CN107561623A - A kind of all dielectric depolarization Amici prism and preparation method thereof - Google Patents
A kind of all dielectric depolarization Amici prism and preparation method thereof Download PDFInfo
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Abstract
The present invention relates to a kind of all dielectric depolarization Amici prism.It is an object of the invention to provide it is a kind of can effectively reduce the difficulty of Film Design, be easy to design control, easily prepared depolarization Amici prism, it includes incident eyeglass（1）, outgoing eyeglass（3）And it is glued at incident eyeglass and all dielectric depolarization spectro-film being emitted between eyeglass（2）；It by high, medium and low three kinds of different coating materials multilayer spectro-film that alternate combinations form successively, the high index film material is Ti3O5 that all dielectric depolarization spectro-film, which is, and the middle refractive index coating materials is M3, and the middle refractive index coating materials is SiO2.The beneficial effects of the invention are as follows：Difficulty of processing is not only effectively reduced, reduces processing cost, is easy to design to produce, and film hardness and firmness are good, and its service band is 532nm, and transflection is than 50:50, the difference of S-polarization and P polarization is less than ± 3%.
Description
Technical field
The present invention relates to a kind of all dielectric depolarization Amici prism.
Background technology
Optical thin film is a kind of important optical element, the transmission of light, modulation, spectrum and energy segmentation and synthesis with
And light in the transfer process of other energy states with playing irreplaceable effect.When light is oblique is mapped to optical thin film, according to electricity
The boundary condition in magnetic field understands that the tangential component in electric field and magnetic field is continuous at dielectric interface, and film is to polarised light P components
Different effective refractive indexs is shown with S components, film layer inevitably results from polarization effect；Pass through this of optical thin film
Characteristic is planted to realize the control to light beam polarization characteristic, all kinds of polarization beam splitting devices can be made.But in the case of many, it is necessary to
To the optical component of depolarization effects.At this moment, including the polarization effect that introduces of device in itself is all harmful.
All dielectric depolarization Amici prism is a kind of important light splitting component, has damage height, practical, can be eliminated
The features such as depolarization light splitting piece backside reflection brings the influence of " ghost ", there is strong market application demand.But because of production and processing
Difficulty is larger, and technique is more complicated, and cost is of a relatively high；Cause practical application advantage unobvious；So invention one kind is easy to design
The film structure of production, the product that can reduce processing cost are necessary.
The content of the invention
The purpose of the present invention can effectively reduce Film Design difficulty in offer one kind, reduce processing cost, easily prepare, and
A kind of and all dielectric depolarization Amici prism that film layer firmness is good, hardness is strong.Its service band is 532nm, and transflection is than 50:
50, the difference of S-polarization and P polarization is less than ± 3%.
What the present invention was realized in：A kind of all dielectric depolarization Amici prism, it include incident eyeglass, outgoing eyeglass with
And it is glued at incident eyeglass and all dielectric depolarization spectro-film being emitted between eyeglass；The depolarization spectro-film be by it is high, in,
Low three kinds of different coating materials multilayer spectro-film that alternate combinations form successively, the high index film material are Ti3O5, the middle refraction
Rate coating materials is M3, and the middle refractive index coating materials is SiO2.
The advantage of the invention is that：
1. select suitable Coating Materials and process for plating；The film layer structure of control is easy in design, with regular symmetrical middle 19
Based on tunic, front and rear matching optimization two membranes and trilamellar membrane, and allow have larger control tolerance respectively so can be significantly
Control difficulty is reduced, cost is reduced, realizes the advantage of all dielectric depolarization Amici prism.
2. all dielectric depolarization Amici prism provided by the invention, compared to depolarization light splitting piece, backside reflection production can be eliminated
The influence of raw " ghost "；Metal film depolarization Amici prism is contrasted, damage is higher, and film layer is harder, and firmness is more preferable；The scope of application
It is wider.
