CN107460533A - A kind of device and method of metal and its alloy electrochemical polish - Google Patents
A kind of device and method of metal and its alloy electrochemical polish Download PDFInfo
- Publication number
- CN107460533A CN107460533A CN201710717016.8A CN201710717016A CN107460533A CN 107460533 A CN107460533 A CN 107460533A CN 201710717016 A CN201710717016 A CN 201710717016A CN 107460533 A CN107460533 A CN 107460533A
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- Prior art keywords
- tank body
- electrochemical polish
- alloy
- inner tank
- fluid
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- 229910052751 metal Inorganic materials 0.000 title claims abstract description 68
- 239000002184 metal Substances 0.000 title claims abstract description 68
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 67
- 239000000956 alloy Substances 0.000 title claims abstract description 67
- 238000000034 method Methods 0.000 title claims abstract description 24
- 239000012530 fluid Substances 0.000 claims abstract description 181
- 238000005498 polishing Methods 0.000 claims abstract description 86
- 238000001816 cooling Methods 0.000 claims abstract description 65
- 210000005056 cell body Anatomy 0.000 claims abstract description 62
- 239000007788 liquid Substances 0.000 claims abstract description 46
- 230000000694 effects Effects 0.000 claims abstract description 17
- 239000004020 conductor Substances 0.000 claims abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 26
- 229910052802 copper Inorganic materials 0.000 claims description 26
- 239000010949 copper Substances 0.000 claims description 26
- 229920006351 engineering plastic Polymers 0.000 claims description 15
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 13
- 239000010936 titanium Substances 0.000 claims description 13
- 229910052719 titanium Inorganic materials 0.000 claims description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 11
- 239000003518 caustics Substances 0.000 claims description 10
- 239000000654 additive Substances 0.000 claims description 9
- 230000000996 additive effect Effects 0.000 claims description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 8
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 claims description 8
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 6
- 230000002787 reinforcement Effects 0.000 claims description 6
- 230000005518 electrochemistry Effects 0.000 claims description 5
- 230000000977 initiatory effect Effects 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 4
- 229910002804 graphite Inorganic materials 0.000 claims description 4
- 239000010439 graphite Substances 0.000 claims description 4
- 229920001223 polyethylene glycol Polymers 0.000 claims description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004202 carbamide Substances 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 3
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 3
- 229940081974 saccharin Drugs 0.000 claims description 3
- 235000019204 saccharin Nutrition 0.000 claims description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 3
- 235000006408 oxalic acid Nutrition 0.000 claims description 2
- 235000019422 polyvinyl alcohol Nutrition 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052738 indium Inorganic materials 0.000 claims 1
- 238000012769 bulk production Methods 0.000 abstract description 6
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 2
- 239000002826 coolant Substances 0.000 description 10
- 230000007797 corrosion Effects 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 230000005611 electricity Effects 0.000 description 5
- 238000010008 shearing Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 229910001069 Ti alloy Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 210000004027 cell Anatomy 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 235000013399 edible fruits Nutrition 0.000 description 3
- 229910000856 hastalloy Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 244000025254 Cannabis sativa Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 235000019628 coolness Nutrition 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 210000004394 hip joint Anatomy 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Abstract
The invention discloses a kind of metal and its device and method of alloy electrochemical polish, the device includes carrier fluid cell body, electrical parameter loading system, fluid delivery system and circulating cooling system, the carrier fluid cell body, for accommodating electrochemical polish liquid and polished metal and its alloy；The electrical parameter loading system, for providing negative electrode, anode and power supply for electrochemical polish, the anode connects the polished metal and its alloy by conductor；The fluid delivery system, for electrochemical polish liquid to be transported in the carrier fluid cell body；The circulating cooling system, for controlling the temperature of the electrochemical polish liquid in the carrier fluid cell body；The polishing method of the present invention is to carry out electrochemical polishing treatment to metal and its alloy by said apparatus.The present invention can effectively solve the problems, such as that existing polissoir polishing effect is poor, polishing efficiency is low, the uniformity of different batches of product and repeatability are poor, can not realize large-scale and bulk production.
Description
Technical field
The present invention relates to field of metal surface treatment, more particularly to the device of a kind of metal and its alloy electrochemical polish and
Method.
Background technology
Metal and its alloy polishing are widely used in artificial hip joint, knee as a kind of surface treatment mode
The products such as joint, due to the roughness of product surface can be significantly reduced after polishing, smooth and bright surface is obtained, is reduced
The frictional force of product is acted on, reduces the generation of friction chip, while glossiness is high, product appearance class is high, therefore polishing technology
Also it is increasingly being used to the surface treatment of normal aggregates product.The general fashion of polishing has, mechanical polishing, chemical polishing, electricity
Chemical polishing etc..Wherein, it is good to mechanically polish Surface flat, by changing polishing material and polishing agent, the high throwing of brightness can be obtained
Light product, but its shortcoming is that labor intensity is big, complex parts are difficult to polishing, while uniformity is poor；Chemical polishing can
Complex part is handled, but uses solution corrosion big, while brightness is poor；By contrast, electrochemical polish uses solution
Corrosivity is relatively low, and mainly by the electrochemical corrosion under electric field, surface is processed by shot blasting, can handle complex part, and make
Short with the time, homogeneity of product is high.
Patent publication No.：CN 104440502A, disclose " roller electropolishing equipment ", the equipment mainly pass through by
Part is put into roller, infiltrates polishing to product to realize in roller by the rotation and electrobrightening solution of roller, but its
It is actually subjected to realize that the fluid-tight operation difficulty of product is larger, simultaneously because being operated for roller and fluid-tight, sample loading volume is limited, it is difficult to
Realize that the dress of large product is hung, and when sample size is more, the interference in product rolling and electrolytic process easily occurs, influences to polish
Effect.
Patent announcement number number：CN204298503U, disclose " electrochemical polish apparatus for being used for metal substrate ", the device
Polished anode assemblies are hung by movable component, then anode assemblies are put into electrolytic cell and carried out at section chemical polishing
Reason, patent publication No.：CN104032366A, " electrochemical polish apparatus and method " is disclosed, the device is by controlling electrolytic cell
In electrolyte flow direction it is opposite with the direction of motion of polished workpiece come realize treat polishing workpiece polishing；On
The polish temperature for the electrolyte that can not be all efficiently controlled in two burnishing devices in electrolytic cell is stated, different product batch easily occurs
The defects of secondary uniformity and poor repeatability, and it is difficult to bulk production.
