CN107557752A - Multilayer diamond-like film and its processing method - Google Patents

Multilayer diamond-like film and its processing method Download PDF

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CN107557752A
CN107557752A CN201710790204.3A CN201710790204A CN107557752A CN 107557752 A CN107557752 A CN 107557752A CN 201710790204 A CN201710790204 A CN 201710790204A CN 107557752 A CN107557752 A CN 107557752A
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processing
film
furnace chamber
multilayer diamond
diamond
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王震
司文华
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BEIYUAN ALLOY (SUZHOU) Co Ltd
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BEIYUAN ALLOY (SUZHOU) Co Ltd
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Abstract

Present invention is disclosed a kind of multilayer diamond-like film and its processing method, the multilayer diamond-like film of the present invention includes being attached to substrate material surface, the binder course for realizing high strength bond between film body and matrix material, and the combination layer surface, the superficial layer for lifting anti-wear performance are covered in, realize transition bonding by intermediate layer between the binder course and the superficial layer.Manufacturing cost of the present invention is low, with reference to effect it is good, significant effect is lifted to properties of product, there is very high use and promotional value.

Description

Multilayer diamond-like film and its processing method
Technical field
The present invention relates to a kind of multilayer diamond-like film and its processing method, and in particular to one kind can be applied to core hydraulic pressure The multilayer diamond-like film and its processing method of parts manufacture, belong to material processing field.
Background technology
With the rapid development of China's metal-working industry, market constantly carries for the performance requirement of all kinds of hydraulic products It is high.It is meanwhile also increasingly strong for product miniaturization and the requirement of the product feature of environmental protection.Above-mentioned requirements are based on, therefore at present The performance of raising material is all being puted forth effort by each processing enterprise.
At present, the friction pair of common hydraulic components is matched from copper alloy and steel more on the market, but with market Raising to hydraulic product performance requirement, in high-voltage product field, the friction pair manufactured using high-tensile strength brass can not meet Performance requirement.Therefore, in order to improve the mechanical performance of product, each processing enterprise is answered using Fine Steel Casting iron as backing base material more The method for closing copper alloy improves the mechanical performance of friction pair.
In existing process of manufacture, most part production is carried out by the way of powder metallurgy.It is and high Pressure, ultrahigh-pressure hydraulic parts are mostly wide in variety, the small product of batch, and the processing mode of powder metallurgy is not appropriate for this small quantities of Amount production, and the larger cost of production equipment of powder metallurgy is higher.
In order to overcome above-mentioned production material many defects existing during processing and use, professional is not Seek some new materials disconnectedly to realize the purpose of lifting properties of product.Specifically, the main component of diamond-film-like is Carbon, coefficient of friction is low, and meets environmental requirement, has in auto parts and components, electronic component, food machinery, medicine equipment etc. This is widely applied.Therefore, it is applied in the production and processing of hydraulic components and just seems very reasonable.
It is but also more strict to the requirements of its product because the use environment of hydraulic components is more special.For example, For friction pair, higher is required to the sintering resistance energy and abrasion resistance properties on surface.But at present, applied to surface of friction pair Diamond-film-like remains stripping problem under the conditions of high speed, heavy duty etc., and performance of the diamond-film-like in oil is not yet It is preferable.Therefore, processing enterprise diamond-film-like put into practical application is few.
In summary, a kind of high intensity, high sintering resistance how to be designed, low abrasion amount, can be applied to core hydraulic pressure zero The multilayer diamond-like film and its processing method of part manufacture, just become that staff in the art is urgently to be resolved hurrily to be asked Topic.
The content of the invention
In view of prior art has drawbacks described above, the purpose of the present invention is to propose to one kind can be applied to core hydraulic components The multilayer diamond-like film and its processing method of manufacture.
The purpose of the present invention, it will be achieved by the following technical programs:
A kind of multilayer diamond-like film, including it is attached to substrate material surface, for realizing height between film body and matrix material The binder course that intensity combines, and it is covered in the combination layer surface, the superficial layer for lifting anti-wear performance, the binder course Between the superficial layer transition bonding is realized by intermediate layer.
Preferably, described matrix material is iron-based material.
Preferably, the intermediate layer includes the first soft transition zone, hard layer and the second soft transition being sequentially superimposed Layer, the first soft transition zone are combined with the binder course, and the second soft transition zone is combined with the superficial layer.
