CN107479247A - Liquid crystal disply device and its preparation method - Google Patents

Liquid crystal disply device and its preparation method Download PDF

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Publication number
CN107479247A
CN107479247A CN201710845041.4A CN201710845041A CN107479247A CN 107479247 A CN107479247 A CN 107479247A CN 201710845041 A CN201710845041 A CN 201710845041A CN 107479247 A CN107479247 A CN 107479247A
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China
Prior art keywords
liquid crystal
base material
alignment layers
layer
pixel electrode
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CN201710845041.4A
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Chinese (zh)
Inventor
黄北洲
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HKC Co Ltd
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HKC Co Ltd
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Priority to CN201710845041.4A priority Critical patent/CN107479247A/en
Priority to PCT/CN2017/107319 priority patent/WO2019056454A1/en
Publication of CN107479247A publication Critical patent/CN107479247A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133528—Polarisers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G02F1/134318—Electrodes characterised by their geometrical arrangement having a patterned common electrode
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
    • G02F1/13712—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering the liquid crystal having negative dielectric anisotropy

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)

Abstract

The invention discloses Liquid crystal disply device and its preparation method.Manufacture method includes：Community electrode is formed in a first base material, a matrix circuit is formed in one second base material, the thin film transistor (TFT) of matrix circuit is connected with patterned pixel electrode, one pixel is distinguished at least two sub-regions in one direction by the patterned pixel electrode, one first both alignment layers are formed on common electrode, and one second both alignment layers are formed on patterned pixel electrode, plurality of grooves is formed in the first both alignment layers or the second both alignment layers, a liquid crystal layer is formed between the first both alignment layers and the second both alignment layers, wherein liquid crystal layer includes the n-type liquid crystal molecule and photoreactivity monomer of the negative dielectric anisotropy of plural number, and one light of irradiation, to put on those liquid crystal molecules more than one of liquid crystal molecule threshold voltage.The present invention can lift visual angle.

Description

Liquid crystal disply device and its preparation method
Technical field
The present invention has negative permittivity anisotropy on a kind of display device and its manufacture method especially in regard to one kind (Anisotropy) Liquid crystal disply device and its preparation method.
Background technology
With the development of science and technology flat display apparatus is widely used in various fields, especially liquid crystal display Device, because with build is frivolous, low power consumption and the advantageous characteristic such as radiationless, gradually substituting conventional cathode ray tube Display device, and apply into the electronic product of numerous species, such as mobile phone, portable multimedia device, notes type meter Calculation machine, LCD TV and LCD screen etc..
Liquid crystal display device is the rotation using electric field controls liquid crystal molecule, allows light to may pass through liquid crystal molecule and shows shadow Picture.A kind of known TN types liquid crystal display device has the problem of visual angle (view angle) is narrow, when beholder deviates display picture Front when, image will produce significantly distortion, especially in the screen of maximization, image distortion phenomenon is more obvious.Most in the past The convenient mode for improving visual angle is to stick view film, but view film is the exclusive material of one manufacturer of Japan, and cost is not Cheaply.Therefore, major panel manufacturer just constantly puts into manpower, time and money and researches and develops new liquid crystal material or new panel construction To improve visual angle, to lift the competitiveness of product.
The content of the invention
The purpose of the present invention can reach the effect at lifting visual angle to provide a kind of Liquid crystal disply device and its preparation method.
The present invention proposes a kind of manufacture method of liquid crystal display device, including：Community electrode is formed in a first base material On；A matrix circuit is formed on one second base material, wherein matrix circuit includes a thin film transistor (TFT) and patterned pixel electricity Pole, thin film transistor (TFT) are connected with patterned pixel electrode, a pixel be patterned pixel electrode be distinguished into one direction to Few two sub-regions；One first both alignment layers are formed on common electrode, and form one second both alignment layers in patterned pixel electrode On；The first both alignment layers or the second both alignment layers are made to form plurality of grooves；A liquid crystal layer is formed in the first both alignment layers and the second orientation Between layer, wherein liquid crystal layer includes the n-type liquid crystal molecule of the negative dielectric anisotropy of plural number and plural photoreactivity monomer；And irradiation One light, and to put on those liquid crystal molecules more than one of those liquid crystal molecules threshold voltage, make those photoreactivity monomers Solidify with those polymerizable liquid crystal molecules, to define incline direction of those liquid crystal molecules under voltage effect.
The light is ultraviolet, and irradiates those photoreactivity monomers by side of the first base material away from the second base material, Or those photoreactivity monomers are irradiated by side of second base material away from the first base material.
The manufacture method more may include：A chromatic filter layer is formed in the first base material or the second base material, wherein colored Filter layer includes multiple optical filtering portions；And a black-matrix layer is formed in the first base material, wherein black-matrix layer corresponds to those Optical filtering portion is set.
The present invention separately proposes a kind of liquid crystal display device, including a first substrate, a second substrate, one first both alignment layers, One second both alignment layers and a liquid crystal layer.First substrate includes community electrode and a first base material, and common electrode is arranged at On one base material.Second substrate includes a matrix circuit and one second base material, and matrix circuit is arranged on the second base material, and includes one Thin film transistor (TFT) and a patterned pixel electrode, thin film transistor (TFT) are connected with patterned pixel electrode, and a pixel is patterned Pixel electrode is distinguished at least two sub-regions in one direction.First both alignment layers are arranged on common electrode, the second both alignment layers It is arranged on patterned pixel electrode, wherein the first both alignment layers or the second both alignment layers have plurality of grooves.Liquid crystal layer is arranged at Between first both alignment layers and the second both alignment layers, liquid crystal layer includes the plural n-type liquid crystal molecule for bearing dielectric anisotropy and plural light is anti- Answering property monomer, wherein, those liquid crystal molecules and those photoreactivity monomers are irradiated by a light, make those photoreactivity monomers Solidify with those polymerizable liquid crystal molecules, to define incline direction of those liquid crystal molecules under voltage effect.
Wherein, in the case of vertical view, those grooves are zigzag.
In addition, the first base material or the second base material can be a flexible substrate, flexible substrate includes high-molecular organic material.
In addition, liquid crystal display device further includes one first Polarizer and one second Polarizer, the first Polarizer and second inclined Tabula rasa is respectively arranged at the first base material and surface of second base material away from liquid crystal layer, and the first Polarizer and the second Polarizer include 45 Spend the orthogonal Nicol prism structure of the absorption axiss of angular direction.
