20.In addition, the operating temperature range of above-mentioned reaction is, for example, the scope at 50 DEG C to 130 DEG C.

Foregoing first alkali soluble resin (C-1) can be by the chemical formula C2 epoxide with least two epoxy radicals (c-1-1) reacted with the compound (c-1-2) with least one carboxylic acid group and at least one ethene unsaturated group, shape Into the reaction product of hydroxyl, then, then by adding compound carboxylic acid anhydride (c-1-3) and/or compound (c- containing epoxy radicals 1-4) carry out obtained by polymerisation.Having on the epoxide (c-1-1) of at least two epoxy radicals based on chemical formula C2 Epoxy radicals total yield be 1 equivalent, the above-mentioned compound with least one carboxylic acid group and at least one ethene unsaturated group (c-1-2) acid value equivalent is preferably 0.8 equivalent to 1.5 equivalents, more preferably 0.9 equivalent to 1.1 equivalents.Based on above-mentioned hydroxyl The hydroxyl total amount of reaction product be 100 molar percentages (mole %), the usage amount of compound carboxylic acid anhydride (c-1-3) is preferably 10 moles of % to 100 moles of %, more preferably 20 moles of % to 100 moles of %, particularly good is 30 moles of % to 100 moles of %.

When preparing above-mentioned first alkali soluble resin (C-1), in order to accelerate to react, it will usually added in reaction solution Alkali compounds is as catalysts.Above-mentioned catalysts can be used alone or as a mixture, and above-mentioned catalysts include But it is not limited to：Triphenylphosphine (triphenyl phosphine), antimony triphenyl (triphenyl stibine), triethylamine (triethylamine), triethanolamine (triethanolamine), tetramethyl ammonium chloride (tetramethyl ammonium Chloride), benzyltriethylammonium chloride (benzyltriethyl ammonium chloride) etc..Had extremely based on above-mentioned The epoxide (c-1-1) of few two epoxy radicals with least one carboxylic acid group and at least one ethene unsaturated group The usage amount summation of compound (c-1-2) is 100 parts by weight, and the usage amount of catalysts is preferably 0.01 parts by weight to 10 weights Measure part, more preferably 0.3 parts by weight to 5 parts by weight.

In order to control the degree of polymerization, polymerization inhibitor (polymerization generally can be also added in reaction solution inhibitor).Above-mentioned polymerization inhibitor is such as, but not limited to：Methoxyl group phenol (methoxyphenol), methylnaphthohydroquinone (methylhydroquinone), quinhydrones (hydroquinone), DBPC 2,6 ditertiary butyl p cresol (2,6-di-t-butyl-p- ) or phenthazine (phenothiazine) etc. cresol.Above-mentioned polymerization inhibitor can the individually a kind of or a variety of uses of mixing.It is based on The above-mentioned epoxide (c-1-1) with least two epoxy radicals with least one carboxylic acid group and at least one ethene The usage amount summation of the compound (c-1-2) of unsaturated group is 100 parts by weight, and the usage amount of polymerization inhibitor is preferably 0.01 weight Part is measured to 10 parts by weight, more preferably 0.1 parts by weight to 5 parts by weight.

When preparing the first alkali soluble resin (C-1), polymerization solvent can be used if necessary.As above-mentioned poly- Close reaction dissolvent concrete example, can enumerate as：Ethanol, propyl alcohol, isopropanol, butanol, isobutanol, 2- butanol, hexanol or ethylene glycol Deng alcohol compound；The ketone compounds such as MEK or cyclohexanone；The aromatic hydrocarbon compound such as toluene or dimethylbenzene；Cellosolve Or the Cellosolve class compound such as butyl Cellosolve (butyl cellosolve) (cellosolve)；Card must appropriate (carbitol) or Butyl card must the card such as appropriate (butyl carbitol) must appropriate class compound；Propylene glycol monomethyl ether (propylene glycol Monomethyl ether) etc. propylene glycol alkyl ether compound；Dipropylene glycol monomethyl ether [di (propylene glycol) Methyl ether] etc. more propylene glycol alkyl ethers [poly (propylene glycol) alkyl ether] class compound；Acetic acid Ethyl ester, butyl acetate, ethylene glycol ether acetate (ethylene glycol monoethyl ether acetate) or the third two The acetic ester compounds such as alcohol methyl ether acetate (propylene glycol methyl ether acetate)；Ethyl lactate (ethyl lactate) or butyl lactate (butyl lactate) etc. lactic acid alkyl ester (alkyl lactate) class compound；Or Dialkyl group glycol ethers；Or 3- ethoxyl ethyl propionates.Above-mentioned polymerization solvent typically can individually or a variety of uses of mixing.Separately Outside, the acid value of above-mentioned first alkali soluble resin (C-1) is preferably 50mgKOH/g to 200mgKOH/g, more preferably 60mgKOH/g To 150mgKOH/g.

In addition, above-mentioned first alkali soluble resin (C-1) passes through colloid osmotic chromatograph (Gel Permeation Chromatography, GPC) measure polystyrene conversion number mean molecule quantity be generally 500 to 10,000, preferably 800 to 8,000, more preferably 1,000 to 6,000.

In the concrete example of the present invention, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, described the The usage amount scope of one alkali soluble resin (C-1) is 0 parts by weight to 90 parts by weight, preferably 10 parts by weight to 80 parts by weight, More preferably 20 parts by weight are to 70 parts by weight.When using the first alkali soluble resin (C-1), thus photoresist forms The resistance to sputter for the colored filter that thing is formed is more preferably.

《Second alkali soluble resin (C-2)》

The alkali soluble resin (C) can further include the second alkali soluble resin (C-2), by with one or more The ethylene unsaturated monomer of carboxylic acid or carboxylic acid anhydrides (c-2-1) and other copolymerizable ethylene unsaturated monomer (c-2- 2) after combined polymerization, react and obtain with the ethylene unsaturated monomer (c-2-3) with epoxy radicals.

In embodiment, second alkali soluble resin (C-2) is that will first have one or more carboxylic acids or carboxylic The ethylene unsaturated monomer (c-2-1) of acid anhydrides carries out double bond with other copolymerizable ethylene unsaturated monomers (c-2-2) Copolymerization, to form polymer, the side chain of wherein this polymer has carboxylic acid group.Then, in the side chain of this polymer Carboxylic acid group carries out addition reaction with the ethylene unsaturated monomer (c-2-3) with epoxy radicals, and the second alkali-soluble tree is made Fat (C-2).

In another embodiment, second alkali soluble resin (C-2) be first by other copolymerizable ethene not Saturation monomer (c-2-2) carries out double bond copolymerization with the ethylene unsaturated monomer (c-2-3) with epoxy radicals, to be formed The side chain of polymer, wherein this polymer has epoxy radicals.Then, the epoxy radicals in the side chain of this polymer with one or The ethylene unsaturated monomer of more than one carboxylic acid or carboxylic acid anhydrides (c-2-1) carries out addition reaction, and obtained second alkali can Soluble resin (C-2).

In another embodiment, second alkali soluble resin (C-2) be first by other copolymerizable ethene not Saturation monomer (c-2-2) carries out double bond copolymerization with the ethylene unsaturated monomer (c-2-3) with epoxy radicals, to be formed The side chain of polymer, wherein this polymer has epoxy radicals.Then, the epoxy radicals in the side chain of this polymer with one or The ethylene unsaturated monomer of more than one carboxylic acid or carboxylic acid anhydrides (c-2-1) carry out addition reaction after, further with anhydrides Compound carries out half-esterification reaction and second alkali soluble resin (C-2) is made.

The ethylene unsaturated monomer (c-2-1) with one or more carboxylic acids or carboxylic acid anhydrides, wherein, it is described Ethylene unsaturated monomer with one or more carboxylic acids can be including but not limited to unsaturated monocarboxylic compound, insatiable hunger Polycyclic compound with multi-carboxylic acid compounds, with unsaturated group and a carboxylic acid group, or there is unsaturated group and multiple carboxylic acids The polycyclic compound of base.

Foregoing unsaturated monocarboxylic compound is such as, but not limited to (methyl) acrylic acid, butenoic acid, α-chloroacrylic acid, ethyl Acrylic acid, cinnamic acid, 2- (methyl) acryloyloxyethyls succinate (2- (meth) acryloyloxy ethyl Succinate monoester), 2- (methyl) acryloyloxyethyl hexahydrobenzene dicarboxylic acid esters, 2- (methyl) acryloyl ethoxy Base phthalic acid ester or ω-carboxylic acid group's polycaprolactone polyol mono acrylic ester etc..The ω-carboxylic acid group's polycaprolactone polyol Mono acrylic ester can be that East Asia is synthetically produced, model ARONIX M-5300 commodity.

Foregoing unsaturated multi-carboxylic acid compounds can including but not limited to maleic acid, fumaric acid, mesaconic acid, itaconic acid or Citraconic acid etc..

It is bicyclic that the foregoing polycyclic compound with unsaturated group and a carboxylic acid group is such as, but not limited to 5- carboxylic acid groups [2.2.1] hept-2-ene", 5- carboxylic acid group -5- methyl bicycles [2.2.1] hept-2-ene", 5- carboxylic acid group's -5- ethyls are bicyclic [2.2.1] Hept-2-ene", 5- carboxylic acid group -6- methyl bicycles [2.2.1] hept-2-ene"s or bicyclic [2.2.1] hept-2-ene" of 5- carboxylic acid group's -6- ethyls Deng.

The foregoing polycyclic compound such as ring of 5,6- dicarboxyls acidic group two [2.2.1] with unsaturated group and multiple carboxylic acid groups Hept-2-ene" etc..

It is preferred that the foregoing ethylene unsaturated monomer with one or more carboxylic acids is selected from acrylic acid, methyl Acrylic acid, 2- methacryloyloxyethyls succinate, 2- methacryl base oxethyl hexahydrobenzene dicarboxylic acid esters, or it is above-mentioned The combination of compound.

The foregoing ethylene unsaturated monomer (c-2-1) with one or more carboxylic acids or carboxylic acid anhydrides, wherein, it is foregoing Ethylene unsaturated monomer with one or more carboxylic acid anhydrides is such as, but not limited to unsaturated carboxylic acid anhydrides compound or tool There is the polycyclic compound of unsaturated group and carboxylic acid anhydrides.

Foregoing unsaturated carboxylic acid anhydrides compound is such as, but not limited to maleic anhydride, fumaric acid anhydride, mesaconic acid acid anhydride, clothing health Acid anhydrides or citraconic anhydride etc..The foregoing polycyclic compound with unsaturated group and carboxylic acid anhydrides is such as, but not limited to 5,6- dicarboxylic anhydrides Two rings [2.2.1] hept-2-ene" etc..

It is preferred that the foregoing ethylene unsaturated monomer with one or more carboxylic acid anhydrides is maleic anhydride.

The above-mentioned ethylene unsaturated monomer (c-2-1) with one or more carboxylic acids or carboxylic acid anhydrides can be individually a kind of Or a variety of uses of mixing.

In the concrete example of the present invention, described based on second alkali soluble resin (C-2) has one or one The ethylene unsaturated monomer of above carboxylic acid or carboxylic acid anhydrides (c-2-1) and other described copolymerizable ethylene unsaturated monomers (c-2-2) usage amount of combined polymerization monomer is 100 parts by weight, the second with one or more carboxylic acids or carboxylic acid anhydrides The usage amount of alkene unsaturated monomer (c-2-1) is 10 parts by weight to 90 parts by weight；Preferably 15 parts by weight are to 85 parts by weight；More Good is 20 parts by weight to 80 parts by weight.

Other foregoing copolymerizable ethylene unsaturated monomers (c-2-2) are such as, but not limited to (methyl) acrylic acid alkyl Ester, (methyl) acrylic acid alicyclic ester, (methyl) benzyl acrylate, unsaturated dicarboxylic ester, (methyl) hydroxyalkyl acrylate, With the unsaturated compound beyond (methyl) acrylate-based polyethers, distyryl compound or above-claimed cpd.

Above-mentioned (methyl) alkyl acrylate be such as, but not limited to (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) n-propyl, (methyl) isopropyl acrylate, (methyl) n-butyl acrylate, (methyl) isobutyl acrylate, (methyl) acrylic acid sec-butyl ester or (methyl) acrylate tert-buthyl etc..

Above-mentioned (methyl) acrylic acid alicyclic ester for example contains but is not limited to (methyl) cyclohexyl acrylate, (methyl) propylene Acid -2- methyl cyclohexyls, the bicyclic pentyl ester of (methyl) acrylic acid { or three rings [5.2.1.02,6] decyl- 8- bases (methyl) acrylic acid Ester }, the cyclopentyloxy ethyl ester of (methyl) acrylic acid two, (methyl) isobornyl acrylate or (methyl) acrylic acid tetrahydrofuran ester Deng.

Above-mentioned (methyl) benzyl acrylate is such as, but not limited to (methyl) phenyl acrylate or methacrylic acid benzene first Ester etc..

Foregoing unsaturated dicarboxylic ester is such as, but not limited to diethyl maleate, diethyl fumarate or diethyl itaconate Deng.

Foregoing (methyl) hydroxyalkyl acrylate is such as, but not limited to (methyl) 2-Hydroxy ethyl acrylate or (methyl) propylene Acid -2- hydroxy propyl esters etc..

It is foregoing with (methyl) acrylate-based polyethers be such as, but not limited to polyethyleneglycol (methyl) acrylate or Polypropylene glycol list (methyl) acrylate etc..

Foregoing styrenic is such as, but not limited to styrene, α-methylstyrene, m- methyl styrene, p- first Base styrene or p-methoxystyrene etc..

Unsaturated compound beyond above-claimed cpd is such as, but not limited to acrylonitrile, methacrylonitrile, vinyl chloride, inclined two Vinyl chloride, acrylamide, Methacrylamide, ethene ethyl ester, 1,3- butadiene, isoprene, 2,3- dimethyl 1,3- fourths two Alkene, N- succinyl imino group -3- maleimidobenzoyls ester, N- succinyl imino group -4- malimidobutanoates, N- fourths Two acylimino -6- maleimidohexanoic acids esters, N- succinyl imino group -3- maleimidopropionic acids ester, N- (9- acridinyls) Maleimide, N- octyl groups maleimide (N-octylmaleimide), N- N-cyclohexylmaleimides (N- ) or N-phenylmaleimide (N-phenylmaleimide) etc. cyclohexylmaleimide.

Other foregoing copolymerizable ethylene unsaturated monomers (c-2-2) can the individually a kind of or a variety of uses of mixing.

It is preferred that other foregoing copolymerizable ethylene unsaturated monomers (c-2-2) are selected from (methyl) acrylic acid first Ester, (methyl) butyl acrylate, (methyl) acrylic acid 2- hydroxy methacrylates, (methyl) acrylate tert-buthyl, (methyl) acrylic acid Benzene methyl, the bicyclic pentyl ester of (methyl) acrylic acid, isobornyl methacrylate, the cyclopentyloxy ethyl ester of (methyl) acrylic acid two, benzene Any combination of ethene, p-methoxystyrene or above-claimed cpd.

In the concrete example of the present invention, described based on second alkali soluble resin (C-2) has one or one The ethylene unsaturated monomer of above carboxylic acid or carboxylic acid anhydrides (c-2-1) and other described copolymerizable ethylene unsaturated monomers (c-2-2) the usage amount summation of combined polymerization monomer is 100 parts by weight, other described copolymerizable ethylene unsaturated monomers (c-2-2) usage amount is 10 parts by weight to 90 parts by weight；Preferably 15 parts by weight are to 85 parts by weight；More preferably 20 parts by weight are extremely 80 parts by weight.

The ethylene unsaturated monomer (c-2-3) with epoxy radicals is such as, but not limited to (methyl) with epoxy radicals Acrylate compounds, the alpha-alkyl acrylate compounds with epoxy radicals or glycidyl ether compounds etc..

Foregoing (methyl) acrylate compounds with epoxy radicals be such as, but not limited to (methyl) Glycidyl Acrylate, (methyl) acrylic acid 2- methyl polyglycidyl, (methyl) acrylic acid 3,4- epoxies butyl ester, (methyl) acrylic acid 6,7- epoxies heptyl ester, 3,4- epoxycyclohexyls (methyl) acrylate or 3,4- epoxycyclohexyl-methyls (methyl) acrylate etc..

The foregoing alpha-alkyl acrylate compounds with epoxy radicals be such as, but not limited to α-ethylacrylate polyglycidyl, α-n-propyl Glycidyl Acrylate, α-n-butyl polyglycidyl or α-ethylacrylate -6,7- epoxy heptyl esters etc..

Aforementioned epoxy ether compound is such as, but not limited to o- vinyl benzene methyl glycidyl ethers (o- Vinylbenzylglycidylether), m- vinyl benzene methyl glycidyl ethers (m-vinylbenzylglycidylether) Or p- vinyl benzene methyl glycidyl ethers (p-vinylbenzylglycidylether) etc..

The ethylene unsaturated monomer (c-2-3) with epoxy radicals can the individually a kind of or a variety of uses of mixing.

It is preferred that the foregoing ethylene unsaturated monomer (c-2-3) with epoxy radicals is selected from glycidyl third Ester, methacrylic acid 2- methyl polyglycidyl, 3,4- epoxycyclohexyl-methyls methacrylate, methacrylic acid 6,7- epoxies Heptyl ester, o- vinyl benzene methyl glycidyl ethers, m- vinyl benzene methyl glycidyl ethers, p- vinyl benzene methyl glycidyl ethers Or any combination of above-claimed cpd.

In the concrete example of the present invention, described based on second alkali soluble resin (C-2) has one or one The ethylene unsaturated monomer of above carboxylic acid or carboxylic acid anhydrides (c-2-1) and other described copolymerizable ethylene unsaturated monomers (c-2-2) the usage amount summation of combined polymerization monomer is 100 parts by weight, the ethylene unsaturated monomer with epoxy radicals (c-2-3) usage amount scope is 1 parts by weight to 35 parts by weight；Preferably 3 parts by weight are to 30 parts by weight；More preferably 5 parts by weight To 25 parts by weight.

Initiator used in above-mentioned polymerisation is including but not limited to the double -2- methylbutyronitriles of 2,2 '-azo, 2,2 '-idol Nitrogen-two-(2,4 methyl pentane nitrile).

In addition, above-mentioned second alkali soluble resin (C-2) passes through colloid osmotic chromatograph (Gel Permeation Chromatography, GPC) measure polystyrene conversion number mean molecule quantity be generally 1000 to 35,000, preferably For 3,000 to 30,000, more preferably 5,000 to 25,000.

In the concrete example of the present invention, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, described the The usage amount of two alkali soluble resins (C-2) is 10 parts by weight to 100 parts by weight；Preferably 20 parts by weight are to 90 parts by weight；More Good is 30 parts by weight to 80 parts by weight.

《Compound (D-1) with ester ring type epoxy radicals and an ethene unsaturated group》

The compound (D) of the unsaturated group containing ethene includes unsaturated with ester ring type epoxy radicals and an ethene The compound (D-1) of base.The compound (D-1) with ester ring type epoxy radicals and an ethene unsaturated group is followingization Any one compound represented by formula D1 to chemical formula D 15.

【Chemical formula D 1】

【Chemical formula D 2】

【Chemical formula D 3】

【Chemical formula D 4】

【Chemical formula D 5】

【Chemical formula D 6】

【Chemical formula D 7】

【Chemical formula D 8】

【Chemical formula D 9】

【Chemical formula D 10】

【Chemical formula D 11】

【Chemical formula D 12】

【Chemical formula D 13】

【Chemical formula D 14】

【Chemical formula D 15】

It is preferred that the compound (D-1) with ester ring type epoxy radicals and an ethene unsaturated group is by described Any one compound in compound represented by chemical formula D 1 to the chemical formula D 3.More preferably, it is described that there is ester ring type Epoxy radicals and the compound of an ethene unsaturated group (D-1) are the compounds represented by the chemical formula D 1.