Preferably, the combination of each interlayer is low temperature vacuum plasma implantation deposition.
Present invention further teaches a kind of processing method for processing above-mentioned multilayer diamond-like film, comprise the following steps:
S1, the furnace chamber progress vacuumize process by process equipment, and ensure that the vacuum in furnace chamber reaches more than 2pa;
S2, the surface of matrix material to needing to be put into the furnace chamber are cleaned, after the completion of cleaning, by described matrix Material is put into the furnace chamber;
S3, processing gas is injected into the furnace chamber, after treating that the processing is injected with gas, connect processing immediately The high frequency electric source of equipment, described matrix surrounding materials are made to generate plasma;
S4, cutting off processing equipment high frequency electric source, the heavy ion sheath of described matrix surrounding materials is set to disappear, plasma is certainly By floating;
S5, the high-voltage pulse power source for connecting process equipment, the gas ions of described matrix surrounding materials are made all to adsorb, deposition In the surface of described matrix material;
S6, the operation for repeating S1~S5, until described matrix material surface forms complete multilayer diamond-like film.
Preferably, in S1, after carrying out vacuumize process to the furnace chamber of process equipment, vacuum in furnace chamber for 2~ 3pa。
Preferably, in S3, when needing to use process equipment to complete the processing to intermediate layer, injected into the furnace chamber Processing with the combination that gas is one or both of Hexamethyldisiloxane and tetramethylsilane.
Preferably, in S3, when needing to use process equipment to complete the processing to superficial layer, injected into the furnace chamber Processing with the combination that gas is one or both of acetylene and toluene.
Preferably, in S2, when a length of 30~40min for being cleaned to substrate material surface.
Preferably, when being processed to binder course, a length of 45~60min during processing;When being processed to intermediate layer, A length of 105~140min during processing;When being processed to superficial layer, a length of 45~60min during processing.
The present invention protrusion effect be:
(1) multilayer diamond-like film of the invention can be deposited on using carbon steel, steel alloy as the matrix material of representative cunning Dynamic surface, makes processed finished products possess the features such as high intensity, high sintering resistance, low abrasion amount, so as to ensure that making for processed finished products Use effect.
(2) present invention is implanted into deposition technique by using low temperature vacuum plasma, is sunk in substrate surface attachment DLC Lamination, can give full play to the strength character of matrix material, while avoid high-temperature heating from producing shadow to matrix material metallographic structure Deformed caused by sound.
(3) present invention has used multiple-layer stacked deposition technique, by gas componant in processing procedure and electrical conditions Control, make the interlayer boundary of multilayer diamond-like film in fuzzy angled transition, so as to drastically increase diamond-film-like with The bond strength of substrate surface and anti-layering peel-ability, and the anti-sintering property of hydraulic components slidingsurface is improved, The low friction feature of diamond-film-like is more fully given play to.
(4) process of the invention is not high to equipment requirement, and cost of manufacture is relatively low, it is possible to achieve can realize same The Multi-varieties and Small-batch Production and multi items mixture manufacturing of one equipment;Meanwhile such mode of production can also be realized to very The processing of more small sizes, high complexity product, for example, the three-dimensional surface of convex-concave or Bearing inner surface etc., so as to help to contract The volume of finding, meet the miniaturization needs of product.
In summary, manufacturing cost of the present invention it is low, with reference to effect it is good, to properties of product lifted significant effect, have it is very high Use and promotional value.
Just accompanying drawing in conjunction with the embodiments below, is described in further detail to the embodiment of the present invention, so that of the invention Technical scheme is more readily understood, grasped.
Brief description of the drawings
Fig. 1 is the structural representation of the multilayer diamond-like film of the present invention;
Fig. 2 is the result schematic diagram that material friction is tested in the present invention;
Fig. 3 is the result schematic diagram of resistance to sintering test in the present invention;
Wherein:1st, binder course;2nd, the first soft transition zone;3rd, hard layer;4th, the second soft transition zone;5th, superficial layer.
Embodiment
Present invention is disclosed a kind of multilayer diamond-like film that can be applied to the manufacture of core hydraulic components and its processing side Method.
