CN107463064B - Mask, display substrate, manufacturing method of display substrate and display device - Google Patents
Mask, display substrate, manufacturing method of display substrate and display device Download PDFInfo
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- CN107463064B CN107463064B CN201710706686.XA CN201710706686A CN107463064B CN 107463064 B CN107463064 B CN 107463064B CN 201710706686 A CN201710706686 A CN 201710706686A CN 107463064 B CN107463064 B CN 107463064B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
Abstract
The invention provides a mask, a display substrate, a manufacturing method of the display substrate and a display device, wherein the manufacturing method of the display substrate comprises the following steps: the method comprises the steps of forming an annular groove matched with a preset outer ring area at the top of an auxiliary spacer on a film layer graph of a display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove sinks, or forming a bulge matched with a preset middle area at the top of the auxiliary spacer on the film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically kept equal, the top of the auxiliary spacer is prevented from appearing in a crater shape, the flatness of the top surface of the auxiliary spacer is improved, and therefore the problem that a liquid crystal display panel is poor in touch pressure is avoided.
Description
Technical Field
The invention relates to the technical field of display, in particular to a mask, a display substrate, a manufacturing method of the display substrate and a display device.
Background
The liquid crystal display panel part mainly comprises an array substrate, a color film substrate and liquid crystal which forms a box between the array substrate and the color film substrate, wherein the color film substrate is provided with a columnar spacer for supporting the thickness of a liquid crystal box besides a color resistance layer for providing color filtering function. In order to make the membrane surface uniform after the box is formed and reduce the risk of low-temperature bubbles (bubbles) and gravity Mura, the columnar spacer is often arranged in two-stage mode (Main spacer (Main)/auxiliary spacer (Sub)) or three-stage mode (Main/Sub1/Sub 2). In the prior art, the design of a mask plate of a columnar spacer is mainly divided into a conventional type and a semi-permeable membrane type. The main spacer and the auxiliary spacer of the conventional columnar spacer both adopt a full light-transmitting pattern, and the section difference is generally regulated and controlled by controlling the size of an opening of the full light-transmitting pattern. The semi-permeable membrane type columnar spacer generally adopts a total light-transmitting pattern as a main spacer, adopts a semi-transmitting pattern as an auxiliary spacer, generally has fixed transmittance, and gives the transmittance of the semi-transmitting pattern according to the requirement of section difference.
When the semi-transparent mask is used to make the columnar spacer, when the semi-transparent pattern of the mask exceeds a certain opening value, the light intensity at the center of the semi-transparent pattern is reduced compared with the light intensity at other positions, and a crater-like depression may be formed at the top of the auxiliary spacer (see fig. 1), thereby causing a risk of poor touch pressure of the liquid crystal display panel. In fig. 1, 10 is a color film substrate, 11 is a main spacer, and 12 is an auxiliary spacer.
Disclosure of Invention
In view of the above, the present invention provides a mask, a display substrate, a method for manufacturing the same, and a display device, which are used to improve the flatness of the top surface of the auxiliary spacer and avoid the poor contact pressure of the liquid crystal display panel.
In order to solve the above technical problem, in a first aspect, an embodiment of the present invention provides a mask for manufacturing a preset film pattern on a display substrate, where the mask includes: and the shape and the size of the semi-transparent pattern are matched with those of a preset outer ring area of the top surface of the auxiliary spacer required to be formed on the display substrate.
In a second aspect, an embodiment of the present invention further provides a method for manufacturing a display substrate, including:
forming a preset film layer;
and patterning the preset film layer by using the mask provided by the first aspect to form a preset film layer pattern, wherein the preset film layer pattern comprises an annular groove corresponding to the semi-transparent pattern.
Preferably, the display substrate is a color film substrate, the preset film layer pattern is a black matrix pattern, and the mask further includes: a plurality of fully transparent patterns and opaque patterns;
the manufacturing method of the display substrate comprises the following steps:
forming a shading material film layer which is the preset film layer;
forming a photoresist layer on the shading material film layer;
exposing and developing the photoresist layer by using the mask to form a photoresist full-retention area corresponding to the opaque pattern, a photoresist semi-retention area corresponding to the semi-transparent pattern and a photoresist full-removal area corresponding to the fully-transparent pattern;
etching the shading material film layer of the photoresist full-removing area;
ashing the photoresist layer of the photoresist semi-reserved area;
etching the shading material film layer of the photoresist semi-reserved area to form a black matrix pattern comprising an annular groove;
and stripping the photoresist layer of the photoresist full-reserved area to expose the black matrix pattern.
Preferably, after the forming of the preset film layer pattern, the method further includes:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the orthographic projection of a preset outer ring area on the top surface of the auxiliary spacer on a preset film layer graph is superposed with the annular groove.
In a third aspect, an embodiment of the present invention further provides a mask for manufacturing a preset film pattern on a display substrate, where the mask includes: the shape and the size of the opaque pattern are matched with those of a preset middle area on the top surface of the auxiliary spacer to be formed on the display substrate.