The chemical formula D 1 to D3 concrete example is such as, but not limited to following compound：

The chemical formula D 4 to D15 concrete example is such as, but not limited to following compound：

In the concrete example of the present invention, the usage amount based on alkali soluble resin (C) is 100 parts by weight, described to have fat The usage amount scope of ring type epoxy radicals and the compound of an ethene unsaturated group (D-1) is 10 parts by weight to 100 parts by weight, Preferably 15 parts by weight are to 95 parts by weight, and more preferably 20 parts by weight are to 90 parts by weight.Described there is ester ring type ring when being not used Epoxide and during the compound of an ethene unsaturated group (D-1), the colorized optical filtering that the photosensitive resin composition of gained is formed Sector-meeting has the problem of resistance to sputter is bad.

《The compound (D-2) of other unsaturated groups containing ethene》

It is preferred that the compound (D) of the unsaturated group containing ethene may also include other unsaturated groups containing ethene Compound (D-2).The compound (D-2) of other described unsaturated groups containing ethene, which can include, has at least one ethene insatiable hunger With the unsaturated compound of base and the unsaturated compound with least two ethene unsaturated groups.

The concrete example of the above-mentioned unsaturated compound with least one ethene unsaturated group is such as, but not limited to propylene Acid amides, acryloyl morpholine, metering system morpholide, acrylic acid -7- amino -3,7- dimethyl monooctyl ester, methacrylic acid -7- ammonia Base -3,7- dimethyl monooctyl ester, isobutoxymethyl acrylamide, isobutoxymethyl Methacrylamide, isobomyl acrylate Base 2-ethoxyethyl acetate, methacrylic acid isobornyl 2-ethoxyethyl acetate, isobornyl acrylate, isobornyl methacrylate, acrylic acid -2- It is ethylhexyl, methacrylic acid -2- ethylhexyls, ethyl diethylene glycol (DEG) acrylate, ethyl diethylene glycol (DEG) methacrylate, tertiary pungent Base acrylamide, t-octyl Methacrylamide, diacetone acrylamide, two acetone Methacrylamides, acrylic acid diformazan ammonia Base ester, dimethylaminoethyl ester, dodecylacrylate, lauryl methacrylate, the ring penta of acrylic acid two Alkene 2-ethoxyethyl acetate, methacrylic acid dicyclopentenyl 2-ethoxyethyl acetate, acrylic acid dicyclopentenyl ester, methacrylic acid dicyclopentenyl ester, N, N- DMAA, N, N- dimethylmethacryl amides, acrylic acid tetrachloro phenyl ester, methacrylic acid tetrachloro phenyl ester, propylene Acid -2- tetrachloros phenoxy ethyl, methacrylic acid -2- tetrachloros phenoxy ethyl, tetrahydrofurfuryl acrylate, methacrylic acid tetrahydrochysene Chaff ester, tetrabromophenyl acrylate, methacrylic acid tetrabromo phenyl ester, acrylic acid -2- tetrabromos phenoxy ethyl, methacrylic acid -2- Tetrabromo phenoxy ethyl, acrylic acid -2- Trichlorophenoxies ethyl ester, methacrylic acid -2- Trichlorophenoxies ethyl ester, acrylic acid tribromo Phenyl ester, methacrylic acid tribromophenyl, acrylic acid -2- tribromophenoxies ethyl ester, methacrylic acid -2- tribromophenoxies ethyl ester, Acrylic acid -2- hydroxyl ethyl esters, 2-hydroxyethyl methacry-late, 2-hydroxypropyl acrylate, Hydroxypropyl methacrylate, ethene Base caprolactam, nitrogen-vinyl skin junket alkanone, acrylate, phenoxyethyl methacrylate, acrylic acid pentachloro- Phenyl ester, methacrylic acid pentachlorophenyl ester, acrylic acid pentabromo- phenyl ester, methacrylic acid pentabromo- phenyl ester, gather single acrylic acid glycol ester, Poly- monomethacrylate glycol ester, poly- mono acrylic acid propylene glycol ester, poly- monomethacrylate acid propylene glycol ester, acrylic acid borneol Ester, GMA, or methacrylic acid norbornene ester etc..It is described that there is at least one ethene unsaturated group not Saturated compounds individually a kind of can use or mix a variety of uses.

The concrete example of the above-mentioned unsaturated compound with least two ethene unsaturated groups is such as, but not limited to second two Alcohol diacrylate, ethylene glycol dimethacrylate, diacrylate dicyclopentenyl ester, dimethacrylate dicyclopentenyl ester, Triethylene glycol diacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, three (2- ethoxys) isocyanates two Acrylate, three (2- ethoxys) isocyanates dimethylacrylates, three (2- ethoxys) isocyanurate triacrylates, three (2- ethoxys) isocyanates trimethyl acrylic ester, caprolactone modification three (2- ethoxys) isocyanurate triacrylates, Three (2- ethoxys) isocyanates trimethyl acrylic esters, three acrylic acid trihydroxy methyl propyl ester, the trimethyl third of caprolactone modification Olefin(e) acid trihydroxy methyl propyl ester, three acrylic acid trihydroxy methyl propyl ester of oxirane (hereinafter referred to as EO) modification, the front three of EO modifications Base acrylic acid trihydroxy methyl propyl ester, three acrylic acid trihydroxy methyl propyl ester of expoxy propane (hereinafter referred to as PO) modification, PO are modified Trimethacrylate acid trihydroxy methyl propyl ester, triethylene glycol diacrylate, triethylene glycol dimethacrylate, the propylene of neopentyl glycol two Acid esters, neopentylglycol dimethacrylate, 1,4 butanediol diacrylate, 1,4- butanediol dimethylacrylates, 1, 6- hexanediyl esters, 1,6-HD dimethylacrylate, pentaerythritol triacrylate, pentaerythrite trimethyl Acrylate, tetramethylol methane tetraacrylate, pentaerythritol tetramethylacrylate, polyester diacrylate, polyester dimethyl Acrylate, polyethyleneglycol diacrylate, polyethylene glycol dimethacrylate, dipentaerythritol acrylate (dipentaerythritol hexaacrylate；DPHA), dipentaerythritol hexamethacrylate, dipentaerythritol 5 third Olefin(e) acid ester, dipentaerythritol pentamethacrylates, dipentaerythritol tetraacrylate, dipentaerythritol tetramethyl acrylic acid Ester, the dipentaerythritol acrylate of caprolactone modification, the dipentaerythritol hexamethacrylate of caprolactone modification, in oneself Dipentaerythritol Pentaacrylate, dipentaerythritol pentamethacrylates, the tetrapropylene acid two of caprolactone modification of ester modification Trihydroxy methyl propyl ester, the trihydroxy methyl propyl ester of tetramethyl acrylic acid two, the bisphenol a diacrylate of EO modifications, the bisphenol-A of EO modifications Dimethylacrylate, the bisphenol a diacrylate of PO modifications, the bisphenol a dimethacrylate of PO modifications, the hydrogen of EO modifications Change bisphenol a diacrylate, the hydrogenated bisphenol A dimethylacrylate of EO modifications, the hydrogenated bisphenol A diacrylate of PO modifications Ester, the hydrogenated bisphenol A dimethylacrylate of PO modifications, the glycerin tripropionate of PO modifications, the Bisphenol F diacrylate of EO modifications Ester, Bisphenol F dimethylacrylate, phenolic aldehyde polyglycidyl ether acrylate, the phenolic aldehyde polyglycidyl ether methyl of EO modifications The commodity of acrylate, the manufacture of Japanese Toagosei Co., Ltd and model TO-1382, or it is limited by Japanese chemical drug share Company manufactures and its model KAYARAD DPCA-12, KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-60 or KAYARAD DPCA-120, KAYARAD DPEA-12 commodity etc..Wherein, it is described that there are at least two ethene The unsaturated compound of unsaturated group individually a kind of can use or mix a variety of uses.

It is preferred that the compound (D-2) of other described unsaturated groups containing ethene is selected from three acrylic acid trihydroxy methyls third Ester, three acrylic acid trihydroxy methyl propyl ester of EO modifications, three acrylic acid trihydroxy methyl propyl ester, the acrylic acid of pentaerythrite three of PO modifications Ester, tetramethylol methane tetraacrylate, dipentaerythritol acrylate, Dipentaerythritol Pentaacrylate, dipentaerythritol four Acrylate, the dipentaerythritol acrylate of caprolactone modification, the sour two trihydroxy methyl propyl ester of tetrapropylene, the glycerine of PO modifications Tripropionate, KAYARAD DPCA-12, KAYARAD DPCA-20, KAYARAD DPCA-30, KAYARAD DPCA-60 or KAYARAD DPCA-120 or above-claimed cpd any combination.

The compound (D-2) of other above-mentioned unsaturated groups containing ethene individually a kind of can use or mix a variety of uses.

In the present invention concrete example in, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, it is described its The usage amount of the compound (D-2) of his unsaturated group containing ethene is 100 parts by weight to 200 parts by weight；Preferably 115 parts by weight To 185 parts by weight；More preferably 130 parts by weight are to 170 parts by weight.

In the concrete example of the present invention, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, described to contain The usage amount of the compound (D) of ethene unsaturated group is 110 parts by weight to 300 parts by weight；Preferably 130 parts by weight are to 280 Parts by weight；More preferably 150 parts by weight are to 260 parts by weight.

《Light initiator (E-1)》

It is preferred that the smooth initiator (E) can include the light initiator (E-1) with the structure as shown in chemical formula E1：

【Chemical formula E1】

K represents 1 to 10 integer；

E₁₅Carbon number is represented as 1 to 20 alkyl, the alkyl that the carbon number is 1 to 20 is unsubstituted or through as follows An at least group substitutes, and an at least group is selected from halogen atom, OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, carbon number Heteroaryloxycarbonyl that the aryloxycarbonyl for being 6 to 20 for 3 to 20 heteroaryl, carbon number, carbon number are 3 to 20, NE₁₉E₂₀、 COOE₁₇、CONE₁₉E₂₀、PO(OC_kH_2k+1)₂、Phenyl, wherein the carbon Number for 1 to 20 alkyl is substituted through phenyl, and alkyl that it is 1 to 20 through halogen atom, carbon number that the phenyl, which is, carbon number 1 Haloalkyl, OE to 4₁₇、SE₁₈Or NE₁₉E₂₀Substitution；Or

E₁₅Carbon number is represented as 2 to 12 alkoxy carbonyl, the alkoxy carbonyl that the carbon number is 2 to 12 be without being mixed with or Be mixed with through an at least O, wherein it is described through be mixed with or without be mixed with and carbon number be 2 to 12 alkoxy carbonyl be to be unsubstituted or pass through At least monohydroxy substitutes；Or

R represents 1 to 2 integer；

Z₂Represent O, S, SO or SO₂；

Z₃Represent O, CO, S or singly-bound；

N represents 1 to 20 integer；

The light initiator (E-1) with structure shown in chemical formula E1 is characterised by its carbazole moiety comprising at least One cyclic (annulated) unsaturation ring.In other words, at least one pair of E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈It is

The alkyl that foregoing alleged carbon number is 1 to 20 be straight or branched and be such as carbon number be 1 to 18, carbon number be 1 to 4th, the alkyl that carbon number is 1 to 12, carbon number is 1 to 8, carbon number is 1 to 8 or carbon number is 1 to 4, or carbon number is 4 to 12 or carbon number is 4 To 8 alkyl.Specific example for example methyl, ethyl, propyl group, isopropyl, normal-butyl, sec-butyl, isobutyl group, the tert-butyl group, amyl group, oneself Base, heptyl, 2,4,4- tri-methyl-amyls, 2- ethylhexyls, octyl group, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, 16 Base, octadecyl and 20 bases.The alkyl identical definition that it is 1 to 20 with above-mentioned carbon number that the alkyl that carbon number is 1 to 6, which has, and have There is the corresponding carbon number of highest.

The alkyl that the carbon number for being unsubstituted or being substituted containing an at least carbon-to-carbon multikey is 1 to 20 is as aftermentioned Alkenyl.

The carbon number is that definition as be described hereinafter substitutes and carbon number as previously defined through halogen by 1 to 4 haloalkyl For 1 to 4 alkyl.Alkyl group may be, for example, list-or more halogenations, until all hydrogen atoms replace with halogen, and may be, for example, C_jH_wX_y, wherein w+y=2j+1 and X is halogen, preferably fluorine atom.Specific example such as chloromethyl, trichloromethyl, trifluoromethyl Or 2- bromopropyls, in particular trifluoromethyl or trichloromethyl.

The hydroxy alkyl that the carbon number is 2 to 4 means the alkyl that the carbon number through the substitution of one or two oxygen atoms is 2 to 4.Alkane Base can be straight or branched.Specific example such as 2- hydroxyethyls, 1- hydroxyethyls, 1- hydroxypropyls, 2- hydroxypropyls, 3- hydroxyls Propyl group, 1- hydroxybutyls, 4- hydroxybutyls, 2- hydroxybutyls, 3- hydroxybutyls, 2,3- dihydroxypropyls or 2,4- dihydroxy fourths Base.

The alkoxyalkyl that the carbon number is 2 to 10 is the alkyl that the carbon number being mixed with through an O is 2 to 10.Carbon number is 2 to 10 Alkyl there is identical definition with alkyl that foregoing carbon number is 1 to 20, and there is the corresponding carbon number of highest.Specific example is such as Methoxy, methoxy ethyl, methoxy-propyl, ethoxyl methyl, ethoxyethyl group, ethoxycarbonyl propyl, propoxy methyl, Among, propoxypropyl.

It is described be mixed with have one or more O, S, NE₂₆Or the alkyl that CO carbon number is 2 to 20 is for example through O, S, NE₂₆Or CO It is mixed with 1 to 9 time, 1 to 5 time, 1 to 3 time, 1 time or 2 times.If exist it is more than one be mixed with group, it is identical type or not Together.Two oxygen atoms are separated by least one methylene, preferably at least two methylene (i.e. ethylidene).The alkyl is straight Chain or side chain.For example, there will be following construction unit：-CH₂-CH₂-O-CH₂CH₃、-[CH₂CH₂O]_y-CH₃(wherein y=1 To 9) ,-(CH₂-CH₂O)₇-CH₂CH₃、-CH₂-CH(CH₃)-O-CH₂-CH₂CH₃、-CH₂-CH(CH₃)-O-CH₂-CH₃、-CH₂- CH₂-S-CH₂CH₃、-CH₂-CH(CH₃)-NE₂₆-CH₂-CH₃、-CH₂-CH₂-COO-CH₂CH₃Or-CH₂-CH(CH₃)-OCO-CH₂- CH₂CH₃。

The cycloalkyl that the cycloalkyl and carbon number that cycloalkyl that the carbon number is 3 to 10, carbon number are 3 to 10 are 3 to 8 is appreciated that For the alkyl including at least a ring.Specific example such as cyclopropyl, cyclobutyl, cyclopenta, cyclohexyl, cyclooctyl and amyl group ring penta Base.In the present invention, carbon number is that 3 to 10 cycloalkyl also covers the example of two rings, that is, bridging ring, specific example can be such asAnd other corresponding rings.Other concrete examples may be, for example,(such as) or Etc. structure, and bridging or fused ring system, for example, definition herein also includes Etc. structure, wherein R₁₀Represent alkylidene, R₁₁Represent alkyl.

It is described through O, S, NE₂₆Or the cycloalkyl that the carbon numbers that are mixed with of CO are 3 to 20 has determining as hereinbefore At least one-the CH of justice, wherein alkyl₂- group is to replace with O, S, NE₂₆Or CO.Specific example is such as(such as)、 Deng knot Structure.

The carbon number is bonded the group formed with the cycloalkyl that carbon number is 3 to 10 by 1 to 8 alkyl and referred to through at least one The individual alkyl-substituted carbon number as previously defined with most 8 carbon atoms is 3 to 10 cycloalkyl.Specific example isDeng.

It is described be mixed with the carbon number for having one or more O and be bonded by 1 to 8 alkyl with the cycloalkyl that carbon number is 3 to 10 formed Group refer to through it is at least one with most 8 carbon atoms it is alkyl-substituted be mixed with as previously defined have one or more O carbon number is 3 to 10 cycloalkyl.Specific example is such asDeng.

The alkoxy that the carbon number is 1 to 12 is the alkyl that the carbon number through an oxygen atom substitution is 1 to 12.Carbon number is 1 Alkyl to 12 has identical definition of such as foregoing carbon number for 1 to 20 alkyl, and has the corresponding carbon number of highest.Carbon number Alkoxy for 1 to 4 is straight or branched, such as methoxyl group, ethyoxyl, propoxyl group, isopropoxy, n-butoxy, Zhong Ding oxygen Base, isobutoxy or tert-butoxy.The alkoxy that the alkoxy and carbon number that carbon number is 1 to 8 are 1 to 4 be it is identical with aforementioned definitions, And there is the corresponding carbon number of highest.

The alkyl sulfenyl that the carbon number is 1 to 12 is the alkyl that the carbon number through a sulphur atom substitution is 1 to 12.The carbon The alkyl that number is 1 to 12 has the identical definition for the alkyl for being 1 to 20 such as foregoing carbon number, and has the corresponding carbon atom of highest Number.The alkyl sulfenyl that carbon number is 1 to 4 is straight or branched, such as methylsulfany, ethylsulfanyl, propyl group sulfenyl, isopropyl sulphur Base, n-butylthio, s-butylthio, i-butylthio, tert. butyl-sulphenyl.

Phenyl-the R₅Ke Li such as Wei Benzyl bases, phenylethyl, α-methylbenzyl or α, in particular alpha-alpha-dimethyl-benzyl, benzyl Base.

Phenyl-the R₈May be, for example, benzyloxy, phenyl ethoxy, Alpha-Methyl benzyloxy or α, alpha-alpha-dimethyl benzyloxy, In particular benzyloxy.

The alkenyl that the carbon number is 2 to 12 is list-or how unsaturated and is the alkenyl, carbon number that for example, carbon number is 2 to 10 The alkenyl for being 2 to 5 for 2 to 8 alkenyl, carbon number.Specific example such as vinyl, pi-allyl, methacrylic, 1,1- dimethyl alkene Propyl group, 1- cyclobutenyls, 3- cyclobutenyls, 2- cyclobutenyls, 1,3-pentadiene base, 5- hexenyls, 7- octenyls or laurylene base, especially For pi-allyl.The alkenyl that carbon number is 2 to 5 has the identical definition for the alkenyl for being 2 to 12 such as foregoing carbon number, and corresponding with highest Carbon number.

Being mixed with has one or more O, S, NE₂₆Or the alkenyl that CO carbon number is 2 to 12 is for example through O, S, NE₂₆Or CO is mixed with 1 To 9 times, 1 to 5 time, 1 to 3 time, 1 time or 2 times.If exist it is more than one be mixed with group, it is identical type or difference.Two Individual oxygen atom is separated by least one methylene, preferably at least two methylene (i.e. ethylidene).Alkenyl is straight or branched And as defined above.For example, following construction unit can be formed：- CH=CH-O-CH₂CH₃,-CH=CH-O-CH=CH₂ Deng.

The cycloalkenyl group that the carbon number is 4 to 8 has an at least double bond, and may be, for example, the cycloalkenyl group or carbon that carbon number is 4 to 6 Number is 6 to 8 cycloalkenyl group.Specific example such as cyclobutane base, cyclopentenyl, cyclohexenyl group or cyclo-octene base, in particular cyclopentene Base and cyclohexenyl group, preferably cyclohexenyl group.

The alkenyloxy group that the carbon number is 3 to 6 is single or multiple unsaturation, and with wherein one of the definition such as foregoing alkenyl Person, and attachment epoxide has the corresponding carbon number of highest.Specific example for example allyloxy, methyl allyloxy, butenyloxy, Amylene epoxide, 1,3- pentadienes epoxide, 5- hexene epoxides.

The alkynyl that the carbon number is 2 to 12 is single or multiple unsaturated straight or branched, and may be, for example, that carbon number is 2 to 8 The alkynyl that the alkynyl or carbon number that alkynyl, carbon number are 2 to 6 are 2 to 4.Specific example such as acetenyl, propinyl, butynyl, 1- butine Base, 3- butynyls, 2- butynyls, pentynyl hexin base, 2- hexin bases, 5- hexin bases, octynyl etc..