A kind of multilayer diamond-like film, including it is attached to substrate material surface, for realizing height between film body and matrix material The binder course 1 that intensity combines, and it is covered in the surface of binder course 1, the superficial layer 5 for lifting anti-wear performance, the knot Close and realize transition bonding by intermediate layer between layer 1 and the superficial layer 5.
Described matrix material is iron-based material.
The intermediate layer includes the first soft transition zone 2, the 3 and second soft transition zone 4 of hard layer being sequentially superimposed, institute State the first soft transition zone 2 to be combined with the binder course 1, the second soft transition zone 4 is combined with the superficial layer 5.
The combination of each interlayer is low temperature vacuum plasma implantation deposition.
Present invention further teaches a kind of processing method for processing above-mentioned multilayer diamond-like film, comprise the following steps:
S1, the furnace chamber progress vacuumize process by process equipment, and ensure that the vacuum in furnace chamber reaches more than 2pa;
S2, the matrix material for needing to be put into the furnace chamber is cleaned, after the completion of cleaning, described matrix material put Enter in the furnace chamber;
S3, processing gas is injected into the furnace chamber, after treating that the processing is injected with gas, connect processing immediately The high frequency electric source of equipment, described matrix surrounding materials are made to generate plasma;
S4, cutting off processing equipment high frequency electric source, the heavy ion sheath of described matrix surrounding materials is set to disappear, plasma is certainly By floating;
S5, the high-voltage pulse power source for connecting process equipment, the gas ions of described matrix surrounding materials are made all to adsorb, deposition In the surface of described matrix material;
S6, the operation for repeating S1~S5, until described matrix material surface forms complete multilayer diamond-like film.
In S1, after the furnace chamber progress vacuumize process of process equipment, the vacuum in furnace chamber is 2~3pa.
In S3, when needing to use process equipment to complete processing to binder course 1, the processing injected into the furnace chamber It is Hexamethyldisiloxane (HMDSO) and/or tetramethylsilane (TMS) with gas.
In S3, when needing to use process equipment to complete processing to superficial layer 5, the processing injected into the furnace chamber It is acetylene (C2H2) and/or toluene (C7H8) with gas.
It should be noted that above-mentioned processing gas, which both can be used alone, can also integrate use, specific service condition It can be further determined that according to actual condition.
S1~S5 processing total duration is 45~75min.The total duration for completing material overall processing is about 300min.This Total duration refers to the whole processing procedure about required time.Specifically, the processed surface of cleaning early stage need 30~ 40min, the processing of the binder course 1 need 45~60min, and the processing of the first soft transition zone 2 needs 30~40min, The processing of the hard layer 3 needs 45~60min, and the processing of the second soft transition zone 4 needs 30~40min, the superficial layer Processing need 45~60min.
In addition, above-mentioned process operation can be carried out under room temperature state, the requirement for environment temperature is not notable.By Deposition technique is implanted into using low temperature vacuum plasma in the present invention, the strike used in conventional process is different from and applies The mode of layer, rapidoprint will not significantly heat up, and the phenomenon for also avoiding material deformation occurs.
Described low temperature vacuum plasma implantation deposition technique refers under conditions of base material is static by directly in base material Upper overlapped high-frequency pulse makes base material self-discharge produce plasma, so as to attract ion to form sedimentary, ensures that work Part surface forms uniform DLC sedimentary.In addition, the technology can also be completed in the case of without using rotating device To there is the processing of the three-dimensional workpiece surface deposits of convex-concave profile.
Specifically, technical scheme mainly solves the problems, such as several aspects:
(1) bond strength between diamond-film-like and matrix material is improved, avoids the stripping being also easy to produce in high load region From phenomenon, the stability of friction pair performance ensure that.
(2) low-temperature treatment is used, avoiding high temperature surface treatment makes to deform caused by rapidoprint, after eliminating deformation Continuous Technology for Heating Processing produces internal stress to diamond-film-like, extends the life-span of rapidoprint.
(3) oil resistance of diamond-film-like is improved, overcome that conventional diamond-film-like is easily peeled off in oil asks Topic.
The multilayer diamond-like film of the present invention, its film hardness HV indexes 1500-2000, anti-sintering PV indexes more than 100 (PV=P × V, wherein P are pressure when sintering occurs, and V is sliding speed when sintering occurs.) as a comparison, equal conditions The PV indexes of lower control copper alloy are 75 or so.In the case of caused by no peeling, abrasion weight of the invention is visual It is zero.