In a fourth aspect, an embodiment of the present invention further provides a method for manufacturing a display substrate, including:
forming a preset film layer;
and patterning the preset film layer by using the mask provided by the third aspect to form a preset film layer pattern, wherein the preset film layer pattern comprises a protrusion corresponding to the opaque pattern.
Preferably, the display substrate is a color film substrate, the preset film layer pattern is a black matrix pattern, and the mask further includes: a plurality of fully transmissive patterns;
the manufacturing method of the display substrate comprises the following steps:
forming a light shielding material film layer;
forming a photoresist layer on the shading material film layer;
exposing and developing the photoresist layer by using the mask to form a photoresist full-retention area corresponding to the opaque pattern, a photoresist semi-retention area corresponding to the semi-transparent pattern and a photoresist full-removal area corresponding to the fully-transparent pattern;
etching the shading material film layer of the photoresist full-removing area;
ashing the photoresist layer of the photoresist semi-reserved area;
etching the shading material film layer of the photoresist semi-reserved area to form a convex black matrix pattern;
and stripping the photoresist layer of the photoresist full-reserved area to expose the black matrix pattern.
Preferably, after the forming of the preset film layer pattern, the method further includes:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the preset middle area of the top surface of the auxiliary spacer is positioned on the orthographic projection of the preset film layer pattern and the projection are superposed.
In a fifth aspect, an embodiment of the present invention further provides a display substrate manufactured by the method according to the second aspect, including:
presetting a film layer pattern, wherein the preset film layer pattern comprises an annular groove, and the shape and the size of the annular groove are matched with the shape and the size of a preset outer ring area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
In a sixth aspect, an embodiment of the present invention further provides a display substrate manufactured by the method in the fourth aspect, including:
presetting a film layer pattern, wherein the preset film layer pattern comprises a bulge, and the shape and the size of the bulge are matched with the shape and the size of a preset middle area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
In a seventh aspect, an embodiment of the present invention further provides a display device, including the display substrate provided in the fifth aspect or the sixth aspect.
The technical scheme of the invention has the following beneficial effects:
the annular groove matched with the preset outer ring area at the top of the auxiliary spacer is formed on the film layer graph of the display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove sinks, or a bulge matched with the preset middle area at the top of the auxiliary spacer is formed on the film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically kept equal, the crater shape at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and therefore the poor touch pressure of a liquid crystal display panel is avoided.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without inventive labor.
FIG. 1 is a schematic view of a prior art cylindrical spacer with a crater-shaped top;
fig. 2 is a diagram showing a distribution of light intensity of semi-transparent patterns having different sizes at respective positions of openings thereof;
FIG. 3 is a diagram illustrating a distribution of light intensity corresponding to the center positions of semi-transparent patterns of different sizes;
fig. 4 is a schematic view showing the influence of different exposure gaps (gaps) on the light intensity distribution at the center position of the semi-transmissive pattern of different sizes;
FIG. 5 is a schematic structural diagram of a mask according to a first embodiment of the present invention;
fig. 6-12 are schematic flow charts illustrating a method for manufacturing a display substrate according to a third embodiment of the invention;
fig. 13 is a schematic view illustrating a manufacturing method of a display substrate according to a fourth embodiment of the invention;
fig. 14 is a schematic structural diagram of a mask according to a fifth embodiment of the present invention;
15-19 are schematic flow charts of methods for manufacturing a display substrate according to a seventh embodiment of the invention;
fig. 20 is a schematic view of a manufacturing method of a display substrate according to an eighth embodiment of the invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the drawings of the embodiments of the present invention. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the invention, are within the scope of the invention.
The inventor of the invention finds that when the semi-transparent mask is used for manufacturing the columnar spacer, the light intensity at the center of the semi-transparent pattern is generally higher than that at other positions, and the difference value between the light intensity at the center of the semi-transparent pattern and the light intensity at other positions is increased along with the increase of the semi-transparent pattern, and reaches the maximum value at a certain opening. However, when the semi-transparent pattern of the mask exceeds a certain opening value, the light intensity at the center of the semi-transparent pattern is reduced compared with the light intensity at other positions.
Referring to fig. 2 and fig. 3, fig. 2 is a diagram showing a distribution of light intensity at each position of the opening of the semi-transparent pattern with different sizes (in the embodiment of the present invention, the semi-transparent pattern is circular, and the size of the opening of the semi-transparent pattern refers to the size of the diameter of the opening). In fig. 2, the abscissa represents the relative distance between a certain position on the semi-transmissive pattern and the center position, and the ordinate represents the light intensity. Fig. 3 is a diagram showing a distribution of light intensity corresponding to the center position of the semi-transmissive pattern having different sizes. In fig. 3, the abscissa represents the size of the semi-transmissive pattern, and the ordinate represents the light intensity at the center of the semi-transmissive pattern.
As can be seen from fig. 2 and 3, as the semi-transparent pattern increases, the difference between the light intensity at the center of the semi-transparent pattern and the light intensity at other positions increases, and reaches a maximum value at a certain opening (20 um in the embodiment of the present invention). However, when the semi-transparent pattern of the mask exceeds a certain opening value, the light intensity at the center of the semi-transparent pattern is reduced compared with the light intensity at other positions.