The present invention proposes a kind of liquid crystal display device again, including a first substrate, a second substrate, one first both alignment layers, One second both alignment layers, a liquid crystal layer, one first Polarizer and one second Polarizer and a backlight module.First substrate includes one Common electrode, a chromatic filter layer, a black-matrix layer and a first base material, chromatic filter layer are arranged in the first base material, black Color matrix layer is set around chromatic filter layer, and common electrode is arranged in chromatic filter layer and black-matrix layer.Second substrate bag It is arranged at containing a matrix circuit and one second base material, matrix circuit on the second base material, and includes a thin film transistor (TFT) and a pattern Change pixel electrode, thin film transistor (TFT) is connected with patterned pixel electrode, and a pixel is patterned pixel electrode in one direction It is distinguished at least two sub-regions.First both alignment layers are arranged on common electrode, and the second both alignment layers are arranged at patterned pixel electricity On extremely, wherein the first both alignment layers or the second both alignment layers have plurality of grooves, and in the case of vertical view, those grooves are sawtooth Shape.Liquid crystal layer is arranged between the first both alignment layers and the second both alignment layers, wherein wherein liquid crystal layer includes the negative dielectric anisotropy of plural number N-type liquid crystal molecule and plural photoreactivity monomer, and be that those liquid crystal molecules and those photoreactivities are irradiated by a light Monomer, those photoreactivity monomers is solidified with those polymerizable liquid crystal molecules, acted on defining those liquid crystal molecules in a voltage Under incline direction.First Polarizer and the second Polarizer are respectively arranged at the first base material and table of second base material away from liquid crystal layer Face.Backlight module is arranged at side of the second substrate away from first substrate.
From the above, in the Liquid crystal disply device and its preparation method of the present invention, matched somebody with somebody by the first both alignment layers or second Patterning configuration and polymer-stabilized alignment technology to those grooves of layer make liquid crystal molecule pre-tilt when without applied voltage (pre-tilt) in multiple directions, when the drive voltage is applied, liquid crystal molecule can be made to be rotated along the direction of script pre-tilt, removed Outside the reaction speed that liquid crystal can be accelerated, the purpose of multiregional vertical align is more can reach, and then cause the liquid crystal of the present invention Display device has the effect at lifting visual angle.
Brief description of the drawings
Fig. 1 is a kind of process step figure of the manufacture method of liquid crystal display device of first embodiment of the invention.
Fig. 2A to Fig. 2 G is respectively the manufacturing process schematic diagram of the liquid crystal display device of one embodiment of the invention.
Fig. 3 is the schematic diagram of the patterned pixel electrode of an embodiment.
Fig. 4 A to Fig. 4 C are respectively liquid crystal molecule and reaction schematic diagram during photoreactivity monomer irradiation light.
Fig. 5 is the schematic diagram of the liquid crystal display device of another embodiment aspect of the present invention.
Fig. 6 is a kind of schematic diagram of liquid crystal display device of another preferred embodiment of the present invention.
Fig. 7 is a kind of process step figure of the manufacture method of liquid crystal display device of second embodiment of the invention.
Fig. 8 A to Fig. 8 G are respectively the manufacturing process schematic diagram of the liquid crystal display device of one embodiment of the invention.
Fig. 9 A to Fig. 9 C are respectively liquid crystal molecule and reaction schematic diagram during photoreactivity monomer irradiation light.
Figure 10 is the schematic diagram of the liquid crystal display device of another embodiment aspect of the present invention.
Embodiment
Hereinafter with reference to correlative type, illustrate the Liquid crystal disply device and its preparation method according to present pre-ferred embodiments, Wherein identical component will be illustrated with identical reference marks.
The liquid crystal display device of following examples includes a liquid crystal display panel, and liquid crystal display panel can be a vertical orientation The liquid crystal display panel of mode (vertical alignment mode, VA mode).In VA type liquid crystal display panels, not In the state of applying driving voltage, the liquid crystal molecule of major part is all arranged vertically to upper and lower substrate, and turns into penetrance (Transmittance) state for being zero (i.e. black display), when applying the driving voltage of predetermined voltage (giving fixed electrode), then Liquid crystal molecule can substantially turn into horizontally arranged and liquid crystal display panel is obtained white displays, and apply less than predetermined voltage During driving voltage, the liquid crystal molecule of major part can obtain uniform semi-tone and show to tilt.
First embodiment
Fig. 1 is a kind of process step figure of the manufacture method of liquid crystal display device of first embodiment of the invention.
As shown in figure 1, the manufacturing process of liquid crystal display device may include following steps：Community electrode is formed in one first (step T01), one matrix circuit of formation are on one second base material on base material, and wherein matrix circuit includes a thin film transistor (TFT) and one Patterned pixel electrode, thin film transistor (TFT) are connected with patterned pixel electrode, and a pixel is patterned pixel electrode in a side At least two sub-regions (step T02) are distinguished into upwards, form one first both alignment layers on common electrode, and are formed one second and matched somebody with somebody To layer in (step T03) on patterned pixel electrode, the first both alignment layers or the second both alignment layers is formed plurality of grooves (step T04 a liquid crystal layer), is formed between the first both alignment layers and the second both alignment layers, and wherein liquid crystal layer includes the negative dielectric anisotropy of plural number One light of n-type liquid crystal molecule and plural photoreactivity monomer (step T05) and irradiation, and with more than those liquid crystal molecules One of threshold voltage put on those liquid crystal molecules, solidify those photoreactivity monomers and those polymerizable liquid crystal molecules, with fixed Incline direction (step T06) of those the adopted liquid crystal molecules under voltage effect.
In addition, the manufacture method of liquid crystal display device more may include：Formed a chromatic filter layer in the first base material or On second base material, wherein chromatic filter layer includes multiple optical filtering portions and forms a black-matrix layer in the first base material, wherein Black-matrix layer is set corresponding to those optical filtering portions.
Hereinafter, it refer to Fig. 1 and coordinate shown in Fig. 2A to Fig. 2 G, to illustrate above-mentioned manufacture method.Wherein, Fig. 2A extremely schemes 2G is respectively the manufacturing process schematic diagram of the liquid crystal display device 1 of one embodiment of the invention.