The carbon number be 2 to 20 alkanoyl be straight or branched, and may be, for example, carbon number be 2 to 18, carbon number be 2 to 14th, the alkanoyl or carbon number that carbon number is 2 to 12, carbon number is 2 to 8, carbon number is 2 to 6 or carbon number is 2 to 4 are 4 to 12 or carbon number is 4 to 8 alkanoyl.Specific example such as acetyl group, propiono, bytyry, isobutyryl, valeryl, caproyl, heptanoyl group, pungent Acyl group, pelargonyl group, capryl, dodecanoyl, myristoyl base, pentadecanoyl base, hexadecanoyl group, octadecanoyl, 20 acyl groups, preferably For acetyl group.The alkanoyl that carbon number is 1 to 8 has the alkanoyl identical definition that carbon number as the aforementioned is 2 to 20, and with most High corresponding carbon number.

The alkoxy carbonyl that the carbon number is 2 to 12 is straight or branched, and is such as methoxycarbonyl, ethyoxyl carbonyl Base, propoxycarbonyl, n-butoxycarbonyl, isobutoxy carbonyl, 1,1- dimethyl propylenes Epoxide carbonyl, pentyloxy carbonyl, own oxygen Base carbonyl, Epoxide carbonyl in heptan, carbonyl octyloxy, nonyl epoxide carbonyl, decyloxy carbonyl or 12 Epoxide carbonyls, in particular methoxyl group Carbonyl, ethoxy carbonyl, propoxycarbonyl, n-butoxycarbonyl or isobutoxy carbonyl, preferably methoxycarbonyl.

It is described that to be mixed with the alkoxy carbonyl that the carbon number for having one or more O is 2 to 12 can be straight or branched.Two oxygen atoms Separated by least two methylene (i.e. ethylidene).The alkoxy carbonyl through being mixed with is unsubstituted or through one or more hydroxyl Substitution.Carbon number be 6 to 20 aryloxycarbonyl may be, for example, phenyloxycarbonyl (=phenyl-O- (CO) O-), naphthoxycarbonyl, Anthracene Epoxide carbonyl etc..The Heteroarylcarbonyl that carbon number is 5 to 20 can be the heteroaryl that the carbon number being bonded with-O-CO- is 5 to 20.

The naphthene base carbonyl that the carbon number is 3 to 10 can be the cycloalkyl that the carbon number being bonded with CO is 3 to 10, wherein cycloalkanes Base has to be defined as hereinbefore, and has the corresponding carbon number of highest.Being mixed with has one or more O, S, NE₂₆Or CO carbon number Refer to the cycloalkyl being bonded with CO through being mixed with for 3 to 10 naphthene base carbonyl, wherein the cycloalkyl through being mixed with have with it is foregoing Identical defines.

The cycloalkyl that it is 3 to 10 with the carbon number for-O- (CO)-be bonded that the cyclo alkoxy carbonyl that the carbon number is 3 to 10, which can be, Wherein cycloalkyl has definition as hereinbefore, and has the corresponding carbon number of highest.Being mixed with has one or more O, S, NE₂₆ Or the cyclo alkoxy carbonyl that CO carbon number is 3 to 10 refers to through being mixed with the cycloalkyl with-O- (CO)-be bonded, wherein through being mixed with Cycloalkyl there is definition as hereinbefore.

The alkyl phenyl that the carbon number is 1 to 20 refers to that wherein carbon atom is total through at least one alkyl-substituted phenyl Close up to 20.

The aryl that the carbon number is 6 to 20 may be, for example, phenyl, naphthyl, anthryl, phenanthryl, pyrenyl, 1,2- benzos phenanthryl, simultaneously Tetraphenyl, the sub- triphenyl of connection etc., in particular phenyl or naphthyl, preferably phenyl.Naphthyl is 1- naphthyls or 2- naphthyls.

In the content of the smooth initiator (E-1), the heteroaryl that the carbon number is 3 to 20 includes monocyclic or polycyclic system System, such as fused ring system.Concrete example is thienyl, benzo [b] thienyl, naphtho- [2,3-b] thienyl, thianthrene group, furans Base, dibenzofuran group, benzo piperazine mutter base (benzopyran), xanthyl, thioxanthene base, Fei Evil thiophenes base, pyrrole radicals, imidazole radicals, It is pyrazolyl, pyrazinyl, pyrimidine radicals, pyridazinyl, indolizine base, isoindolyl, indyl, indazolyl, purine radicals, quinolizine base, different Quinolyl, quinolyl, phthalazinyl, naphthyridines base, quinoxalinyls, quinazolyl, cinnolines base (cinnoline), pteridine radicals, carbazole It is base, B-carboline base, phenanthridinyl, acridinyl, perimidinyl, phenanthroline, phenazinyl, isothiazolyl, phenothiazinyl, different Oxazolyl, furan Xanthones bases, fen Evil bases, 7- phenanthryl, anthraquinone -2- bases (epoxide -9,10- dihydroanthracene -2- bases of=9,10- bis-), 3- benzos [b] thienyl, 5- benzos [b] thienyl, 2- benzos [b] thienyl, 4- dibenzofuran groups, 4,7- dibenzofuran groups, 4- Methyl -7- dibenzofuran groups, 2- xanthyls, 8- methyl -2- xanthyls, 3- xanthyls, 2- Fei Evil thiophenes base, 2,7- Fei Evil thiophenes Base, 2- pyrrole radicals, 3- pyrrole radicals, 5- methyl -3- pyrrole radicals, 2- imidazole radicals, 4- imidazole radicals, 5- imidazole radicals, 2- methyl -4- imidazoles Base, 2- ethyl -4- imidazole radicals, 2- ethyl -5- imidazole radicals, 1H-TETRAZOLE -5- bases, 3- pyrazolyls, 1- methyl -3- pyrazolyls, 1- third Base -4- pyrazolyls, 2- pyrazinyls, 5,6- dimethyl -2- pyrazinyls, 2- indolizine base, 2- methyl -3- isoindolyls, 2- methyl - 1- isoindolyls, 1- methyl -2- indyls, 1- methyl -3- indyls, 1,5- dimethyl -2- indyls, 1- methyl -3- indazoles Base, 2,7- dimethyl -8- purine radicals, 2- methoxyl group -7- methyl -8- purine radicals, 2- quinolizines base, 3- isoquinolyls, 6- isoquinolin Base, 7- isoquinolyls, 3- methoxyl group -6- isoquinolyls, 2- quinolyls, 6- quinolyls, 7- quinolyls, 2- methoxyl group -3- quinoline Base, 2- methoxyl group -6- quinolyls, 6- phthalazinyls, 7- phthalazinyls, 1- methoxyl group -6- phthalazinyls, 1,4- dimethoxy -6- phthalazines Base, 1,8- naphthyridines -2- bases, 2- quinoxalinyls, 6- quinoxalinyls, 2,3- dimethyl -6- quinoxalinyls, 2,3- dimethoxys -6- Quinoxalinyl, 2- quinazolyls, 7- quinazolyls, 2- dimethylamino -6- quinazolyls, 3- cinnolines base, 6- cinnolines base, 7- are scolded Quinoline base, 3- methoxyl group -7- cinnolines base, 2- pteridine radicals, 6- pteridine radicals, 7- pteridine radicals, 6,7- dimethoxy -2- pteridine radicals, 2- clicks Oxazolyl, 3- carbazyls, 9- methyl -2- carbazyls, 9- methyl -3- carbazyls, B-carboline -3- bases, 1- methyl-ss-carboline -3- bases, 1- methyl-ss-carboline -6- bases, 3- phenanthridinyls, 2- acridinyls, 3- acridinyls, 2- perimidinyls, 1- methyl -5- naphthalenes are embedding Pyrimidyl, 5- phenanthrolines, 6- phenanthrolines, 1- phenazinyl, 2- phenazinyl, 3- isothiazolyls, 4- isothiazolyls, 5- are different Thiazolyl, 2- phenothiazinyls, 3- phenothiazinyls, 10- methyl -3- phenothiazinyls, 3- isoxazolyls, 4- isoxazolyls, 5- Yi Evil Oxazolyl, 4- methyl -3- furan Xanthones bases, 2- Fen Evil bases, 10- methyl -2- Fen Evil bases etc..

It is preferred that the heteroaryl that the carbon number is 3 to 20 can be thienyl, benzo [b] thienyl, thianthrene group, thioxanthene base, 1- methyl -2- indyls or 1- methyl -3- indyls.More preferably, the heteroaryl that carbon number is 3 to 20 can be thienyl.

The carbon number is to be connected to determining as foregoing for molecule remainder via CO groups by 4 to 20 Heteroarylcarbonyl The carbon number of justice is 3 to 20 heteroaryl.

The aryl (heteroaryl that the aryl or carbon number that phenyl, naphthyl, carbon number are 6 to 20 are 5 to 20) that is substituted is Respectively through 1 to 7 time, 1 to 6 time or 1 to 4 time, preferably through 1 time, 2 times or 3 times substitution.Defined aryl can not have than Free position in aryl rings is more substituent.

In the position 4 of substituent preferably on the phenyl ring on the benzyl ring or in 3,4-, 3,4,5-, 2,6-, 2,4- Or 2,4,6- configurations.

The group through being mixed with least once be through be mixed with such as 1 to 19 time, 1 to 15 time, 1 to 12 time, 1 to 9 time, 1 To 7 times, 1 to 5 time, 1 to 4 time, 1 to 3 time or 1 time or 2 times (numbers for being mixed with the carbon number that atomicity is mixed with depending on plan). Group through substituting at least once has such as 1 to 7,1 to 5,1 to 4,1 to 3 or 1 or 2 and identical or different taken Dai Ji.

Group through at least substituent substitution as defined above refers to have at least one identical or different Substituent.Halogen is fluorine, chlorine, bromine and iodine, preferably fluorine, chlorine and bromine, more preferably fluorine and chlorine.

For example, if E₁And E₂、E₂And E₃、E₃And E₄Or E₅And E₆、E₆And E₇、E₇And E₈It is separatelyThe structure for example shown in below formula E1-a to chemical formula E1-i is then formed, wherein with chemistry Formula E1-a structure is preferable.

【Chemical formula E1-a】

【Chemical formula E1-b】

【Chemical formula E1-c】

【Chemical formula E1-d】

【Chemical formula E1-e】

【Chemical formula E1-f】

【Chemical formula E1-g】

【Chemical formula E1-h】

【Chemical formula E1-i】

The compound of the chemical formula E1 is characterised by that at least one benzyl ring condenses with carbazole moiety, to form " naphthalene Base " ring.Namely above-mentioned chemical formula E1-a to one of chemical formula E1-i structure be according to depicted in chemical formula E1.

If E₁And E₂、E₂And E₃、E₃And E₄Or E₅And E₆、E₆And E₇、E₇And E₈It is separately-(CH₂)_p-W-(CH₂)_q-, Then formed for exampleEtc. structure.

If the substituent OE on phenyl or naphthyl ring₁₇、SE₁₈、SOE₁₈、SO₂E₁₈Or NE₁₉E₂₀Via group E₁₇、E₁₈、E₁₉ And/or E₂₀Five Yuans or six membered ring are formed with a carbon atom of naphthyl ring, then is obtained comprising 3 or more rings (including naphthyl Ring) structure.Specific example may be, for example,

Deng.

If E₁₇With withGroup phenyl or naphthyl ring one Individual carbon atom forms singly-bound, then is formed for example Etc. structure.

If E₁₆It is through SE₁₈Substituted phenyl, wherein E₁₈Expression is bonded to COE₁₆Carbazole moiety phenyl or naphthyl The singly-bound of ring, the structure formed may be, for example,

If it is, E₁₆It is through SE₁₈Substituted phenyl, wherein group E₁₈Expression is bonded to COE₁₆Carbazole moiety Phenyl or naphthyl ring singly-bound, and formed has a phenyl or naphthyl ring of thioxanthene base section and carbazole moiety simultaneously.

If E₁₉And E₂₀It is to be formed to have O, S or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or six First saturation or unsaturation ring, the then saturation or unsaturation ring formed may be, for example, aziridine, pyrroles, thiazole, Pyrrolizidine, Evil Azoles, pyridine, 1,3- diazines, 1,2- diazines, hexahydropyridine or morpholine.If it is preferred that E₁₉And E₂₀It is the nitrogen-atoms one with being bonded Rise to be formed and have O, S or NE without being mixed with or being mixed with₁₇Five yuan or hexa-atomic saturation or unsaturation ring, then formed without being mixed with or being mixed with There is O or NE₁₇, especially the five of O yuan or hexa-atomic saturated rings.

If E₂₁And E₂₂It is to be formed to have O, S or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₂₆Five yuan or six First saturation or unsaturation ring, and phenyl ring optionally condenses with the saturation or unsaturation ring, then the saturation formed or insatiable hunger With ring may be, for example, aziridine, pyrroles, thiazole, Pyrrolizidine, oxazoles, pyridine, 1,3- diazines, 1,2- diazines, hexahydropyridine or Quinoline or accordingly cyclization (such as)。

If E₁₉And E₂₀It is that heteroaromatic ring system is formed together with the nitrogen-atoms being bonded, then heteroaromatic ring system is Refer to comprising more than one ring (such as 2 or 3 rings) and from identical type or it is different types of one or more Hetero atom.Suitable hetero atom may be, for example, N, S, O or P, especially N, S or O.Specific example such as carbazole, indoles, iso-indoles, Yin Azoles, purine, isoquinolin, quinoline, carboline, phenthazine etc..

The light initiator (E-1) (oxime ester) of structure shown in the chemical formula E1 is prepared by known method, such as logical Cross makes corresponding oxime and carboxylic acid halides, particularly chloride or anhydride reaction under the following conditions：Atent solvent (such as：The tert-butyl group Methyl ether, tetrahydrofuran (THF) or dimethylformamide) in, it is molten in the presence of alkali (such as triethylamine or pyridine), or in alkalescence In agent (such as pyridine).In one embodiment of this invention, as chemical formula E1-a compound be with following chemical formula (i) shown in Method prepare, wherein E₇It is oxime ester base groupAnd Z₁It is singly-bound.And such as chemical formula E1-b to chemical formula Compound shown in E1-h is to prepare in the same way, but selects suitable oxime to carry out.

【Chemical formula (i)】

In chemical formula (i), E₁、E₂、E₅、E₆、E₈、E₁₃、E₁₄And E₁₅It is that as defined above, X means halogen atom, especially It is chlorine atom.It is preferred that E₁₄For methyl.

The above-mentioned reaction as shown in chemical formula (i) is that the art has known to usually intellectual, and generally at -15 DEG C Implement at a temperature of extremely+50 DEG C, preferably implement at a temperature of 0 DEG C to 25 DEG C.

Work as Z₁When being CO, corresponding oxime be by using alkyl nitrite (such as methyl nitrite, nitrous ether (ethyl nitrite), Propyl nitrite, butyl nitrite or isoamyl nitrite) methylene nitrosation is synthesized.Then, esterification be with it is foregoing Implement under the same conditions, detailed preparation method is as shown in chemical formula (ii).

【Chemical formula (ii)】

Therefore, can by make in the presence of the mixture of alkali or alkali corresponding oxime compound with such asCarboxylic acid halides or such asAnhydride reaction, be made chemical formula E1 as defined above compound, wherein X be halogen atom, and spy It is not chlorine atom, and E₁₄Definition know as foregoing.

The required oxime as parent material can pass through standard chemical teaching material (such as J.March, Advanced Organic Chemistry, the 4th edition, Wiley Interscience, 1992) or monograph (such as S.R.Sandler＆W.Karo, Organic Functional group preparations, volume 3, Academic Press) described in a variety of methods obtain.

A kind of most convenient method be (such as) in polar solvent (such as dimethyl acetamide (DMA), the DMA aqueous solution, second Alcohol or ethanol water) in make aldehydes or ketones and azanol or its reactant salt.In this case, the alkali such as sodium acetate or pyridine is added To control the pH of reactant mixture.It is well known that reaction speed has pH dependences, and can connect when starting or during reaction Alkali is added continuously.Also the basic solvents such as pyridine can be used as alkali and/or solvent or cosolvent.Reaction temperature is usually room The warm reflux temperature to mixture, typically about 20 DEG C to 120 DEG C.

Corresponding ketone intermediate be (such as) by document (such as standard chemical teaching material, such as J.March, Advanced Organic Chemistry, the 4th edition, Wiley Interscience, 1992) it is prepared by method described in.In addition, continuously not Reed-Kerafyrm thatch reaction (Friedel-Crafts reaction) can be effectively used for synthetic intermediate.These reactions are to be familiar with Known to skilled person.

Another convenient synthesis of oxime is to use nitrous acid or alkyl nitrite by " activity " methylene nitrosation.Alkalescence condition (such as Organic Syntheses coll. (J.Wiley＆Sons, New York, 1988) VI rolls up page 199 and the 840th Described in page) (such as Organic Synthesis coll. Vs roll up page 32 and page 373, III volume the with acid condition Page 191 and page 513, described in page 202, page 204 and page 363 of vol. ii) be both adapted to prepare and use in the present invention Make the oxime of parent material.Typically nitrous acid is produced from natrium nitrosum.Alkyl nitrite can be (such as) methyl nitrite, nitrous Acetoacetic ester, propyl nitrite, butyl nitrite or isoamyl nitrite.