Referring to fig. 4, fig. 4 is a schematic diagram illustrating the effect of different exposure gaps (gaps) on the light intensity distribution of the center positions of the semi-transparent patterns with different sizes, wherein the exposure gaps refer to the gaps between the mask and the display substrate to be exposed. As can be seen from fig. 4, the smaller the exposure gap, the smaller the opening value of the semi-transmissive pattern corresponding to the light intensity at the center position of the semi-transmissive pattern reaching the maximum value. In addition, as can be seen from fig. 4, the distribution of the light intensity at the center position of the semi-transmissive pattern still follows the above-described variation law regardless of the exposure gap: with the increase of the semi-transparent pattern, the difference between the light intensity at the center of the semi-transparent pattern and the light intensity at other positions is increased, and reaches the maximum value at a certain opening. However, when the semi-transparent pattern of the mask exceeds a certain opening value, the light intensity at the center of the semi-transparent pattern is reduced compared with the light intensity at other positions.
When the light intensity at the center of the semi-transmissive pattern is decreased compared with other positions of the semi-transmissive pattern, a crater-like depression may be formed at the top of the auxiliary spacer (see fig. 1), which may cause a risk of poor touch pressure of the lcd panel.
In order to solve the above problems, embodiments of the present invention provide a mask, a display substrate, a method for manufacturing the same, and a display device, in which an annular groove matched with a preset outer ring region at the top of an auxiliary spacer is formed on a film layer pattern of the display substrate, so that a preset outer ring region at the top of the auxiliary spacer formed on the annular groove is sunken, or a protrusion matched with a preset middle region at the top of the auxiliary spacer is formed on the film layer pattern of the display substrate, so that the preset middle region at the top of the auxiliary spacer formed on the protrusion is lifted, and the heights of the outer ring region and the middle region at the top of the auxiliary spacer are substantially equal, thereby preventing the top of the auxiliary spacer from appearing in a crater shape, improving the flatness of the top surface of the auxiliary spacer, and avoiding poor contact pressure of a liquid crystal display panel.
Referring to fig. 5, fig. 5 is a schematic structural diagram of a mask 20 according to a first embodiment of the present invention, the mask 20 is used for manufacturing a predetermined film pattern on a display substrate, and the mask 20 includes: and the shape and the size of the semi-transparent patterns 21 are matched with those of a preset outer ring area of the top surface of the auxiliary spacer required to be formed on the display substrate.
In the embodiment of the present invention, the semi-transmissive pattern 21 is annular, and the auxiliary spacer to be formed on the display substrate is a columnar spacer having a circular cross section. Of course, in some other embodiments of the present invention, the cross section of the columnar spacer is not limited to be circular, and may also be square, oval, or rectangular, and correspondingly, the shape of the semi-light-transmitting pattern 21 is also a corresponding annular structure.
In the embodiment of the present invention, the size of the semi-transparent pattern 21 may be determined according to an experimental value or an empirical value, and is matched with the size of the outer ring of the crater having the auxiliary spacer with the crater-shaped top.
In the embodiment of the present invention, the transmittance of the semi-transparent pattern 21 may be determined according to an experimental value or an empirical value, and is matched with the depth of the crater recess of the corresponding auxiliary spacer having the crater-shaped top.
In the embodiment of the present invention, the number of the semi-transparent patterns 21 is the same as the number of the auxiliary spacers to be formed on the display substrate, and the positions correspond to each other. Of course, in other embodiments of the present invention, other arrangement manners are not excluded, for example, the number of the semi-transparent patterns 21 is less than the number of the auxiliary spacers, and only corresponds to a part of the auxiliary spacers.
The mask 20 is used for making a preset film layer pattern on a display substrate, and the display substrate is a display substrate needing to form a spacer. In the embodiment of the invention, the display substrate may be a color film substrate, and the preset film pattern may be a black matrix pattern. Of course, in other embodiments of the present invention, the display substrate may also be an array substrate, and the predetermined film layer pattern is a film layer pattern on the array substrate, such as a passivation layer.
When the display substrate in the embodiment of the present invention is a color film substrate and the preset film pattern is a black matrix pattern, in the embodiment of the present invention, the mask 20 further includes: and the light-transmitting patterns 22 and the non-light-transmitting patterns 23 are arranged in the matrix, wherein the light-transmitting patterns 22 correspond to sub-pixel regions surrounded by the black matrix patterns. The opaque patterns 23 and the semi-transparent patterns 21 correspond to the black matrix patterns.
The second embodiment of the present invention further provides a method for manufacturing a display substrate, including:
forming a preset film layer;
the preset film layer is patterned by adopting the mask plate in the embodiment to form a preset film layer pattern, and the preset film layer pattern comprises an annular groove corresponding to the semi-transparent pattern.
The display substrate in the embodiment of the invention is a display substrate on which a spacer needs to be formed, and can be a color film substrate or an array substrate.
In the embodiment of the invention, the annular groove matched with the preset outer ring area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove is sunken, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, the crater shape at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and the poor touch pressure correlation of the liquid crystal display panel is avoided.