Brief description of the drawings
Fig. 1 is a kind of film layer structure schematic diagram of all dielectric depolarization Amici prism provided by the present invention；
Fig. 2 is the reflectance spectrum curve that the embodiment of the present invention 1 provides；
Fig. 3 is the optical transmission spectra curve that the embodiment of the present invention 1 provides；
Fig. 4 is the reflectance spectrum curve that the embodiment of the present invention 1 provides；
Fig. 5 is the optical transmission spectra curve that the embodiment of the present invention 1 provides；
Fig. 6 is the reflectance spectrum curve that the embodiment of the present invention 1 provides；
Fig. 7 is the optical transmission spectra curve that the embodiment of the present invention 1 provides；
A kind of structural representation for all dielectric depolarization Amici prism that Fig. 8 is provided by the embodiment of the present invention；
Label declaration：20- incidence eyeglasses, 21- all dielectric depolarization spectro-films, 22- outgoing eyeglasses.
Embodiment
Present invention is described in detail with reference to Figure of description and specific embodiment：
As Fig. 1 show a kind of all dielectric depolarization Amici prism provided by the invention, it includes incident eyeglass 1, outgoing eyeglass
3 and be glued at incident eyeglass and be emitted eyeglass between all dielectric depolarization spectro-film 2；The all dielectric depolarization spectro-film
It is by high, medium and low three kinds of different medium coating materials multilayer spectro-film that alternate combinations form successively.The high index film material is
Ti3O5, the middle refractive index coating materials are M3, and the middle refractive index coating materials is SiO2.The all dielectric depolarization spectro-film 2 is pressed
Distance apart from the incident inclined-plane of eyeglass 1 is followed successively by：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer, Ti3O5
Film layer（13）, the 4th layer, M3 film layers（12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer, SiO2 film layers
（11）, the 8th layer, M3 film layers（12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer, Ti3O5 film layers
（13）, the 12nd layer, M3 film layers（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th layer, Ti3O5 films
Layer（13）, the 16th layer, M3 film layers（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）, the 19th layer, SiO2
Film layer（11）, the 20th layer, M3 film layers（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）, the 23rd layer,
Ti3O5 film layers（13）, the 24th layer, M3 film layers（12）.
A kind of all dielectric depolarization Amici prism according to claim 1, it is characterised in that：1st layer, SiO2 film layers
（11）Thickness is 100.9-103.9nm, the 2nd layer, M3 film layers（12）103.1-104.1nm, the 3rd layer, Ti3O5 film layers（13）
42.7-43.7nm, the 4th layer, M3 film layers（12）91.5-93.5nm, the 5th layer, Ti3O5 film layers（13）69.5-71nm, the 6th layer, M3
Film layer（12）91.5-93.5nm, the 7th layer, SiO2 film layers（11）109.8-111.8nm, the 8th layer, M3 film layers（12）91.5-
93.5nm, the 9th layer, SiO2 film layers（11）109.8-111.8nm, the 10th layer, M3 film layers（12）91.5-93.5nm, 11th layer,
Ti3O5 film layers（13）69.5-71nm, the 12nd layer, M3 film layers（12）91.5-93.5nm, the 13rd layer, Ti3O5 film layers（13）69.5-
71nm, the 14th layer, M3 film layers（12）91.5-93.5nm, the 15th layer, Ti3O5 film layers（13）69.5-71nm, the 16th layer, M3 films
Layer（12）91.5-93.5nm, the 17th layer, SiO2 film layers（11）109.8-111.8nm, the 18th layer, M3 film layers（12）91.5-
93.5nm, the 19th layer, SiO2 film layers（11）109.8-111.8nm, the 20th layer, M3 film layers（12）91.5-93.5nm, the 21st layer,
Ti3O5 film layers（13）69.5-71nm, the 22nd layer, M3 film layers（12）91.5-93.5nm, the 23rd layer, Ti3O5 film layers（13）
97.2-98.2nm, the 24th layer, M3 film layers（12）62.4-63.4nm.
Preparation method of the present invention concretely comprises the following steps：
1. prepare glass substrate material；
2. Ti3O5, M3 and SiO2 are selected as Coating Materials；
3. clean glass substrate layer：Ultrasonic wave cleaning is carried out to substrate of glass, then dries, refills into coating machine；
4. vacuumize so that the low 2*10-3Pa of background vacuum, heated baking then is carried out to substrate of glass, temperature reaches 120-
150 DEG C, and constant temperature 20-30 minutes；
5. using radio-frequency ion source is etched to the glass substrate layer after cleaning 5-10 minutes；
6. using radio-frequency ion source auxiliary electron beam evaporation method in the glass basic surface 5. handled by step according to apart from glass
Glass substrate layer is from closely to far alternating deposit is coated with successively：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer,
Ti3O5 film layers（13）, the 4th layer, M3 film layers（12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer,
SiO2 film layers（11）, the 8th layer, M3 film layers（12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer,
Ti3O5 film layers（13）, the 12nd layer, M3 film layers（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th
Layer, Ti3O5 film layers（13）, the 16th layer, M3 film layers（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）,
19 layers, SiO2 film layers（11）, the 20th layer, M3 film layers（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）、
23rd layer, Ti3O5 film layers（13）, the 24th layer, M3 film layers（12）.