Technical scheme is expanded on further below by way of every specific experiment:
(1) material friction is tested
The processing base material of test sample uses carbon steel, to the processing of slidingsurface implementation of class diamond film deposition.Sample table Surface roughness is Ra=0.20~0.40, the average HRC Actual Measuring average values 60.2 of hardness.(PV index contrast copper alloy sample hardness HRB Actual Measuring average values 93.0).
Experiment pairing material is FCD600, and through the soft desalt processing of gas, it is shaped as φ 50 × φ, 10 × 8t, rough surface Spend hardness HV510 ± 30 of Ra=0.20~0.40 (gas soft desalination Biao Mian Xia 15 μm of Approximately).
Experimental condition parameter is as follows, friction area:3.67cm2, maximum pressure 24.5MPa (when pressure is 10000N), slide Dynamic radius:19.5mm, maximum speed 10.21m/s (when revolution is 5000rpm), lubricating condition:Lubricating oil Cosmo Hydro AW 46 (kinetic viscosity 45.9mm2/ s, 40 DEG C, 6.974mm2/ s, 100 DEG C), MAX240ml/min circulations are overflowed.
Test stop condition, a. coefficient of friction more than 0.2, more than 200 DEG C of b. pairing materials temperature, 200 DEG C of c. oil temperatures with On, more than d. moments of torsion 1500Ncm.When one of above-mentioned a~d occurs, experiment is automatically stopped.According to the pressure during stopping of record Power, speed calculate the sintering resistance energy that pv indexes compare sedimentary.Result of the test is referring to Fig. 2.
(2) resistance to sintering test
Relevance that herein first will illustratively between this experiment and above-mentioned material friction test.By and large, friction examination Test and generally comprise two kinds of resistance to sintering test and Abrasion resistance test.(1) is described as described above for the primary condition of experiment.But two kinds of experiments Load mode and sliding speed control mode it is different.
Resistance to sintering test is the load of gradual increase friction pair, gradually accelerates the sintering that sliding speed is finally reached friction pair Point.Namely biting point.Friction pair, which sticks together, on biting point to slide.This experiment is to evaluate material using PV indexes Sintering resistance energy, the bigger sintering resistance for representing material of the numerical value of PV indexes can be better.
Abrasion resistance test is under constant load, velocity conditions.Investigate endurance quality i.e. the life-span of friction pair.This Because the coefficient of friction of diamond-film-like is extremely low in invention, wear extent can be ignored under conditions of no stripping.So Only do resistance to sintering test.
This test sample base material is handled using carbon steel slidingsurface implementation of class diamond film deposition.Implement frictional behaviour examination Test.Base surface roughness is in Ra 0.01 between Ra0.35.Foundation as a comparison, current copper alloy hydraulic components are slided The surface roughness on dynamic surface is more between Ra0.2 to Ra0.5.
Result of the test is sunk as shown in figure 3, result of the test shows the surface roughness of slidingsurface between Ra0.2 to 0.4 The sintering resistance energy PV indexes of lamination can reach more than 100, and the slidingsurface that this is exactly hydraulic components generally uses Surface roughness, it may not be necessary to the difficulty of processing on the processed surface of increase.
(3) gas componant optimizes with intermediate layer
Test substrate selects S45C (n=3), and experimental result is as shown in table 1.
Table 1
The result of table 1 shows, using acetylene as main sedimentary raw material, the sample using Hexamethyldisiloxane as intermediate layer raw material The PV of the resistance to sintering indexes of the sedimentary of 1~3 processing are 17 to 24.4~6 addition silicon do not have to the sintering resistance PV indexes of sedimentary Improve, the sintering resistance PV indexes to sedimentary that 7~12 acetylene add titanium have clear improvement, the equipment used with regard to this experiment The sintering resistance PV indexes of sedimentary are 38 to 55 during Ti content highest in limit of power.In summary, base material is used as using S45C The sintering resistance energy of contrast copper alloy can not be obtained.
For test substrate from SCM415N leaching charcoals (n=3), experimental result is as shown in table 2.