In some embodiments of the present invention, after forming the predetermined film layer pattern, the method for manufacturing the display substrate further includes:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the orthographic projection of a preset outer ring area on the top surface of the auxiliary spacer on a preset film layer graph is superposed with the annular groove.
Referring to fig. 6 to 12, fig. 6 to 12 are schematic flow charts illustrating a manufacturing method of a display substrate according to a third embodiment of the present invention, the manufacturing method of the display substrate includes:
step 601: referring to fig. 6, a light-shielding material film 31' is formed, wherein the light-shielding material film is the predetermined film;
step 602: referring to fig. 7, a photoresist layer 32 is formed on the light shielding material film 31';
in the embodiment of the present invention, the positive photoresist used in the photoresist layer 32 is a fully exposed positive photoresist that is soluble in a developing solution, a partially exposed positive photoresist that is partially soluble in a developing solution, and an unexposed positive photoresist that is insoluble in a developing solution.
Step 603: referring to fig. 8, the mask 20 of the first embodiment is used to expose and develop the photoresist layer 32 to form a photoresist total-retaining region 321 corresponding to the opaque pattern 23, a photoresist semi-retaining region 322 corresponding to the semi-transparent pattern 21, and a photoresist total-removing region 323 corresponding to the fully-transparent pattern 22;
step 604: referring to fig. 9, the light-shielding material film 31' in the photoresist full removal region 323 is etched;
step 605: referring to fig. 10, the photoresist layer 32 in the photoresist semi-reserved region 322 is ashed;
step 606: referring to fig. 11, the light-shielding material film 31' of the photoresist semi-reserved region 322 is etched to form a black matrix pattern 31 including a ring-shaped groove 311;
step 607: referring to fig. 12, the photoresist layer of the photoresist all-remained region 321 is stripped to expose the black matrix pattern 31.
In the embodiment of the invention, the annular groove matched with the preset outer ring area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove is sunken, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, the crater shape at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and the poor touch pressure correlation of a liquid crystal display panel is avoided.
Referring to fig. 13, fig. 13 is a schematic view of a manufacturing method of a display substrate according to a fourth embodiment of the present invention, the manufacturing method of the display substrate includes:
step 701: providing a substrate 30;
step 702: forming a black matrix pattern 31 on the base substrate 30, the black matrix pattern 31 including an annular groove 311;
please refer to the embodiments shown in fig. 6-12 for a specific method for forming the black matrix pattern 31.
Step 703: forming a color resist pattern 33 in a subpixel region surrounded by the black matrix pattern 31;
step 704: a flat layer 34 is formed on the black matrix pattern 31 and the color resist pattern 33, and the flat layer 44 is formed with an annular groove 341 at a position corresponding to the annular groove 311.
In the prior art, when forming the planarization layer, the planarization layer material is usually naturally leveled on the black matrix pattern 31 and the color resist pattern 33, and then cured, in the embodiment of the present invention, in order to avoid the annular groove 311 on the black matrix pattern 31 being filled with the planarization layer 34, it is therefore necessary to accelerate the curing of the planarization layer material in the process of forming the planarization layer 34, and avoid the planarization layer material being naturally leveled, so as to form the annular groove 341 corresponding to the annular groove 311 on the planarization layer 34.
Step 705: forming a spacer on the flat layer 34, wherein the spacer includes a main spacer 351 and an auxiliary spacer 352, the auxiliary spacer 352 is disposed corresponding to the annular groove 341, and an orthogonal projection of a preset outer ring region 3521 of a top surface of the auxiliary spacer 352 on the flat layer 34 coincides with the annular groove 341, and of course, at the same time, an orthogonal projection of the preset outer ring region 3521 of the top surface of the auxiliary spacer 352 on the black matrix pattern 31 coincides with the annular groove 311, so that the auxiliary spacer 352 is sunk at a position corresponding to the annular groove 341, thereby avoiding forming a crater-shaped top.
In the embodiment of the invention, a semi-permeable mask 40 is used for patterning an insulating material film layer for forming the spacer to form the spacer, and the semi-permeable mask 40 includes a full-light-transmitting pattern region 41 corresponding to the main spacer 351 and a semi-light-transmitting pattern 42 corresponding to the auxiliary spacer 352.
In the embodiment of the invention, the annular groove matched with the preset outer ring area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove is sunken, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, the crater shape at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and the poor touch pressure correlation of a liquid crystal display panel is avoided.
In the above embodiments, the spacer is a two-stage (Main spacer (Main)/Sub spacer (Sub)) spacer, in some other embodiments of the present invention, the spacer may also be a three-stage (Main/Sub1/Sub2), where the heights of Sub1 and Sub2 are different in the case of a three-stage spacer, and the masks in the embodiments of the present invention respectively include semi-transparent patterns corresponding to Sub1 and Sub 2.
Referring to fig. 14, fig. 14 is a schematic structural diagram of a mask 50 according to a fifth embodiment of the present invention, the mask 50 is used for manufacturing a predetermined film pattern on a display substrate, and the mask 50 includes: a plurality of opaque patterns 51 and semi-transparent patterns 52, wherein the shape and size of the opaque patterns 51 match with the shape and size of a predetermined central region of the top surface of the auxiliary spacer to be formed on the display substrate.