To sum up, a kind of metal of function admirable and its device and method of alloy electrochemical polish are researched and developed, is solved existing
Polissoir polishing effect is poor, polishing efficiency is low, the uniformity of different batches of product and repeatability it is poor, can not realize it is large-scale and
The defects of bulk production, it appears increasingly important.
The content of the invention
It is an object of the invention to overcome, existing polissoir polishing effect is poor, polishing efficiency is low, different batches of product
Uniformity and repeatability it is poor, the defects of large-scale and bulk production can not be realized.
In order to solve the above-mentioned technical problem, a kind of device of metal and its alloy electrochemical polish is originally provided, including is carried
Liquid bath body, electrical parameter loading system, fluid delivery system and circulating cooling system；The carrier fluid cell body, for accommodating electrochemistry
Polishing fluid and polished metal and its alloy；The electrical parameter loading system, for providing negative electrode, anode for electrochemical polish
And power supply, the anode connect the polished metal and its alloy by conductor；The fluid delivery system, for by electricity
Chemical polishing solution is transported in the carrier fluid cell body；The circulating cooling system, for controlling the electrification in the carrier fluid cell body
The temperature of optical polishing liquid.
Further, the carrier fluid cell body includes inner tank body and outer tank body, shape between the inner tank body and the outer tank body
Into cooling duct, the inner tank body connects with the fluid delivery system, and the cooling duct connects with the circulating cooling system
It is logical；The conductor is conductive copper rod, and the conductive copper rod is arranged on the top of the inner tank body, set around the outer tank body
There is reinforcement.
Further, the shape of the inner tank body and the outer tank body is circle, the inner tank body and the water jacket
Body is processed into by engineering plastic flitch, wherein, the inner tank body is processed into by porous type engineering plastic flitch.
Further, the electrical parameter loading system includes anode, negative electrode and power supply, and the negative electrode passes through with the anode
Porous type engineering plastic flitch is isolated；The anode is connected with one end of the conductive copper rod, and the other end of the conductive copper rod leads to
Cross the metal and its alloy that electropolishing is treated described in conductive hanger suspension；The negative electrode is annularly uniformly and symmetrically distributed in the carrier fluid
In cell body, the negative electrode is titanium plate or graphite cake；The power supply is DC constant voltage constant-current supply, the DC constant voltage constant-current supply
On-load voltage scope be 5-45V, current density range 0.1-1.5A/cm2, power source loads effect≤0.1%.
Further, the fluid delivery system includes centrifugal pump and fluid delivery tube, and the outlet of the centrifugal pump passes through
The fluid delivery tube connects with the inner tank body, and the caliber of the fluid delivery tube is 10-50mm.
Preferably, mozzle is vertically installed with the inner tank body, the mozzle includes first end and the second end,
The first end is set close to the top of the inner tank body, and the first end connects with the fluid delivery tube, and described the
Two ends are set close to the bottom of the inner tank body, and the second end is flat duckbilled mouth structure.
Further, it is provided with perforate on tube wall of the mozzle away from the second end, the perforate 703 is along pipe
The vertical of wall is uniformly arranged in a row, and the opening direction of the second end is identical with the opening direction of the perforate, and and institute
The circular arc tangential line direction for stating the position that inner tank body is provided with the mozzle is parallel.
Further, the bottom of the inner tank body is provided with arcuate guide spoke, and the initiating terminal of the guiding spoke is close
The second end is set, and the width for being oriented to spoke is gradually reduced in the counterclockwise direction.
Further, overflowed into the electrochemical polish liquid of the mozzle from the perforate and the second end laggard
Enter in the inner tank body, and under the guiding of the guiding spoke, in the counterclockwise direction in the inner tank body internal rotation.
Preferably, the mozzle is two, and two mozzles are radially symmetrically distributed in the inner tank body.
Preferably, the guiding spoke is two, and two spokes that are oriented to are arranged between two mozzles.
Further, the fluid delivery system triggers fluid motion, the centrifugation by the centrifugal pump trandfer fluid
Fluid flow in pump is 1-8m3/ h, power 1-10KW, when electropolishing acts on, the shear rate of flow of fluid is 3.0-
7.0m/s。
Further, the circulating cooling system is arranged on the outside of the carrier fluid cell body, and it includes heater and cold
But device, the heater and the cooling device are connected with the cooling duct respectively by valve transfer.
Further, the circulating cooling system controls the temperature of the electrochemical polish liquid in the carrier fluid cell body in 15-
40℃。
Further, the electrochemical polish liquid is made up of corrosive agent and additive, and the corrosive agent is perchloric acid, grass
One or more in acid, acetic acid, sulfamic acid, phosphoric acid, the additive are urea, polyethylene glycol, polyvinyl alcohol, the third three
One or more in alcohol, saccharin.
Present invention also offers a kind of method of metal and its alloy electrochemical polish, and this method is using said apparatus to gold
Category and its alloy carry out electrochemical polishing treatment.
The metal of the present invention and its device and method of alloy electrochemical polish, have the advantages that：
1st, it is of the invention that polishing fluid and polished part are accommodated by carrier fluid cell body, by fluid delivery system into carrier fluid cell body
Polishing fluid is conveyed, polish temperature is controlled by circulating cooling system, and electrochemical polish mistake is controlled by electrical parameter loading system
Journey, the present invention are easily achieved bulk production by said structure, reduce the labor intensity that tradition machinery polishing polishes step by step, add
Work cost is low, there is provided processing efficiency.
2nd, fluid delivery system of the invention includes centrifugal pump and fluid delivery tube, by match flow in centrifugal pump and
The caliber of delivery pipe, the shearing flow velocity of fluid is controlled, realize good electropolishing effect.
3rd, the coolant in circulating cooling system of the invention is flowed with thermal convection in the heat exchanger, coolant
Rotary motion direction with state the electrochemical polish solution in carrier fluid cell body stirring after rotating operation it is in opposite direction, effectively control
The temperature of electrochemical polish.
4th, using the device and method of the present invention, it is possible to achieve the uniformity of different batches of product and reproducible, effectively
Avoid poor traditional polishing mode product different parts uniformity and the repeatability of special-shaped product appearance and reappearance is bad
Problem.
Brief description of the drawings
, below will be to required in embodiment or description of the prior art in order to illustrate more clearly of technical scheme
The accompanying drawing used is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the present invention, right
For those of ordinary skill in the art, on the premise of not paying creative work, it can also be obtained according to these accompanying drawings
Its accompanying drawing.