First, step T01 is：Common electrode 112 is formed in the first base material 111.As shown in Figure 2 A, it is in the first base material Formed on 111 surface a flood common electrode 112 (Fig. 2A be display invert, i.e., common electrode 112 is located at the first base material 111 lower surface).But, before the step T01 of common electrode 112 is formed, the present embodiment is first in the first base material 111 Chromatic filter layer CF and black-matrix layer BM is formed on surface, and black-matrix layer BM is set corresponding to chromatic filter layer CF Afterwards, then by common electrode 112 it is formed on chromatic filter layer CF and black-matrix layer BM.Wherein, black-matrix layer BM is impermeable Luminescent material, such as can be metal or resin, and metal for example can be chromium, chromium oxide or nitrogen oxygen chromium compound.Due to black matrix" Layer BM is light tight material, therefore lighttight region can be formed in the first base material 111, and then defines the area of light-permeable Domain.Chromatic filter layer CF can include multiple optical filtering portions such as a red, green and a blueness, and its material is light-permeable material, Such as can be pigment or dyestuff, and can by decoration method, pigment dispersion method, print process, dry film method or electricity the mode such as method will not Optical filtering portion with color is respectively formed in the first base material 111.In this, those optical filtering portions do not limit only red, green or blue Color optical filtering portion, and black-matrix layer BM can be set around those optical filtering portions.In addition, the chromatic filter layer CF of the present embodiment is It is formed in the first base material 111, but in various embodiments, chromatic filter layer CF can be also formed on the second base material 121.
Then, step T02 is：Matrix circuit is formed on the second base material 121, wherein matrix circuit includes thin film transistor (TFT) T and patterned pixel electrode 122, thin film transistor (TFT) T are connected with patterned pixel electrode 122, and a pixel is patterned picture Plain electrode 122 is distinguished at least two sub-regions in one direction.Wherein, thin film transistor (TFT) T can with patterned pixel electrode 122 For two-dimensional array, and it is the switch module and pixel electrode of one of liquid crystal display panel pixel (pixel)., can in this Thin film transistor (TFT) T and patterned pixel electrode 122 are formed on the second base material 121 by semiconductive thin film processing procedure.Above-mentioned Thin film manufacture process can include low temperature polycrystalline silicon (LTPS) processing procedure, non-crystalline silicon (a-Si) processing procedure or metal oxide (such as indium gallium zinc, IGZO) manufacture of semiconductor etc., is not intended to limit.In addition, it is that can be initially formed pixel electrode and then be patterned by etch process The pixel electrode, as shown in figure 3, so that there are multiple slits as patterned pixel electrode 122, and a pixel can be by pattern These slits for changing pixel electrode 122 are distinguished at least two sub-regions in one direction, and then according to the figure of this pixel electrode Case, when a voltage is employed, liquid crystal molecule tiltable is in such as four different directions (a, b, c, d), to lift visual angle.
In addition, as shown in Figure 2 B, the thin film transistor (TFT) T of the present embodiment can include a gate G, a brake-pole dielectric layer GI, one Channel layer C, a source S and a drain D.Gate G is formed on the second base material 121, and gate G material can be that metal (is, for example, Aluminium, copper, silver, molybdenum or titanium) or the single or multiple lift structure that is formed of its alloy.Part, can to transmit the wire of driving signal Structure with use with gate G with layer and same processing procedure, is electrical connected each other, such as scan line (figure is not shown).Gate dielectric Layer GI is formed and is covered on gate G, and brake-pole dielectric layer GI can be that organic material is, for example, organo-siloxane compound, or inorganic Material is, for example, the sandwich construction of silicon nitride, silica, silicon oxynitride, carborundum, aluminum oxide, hafnium oxide or above-mentioned material.Lock Pole dielectric layer GI need to completely cover gate G, and on the second base material 121 of selectable portion or whole coverings.
Channel layer C is formed on brake-pole dielectric layer GI with respect to gate G positions.On the implementation, channel layer C is such as, but not limited to Include monoxide semiconductor.Wherein, foregoing oxide semiconductor includes oxide, and oxide includes indium, gallium, zinc and tin One of them, for example, indium gallium zinc (Indium Gallium Zinc Oxide, IGZO).In addition, source S is divided with drain D It is not formed on channel layer C, and source S and drain D one end contact with channel layer C respectively.In thin film transistor (TFT) T channel layer When C is not turned on, source S and drain D are electrically isolated.Part can be used with source S with drawing to transmit the wire of driving signal Pole D is the same as the structure of layer and same processing procedure, such as data wire (figure do not show).Wherein, thin film transistor (TFT) T drain D can be with pattern Change pixel electrode 122 to connect, therefore, when thin film transistor (TFT) T channel layer C conductings, the data voltage of pixel can pass through data Line, source S are transferred to corresponding patterned pixel electrode 122 with drain D.Wherein, source S and drain D material can be gold The single or multiple lift structure that category (such as aluminium, copper, silver, molybdenum or titanium) or its alloy are formed does not limit.
The thin film transistor (TFT) T of the present embodiment source S is directly formed with drain D to be connected on channel layer C with channel layer C Connect, but, in various embodiments, after also one layer of etch stop layer (not illustrating) being formed on channel layer C, then lead to respectively One of overetch stop layer is open and source S is contacted respectively with channel layer C with drain D one end.Above-mentioned etch stop layer Can be that organic material be, for example, organo-siloxane compound, or single-layer inorganic material such as silicon nitride, silica, silicon oxynitride, carbon SiClx, aluminum oxide, hafnium oxide or the sandwich construction of above-mentioned material combination.
In addition, the base material 121 of the first base material 111 or second can be a rigid base material, and made by light-transmitting materials, such as can For a glass baseplate, a quartz substrate or a plastic basis material, do not limit.In further embodiments, the first base material 111 or the Two base materials 121 can be a flexible substrate so that liquid crystal display panel has pliability for a soft panel.Flexible substrate can wrap Containing high-molecular organic material, the glass transition temperature of high-molecular organic material (Glass Transition Temperature, Tg) between 600 degree, by so high glass transition temperature, flexible substrate can be made in follow-up to Celsius between 400 degree Celsius Thin film manufacture process in, characteristic will not be destroyed.High-molecular organic material can be thermoplastic, for example, polyimides (PI), Polyethylene (Polyethylene, PE), polyvinyl chloride (Polyvinylchloride, PVC), polystyrene (PS), acryl (propylene, acrylic), fluorinated polymer (Fluoropolymer), polyester fiber (polyester) or nylon (nylon).Separately Outside, the material of common electrode 112 and patterned pixel electrode 122 for example can be indium tin oxide (ITO), indium-zinc oxide (IZO), aluminium zinc oxide (AZO), cadmium tin-oxide (CTO), tin oxide (SnO2) or the electrically conducting transparent material such as zinc oxide (ZnO) Material, is not limited.
It is noted that the present embodiment is first to carry out carrying out step T02 again after step T01, so it is not limited thereto, In various embodiments, both sequentially can be on the contrary, or carry out simultaneously.In addition, matrix circuit can more include complex data line With plural scan line, those data wires are staggered to define plural pixel with those scan lines.Wherein, a pixel can be right Should there are a thin film transistor (TFT) T and a patterned pixel electrode 122, and a pixel can correspond to one of chromatic filter layer CF Optical filtering portion.