In the embodiment of the present invention, the opaque pattern 51 is circular, the auxiliary spacers to be formed on the display substrate are columnar spacers, and the cross section is circular. Of course, in other embodiments of the present invention, the cross section of the columnar spacer is not limited to a circle, and may also be square, oval, or rectangular, for example.
In the embodiment of the present invention, the size of the opaque pattern 51 may be determined according to an experimental value or an empirical value, and is matched with the size of the corresponding crater recessed region of the secondary spacer having the crater-shaped top.
In the embodiment of the present invention, the transmittance of the opaque pattern 51 may be determined according to an experimental value or an empirical value, and is matched with the depth of the crater recess of the corresponding auxiliary spacer having a crater-shaped top.
In the embodiment of the present invention, the number of the opaque patterns 51 is the same as the number of the auxiliary spacers to be formed on the display substrate, and the positions correspond to each other. Of course, in other embodiments of the present invention, other arrangement manners are not excluded, for example, the number of the opaque patterns 51 is less than that of the auxiliary spacers, and the opaque patterns correspond to only some of the auxiliary spacers.
The mask 50 is used for making a preset film layer pattern on a display substrate, and the display substrate is a display substrate needing to form a spacer. In the embodiment of the invention, the display substrate may be a color film substrate, and the preset film pattern may be a black matrix pattern. Of course, in other embodiments of the present invention, the display substrate may also be an array substrate, and the predetermined film layer pattern is a film layer pattern on the array substrate, such as a passivation layer.
When the display substrate in the embodiment of the present invention is a color film substrate and the preset film pattern is a black matrix pattern, in the embodiment of the present invention, the mask 50 further includes: and the full light-transmitting patterns 53 correspond to sub-pixel regions surrounded by the black matrix patterns. The opaque patterns 51 and the semi-transmissive patterns 52 correspond to the black matrix patterns.
The sixth embodiment of the present invention further provides a method for manufacturing a display substrate, including:
forming a preset film layer;
and patterning the preset film layer by using the mask in the fifth embodiment to form a preset film layer pattern, wherein the preset film layer pattern comprises protrusions corresponding to the light-tight pattern.
The display substrate in the embodiment of the invention is a display substrate on which a spacer needs to be formed, and can be a color film substrate or an array substrate.
In the embodiment of the invention, the bulge matched with the preset middle area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, a crater at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and poor touch pressure correlation of a liquid crystal display panel is avoided.
In some embodiments of the present invention, after forming the predetermined film layer pattern, the method further includes the following steps:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the preset middle area of the top surface of the auxiliary spacer is positioned on the orthographic projection of the preset film layer pattern and the projection are superposed.
Referring to fig. 15 to 19, fig. 15 to 19 are schematic flow charts of a manufacturing method of a display substrate according to a seventh embodiment of the present invention, the manufacturing method of the display substrate includes:
step 801: referring to fig. 15, a light-shielding material film 31' is formed, wherein the light-shielding material film is the predetermined film;
step 802: referring to fig. 15, a photoresist layer 32 is formed on the light shielding material film 31';
in the embodiment of the present invention, the positive photoresist used in the photoresist layer 32 is a fully exposed positive photoresist that is soluble in a developing solution, a partially exposed positive photoresist that is partially soluble in a developing solution, and an unexposed positive photoresist that is insoluble in a developing solution.
Step 803: referring to fig. 15, the mask 50 shown in the fifth embodiment is used to expose and develop the photoresist layer 32, so as to form a photoresist fully-reserved region 321 corresponding to the opaque pattern 51, a photoresist semi-reserved region 322 corresponding to the semi-transparent pattern 52, and a photoresist fully-removed region 323 corresponding to the fully-transparent pattern 53;
step 804: referring to fig. 16, the light-shielding material film 31' in the photoresist full removal region 323 is etched;
step 805: referring to fig. 17, the photoresist layer 32 in the photoresist semi-reserved region 322 is ashed;
step 806: referring to fig. 18, the light-shielding material film 31' of the photoresist semi-reserved region 322 is etched to form a black matrix pattern 31 including a protrusion 312;
step 807: referring to fig. 19, the photoresist layer of the photoresist all-remained region 321 is stripped to expose the black matrix pattern 31.
In the embodiment of the invention, the bulge matched with the preset middle area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, a crater at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and poor touch pressure correlation of a liquid crystal display panel is avoided.
Referring to fig. 20, fig. 20 is a schematic view of a manufacturing method of a display substrate according to an eighth embodiment of the present invention, the manufacturing method of the display substrate includes:
step 901: providing a substrate 30;
step 902: forming a black matrix pattern 31 on the base substrate 30, the black matrix pattern 31 including a protrusion 312;
please refer to the embodiment shown in fig. 15-19 for a specific method for forming the black matrix pattern 31.