7. during step is completed 6., when being coated with each SiO2 film layers, it is 0 .6-0 .8nm/s to control sedimentation rate,
Oxygenation capacity is 5-10sccm, ion beam voltage 600-800V, ion beam current 600-800mA；
When being coated with each M3 film layers, it is 0 .2-0 .4nm/s to control sedimentation rate, oxygenation capacity 0-5sccm, and ion beam voltage is
600-800V, ion beam current 500-600mA；
When being coated with each Ti3O5 film layers, it is 0 .3-0 .5nm/s to control sedimentation rate, oxygenation capacity 10-15sccm, ion beam electricity
Press as 800-1000V, ion beam current 700-900mA；
Embodiment 1
A kind of all dielectric depolarization Amici prism, the prism by incident eyeglass 1, outgoing eyeglass 3 and be glued at incident eyeglass and
All dielectric depolarization spectro-film 2 between outgoing eyeglass forms；The all dielectric depolarization spectro-film 2 is by 24 layer dielectric groups
Into；24 layer dielectric is followed successively by：1st layer, SiO2 film layers（11）Thickness is 102.4nm, the 2nd layer, M3 film layers（12）
103.6nm, the 3rd layer, Ti3O5 film layers（13）43.2nm, the 4th layer, M3 film layers（12）92.5nm, the 5th layer, Ti3O5 film layers（13）
70.3nm, the 6th layer, M3 film layers（12）92.5nm, the 7th layer, SiO2 film layers（11）110.8nm, the 8th layer, M3 film layers（12）
92.5nm, the 9th layer, SiO2 film layers（11）110.8nm, the 10th layer, M3 film layers（12）92.5nm, 11th layer, Ti3O5 film layers
（13）70.3nm, the 12nd layer, M3 film layers（12）92.5nm, the 13rd layer, Ti3O5 film layers（13）70.3nm, the 14th layer, M3 film layers
（12）92.5nm, the 15th layer, Ti3O5 film layers（13）70.3nm, the 16th layer, M3 film layers（12）92.5nm, the 17th layer, SiO2 films
Layer（11）110.8nm, the 18th layer, M3 film layers（12）92.5nm, the 19th layer, SiO2 film layers（11）110.8nm, the 20th layer, M3
Film layer（12）92.5nm, the 21st layer, Ti3O5 film layers（13）70.3nm, the 22nd layer, M3 film layers（12）92.5nm, the 23rd layer,
Ti3O5 film layers（13）97.7nm, the 24th layer, M3 film layers（12）62.8nm.
Described glass baseplate uses BK7.
As shown in Fig. 2 the transmissivity and reflectivity Characteristics figure of all dielectric depolarization Amici prism for embodiment 1, from figure
In as can be seen that all dielectric depolarization Amici prism provided by the invention can be divided into 532nm wavelength transflection ratio for 50:50 and
The difference of S-polarization and P polarization is controlled within ± 3%.
Embodiment 2
A kind of all dielectric depolarization Amici prism, the prism by incident eyeglass 1, outgoing eyeglass 3 and be glued at incident eyeglass and
All dielectric depolarization spectro-film 2 between outgoing eyeglass forms；The all dielectric depolarization spectro-film 2 is by 24 layer dielectric groups
Into；24 layer dielectric is followed successively by：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer, Ti3O5 film layers
（13）, the 4th layer, M3 film layers（12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer, SiO2 film layers
（11）, the 8th layer, M3 film layers（12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer, Ti3O5 film layers
（13）, the 12nd layer, M3 film layers（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th layer, Ti3O5 films
Layer（13）, the 16th layer, M3 film layers（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）, the 19th layer, SiO2
Film layer（11）, the 20th layer, M3 film layers（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）, the 23rd layer,
Ti3O5 film layers（13）, the 24th layer, M3 film layers（12）.