Then, carrying out step T03 is：The first both alignment layers 113 are formed on common electrode 112, and form the second both alignment layers 123 on patterned pixel electrode 122.As shown in Fig. 2 C and Fig. 2 D, first both alignment layers 113 of the present embodiment are covered in common electricity On pole 112, and the second both alignment layers 123 are covered on the patterned pixel electrode 122 of matrix circuit.First both alignment layers 113 and Two both alignment layers 123 can for example be coated with, print or depositional mode be respectively formed in common electrode 112 with matrix circuit.First The material of the both alignment layers 123 of both alignment layers 113 and second for example can be inorganic material or organic material, and inorganic material example cocoa bores for class Carbon film (Diamond-like Carbon, DLC), carborundum (SiC), silica (SiO2), silicon nitride (Si3N4) or aluminum oxide (Al2O3) ... etc., and organic material for example can be pi (PI) or polymethyl methacrylate (Polymethylmethacrylate,PMMA)。
Then, step T04 is：The first both alignment layers 113 or the second both alignment layers 123 are made to form plurality of grooves 1131,.Such as figure Shown in 2E, the present embodiment is the first both alignment layers 113 is formed in one direction exemplified by plurality of grooves 1131.But, not With in embodiment, also plurality of grooves can be formed in the second both alignment layers 123, or make the first both alignment layers 113 and the second orientation Layer 123 forms plurality of grooves respectively, and the present invention neither limits.In certain embodiments, can such as pattern in imprint mode Change the first both alignment layers 113, to define the pattern of the first both alignment layers 113, make the first both alignment layers 113 that there are multiple grooves 1131, And in the case of vertical view, those grooves 1131 are, for example, zigzag.
Then, step T05 is：As shown in Figure 2 F, liquid crystal layer 13 is formed in the first both alignment layers 113 and the second both alignment layers 123 Between, wherein liquid crystal layer 13 include the negative dielectric anisotropy of plural number n-type liquid crystal molecule and plural photoreactivity monomer (monomer, Figure does not indicate).In this, it is incorgruous that negative dielectric is such as, but not limited to added with the formula injection method that drips (One Drop Filling, ODF) The n-type liquid crystal molecule and photoreactivity monomer of property are between the first both alignment layers 113 and the second both alignment layers 123, making the first base material 111 One layer of liquid crystal layer 13 is formed between the second base material 121.Wherein, photoreactivity monomer is such as, but not limited to ultraviolet curable Resin (UV curable resin), its percentage by weight for example can be 0.2%.
Finally, step T06 is：A light is irradiated, and those are put on the threshold voltage more than those liquid crystal molecules 131 Liquid crystal molecule 131, make those photoreactivity monomers and those polymerizing curables of liquid crystal molecule 131, to define those liquid crystal molecules 131 Incline direction under voltage effect.In certain embodiments, light is ultraviolet (UV), and its wavelength for example can be between 300nm To between 450nm, it is, for example, 30mW or higher intensity that width, which penetrates intensity,.
Please also refer to shown in Fig. 4 A to Fig. 4 C, it is respectively liquid crystal molecule and reaction during photoreactivity monomer irradiation light Schematic diagram.As shown in Figure 4 A, without under applying alive initial state, those liquid crystal molecules 131 are vertically calibrated (n-type liquid Brilliant molecule), and photoreactivity monomer 15 and those liquid crystal molecules 131 are unpolymerized.As shown in Figure 4 B, when more than those liquid crystal point When the threshold voltage (voltage V) of son 131 is employed, an electric field puts on those liquid crystal molecules 131 and those photoreactivity monomers 15, those liquid crystal molecules 131 will be tilted in pattern and patterned pixel electrode by those grooves 1131 of the first both alignment layers 113 Defined in 122 on direction, and those photoreactivity monomers 15 also tilt in a similar way.Applying voltage and shone with light When penetrating, as shown in Figure 4 C, ultraviolet R is to irradiate those liquid crystal molecules by side of the first base material 111 away from the second base material 121 131 with those photoreactivity monomers 15, photoreactivity monomer 15 will produce polymerization with liquid crystal molecule 131, to control those The direction of liquid crystal molecule 131.Wherein, it is to make to produce between common electrode 112 and patterned pixel electrode 122 to apply alive purpose A raw electric field, and make photoreactivity monomer 15 and the polymerizing curable of liquid crystal molecule 131 while ultraviolet is irradiated, and after making solidification Monomer arranged according to the pattern of groove 1131 with patterned pixel electrode 122, to define those liquid crystal molecules 131 one The lower incline direction of voltage effect, the purpose of the orientation of liquid crystal molecule 131 is made to reach with this curable monomer of transmission, thereby improves liquid The optical property of LCD panel.After voltage removes, because the photoreactivity monomer 15 of hardening polymerize in liquid crystal molecule 131, Therefore those pre-tilts of liquid crystal molecule 131 can be made in multiple directions.
In addition, in Fig. 1, in addition to step T01 to step T06, the manufacture method of liquid crystal display device more may include One step T07：Set one first Polarizer 14 and one second Polarizer 15 remote in the first base material 111 and the second base material 121 respectively The surface of chaotropic crystal layer 13, as shown in Figure 2 G.Wherein, the first Polarizer 14 and the second Polarizer 15 can for example include 45 degree of angles Orthogonal Nicolle (crossed Nicol) prism structure of the absorption axiss in direction, thereby calibrate the side of those liquid crystal molecules 131 To.