Fig. 1 is the dimensional structure diagram of the burnishing device of the present invention；
Fig. 2 is Fig. 1 front view；
Fig. 3 is Fig. 1 top view；
Fig. 4 is the schematic diagram of the present invention；
Fig. 5 is the inner tank body and its internal structure schematic diagram of the present invention；
Fig. 6 is Fig. 5 top view；
Fig. 7 is the mozzle of the present invention and the position relationship structural representation being oriented between spoke；
Fig. 8 is the structural representation of the mozzle of the present invention；
Fig. 9 is the second end of the present invention and the opening direction schematic diagram of perforate；
Figure 10 is the SEM figures before pure titanium polishing；
Figure 11 is the SEM figures after pure titanium polishing in the embodiment of the present invention 1；
Figure 12 is the surface energy spectrum diagram after pure titanium polishing in the embodiment of the present invention 1；
Figure 13 is the AFM figures after pure titanium polishing in the embodiment of the present invention 1；
Figure 14 is the SEM after the titanium alloy polishing in the embodiment of the present invention 2.
Wherein, reference corresponds in figure：1- carrier fluid cell bodies, 101- inner tank bodys, 102- outer tank bodies, 103- coolings are logical
Road, 2- electrical parameter loading systems, 201- negative electrodes, 202- anodes, 203- power supplys, 204- conductors, 205- conduction hangers, 3- fluids are defeated
Send system, 301- centrifugal pumps, 302- fluid delivery tubes, 4- circulating cooling systems, 401- heaters, 402- cooling devices, 5-
Metal and its alloy, 6- reinforcements, 7- mozzles, 701- first ends, 702- the second ends, 703- perforates, 8- are oriented to spoke.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in inventive embodiments is carried out clear, complete
Ground describes, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based on this
The embodiment of invention, the every other reality that those of ordinary skill in the art are obtained on the premise of creative work is not made
Example is applied, belongs to the scope of protection of the invention.
Embodiment 1
As Figure 1-Figure 4, the invention provides a kind of metal and its device of alloy electrochemical polish, including carrier fluid cell body 1,
Electrical parameter loading system 2, fluid delivery system 3 and circulating cooling system 4.
The carrier fluid cell body 1, for accommodating electrochemical polish liquid and polished metal and its alloy 5, the carrier fluid groove
Body 1 includes inner tank body 101 and outer tank body 102, and cooling duct 103 is formed between the inner tank body 101 and the outer tank body 102,
The inner tank body 101 connects with the fluid delivery system 3, and the cooling duct 103 connects with the circulating cooling system 4；
The conductor 204 is conductive copper rod, and the conductive copper rod is arranged on the top of the inner tank body 101, the week of the outer tank body 102
Enclose and be provided with reinforcement 6.The shape of the inner tank body 101 and the outer tank body 102 is circle, the inner tank body 101 and institute
Outer tank body 102 is stated to be processed into by corrosion resistant engineering plastic flitch, wherein, the inner tank body is porous type engineering plastic flitch system
Into.
The electrical parameter loading system 2, it is described for providing negative electrode 201, anode 202 and power supply 203 for electrochemical polish
Anode 202 connects the polished metal and its alloy 5 by conductor 204, and the electrical parameter loading system 2 includes anode
202nd, negative electrode 201 and power supply 203, the negative electrode 201 and the anode 202 by corrosion resistant porous type engineering plastic flitch every
From the anode 202 is connected with one end of the conductive copper rod, and the other end of the conductive copper rod is outstanding by conductive hanger 205
The metal and its alloy 5 of electropolishing are treated described in extension, the negative electrode 201 is annularly uniformly and symmetrically distributed in the carrier fluid cell body 1,
The negative electrode 201 is corrosion resistant titanium plate, and the power supply 203 is DC constant voltage constant-current supply, the DC constant voltage constant-current supply
On-load voltage scope be 5V, current density range 0.1A/cm2, power source loads effect is 0.1%.
The fluid delivery system 3, for electrochemical polish liquid to be transported in the carrier fluid cell body 1, the fluid is defeated
System 3 is sent to include centrifugal pump 301 and fluid delivery tube 302, the outlet of the centrifugal pump 301 passes through the fluid delivery tube 302
Connected with the inner tank body 101, the caliber of the fluid delivery tube 302 is 10mm, the fluid delivery system 3 by it is described from
Heart pump 301 has a pressurization function, and trandfer fluid triggers fluid motion under pressurization, the fluid flow in the centrifugal pump 301
For 1m3/ h, power 1KW, the shear rate of flow of fluid is 3.0m/s.
As viewed in figures 5-8, mozzle 7 is vertically installed with the inner tank body 101, the mozzle 7 includes first end
701 and the second end 702, the first end 701 is set close to the top of the inner tank body 101, the first end 701 with
The fluid delivery tube 302 is connected, and the second end 702 is set close to the bottom of the inner tank body 101, the second end
702 be flat duckbilled mouth structure.
Continue as shown in figure 8, tube wall of the mozzle 7 away from the second end 702 is provided with perforate 703, it is described
Perforate 703 is vertically evenly distributed on tube wall, is specially uniformly arranged in a row along the vertical of tube wall.The second end 702
Opening direction it is identical with the opening direction of the perforate 703, and the inner tank body 101 is provided with the mozzle 7
The circular arc tangential line direction of position is parallel.The direction of arrow in Fig. 9 is the opening direction of the second end and the opening direction of perforate,
Straight line in Fig. 9 is the circular arc tangential line of inner tank body, there it can be seen that the opening direction of the second end and the opening direction of perforate
It is parallel with the direction of the circular arc tangential line.
Continue as illustrated in figs. 5-7, the bottom of the inner tank body 101 is provided with arcuate guide spoke 8, the guiding spoke 8
Initiating terminal set close to the second end 702, it is described be oriented to spoke 8 width be gradually reduced in the counterclockwise direction.This reality
Apply the polishing fluid counter-rotating for serving reverse guide effect, making in inner tank body of the guiding spoke in example.Arrow side in Fig. 7
To the direction of rotation of as polishing fluid.
Continue as shown in fig. 7, the mozzle 7 in the embodiment of the present invention is two, two mozzles 7 are radially symmetrical
It is distributed in the inner tank body 101, it is so-called symmetrical to refer to that two mozzles 7 are provided with the second end and perforate
That side is positioned opposite to each other, provides precondition for polishing fluid counter-rotating, the guiding spoke 8 is two, described in two
Spoke 8 is oriented to be arranged between two mozzles 7.