A kind of all dielectric depolarization Amici prism according to claim 1, it is characterised in that：1st layer, SiO2 film layers
（11）Thickness is 100.9nm, the 2nd layer, M3 film layers（12）103.1nm, the 3rd layer, Ti3O5 film layers（13）42.7nm, the 4th layer, M3
Film layer（12）91.5nm, the 5th layer, Ti3O5 film layers（13）69.5nm, the 6th layer, M3 film layers（12）91.5nm, the 7th layer, SiO2 films
Layer（11）109.8nm, the 8th layer, M3 film layers（12）91.5nm, the 9th layer, SiO2 film layers（11）109.8nm, the 10th layer, M3 film layers
（12）91.5nm, 11th layer, Ti3O5 film layers（13）69.5nm, the 12nd layer, M3 film layers（12）91.5nm, the 13rd layer, Ti3O5 films
Layer（13）69.5nm, the 14th layer, M3 film layers（12）91.5nm, the 15th layer, Ti3O5 film layers（13）69.5nm, the 16th layer, M3 films
Layer（12）91.5nm, the 17th layer, SiO2 film layers（11）109.8nm, the 18th layer, M3 film layers（12）91.5nm, the 19th layer, SiO2
Film layer（11）109.8nm, the 20th layer, M3 film layers（12）91.5nm, the 21st layer, Ti3O5 film layers（13）69.5nm, the 22nd layer,
M3 film layers（12）91.5nm, the 23rd layer, Ti3O5 film layers（13）97.2nm, the 24th layer, M3 film layers（12）62.4nm.
Described glass baseplate uses BK7.
As shown in Fig. 2 the transmissivity and reflectivity Characteristics figure of all dielectric depolarization Amici prism for embodiment 1, from figure
In as can be seen that all dielectric depolarization Amici prism provided by the invention can be divided into 532nm wavelength transflection ratio for 50:50 and
The difference of S-polarization and P polarization is controlled within ± 3%.
Embodiment 3
A kind of all dielectric depolarization Amici prism, the prism by incident eyeglass 1, outgoing eyeglass 3 and be glued at incident eyeglass and
All dielectric depolarization spectro-film 2 between outgoing eyeglass forms；The all dielectric depolarization spectro-film 2 is by 24 layer dielectric groups
Into；24 layer dielectric is followed successively by：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer, Ti3O5 film layers
（13）, the 4th layer, M3 film layers（12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer, SiO2 film layers
（11）, the 8th layer, M3 film layers（12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer, Ti3O5 film layers
（13）, the 12nd layer, M3 film layers（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th layer, Ti3O5 films
Layer（13）, the 16th layer, M3 film layers（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）, the 19th layer, SiO2
Film layer（11）, the 20th layer, M3 film layers（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）, the 23rd layer,
Ti3O5 film layers（13）, the 24th layer, M3 film layers（12）.
A kind of all dielectric depolarization Amici prism according to claim 1, it is characterised in that：1st layer, SiO2 film layers
（11）Thickness is 103.9nm, the 2nd layer, M3 film layers（12）104.1nm, the 3rd layer, Ti3O5 film layers（13）43.7nm, the 4th layer, M3
Film layer（12）93.5nm, the 5th layer, Ti3O5 film layers（13）71nm, the 6th layer, M3 film layers（12）93.5nm, the 7th layer, SiO2 film layers
（11）111.8nm, the 8th layer, M3 film layers（12）93.5nm, the 9th layer, SiO2 film layers（11）111.8nm, the 10th layer, M3 film layers
（12）93.5nm, 11th layer, Ti3O5 film layers（13）71nm, the 12nd layer, M3 film layers（12）93.5nm, the 13rd layer, Ti3O5 film layers
（13）71nm, the 14th layer, M3 film layers（12）93.5nm, the 15th layer, Ti3O5 film layers（13）71nm, the 16th layer, M3 film layers（12）
93.5nm, the 17th layer, SiO2 film layers（11）111.8nm, the 18th layer, M3 film layers（12）93.5nm, the 19th layer, SiO2 film layers
（11）111.8nm, the 20th layer, M3 film layers（12）93.5nm, the 21st layer, Ti3O5 film layers（13）71nm, the 22nd layer, M3 film layers
（12）93.5nm, the 23rd layer, Ti3O5 film layers（13）98.2nm, the 24th layer, M3 film layers（12）63.4nm.