In another embodiment, light initiator (E-1) is free type oxime compound, and with as shown in chemical formula E1A Structure：

【Chemical formula E1A】

In chemical formula E1A, E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Independently represent hydrogen atom, carbon number as 1 to 20 alkane Base,COE₁₆、OE₁₇, halogen atom, NO₂OrOr

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈Independently represent warpSubstituted carbon number is 2 to 10 alkenyl, or E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈Separately common representative-(CH₂)_p-W-(CH₂)_q-；Or

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈It is separately common to representA wherein at least E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈For

E₉、E₁₀、E₁₁And E₁₂Independently represent hydrogen atom, carbon number as 1 to 20 alkyl, carbon number be 1 to 20 alkyl be Be unsubstituted or substitute through an at least group as follows, and an at least group be selected from phenyl, halogen atom, CN, OH, SH, Carbon number is 1 to 4 alkoxy, (CO) OH or (CO) O (R₁), wherein R₁Carbon number is represented as 1 to 4 alkyl；Or

E₉、E₁₀、E₁₁And E₁₂Separately represent the phenyl being unsubstituted or substitute through an at least group as follows Phenyl, an at least group be selected from carbon number be 1 to 6 alkyl, halogen atom, CN, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₉、E₁₀、E₁₁And E₁₂Separately represent halogen atom, CN, OE₁₇、SE₁₈、SOE₁₈、SO₂E₁₈Or NE₁₉E₂₀, its Middle substituent OE₁₇、SE₁₈Or NE₁₉E₂₀It is optionally via group E₁₇、E₁₈、E₁₉And/or E₂₀With the naphthalene nucleus in formula (IA) One carbon atom forms five-membered ring or six membered ring；Or

E₉、E₁₀、E₁₁And E₁₂Separately representCOE₁₆Or NO₂；

E₁₃Carbon number is represented as 1 to 20 alkyl, carbon number be 1 to 20 alkyl be unsubstituted or through it is as follows at least One group substitutes, wherein an above-mentioned at least group is selected from halogen atom, E₁₇、COOE₁₇、OE₁₇、SE₁₈、CONE₁₉E₂₀、 NE₁₉E₂₀、PO(OC_kH_2k+1)₂OrOr

E₁₃Carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with to have one or more O, S, SO, SO₂、 NE₂₆Or CO；Or

E₁₃Carbon number is represented as 2 to 12 alkenyl, carbon number be 2 to 12 alkenyl be without be mixed with or be mixed with have one or more O, CO or NE₂₆, wherein the alkenyl through being mixed with and alkyl that carbon number is 2 to 20 and carbon number without being mixed with or through being mixed with are 2 to 12 is It is unsubstituted or substitutes through an at least halogen atom；Or

E₁₃Phenyl or naphthyl is represented, and it is respectively unsubstituted or substituted through an at least group as follows, wherein described An at least group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀、COE₁₆、CN、NO₂, halogen atom, carbon number be 1 to 20 Alkyl, the haloalkyl that carbon number is 1 to 4, being mixed with has one or more O, S, CO or NE₂₆And carbon number is 2 to 20 alkyl；Or its is each There are one or more O, S, CO or NE through not being mixed with or being mixed with₂₆And carbon number is substituted by 3 to 10 cycloalkyl；

K represents 1 to 10 integer；

E₁₅It is 6 to 20 aromatic radical or carbon number as 3 to 20 heteroaryl to represent carbon number, and it is respectively unsubstituted or through following institute At least group substitution shown, and an at least group is selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, CN, NO₂、 OE₁₇、SE₁₈、NE₁₉E₂₀、PO(OC_kH_2k+1)₂, be bonded with SO and alkyl and SO that carbon number is 1 to 10₂Bonding and carbon number are 1 to 10 Alkyl, be mixed with and have one or more O, S or NE₂₆And carbon number is 2 to 20 alkyl；Or it respectively takes through the alkyl that carbon number is 1 to 20 The alkyl that generation, wherein carbon number are 1 to 20 is to be unsubstituted or substitute through an at least group as follows, and an at least group selects From halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl, carbon number 6 Heteroaryloxycarbonyl, the OE that aryloxycarbonyl, carbon number to 20 are 3 to 20₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Carbon number is represented as 1 to 20 alkyl, carbon number be 1 to 20 alkyl be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from halogen atom, OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 Heteroaryloxycarbonyl that aryloxycarbonyl that heteroaryl, carbon number are 6 to 20, carbon number are 3 to 20, NE₁₉E₂₀、COOE₁₇、 CONE₁₉E₂₀、PO(OC_kH_2k+1)₂、Or phenyl, wherein carbon number is that 1 to 20 alkyl is Substitute through phenyl, and alkyl that it is 1 to 20 through halogen atom, carbon number that phenyl, which is, carbon number be 1 to 4 haloalkyl, OE₁₇、SE₁₈ Or NE₁₉E₂₀Substitution；Or

E₁₅Carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with to have one or more O, SO or SO₂, warp It is mixed with and alkyl that carbon number is 2 to 20 is to be unsubstituted or substitute through an at least group as follows, and an at least group selects From halogen atom, OE₁₇、COOE₁₇、CONE₁₉E₂₀, phenyl or through OE₁₇、SE₁₈Or NE₁₉E₂₀Substituted phenyl；Or

E₁₅Carbon number is represented as 2 to 20 alkanoyl or benzoyl, is unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from the alkyl, halogen atom, phenyl, OE that carbon number is 1 to 6₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Carbon number is represented as 2 to 12 alkoxy carbonyl, the alkoxy carbonyl that carbon number is 2 to 12 is without being mixed with or being mixed with Have one or more O, wherein through be mixed with or without be mixed with and carbon number be 2 to 12 alkoxy carbonyl be to be unsubstituted or through at least one Hydroxyl substitutes；Or

E₁₅Phenyloxycarbonyl is represented, phenyloxycarbonyl is to be unsubstituted or substitute through an at least group as follows, and An at least group is selected from the haloalkyl, phenyl, OE that the alkyl, halogen atom, carbon number that carbon number is 1 to 6 are 1 to 4₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Represent CN, CONE₁₉E₂₀、NO₂, carbon number be 1 to 4 haloalkyl, S (O)_r-R₂And S (O)_rThe phenyl of bonding, Wherein with S (O)_rThe phenyl of bonding be unsubstituted or through carbon number be 1 to 12 alkyl or SO₂-R₂Substitution, and R₂Represent carbon number For 1 to 6 alkyl；Or

E₁₅Representative and SO₂Phenyl, diphenylphosphino or the two (R of O bondings₃)-phosphono, wherein with SO₂The benzene of O bondings Base is to be unsubstituted or substitute through the alkyl that carbon number is 1 to 12, and R₃Carbon number is represented as 1 to 4 alkoxy；

R represents 1 to 2 integer；

Z₂Represent O, S, SO or SO₂；

Z₃Represent O, CO, S or singly-bound；

E₁₆It is 6 to 20 aryl or carbon number as 3 to 20 heteroaryl to represent carbon number, and it is respectively unsubstituted or through as follows An at least group substitution, and an at least group be selected from phenyl, halogen atom, carbon number be 1 to 4 haloalkyl, CN, NO₂、 OE₁₇、SE₁₈、NE₁₉E₂₀, be mixed with and have one or more O, S or NE₂₆And carbon number is 1 to 20 alkyl, or the alkane that carbon number is 1 to 20 The alkyl that base, wherein carbon number are 1 to 20 is to be unsubstituted or substitute through an at least group as follows, a wherein at least group Selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl, carbon number The Heteroaryloxycarbonyl for being 3 to 20 for 6 to 20 aryloxycarbonyl, carbon number, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₆Hydrogen atom or carbon number are represented as 1 to 20 alkyl, wherein carbon number is that 1 to 20 alkyl is unsubstituted or through such as At least group substitution shown in lower, and an at least group is selected from halogen atom, phenyl, OH, SH, CN, the alkene that carbon number is 3 to 6 Epoxide, OCH₂CH₂CN、OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁), O (CO) phenyl or (CO) OH or (CO) O (R₁)；Or

E₁₆Carbon number is represented as 2 to 12 alkyl, the alkyl that carbon number is 2 to 12 is to be mixed with to have one or more O, S or NE₂₆；Or

E₁₆Represent (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 12 alkenyl or carbon number be 3 to 8 Cycloalkyl, wherein the R₄Carbon number is represented as 1 to 8 alkyl；Or

E₁₆Represent through SE₁₈Substituted phenyl, wherein E18 represent and are bonded to COE₁₆The phenyl of attached carbazole moiety or The singly-bound of naphthyl ring；

N represents 1 to 20 integer；

E₁₇Represent hydrogen atom, phenyl-R₅, carbon number be 1 to 20 alkyl, its be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from halogen atom, OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、 OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁)、O(CO)-(R₆), the phenyl, (CO) OH, (CO) O (R that are bonded with O (CO)₁), carbon number For 3 to 20 cycloalkyl, SO₂-(R₇)、O(R₇) or be mixed with the cycloalkyl for thering is one or more O and carbon number to be 3 to 20, wherein R₅Generation Alkyl, the R that table carbon number is 1 to 3₆Carbon number is represented as 2 to 4 alkenyl, and R₇Carbon number is represented as 1 to 4 haloalkyl；Or

E₁₇Carbon number is represented as 2 to 20 alkyl, and the alkyl that carbon number is 2 to 20 is to be mixed with to have one or more O, S or NE₂₆； Or

E₁₇Represent carbon number and be bonded the group formed, and above-mentioned base with carbon number as 3 to 10 cycloalkyl by 1 to 8 alkyl Group is without being mixed with or having one or more O through being mixed with；Or

E₁₇Represent benzoyl, benzoyl is unsubstituted or substituted through an at least group as follows, and it is described extremely A few group is selected from the alkoxy that alkyl, halogen atom, OH or the carbon number that carbon number is 1 to 6 are 1 to 3；Or

E₁₇Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through as follows at least one Group substitutes, and an at least group be selected from alkoxy that halogen atom, the alkyl that OH, carbon number are 1 to 12, carbon number are 1 to 12, CN、NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, diphenyl-amino orWherein R₈Carbon number is represented as 1 to 3 alkoxy, and R₉Carbon number is represented as 1 to 12 alkyl；Or

E₁₇With withOne of carbon atom of phenyl or naphthyl ring form list Key；

E₁₈Represent hydrogen atom, carbon number as 2 to 12 cycloalkyl or phenyl-R as 3 to 20 of alkenyl, carbon number₅, wherein carbon number The cycloalkyl for being 3 to 20 for 2 to 12 alkenyl, carbon number and phenyl-R₅Be without be mixed with or be mixed with have one or more O, S, CO, NE₂₆Or COOE₁₇；Or

E₁₈Carbon number is represented as 1 to 20 alkyl, the alkyl that carbon number is 1 to 20 is unsubstituted or through following depicted at least one Group substitutes, and an at least group is selected from OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、OCH₂CH₂(CO)O (R₁)、O(CO)-(R₆)、O(CO)-(R₁), O (CO)-phenyl or (CO) OE₁₇；Or

E₁₈Carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with to have one or more O, S, CO, NE₂₆ Or COOE₁₇；Or

E₁₈Benzoyl is represented, benzoyl is to be unsubstituted or substitute through an at least group as follows, and at least One group is selected from the alkyl sulfide that the alkoxy that the alkyl that carbon number is 1 to 6, halogen atom, OH, carbon number are 1 to 4 or carbon number are 1 to 4 Base；Or

E₁₈Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, its is each unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from haloalkyl, carbon number that alkyl, carbon number that halogen atom, carbon number are 1 to 12 are 1 to 4 and is 1 to 12 alkoxy, CN, NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, hexichol Base amino, (CO) O (R₄)、CO-R₄、(CO)N(R₄)₂Or

E₁₉And E₂₀Separately represent hydrogen atom, carbon number as 1 to 20 hydroxy alkyl, carbon as 2 to 4 of alkyl, carbon number Cycloalkyl that alkenyl that alkoxyalkyl that number is 2 to 10, carbon number are 2 to 5, carbon number are 3 to 20, phenyl-R5, carbon number are 1 to 8 Alkanoyl, carbon number be 1 to 8 alkanoyl epoxide, carbon number be 3 to 12 enoyl-, SO₂-R₇Or benzoyl；Or

E₁₉And E₂₀It is to be formed to have O, S or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or hexa-atomic Saturation or unsaturation ring, and five yuan or hexa-atomic saturation or unsaturation ring are to be unsubstituted or taken through an at least group as follows In generation, wherein at least a group, are selected from the alkyl that carbon number is 1 to 20, the alkoxy that carbon number is 1 to 20 ,=O, OE₁₇、SE₁₈、 NE₂₁E₂₂、(CO)E₂₃、NO₂, halogen atom, carbon number be 1 to 4 haloalkyl, CN, phenyl,Or without It is mixed with or through at least O, S, CO or NE₁₇Be mixed with and carbon number be 3 to 20 cycloalkyl；Or

E₁₉And E₂₀It is that heteroaromatic ring system is formed together with attached nitrogen-atoms, the heteroaromatic ring system is It is unsubstituted or substitutes through an at least group as follows, and an at least group is selected from the alkyl, carbon that carbon number is 1 to 20 Alkoxy that haloalkyl that number is 1 to 4, carbon number are 1 to 20 ,=O, OE₁₇、SE₁₈、NE₂₁E₂₂、(CO)E₂₃、Halogen atom, NO₂, CN, phenyl, or have one or more O, S, CO or NE without being mixed with or being mixed with₁₇And carbon Number is 3 to 20 cycloalkyl；

E₂₁And E₂₂Separately represent hydrogen atom, carbon number as 1 to 20 haloalkyl, carbon as 1 to 4 of alkyl, carbon number Cycloalkyl or phenyl of the number for 3 to 10；

E₂₅Represent COOE₁₇、CONE₁₉E₂₀、(CO)E₁₇；Or have and be directed to E₁₇One of in definition wherein；

E₂₆Represent hydrogen atom, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, be mixed with and have an at least O or CO And carbon number is 2 to 20 alkyl；Or E₂₆Represent phenyl-R₁, without being mixed with or being mixed with, to have one or more O or CO and carbon number be 3 to 8 Cycloalkyl；Or E₂₆Represent (CO) E₁₉；Or E₂₆Represent phenyl, E₂₆It is to be unsubstituted or taken through an at least group as follows Generation, and an at least group is selected from the haloalkyl, OE that alkyl, halogen atom, carbon number that carbon number is 1 to 20 are 1 to 4₁₇、 SE₁₈、NE₁₉E₂₀OrBut condition has at least for the light initiator (E-1) of the structure as shown in chemical formula E1A One

For group defined in the compound shown in chemical formula E1A, preferably correspond to be directed to chemical formula as following E1 compound institute definien, simply defined in oxime ester base group (such as) all replace with corresponding dissociate Oximido group

Each oxime ester base group can two kinds of configurations (Z) or (E) exist.Isomers can be separated by traditional methods, but Can be used isomer mixture as (such as) light initial substance.Therefore, the smooth initiator (E-1), as shown in chemical formula E1 Compound, the mixture comprising configurational isomer.

In a preferred embodiment, light initiator (E) includes the light initiator (E- of the structure as shown in chemical formula E1 1), wherein E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Independently represent hydrogen atom, carbon number as 1 to 20 alkyl,COE₁₆Or NO₂；Or

Z₁Represent CO or singly-bound；

E₁₃Carbon number is represented as 1 to 20 alkyl, carbon number be 1 to 20 alkyl be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from halogen atom, OE₁₇、SE₁₈、COOE₁₇、CONE₁₉E₂₀Or PO (OC_kH_2k+1)₂；Or

E₁₃Carbon number is represented as 2 to 20 alkyl, it is to be mixed with to have one or more O, S, NE₂₆Or CO；Or

E₁₃Phenyl or naphthyl is represented, both this is unsubstituted or through at least oneOr COE₁₆ Substitution；

E₁₄Represent carbon number as 1 to 20 alkyl, phenyl or carbon number as 1 to 8 alkoxy；

E₁₅Phenyl, naphthyl, carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through as follows at least one Group substitutes, and an at least group is selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, OE₁₇、SE₁₈, be mixed with There is the alkyl that an at least O or S and carbon number are 2 to 20, or it respectively substitutes through the alkyl that one or more carbon numbers are 1 to 20, the carbon Number is to be unsubstituted or substitute through an at least group as follows for 1 to 20 alkyl, and an at least group is selected from halogen original Son, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl, carbon number be 6 to 20 virtue Epoxide carbonyl, the Heteroaryloxycarbonyl that carbon number is 4 to 20, OE₁₇、SE₁₈、NE₁₉E₂₀Or PO (OC_kH_2k+1)₂；Or

E₁₅Carbon number is represented as 1 to 20 alkyl, it is to be unsubstituted or substitute through an at least group as follows, and extremely A few group is selected from OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl, NE₁₉E₂₀、COOE₁₇、 CONE₁₉E₂₀Or PO (OC_kH_2k+1)₂；

E₁₆Phenyl is represented, it is to be unsubstituted or substitute through an at least group as follows, and at least a group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀, be mixed with least O, S or NE₂₆And carbon number is 2 to 20 alkyl；Or

E₁₆Phenyl is represented, is to substitute through the alkyl that an at least carbon number is 1 to 20, wherein carbon number is that 1 to 20 alkyl is not It is substituted or substitutes through an at least group as follows, and an at least group is selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, benzene Aryloxycarbonyl that heteroaryl that cycloalkyl that base, carbon number are 3 to 8, carbon number are 3 to 20, carbon number are 6 to 20, carbon number are 4 to 20 Heteroaryloxycarbonyl, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₆Carbon number is represented as 1 to 20 alkyl, E₁₆It is to be unsubstituted or substitute through an at least group as follows, and An at least group is selected from halogen atom, phenyl, OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂(CO)O(R₁)、O (CO)-(R₁) or (CO) O (R₁)；

E₁₇Carbon number is represented as 1 to 20 alkyl, it is to be unsubstituted or substitute through an at least group as follows, and extremely A few group is selected from halogen atom, OCH₂CH₂(CO)O(R₁)、O(R₁)、(CO)O(R₁), carbon number be 3 to 20 cycloalkyl, wherein The cycloalkyl that carbon number is 3 to 20 is not to be mixed with or be mixed with an at least O；Or

E₁₇Carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with an at least O；

E₁₈Represent and pass through (CO) OE₁₇Substituted methyl；

E₁₉And E₂₀Independently represent hydrogen atom, phenyl, carbon number as 1 to 20 alkyl, carbon number as 1 to 8 alkanoyl or Carbon number is 1 to 8 alkanoyl epoxide；Or

E₁₉And E₂₀That heteroaromatic ring system is formed together with the nitrogen-atoms being bonded, heteroaromatic ring system be without Substitution or warpSubstitution, but condition is the light initiator (E-1) of the structure as shown in chemical formula E1 With at least one

Chemical formula E1 as defined above compound, wherein E must be paid attention to₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Respectively Independently represent hydrogen atom,COE₁₆Or NO₂；

E₃And E₄It is together

E₉、E₁₀、E₁₁And E₁₂For hydrogen atom；

Z₁For singly-bound；

E₁₃It is the alkyl that carbon number is 1 to 20；

E₁₄It is the alkyl that carbon number is 1 to 20；

E₁₅It is the alkyl that carbon number is 1 to 20 or the phenyl substituted through a following at least group, wherein at least a group can For OE₁₇Or the alkyl that carbon number is 1 to 20；

E₁₆It is phenyl, phenyl is that a wherein at least group can be OE through following at least group substitution₁₇Or carbon number is 1 To 20 alkyl；

E₁₇It is that the carbon number for being unsubstituted or substituting through an at least halogen atom is 1 or 20 alkyl or is mixed with and has an at least oxygen The carbon number of atom is 1 to 20 alkyl, but is existed in compound of the condition for the structural formula as shown in chemical formula E1 at least one

In one more preferably embodiment, light initiator (E) includes the light initiator (E- of the structure as shown in chemical formula E1 1), wherein E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Independently represent hydrogen atom；Or

E₁And E₂、E₃And E₄Or E₅And E₆It is separately common to representAn and at least E₁And E₂、E₃And E₄Or E₅And E₆ForOr

E₂RepresentCOE₁₆、NO₂OrOr

E₇RepresentOr COE₁₆；

E₉、E₁₁And E₁₂Represent hydrogen atom；

E₁₀Represent hydrogen atom, OE₁₇Or COE₁₆；

Z₁Represent CO or singly-bound；

E₁₃Carbon number is represented as 1 to 20 alkyl, it is to be unsubstituted or substitute through an at least group as follows, and extremely A few group is selected from halogen atom, E₁₇、OE₁₇、SE₁₈Or PO (OC_kH_2k+1)₂；Or

E₁₃Carbon number is represented as 2 to 20 alkyl, it is to be mixed with an at least O；Or

E₁₃Represent phenyl；

K represents integer 2；

E₁₄Carbon number is represented as 1 to 20 alkyl or thienyl；

E₁₅Phenyl or naphthyl is represented, and it is respectively unsubstituted or through an at least OE₁₇Or the alkyl that carbon number is 1 to 20 substitutes； Or

E₁₅Thienyl, hydrogen atom or carbon number are represented as 1 to 20 alkyl, wherein carbon number is that 1 to 20 alkyl is without taking In generation, substitutes through an at least group as follows, and an at least group is selected from OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, NE₁₉E₂₀Or COOE₁₇；Or

E₁₅Carbon number is represented as 2 to 20 alkyl, and the alkyl that carbon number is 2 to 20 is mixed with and has SO₂；

E₁₆Phenyl or naphthyl is represented, it is respectively unsubstituted or substituted through an at least group as follows, and an at least base Group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀Or the alkyl that carbon number is 1 to 20；Or

E₁₆Represent thienyl；

E₁₇Represent hydrogen atom, carbon number as 1 to 8 alkanoyl or carbon number as 1 to 20 alkyl, carbon number be 1 to 20 alkyl To be unsubstituted or substitute through an at least group as follows, and an at least group be selected from halogen atom, O (CO)- (R₁)、O(CO)-(R₆), or it is mixed with the cycloalkyl that an at least O and carbon number are 3 to 20；Or

E₁₇Carbon number is represented as 2 to 20 alkyl, and the alkyl that carbon number is 2 to 20 is mixed with an at least O；

E₁₈Represent carbon number as 3 to 20 cycloalkyl, carbon number as 1 to 20 alkyl, its be unsubstituted or through an at least OH, O(CO)-(R₆) or (CO) OE₁₇Substitution；Or

E₁₈Phenyl is represented, it is to be unsubstituted or substitute through an at least halogen atom；

E₁₉And E₂₀Be separately represent carbon number as 1 to 8 alkanoyl or carbon number as 1 to 8 alkanoyl epoxide；Or

E₁₉And E₂₀It is to be formed to be mixed with have O five yuan or hexa-atomic saturated rings together with the nitrogen-atoms being bonded, but condition is such as The smooth initiator (E-1) of structure shown in chemical formula E1 has at least one

The chemical formula E1-a to chemical formula E1-g that the specific example of the light initiator (E-1) of the present invention is as defined above Compound, chemical formula E1-a, chemical formula E1-b, chemical formula E1-c, especially chemical formula E1-a or chemical formula E1-c or chemical formula E1-a, chemical formula E1-c or chemical formula E1-d, especially chemical formula E1-a compound attract people's attention.