In the present embodiment, can be as follows with the principle of counter-rotating into the polishing fluid of inner tank body：The mozzle 7 and institute
State fluid delivery tube 302 to connect, electrochemical polish liquid can deliver into mozzle through fluid delivery tube, into the mozzle 7
Electrochemical polish liquid overflowed from the perforate 703 and the second end 702 after enter in the inner tank body 101, because of this reality
Apply in example has as above special set to the distribution arrangement of the opening direction of the second end, the opening direction of perforate and guiding spoke
Put, therefore the polishing fluid entered in inner tank body, can be in the counterclockwise direction described interior under the guiding of the guiding spoke 8
Rotating with Uniform in cell body 101.Such a rotation mode can make polishing fluid more uniform in inner tank body internal rotation, improve polishing effect
Fruit.In addition, the second end is arranged to flat duckbilled mouth structure by the present embodiment, it is because the pressure that polishing fluid overflows from the structure
It is larger, bigger power can be provided for polishing fluid counter-rotating.
The circulating cooling system 4, it is described to follow for controlling the temperature of the electrochemical polish liquid in the carrier fluid cell body 1
Ring cooling system 4 is arranged on the outside of the carrier fluid cell body 1, and it includes heater 401 and cooling device 402, wherein heating
It is logical comprising circulating heat exchange pump and heat exchanger, the heater 401 and the cooling device 402 inside device and cooling device
Valve transfer is crossed, is connected respectively with the cooling duct 103, the heat exchanger is dividing wall type heat exchanger, and the coolant is with heat
Convection type flows in the heat exchanger, and heat exchanger and heat exchanger tube material use Hastelloy, the rotation fortune of the coolant
Dynamic direction and the rotating operation after the electrochemical polish solution stirring in the carrier fluid cell body 1 are in opposite direction, the circulating cooling
System controls the temperature of the electrochemical polish liquid in the carrier fluid cell body 1 at 15 DEG C.
The electrochemical polish liquid is made up of corrosive agent and additive, the corrosive agent be perchloric acid and oxalic acid, it is described to add
It is urea and polyethylene glycol to add agent.
Present invention also offers a kind of method of metal and its alloy electrochemical polish, by said apparatus to metal and its
Alloy carries out electrochemical polish, and technical process is as follows：
The one of S1, the conductive copper rod being suspended on by conductive hanger 205 polished metal and its alloy 5 on carrier fluid cell body 1
End, the anode of the other end connection electrical parameter loading system of conductive copper rod；
S2, electrochemical polish liquid conveyed into mozzle 701 by pump 301 and fluid delivery tube 302, into the mozzle
Electrochemical polish liquid in 701 overflows from perforate 703 and the second end 702, and in the case where being oriented to the guiding of spoke 8, including reverse
The internal rotation of cell body 101, need to control fluid flow, power and shearing speed in centrifugal pump 301 in electrochemical polish liquid course of conveying
Rate；
S3, the DC constant voltage constant-current supply for connecting electrical parameter loading system, now, the metal and its alloy 5, electrical parameter for treating light add
The negative electrode and electrochemical polish liquid of loading system form a polishing system, and the metal and its alloy 5 for persistently treating light carry out electricity
Chemical polishing is handled；
S4, the circulating cooling system 4 being made up of circulating cooling pump and heat exchanger control the electrochemistry in the carrier fluid cell body 1
The temperature of polishing fluid is at 15 DEG C.
Metal and its alloy in this implementation can be titanium, and Figure 10 is the SEM figures before the polishing of pure titanium, and Figure 11 is pure titanium through this
Burnishing device in embodiment and the SEM figures after polishing method polishing, Figure 12 are the surface energy spectrum diagrams after pure titanium polishing, Tu13Shi
AFM after pure titanium polishing schemes, there it can be seen that the pure titanium after the burnishing device in the present embodiment and method polish is averaged
Roughness Ra=7.962nm.
Embodiment 2
As Figure 1-Figure 4, the invention provides a kind of metal and its device of alloy electrochemical polish, including carrier fluid cell body 1,
Electrical parameter loading system 2, fluid delivery system 3 and circulating cooling system 4.
The carrier fluid cell body 1, for accommodating electrochemical polish liquid and polished metal and its alloy 5, the carrier fluid groove
Body 1 includes inner tank body 101 and outer tank body 102, and cooling duct 103 is formed between the inner tank body 101 and the outer tank body 102,
The inner tank body 101 connects with the fluid delivery system 3, and the cooling duct 103 connects with the circulating cooling system 4；
The conductor 204 is conductive copper rod, and the conductive copper rod is arranged on the top of the inner tank body 101, the week of the outer tank body 102
Enclose and be provided with reinforcement 6.The shape of the inner tank body 101 and the outer tank body 102 is circle, the inner tank body 101 and institute
Outer tank body 102 is stated to be processed into by corrosion resistant engineering plastic flitch, wherein, the inner tank body is porous type engineering plastic flitch system
Into.
The electrical parameter loading system 2, it is described for providing negative electrode 201, anode 202 and power supply 203 for electrochemical polish
Anode 202 connects the polished metal and its alloy 5 by conductor 204, and the electrical parameter loading system 2 includes anode
202nd, negative electrode 201 and power supply 203, the negative electrode 201 and the anode 202 by corrosion resistant porous type engineering plastic flitch every
From the anode 202 is connected with one end of the conductive copper rod, and the other end of the conductive copper rod is outstanding by conductive hanger 205
The metal and its alloy 5 of electropolishing are treated described in extension, the negative electrode 201 is annularly uniformly and symmetrically distributed in the carrier fluid cell body 1,
The negative electrode 201 is corrosion resistant graphite cake, and the power supply 203 is DC constant voltage constant-current supply, the DC constant voltage Constant Electric Current
The on-load voltage scope in source is 25V, current density range 1A/cm2, power source loads effect is 0.08%.
The fluid delivery system 3, for electrochemical polish liquid to be transported in the carrier fluid cell body 1, the fluid is defeated
System 3 is sent to include centrifugal pump 301 and fluid delivery tube 302, the outlet of the centrifugal pump 301 passes through the fluid delivery tube 302
Connected with the inner tank body 101, the caliber of the fluid delivery tube 302 is 30mm, the fluid delivery system 3 by it is described from
Heart pump 301 has a pressurization function, and trandfer fluid triggers fluid motion under pressurization, the fluid flow in the centrifugal pump 301
For 4m3/ h, power 5KW, the shear rate of flow of fluid is 5m/s.