Therefore, the liquid crystal display device 1 of the present embodiment includes liquid crystal display panel, and liquid crystal display panel includes first substrate 11st, second substrate 12, the first both alignment layers 113, the second both alignment layers 123, liquid crystal layer 13, the first Polarizer 14 and the second Polarizer 15。
First substrate 11 includes common electrode 112, chromatic filter layer CF, black-matrix layer BM and the first base material 111, colored Filter layer CF is arranged in the first base material 111, and black-matrix layer BM is set around chromatic filter layer CF, and common electrode 112 is set It is placed on chromatic filter layer CF and black-matrix layer BM.In addition, second substrate 12 includes matrix circuit and the second base material 121, square Battle array circuit is arranged on the second base material 121, and can include a thin film transistor (TFT) (figure does not indicate) and patterned pixel electrode 122, Thin film transistor (TFT) is connected with patterned pixel electrode 122, and a pixel can be patterned the area in one direction of pixel electrode 122 It is divided at least two sub-regions.In addition, the first both alignment layers 113 are arranged on common electrode 112, the second both alignment layers 123 are arranged at On the patterned pixel electrode 122 of matrix circuit, wherein the first both alignment layers 113 have plurality of grooves 1131, and in vertical view In the case of, those grooves 1131 can be zigzag.In addition, liquid crystal layer 13 is arranged at the first both alignment layers 113 and the second both alignment layers 123 Between, wherein liquid crystal layer 13 includes the n-type liquid crystal molecule 131 of the negative dielectric anisotropy of plural number and plural photoreactivity monomer 15, and And be to irradiate those liquid crystal molecules 131 and those photoreactivity monomers 15 for example, by ultraviolet, make those photoreactivity monomers 15 with those polymerizing curables of liquid crystal molecule 131, with define those liquid crystal molecules 131 a voltage effect under incline direction.This Outside, the first Polarizer 14 and the second Polarizer 15 are respectively arranged at the base material 121 of the first base material 111 and second away from liquid crystal layer 13 Surface.Wherein, the first Polarizer 14 includes the orthogonal Nicolle rib of the absorption axiss of 45 degree of angular direction with the second Polarizer 15 Mirror structure.By the first Polarizer 14 and the second Polarizer 15 of two absorption axiss substantially difference 90 degree (orthogonal), control is recycled Electric field strong and weak between patterning pixel electrode 122 and common electrode 112, liquid crystal molecule 131 can be made to produce deflection with modulation The polarized light property of light, reach the purpose of display image.
In addition, refer to shown in Fig. 5, it is the liquid crystal display device 1a of another embodiment aspect of present invention schematic diagram.
With Fig. 2 G liquid crystal display device 1 primary difference is that, the liquid crystal display device 1a of the present embodiment colored filter Photosphere CF is arranged on the second base material 121, and patterned pixel electrode 122 can by a chromatic filter layer CF through hole and with it is thin Film transistor T drain D connections, and the second both alignment layers 123 are arranged on patterned pixel electrode 122 and chromatic filter layer CF. In this, chromatic filter layer CF optical filtering portion is to be formed and be covered on matrix circuit so that second substrate 12 turns into colorized optical filtering Layer on array (color filter on array, COA) substrate.It is noted that in this embodiment, ultraviolet Those liquid crystal molecules 131 and those photoreactivity monomers 15 can be irradiated by the second side of the base material 121 away from the first base material 111. For liquid crystal display device 1, the liquid crystal display device 1a of the present embodiment can have higher penetrance.
In addition, liquid crystal display device 1a other technical characteristics can refer to the same components of liquid crystal display device 1, it is no longer superfluous State.
Hold, in above-mentioned liquid crystal display device 1,1a, those grooves of the first both alignment layers 113 of patterning can be passed through 1131 configuration and polymer-stabilized alignment technology make liquid crystal molecule when without additional driving voltage pre-tilt in multiple directions, when When applying driving voltage, liquid crystal molecule 131 can be made to be rotated along the direction of script pre-tilt, the reaction speed except liquid crystal can be accelerated Outside degree, the liquid crystal molecule 131 of pixel can be more set to reach multiregional vertical align (Multi-domain Vertical Alignment, MVA) purpose, and then make liquid crystal display device 1,1a have lifting visual angle effect.
In addition, refer to shown in Fig. 6, it is a kind of signal of liquid crystal display device 2 of another preferred embodiment of the present invention Figure.
Liquid crystal display device 2 may include a liquid crystal display panel 3 and a backlight module 4 (Backlight Module). Wherein, liquid crystal display panel 3 can be one of liquid crystal display panel of above-described embodiment, or it changes aspect, specific skill Art content can refer to above-mentioned, be repeated no more in this.And backlight module 4 is oppositely arranged with liquid crystal display panel 3, and backlight module 4 It may be disposed at side of the second substrate 12 away from first substrate 11.When the light E that backlight module 4 is sent passes through liquid crystal display panel When 3, color can be shown to form image by each pixel of liquid crystal display panel 3.
From the above, in the Liquid crystal disply device and its preparation method of the present invention, matched somebody with somebody by the first both alignment layers or second Patterning configuration and polymer-stabilized alignment technology to those grooves of layer make liquid crystal molecule pre-tilt when without applied voltage In multiple directions, when the drive voltage is applied, liquid crystal molecule can be made to be rotated along the direction of script pre-tilt, except liquid can be accelerated Outside brilliant reaction speed, the purpose of multiregional vertical align is more can reach, and then causes the liquid crystal display device tool of the present invention There is the effect at lifting visual angle.
Second embodiment
Fig. 7 is a kind of process step figure of the manufacture method of liquid crystal display device of second embodiment of the invention.
As shown in fig. 7, the manufacturing process of liquid crystal display device may include following steps：Community electrode is formed in one first (step V01), one matrix circuit of formation are on one second base material on base material, and wherein matrix circuit includes a thin film transistor (TFT) and one Patterned pixel electrode, thin film transistor (TFT) are connected with patterned pixel electrode, and a pixel is patterned pixel electrode in a side At least two sub-regions (step V02) are distinguished into upwards, form an insulating barrier on common electrode or patterned pixel electrode, its Middle insulating barrier includes a plurality of slits (step V03), forms one first both alignment layers on common electrode, and forms one second orientation In on patterned pixel electrode, wherein insulating barrier is folded between common electrode and the first both alignment layers layer, or is folded in patterning (step V04) between pixel electrode and the second both alignment layers, a liquid crystal layer is formed between the first both alignment layers and the second both alignment layers, its Middle liquid crystal layer includes n-type liquid crystal molecule and plural photoreactivity monomer (step V05) and the irradiation of the negative dielectric anisotropy of plural number One light, and to put on those liquid crystal molecules more than one of those liquid crystal molecules threshold voltage, make those described photoreactivities Monomer solidifies with those described polymerizable liquid crystal molecules, to define incline direction (step of those liquid crystal molecules under voltage effect Rapid V06).
In addition, the manufacture method of liquid crystal display device more may include：Formed a chromatic filter layer in the first base material or On second base material, wherein chromatic filter layer includes multiple optical filtering portions and forms a black-matrix layer in the first base material, wherein Black-matrix layer is set corresponding to those optical filtering portions.
Hereinafter, it refer to Fig. 7 and coordinate shown in Fig. 8 A to Fig. 8 G, to illustrate above-mentioned manufacture method.Wherein, Fig. 8 A extremely scheme 8G is respectively the manufacturing process schematic diagram of the liquid crystal display device 1 of one embodiment of the invention.
First, step V01 is：Common electrode 112 is formed in the first base material 111.As shown in Figure 8 A, it is in the first base material Formed on 111 surface a flood common electrode 112 (Fig. 8 A be display invert, i.e., common electrode 112 is located at the first base material 111 lower surface).But, before the step V01 of common electrode 112 is formed, the present embodiment is first in the first base material 111 Chromatic filter layer CF and black-matrix layer BM is formed on surface, and black-matrix layer BM is set corresponding to chromatic filter layer CF Afterwards, then by common electrode 112 it is formed on chromatic filter layer CF and black-matrix layer BM.