In an example, E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Independently represent hydrogen atom, Or COE₁₆, or E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈It is independently uncommon to represent

In an example, E₁And E₂Or E₃And E₄It is jointlyOr E₃And E₄、E₅And E₆It is jointlyE₃And E₄Especially it is jointly

In an example, E₁、E₅、E₆And E₈Represent hydrogen atom.It is preferred that E₇Represent hydrogen atom, Or COE₁₆, or E₇RepresentOr COE₁₆, so with E₇RepresentFor more preferably.Preferably Ground, E₂RepresentCOE₁₆OrOr E₂And E₁It is jointlySo with E₂Represent COE₁₆For more preferably.Z₁Preferably singly-bound.

In an example, E₉、E₁₀、E₁₁And E₁₂Separately represent hydrogen atom, carbon number as 1 to 20 alkyl, without taking The phenyl in generation or the phenyl substituted through an at least group as follows, and an at least group be selected from alkyl that carbon number is 1 to 6, Halogen atom, OE₁₇Or SE₁₈；Or

E₉、E₁₀、E₁₁And E₁₂Separately represent halogen atom, OE₁₇、SE₁₈Or NE₁₉E₂₀, wherein substituent OE₁₇、 SE₁₈Or NE₁₉E₂₀It is optionally via group E₁₇、E₁₈、E₁₉And/or E₂₀With a carbon atom shape of the naphthalene nucleus in chemical formula E1 Into five-membered ring or six membered ring；Or

E₉、E₁₀、E₁₁And E₁₂Separately representOr COE₁₆。

In a specific example, E₉、E₁₀、E₁₁And E₁₂Separately represent hydrogen atom, carbon number as 1 to 20 alkyl, The phenyl being unsubstituted or the phenyl substituted through an at least group as follows, and it is 1 to 6 that an at least group, which is selected from carbon number, Alkyl, halogen atom, OE₁₇Or SE₁₈；Or

E₉、E₁₀、E₁₁And E₁₂Separately represent halogen atom, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₉、E₁₀、E₁₁And E₁₂Separately representOr COE₁₆。

In an example, E₉、E₁₀、E₁₁And E₁₂Separately represent hydrogen atom, carbon number as 1 to 20 alkyl, without taking The phenyl in generation or through one or more carbon numbers be 1 to 6 alkyl-substituted phenyl；Or E₉、E₁₀、E₁₁And E₁₂Separately representOr COE₁₆。

In another example, E₉、E₁₀、E₁₁And E₁₂Independently represent hydrogen atom, carbon number as 1 to 20 alkyl, without taking The phenyl in generation or the phenyl substituted through an at least group as follows, and an at least group be selected from alkyl that carbon number is 1 to 6, Halogen atom, OE₁₇Or SE₁₈；Or

E₉、E₁₀、E₁₁And E₁₂Independently represent halogen atom, OE₁₇、SE₁₈Or NE₁₉E₂₀, wherein substituent OE₁₇、SE₁₈ Or NE₁₉E₂₀It is optionally via group E₁₇、E₁₈、E₁₉And/or E₂₀Formed with a carbon atom of the naphthalene nucleus in chemical formula E1 Five-membered ring or six membered ring.

In addition, in an example, E₉、E₁₀、E₁₁And E₁₂Independently represent hydrogen atom, carbon number as 1 to 20 alkyl, not The phenyl being substituted or the phenyl substituted through an at least group as follows, at least a group are selected from the alkane that carbon number is 1 to 6 Base, halogen atom, OE₁₇Or SE₁₈；Or E₉、E₁₀、E₁₁And E₁₂Independently represent halogen atom, OE₁₇、SE₁₈、NE₁₉E₂₀Or COE₁₆。

Or in an example, E₉、E₁₀、E₁₁And E₁₂Independently represent hydrogen atom, carbon number as 1 to 20 alkyl, not The phenyl being substituted or the phenyl substituted through an at least group as follows, at least a group are selected from the alkane that carbon number is 1 to 6 Base, halogen atom, OE₁₇Or SE₁₈；Or E₉、E₁₀、E₁₁And E₁₂Independently represent halogen atom, OE₁₇、COE₁₆Or NE₁₉E₂₀。

It is preferred that E₉、E₁₁And E₁₂It is hydrogen atom, and E₁₀For hydrogen atom, OE₁₇Or COE₁₆。

E₁₃It is for example to represent carbon number as 1 to 20 alkyl, it is to be unsubstituted or taken through an at least group as follows Generation, wherein an above-mentioned at least group is selected from halogen atom, COOE₁₇Or CONE₁₉E₂₀；Or

E₁₃Carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with to have one or more O, S, SO, SO₂、 NE₂₆Or CO；

E₁₃Carbon number is represented as 2 to 12 alkenyl, the alkenyl that carbon number is 2 to 12 is not to be mixed with or be mixed with to have one or more O, CO Or NE₂₆；Or

E₁₃Carbon number is represented as 3 to 10 cycloalkyl, cycloalkyl is not to be mixed with or be mixed with to have one or more O, S, CO or NE₂₆； Or

E₁₃Phenyl or naphthyl is represented, and it is respectively to be unsubstituted or substituting through an at least group as follows, wherein extremely A few group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀、COE₁₆、NO₂, halogen atom, carbon number be 1 to 20 Alkyl, carbon number be 1 to 4 haloalkyl, be mixed with through an at least O and carbon number be 2 to 20 alkyl；Or represent carbon number as 1 to 20 alkyl, it is to be unsubstituted or substitute through an at least group as follows, wherein an above-mentioned at least group is selected from halogen Plain atom, E₁₇、COOE₁₇、OE₁₇、SE₁₈、CONE₁₉E₂₀Or PO (OC_kH_2k+1)₂；Or carbon number is represented as 2 to 20 alkyl, between it is It is miscellaneous to have one or more O.

In addition, E₁₃Carbon number is represented as 1 to 20 alkyl, it is to be unsubstituted or taken through an at least group as follows Generation, wherein an above-mentioned at least group is selected from halogen atom, E₁₇、COOE₁₇、OE₁₇、SE₁₈、CONE₁₉E₂₀Or PO (OC_kH_2k+1)₂； Or carbon number is represented as 2 to 20 alkyl, the alkyl that carbon number is 2 to 20 is to be mixed with to have an O；Or carbon number is represented as 2 to 12 alkene Base, the cycloalkyl that carbon number is 3 to 10；Or E₁₃Represent phenyl or naphthyl, and its respectively for be unsubstituted or through it is as follows at least One group substitutes, and a wherein at least group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀、COE₁₆、NO₂, halogen Haloalkyl that alkyl that atom, carbon number are 1 to 20, carbon number are 1 to 4, it is mixed with the alkane that the carbon number for there are one or more O is 2 to 20 Base.

In another embodiment, E₁₃Carbon number is represented as 1 to 20 alkyl, its be unsubstituted or through it is as follows at least One group substitutes, wherein an above-mentioned at least group is selected from halogen atom, E₁₇、OE₁₇、SE₁₈Or PO (OC_kH_2k+1)₂；Or represent It is mixed with the alkyl for having that one or more O and carbon number are 2 to 20；Or represent carbon number as 2 to 12 alkenyl, carbon number as 3 to 10 cycloalkanes Base, phenyl or naphthyl.

Or E₁₃Such as carbon number can be represented as 1 to 20 alkyl, it is unsubstituted or through an at least base as follows Group's substitution, wherein an above-mentioned at least group is selected from halogen atom, E₁₇、OE₁₇、SE₁₈Or PO (OC_kH_2k+1)₂；Or represent at least one The alkyl that O is mixed with and carbon number is 2 to 20；Or represent phenyl, carbon number as 2 to 12 alkenyl or carbon number as 3 to 10 cycloalkyl.

Or E₁₃Can represent carbon number as 1 to 20 alkyl, phenyl, carbon number as 2 to 12 alkenyl or carbon number as 3 to 10 Cycloalkyl.Or E₁₃Be carbon number be 1 to 20 alkyl, carbon number be 2 to 12 alkenyl or carbon number be 3 to 10 cycloalkyl.It is preferred that E₁₃Carbon number can be represented as the alkyl that 1 to 20 alkyl, especially carbon number are 1 to 8, such as 2- ethylhexyls；

E₁₄Can for example represent hydrogen atom, carbon number as 3 to 8 cycloalkyl, carbon number as 2 to 5 alkenyl, carbon number is 1 to 20 Alkoxy or the alkyl that carbon number is 1 to 20, it is to be unsubstituted or substitute through an at least halogen atom or phenyl；Or

E₁₄Phenyl or naphthyl is represented, it is respectively to be unsubstituted or substitute through an at least group as follows, and at least one Group is selected from the alkyl that carbon number is 1 to 6, the haloalkyl that carbon number is 1 to 4, halogen atom, OE₁₇、SE₁₈And/or NE₁₉E₂₀；Or

E₁₄Carbon number is represented as 3 to 5 heteroaryl, such as thienyl, or represent carbon number as 1 to 8 alkoxy, Benzyl epoxides or Phenoxy group.

Or E₁₄Carbon number can for example be represented as 1 to 20 alkyl, and the alkyl that carbon number is 1 to 20 is through an at least halogen Atom or phenyl substitutes；Or

E₁₄Represent carbon number as 3 to 5 heteroaryl (such as thienyl) or represent be unsubstituted or through it is as follows at least The phenyl of one group substitution, and to be selected from haloalkyl, halogen that alkyl, carbon number that carbon number is 1 to 6 are 1 to 4 former for an at least group Son, OE₁₇、SE₁₈And/or NE₁₉E₂₀；Or

E₁₄Carbon number is represented as 1 to 8 alkoxy, Benzyl epoxides or phenoxy group.

In another embodiment, E₁₄The alkyl of carbon number 1 to 20 is represented, and the alkyl of carbon number 1 to 20 is to be unsubstituted or pass through Phenyl substitutes；Or

E₁₄It is phenyl, and phenyl is unsubstituted or substituted through the alkyl that an at least carbon number is 1 to 6.

It is preferred that E₁₄Be carbon number be 1 to 20 alkyl, carbon number be 3 to 5 heteroaryl (such as thienyl), or phenyl, In particular carbon number is 1 to 20 alkyl or thienyl, and more preferably carbon number is 1 to 8 alkyl.

E₁₅May be, for example, the aryl that carbon number is 6 to 20 or the heteroaryl that carbon number is 5 to 20, it is respectively unsubstituted or through as follows Shown at least group substitution, and an at least group selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, CN, NO₂、OE₁₇、SE₁₈、NE₁₉E₂₀, carbon number be 1 to 20 alkyl；Or

E₁₅It is hydrogen atom, the cycloalkyl that carbon number is 3 to 8, wherein carbon number is that 3 to 8 cycloalkyl is without being mixed with or being mixed with There are one or more O, CO or NE₂₆；Or

E₁₅It is the alkyl that carbon number is 1 to 20, the alkyl that carbon number is 1 to 20 is unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from halogen atom, OE₁₇, carbon number be 3 to 8 cycloalkyl, carbon number be 5 to 20 heteroaryl, Heteroaryloxy-carbonyl that phenyloxycarbonyl that carbon number is 8 to 20, carbon number are 5 to 20, NE₁₉E₂₀、COOE₁₇、CONE₁₉E₂₀、PO (OC_kH_2k+1)₂、Phenyl or the phenyl substituted through following group, above-mentioned group is selected from halogen atom, carbon number The haloalkyl for being 1 to 4 for 1 to 20 alkyl, carbon number, OE₁₇Or NE₁₉E₂₀；Or

E₁₅It is the alkyl that carbon number is 2 to 20, and the alkyl that carbon number is 2 to 20 is mixed with and has at least O, S or SO₂；Or

E₁₅Be carbon number be 2 to 20 alkanoyl, benzoyl, carbon number be 2 to 12 alkoxy carbonyl, phenyloxycarbonyl, CONE₁₉E₂₀、NO₂Or the haloalkyl that carbon number is 1 to 4.

In addition, E₁₅May be, for example, hydrogen atom, the aryl that carbon number is 6 to 20, in particular phenyl or naphthyl, phenyl or naphthyl is Respectively it is unsubstituted or substitutes through the alkyl that carbon number is 1 to 12；Or the heteroaryl that carbon number is 3 to 5, such as thienyl；Or carbon The alkyl that cycloalkyl that number is 3 to 8, carbon number are 1 to 20, it is to be unsubstituted or substitute through an at least group as follows, And an at least group is selected from OE₁₇、SE₁₇, carbon number be 3 to 8 cycloalkyl, NE₁₉E₂₀Or COOE₁₇；Or

E₁₅It is the alkyl that carbon number is 2 to 20, and the alkyl that carbon number is 2 to 20 is mixed with and has an at least O or SO₂。

In the compound as shown in chemical formula E1, E₁₅May be, for example, hydrogen atom, phenyl, naphthyl, its be respectively unsubstituted or Substitute through the alkyl that carbon number is 1 to 8；Or

E₁₅It is thienyl, the alkyl that carbon number is 1 to 20, it is unsubstituted or substituted through an at least group as follows, And an at least group is selected from OE₁₇、SE₁₇, carbon number be 3 to 8 cycloalkyl, NE₁₉E₂₀Or COOE₁₇；Or

E₁₅In particular (such as) carbon number be 3 to 8 cycloalkyl or carbon number be 1 to 20 alkyl, preferably carbon number be 1 to 20 Alkyl, more preferably carbon number be 1 to 12 alkyl.

E'₁₄And E'₁₅Preferably respectively have as described above for E₁₄And E₁₅One of which in defining.

Z₂Be (such as) O, S or SO, such as O or S, in particular O.

E₁₆May be, for example, aryl (especially phenyl or naphthyl, especially phenyl) that carbon number is 6 to 20 or carbon number be 5 to 20 it is miscellaneous Aryl (especially thienyl), it is respectively unsubstituted or substituted through an at least group as follows, and at least a group is selected from Phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, CN, NO₂、OE₁₇、SE₁₈、NE₁₉E₂₀Or it is mixed with least O carbon number and is 1 to 20 alkyl；Or it respectively substitutes through the alkyl that an at least carbon number is 1 to 20, the alkyl that carbon number is 1 to 20 is unsubstituted or passed through At least group substitution as follows, and an at least group is selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number The heteroaryl that aryloxycarbonyl that the heteroaryl for being 5 to 20 for 3 to 8 cycloalkyl, carbon number, carbon number are 6 to 20, carbon number are 5 to 20 Epoxide carbonyl, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₆It is hydrogen atom, the alkyl that carbon number is 1 to 20, and the alkyl that carbon number is 1 to 20 is unsubstituted or through as follows An at least group substitution, and an at least group selected from halogen atom, phenyl, OH, SH, carbon number be 3 to 6 alkenyloxy group, OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁), O (CO)-phenyl, (CO) OH or (CO) O (R₁)；Or

E₁₆It is the alkyl that carbon number is 2 to 12, and the alkyl that carbon number is 2 to 12 is mixed with and has an at least O；Or

E₁₆It is (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 12 alkenyl or carbon number be 3 to 8 ring Alkyl, and n is 1 to 20, such as 1 to 12 or 1 to 8, in particular 1 or 2.

In addition, E₁₆May be, for example, phenyl or naphthyl, in particular phenyl, thienyl or carbazole, it is respectively unsubstituted or through such as At least group substitution shown in lower, and an at least group selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, OE₁₇、SE₁₈、NE₁₉E₂₀Or the alkyl that carbon number is 1 to 20；Or

E₁₆It is the alkyl that carbon number is 1 to 20, the alkyl that carbon number is 1 to 20 is unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from halogen atom, phenyl, OH, SH, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂(CO)O (R₁)、O(CO)-(R₁), O (CO)-phenyl, (CO) OH or (CO) O (R₁)；Or

E₁₆It is the alkyl that carbon number is 2 to 12, and the alkyl that carbon number is 2 to 12 is to be mixed with to have an at least O；Or

In addition, E₁₆May be, for example, phenyl or naphthyl, in particular phenyl, it is respectively unsubstituted or through as follows at least one Group substitutes, and an at least group is selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, OE₁₇、SE₁₈、NE₁₉E₂₀ Or the alkyl that carbon number is 1 to 20；Or

E₁₆It is the heteroaryl that carbon number is 3 to 5, in particular thienyl.

E₁₆In particular (such as) phenyl, phenyl is unsubstituted or substitutes through an at least group as follows, and at least one Group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀Or the alkyl that carbon number is 1 to 20, or E₁₆It is thienyl.

It is preferred that E₁₆Be (such as) phenyl or naphthyl, it is respectively unsubstituted or taken through the alkyl that an at least carbon number is 1 to 20 Generation.

E₁₆In particular phenyl, and phenyl substitutes through the alkyl that an at least carbon number is 1 to 20.

E₁₇May be, for example, hydrogen atom, phenyl-R₅, carbon number be 1 to 20 alkyl, it is unsubstituted or through as follows An at least group substitutes, and an at least group is selected from halogen atom, OH, OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁)、O (CO)-(R₆), O (CO)-phenyl, (CO) OH, (CO) O (R₁), carbon number be 3 to 20 cycloalkyl or be mixed with the carbon number for having an at least O For 3 to 20 cycloalkyl；Or

E₁₇It is the alkyl that carbon number is 2 to 20, and the alkyl that carbon number is 2 to 20 is mixed with and has an at least O；Or

E₁₇It is (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 1 to 8 alkanoyl, carbon number be 2 to 12 alkene The cycloalkyl that the enoyl- or carbon number that base, carbon number are 3 to 6 are 3 to 20, it is that have an at least O without being mixed with or being mixed with；Or

E₁₇It is benzoyl, and benzoyl is to be unsubstituted or substitute through an at least group as follows, and at least The alkoxy substitution that one group is 1 to 3 selected from alkyl, halogen atom, OH or the carbon number that carbon number is 1 to 6；Or

E₁₇It is the heteroaryl that phenyl, naphthyl or carbon number are 5 to 20, it is respectively unsubstituted or through an at least base as follows Group's substitution, and an at least group be 1 to 12 selected from halogen atom, OH, carbon number alkyl, carbon number be 1 to 12 alkoxy, CN、NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, diphenyl-amino or

In another embodiment, E₁₇Be (such as) hydrogen atom, phenyl-R₅, carbon number be 1 to 20 alkyl, it is without taking In generation, substitutes through an at least group as follows, and an at least group is selected from halogen atom, O (CO)-(R₁)、O(CO)- (R₆) or be mixed with have an at least O carbon number be 2 to 20 alkyl；Or

E₁₇Be carbon number be 1 to 8 alkanoyl, carbon number be 2 to 12 alkenyl, carbon number be 3 to 6 enoyl-, be mixed with have to Alkyl that few O carbon number is 2 to 20, the cycloalkyl for being 3 to 20 without being mixed with or being mixed with the carbon number for having an at least O；Or

E₁₇It is benzoyl, benzoyl is to be unsubstituted or substitute through an at least group as follows, and at least one The alkoxy that group is 1 to 3 selected from alkyl, halogen atom, OH or the carbon number that carbon number is 1 to 6；Or

E₁₇It is phenyl or naphthyl, it is respectively unsubstituted or substituted through an at least group as follows, and an at least group The alkoxy that the alkyl or carbon number for being 1 to 12 selected from halogen atom, carbon number are 1 to 12.

