CN107324650A - One kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali - Google Patents
One kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali Download PDFInfo
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- CN107324650A CN107324650A CN201710446011.6A CN201710446011A CN107324650A CN 107324650 A CN107324650 A CN 107324650A CN 201710446011 A CN201710446011 A CN 201710446011A CN 107324650 A CN107324650 A CN 107324650A
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- Prior art keywords
- glass
- oxide
- amoled
- aluminium
- thermal stability
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Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/004—Refining agents
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
It is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali the invention discloses one kind, it is made up of the component of following percentage by weight:Silica 45.2 48.6, aluminum oxide 10.5 13.5, boron oxide 2.4 3.5, magnesia 2.8 5.4, calcium oxide 3.2 4.9, zirconium dioxide 1.6 3.1, barium monoxide 1.5 4.7, tin oxide 2.2 3.3, cerium oxide 1.5 2.4, neodymia 2.0 2.5, lanthana 1.2 1.5, strontium carbonate 0.01 0.08.The base plate glass composition material of the present invention forms tough and tensile glass by melting, network structure is formed in glass by means of silica, and glass is generated tough and tensile surface by means of alundum (Al2O3), and then increase glass heat resistance and devitrification resistance, reduce glass swelling rate, the viscosity and the coefficient of expansion of glass are reduced by means of magnesia in addition, and increase the chemical resistance and devitrification resistance of glass by barium monoxide, solve existing AMOLED not enough with base plate glass intensity and hardness, replace PbO by tin oxide simultaneously, the compositions such as As2O3 or Sb2O3, and then the existing AMOLED of solution does not meet environmental protection standard with base plate glass, the problem of causing to reclaim difficulty and can not recycle.
Description
Technical field
The present invention relates to AMOLED technical fields, and in particular to one kind is used for AMOLED high thermal stability alkali-free boron manosil ASs
Salt glass.
Background technology
The manufacture of AMLCD is extremely complex, and the property of base plate glass is particularly important.It is of prime importance that being used for
The glass substrate of production AMOLED devices must strictly control its physical size.Glass substrate must have following characteristic:Contain
There is alkali metal oxide to be less than l000ppm;Has chemical resistance;Thermal coefficient of expansion must be close with the silicon of thin film transistor (TFT);Improve glass
Glass strain point, to reduce thermal shrinking quantity.
AMOLED glass substrate is according to the technical standard of liquid crystal display, it is necessary to possess following basic physics special
Property:1st, the thermal coefficient of expansion of glass substrate must be enough low, not higher than 40 × 10-7/ DEG C;2nd, the strain point temperature of glass substrate should
Higher than 640 DEG C;3rd, density is less than 2.6g/cm3, and more light better.
In order to obtain still alkali-free glass, using fining gases, produced when expelling glass reaction from glass melts
Gas, in addition when homogenizing fusing, it is necessary to reuse the fining gases of generation, increase alveolar layer footpath makes it float, thus taken
Go out the small bubble of participation.
But, the alkali-free glass as liquid crystal display glass substrate, the viscosity of glass melts is high, with containing alkali composition
Glass compare, need to be melted with higher temperature.In such a alkali-free glass substrate, generally cause glass in 1300-1500 degree
Change reaction, more than 1500 degree at a high temperature of deaeration, homogenize.Therefore, in fining agent, widely using can be in 1300-
1700 degree of temperature range produces the As2O3 of fining gases.But, As2O3 toxicity is very strong, glass manufacturing process or
During the processing of cullet, it is possible to the problem of polluting environment and bring health, it uses and is restricted.
The content of the invention
The present invention is intended to provide a kind of be used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali.
The present invention provides following technical scheme:
One kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali, and it is by the component of following percentage by weight
Composition:Silica 45.2-48.6, aluminum oxide 10.5-13.5, boron oxide 2.4-3.5, magnesia 2.8-5.4, calcium oxide 3.2-
4.9th, zirconium dioxide 1.6-3.1, barium monoxide 1.5-4.7, tin oxide 2.2-3.3, cerium oxide 1.5-2.4, neodymia 2.0-2.5,
Lanthana 1.2-1.5, strontium carbonate 0.01-0.08.
The various material composition purity are higher than 99%.
The specific modulus of the glass is more than 30GPa cm3/gm.
The glass also includes chemical fining agent, and the fining agent is the arsenic oxide arsenoxide and 0.8-1.2% by 0.5-0.9%
Antimony oxide is constituted.