Table 2
The result of table 2 shows that base material SCM415N (16~18) PV indexes can reach more than 50 and compare under the conditions of test process S45C has a clear superiority.Using acetylene as main sedimentary raw material, adding Ti during using Hexamethyldisiloxane as intermediate layer raw material can not Improve the sintering resistance energy of sedimentary.Unstrpped gas is changed to the mixture of acetylene and toluene and makees intermediate layer using tetramethylsilane Raw material is in mixing ratio 22.5:When 7.5, PV indexes can reach 70 or so, close to the PV indexes of contrast copper alloy.
(4) influences of the BPD (BPD=Bias Pulse Delay) to sedimentary sintering resistance energy
BPD and resistance to sintering PV indexes correlation are as shown in table 3.
Table 3
The result of table 3 shows, BPD at 100 or so, the resistance to sintering PV indexes of sedimentary more than 100, BPD 60 to 140 it Between can ensure the PV of the resistance to sintering indexes of sedimentary more than 75.The resistance to sintering PV indexes of copper alloy are 75 as a comparison.
According to above result of the test, with reference to the application field of the present invention, present invention can apply to the oil distribution casing of high-pressure plunger, The processing of the core hydraulic components such as cylinder body, plunger.
Relative to prior art, the invention has the characteristics that:
(1) multilayer diamond-like film of the invention can be deposited on using carbon steel, steel alloy as the matrix material of representative cunning Dynamic surface, makes processed finished products possess the features such as high intensity, high sintering resistance, low abrasion amount, so as to ensure that making for processed finished products Use effect.
(2) present invention is implanted into deposition technique by using low temperature vacuum plasma, is sunk in substrate surface attachment DLC Lamination, can give full play to the strength character of matrix material, while avoid high-temperature heating from producing shadow to matrix material metallographic structure Deformed caused by sound.
(3) present invention has used multiple-layer stacked deposition technique, by gas componant in processing procedure and electrical conditions Control, make the interlayer boundary of multilayer diamond-like film in fuzzy angled transition, so as to drastically increase diamond-film-like with The bond strength of substrate surface and anti-layering peel-ability, and the anti-sintering property of hydraulic components slidingsurface is improved, The low friction feature of diamond-film-like is more fully given play to.
(4) process of the invention is not high to equipment requirement, and cost of manufacture is relatively low, it is possible to achieve can realize same The Multi-varieties and Small-batch Production and multi items mixture manufacturing of one equipment;Meanwhile such mode of production can also be realized to very The processing of more small sizes, high complexity product, for example, the three-dimensional surface of convex-concave or Bearing inner surface etc., so as to help to contract The volume of finding, meet the miniaturization needs of product.
In summary, manufacturing cost of the present invention it is low, with reference to effect it is good, to properties of product lifted significant effect, have it is very high Use and promotional value.
It is obvious to a person skilled in the art that the invention is not restricted to the details of above-mentioned one exemplary embodiment, Er Qie In the case of without departing substantially from spirit and essential characteristics of the invention, the present invention can be realized in other specific forms.Therefore, no matter From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power Profit requires rather than described above limits, it is intended that all in the implication and scope of the equivalency of claim by falling Change is included in the present invention, and any reference in claim should not be considered as to the involved claim of limitation.

Claims (10)

  1. A kind of 1. multilayer diamond-like film, it is characterised in that:Including being attached to substrate material surface, for realizing film body and matrix The binder course of storeroom high strength bond(1), and it is covered in the binder course(1)Surface, the table for lifting anti-wear performance Surface layer(5), the binder course(1)With the superficial layer(5)Between by intermediate layer realize transition bonding.
  2. 2. multilayer diamond-like film according to claim 1, it is characterised in that:Described matrix material is iron-based material.
  3. 3. multilayer diamond-like film according to claim 1, it is characterised in that:The intermediate layer includes the be sequentially superimposed One soft transition zone(2), hard layer(3)And the second soft transition zone(4), the first soft transition zone(2)With the knot Close layer(1)It is combined, the second soft transition zone(4)With the superficial layer(5)It is combined.
  4. 4. according to any described multilayer diamond-like film of claim 1 or 3, it is characterised in that:The combination side of each interlayer Formula is low temperature vacuum plasma implantation deposition.