E₁₇Also for (such as) hydrogen atom, phenyl-R₅, carbon number be 1 to 8 alkanoyl, carbon number be 1 to 20 alkyl, it is It is unsubstituted or substitutes through an at least group as follows, and an at least group is 3 to 20 selected from halogen atom, carbon number Cycloalkyl, O (CO)-(R₁)、O(CO)-(R₆) or be mixed with the alkyl that the carbon number for having an at least O is 2 to 20, or E₁₇It is that carbon number is 2 To 20 alkyl, it, which is mixed with, an at least O.

E₁₇The alkyl that alkanoyl that in particular hydrogen atom, carbon number are 1 to 8, carbon number are 1 to 20, it is to be unsubstituted or pass through At least group substitution as follows, and an at least group is selected from O (CO)-(R₁)、O(CO)-(R₆) or be mixed with and have at least one O carbon number is 2 to 20 alkyl, or E₁₇It is the alkyl that carbon number is 2 to 20, it, which is mixed with, an at least O.

E₁₈Be (such as) carbon number be 3 to 20 cycloalkyl, it has an at least O without being mixed with or being mixed with；Or

E₁₈It is the alkyl that carbon number is 1 to 20, it is unsubstituted or substituted through an at least group as follows, and at least one Group is selected from OH, O (CO)-(R₆)、O(CO)-(R₁) or (CO) OE₁₇；Or

E₁₈It is the alkyl that carbon number is 2 to 20, it, which is mixed with, at least O, S, CO, NE₂₆Or COOE₁₇；Or

E₁₈It is the alkanoyl that carbon number is 2 to 8 or the enoyl- that carbon number is 3 to 6, benzoyl；Or

E₁₈It is the heteroaryl that phenyl, naphthyl or carbon number are 3 to 20, it is respectively unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from the haloalkyl, carbon number that halogen atom, the alkyl that carbon number is 1 to 12, carbon number are 1 to 4 For 1 to 12 alkoxy or NO₂。

In another embodiment, E₁₈Be (such as) carbon number be 3 to 20 cycloalkyl, carbon number be 1 to 20 alkyl, it is not It is substituted or substitutes through an at least group as follows, and an at least group is selected from OH, O (CO)-(R₆)、O(CO)-(R₁) Or (CO) OE₁₇；Or

E₁₈It is phenyl or naphthyl, it is respectively unsubstituted or through the alkyl that an at least halogen atom or carbon number are 1 to 12, especially Halogen atom substitutes.

E₁₈Be (such as) carbon number be 1 to 20 alkyl, carbon number be 2 to 12 alkenyl, carbon number be 3 to 20 cycloalkyl, benzene Base-R₅, carbon number be 2 to 8 alkanoyl, benzoyl, phenyl or naphthyl.

For example, E₁₈It is the alkyl that carbon number is 1 to 20, it substitutes through an at least group as follows, and at least one Group is selected from OH, O (CO)-(R₆)、O(CO)-(R₁) or (CO) OE₁₇, or E₁₈It is phenyl, it takes through an at least halogen atom Generation.

It is preferred that E₁₈It is the alkyl that carbon number is 1 to 8, it is substituted as hereinbefore defined.

For example, E₁₉And E₂₀Be separately hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 2 to 4 hydroxyl Alkyl, the cycloalkyl that carbon number is 3 to 20, phenyl-R₅, phenyl or naphthyl, carbon number be 1 to 8 alkanoyl, carbon number be 1 to 8 alkane Acyloxy, the enoyl- or benzoyl that carbon number is 3 to 12；Or

E₁₉And E₂₀It is to be formed to have O, S or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or hexa-atomic Saturation or unsaturation ring；Or

E₁₉And E₂₀It is that heteroaromatic ring system is formed together with the nitrogen-atoms being bonded, heteroaromatic ring system is without taking In generation, substitutes through an at least group as follows, and it is 1 to 4 that an at least group, which is selected from alkyl, carbon number that carbon number is 1 to 20, Haloalkyl or

In addition, for example, E₁₉And E₂₀Be separately hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 2 to 4 Hydroxy alkyl, carbon number be 3 to 20 cycloalkyl, phenyl-R₅, carbon number be 1 to 8 alkanoyl, carbon number be 1 to 8 alkanoyl Epoxide, the enoyl- or benzoyl that carbon number is 3 to 12；Or

E₁₉And E₂₀It is to be formed to have O or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or hexa-atomic full And ring；Or

E₁₉And E₂₀It is that carbazole ring is formed together with the nitrogen-atoms being bonded.

For example, E₁₉And E₂₀Be separately hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 2 to 4 hydroxyl Alkyl, the cycloalkyl that carbon number is 3 to 20, phenyl-R₅, carbon number be 1 to 8 alkanoyl, carbon number be 1 to 8 alkanoyl epoxide, carbon Number is 3 to 12 enoyl- or benzoyl；Or

E₁₉And E₂₀It is to be formed to have O or NE without being mixed with or being mixed with together with the nitrogen-atoms being bonded₁₇Five yuan or hexa-atomic full And ring.

It is preferred that E₁₉And E₂₀Be separately carbon number be 1 to 8 alkanoyl, carbon number be 1 to 8 alkanoyl epoxide； Or

E₁₉And E₂₀It is to form morpholine ring with the nitrogen-atoms being bonded.

For example, E₂₁And E₂₂Be separately hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 1 to 4 halo Alkyl, the cycloalkyl that carbon number is 3 to 10 or phenyl；Or

E₂₁And E₂₂It is to form morpholine ring with the nitrogen-atoms being bonded.E₂₁And E₂₂Especially it is separately hydrogen atom or carbon Number is 1 to 20 alkyl.

E₂₃Be (such as) hydrogen atom, OH, phenyl or carbon number be 1 to 20 alkyl.E₂₃In particular hydrogen atom, OH or carbon number For 1 to 4 alkyl.

E₂₄Be preferably configured to such as E₁₉And E₂₀Defined one of which.E₂₅Be preferably configured to such as E₁₇Defined One of which.

E₂₆Be (such as) hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 1 to 4 haloalkyl, carbon number be 2 to 20 Alkyl, it, which is mixed with, an at least O or CO；Or

E₂₆It is phenyl-R₁, carbon number be 3 to 8 cycloalkyl, and carbon number be 3 to 8 cycloalkyl be without being mixed with or being mixed with one Or multiple O or CO；Or

E₂₆It is (CO) E₁₉Or phenyl, and phenyl is to be unsubstituted or substitute through a following at least group, at least a group can Haloalkyl that the alkyl for being 1 to 20 for carbon number, halogen atom, carbon number are 1 to 4, OE₁₇、SE₁₈、NE₁₉E₂₀；Or

E₂₆Represent (such as) hydrogen atom, carbon number be 1 to 20 alkyl, carbon number be 1 to 4 haloalkyl；It is phenyl-R₁、 Cycloalkyl, (CO) E that carbon number is 3 to 8₁₉Or phenyl, and phenyl is to be unsubstituted or taken through the alkyl that an at least carbon number is 1 to 20 Generation.In addition, E₂₆Be (such as) hydrogen or carbon number be 1 to 20 alkyl, the alkyl that in particular carbon number is 1 to 4.

The concrete example of the light initiator (E-1) of the foregoing structure with as shown in chemical formula E1 is such as, but not limited to such as The light initiator of structure shown in lower chemical formula E-1 to chemical formula E-86.

Usage amount based on alkali soluble resin (C) is 100 parts by weight, and the usage amount scope of light initiator (E-1) is 10 Parts by weight are to 50 parts by weight, and preferably 13 parts by weight are to 47 parts by weight, and more preferably 16 parts by weight are to 44 parts by weight.When using institute When stating light initiator (E-1), the resistance to sputter of the colored filter of the photosensitive resin composition formation of gained is more preferably.

《Light initiator (E-2)》

It is preferred that the smooth initiator (E) can further include light initiator (E-2).The smooth initiator has as changed Structure shown in formula E2

【Chemical formula E2】

Can further improve sensitivity to consider, E₃₀Represent that the organic group of cycloalkyl for being 3 to 10 containing carbon number is Preferably, E₃₀Represent the organic group for the cycloalkyl for being 5 to 8 containing carbon number for more preferably.

E₃₀It can be mixed with the hydrocarbon-based for having divalence to contain to represent the organic group containing the cycloalkyl that carbon number is 3 to 20 The organic group of cycloalkyl, the example of the divalence hydrocarbon-based are preferably alkylidene, and more preferably carbon number is 2 to 5 alkylidene, most Good is ethylidene.

The E₃₀It is the organic group containing the cycloalkyl that carbon number is 3 to 20, preferably cycloalkyl alkylidene, more preferably ring Amyl group ethyl.

In the chemical formula E2, further to lift sensitivity to consider, the E₃₁For alkyl or aryl, preferably alkyl, More preferably it is the alkyl that carbon number is 1 to 5, is most preferably methyl.

In the chemical formula E2, further to lift sensitivity to consider, the E₃₂For alkyl or aryl, preferably alkyl, More preferably it is the alkyl that carbon number is 1 to 10, is most preferably ethyl.

In the chemical formula E2, further to lift sensitivity to consider, the E₃₃For alkyl, preferably carbon number is 1 to 5 Alkyl, more preferably methyl.

In the chemical formula E2, E₃₃The position of substitution can be ortho position, meta or para position.Further to improve sensitivity to examine Amount, preferably ortho position.

In example by the chemical formula E2 compounds represented, E₃₀It is cycloalkyl ethylidene, E₃₁It is methyl, E₃₂It is ethyl, E₃₃ It is methyl, specific commodity are, for example, TR-PBG-304 of Changzhou strength Co., Ltd. etc..

The concrete example of the smooth initiator (E-2) such as, but not limited to has following chemical formula E2-a to chemical formula E2-j institutes The light initiator for the structure shown.

【Chemical formula E2-a】

【Chemical formula E2-b】

【Chemical formula E2-c】

【Chemical formula E2-d】

【Chemical formula E2-e】

【Chemical formula E2-f】

【Chemical formula E2-g】

【Chemical formula E2-h】

【Chemical formula E2-i】

【Chemical formula E2-j】

Usage amount based on alkali soluble resin (C) is 100 parts by weight, and the usage amount scope of light initiator (E-2) is 10 Parts by weight are to 50 parts by weight, and preferably 13 parts by weight are to 47 parts by weight, and more preferably 16 parts by weight are to 44 parts by weight.When using institute When stating light initiator (E-2), the resistance to sputter of the colored filter of the photosensitive resin composition formation of gained is more preferably.

《Light initiator (E-3)》

It is preferred that the smooth initiator (E) can further include other free radical type light initiators (E-3).

Other free radical type light initiators (E-3) can be selected from acetophenone based compound (acetophenone), two Imidazole compound (biimidazole), acyl oxime compound (acyl oxime) or these combination.

Above-mentioned acetophenone based compound is selected to dimethylamino acetophenone (p-dimethylamino- Acetophenone), α, α '-dimethoxy azoxy acetophenone (α, α '-dimethoxyazoxy-acetophenone), 2,2 '-dimethyl -2- phenyl acetophenones (2,2 '-dimethyl-2-phenyl-acetophenone), acetanisole (p-methoxy-acetophenone), 2- methyl isophthalic acids-(4- methylthiophenyis) -2- morpholino -1- acetone [2-methyl- 1- (4-methylthio phenyl) -2-morpholino-1-propanone], 2- benzyls -2-N, N- dimethylamino -1- (4- Morphlinophenyl) -1- butanone [2-benzyl-2-N, N-di-methylamino-1- (4-morpholinophenyl) -1- butanone]。

Above-mentioned diimidazole based compound is selected from 2,2 '-bis- (o- chlorphenyls) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (o-chlorophenyl) -4,4 ', 5,5 '-tetraphenyl-biimidazole], 2,2 '-bis- (ortho-fluorophenyls Base) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (o-fluorophenyl) -4,4 ', 5,5 '-tetraphenyl- Biimidazole], 2,2 '-bis- (ortho-methyl phenyl) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (o-methyl ) -4,4 ', phenyl 5,5 '-tetraphenyl-biimidazole], 2,2 '-bis- (o- methoxyphenyls) -4,4 ', 5,5 ' - Tetraphenyl diimidazole [2,2 '-bis (o-methoxyphenyl) -4,4 ', 5,5 '-tetraphenyl-biimidazole], 2, 2 '-bis- (o- ethylphenyls) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (o-ethylphenyl) -4,4 ', 5,5 ' - Tetraphenyl-biimidazole], 2,2 '-bis- (p-methoxyphenyls) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 ' - Bis (p-methoxyphenyl) -4,4 ', 5,5 '-tetraphenyl-biimidazole], 2,2 '-bis- (2,2 ', 4,4 '-four Methoxyphenyl) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (2,2 ', 4,4 '-tetramethoxyphenyl) -4, 4 ', 5,5 '-tetraphenyl-biimidazole], 2,2 '-bis- (2- chlorphenyls) -4,4 ', 5,5 '-tetraphenyl diimidazole [2, 2 '-bis (2-chlorophenyl) -4,4 ', 5,5 '-tetraphenyl-biimidazole], 2,2 '-bis- (2,4 dichloro benzenes Base) -4,4 ', 5,5 '-tetraphenyl diimidazole [2,2 '-bis (2,4-dichlorophenyl) -4,4 ', 5,5 ' - tetraphenyl-biimidazole]。

Above-mentioned acyl oxime compound is selected from ethane ketone, 1- [9- ethyls -6- (2- methyl benzoyls) -9 hydrogen-carbazole - 3- substituents] -, 1- (oxygen-acetyl oxime) [Ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H- Carbazole-3-yl]-, 1- (O-acetyl oxime), such as the Ciba Specialty Chemicals name of an article is CGI-242 person, under its structure shown in chemical formula E3-1], 1- [4- (phenyl) phenyl]-octane -1,2- diketone 2- (O- benzoyls Base oxime) [1- [4- (phenylthio) phenyl]-octane-1,2-dione 2- (O-benzoyl-oxime), such as Ciba Specialty Chemicals manufacture trade name CGI-124 commodity, shown in the following chemical formula E3-2 of its structure], ethane Ketone, 1- [9- ethyls -6- (the chloro- 4- benzyls of 2--thio-benzoyl) -9 hydrogen-carbazole -3- substituents] -1- (oxygen-acetyl oxime) [Ethanone,1-[9-ethyl-6-(2-chloro-4-benzyl-thio-benzoyl)-9H-carbazole-3-yl]-, 1- (O-acetyl oxime), such as rising sun electrification company system, shown in the following chemical formula E3-3 of its structure]：

【Chemical formula E3-1】

【Chemical formula E3-2】

【Chemical formula E3-3】

It is preferred that other free radical type light initiators (E-3) are 2- methyl isophthalic acids-(4- methylthiophenyis) -2- Quinoline generation -1- acetone, 2- benzyls -2-N, N- dimethylamino -1- (4- morphlinophenyls) -1- butanone, 2,2 '-bis- (o- chlorphenyls) - 4,4 ', 5,5 '-tetraphenyl diimidazole, ethane ketone, 1- [9- ethyls -6- (2- methyl benzoyls) -9 hydrogen-carbazole -3- substitutions Base]-, 1- (oxygen-acetyl oxime) or these combination.

It is preferred that other free radical type light initiators (E-3) can further add following compound：Thioxanthones (thioxanthone), 2,4- diethyl thioxanthones (2,4-diethyl-thioxanthanone), thioxanthones -4- sulfones (thioxanthone-4-sulfone), benzophenone (benzophenone), 4,4 '-bis- (dimethylamino) benzophenone [4, 4 '-bis (dimethylamino) benzophenone], 4,4 '-bis- (lignocaine) benzophenone [4,4 '-bis (diethylamino) benzophenone] etc. benzophenone (benzophenone) class compound；Benzil (benzil), α-diketone (α-diketone) class compound of acetyl group (acetyl) etc.；The keto-alcohol of diphenylhydroxyethanone (benzoin) etc. (acyloin) class compound；Diphenylhydroxyethanone methyl ether (benzoin methylether), diphenylhydroxyethanone ether (benzoin Ethylether), the keto-alcohol ether (acyloin of diphenylhydroxyethanone isopropyl ether (benzoin isopropyl ether) etc. Ether) class compound；2,4,6- trimethyl benzoyl diphenyl phosphine oxides (2,4,6-trimethyl-benzoyl- Diphenyl-phosphineoxide), double-(2,6- dimethoxys benzoyl) -2,4,4- trimethylpentyl phosphine oxides [bis- (2,6-dimethoxy-benzoyl) -2,4,4-trimethyl-benzyl-phosphineoxide] etc. acyl phosphine oxide (acylphosphineoxide) class compound；Anthraquinone (anthraquinone), 1,4- naphthoquinones (1,4-naphthoquinone) Deng quinone (quinone) class compound；Chloroacetophenone (phenacyl chloride), trisbromomethyl benzene sulfone (tribromomethyl-phenylsulfone), three (trichloromethyl)-s- triazines [tris (trichloromethyl)-s- Triazine] etc. halide；And the peroxide of di-t-butyl peroxide (di-tertbutylperoxide) etc.. Wherein, it is preferable with benzophenone (benzophenone) class compound, especially with 4,4 '-bis- (lignocaine) benzophenone is most It is good.

Above-mentioned other free radical type light initiators (E-3) can the individually a kind of or a variety of uses of mixing.

In the present invention concrete example in, the usage amount based on the alkali soluble resin (C) is 100 parts by weight, it is described its The usage amount scope of its free radical type light initiator (E-3) is 0 parts by weight to 100 parts by weight；Preferably 4 parts by weight are to 96 weight Part；More preferably 8 parts by weight are to 92 parts by weight.

Usage amount based on the alkali soluble resin (C) is 100 parts by weight, the usage amount model of the smooth initiator (E) Enclose for 20 parts by weight to 200 parts by weight；Preferably 30 parts by weight are to 190 parts by weight；More preferably 40 parts by weight are to 180 parts by weight.

Solvent (F) need to select to can dissolve dyestuff (B), alkali soluble resin (C), the compound of the unsaturated group containing ethene (D) and light initiator (E), and the appropriate evaporative that not react to each other and have with the composition is needed.

Solvent (F) can be identical with preparing solvent used in alkali soluble resin (C), will not be repeated here.It is preferred that institute State solvent (F) and be selected from propylene glycol methyl ether acetate, cyclohexanone or 3- ethoxyl ethyl propionates.

Usage amount based on the alkali soluble resin (C) is 100 parts by weight, and the usage amount scope of the solvent (F) is 500 parts by weight to 5000 parts by weight；Preferably 800 parts by weight are to 4500 parts by weight；More preferably 1000 parts by weight are to 4000 weight Part.

The photosensitive resin composition is alternative to include additive (G), such as, but not limited to：Filler, alkali are solvable High-molecular compound, adherence accelerator, antioxidant, ultra-violet absorber, anti-agglutinant beyond property resin (C) etc..

The additive (G) is such as, but not limited to the fillers such as glass, aluminium；Polyvinyl alcohol, polyalkylene glycol monoalkyl ether, gather High-molecular compound beyond the alkali soluble resins such as perfluoroalkyl acrylate alkyl ester (C)；Vinyltrimethoxy silane, the second of vinyl three TMOS, vinyl three (2- methoxyethoxies) silane, nitrogen-(2- amino-ethyls) -3- amino propyl methyl dimethoxy silicon Alkane, nitrogen-(2- amino-ethyls) -3- TSL 8330s, APTES, 3- epoxy prapanols third Base trimethoxy silane, 3- epoxy prapanol hydroxypropyl methyls dimethoxysilane, 2- (3,4- epoxycyclohexyls) ethyl trimethoxy Silane, 3- chloropropylmethyldimethoxysilanes, 3- r-chloropropyl trimethoxyl silanes, 3- metacryloxy propyl trimethoxies The adherence accelerator such as silane, 3- mercaptopropyl trimethoxy silanes；2,2- thiobis (4- methyl-6-tert-butylphenols), 2, The antioxidants such as 6- di-t-butyl phenol；2- (the 3- tert-butyl group -5- methyl -2- hydroxy phenyls) -5- chlorphenyls nitrine, alkoxy The ultra-violet absorbers such as benzophenone；And the anti-agglutinant such as Sodium Polyacrylate.Additive (G) described above can be individually a kind of or mixed more Kind uses.

