CN107340626A - Black matrix structure and preparation method thereof, colored filter and display panel - Google Patents
Black matrix structure and preparation method thereof, colored filter and display panel Download PDFInfo
- Publication number
- CN107340626A CN107340626A CN201710706487.9A CN201710706487A CN107340626A CN 107340626 A CN107340626 A CN 107340626A CN 201710706487 A CN201710706487 A CN 201710706487A CN 107340626 A CN107340626 A CN 107340626A
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- China
- Prior art keywords
- black matrix
- substrate
- matrix structure
- display panel
- photoresistance
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Abstract
The present invention relates to display field, discloses a kind of black matrix structure and preparation method thereof, colored filter and display panel.The black matrix structure includes the one or more black matrix"s of substrate and formation on the substrate, wherein the surface that each black matrix" in one or more of black matrix"s is in contact with the substrate is the surface of out-of-flatness.In black matrix area diffusing reflection occurs for the light of its display panel that can to include the black matrix structure from front directive, so as to improve the contrast of the image shown by display panel.
Description
Technical field
The present invention relates to display field, in particular it relates to a kind of black matrix structure and preparation method thereof, colored filter
And display panel.
Background technology
With the development of Display Technique, high-contrast, the display panel of fine definition are increasingly by the happiness of consumers
Love.Colored filter is one of important feature in display panel, and black matrix" is the important component of colored filter.Its
In, black matrix" can increase the contrast of display picture, prevent colour mixture.
Present inventor find, at present in the manufacture craft of colored filter, complete make black matrix" with it is smooth
Glass substrate directly contact, the contact surface is in colored filter and TFT (Thin Film Transistor, thin film transistor (TFT))
Module group assembling can be towards user after turning into display panel.After the external world has light to be radiated at display panel, the contact surface can occur
To the mirror-reflection of incident ray, reflected light, which is incident to eyes of user, will reduce the viewing experience of user, especially, show
The reflected light is particularly evident when black, and this reduces the contrast of display panel lock display image to a certain extent.
The content of the invention
It is an object of the invention to provide a kind of black matrix structure and preparation method thereof, colored filter and display panel,
For solving above-mentioned technical problem or at least partly solving above-mentioned technical problem.
To achieve these goals, the embodiment of the present invention provides a kind of black matrix structure, the black matrix structure bag
The one or more black matrix"s of substrate and formation on the substrate are included, wherein every in one or more of black matrix"s
The surface that one black matrix" is in contact with the substrate is the surface of out-of-flatness.
Alternatively, the surface that each black matrix" in one or more of black matrix"s is in contact with the substrate
It is raised.
Alternatively, formed with one or more grooves on the substrate, shape corresponding to one or more of black matrix"s
Into one or more of grooves in the substrate.
Alternatively, the arrangement in one or more of black matrix" cycles is on the substrate.
Alternatively, the substrate is glass substrate.
Correspondingly, the embodiment of the present invention also provides a kind of colored filter, and the colored filter includes：Above-mentioned black square
Battle array structure；And color layer, the color layer are formed in the same side of the substrate with one or more of black matrix"s, and
The color layer is formed at non-black matrix area on the substrate.
Correspondingly, the embodiment of the present invention also provides a kind of display panel, and the display panel includes above-mentioned colored filter.
Correspondingly, the embodiment of the present invention also provides a kind of preparation method of black matrix structure, and this method includes：In substrate
Non-black matrix area at be coated to form photoresistance figure；Substrate formed with the photoresistance image is performed etching with
One or more grooves are formed in the black matrix area of the substrate；By the photoresistance figure from the strippable substrate；And
Black matrix" is formed in each groove of one or more of grooves of the substrate, wherein the black square formed
The surface that battle array is in contact with the substrate is raised.
Alternatively, the substrate is glass substrate.
Alternatively, it is described the substrate formed with the photoresistance image is performed etching including：Using hydrofluoric acid to formed with
The substrate of the photoresistance image performs etching.
Pass through above-mentioned technical proposal, the surface that black matrix area is in contact with substrate is arranged to the surface of out-of-flatness,
So that in black matrix area diffusing reflection occurs for the light that the display panel of the black matrix structure is included from front directive,
Improve the contrast of the image shown by display panel.