Then, step V02 is：Matrix circuit is formed on the second base material 121, wherein matrix circuit includes thin film transistor (TFT) T and patterned pixel electrode 122, thin film transistor (TFT) T are connected with patterned pixel electrode 122, and a pixel is patterned picture Plain electrode 122 is distinguished at least two sub-regions in one direction.In addition, it is that can be initially formed pixel electrode and then pass through erosion Journey is scribed to pattern the pixel electrode, as shown in figure 3, so that there are multiple slits as patterned pixel electrode 122, and one These slits that individual pixel can be patterned pixel electrode 122 are distinguished at least two sub-regions in one direction, and then according to The pattern of this pixel electrode, when a voltage is employed, liquid crystal molecule tiltable in such as four different directions (a, b, c, d), To lift visual angle.
In addition, as shown in Figure 8 B, the thin film transistor (TFT) T of the present embodiment can include a gate G, a brake-pole dielectric layer GI, one Channel layer C, a source S and a drain D.Gate G is formed on the second base material 121.Brake-pole dielectric layer GI is formed and is covered in lock On the G of pole.Brake-pole dielectric layer GI need to completely cover gate G, and on the second base material 121 of selectable portion or whole coverings.
Channel layer C is formed on brake-pole dielectric layer GI with respect to gate G positions.In addition, source S is respectively formed in drain D On channel layer C, and source S and drain D one end contact with channel layer C respectively.Do not turned in thin film transistor (TFT) T channel layer C When, source S and drain D are electrically isolated.Thin film transistor (TFT) T drain D can be connected with patterned pixel electrode 122, therefore, when thin During film transistor T channel layer C conductings, the data voltage of pixel can be transferred to drain D corresponding by data wire, source S Patterned pixel electrode 122.
The thin film transistor (TFT) T of the present embodiment source S is directly formed with drain D to be connected on channel layer C with channel layer C Connect, but, in various embodiments, after also one layer of etch stop layer (not illustrating) being formed on channel layer C, then lead to respectively One of overetch stop layer is open and source S is contacted respectively with channel layer C with drain D one end.Above-mentioned etch stop layer Can be that organic material be, for example, organo-siloxane compound, or single-layer inorganic material such as silicon nitride, silica, silicon oxynitride, carbon SiClx, aluminum oxide, hafnium oxide or the sandwich construction of above-mentioned material combination.
It is noted that the present embodiment is first to carry out carrying out step V02 again after step V01, so it is not limited thereto, In various embodiments, both sequentially can be on the contrary, or carry out simultaneously.In addition, matrix circuit can more include complex data line With plural scan line, those data wires are staggered to define plural pixel with those scan lines.Wherein, a pixel can be right Should there are a thin film transistor (TFT) T and a patterned pixel electrode 122, and a pixel can correspond to one of chromatic filter layer CF Optical filtering portion.
Then, carrying out step V03 is：Insulating barrier 114 is formed on common electrode 112 or patterned pixel electrode 122, its Middle insulating barrier 114 includes a plurality of slits 1141.As shown in Figure 8 C, the present embodiment is exhausted in forming one layer on common electrode 112 Edge layer 114, and for example so that etching mode makes insulating barrier 114 have a plurality of slits 1141 as an example.In various embodiments, Insulating barrier can be formed on patterned pixel electrode 122, and make insulating barrier formed with a plurality of slits；Or in common electricity Pole 112 is not intended to limit with forming the insulating barrier with a plurality of slits, the present invention on patterned pixel electrode 122 simultaneously.In addition, In the case of vertical view, those slits 1411 are zigzag.
Then, carrying out step V04 is：The first both alignment layers 113 are formed on common electrode 112, and form the second both alignment layers 123 on patterned pixel electrode 122, and wherein insulating barrier 114 is folded between the both alignment layers 113 of common electrode 112 and first, or It is folded between the both alignment layers 123 of patterned pixel electrode 122 and second.As in fig. 8d, the present embodiment is due to insulating barrier 114 It is arranged on common electrode 112, therefore, forms the first both alignment layers 113 when on common electrode 112, insulating barrier 114 will be made sandwiched Between the both alignment layers 113 of common electrode 112 and first.Wherein, the material of the first both alignment layers 113 can insert the narrow of insulating barrier 114 In seam 1141 so that the first both alignment layers 113 can also form patterning according to the pattern of insulating barrier 114 and have in one direction Plurality of grooves 1131, and in the case of vertical view, those grooves 1131 and zigzag.In addition, as illustrated in fig. 8e, this implementation Second both alignment layers 123 of example are covered on the patterned pixel electrode 122 of matrix circuit.In various embodiments, insulation is worked as Those slits of layer are when being formed on patterned pixel electrode 122, then insulating barrier will be folded in patterned pixel electrode 122 and the Between two both alignment layers 123, and the second both alignment layers 123 also will form multiple grooves because of those slits.
Then, step V05 is：As shown in Figure 8 F, liquid crystal layer 13 is formed in the first both alignment layers 113 and the second both alignment layers 123 Between, wherein liquid crystal layer 13 include the negative dielectric anisotropy of plural number n-type liquid crystal molecule and plural photoreactivity monomer (monomer, Figure does not indicate).Wherein, photoreactivity monomer is such as, but not limited to ultraviolet curable resin (UV curable resin), Its percentage by weight for example can be 0.2%.
Finally, step V06 is：A light is irradiated, and those are put on the threshold voltage more than those liquid crystal molecules 131 Liquid crystal molecule 131, make those photoreactivity monomers and those polymerizing curables of liquid crystal molecule 131, to define those liquid crystal molecules 131 Incline direction under voltage effect.In certain embodiments, light is ultraviolet (UV), and its wavelength for example can be between 300nm To between 450nm, it is, for example, 30mW or higher intensity that width, which penetrates intensity,.