  5. 5. the processing method that one kind is used to process the multilayer diamond-like film as described in claim 1 ~ 3 is any, it is characterised in that Comprise the following steps:
    S1, the furnace chamber progress vacuumize process by process equipment, and ensure that the vacuum in furnace chamber reaches more than 2pa;
    S2, the surface of matrix material to needing to be put into the furnace chamber are cleaned, after the completion of cleaning, by described matrix material It is put into the furnace chamber;
    S3, processing gas is injected into the furnace chamber, after treating that the processing is injected with gas, connect process equipment immediately High frequency electric source, make described matrix surrounding materials generate plasma;
    S4, cutting off processing equipment high frequency electric source, the heavy ion sheath of described matrix surrounding materials is set to disappear, plasma freely floats It is floating;
    S5, the high-voltage pulse power source for connecting process equipment, make the gas ions of described matrix surrounding materials all adsorb, are deposited on institute State the surface of matrix material;
    S6, the operation for repeating S1 ~ S5, until described matrix material surface forms complete multilayer diamond-like film.
  6. 6. the processing method of multilayer diamond-like film according to claim 5, it is characterised in that:In S1, processing is set After standby furnace chamber carries out vacuumize process, the vacuum in furnace chamber is 2 ~ 3pa.
  7. 7. the processing method of multilayer diamond-like film according to claim 5, it is characterised in that:In S3, when needs make When completing processing to intermediate layer with process equipment, the processing injected into the furnace chamber with gas be Hexamethyldisiloxane and The combination of one or both of tetramethylsilane.
  8. 8. the processing method of multilayer diamond-like film according to claim 5, it is characterised in that:In S3, when needs make Completed with process equipment to superficial layer(5)Processing when, the processing injected into the furnace chamber is in acetylene and toluene with gas One or two kinds of combinations.
  9. 9. the processing method of multilayer diamond-like film according to claim 5, it is characterised in that:In S2, to matrix material When a length of 30 ~ 40min that material surface is cleaned.
  10. 10. the processing method of multilayer diamond-like film according to claim 5, it is characterised in that:In S3 ~ S5, right Binder course(1)When being processed, a length of 45 ~ 60min during processing;When being processed to intermediate layer, a length of 105 during processing ~ 140min;To superficial layer(5)When being processed, a length of 45 ~ 60min during processing.
CN201710790204.3A 2017-09-05 2017-09-05 Multilayer diamond-like film and its processing method Pending CN107557752A (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1827845A (en) * 2005-11-11 2006-09-06 东北大学 Method for manufacturing diamond-like film and part with coating manufactured thereby
CN102586735A (en) * 2012-03-16 2012-07-18 广州有色金属研究院 Hydrogen-free silicon incorporated diamond film and preparation method thereof
CN103572249A (en) * 2012-08-07 2014-02-12 株式会社电装 Method and device for forming amorphous carbon coating
CN104846332A (en) * 2015-04-17 2015-08-19 岭南师范学院 Superlubricity multilayer nano composite coating and preparation method thereof
CN104894513A (en) * 2015-04-13 2015-09-09 江苏惠丰润滑材料股份有限公司 Silicon-doped diamond film on surface of spacecraft moving part and method for combining to surface of spacecraft moving part
CN107022745A (en) * 2017-04-28 2017-08-08 星弧涂层新材料科技(苏州)股份有限公司 Incrassation type laminated film and its film plating process based on DLC film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1827845A (en) * 2005-11-11 2006-09-06 东北大学 Method for manufacturing diamond-like film and part with coating manufactured thereby
CN102586735A (en) * 2012-03-16 2012-07-18 广州有色金属研究院 Hydrogen-free silicon incorporated diamond film and preparation method thereof
CN103572249A (en) * 2012-08-07 2014-02-12 株式会社电装 Method and device for forming amorphous carbon coating
CN104894513A (en) * 2015-04-13 2015-09-09 江苏惠丰润滑材料股份有限公司 Silicon-doped diamond film on surface of spacecraft moving part and method for combining to surface of spacecraft moving part
CN104846332A (en) * 2015-04-17 2015-08-19 岭南师范学院 Superlubricity multilayer nano composite coating and preparation method thereof
CN107022745A (en) * 2017-04-28 2017-08-08 星弧涂层新材料科技(苏州)股份有限公司 Incrassation type laminated film and its film plating process based on DLC film

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