Brief description of the drawings
Accompanying drawing is that the embodiment of the present invention is further understood for providing, and a part for constitution instruction, with
The embodiment in face is used to explain the embodiment of the present invention together, but does not form the limitation to the embodiment of the present invention.Attached
In figure：
Fig. 1 shows the schematic diagram for the black matrix structure that one embodiment of the invention provides；
Fig. 2 shows that the schematic diagram of mirror-reflection occurs for black matrix structure of the prior art；
Fig. 3 shows that irreflexive schematic diagram occurs for black matrix structure provided in an embodiment of the present invention；
Fig. 4 shows the partial schematic diagram of the structure for the colored filter that one embodiment of the invention provides；
Fig. 5 shows the schematic flow sheet of the preparation method for the black matrix structure that one embodiment of the invention provides；
Fig. 6 shows the schematic diagram for making the photoresistance figure formed during black matrix structure；And
Fig. 7 shows the schematic cross-section in the AA ' directions along Fig. 6.
Description of reference numerals
100 substrates 401,403 black matrix"s
The color layer of 101 glass substrate 301,302,303
The groove of 200 photoresistance figure 402
Embodiment
The embodiment of the present invention is described in detail below in conjunction with accompanying drawing.It should be appreciated that this place is retouched
The embodiment stated is merely to illustrate and explain the present invention, and is not intended to limit the invention.
Fig. 1 shows the schematic diagram for the black matrix structure that one embodiment of the invention provides.As shown in figure 1, the present invention one
Embodiment provides a kind of black matrix structure, and the black matrix structure can include substrate 100 and be formed on the substrate 100
One or more black matrix"s 401, wherein each black matrix" 401 in one or more of black matrix"s 401 with
The surface that the substrate 100 is in contact is the surface of out-of-flatness, and the surface of the out-of-flatness can cause light to be incident to black
During the contact surface of matrix 401 and substrate, diffusing reflection occurs.So that when forming display panel by the black matrix structure, from
In black matrix area diffusing reflection occurs for the reflected light that front is incident to display panel, improves the picture shown by display panel
Contrast.
Alternatively, black matrix" 401 can be with the arrangement in cycle on the substrate 100.
With further reference to Fig. 1, in one embodiment, the surface that each black matrix" 401 is in contact with substrate 100 can be with
It is raised.In this embodiment, in order that be formed on the substrate 100 black matrix" 401 with the substrate 100
The surface being in contact is raised, corresponding on the substrate 100 can form one or more grooves, recessed in the one or more
The region of each groove in groove carries out light blockage coating and is obtained with black matrix" 401, the black matrix" can cause into
Diffusing reflection occurs for the light for penetrating the contact surface in black matrix" and substrate.
Wherein it is possible to the black matrix" forming region on substrate 100 is carried out using the chemical liquid of hydrofluoric acid etc.
To form the groove, the contents of the section will hereinafter describe in detail etching.
Alternatively, substrate 100 can be glass substrate, but the embodiment of the present invention is not restricted to this.
Black matrix structure of the prior art and black matrix structure provided in an embodiment of the present invention will hereafter be carried out
Comparative descriptions.
Fig. 2 shows that the schematic diagram of mirror-reflection occurs for black matrix structure of the prior art, and Fig. 3 shows the present invention
Irreflexive schematic diagram occurs for the black matrix structure that embodiment provides.Base used in Fig. 2 and Fig. 3 illustrated embodiment
Plate is glass basic 101.
As shown in Fig. 2 in black matrix structure of the prior art, the contact surface of black matrix" 403 and glass substrate 101
It is smooth.For display panel comprising the black matrix structure after assembling, extraneous light can be from the side of glass substrate 101
Inject.The color layer formed on glass substrate 101 is formed by the photoresist with certain transmitance, therefore, is injected
Reflected light of the extraneous light in color layer region it is very weak.Because the material for making black matrix" 403 is that have extremely low transmitance
Photoresist, therefore it is anti-on smooth contact surface of the black matrix" 403 with glass substrate 101 more minute surface to occur
Penetrate, will greatly reduce visual experience when the reflection light of mirror-reflection enters human eye, influence the contrast of display picture.