Usage amount based on the alkali soluble resin (C) is 100 parts by weight, the usage amount scope of the additive (G) For 0.1 parts by weight to 10 parts by weight；Preferably 0.3 parts by weight are to 7 parts by weight；More preferably 0.5 parts by weight are to 4 parts by weight.

The manufacture method of the colored filter, it is to comprise the following steps：By the foregoing photosensitive resin composition Pixel layer is formed on substrate.

The colored filter is as obtained by the manufacture method of the above-mentioned colored filter.

The manufacture method of the colored filter is mainly by turning round coating, cast coat, ink-jet application (ink-jet) Or the coating method such as print roll coating, the foregoing photosensitive resin composition for being mixed into solution state is coated on the substrate On.After coating, first in a manner of being dried under reduced pressure, most solvent is removed, then solvent is removed in a manner of pre-baked (pre-bake) Remove and form pre-baked film.Wherein, be dried under reduced pressure and pre-baked condition, according to the species of each composition, compounding ratio and it is different, generally, Being dried under reduced pressure is carried out 1 second to 60 seconds under 0 to 200mmHg pressure, and pre-baked is that 1 is carried out at a temperature of 70 to 110 DEG C Minute was to 15 minutes.After pre-baked, the pre-baked film exposes under specified light shield (mask), is soaked at a temperature of 23 ± 2 DEG C Stain is developed for 15 seconds to 5 minutes in developer solution, remove should not part and form pattern.The light used is exposed, with g lines, h The ultraviolet of line, i lines etc. is preferred, and UV-device can be (super) high-pressure mercury-vapor lamp or metal halid lamp.

The concrete example of aforesaid base plate is such as, but not limited to：Alkali-free glass, soda-lime glass, hard for liquid crystal display device Glass (Pai Lesi glass), quartz glass, soda-lime glass and in nesa coating accompanying on these glass；Or for solid The photo-electric conversion device substrate of camera etc. is (such as：Silicon substrate) etc..These substrates are usually to be initially formed each pixel of isolation The black matrix" (black matrix) of chromatograph.

The concrete example of the developer solution：Sodium hydroxide, potassium hydroxide, sodium carbonate, sodium acid carbonate, potassium carbonate, saleratus, Sodium metasilicate, sodium methyl silicate, ammoniacal liquor, ethamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, courage The alkaline aqueous solution that the alkali compounds such as alkali, pyrroles, croak pyridine or 1,8- diazabicylo-(5,4,0) -7- hendecenes are formed, The concentration range of the alkaline aqueous solution is generally 0.001 to 10 weight %, preferably 0.005 to 5 weight %, and more preferably 0.01 To 1 weight %.

During the developer solution formed using the aforementioned base aqueous solution, usually cleaned again with water after development, secondly with pressure Contracting air or compressed nitrogen air-dry pattern.

The substrate with photo-hardening film layer after air-drying, using heaters such as hot plate or baking ovens, it is in temperature range Heat 1 to 15 minute, the volatile ingredient in film is removed, and make unreacted ethene in film at 100 to 280 DEG C Unsaturated double-bond carries out thermmohardening reaction.Using the photosensitive resin composition of assorted (mainly including the color of red, green, blue three) pre- Repeated three times with same step in fixed pixel, you can obtain the pixel shader layer of the color of red, green, blue three.

Secondly, on pixel shader layer, ITO (tin indium oxide) evaporations are formed under vacuum with 220 DEG C to 250 DEG C temperature Film, if necessary, after etching and wiring are implemented to ITO evaporation films, liquid crystal orienting film polyimides is coated, and then burnt till, i.e., Can be as the colored filter of liquid crystal display.

Furthermore the foregoing liquid crystal orienting film used, it is the orientation for limiting liquid crystal molecule, herein and is not particularly limited, Such as inorganic matter or organic matter any one.Technology as formation liquid crystal orienting film is to appoint in the technical field of the invention Known to what tool usually intellectual, and the non-emphasis for the present invention, therefore do not repeat separately.

The liquid crystal display cells include colored filter as described above.

The liquid crystal display cells, the colored filter obtained by mainly by above-mentioned method for manufacturing colored filtering substrate (CF) substrate, and membrane transistor (Thin Film Transistor are set；TFT driving substrate) is formed.First, exist Gap (structure cell interval is intervened between above-mentioned 2 plate base；Cell gap) make oppositely disposed, surrounding's position sealing agent of 2 plate bases After fitting, the filling injection liquid crystal in the gap that substrate surface and sealing agent are distinguished, then seal hand-hole and form liquid Jingjing born of the same parents (cell).Then, in the outer surface of liquid crystal cell, that is, other sides of each substrate of liquid crystal cell are formed On, it is bonded Polarizer and liquid crystal display cells is made.

As for the foregoing liquid crystal used, that is, liquid-crystal compounds or liquid-crystal composition, herein and it is not particularly limited, can makes With any liquid-crystal compounds and liquid-crystal composition.

【Embodiment】

The present invention will be described further with regard to following examples, however, it should be noted that the embodiment is only to illustrate to say Bright use, and it is not necessarily to be construed as the limitation that the present invention is implemented.

<Synthesis example>First alkali soluble resin (C-1)

[synthesis example C-1-1] first alkali soluble resin (C-1)

By fluorenes ring oxygen compound (model ESF-300, the Nippon Steel's chemistry system of 100 parts by weight；Epoxide equivalent 231), 30 weights Measure the acrylic acid of part, the benzyltriethylammonium chloride of 0.3 parts by weight, the DBPC 2,6 ditertiary butyl p cresol and 130 weights of 0.1 parts by weight Measure part propylene glycol methyl ether acetate continuously added to 500mL four-hole boiling flask in, and pan feeding speed control 25 parts by weight/point Clock, in the range of temperature is maintained into 100 DEG C to 110 DEG C, after reacting 15 hours, you can acquisition solid component concentration is 50wt% Pale yellow transparent mixed liquor.Then, the above-mentioned mixed liquor of 100 parts by weight is dissolved in the ethylene glycol ether acetate of 25 parts by weight In, while the tetrabydrophthalic anhydride of 6 parts by weight and the benzophenone tetracarboxylic dianhydride of 13 parts by weight are added, and be heated to 110 DEG C to 115 DEG C, after reacting 2 hours, you can acquisition acid value is 98.0mgKOH/g, and number mean molecule quantity is 1,623 First alkali soluble resin (C-1-1).

[synthesis example C-1-2] first alkali soluble resin (C-1)

By fluorenes ring oxygen compound (model ESF-300, the Nippon Steel's chemistry system of 100 parts by weight；Epoxide equivalent 231), 30 weights Measure the acrylic acid of part, the benzyltriethylammonium chloride of 0.3 parts by weight, the DBPC 2,6 ditertiary butyl p cresol and 130 weights of 0.1 parts by weight Measure part propylene glycol methyl ether acetate continuously added to 500mL four-hole boiling flask in, and pan feeding speed control 25 parts by weight/point Clock, in the range of temperature is maintained into 100 DEG C to 110 DEG C, after reacting 15 hours, you can acquisition solid component concentration is 50wt% Pale yellow transparent mixed liquor.Then, the above-mentioned mixed liquor of 100 parts by weight is dissolved in the ethylene glycol ether acetate of 25 parts by weight In, while the benzophenone tetracarboxylic dianhydride of 13 parts by weight is added, reacted at 90 DEG C to 95 DEG C 2 hours, then, add 6 weights The tetrabydrophthalic anhydride of part to be measured, and is reacted 4 hours at 90 DEG C to 95 DEG C, you can acquisition acid value is 99.0mgKOH/g, and Number mean molecule quantity is 2,162 the first alkali soluble resin (C-1-2).

[synthesis example C-1-3] first alkali soluble resin (C-1)

By epoxide (model NC-3000, Japanese chemical drug (strain) system of 400 parts by weight；Epoxide equivalent 288), 102 weights Measure the acrylic acid of part, the methoxyl group phenol (methoxyphenol) of 0.3 parts by weight, the triphenylphosphine and 264 parts by weight of 5 parts by weight Propylene glycol methyl ether acetate be placed in reaction bulb, temperature is maintained 95 DEG C, after reaction 9 hours, you can obtaining acid value is 2.2mgKOH/g intermediate product.Then, the tetrabydrophthalic anhydride (tetrahydrophthalic of 151 parts by weight is added Anhydride), reacted 4 hours at 95 DEG C, you can acquisition acid value is 102mgKOH/g, and number mean molecule quantity is 2,589 The first alkali soluble resin (C-1-3).

[synthesis example C-1-4] first alkali soluble resin (C-1)

By epoxide (model NC-3000, Japanese chemical drug (strain) system of 200 parts by weight；Epoxide equivalent 288), 60 weights Measure the acrylic acid of part, the methoxyl group phenol (methoxyphenol) of 0.15 parts by weight, the triphenylphosphine and 200 weight of 2.5 parts by weight The propylene glycol methyl ether acetate of part is placed in reaction bulb, temperature is maintained into 95 DEG C, after reacting 9 hours, you can obtaining acid value is 2.5mgKOH/g intermediate product.Then, the tetrabydrophthalic anhydride (tetrahydrophthalic of 70 parts by weight is added Anhydride) and 15 parts by weight 3,4- epoxycyclohexyl-methyl methacrylates, reacted 4 hours at 95 DEG C, you can obtain It is 105mgKOH/g to obtain acid value, and number mean molecule quantity is 3,410 the first alkali soluble resin (C-1-4).

[synthesis example C-2-1] second alkali soluble resin (C-2)

Agitator, thermometer, condenser pipe and nitrogen inlet are set on four cervical vertebra bottles, and import nitrogen.Then, add The propylene glycol methyl ether acetate (referred to as PGMEA) of 100 parts by weight, and temperature is warming up to 100 DEG C.Then, by 25 parts by weight 2- methacryloyloxyethyls succinate (referred to as HOMS), 70 parts by weight 2-hydroxyethyl methacrylate (referred to as For HEMA), the 3,4- epoxycyclohexyl-methyls methacrylate (ECMMA) of 15 parts by weight, the o- vinyl benzene of 10 parts by weight Methyl glycidyl ethers (referred to as VBGE), and the 2 of 4.5 parts by weight, the double -2- methylbutyronitriles of 2 '-azo (referred to as AMBN) are molten In the propylene glycol methyl ether acetate of 100 parts by weight, and by this mixed solution in instilling above-mentioned four cervical vertebras bottle in 2 hours dropwise In.After 100 DEG C are reacted 6.5 hours, the acrylic acid (referred to as AA) of 5 parts by weight is added in the four cervical vertebra bottles full of nitrogen, And temperature is risen to 110 DEG C.After reaction 6 hours, you can synthesis example C-2-1 the second alkali soluble resin is made.

[synthesis example C-2-2 to C-2-6] second alkali soluble resin (C-2)

Synthesis example C-2-2 to C-2-6 is to prepare the second alkali soluble resin with the step identical with synthesis example C-2-1 (C-2), difference be in：Change reaction temperature, polymerization time, the species and usage amount of composition, its actual conditions is stated in detail in table 1。

<Embodiment>Photosensitive resin composition

[embodiment 1]

By the synthesis example C-2-5 of 100 parts by weight the second alkali soluble resin (C-2), the C.I. paratoneres of 50 parts by weight 254 (hereinafter referred to as A-1), 5 parts by weight C.I. acid reds 52 (hereinafter referred to as B-1), the unsaturated group containing ethene of 5 parts by weight Compound D-1-1, acrylic acid-2-ethyl caproite (hereinafter referred to as D-2-1), the ethane ketone of 30 parts by weight of 105 parts by weight, 1- [9- ethyls -6- (2- methyl benzoyls) -9 hydrogen-carbazole -3- substituents] -, 1- (oxygen-acetyl oxime) (hereinafter referred to as E-3-1), After adding the 3- ethoxyl ethyl propionates (hereinafter referred to as F-1) of 1500 parts by weight, with swing-out stirrer, mixing is dissolved, It is i.e. modulated and photosensitive resin composition, the photosensitive resin composition commented in a manner of following properties evaluations Valency, acquired results are as shown in table 2.

[embodiment 2 to 21 and comparative example 1 to 5]

Embodiment 2 to 21 and comparative example 1 to 5 are come with the step identical with the photosensitive resin composition of embodiment 1 Prepare, it is to change the species of raw material in photosensitive resin composition and make that difference, which is in embodiment 2 to 21 and comparative example 1 to 5, The result of dosage, its actual conditions prepared and properties evaluations is stated in detail in table 2.

1. resistance to sputter

Photosensitive resin composition obtained by embodiment and comparative example is changed with the colourity before and after sputter, assessed whereby Its resistance to sputter.By the photosensitive resin composition obtained by embodiment and comparative example in a manner of rotary coating, chi is coated on On the very little glass substrate for 100mm × 100mm.Then, it is dried under reduced pressure, its pressure is 100mmHg and the time is 30 seconds. Then, pre-baked processing procedure is carried out, its temperature is 80 DEG C and the time is 2 minutes, forms the pre-baked film that a thickness is 2.5 μm.Carry out After pre-baked processing procedure, using energy as 60mJ/cm²Ultraviolet light (exposure machine Canon PLA-501F) irradiate the pre-baked film, and Pre-baked film after exposure is impregnated in 23 DEG C of developer solution.After 1 minute, the film is cleaned with pure water, and with 230 DEG C carry out after bake 30 minutes, i.e., on the glass substrate formed pixel shader layer.

Then, the colourity (L*, a*, b*) of pixel shader layer is determined with colorimeter (great Zhong electronics corporations system, model MCPD), Then it is that 14.6 Ω/sq, thickness are that sputter, which forms a film resistance, on the pixel shader layerIto thin film, splash It is 220 DEG C to plate temperature, so that the colored filter is made.

Afterwards, the colourity of above-mentioned colored filter is determined with the colorimeter, and colourity change is calculated with mathematics formula (V) (Δ Eab*), resulting colourity change (Δ Eab*) is smaller, represents that resistance to sputter is better, and is carried out according to following evaluation criteria Evaluation：

Δ Eab*=[(Δ L)²+(Δa)²+(Δb)²]^1/2Mathematics formula (V)

☆：ΔEab*<0.9；

◎：0.9≤ΔEab*<1；

○：1≤ΔEab*<3；

△：3≤ΔEab*<5；

╳：5≤ΔEab*.

Table 1

In table 1, " --- " represents to be not used, and the composition that each code name represents is as follows：

MAA	Methacrylic acid
		HOMS	2- methacryloyloxyethyl succinates
AA	Acrylic acid
		N-PMI	N-phenylmaleimide
HEMA	2-hydroxyethyl methacrylate
		BzMA	Benzyl methacrylate
ECMMA	3,4- epoxycyclohexyl-methyl methacrylates
		MGMA	Methacrylic acid 2- methyl polyglycidyls
VBGE	O- vinyl benzene methyl glycidyl ethers
		AMBN	Double -2- the methylbutyronitriles of 2,2 '-azo
ADVN	2,2 '-azo-two-(2,4 methyl pentane nitrile)
		PGMEA	Propylene glycol methyl ether acetate
EEP	3- ethoxyl ethyl propionates

Table 2

The (Continued) of table 2

In table 2, " --- " represents to be not used, and the composition that each code name represents is as follows：

From the result of form 2, the photosensitive resin composition of embodiment 1 to 21 is because having ester ring type epoxy described in use The compound of base and an ethene unsaturated group (D-1) so that obtained colored filter has preferable resistance to sputter.

Comparative example 1 to 5 is because of the chemical combination for not having to have ester ring type epoxy radicals and an ethene unsaturated group described in use Thing (D-1) so that the resistance to sputter of obtained colored filter is bad.

In summary, photosensitive resin composition of the present invention described in addition by having ester ring type epoxy radicals and an ethene The compound (D-1) of property unsaturated group, it can effectively lift the resistance to sputter of the colored filter as made from photosensitive resin composition Property, it can be applied to prepare colored filter and liquid crystal display device, therefore the purpose of the present invention can be reached really.

Claims

1. a kind of photosensitive resin composition, it is characterised in that it is included：

Pigment (A)；

Dyestuff (B)；

Alkali soluble resin (C)；

The compound (D) of the unsaturated group containing ethene, the compound (D) of the unsaturated group containing ethene, which includes, has ester ring type Epoxy radicals and the compound of an ethene unsaturated group (D-1)；

Light initiator (E)；And

Solvent (F).

2. photosensitive resin composition according to claim 1, it is characterised in that described that there is ester ring type epoxy radicals and one The compound (D-1) of individual ethene unsaturated group is any one compound represented by below formula D1 to chemical formula D 15：

【Chemical formula D 1】

【Chemical formula D 2】

【Chemical formula D 3】

【Chemical formula D 4】

【Chemical formula D 5】

【Chemical formula D 6】

【Chemical formula D 7】

【Chemical formula D 8】

【Chemical formula D 9】

【Chemical formula D 10】

【Chemical formula D 11】

【Chemical formula D 12】

【Chemical formula D 13】

【Chemical formula D 14】

【Chemical formula D 15】

Chemical formula D 1 is into chemical formula D 15, R^1dRepresent hydrogen atom or methyl；R^2d、R^4d、R^6dSeparately represent hydrogen atom, not The alkyl for being substituted or being substituted；R^3dThe alkyl for being unsubstituted or being substituted, the aryl for being unsubstituted or being substituted are represented, or not The acyl group for being substituted or being substituted；R^5dRepresent the alkyl for being unsubstituted or being substituted, the aryl for being unsubstituted or being substituted；R^7d Represent hydrogen atom or methyl；R^8dRepresent the divalent aliphatic hydrocarbon that carbon number is 1 to 6；X¹To X³Represent singly-bound or divalent organic base Group.

3. photosensitive resin composition according to claim 2, it is characterised in that described that there is ester ring type epoxy radicals and one The compound (D-1) of individual ethene unsaturated group is by the compound represented by the chemical formula D 1 to the chemical formula D 3 Any one compound.