Compared with prior art, the beneficial effects of the invention are as follows:The base plate glass composition material of the present invention is by melting shape
Into tough and tensile glass, and network structure can be formed in glass by means of silica, and make glass generation tough and tensile by means of alundum (Al2O3)
Surface, and then increase glass heat resistance and devitrification resistance, reduce glass swelling rate, reduce the viscosity of glass by means of magnesia in addition
And the coefficient of expansion, and increase the chemical resistance and devitrification resistance of glass by barium monoxide, solve existing AMOLED base plate glass
Intensity and hardness are not enough, while replacing the compositions such as PbO, As2O3 or Sb2O3 by tin oxide, and then solve existing AMOLED
Environmental protection standard is not met with base plate glass, the problem of causing to reclaim difficulty and can not recycle.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
Embodiment 1 is a kind of to be used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali, and it is by following weight percent
The component composition of ratio:Silica 45.2, aluminum oxide 10.5, boron oxide 2.4, magnesia 2.8, calcium oxide 3.2, zirconium dioxide
1.6th, barium monoxide 1.5, tin oxide 2.2, cerium oxide 1.5, neodymia 2.0, lanthana 1.2, strontium carbonate 0.01.
The various material composition purity are higher than 99%.
The specific modulus of the glass is more than 30GPa cm3/gm.
The glass also includes chemical fining agent, and the fining agent is the arsenic oxide arsenoxide and 0.8-1.2% by 0.5-0.9%
Antimony oxide is constituted.
Embodiment 2 is a kind of to be used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali, and it is by following weight percent
The component composition of ratio:Silica 48.6, aluminum oxide 13.5, boron oxide 3.5, magnesia 5.4, calcium oxide 4.9, zirconium dioxide
3.1st, barium monoxide 4.7, tin oxide 3.3, cerium oxide 2.4, neodymia 2.5, lanthana 1.5, strontium carbonate 0.08.
The various material composition purity are higher than 99%.
The specific modulus of the glass is more than 30GPa cm3/gm.
The glass also includes chemical fining agent, and the fining agent is the arsenic oxide arsenoxide and 0.8-1.2% by 0.5-0.9%
Antimony oxide is constituted.
Embodiment 3 is a kind of to be used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali, and it is by following weight percent
The component composition of ratio:Silica 46.7, aluminum oxide 12.8, boron oxide 3.2, magnesia 4.2, calcium oxide 3.7, zirconium dioxide
2.5th, barium monoxide 3.3, tin oxide 2.9, cerium oxide 2.1, neodymia 2.3, lanthana 1.4, strontium carbonate 0.06.
The various material composition purity are higher than 99%.
The specific modulus of the glass is more than 30GPa cm3/gm.
The glass also includes chemical fining agent, and the fining agent is the arsenic oxide arsenoxide and 0.8-1.2% by 0.5-0.9%
Antimony oxide is constituted.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit is required rather than the explanation is limited, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Although not each moreover, it will be appreciated that the present specification is described in terms of embodiments
Embodiment is only comprising an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
Art personnel may be appreciated other embodiment.
Claims (4)
1. one kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali, it is characterised in that it is by following weight hundred
Divide the component composition of ratio:Silica 45.2-48.6, aluminum oxide 10.5-13.5, boron oxide 2.4-3.5, magnesia 2.8-5.4,
Calcium oxide 3.2-4.9, zirconium dioxide 1.6-3.1, barium monoxide 1.5-4.7, tin oxide 2.2-3.3, cerium oxide 1.5-2.4, oxidation
Neodymium 2.0-2.5, lanthana 1.2-1.5, strontium carbonate 0.01-0.08.
2. a kind of high thermal stability silicate glass containing boron and aluminium without alkali according to claim 1, it is characterised in that:It is described various
Material composition purity is higher than 99%.
3. a kind of high thermal stability silicate glass containing boron and aluminium without alkali according to claim 1, it is characterised in that:It is described
The specific modulus of glass is more than 30GPa cm3/gm.
4. a kind of high thermal stability silicate glass containing boron and aluminium without alkali according to claim 1, it is characterised in that:The glass
Chemical fining agent is also included, the fining agent is made up of 0.5-0.9% arsenic oxide arsenoxide and 0.8-1.2% antimony oxide.
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CN201710446011.6A CN107324650A (en) | 2017-06-14 | 2017-06-14 | One kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali |
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CN201710446011.6A CN107324650A (en) | 2017-06-14 | 2017-06-14 | One kind is used for AMOLED high thermal stability silicate glass containing boron and aluminium without alkali |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108358445A (en) * | 2018-02-08 | 2018-08-03 | 合肥利裕泰玻璃制品有限公司 | A kind of high-temperature-resistant lead-free glass material and preparation method thereof |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101062834A (en) * | 2007-05-15 | 2007-10-31 | 中国建筑材料科学研究总院 | LCD sheet glass |
-
2017
- 2017-06-14 CN CN201710446011.6A patent/CN107324650A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101062834A (en) * | 2007-05-15 | 2007-10-31 | 中国建筑材料科学研究总院 | LCD sheet glass |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108358445A (en) * | 2018-02-08 | 2018-08-03 | 合肥利裕泰玻璃制品有限公司 | A kind of high-temperature-resistant lead-free glass material and preparation method thereof |
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Application publication date: 20171107 |