As shown in figure 3, Fig. 3 is the partial enlarged drawing of black matrix" 401 shown in Fig. 1, for displaying, the present invention is implemented
It is being provided in example that picture display effect is carried with glass substrate 101 has the black matrix" 401 of out-of-flatness contact surface structure
Rise.Equally when extraneous light incides the base surface of black matrix" and glass substrate, because black matrix" 401 is produced on groove
On, it can make incident ray that diffusing reflection occur, in this way, reflection because of the concaveconvex structure that glass etching is formed in itself plus groove
Light will not concentrate injection human eye in one direction, thus can substantially increase the contrast of display picture, while be lifted aobvious
Show effect.
Fig. 4 shows the partial schematic diagram of the structure for the colored filter that one embodiment of the invention provides.As shown in figure 4,
The embodiment of the present invention also provides a kind of colored filter, and the colored filter can include：Above-mentioned black matrix structure；And
Color layer, the color layer and one or more of black matrix"s 401 are formed in the same side of the substrate 100, and described
Color layer is formed at the non-black matrix area on the substrate 100.The color layer can include：Red pixel composition
The color layer 303 of color layer 301, the color layer 302 of green pixel composition and blue pixel composition.
Alternatively, the color layer can be made up of the photoresist with certain transmitance, to cause extraneous light to exist
Color layer region produces weaker reflected light.
Further, colored filter can also include protective layer, ITO conducting films etc..By using the embodiment of the present invention
The black matrix structure of offer.
Colored filter provided in an embodiment of the present invention and TFT module group assemblings can improve display surface into after display panel
The contrast of the display picture of plate.
Fig. 5 shows the schematic flow sheet of the preparation method for the black matrix structure that one embodiment of the invention provides.Such as Fig. 5
Shown, the embodiment of the present invention also provides a kind of preparation method of black matrix structure, and this method can include：Step S51, in base
It is coated at the non-black matrix area of plate to form photoresistance figure；Step S52, to the substrate formed with the photoresistance image
Perform etching and one or more grooves are formed with the black matrix area in the substrate；Step S53, by the photoresistance figure from
The strippable substrate；And step S54, form black in each groove of one or more of grooves of the substrate
Matrix, wherein the black matrix" formed is raised with the surface that the substrate is in contact.The black matrix" knot formed
When structure can cause incident light beam strikes to the base surface of black matrix" and substrate, diffusing reflection occurs.So as to by the black square
During battle array structure composition display panel, in black matrix area diffusing reflection occurs for the reflected light that display panel is incident to from front, carries
The contrast of picture shown by high display panel.
Wherein, the substrate preferably can be glass substrate, but the embodiment of the present invention is not restricted to this.
Fig. 6 shows the schematic diagram for making the photoresistance figure 200 formed during black matrix structure.It is as shown in fig. 7, optional
Ground, photoresistance figure 200 can be formed on the glass substrate by way of developing and exposing, photoresistance figure 200 with black matrix"
Open area there is onesize and position, that is to say, that photoresistance figure 200 is equivalent to non-on similar shape cover glass substrate
Black matrix area.Before being performed etching to glass substrate, be coated at the non-black matrix area of glass substrate with
The effect for forming photoresistance figure is that non-black matrix area is protected, to prevent the non-black matrix area of glass substantially
It is etched.Non-black matrix area refers to that substrate surface (forms the table of the side of black matrix" on substrate in the embodiment of the present invention
Face) on need not make the region of black matrix".
Fig. 7 shows the schematic cross-section in the AA ' directions along Fig. 6.After photoresistance figure is formed, can utilize to lose
Carved glass substrate but do not influence the decoction of photoresistance figure 200 chemical property itself to the glass base formed with photoresistance image 200
Plate is performed etching, and one or more grooves 402 are formed with the black matrix area in the glass substrate.The wherein black of substrate
Matrix area refers to need the region for making black matrix" on substrate.It is alternatively possible to using hydrofluoric acid etc. come to glass substrate
It is etched.
Formed after groove 402, photoresistance figure 200 can be peeled off from the glass substrate, it is alternatively possible to use
Photoresistance stripper peels off the photoresistance figure 200 from the glass substrate, but the embodiment of the present invention is not restricted to this.
, can be by being coated with, developing, the conventional manufacturing process such as exposing, in groove after photoresistance figure 200 is peeled off
The making of black matrix" is completed in 402 regions, makes incident ray that irreflexive black matrix structure occur so as to obtain, so as to by
During the black matrix structure composition display panel, the reflected light that display panel is incident to from front occurs in black matrix area
Diffusing reflection, improve the contrast of the picture shown by display panel.