Please also refer to shown in Fig. 9 A to Fig. 9 C, it is respectively liquid crystal molecule and reaction during photoreactivity monomer irradiation light Schematic diagram.As shown in Figure 9 A, without under applying alive initial state, those liquid crystal molecules 131 are vertically calibrated (n-type liquid Brilliant molecule), and photoreactivity monomer 15 and those liquid crystal molecules 131 are unpolymerized.As shown in Figure 9 B, when more than those liquid crystal point When the threshold voltage (voltage V) of son 131 is employed, an electric field puts on those liquid crystal molecules 131 and those photoreactivity monomers 15, those liquid crystal molecules 131 will be tilted in the pattern and patterned pixel electrode of those grooves 1131 of the first both alignment layers 113 Defined in 122 on direction, and those photoreactivity monomers 15 also tilt in a similar way.Applying voltage and shone with light When penetrating, as shown in Figure 9 C, ultraviolet R can irradiate those liquid crystal molecules by side of the first base material 111 away from the second base material 121 131 with those photoreactivity monomers 15, photoreactivity monomer 15 will produce polymerization with liquid crystal molecule 131, to control those The direction of liquid crystal molecule 131.Wherein, it is to make to produce between common electrode 112 and patterned pixel electrode 122 to apply alive purpose A raw electric field, and make photoreactivity monomer 15 and the polymerizing curable of liquid crystal molecule 131 while ultraviolet is irradiated, and after making solidification Monomer arranged according to slit 1141 (those grooves 1131) and the pattern of patterned pixel electrode 122, to define those Incline direction of the liquid crystal molecule 131 under voltage effect, to make the orientation of liquid crystal molecule 131 through this curable monomer to reach Purpose, thereby improve the optical property of liquid crystal display panel.After voltage removes, because the photoreactivity monomer 15 of hardening polymerize In liquid crystal molecule 131, therefore those pre-tilts of liquid crystal molecule 131 can be made in multiple directions.
In addition, in the figure 7, in addition to step V01 to step V06, the manufacture method of liquid crystal display device more may include One step V07：Set one first Polarizer 14 and one second Polarizer 15 remote in the first base material 111 and the second base material 121 respectively The surface of chaotropic crystal layer 13, as shown in fig. 8g.Wherein, the first Polarizer 14 and the second Polarizer 15 can for example include 45 degree of angles Orthogonal Nicolle (crossed Nicol) prism structure of the absorption axiss in direction, thereby calibrate the side of those liquid crystal molecules 131 To.
Therefore, the liquid crystal display device 1 of the present embodiment includes liquid crystal display panel, and liquid crystal display panel includes first substrate 11st, second substrate 12, an insulating barrier 114, the first both alignment layers 113, the second both alignment layers 123, liquid crystal layer 13, the first Polarizer 14 with Second Polarizer 15.
First substrate 11 includes common electrode 112, chromatic filter layer CF, black-matrix layer BM and the first base material 111, colored Filter layer CF is arranged in the first base material 111, and black-matrix layer BM is set around chromatic filter layer CF, and common electrode 112 is set It is placed on chromatic filter layer CF and black-matrix layer BM.
Second substrate 12 includes matrix circuit and the second base material 121, and matrix circuit is arranged on the second base material 121, and can Connect comprising a thin film transistor (TFT) (figure does not indicate) and patterned pixel electrode 122, thin film transistor (TFT) with patterned pixel electrode 122 Connect, a pixel is patterned pixel electrode 122 and is distinguished at least two sub-regions in one direction.In addition, insulating barrier 114 is set It is placed on common electrode 112 or patterned pixel electrode 122, wherein insulating barrier 114 includes a plurality of slits 1141, and overlooks In the case of, those slits 1141 can be zigzag.First both alignment layers 113 are arranged on common electrode 112, the second both alignment layers 123 are arranged on the patterned pixel electrode 122 of matrix circuit, and wherein insulating barrier 114 is folded in common electrode 112 and matched somebody with somebody with first To between layer 113, or it is folded between the both alignment layers 123 of patterned pixel electrode 122 and second.In addition, liquid crystal layer 13 is arranged at Between first both alignment layers 113 and the second both alignment layers 123, wherein liquid crystal layer 13 includes the n-type liquid crystal point of the negative dielectric anisotropy of plural number Son 131 and plural photoreactivity monomer 15, moreover, being to irradiate those liquid crystal molecules 131 for example, by ultraviolet and those light are anti- Answering property monomer 15, make those photoreactivity monomers 15 and those polymerizing curables of liquid crystal molecule 131, to define those liquid crystal molecules 131 incline direction under voltage effect.In addition, the first Polarizer 14 and the second Polarizer 15 are respectively arranged at the first base material 111 and second surface of the base material 121 away from liquid crystal layer 13.Wherein, the first Polarizer 14 and the second Polarizer 15 include 45 degree The orthogonal Nicol prism structure of the absorption axiss of angular direction.It is inclined by the first of two absorption axiss substantially difference 90 degree (orthogonal) The Polarizer 15 of tabula rasa 14 and second, the electric field strong and weak between control patterning pixel electrode 122 and common electrode 112 is recycled, Liquid crystal molecule 131 can be made to produce deflection with the polarized light property of modulation light, reach the purpose for showing image.
In addition, refer to shown in Figure 10, it is the liquid crystal display device 1a of another embodiment aspect of present invention schematic diagram.
With Fig. 8 G liquid crystal display device 1 primary difference is that, the liquid crystal display device 1a of the present embodiment colored filter Photosphere CF is arranged on the second base material 121, and patterned pixel electrode 122 can by a chromatic filter layer CF through hole and with it is thin Film transistor T drain D connections, and the second both alignment layers 123 are arranged on patterned pixel electrode 122 and chromatic filter layer CF. In this, chromatic filter layer CF optical filtering portion can form and be covered on matrix circuit so that second substrate 12 turns into colorized optical filtering Layer on array (color filter on array, COA) substrate.It is noted that in this embodiment, ultraviolet Those liquid crystal molecules 131 and those photoreactivity monomers 15 can be irradiated by the second side of the base material 121 away from the first base material 111. For liquid crystal display device 1, the liquid crystal display device 1a of the present embodiment can have higher penetrance.In addition, liquid crystal Display device 1a other technical characteristics can refer to the same components of liquid crystal display device 1, repeat no more.
Hold, in above-mentioned liquid crystal display device 1,1a, common electrode 112 or figure can be arranged at by insulating barrier 114 On case pixel electrode 122, and insulating barrier 114 is included the structure designs of a plurality of slits 1141, allow the first both alignment layers 113 It is covered on insulating barrier 114 or when the second both alignment layers 123 are covered on the insulating layer, can be according to the pattern of those slits of insulating barrier And the first both alignment layers 113 or the second both alignment layers 123 of patterning are formed, in addition, recycling polymer-stabilized alignment technology to make liquid Pre-tilt is in multiple directions when without additional driving voltage for brilliant molecule, when the drive voltage is applied, can make liquid crystal molecule 131 along The direction of script pre-tilt rotates, and in addition to it can accelerate the reaction speed of liquid crystal, the liquid crystal molecule 131 of pixel can more reached The purpose of multiregional vertical align (Multi-domain Vertical Alignment, MVA), and then make liquid crystal display device 1st, 1a has the effect at lifting visual angle.