Described glass baseplate uses BK7.
As shown in Fig. 2 the transmissivity and reflectivity Characteristics figure of all dielectric depolarization Amici prism for embodiment 1, from figure
In as can be seen that all dielectric depolarization Amici prism provided by the invention can be divided into 532nm wavelength transflection ratio for 50:50 and
The difference of S-polarization and P polarization is controlled within ± 3%.
Above-mentioned that specifically simply the 532nm of BK7 materials is explained in detail as technical scheme in real time, the present invention is not only
Be confined to above-described embodiment, it is every to obtain any improvement and replacement according to the principle of the invention, all should protection scope of the present invention it
It is interior.
Claims (7)
- A kind of 1. all dielectric depolarization Amici prism, it is characterised in that：It includes incident eyeglass（1）, outgoing eyeglass（3）And glue Close in incident eyeglass（1）With outgoing eyeglass（3）Between depolarization spectro-film（2）Composition；It is characterized in that：The depolarization spectro-film（2）Be by high, medium and low three kinds of different coating materials multilayer spectro-film that alternate combinations form successively, The depolarization spectro-film is made up of 24 layer dielectric layers, and the 24 layer dielectric film layer is from incident eyeglass（1）To outgoing eyeglass（3） It is followed successively by：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer, Ti3O5 film layers（13）, the 4th layer, M3 film layers （12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer, SiO2 film layers（11）, the 8th layer, M3 film layers （12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer, Ti3O5 film layers（13）, the 12nd layer, M3 films Layer（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th layer, Ti3O5 film layers（13）, the 16th layer, M3 Film layer（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）, the 19th layer, SiO2 film layers（11）, the 20th layer, M3 Film layer（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）, the 23rd layer, Ti3O5 film layers（13）, the 24th Layer, M3 film layers（12）.
- A kind of 2. all dielectric depolarization Amici prism according to claim 1, it is characterised in that：1st layer, SiO2 film layers （11）Thickness is 100.9-103.9nm, the 2nd layer, M3 film layers（12）103.1-104.1nm, the 3rd layer, Ti3O5 film layers（13） 42.7-43.7nm, the 4th layer, M3 film layers（12）91.5-93.5nm, the 5th layer, Ti3O5 film layers（13）69.5-71nm, the 6th layer, M3 Film layer（12）91.5-93.5nm, the 7th layer, SiO2 film layers（11）109.8-111.8nm, the 8th layer, M3 film layers（12）91.5- 93.5nm, the 9th layer, SiO2 film layers（11）109.8-111.8nm, the 10th layer, M3 film layers（12）91.5-93.5nm, 11th layer, Ti3O5 film layers（13）69.5-71nm, the 12nd layer, M3 film layers（12）91.5-93.5nm, the 13rd layer, Ti3O5 film layers（13）69.5- 71nm, the 14th layer, M3 film layers（12）91.5-93.5nm, the 15th layer, Ti3O5 film layers（13）69.5-71nm, the 16th layer, M3 films Layer（12）91.5-93.5nm, the 17th layer, SiO2 film layers（11）109.8-111.8nm, the 18th layer, M3 film layers（12）91.5- 93.5nm, the 19th layer, SiO2 film layers（11）109.8-111.8nm, the 20th layer, M3 film layers（12）91.5-93.5nm, the 21st layer, Ti3O5 film layers（13）69.5-71nm, the 22nd layer, M3 film layers（12）91.5-93.5nm, the 23rd layer, Ti3O5 film layers（13） 97.2-98.2nm, the 24th layer, M3 film layers（12）62.4-63.4nm.
- A kind of 3. all dielectric depolarization Amici prism according to claim 1, it is characterised in that：Described optical glass base The refractive index of material is：1.49-1.56.
- A kind of 4. all dielectric depolarization Amici prism according to claim 1, it is characterised in that：Described glass baseplate is adopted With K9 or D263T or B270 or BK7.