The optional embodiment of example of the present invention, still, the embodiment of the present invention and unlimited are described in detail above in association with accompanying drawing
Detail in above-mentioned embodiment, can be to the embodiment of the present invention in the range of the technology design of the embodiment of the present invention
Technical scheme carry out a variety of simple variants, these simple variants belong to the protection domain of the embodiment of the present invention.
It is further to note that each particular technique feature described in above-mentioned embodiment, in not lance
In the case of shield, it can be combined by any suitable means.In order to avoid unnecessary repetition, the embodiment of the present invention pair
Various combinations of possible ways no longer separately illustrate.
In addition, it can also be combined between a variety of embodiments of the embodiment of the present invention, as long as it is not
The thought of the embodiment of the present invention is run counter to, it should equally be considered as disclosure of that of the embodiment of the present invention.
Claims (10)
1. a kind of black matrix structure, it is characterised in that the black matrix structure includes substrate and formed on the substrate
One or more black matrix"s,
The surface that each black matrix" in wherein one or more of black matrix"s is in contact with the substrate is injustice
Whole surface.
2. black matrix structure according to claim 1, it is characterised in that every in one or more of black matrix"s
One black matrix" is raised with the surface that the substrate is in contact.
3. black matrix structure according to claim 2, it is characterised in that formed with one or more recessed on the substrate
Groove, one or more of grooves of the formation in the substrate corresponding to one or more of black matrix"s.
4. black matrix structure according to claim 1, it is characterised in that one or more of black matrix" cycles
Arrangement is on the substrate.
5. black matrix structure according to claim 1, it is characterised in that the substrate is glass substrate.
6. a kind of colored filter, it is characterised in that the colored filter includes：
Black matrix structure in claim 1 to 5 described in any one claim；And
Color layer, the color layer are formed in the same side of the substrate, and the coloured silk with one or more of black matrix"s
Chromatograph is formed at non-black matrix area on the substrate.
7. a kind of display panel, it is characterised in that the display panel includes colored filter according to claim 6.
8. a kind of preparation method of black matrix structure, it is characterised in that this method includes：
It is coated at the non-black matrix area of substrate to form photoresistance figure；
Substrate formed with the photoresistance image is performed etching to form one or more in the black matrix area of the substrate
Individual groove；
By the photoresistance figure from the strippable substrate；And
Black matrix" is formed in each groove of one or more of grooves of the substrate, wherein what is formed is described black
Colour moment battle array is raised with the surface that the substrate is in contact.
9. according to the method for claim 8, it is characterised in that the substrate is glass substrate.
10. according to the method for claim 8, it is characterised in that described that the substrate formed with the photoresistance image is carried out
Etching includes：
The substrate formed with the photoresistance image is performed etching using hydrofluoric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710706487.9A CN107340626A (en) | 2017-08-17 | 2017-08-17 | Black matrix structure and preparation method thereof, colored filter and display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710706487.9A CN107340626A (en) | 2017-08-17 | 2017-08-17 | Black matrix structure and preparation method thereof, colored filter and display panel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107340626A true CN107340626A (en) | 2017-11-10 |
Family
ID=60214526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710706487.9A Pending CN107340626A (en) | 2017-08-17 | 2017-08-17 | Black matrix structure and preparation method thereof, colored filter and display panel |
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Cited By (6)
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| CN110231730A (en) * | 2019-05-14 | 2019-09-13 | 深圳市华星光电技术有限公司 | The preparation method and color membrane substrates of color membrane substrates |
| CN110246872A (en) * | 2019-04-26 | 2019-09-17 | 昆山工研院新型平板显示技术中心有限公司 | Display panel and display device |
| CN110456556A (en) * | 2019-08-27 | 2019-11-15 | 厦门天马微电子有限公司 | A kind of color membrane substrates and display panel |
| CN110543847A (en) * | 2019-08-29 | 2019-12-06 | 维沃移动通信有限公司 | Display module and electronic equipment |
| WO2020042240A1 (en) * | 2018-08-30 | 2020-03-05 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal display device |
| WO2022000798A1 (en) * | 2020-06-28 | 2022-01-06 | 武汉华星光电技术有限公司 | Display device and preparation method therefor |
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| CN110543847A (en) * | 2019-08-29 | 2019-12-06 | 维沃移动通信有限公司 | Display module and electronic equipment |
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