Step 903: forming a color resist pattern 33 in a subpixel region surrounded by the black matrix pattern 31;
step 904: a flat layer 34 is formed on the black matrix pattern 31 and the color resist pattern 33, and a protrusion 342 is formed on the flat layer 44 at a position corresponding to the protrusion 312.
In the prior art, when forming the planarization layer, usually, the planarization layer material is naturally leveled on the black matrix pattern 31 and the color resist pattern 33, and then cured, in the embodiment of the present invention, in order to prevent the protrusion 312 on the black matrix pattern 31 from being planarized by the planarization layer 34, it is necessary to accelerate the curing of the planarization layer material in the process of forming the planarization layer 34, and prevent the planarization layer material from naturally leveling, so as to form the protrusion 342 corresponding to the protrusion 312 on the planarization layer 34.
Step 905: forming a spacer on the flat layer 34, wherein the spacer includes a main spacer 351 and an auxiliary spacer 352, the auxiliary spacer 352 is disposed corresponding to the protrusion 242, and an orthogonal projection of the preset central region 3522 of the top surface of the auxiliary spacer 352 on the flat layer 34 coincides with the protrusion 342, and of course, an orthogonal projection of the preset central region 3522 of the top surface of the auxiliary spacer 352 on the black matrix pattern 31 coincides with the protrusion 312, so that the auxiliary spacer 352 is lifted at a position corresponding to the protrusion 342 to avoid forming a crater-shaped top.
In the embodiment of the invention, a semi-permeable mask 40 is used for patterning an insulating material film layer for forming the spacer to form the spacer, and the semi-permeable mask 40 includes a full-light-transmitting pattern region 41 corresponding to the main spacer 351 and a semi-light-transmitting pattern 42 corresponding to the auxiliary spacer 352.
In the embodiment of the invention, the bulge matched with the preset middle area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, a crater at the top of the auxiliary spacer is avoided, the flatness of the top surface of the auxiliary spacer is improved, and poor touch pressure correlation of a liquid crystal display panel is avoided.
In the above embodiments, the spacer is a two-stage (Main spacer (Main)/Sub spacer (Sub)) spacer, in some other embodiments of the present invention, the spacer may also be a three-stage (Main/Sub1/Sub2), where the heights of Sub1 and Sub2 are different in the case of a three-stage spacer, and the masks in the embodiments of the present invention respectively include semi-transparent patterns corresponding to Sub1 and Sub 2.
The ninth embodiment of the present invention further provides a display substrate manufactured by the manufacturing method of the display substrate according to any one of the second to fourth embodiments, including: presetting a film layer pattern, wherein the preset film layer pattern comprises an annular groove, and the shape and the size of the annular groove are matched with the shape and the size of a preset outer ring area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
In the embodiment of the invention, the annular groove matched with the preset outer ring area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset outer ring area at the top of the auxiliary spacer formed on the annular groove is sunken, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically kept equal, the flatness of the top surface of the auxiliary spacer is improved, and the poor touch pressure correlation of the liquid crystal display panel is avoided.
In the embodiment of the invention, the annular groove is annular, the auxiliary spacer which needs to be formed on the display substrate is a columnar spacer, and the cross section of the auxiliary spacer is circular. Of course, in other embodiments of the present invention, the cross section of the columnar spacer is not limited to a circle, and may also be a square, an ellipse, a rectangle, or the like, and correspondingly, the shape of the annular groove is also a corresponding annular structure.
In the embodiment of the invention, the size of the annular groove is matched with the size of the outer ring of the volcanic vent of the auxiliary shock insulator with the volcanic vent-shaped top.
In the embodiment of the invention, the depth of the annular groove is matched with the depth of the crater dent of the corresponding auxiliary shock insulator with the crater-shaped top.
In the embodiment of the invention, the number of the annular grooves is the same as that of the auxiliary spacers required to be formed on the display substrate, and the positions of the annular grooves correspond to those of the auxiliary spacers one by one. Of course, in other embodiments of the present invention, other arrangement manners are not excluded, for example, the number of the annular grooves is less than the number of the auxiliary spacers, and the annular grooves only correspond to part of the auxiliary spacers one by one.
In some embodiments of the present invention, the display substrate further comprises: the isolation pad comprises a main isolation pad and an auxiliary isolation pad, the auxiliary isolation pad is arranged above the corresponding annular groove, and the orthographic projection of the preset outer ring area on the top surface of the auxiliary isolation pad on the film layer graph is coincided with the annular groove.
In some embodiments of the present invention, the display substrate is a color film substrate, and the predetermined film pattern is a black matrix pattern. Of course, in other embodiments of the present invention, the display substrate may also be an array substrate, and the predetermined film layer pattern is a film layer pattern on the array substrate, such as a passivation layer.
In some preferred embodiments of the present invention, the display substrate is a color film substrate, and the preset film pattern is a black matrix pattern.