As viewed in figures 5-8, mozzle 7 is vertically installed with the inner tank body 101, the mozzle 7 includes first end
701 and the second end 702, the first end 701 is set close to the top of the inner tank body 101, the first end 701 with
The fluid delivery tube 302 is connected, and the second end 702 is set close to the bottom of the inner tank body 101, the second end
702 be flat duckbilled mouth structure.
Continue as shown in figure 8, being provided with perforate 703, institute on tube wall of the mozzle 7 away from the second end 702
State perforate 703 to be vertically evenly distributed on tube wall, be specially uniformly arranged in a row along the vertical of tube wall.The second end
702 opening direction is identical with the opening direction of the perforate 703, and the inner tank body 101 is provided with the mozzle 7
Position circular arc tangential line direction it is parallel.The direction of arrow in Fig. 9 is the opening direction of the second end and the openings of perforate
To the straight line in Fig. 9 is the circular arc tangential line of inner tank body, there it can be seen that the opening direction of the second end and the opening of perforate
Direction is parallel with the direction of the circular arc tangential line.
Continue as illustrated in figs. 5-7, the bottom of the inner tank body 101 is provided with arcuate guide spoke 8, the guiding spoke 8
Initiating terminal set close to the second end 702, it is described be oriented to spoke 8 width be gradually reduced in the counterclockwise direction.This reality
Apply the polishing fluid counter-rotating for serving reverse guide effect, making in inner tank body of the guiding spoke in example.Arrow side in Fig. 7
To the direction of rotation of as polishing fluid.
Continue as shown in fig. 7, the mozzle 7 in the embodiment of the present invention is two, two mozzles 7 are radially symmetrical
It is distributed in the inner tank body 101, it is so-called symmetrical to refer to that two mozzles 7 are provided with the second end and perforate
That side is positioned opposite to each other, provides precondition for polishing fluid counter-rotating, the guiding spoke 8 is two, described in two
Spoke 8 is oriented to be arranged between two mozzles 7.
In the present embodiment, can be as follows with the principle of counter-rotating into the polishing fluid of inner tank body：The mozzle 7 and institute
State fluid delivery tube 302 to connect, electrochemical polish liquid can deliver into mozzle through fluid delivery tube, into the mozzle 7
Electrochemical polish liquid overflowed from the perforate 703 and the second end 702 after enter in the inner tank body 101, because of this reality
Apply in example has as above special set to the distribution arrangement of the opening direction of the second end, the opening direction of perforate and guiding spoke
Put, therefore the polishing fluid entered in inner tank body, can be in the counterclockwise direction described interior under the guiding of the guiding spoke 8
Rotating with Uniform in cell body 101.Such a rotation mode can make polishing fluid more uniform in inner tank body internal rotation, improve polishing effect
Fruit.In addition, the second end is arranged to flat duckbilled mouth structure by the present embodiment, it is because the pressure that polishing fluid overflows from the structure
It is larger, bigger power can be provided for polishing fluid counter-rotating.
The circulating cooling system 4, it is described to follow for controlling the temperature of the electrochemical polish liquid in the carrier fluid cell body 1
Ring cooling system 4 is arranged on the outside of the carrier fluid cell body 1, and it includes heater 401 and cooling device 402, wherein heating
It is logical comprising circulating heat exchange pump and heat exchanger, the heater 401 and the cooling device 402 inside device and cooling device
Valve transfer is crossed, is connected respectively with the cooling duct 103, the heat exchanger is dividing wall type heat exchanger, and the coolant is with heat
Convection type flows in the heat exchanger, and heat exchanger and heat exchanger tube material use Hastelloy, the rotation fortune of the coolant
Dynamic direction and the rotating operation after the electrochemical polish solution stirring in the carrier fluid cell body 1 are in opposite direction, the circulating cooling
System controls the temperature of the electrochemical polish liquid in the carrier fluid cell body 1 at 30 DEG C.
The electrochemical polish liquid is made up of corrosive agent and additive, and the corrosive agent is acetic acid, sulfamic acid and phosphoric acid,
The additive is polyethylene glycol and glycerine.
Present invention also offers a kind of method of metal and its alloy electrochemical polish, by said apparatus to metal and its
Alloy carries out electrochemical polish, and technical process is as follows：
The one of S1, the conductive copper rod being suspended on by conductive hanger 205 polished metal and its alloy 5 on carrier fluid cell body 1
End, the anode of the other end connection electrical parameter loading system of conductive copper rod；
S2, electrochemical polish liquid conveyed into mozzle 701 by pump 301 and fluid delivery tube 302, into the mozzle
Electrochemical polish liquid in 701 overflows from perforate 703 and the second end 702, and in the case where being oriented to the guiding of spoke 8, including reverse
The internal rotation of cell body 101, need to control fluid flow, power and shearing speed in centrifugal pump 301 in electrochemical polish liquid course of conveying
Rate；
S3, the DC constant voltage constant-current supply for connecting electrical parameter loading system, now, the metal and its alloy 5, electrical parameter for treating light add
The negative electrode and electrochemical polish liquid of loading system form a polishing system, and the metal and its alloy 5 for persistently treating light carry out electricity
Chemical polishing is handled；
S4, the circulating cooling system 4 being made up of circulating cooling pump and heat exchanger control the electrochemistry in the carrier fluid cell body 1
The temperature of polishing fluid is at 30 DEG C.
Metal and its alloy in the present embodiment can be titanium alloy, and Figure 14 is that titanium alloy fills through the polishing in the present embodiment
The SEM figures after being polished with polishing method are put, there it can be seen that the titanium alloy surface after polishing is smooth, impurity is less.
Embodiment 3
As Figure 1-Figure 4, the invention provides a kind of metal and its device of alloy electrochemical polish, including carrier fluid cell body 1,
Electrical parameter loading system 2, fluid delivery system 3 and circulating cooling system 4.
The carrier fluid cell body 1, for accommodating electrochemical polish liquid and polished metal and its alloy 5, the carrier fluid groove
Body 1 includes inner tank body 101 and outer tank body 102, and cooling duct 103 is formed between the inner tank body 101 and the outer tank body 102,
The inner tank body 101 connects with the fluid delivery system 3, and the cooling duct 103 connects with the circulating cooling system 4；
The conductor 204 is conductive copper rod, and the conductive copper rod is arranged on the top of the inner tank body 101, the week of the outer tank body 102
Enclose and be provided with reinforcement 6.The shape of the inner tank body 101 and the outer tank body 102 is circle, the inner tank body 101 and institute
Outer tank body 102 is stated to be processed into by corrosion resistant engineering plastic flitch, wherein, the inner tank body is porous type engineering plastic flitch.