From the above, in the Liquid crystal disply device and its preparation method of the present invention, those slits of insulating barrier are passed through Patterning configuration and polymer-stabilized alignment technology make liquid crystal molecule pre-tilt when without applied voltage in multiple directions, work as application During driving voltage, liquid crystal molecule can be made to be rotated along the direction of script pre-tilt, in addition to it can accelerate the reaction speed of liquid crystal, The purpose of multiregional vertical align is more can reach, and then causes the liquid crystal display device of the present invention that there is the effect at lifting visual angle.
Illustrative is the foregoing is only, rather than is restricted person.Any spirit and scope without departing from the present invention, and to it The equivalent modifications of progress or change, it all should be included in Claims scope.

Claims (10)

  1. A kind of 1. manufacture method of liquid crystal display device, it is characterised in that including：
    Community electrode is formed in a first base material；
    A matrix circuit is formed on one second base material, wherein the matrix circuit includes a thin film transistor (TFT) and a patterning picture Plain electrode, the thin film transistor (TFT) are connected with the patterned pixel electrode, and a pixel is existed by the patterned pixel electrode At least two sub-regions are distinguished on one direction；
    One first both alignment layers are formed on the common electrode, and form one second both alignment layers in the patterned pixel electrode On；
    First both alignment layers or second both alignment layers are made to form plurality of grooves；
    A liquid crystal layer is formed between first both alignment layers and second both alignment layers, is born wherein the liquid crystal layer includes plural number The n-type liquid crystal molecule of dielectric anisotropy and plural photoreactivity monomer；And
    A light is irradiated, and to put on those described liquid crystal molecules more than one of those liquid crystal molecules threshold voltage, is made Those described photoreactivity monomers solidify with those described polymerizable liquid crystal molecules, to define those described liquid crystal molecules in a voltage Incline direction under effect.
  2. 2. manufacture method as claimed in claim 1, it is characterised in that wherein in the case of vertical view, those described grooves are Zigzag.
  3. 3. manufacture method as claimed in claim 1, it is characterised in that further include：
    A chromatic filter layer is formed in the first base material or second base material, wherein the chromatic filter layer include it is multiple Optical filtering portion；And
    A black-matrix layer is formed in the first base material, is set wherein the black-matrix layer corresponds to those described optical filtering portions Put.
  4. 4. manufacture method as claimed in claim 1, it is characterised in that further include：
    Set one first Polarizer and one second Polarizer in the first base material and second base material away from the liquid respectively The surface of crystal layer.
  5. 5. manufacture method as claimed in claim 1, it is characterised in that wherein described light is ultraviolet, and by described first Base material those described liquid crystal molecules of side irradiation and those described photoreactivity monomers away from second base material, or by described Second base material those described liquid crystal molecules of side irradiation and those described photoreactivity monomers away from the first base material.
  6. A kind of 6. liquid crystal display device, it is characterised in that including：
    One first substrate, comprising community electrode and a first base material, the common electrode is arranged in the first base material；
    One second substrate, comprising a matrix circuit and one second base material, the matrix circuit is arranged on second base material, and Comprising a thin film transistor (TFT) and a patterned pixel electrode, the thin film transistor (TFT) is connected with the patterned pixel electrode, and one Individual pixel is distinguished at least two sub-regions in one direction by the patterned pixel electrode；
    One first both alignment layers, are arranged on the common electrode；
    One second both alignment layers, it is arranged on the patterned pixel electrode, wherein first both alignment layers or second orientation Layer has plurality of grooves；And
    One liquid crystal layer, it is arranged between first both alignment layers and second both alignment layers, the liquid crystal layer includes negative Jie of plural number The n-type liquid crystal molecule of electric anisotropy and plural photoreactivity monomer；
    Wherein, those described liquid crystal molecules and those described photoreactivity monomers are irradiated by a light, makes those described light anti- Answering property monomer solidifies with those described polymerizable liquid crystal molecules, to define inclination of those the described liquid crystal molecules under voltage effect Direction.
  7. 7. liquid crystal display device as claimed in claim 6, it is characterised in that wherein described the first base material or second base material For a flexible substrate, the flexible substrate includes high-molecular organic material.
  8. 8. liquid crystal display device as claimed in claim 6, it is characterised in that wherein described light is ultraviolet, described ultraviolet Line is by those the described liquid crystal molecules of side irradiation of the first base material away from second base material and those described light reactions Property monomer, or those described liquid crystal molecules and those described light are irradiated by side of second base material away from the first base material Reactive monomer.
  9. 9. liquid crystal display device as claimed in claim 6, it is characterised in that further include：
    One first Polarizer and one second Polarizer, the first base material is respectively arranged at second base material away from the liquid The surface of crystal layer, first Polarizer include the orthogonal Nicolle of the absorption axiss of 45 degree of angular direction with second Polarizer Prism structure.
  10. A kind of 10. liquid crystal display device, it is characterised in that including：
    One first substrate, include community electrode, a chromatic filter layer, a black-matrix layer and a first base material, the colour Filter layer is arranged in the first base material, and the black-matrix layer is set around the chromatic filter layer, the common electrode It is arranged in the chromatic filter layer and the black-matrix layer；
    One second substrate, comprising a matrix circuit and one second base material, the matrix circuit is arranged on second base material, and Comprising a thin film transistor (TFT) and a patterned pixel electrode, the thin film transistor (TFT) is connected with the patterned pixel electrode, and one Individual pixel is distinguished at least two sub-regions in one direction by the patterned pixel electrode；
    One first both alignment layers, are arranged on the common electrode；
    One second both alignment layers, it is arranged on the patterned pixel electrode, wherein first both alignment layers or second orientation Layer has plurality of grooves, and in the case of vertical view, those described grooves are zigzag；
    One liquid crystal layer, it is arranged between first both alignment layers and second both alignment layers, wherein the liquid crystal layer includes plural number The n-type liquid crystal molecule and plural photoreactivity monomer of negative dielectric anisotropy, and be that described those liquid crystal point are irradiated by a light Sub and those described photoreactivity monomers, those described photoreactivity monomers are made to solidify with those described polymerizable liquid crystal molecules, with Incline direction of those the described liquid crystal molecules of definition under voltage effect；
    One first Polarizer and one second Polarizer, the first base material is respectively arranged at second base material away from the liquid The surface of crystal layer；And
    One backlight module, it is arranged at side of the second substrate away from the first substrate.
CN201710845041.4A 2017-09-19 2017-09-19 Liquid crystal disply device and its preparation method Pending CN107479247A (en)

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Application publication date: 20171215