In some preferred embodiments of the present invention, the display substrate may be as shown in fig. 13, and includes a substrate 30, a black matrix pattern 31, a color-resist pattern 33, a flat layer 34 and a spacer, wherein the black matrix pattern 31 includes an annular groove 311, the flat layer 34 includes an annular groove 341 corresponding to the annular groove 311, the spacer includes a main spacer 351 and an auxiliary spacer 352, the auxiliary spacer 352 is disposed corresponding to the annular groove 341, an orthogonal projection of a preset outer ring region 3521 of a top surface of the auxiliary spacer 352 on the flat layer 34 coincides with the annular groove 341, and an orthogonal projection of a preset outer ring region 3521 of a top surface of the auxiliary spacer 352 on the black matrix pattern 31 coincides with the annular groove 311.
In the above embodiments, the depth of the annular recess is about 0.2 μm, for example 0.15-0.25 μm, preferably 0.2 μm.
An embodiment of the present invention further provides a display substrate manufactured by the manufacturing method of the display substrate according to any one of the sixth to eighth embodiments, including: presetting a film layer pattern, wherein the preset film layer pattern comprises a bulge, and the shape and the size of the bulge are matched with the shape and the size of a preset middle area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
In the embodiment of the invention, the bulge matched with the preset middle area at the top of the auxiliary spacer is formed on the preset film layer graph of the display substrate, so that the preset middle area at the top of the auxiliary spacer formed on the bulge is lifted, the heights of the outer ring area and the middle area at the top of the auxiliary spacer are basically equal, the flatness of the top surface of the auxiliary spacer is improved, and the poor touch pressure correlation of the liquid crystal display panel is avoided.
In the embodiment of the invention, the shape of the bulge is circular, the auxiliary spacer which needs to be formed on the display substrate is a columnar spacer, and the cross section of the auxiliary spacer is circular. Of course, in other embodiments of the present invention, the cross section of the columnar spacer is not limited to a circle, and may also be a square, an ellipse, a rectangle, or the like, correspondingly.
In the embodiment of the invention, the size of the bulge is matched with the size of the invagination area of the crater of the corresponding auxiliary shock insulator with the crater-shaped top.
In an embodiment of the invention, the height of the protrusions is matched with the depth of the crater depressions of the corresponding auxiliary mat with crater-shaped tops.
In the embodiment of the invention, the number of the bulges is the same as that of the auxiliary shock insulators required to be formed on the display substrate, and the bulges correspond to the auxiliary shock insulators in position one by one. Of course, in other embodiments of the present invention, other arrangement manners are not excluded, for example, the number of the protrusions is less than the number of the auxiliary spacers, and the protrusions only correspond to part of the auxiliary spacers one by one.
In some embodiments of the present invention, the display substrate further comprises: the isolation pad comprises a main isolation pad and an auxiliary isolation pad, the auxiliary isolation pad is arranged above the corresponding protrusion, and the orthographic projection of the preset middle area on the top surface of the auxiliary isolation pad on the film layer graph coincides with the protrusion.
In some embodiments of the present invention, the display substrate is a color film substrate, and the predetermined film pattern is a black matrix pattern. Of course, in other embodiments of the present invention, the display substrate may also be an array substrate, and the predetermined film layer pattern is a film layer pattern on the array substrate, such as a passivation layer.
In some preferred embodiments of the present invention, the display substrate is a color film substrate, and the preset film pattern is a black matrix pattern.
In some preferred embodiments of the present invention, the display substrate may be as shown in fig. 20, and includes a substrate 30, a black matrix pattern 31, a color barrier layer pattern 33, a flat layer 34 and a spacer, wherein the black matrix pattern 31 includes a protrusion 312, the flat layer 34 includes a protrusion 342 corresponding to the protrusion 312, the spacer includes a main spacer 351 and an auxiliary spacer 352, the auxiliary spacer 352 is disposed corresponding to the protrusion 342, an orthographic projection of a predetermined central region 3522 of a top surface of the auxiliary spacer 352 on the flat layer 34 coincides with the protrusion 342, and an orthographic projection of a predetermined central region 3522 of a top surface of the auxiliary spacer 352 on the black matrix pattern 31 coincides with the protrusion 312.
In the above embodiments, the height of the protrusions is about 0.2 μm, for example 0.15-0.25 μm, preferably 0.2 μm.
An embodiment of the present invention further provides a display device, including the display substrate in any of the above embodiments.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this invention belongs. The use of "first," "second," and similar terms in the present application do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. Also, the use of the terms "a" or "an" and the like do not denote a limitation of quantity, but rather denote the presence of at least one. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships are changed accordingly.
While the foregoing is directed to the preferred embodiment of the present invention, it will be understood by those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (7)
1. A method for manufacturing a display substrate is characterized by comprising the following steps:
forming a preset film layer;
composition is carried out on the preset film layer by adopting a mask plate to form a preset film layer pattern; the mask plate comprises: the shape and the size of the semi-transparent pattern are matched with those of a preset outer ring area on the top surface of the auxiliary spacer to be formed on the display substrate; the preset film layer pattern comprises an annular groove corresponding to the semi-transparent pattern; the display substrate is a color film substrate, the preset film layer graph is a black matrix graph, and the mask further comprises: a plurality of fully transparent patterns and opaque patterns;
the manufacturing method of the display substrate comprises the following steps:
forming a shading material film layer which is the preset film layer;
forming a photoresist layer on the shading material film layer;
exposing and developing the photoresist layer by using the mask to form a photoresist full-retention area corresponding to the opaque pattern, a photoresist semi-retention area corresponding to the semi-transparent pattern and a photoresist full-removal area corresponding to the fully-transparent pattern;
etching the shading material film layer of the photoresist full-removing area;
ashing the photoresist layer of the photoresist semi-reserved area;
etching the shading material film layer of the photoresist semi-reserved area to form a black matrix pattern comprising an annular groove;
and stripping the photoresist layer of the photoresist full-reserved area to expose the black matrix pattern.