The electrical parameter loading system 2, it is described for providing negative electrode 201, anode 202 and power supply 203 for electrochemical polish
Anode 202 connects the polished metal and its alloy 5 by conductor 204, and the electrical parameter loading system 2 includes anode
202nd, negative electrode 201 and power supply 203, the negative electrode 201 and the anode 202 by corrosion resistant porous type engineering plastic flitch every
From the anode 202 is connected with one end of the conductive copper rod, and the other end of the conductive copper rod is outstanding by conductive hanger 205
The metal and its alloy 5 of electropolishing are treated described in extension, the negative electrode 201 is annularly distributed in the carrier fluid cell body 1, the negative electrode
201 be corrosion resistant graphite cake, and the power supply 203 is DC constant voltage constant-current supply, the loading of the DC constant voltage constant-current supply
Voltage range is 45V, current density range 1.5A/cm2, power source loads effect is 0.09%.
The fluid delivery system 3, for electrochemical polish liquid to be transported in the carrier fluid cell body 1, the fluid is defeated
System 3 is sent to include centrifugal pump 301 and fluid delivery tube 302, the outlet of the centrifugal pump 301 passes through the fluid delivery tube 302
Connected with the inner tank body 101, the caliber of the fluid delivery tube 302 is 50mm, the fluid delivery system 3 by it is described from
Heart pump 301 has a pressurization function, and trandfer fluid triggers fluid motion under pressurization, the fluid flow in the centrifugal pump 301
For 8m3/ h, power 10KW, the shear rate of flow of fluid is 7.0m/s.
As viewed in figures 5-8, mozzle 7 is vertically installed with the inner tank body 101, the mozzle 7 includes first end
701 and the second end 702, the first end 701 is set close to the top of the inner tank body 101, the first end 701 with
The fluid delivery tube 302 is connected, and the second end 702 is set close to the bottom of the inner tank body 101, the second end
702 be flat duckbilled mouth structure.
Continue as shown in figure 8, being provided with perforate 703, institute on tube wall of the mozzle 7 away from the second end 702
State perforate 703 to be vertically evenly distributed on tube wall, be specially uniformly arranged in a row along the vertical of tube wall.The second end
702 opening direction is identical with the opening direction of the perforate 703, and the inner tank body 101 is provided with the mozzle 7
Position circular arc tangential line direction it is parallel.The direction of arrow in Fig. 9 is the opening direction of the second end and the openings of perforate
To the straight line in Fig. 9 is the circular arc tangential line of inner tank body, there it can be seen that the opening direction of the second end and the opening of perforate
Direction is parallel with the direction of the circular arc tangential line.
Continue as illustrated in figs. 5-7, the bottom of the inner tank body 101 is provided with arcuate guide spoke 8, the guiding spoke 8
Initiating terminal set close to the second end 702, it is described be oriented to spoke 8 width be gradually reduced in the counterclockwise direction.This reality
Apply the polishing fluid counter-rotating for serving reverse guide effect, making in inner tank body of the guiding spoke in example.Arrow side in Fig. 7
To the direction of rotation of as polishing fluid.
Continue as shown in fig. 7, the mozzle 7 in the embodiment of the present invention is two, two mozzles 7 are radially symmetrical
It is distributed in the inner tank body 101, it is so-called symmetrical to refer to that two mozzles 7 are provided with the second end and perforate
That side is positioned opposite to each other, provides precondition for polishing fluid counter-rotating, the guiding spoke 8 is two, described in two
Spoke 8 is oriented to be arranged between two mozzles 7.
In the present embodiment, can be as follows with the principle of counter-rotating into the polishing fluid of inner tank body：The mozzle 7 and institute
State fluid delivery tube 302 to connect, electrochemical polish liquid can deliver into mozzle through fluid delivery tube, into the mozzle 7
Electrochemical polish liquid overflowed from the perforate 703 and the second end 702 after enter in the inner tank body 101, because of this reality
Apply in example has as above special set to the distribution arrangement of the opening direction of the second end, the opening direction of perforate and guiding spoke
Put, therefore the polishing fluid entered in inner tank body, can be in the counterclockwise direction described interior under the guiding of the guiding spoke 8
Rotating with Uniform in cell body 101.Such a rotation mode can make polishing fluid more uniform in inner tank body internal rotation, improve polishing effect
Fruit.In addition, the second end is arranged to flat duckbilled mouth structure by the present embodiment, it is because the pressure that polishing fluid overflows from the structure
It is larger, bigger power can be provided for polishing fluid counter-rotating.
The circulating cooling system 4, it is described to follow for controlling the temperature of the electrochemical polish liquid in the carrier fluid cell body 1
Ring cooling system 4 is arranged on the outside of the carrier fluid cell body 1, and it includes heater 401 and cooling device 402, wherein heating
It is logical comprising circulating heat exchange pump and heat exchanger, the heater 401 and the cooling device 402 inside device and cooling device
Valve transfer is crossed, is connected respectively with the cooling duct 103, the heat exchanger is dividing wall type heat exchanger, and the coolant is with heat
Convection type flows in the heat exchanger, and heat exchanger and heat exchanger tube material use Hastelloy, the rotation fortune of the coolant
Dynamic direction and the rotating operation after the electrochemical polish solution stirring in the carrier fluid cell body 1 are in opposite direction, the circulating cooling
System controls the temperature of the electrochemical polish liquid in the carrier fluid cell body 1 at 40 DEG C.
The electrochemical polish liquid is made up of corrosive agent and additive, and the corrosive agent is perchloric acid, acetic acid and phosphoric acid, institute
It is polyvinyl alcohol, glycerine and saccharin to state additive.