- 5. a kind of preparation method of all dielectric depolarization Amici prism according to any one in claim 1-4, it is special Sign is：It comprises the following steps：Prepare glass substrate material；Ti3O5, M3 and SiO2 are selected as Coating Materials；Clean glass substrate layer：Ultrasonic wave cleaning is carried out to substrate of glass, then dries, refills into coating machine；Vacuumize so that the low 2*10-3Pa of background vacuum, heated baking then is carried out to substrate of glass, temperature reaches 120- 150 DEG C, and constant temperature 20-30 minutes；Using radio-frequency ion source is etched to the glass substrate layer after cleaning 5-10 minutes；Using radio-frequency ion source auxiliary electron beam evaporation method in the glass basic surface 5. handled by step according to apart from glass Substrate layer is from closely to far alternating deposit is coated with successively：1st layer, SiO2 film layers（11）, the 2nd layer, M3 film layers（12）, the 3rd layer, Ti3O5 film layers（13）, the 4th layer, M3 film layers（12）, the 5th layer, Ti3O5 film layers（13）, the 6th layer, M3 film layers（12）, the 7th layer, SiO2 film layers（11）, the 8th layer, M3 film layers（12）, the 9th layer, SiO2 film layers（11）, the 10th layer, M3 film layers（12）, 11th layer, Ti3O5 film layers（13）, the 12nd layer, M3 film layers（12）, the 13rd layer, Ti3O5 film layers（13）, the 14th layer, M3 film layers（12）, the 15th Layer, Ti3O5 film layers（13）, the 16th layer, M3 film layers（12）, the 17th layer, SiO2 film layers（11）, the 18th layer, M3 film layers（12）, 19 layers, SiO2 film layers（11）, the 20th layer, M3 film layers（12）, the 21st layer, Ti3O5 film layers（13）, the 22nd layer, M3 film layers（12）、 23rd layer, Ti3O5 film layers（13）, the 24th layer, M3 film layers（12）；During step is completed 6., when being coated with each SiO2 film layers, it is 0 .6-0 .8nm/s to control sedimentation rate, oxygenation capacity For 5-10sccm, ion beam voltage 600-800V, ion beam current 600-800mA；When being coated with each M3 film layers, it is 0 .2-0 .4nm/s to control sedimentation rate, oxygenation capacity 0-5sccm, and ion beam voltage is 600-800V, ion beam current 500-600mA；When being coated with each Ti3O5 film layers, it is 0 .3-0 .5nm/s to control sedimentation rate, oxygenation capacity 10-15sccm, ion beam electricity Press as 800-1000V, ion beam current 700-900mA.
- A kind of 6. plating method of all dielectric depolarization Amici prism according to claim 5, it is characterised in that：Step is 5. When being etched using radio-frequency ion source to glass baseplate (1), ion beam voltage 400-600V, ion beam current 400- 600mA。
- A kind of 7. plating method of all dielectric depolarization Amici prism according to claim 5, it is characterised in that：It is being coated with When SiO2 film layers, M3 film layers, Ti3O5 film layers, the revolution speed of workpiece plate is controlled in 20-25r/min.
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| CN201711030167.2A Pending CN107561623A (en) | 2017-10-30 | 2017-10-30 | A kind of all dielectric depolarization Amici prism and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110737099A (en) * | 2018-07-18 | 2020-01-31 | 福州高意光学有限公司 | Polarization independent beam splitter |
| CN114114703A (en) * | 2021-12-10 | 2022-03-01 | 中国科学院光电技术研究所 | All-dielectric depolarization beam splitter prism suitable for wide-angle incidence and preparation method thereof |
-
2017
- 2017-10-30 CN CN201711030167.2A patent/CN107561623A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110737099A (en) * | 2018-07-18 | 2020-01-31 | 福州高意光学有限公司 | Polarization independent beam splitter |
| CN110737099B (en) * | 2018-07-18 | 2022-02-11 | 福州高意光学有限公司 | Polarization independent beam splitter |
| CN114114703A (en) * | 2021-12-10 | 2022-03-01 | 中国科学院光电技术研究所 | All-dielectric depolarization beam splitter prism suitable for wide-angle incidence and preparation method thereof |
| CN114114703B (en) * | 2021-12-10 | 2023-10-03 | 中国科学院光电技术研究所 | All-dielectric depolarization beam splitter prism suitable for wide-angle incidence and preparation method thereof |
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