2. The method for manufacturing a display substrate according to claim 1, wherein after the forming of the predetermined film layer pattern, the method further comprises:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the orthographic projection of a preset outer ring area on the top surface of the auxiliary spacer on a preset film layer graph is superposed with the annular groove.
3. A method for manufacturing a display substrate is characterized by comprising the following steps:
forming a preset film layer;
composition is carried out on the preset film layer by adopting a mask plate to form a preset film layer pattern; the mask plate comprises: the shape and the size of the opaque pattern are matched with those of a preset middle area on the top surface of the auxiliary spacer to be formed on the display substrate; the preset film layer pattern comprises a bulge corresponding to the light-tight pattern;
the display substrate is a color film substrate, the preset film layer graph is a black matrix graph, and the mask further comprises: a plurality of fully transmissive patterns;
the manufacturing method of the display substrate comprises the following steps:
forming a light shielding material film layer;
forming a photoresist layer on the shading material film layer;
exposing and developing the photoresist layer by using the mask to form a photoresist full-retention area corresponding to the opaque pattern, a photoresist semi-retention area corresponding to the semi-transparent pattern and a photoresist full-removal area corresponding to the fully-transparent pattern;
etching the shading material film layer of the photoresist full-removing area;
ashing the photoresist layer of the photoresist semi-reserved area;
etching the shading material film layer of the photoresist semi-reserved area to form a convex black matrix pattern;
and stripping the photoresist layer of the photoresist full-reserved area to expose the black matrix pattern.
4. The method for manufacturing a display substrate according to claim 3, wherein after the forming of the predetermined film layer pattern, the method further comprises:
forming an insulating material film layer;
and composing a picture of the insulating material film layer by adopting a semi-permeable mask to form a spacer, wherein the spacer comprises a main spacer and an auxiliary spacer, and the preset middle area of the top surface of the auxiliary spacer is positioned on the orthographic projection of the preset film layer pattern and the projection are superposed.
5. A display substrate fabricated by the method of any one of claims 1-2, comprising:
presetting a film layer pattern, wherein the preset film layer pattern comprises an annular groove, and the shape and the size of the annular groove are matched with the shape and the size of a preset outer ring area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
6. A display substrate manufactured by the method of any one of claims 3-4, comprising:
presetting a film layer pattern, wherein the preset film layer pattern comprises a bulge, and the shape and the size of the bulge are matched with the shape and the size of a preset middle area of the top surface of the auxiliary spacer, which is required to be formed on the display substrate.
7. A display device comprising the display substrate according to claim 5 or 6.
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| CN108333883A (en) * | 2018-02-28 | 2018-07-27 | 京东方科技集团股份有限公司 | Mask plate, display base plate and preparation method thereof, display panel, display device |
| CN108983486B (en) * | 2018-08-22 | 2021-06-04 | 惠科股份有限公司 | Method for manufacturing display panel |
| CN109212890B (en) * | 2018-08-31 | 2022-01-18 | 京东方科技集团股份有限公司 | Mask, display substrate and manufacturing method thereof |
| CN115308951A (en) * | 2022-08-31 | 2022-11-08 | 合肥鑫晟光电科技有限公司 | Color film substrate, display panel and mask |
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| US5170293A (en) * | 1991-02-18 | 1992-12-08 | Sharp Kabushiki Kaisha | Exposure mechanism |
| CN1873530A (en) * | 2005-06-03 | 2006-12-06 | 三星电子株式会社 | Display device, method of manufacturing the same and mask for manufacturing the same |
| KR20070047087A (en) * | 2005-11-01 | 2007-05-04 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display and method for manufacturing the same |
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| CN104317160A (en) * | 2014-09-19 | 2015-01-28 | 京东方科技集团股份有限公司 | Mask, spacer formed by the mask and preparation method of spacer by using the mask |
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| US5170293A (en) * | 1991-02-18 | 1992-12-08 | Sharp Kabushiki Kaisha | Exposure mechanism |
| CN1873530A (en) * | 2005-06-03 | 2006-12-06 | 三星电子株式会社 | Display device, method of manufacturing the same and mask for manufacturing the same |
| KR20070047087A (en) * | 2005-11-01 | 2007-05-04 | 엘지.필립스 엘시디 주식회사 | Liquid crystal display and method for manufacturing the same |
| CN102819180A (en) * | 2012-07-30 | 2012-12-12 | 京东方科技集团股份有限公司 | Gray-scale mask plate and columnar spacer formed by utilizing same |
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