4. photosensitive resin composition according to claim 1, it is characterised in that the smooth initiator (E), which includes, to be had The light initiator (E-1) of structure shown in chemical formula E1

【Chemical formula E1】

In chemical formula E1, E₁、E₂、E₃、E₄、E₅、E₆、E₇And E₈Represent independently of one another hydrogen atom, carbon number as 1 to 20 alkyl,COE₁₆、OE₁₇, halogen atom, NO₂OrOr

E₁And E₂、E₂And E₃、E₃And E₄、E₅And E₆、E₆And E₇Or E₇And E₈Common representative-(CH independently of one another₂)_p-W-(CH₂)_q-； Or

E₉、E₁₀、E₁₁And E₁₂Hydrogen atom, carbon number each independently are represented as 1 to 20 alkyl, the carbon number is for 1 to 20 alkyl Be unsubstituted or substitute through an at least group as follows, and an at least group be selected from phenyl, halogen atom, CN, OH, SH, alkoxy, (CO) OH or (CO) O (R that carbon number is 1 to 4₁), wherein R₁Carbon number is represented as 1 to 4 alkyl；Or

E₉、E₁₀、E₁₁And E₁₂The phenyl being unsubstituted or the benzene substituted through an at least group as follows are represented independently of one another Base, an at least group are selected from the alkyl, halogen atom, CN, OE that carbon number is 1 to 6₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₉、E₁₀、E₁₁And E₁₂Halogen atom, CN, OE are represented independently of one another₁₇、SE₁₈、SOE₁₈、SO₂E₁₈Or NE₁₉E₂₀, wherein taking For base OE₁₇、SE₁₈Or NE₁₉E₂₀Without or via the group E₁₇、E₁₈、E₁₉And/or E₂₀Formed with a carbon atom of naphthalene nucleus Five-membered ring or six membered ring；Or

E₁₃Carbon number is represented as 1 to 20 alkyl, the carbon number be 1 to 20 alkyl be unsubstituted or through it is as follows at least One group substitutes, wherein an at least group is selected from halogen atom, E₁₇、COOE₁₇、OE₁₇、SE₁₈、CONE₁₉E₂₀、NE₁₉E₂₀、 PO(OC_kH_2k+1)₂OrOr

E₁₃Carbon number is represented as 2 to 20 alkyl, the alkyl that the carbon number is 2 to 20, which is mixed with, one or more O, S, SO, SO₂、NE₂₆ Or CO；Or

E₁₃Carbon number is represented as 2 to 12 alkenyl, the alkenyl that the carbon number is 2 to 12 is without being mixed with or there are one or more through being mixed with O, CO or NE₂₆, wherein the alkenyl through being mixed with and alkyl that carbon number is 2 to 20 and carbon number without being mixed with or through being mixed with are 2 to 12 It is to be unsubstituted or substitute through an at least halogen atom；Or

E₁₃Represent carbon number as 4 to 8 cycloalkenyl group, carbon number as 2 to 12 alkynyl or without be mixed with or be mixed with have one or more O, S, CO or NE₂₆Carbon number be 3 to 10 cycloalkyl；Or

E₁₃Phenyl or naphthyl is represented, and the phenyl or the naphthyl are respectively unsubstituted or taken through an at least group as follows Generation, wherein an at least group is selected from OE₁₇、SE₁₈、NE₁₉E₂₀、COE₁₆、CN、NO₂, halogen The haloalkyl that alkyl that atom, carbon number are 1 to 20, carbon number are 1 to 4, being mixed with has one or more O, S, CO or NE₂₆And carbon number is 2 to 20 alkyl；The phenyl or the naphthyl respectively through carbon number be 3 to 10 cycloalkyl substitution or respectively through be mixed with have it is one or more Individual O, S, CO or NE₂₆And the cycloalkyl that carbon number is 3 to 10 substitutes；

K represents 1 to 10 integer；

E₁₄Represent hydrogen atom, carbon number as 3 to 8 cycloalkyl, carbon number as 2 to 5 alkenyl, carbon number as 1 to 20 alkoxy or carbon Number is 1 to 20 alkyl, and it is unsubstituted or substituted through one or more groups as follows, and one or more of bases Group is selected from halogen atom, phenyl, the alkyl phenyl or CN that carbon number is 1 to 20；Or

E₁₄Phenyl or naphthyl is represented, it is respectively unsubstituted or substituted through an at least group as follows, and an at least base Group is selected from the alkyl that carbon number is 1 to 6, the haloalkyl that carbon number is 1 to 4, halogen atom, CN, OE₁₇、SE₁₈And/or NE₁₉E₂₀；Or

E₁₄Represent carbon number as 3 to 20 heteroaryl, carbon number as 1 to 8 alkoxy, benzyloxy or phenoxy group, the benzyloxy and The phenoxy group is to be unsubstituted or substitute through an at least group as follows, and it is 1 that an at least group, which is selected from carbon number, The haloalkyl and/or halogen atom that alkyl, carbon number to 6 are 1 to 4；

E₁₅It is 6 to 20 aromatic radical or carbon number as 3 to 20 heteroaryl to represent carbon number, and it is respectively unsubstituted or through as follows An at least group substitutes, and an at least group is selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, CN, NO₂、 OE₁₇、SE₁₈、NE₁₉E₂₀、PO(OC_kH_2k+1)₂, be bonded with SO and alkyl and SO that carbon number is 1 to 10₂Bonding and carbon number are 1 to 10 Alkyl, be mixed with and have one or more O, S or NE₂₆And carbon number is 2 to 20 alkyl；Or it respectively takes through the alkyl that carbon number is 1 to 20 Generation, wherein the alkyl that the carbon number is 1 to 20 is to be unsubstituted or substitute through an at least group as follows, and it is described at least One group is selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl Heteroaryloxycarbonyl that aryloxycarbonyl that base, carbon number are 6 to 20, carbon number are 3 to 20, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Carbon number is represented as 1 to 20 alkyl, the carbon number be 1 to 20 alkyl be unsubstituted or through it is as follows at least One group substitutes, and an at least group is selected from halogen atom, OE₁₇、SE₁₈, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to Heteroaryloxycarbonyl that aryloxycarbonyl that 20 heteroaryl, carbon number are 6 to 20, carbon number are 3 to 20, NE₁₉E₂₀、COOE₁₇、 CONE₁₉E₂₀、PO(OC_kH_2k+1)₂、Phenyl, wherein the carbon number be 1 to 20 alkyl is substituted through phenyl, and the halogen that alkyl that it is 1 to 20 through halogen atom, carbon number that the phenyl, which is, carbon number are 1 to 4 Substituted alkyl, OE₁₇、SE₁₈Or NE₁₉E₂₀Substitution；Or

E₁₅Carbon number is represented as 2 to 20 alkyl, the alkyl that the carbon number is 2 to 20 is to be mixed with to have one or more O, SO or SO₂, institute It is to be unsubstituted or substitute through an at least group as follows to state the alkyl through being mixed with and carbon number is 2 to 20, and it is described at least One group is selected from halogen atom, OE₁₇、COOE₁₇、CONE₁₉E₂₀, phenyl or through OE₁₇、SE₁₈Or NE₁₉E₂₀Substituted phenyl；Or

E₁₅Carbon number is represented as 2 to 20 alkanoyl or benzoyl, it is unsubstituted or through an at least group as follows Substitution, and an at least group is selected from the alkyl, halogen atom, phenyl, OE that carbon number is 1 to 6₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₅Representative is unsubstituted or through an at least OE₁₇Substituted naphthoyl or the Heteroarylcarbonyl that carbon number is 3 to 14；Or

E₁₅Carbon number is represented as 2 to 12 alkoxy carbonyl, the alkoxy carbonyl that the carbon number is 2 to 12 is without being mixed with or through extremely A few O is mixed with, wherein through being mixed with or the alkoxy carbonyl without being mixed with and carbon number is 2 to 12 is unsubstituted or through an at least hydroxyl Base substitutes；Or

E₁₅Phenyloxycarbonyl is represented, the phenyloxycarbonyl is to be unsubstituted or substitute through an at least group as follows, and An at least group is selected from the haloalkyl, phenyl, OE that the alkyl, halogen atom, carbon number that carbon number is 1 to 6 are 1 to 4₁₇、 SE₁₈Or NE₁₉E₂₀；Or

E₁₅Represent CN, CONE₁₉E₂₀、NO₂, carbon number be 1 to 4 haloalkyl, S (O)_r-R₂And S (O)_rThe phenyl of bonding, wherein Described and S (O)_rThe phenyl of bonding be unsubstituted or through carbon number be 1 to 12 alkyl or SO₂-R₂Substitution, and R₂Represent carbon number For 1 to 6 alkyl；Or

E₁₅Representative and SO₂Phenyl, diphenylphosphino or the two (R of O bondings₃)-phosphono, wherein described and SO₂The benzene of O bondings Base is to be unsubstituted or substitute through the alkyl that carbon number is 1 to 12, and R₃Carbon number is represented as 1 to 4 alkoxy；

R represents 1 to 2 integer；

Z₂Represent O, S, SO or SO₂；

Z₃Represent O, CO, S or singly-bound；

E₁₆Represent carbon number as 6 to 20 aryl or carbon number as 3 to 20 heteroaryl, its be respectively unsubstituted or through it is as follows extremely Few group substitution, and an at least group is selected from phenyl, halogen atom, the haloalkyl that carbon number is 1 to 4, CN, NO₂、 OE₁₇、SE₁₈、NE₁₉E₂₀, be mixed with and have one or more O, S or NE₂₆And carbon number is 1 to 20 alkyl, or the alkane that carbon number is 1 to 20 Base, wherein the alkyl that the carbon number is 1 to 20 is to be unsubstituted or substitute through an at least group as follows, wherein it is described extremely A few group is selected from halogen atom, COOE₁₇、CONE₁₉E₂₀, phenyl, carbon number be 3 to 8 cycloalkyl, carbon number be 3 to 20 heteroaryl Heteroaryloxycarbonyl that aryloxycarbonyl that base, carbon number are 6 to 20, carbon number are 3 to 20, OE₁₇、SE₁₈Or NE₁₉E₂₀；Or

E₁₆Hydrogen atom or carbon number are represented as 1 to 20 alkyl, wherein the alkyl that the carbon number is 1 to 20 is unsubstituted or through such as At least group substitution shown in lower, and it is 3 to 6 that an at least group, which is selected from halogen atom, phenyl, OH, SH, CN, carbon number, Alkenyloxy group, OCH₂CH₂CN、OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁), O (CO)-phenyl or (CO) OH or (CO) O (R₁)；Or

E₁₆Represent (CH₂CH2O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 12 alkenyl or carbon number be 3 to 8 cycloalkanes Base, wherein R₄Carbon number is represented as 1 to 8 alkyl；Or

E₁₆Represent through SE₁₈Substituted phenyl, wherein E₁₈Representative is bonded to the COE₁₆The phenyl of attached carbazole moiety Or the singly-bound of the naphthyl ring；

N represents 1 to 20 integer；

E₁₇Represent hydrogen atom, phenyl-R₅, carbon number be 1 to 20 alkyl, it is unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from halogen atom, OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、 OCH₂CH₂(CO)O(R₁)、O(CO)-(R₁)、O(CO)-(R₆), the phenyl, (CO) OH, (CO) O (R that are bonded with O (CO)₁), carbon number For 3 to 20 cycloalkyl, SO₂-(R₇)、O(R₇) or be mixed with through an at least O and cycloalkyl that carbon number is 3 to 20, wherein, R₅Represent Carbon number be 1 to 3 alkyl, R₆Carbon number is represented as 2 to 4 alkenyl, and R₇Carbon number is represented as 1 to 4 haloalkyl；Or

E₁₇Carbon number is represented as 2 to 20 alkyl, and the alkyl that the carbon number is 2 to 20 is to be mixed with to have one or more O, S or NE₂₆； Or

E₁₇Represent (CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 1 to 8 alkanoyl, carbon number be 2 to 12 alkene The cycloalkyl that the enoyl- or carbon number that base, carbon number are 3 to 6 are 3 to 20, it is that have one or more O, S, CO without being mixed with or being mixed with Or NE₂₆；Or

E₁₇Represent carbon number and be bonded the group formed with carbon number as 3 to 10 cycloalkyl by 1 to 8 alkyl, and the group is Without being mixed with or being mixed with through an at least O；Or

E₁₇Represent benzoyl, the benzoyl is unsubstituted or substituted through an at least group as follows, and it is described extremely A few group is selected from the alkoxy that alkyl, halogen atom, OH or the carbon number that carbon number is 1 to 6 are 1 to 3；Or

E₁₇Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through an at least group as follows Substitution, and an at least group be selected from alkoxy that halogen atom, the alkyl that OH, carbon number are 1 to 12, carbon number are 1 to 12, CN、NO₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂, diphenyl-amino orWherein R₈Carbon number is represented as 1 to 3 alkoxy, and R₉Carbon number is represented as 1 to 12 alkyl；Or

E₁₇With withPhenyl or naphthyl ring one of carbon it is former Son forms singly-bound；

E₁₈Represent hydrogen atom, carbon number as 2 to 12 cycloalkyl or phenyl-R as 3 to 20 of alkenyl, carbon number₅, wherein the carbon number The cycloalkyl for being 3 to 20 for 2 to 12 alkenyl, the carbon number and the phenyl-R₅It is to have one or more without being mixed with or being mixed with O、S、CO、NE₂₆Or COOE₁₇；Or

E₁₈Carbon number is represented as 1 to 20 alkyl, the alkyl that the carbon number is 1 to 20 is unsubstituted or through following depicted at least one Group substitutes, and an at least group is selected from OH, SH, CN, the alkenyloxy group that carbon number is 3 to 6, OCH₂CH₂CN、OCH₂CH₂(CO) O(R₁)、O(CO)-(R₆)、O(CO)-(R₁), O (CO)-phenyl or (CO) OE₁₇；Or

E₁₈Carbon number is represented as 2 to 20 alkyl, the alkyl that the carbon number is 2 to 20 is to be mixed with to have one or more O, S, CO, NE₂₆Or COOE₁₇；Or

E₁₈Represent (CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(R₄), carbon number be 2 to 8 alkanoyl or carbon number be 3 to 6 alkene acyl Base；Or

E₁₈Benzoyl is represented, the benzoyl is to be unsubstituted or substitute through an at least group as follows, and described An at least group is selected from the alkane that the alkoxy that the alkyl that carbon number is 1 to 6, halogen atom, OH, carbon number are 1 to 4 or carbon number are 1 to 4 Base sulfenyl；Or

E₁₈Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is unsubstituted or through an at least base as follows Group's substitution, and an at least group is selected from the haloalkyl, carbon that halogen atom, the alkyl that carbon number is 1 to 12, carbon number are 1 to 4 Alkoxy, CN, the NO of number for 1 to 12₂, phenyl-R₈, phenoxy group, carbon number be 1 to 12 alkyl sulfenyl, phenylsulfartyl, N (R₉)₂、 Diphenyl amino, (CO) O (R₄)、(CO)-R₄、(CO)N(R₄)₂Or

E₁₉And E₂₀Represent independently of one another hydrogen atom, carbon number as 1 to 20 alkyl, carbon number as 2 to 4 hydroxy alkyl, carbon number is 2 Cycloalkyl that alkenyl that alkoxyalkyl, carbon number to 10 are 2 to 5, carbon number are 3 to 20, phenyl-R₅, carbon number be 1 to 8 alkane Enoyl- that alkanoyl epoxide that acyl group, carbon number are 1 to 8, carbon number are 3 to 12, SO₂-R₇Or benzoyl；Or

E₁₉And E₂₀Phenyl, naphthyl or carbon number are represented as 3 to 20 heteroaryl, it is respectively unsubstituted or through as follows at least one Group substitutes, and an at least group is selected from the alcoxyl that halogen atom, the haloalkyl that carbon number is 1 to 4, carbon number are 1 to 20 The alkoxy that alkyl, benzoyl or the carbon number that base, carbon number are 1 to 12 are 1 to 12；Or

E₁₉And E₂₀It is to be formed together with the nitrogen-atoms being bonded without being mixed with or being mixed with five yuan or hexa-atomic saturation having O, S or NE17 Or unsaturation ring, and described five yuan or hexa-atomic saturation or unsaturation ring are to be unsubstituted or taken through an at least group as follows Generation, wherein an at least group is selected from the alkyl that carbon number is 1 to 20, the alkoxy that carbon number is 1 to 20 ,=O, OE₁₇、SE₁₈、 NE₂₁E₂₂、(CO)E₂₃、NO₂, halogen atom, carbon number be 1 to 4 haloalkyl, CN, phenyl,Or Person has one or more O, S, CO or NE without being mixed with or being mixed with₁₇And carbon number is 3 to 20 cycloalkyl；Or

E₁₉And E₂₀It is that heteroaromatic ring system is formed together with attached nitrogen-atoms, the heteroaromatic ring system is without taking In generation, substitutes through an at least group as follows, and an at least group is selected from the alkyl, carbon number 1 that carbon number is 1 to 20 Alkoxy ,=O, OE that haloalkyl, carbon number to 4 are 1 to 20₁₇、SE₁₈、NE₂₁E₂₂、(CO)E₂₃、Halogen atom, NO₂, CN, phenyl, or without be mixed with or be mixed with have one or more O, S, CO or NE₁₇And carbon number is 3 to 20 cycloalkyl；

E₂₁And E₂₂Represent independently of one another hydrogen atom, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, carbon number is 3 Cycloalkyl or phenyl to 10；

E₂₃Represent hydrogen atom, OH, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, be mixed with have at least O, CO or NE₂₆And carbon number be 2 to 20 alkyl, without being mixed with or being mixed with have O, S, CO or NE₂₆And carbon number is 3 to 20 cycloalkyl；Or

E₂₆Represent hydrogen atom, carbon number as 1 to 20 alkyl, carbon number as 1 to 4 haloalkyl, be mixed with and have at least an O or CO and carbon Number is 2 to 20 alkyl；Or E₂₆Represent phenyl-R₁, without be mixed with or be mixed with through an at least O or CO and carbon number be 3 to 8 cycloalkanes Base；Or E₂₆Represent (CO) E₁₉；Or E₂₆Represent phenyl, E₂₆It is to be unsubstituted or substitute through an at least group as follows, and institute State an at least group and be selected from the haloalkyl, OE that alkyl, halogen atom, carbon number that carbon number is 1 to 20 are 1 to 4₁₇、SE₁₈、 NE₁₉E₂₀OrBut condition has at least for the light initiator (E-1) of the structure as shown in chemical formula E1 One

5. photosensitive resin composition as claimed in claim 1, it is characterised in that the smooth initiator (E), which also includes, to be had The light initiator (E-2) of structure shown in chemical formula (E2)

【Chemical formula E2】

In chemical formula E2, E₃₀Represent the organic group containing the cycloalkyl that carbon number is 3 to 20, E₃₁And E₃₂Represent independently of one another Alkyl or aryl, E₃₃Represent alkyl.

6. photosensitive resin composition according to claim 1, it is characterised in that the alkali soluble resin (C) includes First alkali soluble resin (C-1), first alkali soluble resin (C-1) as mixture carry out polymerisation obtained by, and The mixture is comprising the epoxide (c-1-1) with least two epoxy radicals and with least one carboxylic acid group and at least The compound (c-1-2) of one ethene unsaturated group.

7. photosensitive resin composition according to claim 6, it is characterised in that described that there is at least two epoxy radicals Epoxide (c-1-1) has the structure as shown in chemical formula C1 or chemical formula C2；

【Chemical formula C1】

【Chemical formula C2】

In chemical formula C1, R^1c、R^2c、R^3cAnd R^4cIndependently of one another represent hydrogen atom, halogen atom, carbon number be 1 to 5 alkyl, The aralkyl that the aromatic radical or carbon number that alkoxy that carbon number is 1 to 5, carbon number are 6 to 12 are 6 to 12；

In chemical formula C2, R^5cTo R^18cHydrogen atom, halogen atom, the alkyl or carbon number that carbon number is 1 to 8 are represented independently of one another For 6 to 15 aromatic radical；And g represents 0 to 10 integer.

8. photosensitive resin composition according to claim 1, it is characterised in that based on the alkali soluble resin (C) Usage amount summation be 100 parts by weight, the usage amount scope of the pigment (A) is 30 parts by weight to 300 parts by weight；The dyestuff (B) usage amount scope is 5 parts by weight to 50 parts by weight；The usage amount model of the compound (D) of the unsaturated group containing ethene Enclose for 110 parts by weight to 300 parts by weight；The usage amount scope of the smooth initiator (E) is 20 parts by weight to 200 parts by weight；Institute The usage amount scope for stating solvent (F) is 500 parts by weight to 5000 parts by weight.

9. photosensitive resin composition according to claim 6, it is characterised in that based on the alkali soluble resin (C) Usage amount summation be 100 parts by weight, the usage amount scope of first alkali soluble resin (C-1) is 0 parts by weight to 90 weights Measure part.

10. photosensitive resin composition according to claim 1, it is characterised in that based on the alkali soluble resin (C) Usage amount summation be 100 parts by weight, the compound (D-1) with ester ring type epoxy radicals and an ethene unsaturated group Usage amount scope be 10 parts by weight to 100 parts by weight.

11. photosensitive resin composition according to claim 4, it is characterised in that based on the alkali soluble resin (C) Usage amount summation be 100 parts by weight, the usage amount scope of the smooth initiator (E-1) is 10 parts by weight to 50 parts by weight.

12. photosensitive resin composition according to claim 5, it is characterised in that based on the alkali soluble resin (C) Usage amount summation be 100 parts by weight, the usage amount scope of the smooth initiator (E-2) is 10 parts by weight to 50 parts by weight.

13. a kind of manufacture method of colored filter, it is characterised in that by according to any one of claim 1 to 12 Photosensitive resin composition forms pixel layer.

14. a kind of colored filter, it is characterised in that by the manufacture method institute of colored filter according to claim 13 It is made.

15. a kind of liquid crystal display device, it is characterised in that it includes colored filter according to claim 14.