Present invention also offers a kind of method of metal and its alloy electrochemical polish, by said apparatus to metal and its
Alloy carries out electrochemical polish, and technical process is as follows：
The one of S1, the conductive copper rod being suspended on by conductive hanger 205 polished metal and its alloy 5 on carrier fluid cell body 1
End, the anode of the other end connection electrical parameter loading system of conductive copper rod；
S2, electrochemical polish liquid conveyed into mozzle 701 by pump 301 and fluid delivery tube 302, into the mozzle
Electrochemical polish liquid in 701 overflows from perforate 703 and the second end 702, and in the case where being oriented to the guiding of spoke 8, including reverse
The internal rotation of cell body 101, need to control fluid flow, power and shearing speed in centrifugal pump 301 in electrochemical polish liquid course of conveying
Rate；
S3, the DC constant voltage constant-current supply for connecting electrical parameter loading system, now, the metal and its alloy 5, electrical parameter for treating light add
The negative electrode and electrochemical polish liquid of loading system form a polishing system, and the metal and its alloy 5 for persistently treating light carry out electricity
Chemical polishing is handled；
S4, the circulating cooling system 4 being made up of circulating cooling pump and heat exchanger control the electrochemistry in the carrier fluid cell body 1
The temperature of polishing fluid is at 40 DEG C.
The metal of the present invention and its device and method of alloy electrochemical polish, have the advantages that：
1st, it is of the invention that polishing fluid and polished part are accommodated by carrier fluid cell body, by fluid delivery system into carrier fluid cell body
Polishing fluid is conveyed, polish temperature is controlled by circulating cooling system, and electrochemical polish mistake is controlled by electrical parameter loading system
Journey, the present invention are easily achieved bulk production by said structure, reduce the labor intensity that tradition machinery polishing polishes step by step, add
Work cost is low, there is provided processing efficiency.
2nd, fluid delivery system of the invention includes centrifugal pump and fluid delivery tube, by match flow in centrifugal pump and
The caliber of delivery pipe, the shearing flow velocity of fluid is controlled, realize good electropolishing effect.
3rd, the coolant in circulating cooling system of the invention is flowed with thermal convection in the heat exchanger, coolant
Rotary motion direction with state the electrochemical polish solution in carrier fluid cell body stirring after rotating operation it is in opposite direction, effectively control
The temperature of electrochemical polish.
4th, using the device and method of the present invention, it is possible to achieve the uniformity of different batches of product and reproducible, effectively
Avoid poor traditional polishing mode product different parts uniformity and the repeatability of special-shaped product appearance and reappearance is bad
Problem.
Above disclosed is only several preferred embodiments of the present invention, can not limit the present invention's with this certainly
Interest field, therefore the equivalent variations made according to the claims in the present invention, still belong to the scope that the present invention is covered.
Claims (16)
1. the device of a kind of metal and its alloy electrochemical polish, it is characterised in that including carrier fluid cell body（1）, electrical parameter loading
System（2）, fluid delivery system（3）And circulating cooling system（4）；
The carrier fluid cell body（1）, for accommodating electrochemical polish liquid and polished metal and its alloy（5）；
The electrical parameter loading system（2）, for providing negative electrode for electrochemical polish（201）, anode（202）And power supply（203）,
The anode（202）Pass through conductor（204）Connect the polished metal and its alloy（5）；
The fluid delivery system（3）, for electrochemical polish liquid to be transported into the carrier fluid cell body（1）It is interior；
The circulating cooling system（4）, for controlling the carrier fluid cell body（1）The temperature of interior electrochemical polish liquid.
2. the device of metal according to claim 1 and its alloy electrochemical polish, it is characterised in that the carrier fluid cell body
（1）Including inner tank body（101）And outer tank body（102）, the inner tank body（101）With the outer tank body（102）Between formed cooling
Passage（103）, the inner tank body（101）With the fluid delivery system（3）Connection, the cooling duct（103）Followed with described
Ring cooling system（4）Connection；The conductor（204）For conductive copper rod, the conductive copper rod is arranged on the inner tank body（101）'s
Top, the outer tank body（102）Around be provided with reinforcement（6）.
3. the device of metal according to claim 2 and its alloy electrochemical polish, it is characterised in that the inner tank body
（101）With the outer tank body（102）Shape be circle, the inner tank body（101）With the outer tank body（102）By engineering
Plastic plate is processed into, wherein, the inner tank body（101）It is processed into by porous type engineering plastic flitch.
4. the device of metal according to claim 3 and its alloy electrochemical polish, it is characterised in that the electrical parameter adds
Loading system（2）Including anode（202）, negative electrode（201）And power supply（203）, the negative electrode（201）With the anode（202）Pass through
Porous type engineering plastic flitch is isolated；
The anode（202）It is connected with one end of the conductive copper rod, the other end of the conductive copper rod passes through conductive hanger
（205）Hang the polished metal and its alloy（5）；
The negative electrode（201）Annularly it is uniformly and symmetrically distributed in the carrier fluid cell body（1）In, the negative electrode（201）For POROUS TITANIUM
Plate or graphite cake；
The power supply（203）For DC constant voltage constant-current supply, the on-load voltage scope of the DC constant voltage constant-current supply is 5-
45V, current density range 0.1-1.5A/cm2, power source loads effect≤0.1%.
5. the device of metal according to claim 2 and its alloy electrochemical polish, it is characterised in that the fluid conveying
System（3）Including centrifugal pump（301）And fluid delivery tube（302）, the centrifugal pump（301）Outlet conveyed by the fluid
Pipe（302）With the inner tank body（101）Connection, the fluid delivery tube（302）Caliber be 10-50mm.
6. the device of metal according to claim 5 and its alloy electrochemical polish, it is characterised in that the inner tank body
（101）Inside it is vertically installed with mozzle（7）, the mozzle（7）Including first end（701）And the second end（702）, it is described
First end（701）Close to the inner tank body（101）Top set, the first end（701）With the fluid delivery tube
（302）Connection, the second end（702）Close to the inner tank body（101）Bottom set, the second end（702）For
Flat duckbilled mouth structure.
7. the device of metal according to claim 6 and its alloy electrochemical polish, it is characterised in that the mozzle
（7）Away from the second end（702）Tube wall on be provided with perforate（703）, the perforate（703）Along the vertical uniform of tube wall
It is arranged in a row, the second end（702）Opening direction and the perforate（703）Opening direction it is identical, and with it is described
Inner tank body（101）It is provided with the mozzle（7）Position circular arc tangential line direction it is parallel.
8. the device of metal according to claim 7 and its alloy electrochemical polish, it is characterised in that the inner tank body
（101）Bottom be provided with arcuate guide spoke（8）, the guiding spoke（8）Initiating terminal close to the second end（702）
Set, the guiding spoke（8）Width be gradually reduced in the counterclockwise direction.
9. the device of metal according to claim 8 and its alloy electrochemical polish, it is characterised in that enter the water conservancy diversion
Pipe（7）Electrochemical polish liquid from the perforate（703）With the second end（702）Enter the inner tank body after spilling
（101）In, and in the guiding spoke（8）Guiding under, in the counterclockwise direction in the inner tank body（101）Internal rotation.
10. the device of metal according to claim 9 and its alloy electrochemical polish, it is characterised in that the mozzle
（7）For two, two mozzles（7）Radially it is symmetrically distributed in the inner tank body（101）In.
11. the device of metal according to claim 10 and its alloy electrochemical polish, it is characterised in that the guiding spoke
Bar（8）For two, two guiding spokes（8）It is arranged on two mozzles（7）Between.
12. the device of metal according to claim 5 and its alloy electrochemical polish, it is characterised in that the fluid is defeated
Send system（3）Pass through the centrifugal pump（301）Trandfer fluid triggers fluid motion, the centrifugal pump（301）Interior fluid flow
For 1-8m3/ h, power 1-10KW, when electropolishing acts on, the shear rate of flow of fluid is 3.0-7.0m/s.
13. the device of metal according to claim 1 and its alloy electrochemical polish, it is characterised in that the circulation is cold
But system（4）It is arranged on the carrier fluid cell body（1）Outside, it includes heater（401）And cooling device（402）, it is described
Heater（401）With the cooling device（402）By valve transfer, respectively with the cooling duct（103）Connection.
14. the device of metal according to claim 7 and its alloy electrochemical polish, it is characterised in that the circulation is cold
But system controls the carrier fluid cell body（1）The temperature of interior electrochemical polish liquid is at 15-40 DEG C.
15. the device of metal according to claim 8 and its alloy electrochemical polish, it is characterised in that the electrochemistry
Polishing fluid is made up of corrosive agent and additive, and the corrosive agent is one kind in perchloric acid, oxalic acid, acetic acid, sulfamic acid, phosphoric acid
Or it is a variety of, the additive is the one or more in urea, polyethylene glycol, polyvinyl alcohol, glycerine, saccharin.
16. a kind of method of metal and its alloy electrochemical polish, it is characterised in that using any one in such as claim 1-15
Device described in carries out electrochemical polishing treatment to metal and its alloy.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108286067A (en) * | 2018-02-05 | 2018-07-17 | 苏州新材料研究所有限公司 | A kind of electrochemical polish cooling-cycle device and its application |
| CN109211648A (en) * | 2018-10-22 | 2019-01-15 | 有研工程技术研究院有限公司 | A kind of preparation method of alumina dispersion-strenghtened copper microstructure of the alloy sample |
| CN109666935A (en) * | 2019-02-20 | 2019-04-23 | 东莞市金林自动化机械科技有限公司 | A kind of plasma electric slurry polishing salt and preparation method thereof for silver |
| CN111455446A (en) * | 2020-03-25 | 2020-07-28 | 贵州大学 | Method and system for electropolishing surface of metal cylindrical sample |
| CN111575781A (en) * | 2020-05-25 | 2020-08-25 | 太原理工大学 | Metal material electrolytic polishing device and method |
| CN111748840A (en) * | 2020-07-10 | 2020-10-09 | 四川中雅科技有限公司 | Electrode foil and electrochemical polishing device and method for metallographic phase of electrode foil |
| CN111929337A (en) * | 2020-06-17 | 2020-11-13 | 宁波锦越新材料有限公司 | EBSD sample preparation method of Al-Zn-Mg-Cu alloy and EBSD sample |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6315885B1 (en) * | 1999-09-07 | 2001-11-13 | National Science Council | Method and apparatus for electropolishing aided by ultrasonic energy means |
| CN201581150U (en) * | 2009-11-17 | 2010-09-15 | 东南大学 | Electrolytic polishing device of metallic phase sample used in laboratory |
| CN202572021U (en) * | 2012-03-30 | 2012-12-05 | 河北省安装工程公司 | Electrochemical and mechanical compound polishing device |
| CN204298503U (en) * | 2014-12-04 | 2015-04-29 | 朱晓飞 | For the electrochemical polish apparatus of metal substrate |
| CN105714367A (en) * | 2016-04-27 | 2016-06-29 | 上海纽脉医疗科技有限公司 | Electrolytic polishing device |
-
2017
- 2017-08-21 CN CN201710717016.8A patent/CN107460533B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6315885B1 (en) * | 1999-09-07 | 2001-11-13 | National Science Council | Method and apparatus for electropolishing aided by ultrasonic energy means |
| CN201581150U (en) * | 2009-11-17 | 2010-09-15 | 东南大学 | Electrolytic polishing device of metallic phase sample used in laboratory |
| CN202572021U (en) * | 2012-03-30 | 2012-12-05 | 河北省安装工程公司 | Electrochemical and mechanical compound polishing device |
| CN204298503U (en) * | 2014-12-04 | 2015-04-29 | 朱晓飞 | For the electrochemical polish apparatus of metal substrate |
| CN105714367A (en) * | 2016-04-27 | 2016-06-29 | 上海纽脉医疗科技有限公司 | Electrolytic polishing device |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108286067A (en) * | 2018-02-05 | 2018-07-17 | 苏州新材料研究所有限公司 | A kind of electrochemical polish cooling-cycle device and its application |
| CN109211648A (en) * | 2018-10-22 | 2019-01-15 | 有研工程技术研究院有限公司 | A kind of preparation method of alumina dispersion-strenghtened copper microstructure of the alloy sample |
| CN109666935A (en) * | 2019-02-20 | 2019-04-23 | 东莞市金林自动化机械科技有限公司 | A kind of plasma electric slurry polishing salt and preparation method thereof for silver |
| CN111455446A (en) * | 2020-03-25 | 2020-07-28 | 贵州大学 | Method and system for electropolishing surface of metal cylindrical sample |
| CN111455446B (en) * | 2020-03-25 | 2022-07-01 | 贵州大学 | Method and system for electropolishing surface of metal cylindrical sample |
| CN111575781A (en) * | 2020-05-25 | 2020-08-25 | 太原理工大学 | Metal material electrolytic polishing device and method |
| CN111929337A (en) * | 2020-06-17 | 2020-11-13 | 宁波锦越新材料有限公司 | EBSD sample preparation method of Al-Zn-Mg-Cu alloy and EBSD sample |
| CN111748840A (en) * | 2020-07-10 | 2020-10-09 | 四川中雅科技有限公司 | Electrode foil and electrochemical polishing device and method for metallographic phase of electrode foil |
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|---|---|
| CN107460533B (en) | 2019-11-12 |
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